BR0215787B1 - Method for cathodic electrodeposition of a selected metallic material on a permanent or temporary microcomponent substrate produced by a pulse electrodeposition process - Google Patents

Method for cathodic electrodeposition of a selected metallic material on a permanent or temporary microcomponent substrate produced by a pulse electrodeposition process

Info

Publication number
BR0215787B1
BR0215787B1 BRPI0215787-0B1A BR0215787A BR0215787B1 BR 0215787 B1 BR0215787 B1 BR 0215787B1 BR 0215787 A BR0215787 A BR 0215787A BR 0215787 B1 BR0215787 B1 BR 0215787B1
Authority
BR
Brazil
Prior art keywords
microcomponent
temporary
permanent
electrodeposition
metallic material
Prior art date
Application number
BRPI0215787-0B1A
Other languages
Portuguese (pt)
Other versions
BR0215787A (en
Inventor
Gino Palumbo
Iain Brooks
Jonathan Mccrea
Gleen D Hibbard
Francisco Gonzalez
Klaus Tomantschger
Uwe Erb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BR0215787A publication Critical patent/BR0215787A/en
Publication of BR0215787B1 publication Critical patent/BR0215787B1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C25D5/06—Brush or pad plating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/20—Electroplating using ultrasonics, vibrations
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/67—Electroplating to repair workpiece
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/04—Tubes; Rings; Hollow bodies

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Manufacture Of Switches (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

The invention relates to a process for forming coatings or free-standing deposits of nanocrystalline metals, metal alloys or metal matrix composites. The process employs drum plating or selective plating processes involving pulse electrodeposition and a non-stationary anode or cathode. Novel nanocrystalline metal matrix composites and micro components are disclosed as well. Also described is a process for forming micro components with grain sizes below 1,000nm.
BRPI0215787-0B1A 2002-06-25 2002-06-25 Method for cathodic electrodeposition of a selected metallic material on a permanent or temporary microcomponent substrate produced by a pulse electrodeposition process BR0215787B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2002/007023 WO2004001100A1 (en) 2002-06-25 2002-06-25 Process for electroplating metallic and metall matrix composite foils, coatings and microcomponents

Publications (2)

Publication Number Publication Date
BR0215787A BR0215787A (en) 2005-03-01
BR0215787B1 true BR0215787B1 (en) 2013-12-03

Family

ID=29762587

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0215787-0B1A BR0215787B1 (en) 2002-06-25 2002-06-25 Method for cathodic electrodeposition of a selected metallic material on a permanent or temporary microcomponent substrate produced by a pulse electrodeposition process

Country Status (16)

Country Link
EP (2) EP1516076B1 (en)
JP (1) JP2005530926A (en)
KR (1) KR100890819B1 (en)
AT (1) ATE387522T1 (en)
AU (1) AU2002321112B2 (en)
BR (1) BR0215787B1 (en)
CA (1) CA2490464C (en)
DE (1) DE60225352T2 (en)
DK (1) DK1516076T3 (en)
ES (1) ES2301666T3 (en)
HK (1) HK1075278A1 (en)
IL (1) IL165904A0 (en)
MX (1) MXPA04011940A (en)
PT (1) PT1516076E (en)
WO (1) WO2004001100A1 (en)
ZA (1) ZA200410368B (en)

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US7425255B2 (en) 2005-06-07 2008-09-16 Massachusetts Institute Of Technology Method for producing alloy deposits and controlling the nanostructure thereof using negative current pulsing electro-deposition
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US8202627B2 (en) * 2006-01-24 2012-06-19 Usc, Llc Electrocomposite coatings for hard chrome replacement
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US9005420B2 (en) * 2007-12-20 2015-04-14 Integran Technologies Inc. Variable property electrodepositing of metallic structures
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Also Published As

Publication number Publication date
EP1826294A1 (en) 2007-08-29
KR20050024394A (en) 2005-03-10
WO2004001100A1 (en) 2003-12-31
AU2002321112A1 (en) 2004-01-06
MXPA04011940A (en) 2005-03-31
DE60225352T2 (en) 2008-06-12
EP1516076B1 (en) 2008-02-27
KR100890819B1 (en) 2009-04-06
AU2002321112B2 (en) 2008-07-03
CA2490464A1 (en) 2003-12-31
ATE387522T1 (en) 2008-03-15
PT1516076E (en) 2008-03-11
HK1075278A1 (en) 2005-12-09
JP2005530926A (en) 2005-10-13
ES2301666T3 (en) 2008-07-01
CA2490464C (en) 2008-09-02
DK1516076T3 (en) 2008-06-23
EP1516076A1 (en) 2005-03-23
DE60225352D1 (en) 2008-04-10
ZA200410368B (en) 2006-07-26
BR0215787A (en) 2005-03-01
IL165904A0 (en) 2006-01-15

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