CA1169336A - String stabilized ribbon growth method and apparatus - Google Patents
String stabilized ribbon growth method and apparatusInfo
- Publication number
- CA1169336A CA1169336A CA000367354A CA367354A CA1169336A CA 1169336 A CA1169336 A CA 1169336A CA 000367354 A CA000367354 A CA 000367354A CA 367354 A CA367354 A CA 367354A CA 1169336 A CA1169336 A CA 1169336A
- Authority
- CA
- Canada
- Prior art keywords
- melt
- crucible
- strings
- ribbon
- string
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 80
- 239000000155 melt Substances 0.000 claims abstract description 229
- 230000000087 stabilizing effect Effects 0.000 claims abstract description 7
- 230000005499 meniscus Effects 0.000 claims description 90
- 239000012535 impurity Substances 0.000 claims description 59
- 239000000463 material Substances 0.000 claims description 44
- 238000009413 insulation Methods 0.000 claims description 29
- 229910052710 silicon Inorganic materials 0.000 claims description 27
- 239000010703 silicon Substances 0.000 claims description 27
- 239000013078 crystal Substances 0.000 claims description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 25
- 229910002804 graphite Inorganic materials 0.000 claims description 21
- 239000010439 graphite Substances 0.000 claims description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 13
- 230000008014 freezing Effects 0.000 claims description 12
- 238000007710 freezing Methods 0.000 claims description 12
- 238000005204 segregation Methods 0.000 claims description 11
- 230000014759 maintenance of location Effects 0.000 claims description 8
- 238000001816 cooling Methods 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000033001 locomotion Effects 0.000 claims description 6
- 230000008602 contraction Effects 0.000 claims description 5
- 238000005086 pumping Methods 0.000 claims description 5
- 239000002994 raw material Substances 0.000 claims description 5
- 230000005679 Peltier effect Effects 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010257 thawing Methods 0.000 claims description 3
- 238000003760 magnetic stirring Methods 0.000 claims description 2
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 2
- 238000003756 stirring Methods 0.000 claims description 2
- 108091006146 Channels Proteins 0.000 claims 4
- 230000002730 additional effect Effects 0.000 claims 1
- 230000006835 compression Effects 0.000 claims 1
- 238000007906 compression Methods 0.000 claims 1
- 230000005672 electromagnetic field Effects 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 230000002401 inhibitory effect Effects 0.000 claims 1
- XLNZEKHULJKQBA-UHFFFAOYSA-N terbufos Chemical compound CCOP(=S)(OCC)SCSC(C)(C)C XLNZEKHULJKQBA-UHFFFAOYSA-N 0.000 claims 1
- 238000011179 visual inspection Methods 0.000 abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 26
- 230000008569 process Effects 0.000 description 23
- 239000007788 liquid Substances 0.000 description 16
- 230000006641 stabilisation Effects 0.000 description 12
- 238000011105 stabilization Methods 0.000 description 12
- 230000008859 change Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 239000012768 molten material Substances 0.000 description 9
- 230000009471 action Effects 0.000 description 7
- 210000001787 dendrite Anatomy 0.000 description 7
- 238000011010 flushing procedure Methods 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 230000006870 function Effects 0.000 description 4
- 230000004927 fusion Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000009736 wetting Methods 0.000 description 4
- 239000004020 conductor Substances 0.000 description 3
- 230000005484 gravity Effects 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 101100453921 Caenorhabditis elegans kin-29 gene Proteins 0.000 description 1
- 101100114417 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) con-13 gene Proteins 0.000 description 1
- 241000282887 Suidae Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- JJCFRYNCJDLXIK-UHFFFAOYSA-N cyproheptadine Chemical compound C1CN(C)CCC1=C1C2=CC=CC=C2C=CC2=CC=CC=C21 JJCFRYNCJDLXIK-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000003450 growing effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 208000022119 inability to concentrate Diseases 0.000 description 1
- 239000013072 incoming material Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000003340 mental effect Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 230000005676 thermoelectric effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 239000008207 working material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/007—Pulling on a substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/002—Continuous growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/06—Non-vertical pulling
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/24—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using mechanical means, e.g. shaping guides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/30—Mechanisms for rotating or moving either the melt or the crystal
- C30B15/305—Stirring of the melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US109,865 | 1980-01-07 | ||
US06/109,865 US4661200A (en) | 1980-01-07 | 1980-01-07 | String stabilized ribbon growth |
US21474180A | 1980-12-11 | 1980-12-11 | |
US214,741 | 1980-12-11 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA1169336A true CA1169336A (en) | 1984-06-19 |
Family
