BR7605794A - Mistura fotossensivel e composicao fotopolimerizavel - Google Patents

Mistura fotossensivel e composicao fotopolimerizavel

Info

Publication number
BR7605794A
BR7605794A BR7605794A BR7605794A BR7605794A BR 7605794 A BR7605794 A BR 7605794A BR 7605794 A BR7605794 A BR 7605794A BR 7605794 A BR7605794 A BR 7605794A BR 7605794 A BR7605794 A BR 7605794A
Authority
BR
Brazil
Prior art keywords
photosensitive mixture
photopolimerizable
composition
photopolimerizable composition
photosensitive
Prior art date
Application number
BR7605794A
Other languages
English (en)
Inventor
G Smith
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of BR7605794A publication Critical patent/BR7605794A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
BR7605794A 1975-09-02 1976-09-01 Mistura fotossensivel e composicao fotopolimerizavel BR7605794A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/609,896 US4069054A (en) 1975-09-02 1975-09-02 Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer

Publications (1)

Publication Number Publication Date
BR7605794A true BR7605794A (pt) 1977-08-16

Family

ID=24442784

Family Applications (1)

Application Number Title Priority Date Filing Date
BR7605794A BR7605794A (pt) 1975-09-02 1976-09-01 Mistura fotossensivel e composicao fotopolimerizavel

Country Status (7)

Country Link
US (1) US4069054A (pt)
JP (1) JPS609248B2 (pt)
BR (1) BR7605794A (pt)
CA (1) CA1081522A (pt)
DE (1) DE2639396A1 (pt)
FR (1) FR2322653A1 (pt)
GB (1) GB1565544A (pt)

Families Citing this family (102)

