CA994152A - Photoresist and method of making same - Google Patents
Photoresist and method of making sameInfo
- Publication number
- CA994152A CA994152A CA163,457A CA163457A CA994152A CA 994152 A CA994152 A CA 994152A CA 163457 A CA163457 A CA 163457A CA 994152 A CA994152 A CA 994152A
- Authority
- CA
- Canada
- Prior art keywords
- photoresist
- making same
- making
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22493972A | 1972-02-09 | 1972-02-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA994152A true CA994152A (en) | 1976-08-03 |
Family
ID=22842857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA163,457A Expired CA994152A (en) | 1972-02-09 | 1973-02-06 | Photoresist and method of making same |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS496914A (en) |
| CA (1) | CA994152A (en) |
| DE (1) | DE2306353A1 (en) |
| GB (1) | GB1420351A (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3925077A (en) * | 1974-03-01 | 1975-12-09 | Horizons Inc | Photoresist for holography and laser recording with bleachout dyes |
| US4234676A (en) | 1978-01-23 | 1980-11-18 | W. R. Grace & Co. | Polythiol effect curable polymeric composition |
| US4179531A (en) | 1977-08-23 | 1979-12-18 | W. R. Grace & Co. | Polythiol effect, curable monoalkenyl aromatic-diene and ene composition |
| CA1164710A (en) * | 1978-05-09 | 1984-04-03 | Edward J. Reardon, Jr. | Phototropic photosensitive compositions containing fluoran colorformer |
| CA1153610A (en) * | 1978-05-09 | 1983-09-13 | Edward J. Reardon, Jr. | Carbonylic halides as activators for phototropic compositions |
| JPS6053300B2 (en) * | 1978-08-29 | 1985-11-25 | 富士写真フイルム株式会社 | Photosensitive resin composition |
| JPS5569265A (en) * | 1978-11-15 | 1980-05-24 | Hitachi Ltd | Pattern-forming method |
| JPS6057337A (en) * | 1983-09-07 | 1985-04-03 | Mitsubishi Rayon Co Ltd | Manufacture of photopolymerizable resin composition |
| JPS6080843A (en) * | 1983-10-08 | 1985-05-08 | Mitsubishi Rayon Co Ltd | Photopolymerizable resin composition |
-
1973
- 1973-02-06 CA CA163,457A patent/CA994152A/en not_active Expired
- 1973-02-08 GB GB628273A patent/GB1420351A/en not_active Expired
- 1973-02-09 DE DE19732306353 patent/DE2306353A1/en active Pending
- 1973-02-09 JP JP1636373A patent/JPS496914A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1420351A (en) | 1976-01-07 |
| DE2306353A1 (en) | 1973-08-23 |
| JPS496914A (en) | 1974-01-22 |
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