ID=26807452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA000367354A Expired CA1169336A (en) | 1980-01-07 | 1980-12-22 | String stabilized ribbon growth method and apparatus |
Country Status (6)
Country | Link |
---|---|
CA (1) | CA1169336A (it) |
DE (1) | DE3100245A1 (it) |
FR (1) | FR2473072A1 (it) |
GB (3) | GB2067920B (it) |
IL (1) | IL61852A (it) |
IT (1) | IT1143254B (it) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4689109A (en) * | 1980-12-11 | 1987-08-25 | Sachs Emanuel M | String stabilized ribbon growth a method for seeding same |
US4659421A (en) * | 1981-10-02 | 1987-04-21 | Energy Materials Corporation | System for growth of single crystal materials with extreme uniformity in their structural and electrical properties |
DE3240245A1 (de) * | 1982-10-29 | 1984-05-03 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zum herstellen von bandfoermigen siliziumkoerpern fuer solarzellen |
DE3565558D1 (en) * | 1984-07-31 | 1988-11-17 | Siemens Ag | Process and apparatus for making silicon crystal films with a horizontal pulling direction |
FR2568490B1 (fr) * | 1984-08-02 | 1986-12-05 | Comp Generale Electricite | Procede et dispositif pour deposer une couche de silicium polycristallin sur un ruban de carbone |
US4861416A (en) * | 1985-04-04 | 1989-08-29 | The United States Of America As Represented By The Administrator, National Aeronautics And Space Administration | Ribbon growing method and apparatus |
US6402839B1 (en) | 1998-08-14 | 2002-06-11 | Ebara Solar, Inc. | System for stabilizing dendritic web crystal growth |
US6482261B2 (en) | 2000-12-29 | 2002-11-19 | Ebara Solar, Inc. | Magnetic field furnace |
DE60316337T2 (de) * | 2002-10-18 | 2008-06-05 | Evergreen Solar Inc., Marlborough | Verfahren und vorrichtung zur kristallzüchtung |
US6814802B2 (en) | 2002-10-30 | 2004-11-09 | Evergreen Solar, Inc. | Method and apparatus for growing multiple crystalline ribbons from a single crucible |
US20080134964A1 (en) * | 2006-12-06 | 2008-06-12 | Evergreen Solar, Inc. | System and Method of Forming a Crystal |
FR2913434B1 (fr) * | 2007-03-08 | 2009-11-20 | Apollon Solar | Dispositif et procede de fabrication de plaques autosupportees de silicium ou autres materiaux cristallins. |
WO2009029741A1 (en) * | 2007-08-31 | 2009-03-05 | Evergreen Solar, Inc. | String with reduced wetting for ribbon crystals |
US8304057B2 (en) | 2007-08-31 | 2012-11-06 | Max Era, Inc. | Ribbon crystal end string with multiple individual strings |
WO2010021967A1 (en) | 2008-08-18 | 2010-02-25 | Evergreen Solar, Inc. | Controlling transport of gas borne contaminants across a ribbon surface |
EP2622648A1 (en) * | 2010-10-01 | 2013-08-07 | Evergreen Solar, Inc. | Sheet wafer processing as a function of wafer weight |
US20120164379A1 (en) * | 2010-12-22 | 2012-06-28 | Evergreen Solar, Inc. | Wide Sheet Wafer |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB796878A (en) * | 1955-06-27 | 1958-06-18 | Telefunken Gmbh | Improvements in or relating to methods of stirring molten electrically conductive material |
NL113205C (it) * | 1958-08-28 | 1900-01-01 | ||
US3129061A (en) * | 1961-03-27 | 1964-04-14 | Westinghouse Electric Corp | Process for producing an elongated unitary body of semiconductor material crystallizing in the diamond cubic lattice structure and the product so produced |
US3298795A (en) * | 1964-03-23 | 1967-01-17 | Westinghouse Electric Corp | Process for controlling dendritic crystal growth |
NL124684C (it) * | 1964-07-29 | 1900-01-01 | ||
US3370927A (en) * | 1966-02-28 | 1968-02-27 | Westinghouse Electric Corp | Method of angularly pulling continuous dendritic crystals |
GB1271493A (en) * | 1968-05-09 | 1972-04-19 | Stanelco Thermatron Ltd | Improved treatment process |
US3639718A (en) * | 1970-06-15 | 1972-02-01 | Little Inc A | Pressure- and temperature-controlled crystal growing apparatus |
US3865554A (en) * | 1971-09-23 | 1975-02-11 | Little Inc A | Pressure-and temperature-controlled apparatus for large-scale production of crystals by the czochralski technique |
GB1498925A (en) * | 1975-02-07 | 1978-01-25 | Philips Electronic Associated | Method of manufacturing semiconductor devices in which a layer of semiconductor material is provided on a substrate apparatus for use in carrying out said method and semiconductor devices thus manufactured |
DE2520764A1 (de) * | 1975-05-09 | 1976-11-18 | Siemens Ag | Verfahren und vorrichtung zum herstellen von bandfoermigen einkristallen aus halbleitermaterial |
-
1980
- 1980-12-22 CA CA000367354A patent/CA1169336A/en not_active Expired
- 1980-12-30 GB GB8041489A patent/GB2067920B/en not_active Expired
-
1981
- 1981-01-05 IL IL61852A patent/IL61852A/xx not_active IP Right Cessation
- 1981-01-07 DE DE19813100245 patent/DE3100245A1/de active Granted
- 1981-01-07 FR FR8100172A patent/FR2473072A1/fr active Granted
- 1981-01-07 IT IT67008/81A patent/IT1143254B/it active
-
1984
- 1984-01-12 GB GB08400735A patent/GB2135595B/en not_active Expired
- 1984-01-12 GB GB08400734A patent/GB2135594B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
IT8167008A0 (it) | 1981-01-07 |
GB2135594A (en) | 1984-09-05 |
GB2067920A (en) | 1981-08-05 |
IT1143254B (it) | 1986-10-22 |
GB2135595B (en) | 1985-05-22 |
FR2473072A1 (fr) | 1981-07-10 |
GB2135595A (en) | 1984-09-05 |
GB8400734D0 (en) | 1984-02-15 |
DE3100245A1 (de) | 1982-01-14 |
GB2135594B (en) | 1985-05-15 |
GB2067920B (en) | 1984-10-24 |
GB8400735D0 (en) | 1984-02-15 |
IL61852A (en) | 1984-05-31 |
FR2473072B1 (it) | 1984-09-14 |
DE3100245C2 (it) | 1990-07-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MKEX | Expiry |