BR0115820A - Método e composição útil para sìntese direta de organohalosilanos, método de sintetizar organohalosilanos tendo elevada seletividade para dialquildihalosilanos, método de controlar sìntese direta para fazer organohalosilano - Google Patents
Método e composição útil para sìntese direta de organohalosilanos, método de sintetizar organohalosilanos tendo elevada seletividade para dialquildihalosilanos, método de controlar sìntese direta para fazer organohalosilanoInfo
- Publication number
- BR0115820A BR0115820A BR0115820-1A BR0115820A BR0115820A BR 0115820 A BR0115820 A BR 0115820A BR 0115820 A BR0115820 A BR 0115820A BR 0115820 A BR0115820 A BR 0115820A
- Authority
- BR
- Brazil
- Prior art keywords
- direct synthesis
- organohalosilanes
- synthesizing
- dialkyl
- nanometer
- Prior art date
Links
- 230000015572 biosynthetic process Effects 0.000 title abstract 6
- 238000003786 synthesis reaction Methods 0.000 title abstract 6
- 238000000034 method Methods 0.000 title abstract 5
- 230000002194 synthesizing effect Effects 0.000 title abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 3
- 229910052802 copper Inorganic materials 0.000 abstract 3
- 239000010949 copper Substances 0.000 abstract 3
- 239000003054 catalyst Substances 0.000 abstract 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000012018 catalyst precursor Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 230000006698 induction Effects 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 229910052710 silicon Inorganic materials 0.000 abstract 1
- 239000010703 silicon Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/835—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with germanium, tin or lead
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/72—Copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/80—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with zinc, cadmium or mercury
-
- B01J35/40—
-
- B01J35/612—
Abstract
"MéTODO E COMPOSIçãO úTIL PARA SìNTESE DIRETA DE ORGANOHALOSILANOS, MéTODO DE SINTETIZAR ORGANOHALOSILANOS TENDO ELEVADA SELETIVIDADE PARA DIALQUILDIHALOSILANOS, MéTODO DE CONTROLAR SìNTESE DIRETA PARA FAZER ORGANOHALOSILANO". é revelada aqui uma Síntese Direta de fazer organohalosilanos com maior seletividade para o dialquildihalosilano. Mediante uso de precursores de catalisadores de cobre de dimensões nanométricas, e preferivelmente também promotores de dimensões nanométricas, valores D/T superiores a 10, e preferivelmente superiores a 15, podem ser obtidos com conversões de silício superiores a 80% em peso. Tempos de indução mais curtos são realizados utilizando-se os catalisadores de cobre de dimensões nanométricas na Síntese Direta. Os precursores de catalisadores de cobre de dimensões nanométricas têm, mais preferivelmente, um tamanho médio de partícula inferior a 100 nanómetros.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US25091500P | 2000-12-01 | 2000-12-01 | |
US09/974,266 US7153991B2 (en) | 2000-12-01 | 2001-10-09 | Rochow-Müller direct synthesis using nanosized copper catalyst precursors |
PCT/US2001/043581 WO2002044186A1 (en) | 2000-12-01 | 2001-11-16 | Rochow-muller direct synthesis using copper catalyst precursors with particel dimensions in the nano-region |
Publications (1)
Publication Number | Publication Date |
---|---|
BR0115820A true BR0115820A (pt) | 2004-01-27 |
Family
ID=26941245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR0115820-1A BR0115820A (pt) | 2000-12-01 | 2001-11-16 | Método e composição útil para sìntese direta de organohalosilanos, método de sintetizar organohalosilanos tendo elevada seletividade para dialquildihalosilanos, método de controlar sìntese direta para fazer organohalosilano |
Country Status (5)
Country | Link |
---|---|
US (1) | US7153991B2 (pt) |
EP (1) | EP1337537A1 (pt) |
CN (1) | CN1243758C (pt) |
BR (1) | BR0115820A (pt) |
WO (1) | WO2002044186A1 (pt) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003091159A1 (en) * | 2002-04-25 | 2003-11-06 | General Electric Company | Preparation of nanosized copper (i) compounds |
JP4788866B2 (ja) * | 2004-10-19 | 2011-10-05 | 信越化学工業株式会社 | フェニルクロロシランの製造方法 |
FR2887551B1 (fr) * | 2005-06-22 | 2008-02-15 | Rhodia Chimie Sa | Procede de synthese directe d'alkylhalogenosilanes |
US7652164B2 (en) * | 2005-09-13 | 2010-01-26 | Momentive Performance Materials Inc. | Process for the direct synthesis of trialkoxysilane |
US7645894B2 (en) | 2006-04-22 | 2010-01-12 | Bernard Kanner | Direct process for making cyclic dimethylsiloxane oligomers |
CN102212080A (zh) * | 2010-04-12 | 2011-10-12 | 中国科学院过程工程研究所 | 一种制备甲基氯硅烷的反应装置及包含其的反应*** |
EP2601245A1 (en) | 2010-08-05 | 2013-06-12 | Biofilm IP, LLC | Cyclosiloxane-substituted polysiloxane compounds, compositions containing the compounds and methods of use thereof |
