Classifications

• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F3/00—Colour separation; Correction of tonal value
  • G03F3/10—Checking the colour or tonal value of separation negatives or positives
  • G03F3/101—Colour or tonal value checking by non-photographic means or by means other than using non-impact printing methods or duplicating or marking methods covered by B41M5/00
• • G—PHYSICS
  • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
  • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
  • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
  • G03F7/26—Processing photosensitive materials; Apparatus therefor
  • G03F7/30—Imagewise removal using liquid means
  • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
  • G03F7/3071—Process control means, e.g. for replenishing
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
  • B41P—INDEXING SCHEME RELATING TO PRINTING, LINING MACHINES, TYPEWRITERS, AND TO STAMPS
  • B41P2233/00—Arrangements for the operation of printing presses
  • B41P2233/50—Marks on printed material
  • B41P2233/51—Marks on printed material for colour quality control

Landscapes

• Physics & Mathematics (AREA)
• General Physics & Mathematics (AREA)
• Engineering & Computer Science (AREA)
• Automation & Control Theory (AREA)
• Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
• Preparing Plates And Mask In Photomechanical Process (AREA)

Applications Claiming Priority (1)

Publications (1)

Family

ID=23184786

Family Applications (1)

Country Status (8)

Families Citing this family (9)

• 1973
  • 1973-08-27 CA CA179,675A patent/CA1012822A/en not_active Expired
  • 1973-11-02 NL NL7315076A patent/NL7315076A/xx unknown
  • 1973-11-10 DE DE19732356325 patent/DE2356325A1/en active Pending
  • 1973-11-12 BE BE137661A patent/BE807213A/en unknown
  • 1973-11-12 IT IT5362773A patent/IT1008599B/en active
  • 1973-11-13 FR FR7340263A patent/FR2206868A5/fr not_active Expired
  • 1973-11-13 BR BR887473A patent/BR7308874D0/en unknown
  • 1973-11-13 JP JP12765473A patent/JPS4994403A/ja active Pending

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