BR112012033235A2 - processo de máscara com o uso de filmes com redução de birrefringência espacialmente seletiva - Google Patents
processo de máscara com o uso de filmes com redução de birrefringência espacialmente seletivaInfo
- Publication number
- BR112012033235A2 BR112012033235A2 BR112012033235A BR112012033235A BR112012033235A2 BR 112012033235 A2 BR112012033235 A2 BR 112012033235A2 BR 112012033235 A BR112012033235 A BR 112012033235A BR 112012033235 A BR112012033235 A BR 112012033235A BR 112012033235 A2 BR112012033235 A2 BR 112012033235A2
- Authority
- BR
- Brazil
- Prior art keywords
- mask process
- spatially selective
- birefringence reduction
- selective birefringence
- reduction films
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0147—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on thermo-optic effects
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/06—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain multicolour or other optical effects
- B05D5/061—Special surface effect
- B05D5/063—Reflective effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/378—Special inks
- B42D25/391—Special inks absorbing or reflecting polarised light
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/04—Prisms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/285—Interference filters comprising deposited thin solid films
- G02B5/287—Interference filters comprising deposited thin solid films comprising at least one layer of organic material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/0009—Materials therefor
- G02F1/0063—Optical properties, e.g. absorption, reflection or birefringence
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/0009—Materials therefor
- G02F1/009—Thermal properties
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B20/00—Signal processing not specific to the method of recording or reproducing; Circuits therefor
- G11B20/10—Digital recording or reproducing
- G11B20/12—Formatting, e.g. arrangement of data block or words on the record carriers
- G11B20/1261—Formatting, e.g. arrangement of data block or words on the record carriers on films, e.g. for optical moving-picture soundtracks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Credit Cards Or The Like (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36012910P | 2010-06-30 | 2010-06-30 | |
PCT/US2011/042368 WO2012012177A1 (en) | 2010-06-30 | 2011-06-29 | Mask processing using films with spatially selective birefringence reduction |
Publications (1)
Publication Number | Publication Date |
---|---|
BR112012033235A2 true BR112012033235A2 (pt) | 2018-02-27 |
Family
ID=44454650
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012033235A BR112012033235A2 (pt) | 2010-06-30 | 2011-06-29 | processo de máscara com o uso de filmes com redução de birrefringência espacialmente seletiva |
Country Status (7)
Country | Link |
---|---|
US (3) | US9101956B2 (pt) |
EP (1) | EP2588903B1 (pt) |
JP (2) | JP2013539543A (pt) |
KR (2) | KR101877209B1 (pt) |
CN (1) | CN103038681B (pt) |
BR (1) | BR112012033235A2 (pt) |
WO (1) | WO2012012177A1 (pt) |
Families Citing this family (39)
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CN113917585A (zh) | 2014-10-23 | 2022-01-11 | 康宁股份有限公司 | 光漫射部件和制造光漫射部件的方法 |
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CN107924013B (zh) * | 2015-08-21 | 2019-08-16 | 3M创新有限公司 | 具有光轴的光学膜及用于处理光学膜的***和方法 |
KR102520797B1 (ko) * | 2015-10-15 | 2023-04-12 | 삼성전자주식회사 | 반사형 포토마스크 및 그 제조 방법 |
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CN109313295B (zh) * | 2016-06-03 | 2021-10-08 | 3M创新有限公司 | 具有空间变化微复制层的光学滤光器 |
JP6600278B2 (ja) * | 2016-06-07 | 2019-10-30 | 三菱重工業株式会社 | 選択型ビーム積層造形装置及び選択型ビーム積層造形方法 |
CN105867010B (zh) * | 2016-06-22 | 2019-01-15 | 武汉华星光电技术有限公司 | 彩膜基板及其制作方法 |
CN110088651B (zh) | 2016-12-20 | 2021-09-03 | 3M创新有限公司 | 包括隐藏荧光特征的多层膜 |
CN110446949B (zh) * | 2017-03-31 | 2021-12-28 | 东洋纺株式会社 | 多层层叠膜 |
JP7154228B2 (ja) * | 2017-04-21 | 2022-10-17 | ルミレッズ ホールディング ベーフェー | レーザベース光源用の信頼性の高い光変換デバイス |
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JP6420425B1 (ja) * | 2017-07-27 | 2018-11-07 | リンテック株式会社 | 積層体及び積層体の製造方法 |
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JP2021531502A (ja) | 2018-07-17 | 2021-11-18 | カール ツァイス エスエムエス リミテッド | フォトリソグラフィマスクの基板に導入される1つまたは複数のピクセルの効果を決定するための方法および装置 |
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-
2011
- 2011-06-29 JP JP2013518646A patent/JP2013539543A/ja not_active Withdrawn
- 2011-06-29 EP EP11734203.0A patent/EP2588903B1/en active Active
- 2011-06-29 US US13/703,549 patent/US9101956B2/en not_active Expired - Fee Related
- 2011-06-29 KR KR1020187002806A patent/KR101877209B1/ko active IP Right Grant
- 2011-06-29 WO PCT/US2011/042368 patent/WO2012012177A1/en active Application Filing
- 2011-06-29 BR BR112012033235A patent/BR112012033235A2/pt not_active IP Right Cessation
- 2011-06-29 CN CN201180037303.5A patent/CN103038681B/zh not_active Expired - Fee Related
- 2011-06-29 KR KR1020137002370A patent/KR101851813B1/ko active IP Right Grant
-
2015
- 2015-06-30 US US14/755,457 patent/US9423545B2/en active Active
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2016
- 2016-03-30 JP JP2016068116A patent/JP6297086B2/ja not_active Expired - Fee Related
- 2016-07-25 US US15/218,097 patent/US9810930B2/en active Active
Also Published As
Publication number | Publication date |
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US20130094084A1 (en) | 2013-04-18 |
KR101851813B1 (ko) | 2018-06-11 |
US9423545B2 (en) | 2016-08-23 |
JP2016136278A (ja) | 2016-07-28 |
KR20180014236A (ko) | 2018-02-07 |
US20160334649A1 (en) | 2016-11-17 |
US20150301255A1 (en) | 2015-10-22 |
KR20130040233A (ko) | 2013-04-23 |
US9810930B2 (en) | 2017-11-07 |
WO2012012177A1 (en) | 2012-01-26 |
JP6297086B2 (ja) | 2018-03-20 |
KR101877209B1 (ko) | 2018-07-10 |
CN103038681A (zh) | 2013-04-10 |
JP2013539543A (ja) | 2013-10-24 |
EP2588903B1 (en) | 2021-01-20 |
CN103038681B (zh) | 2016-09-28 |
EP2588903A1 (en) | 2013-05-08 |
US9101956B2 (en) | 2015-08-11 |
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