DE102013212908A1 (de) | 2013-07-02 | 2015-01-08 | Wacker Chemie Ag | Analyse der Zusammensetzung eines Gases oder eines Gasstromes in einem chemischen Reaktor und ein Verfahren zur Herstellung von Chlorsilanen in einem Wirbelschichtreaktor |
CN105683204B (zh) * | 2013-08-30 | 2019-09-17 | 莫门蒂夫性能材料股份有限公司 | 由旋风细粒淤浆相直接合成有机卤代硅烷 |
US9920079B2 (en) * | 2014-12-18 | 2018-03-20 | Dow Corning Corporation | Process for production of halosilanes from silicon-containing ternary intermetallic compounds |
CN106378133A (zh) * | 2016-10-24 | 2017-02-08 | 中国科学院过程工程研究所 | 硅氢氯化法生产三氯氢硅的催化剂、其制备方法及其催化生产三氯氢硅的方法 |
WO2020249237A1 (de) * | 2019-06-14 | 2020-12-17 | Wacker Chemie Ag | Verfahren zur herstellung von methylchlorsilanen mit strukturoptimierten silicium-partikeln |
CN112892564B (zh) * | 2021-01-26 | 2023-07-25 | 深圳市中科墨磷科技有限公司 | 一种黑磷处理铜基催化剂的制备方法及其应用 |
CN115212882B (zh) * | 2022-06-30 | 2023-12-19 | 浙江工业大学 | 一种多孔硅化铜金属间化合物材料及其制备和应用 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE5348C (de) | PAPPERITZ & AVERKAMP, Maschinenfabrikanten, in Berlin, Blumenstrafse 37 | Neuerungen an Schrotmühlen | ||
US2380995A (en) | 1941-09-26 | 1945-08-07 | Gen Electric | Preparation of organosilicon halides |
DE920187C (de) | 1952-07-27 | 1954-11-15 | Basf Ag | Verfahren zur Herstellung von Alkylchlorsilanen |
DE1100006B (de) | 1958-12-04 | 1961-02-23 | Basf Ag | Verfahren zur Herstellung von Siliciumverbindungen |
DE1079607B (de) | 1958-12-04 | 1960-04-14 | Basf Ag | Verfahren zur Herstellung von Silicium, Siliciumlegierungen, Silicium-Metall-Gemischen und Siliciden mit einem Gehalt an Katalysatoren fuer die Synthese von Siliciumverbindungen |
DE1132901B (de) | 1960-03-23 | 1962-07-12 | Basf Ag | Verfahren zur Herstellung von pyrophorem Silicium und Polysiliciumhalogeniden |
DE1161430B (de) | 1961-03-30 | 1964-01-16 | Basf Ag | Verfahren zur Herstellung von Alkylchlor-polysilanen und/oder Alkylchlormonosilanen |
US3505379A (en) | 1964-08-28 | 1970-04-07 | Basf Ag | Production of organosilanes |
FR1488994A (fr) * | 1965-09-10 | 1967-07-21 | Rhone Poulenc Sa | Procédé de purification de chlorosilanes |
US4450282A (en) | 1981-07-29 | 1984-05-22 | General Electric Company | Catalyst for a process for producing silicones |
US4520130A (en) | 1984-05-08 | 1985-05-28 | Scm Corporation | Halosilane catalyst and process for making same |
US4864044A (en) | 1985-02-15 | 1989-09-05 | Union Carbide Corporation | Tin containing activated silicon for the direct reaction |
US4762940A (en) | 1987-12-11 | 1988-08-09 | Dow Corning Corporation | Method for preparation of alkylhalosilanes |
US4946980A (en) | 1988-10-17 | 1990-08-07 | Dow Corning Corporation | Preparation of organosilanes |
US5759230A (en) | 1995-11-30 | 1998-06-02 | The United States Of America As Represented By The Secretary Of The Navy | Nanostructured metallic powders and films via an alcoholic solvent process |
JP3159029B2 (ja) | 1996-01-12 | 2001-04-23 | 信越化学工業株式会社 | シラン類の製造方法 |
JP3346222B2 (ja) * | 1997-05-13 | 2002-11-18 | 信越化学工業株式会社 | アルキルハロシラン製造用触体の製造方法及びアルキルハロシランの製造方法 |
US6057469A (en) * | 1997-07-24 | 2000-05-02 | Pechiney Electrometallurgie | Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes |
US5880307A (en) * | 1998-02-17 | 1999-03-09 | Dow Corning Corporation | Process for the preparation of alkylhalosilanes |
JP3775467B2 (ja) * | 1999-10-25 | 2006-05-17 | 信越化学工業株式会社 | オルガノハロシランの製造方法 |
JP3818357B2 (ja) * | 2000-02-14 | 2006-09-06 | 信越化学工業株式会社 | オルガノハロシランの製造方法 |
US6528674B1 (en) * | 2000-04-20 | 2003-03-04 | General Electric Company | Method for preparing a contact mass |
US6423860B1 (en) * | 2000-09-05 | 2002-07-23 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
JP3812642B2 (ja) * | 2001-02-14 | 2006-08-23 | 信越化学工業株式会社 | オルガノハロシランの製造方法 |
US6407276B1 (en) * | 2001-03-29 | 2002-06-18 | General Electric Company | Method for improving selectivity for dialkyldichlorosilane |
-
2001
- 2001-10-09 US US09/974,266 patent/US7153991B2/en not_active Expired - Lifetime
- 2001-11-16 WO PCT/US2001/043581 patent/WO2002044186A1/en active Application Filing
- 2001-11-16 EP EP01985985A patent/EP1337537A1/en not_active Ceased
- 2001-11-16 BR BR0115820-1A patent/BR0115820A/pt not_active IP Right Cessation
- 2001-11-16 CN CNB018212794A patent/CN1243758C/zh not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US7153991B2 (en) | 2006-12-26 |
CN1483037A (zh) | 2004-03-17 |
WO2002044186A1 (en) | 2002-06-06 |
CN1243758C (zh) | 2006-03-01 |
EP1337537A1 (en) | 2003-08-27 |
US20030032829A1 (en) | 2003-02-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B08F | Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette] |
Free format text: REFERENTE A 9A E 10A ANUIDADES. |
|
B08K | Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette] |
Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2125 DE 27/09/2011. |