BR8706609A - PHOTO-REPRODUCABLE COATING COMPOSITION AND PROCESS FOR THE PREPARATION OF A UV SENSITIVE POLYMER - Google Patents
PHOTO-REPRODUCABLE COATING COMPOSITION AND PROCESS FOR THE PREPARATION OF A UV SENSITIVE POLYMERInfo
- Publication number
- BR8706609A BR8706609A BR8706609A BR8706609A BR8706609A BR 8706609 A BR8706609 A BR 8706609A BR 8706609 A BR8706609 A BR 8706609A BR 8706609 A BR8706609 A BR 8706609A BR 8706609 A BR8706609 A BR 8706609A
- Authority
- BR
- Brazil
- Prior art keywords
- reproducable
- photo
- preparation
- coating composition
- sensitive polymer
- Prior art date
Links
- 239000008199 coating composition Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 229920000642 polymer Polymers 0.000 title 1
- 238000002360 preparation method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/025—Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/30—Low-molecular-weight compounds
- C08G18/34—Carboxylic acids; Esters thereof with monohydroxyl compounds
- C08G18/348—Hydroxycarboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
- C08G18/671—Unsaturated compounds having only one group containing active hydrogen
- C08G18/672—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen
- C08G18/6725—Esters of acrylic or alkyl acrylic acid having only one group containing active hydrogen containing ester groups other than acrylate or alkylacrylate ester groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polyurethanes Or Polyureas (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US93960486A | 1986-12-08 | 1986-12-08 | |
US4546487A | 1987-05-04 | 1987-05-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
BR8706609A true BR8706609A (en) | 1988-07-19 |
Family
ID=26722797
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR8706609A BR8706609A (en) | 1986-12-08 | 1987-12-08 | PHOTO-REPRODUCABLE COATING COMPOSITION AND PROCESS FOR THE PREPARATION OF A UV SENSITIVE POLYMER |
Country Status (13)
Country | Link |
---|---|
KR (1) | KR910001523B1 (en) |
CN (1) | CN1031227C (en) |
BR (1) | BR8706609A (en) |
CA (1) | CA1332093C (en) |
CH (1) | CH680622A5 (en) |
DE (1) | DE3741385C2 (en) |
FR (1) | FR2607820B1 (en) |
GB (1) | GB2199335B (en) |
HK (1) | HK60692A (en) |
IT (1) | IT1233418B (en) |
MX (1) | MX168832B (en) |
NL (1) | NL190785C (en) |
SG (1) | SG61192G (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910021456A (en) * | 1990-02-20 | 1991-12-20 | 우메모토 요시마사 | Water-soluble photocurable polyurethane poly (meth) acrylates, adhesives containing them and methods of making laminated articles |
CA2040097A1 (en) * | 1990-04-12 | 1991-10-13 | Wako Yokoyama | Urethane polymers for printing plate compositions |
US5341799A (en) * | 1991-12-23 | 1994-08-30 | Hercules Incorporated | Urethane polymers for printing plate compositions |
PL354140A1 (en) | 1999-09-30 | 2003-12-29 | Basf Aktiengesellschaftbasf Aktiengesellschaft | Aqueous polyurethane dispersions which can be hardened with mit uv-radiation and thermally, and use thereof |
US20120097329A1 (en) * | 2010-05-21 | 2012-04-26 | Merck Patent Gesellschaft | Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same |
CN104193944A (en) * | 2014-08-21 | 2014-12-10 | 苏州瑞红电子化学品有限公司 | Controllable-acid-value photosensitive alkali-soluble polyurethane acrylate resin and photoresist composition thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4153778A (en) * | 1978-03-30 | 1979-05-08 | Union Carbide Corporation | Acrylyl capped urethane oligomers |
NL8401785A (en) * | 1984-06-04 | 1986-01-02 | Polyvinyl Chemie Holland | PROCESS FOR PREPARING AN AQUEOUS DISPERSION OF URETHAN ACRYLATE ENTCOPOLYMERS AND STABLE AQUEOUS DISPERSION THUS OBTAINED. |
EP0222878B1 (en) * | 1985-05-17 | 1990-12-05 | ATOCHEM NORTH AMERICA, INC. (a Pennsylvania corp.) | Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings |
-
1987
- 1987-11-03 CA CA000550900A patent/CA1332093C/en not_active Expired - Fee Related
- 1987-12-04 IT IT8722899A patent/IT1233418B/en active
- 1987-12-07 DE DE3741385A patent/DE3741385C2/en not_active Expired - Fee Related
- 1987-12-07 NL NL8702942A patent/NL190785C/en not_active IP Right Cessation
- 1987-12-08 BR BR8706609A patent/BR8706609A/en not_active IP Right Cessation
- 1987-12-08 FR FR878717087A patent/FR2607820B1/en not_active Expired - Lifetime
- 1987-12-08 MX MX009667A patent/MX168832B/en unknown
- 1987-12-08 CN CN87107321A patent/CN1031227C/en not_active Expired - Fee Related
- 1987-12-08 GB GB8728631A patent/GB2199335B/en not_active Expired - Lifetime
- 1987-12-08 CH CH4773/87A patent/CH680622A5/de unknown
- 1987-12-08 KR KR1019870014055A patent/KR910001523B1/en active IP Right Grant
-
1992
- 1992-06-12 SG SG611/92A patent/SG61192G/en unknown
- 1992-08-13 HK HK606/92A patent/HK60692A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR910001523B1 (en) | 1991-03-15 |
CH680622A5 (en) | 1992-09-30 |
CN87107321A (en) | 1988-06-22 |
CN1031227C (en) | 1996-03-06 |
SG61192G (en) | 1992-09-04 |
NL190785B (en) | 1994-03-16 |
GB2199335B (en) | 1991-01-09 |
IT8722899A0 (en) | 1987-12-04 |
MX168832B (en) | 1993-06-10 |
FR2607820B1 (en) | 1994-06-10 |
KR880014415A (en) | 1988-12-23 |
DE3741385A1 (en) | 1988-06-09 |
GB2199335A (en) | 1988-07-06 |
CA1332093C (en) | 1994-09-20 |
FR2607820A1 (en) | 1988-06-10 |
HK60692A (en) | 1992-08-21 |
NL190785C (en) | 1994-08-16 |
NL8702942A (en) | 1988-07-01 |
IT1233418B (en) | 1992-03-31 |
GB8728631D0 (en) | 1988-01-13 |
DE3741385C2 (en) | 1996-06-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FB19 | Grant procedure suspended (art. 19) | ||
FF | Decision: intention to grant | ||
FG | Letter patent granted | ||
HO | Change of classification |
Free format text: INT.CL.6 G03F 7/027 E 7/028 |
|
B21A | Patent or certificate of addition expired [chapter 21.1 patent gazette] |
Free format text: PATENTE EXTINTA EM 08/12/2002 |