* Cited by examiner, † Cited by third party
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US4173476A (en) * 1978-02-08 1979-11-06 Minnesota Mining And Manufacturing Company Complex salt photoinitiator
US4218531A (en) * 1978-02-08 1980-08-19 Minnesota Mining And Manufacturing Company Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions
US4324679A (en) * 1978-02-08 1982-04-13 Minnesota Mining And Manufacturing Company Controlling odor in photopolymerization
US4156035A (en) * 1978-05-09 1979-05-22 W. R. Grace & Co. Photocurable epoxy-acrylate compositions
US4139655A (en) * 1978-05-09 1979-02-13 W. R. Grace & Co. Photocurable epoxy compositions containing thiopyrylium salts
US4428807A (en) 1978-06-30 1984-01-31 The Dow Chemical Company Composition containing polymerizable entities having oxirane groups and terminal olefinic unsaturation in combination with free-radical and cationic photopolymerizations means
US4216288A (en) * 1978-09-08 1980-08-05 General Electric Company Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
DE2966764D1 (en) * 1978-10-27 1984-04-12 Ici Plc Polymerisable compositions, derived coatings and other polymerised products
US4241204A (en) * 1979-02-12 1980-12-23 General Electric Company Cationically curable organic resin compositions containing sulfonium salts and an organic oxidant
US4259454A (en) * 1979-02-12 1981-03-31 General Electric Company Curable organic resin compositions and foaming method
US4197174A (en) * 1979-03-14 1980-04-08 American Can Company Method for producing bis-[4-(diphenylsulfonio) phenyl] sulfide bis-MX6
US4201640A (en) * 1979-03-14 1980-05-06 American Can Company Method for producing bis-[4-(diphenylsulfonio)phenyl] sulfide bis-M.X6
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4299938A (en) * 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
US4247473A (en) * 1979-07-19 1981-01-27 American Can Company Method for producing bis-[4-(diphenylsulfonio)pheny] sulfide bis-M.X6 photoinitiator
US4247472A (en) * 1979-07-19 1981-01-27 American Can Company Method for producing bis-[4-(diphenylsulfonic)phenyl]sulfide bis-MF6 photoinitiator
US4250203A (en) * 1979-08-30 1981-02-10 American Can Company Cationically polymerizable compositions containing sulfonium salt photoinitiators and odor suppressants and method of polymerization using same
US4306953A (en) * 1979-11-05 1981-12-22 American Can Company Cationically polymerizable compositions containing sulfonium salt photoinitiators and stable free radicals as odor suppressants and _method of polymerization using same
US4289595A (en) * 1979-11-26 1981-09-15 American Can Company Ambient temperature curing photopolymerizable epoxide compositions utilizing epoxide ethers and methods
US4339567A (en) * 1980-03-07 1982-07-13 Ciba-Geigy Corporation Photopolymerization by means of sulphoxonium salts
US4383025A (en) * 1980-07-10 1983-05-10 Ciba-Geigy Corporation Photopolymerization by means of sulfoxonium salts
US4398014A (en) * 1980-11-04 1983-08-09 Ciba-Geigy Corporation Sulfoxonium salts and their use as polymerization catalysts
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GB2137626B (en) * 1983-03-31 1986-10-15 Sericol Group Ltd Water based photopolymerisable compositions and their use
US4540598A (en) * 1983-08-17 1985-09-10 Ciba-Geigy Corporation Process for curing acid-curable finishes
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
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US4554238A (en) * 1984-03-20 1985-11-19 Minnesota Mining And Manufacturing Company Spectrally-sensitized imaging system
US4694029A (en) * 1985-04-09 1987-09-15 Cook Paint And Varnish Company Hybrid photocure system
JPS623115U (pt) * 1985-06-21 1987-01-09
US4654379A (en) * 1985-12-05 1987-03-31 Allied Corporation Semi-interpenetrating polymer networks
US4751138A (en) 1986-08-11 1988-06-14 Minnesota Mining And Manufacturing Company Coated abrasive having radiation curable binder
CA1305823C (en) * 1986-08-29 1992-07-28 Union Carbide Corporation Photocurable blends of cyclic ethers and cycloaliphatic epoxides
DE3643400A1 (de) * 1986-12-19 1988-07-07 Henkel Kgaa Verfahren zum kleben nichttransparenter substrate und dazu verwendbare klebesysteme
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4889792A (en) * 1987-12-09 1989-12-26 Minnesota Mining And Manufacturing Company Ternary photoinitiator system for addition polymerization
US4975300A (en) * 1987-12-31 1990-12-04 Minnesota Mining And Manufacturing Company Method for curing an organic coating using condensation heating and radiation energy
US4933377A (en) * 1988-02-29 1990-06-12 Saeva Franklin D Novel sulfonium salts and the use thereof as photoinitiators
US5047568A (en) * 1988-11-18 1991-09-10 International Business Machines Corporation Sulfonium salts and use and preparation thereof
US5141969A (en) * 1988-11-21 1992-08-25 Eastman Kodak Company Onium salts and the use thereof as photoinitiators
US4954416A (en) * 1988-12-21 1990-09-04 Minnesota Mining And Manufacturing Company Tethered sulfonium salt photoinitiators for free radical polymerization
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
EP0388343B1 (en) * 1989-03-14 1996-07-17 International Business Machines Corporation Chemically amplified photoresist
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
US5098816A (en) * 1989-10-10 1992-03-24 International Business Machines Corporation Method for forming a pattern of a photoresist
US5059512A (en) * 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
US5212046A (en) * 1989-10-17 1993-05-18 Shipley Company Inc. Near UV photoresist
US5055439A (en) * 1989-12-27 1991-10-08 International Business Machines Corporation Photoacid generating composition and sensitizer therefor
US5464538A (en) * 1989-12-29 1995-11-07 The Dow Chemical Company Reverse osmosis membrane
US5238747A (en) * 1989-12-29 1993-08-24 The Dow Chemical Company Photocurable compositions
US5310581A (en) * 1989-12-29 1994-05-10 The Dow Chemical Company Photocurable compositions
US5045431A (en) * 1990-04-24 1991-09-03 International Business Machines Corporation Dry film, aqueous processable photoresist compositions
EP0473547A1 (de) * 1990-08-27 1992-03-04 Ciba-Geigy Ag Olefinisch ungesättigte Oniumsalze
JPH04113362A (ja) * 1990-09-03 1992-04-14 Fuji Photo Film Co Ltd 光重合性組成物
US5204226A (en) * 1991-03-04 1993-04-20 International Business Machines Corporation Photosensitizers for polysilanes
JP2750310B2 (ja) * 1991-09-17 1998-05-13 インターナショナル・ビジネス・マシーンズ・コーポレイション 近紫外−可視域イメージング用ポジチブフォトレジスト
US5252694A (en) * 1992-01-22 1993-10-12 Minnesota Mining And Manufacturing Company Energy-polymerization adhesive, coating, film and process for making the same
US5262232A (en) * 1992-01-22 1993-11-16 Minnesota Mining And Manufacturing Company Vibration damping constructions using acrylate-containing damping materials
AU664431B2 (en) * 1992-03-03 1995-11-16 Minnesota Mining And Manufacturing Company Thermosetting binder for an abrasive article
US5318808A (en) * 1992-09-25 1994-06-07 Polyset Company, Inc. UV-curable coatings
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
DE4418645C1 (de) * 1994-05-27 1995-12-14 Sun Chemical Corp Lichtempfindliches Gemisch und daraus herstellbares Aufzeichnungsmaterial
US5707780A (en) * 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US6254954B1 (en) 1997-02-28 2001-07-03 3M Innovative Properties Company Pressure-sensitive adhesive tape
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US6488993B2 (en) 1997-07-02 2002-12-03 William V Madigan Process for applying a coating to sheet metal
US6221497B1 (en) * 1997-09-02 2001-04-24 Tekkote Corporation Low friction coated substrate
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US6635195B1 (en) 2000-02-04 2003-10-21 Essilor International Compagnie Generale D'optique Cationic photopolymerization of diepisulfides and application to the manufacture of optical lenses
US6605128B2 (en) 2001-03-20 2003-08-12 3M Innovative Properties Company Abrasive article having projections attached to a major surface thereof
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US9522967B2 (en) * 2006-06-09 2016-12-20 Dentsply International Inc. Photopolymerizable compositions featuring novel amine accelerator for improved color stability and reduced polymerization stress thereby
JP2009007501A (ja) * 2007-06-29 2009-01-15 Toyo Ink Mfg Co Ltd 硬化型粘接着材料
JP2009008965A (ja) * 2007-06-29 2009-01-15 Toyo Ink Mfg Co Ltd 光導波路形成用材料、光導波路の製造方法、および光導波路
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US20150060113A1 (en) 2013-01-22 2015-03-05 Yongcai Wang Photocurable composition, article, and method of use
US20150125674A1 (en) 2013-11-05 2015-05-07 Thomas B. Brust Forming conductive metal patterns using reactive polymers
US9268223B2 (en) 2013-11-20 2016-02-23 Eastman Kodak Company Forming conductive metal pattern using reactive polymers
US9228039B2 (en) 2013-11-20 2016-01-05 Eastman Kodak Company Crosslinkable reactive polymers
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Also Published As

Publication number Publication date
JPS609248B2 (ja) 1985-03-08
DE2639396C2 (pt) 1989-01-19
FR2322653B1 (pt) 1980-05-09
DE2639396A1 (de) 1977-03-10
FR2322653A1 (fr) 1977-04-01
GB1565544A (en) 1980-04-23
CA1081522A (en) 1980-07-15
JPS5230420A (en) 1977-03-08
US4069054A (en) 1978-01-17

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