BE728728A - - Google Patents
Info
- Publication number
- BE728728A BE728728A BE728728DA BE728728A BE 728728 A BE728728 A BE 728728A BE 728728D A BE728728D A BE 728728DA BE 728728 A BE728728 A BE 728728A
- Authority
- BE
- Belgium
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D257/00—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms
- C07D257/02—Heterocyclic compounds containing rings having four nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D257/04—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D233/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
- C07D233/54—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
- C07D233/66—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D233/84—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/20—Two benzimidazolyl-2 radicals linked together directly or via a hydrocarbon or substituted hydrocarbon radical
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D235/00—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings
- C07D235/02—Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, condensed with other rings condensed with carbocyclic rings or ring systems
- C07D235/04—Benzimidazoles; Hydrogenated benzimidazoles
- C07D235/24—Benzimidazoles; Hydrogenated benzimidazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
- C07D235/28—Sulfur atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
- C07D249/02—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms not condensed with other rings
- C07D249/08—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles
- C07D249/10—1,2,4-Triazoles; Hydrogenated 1,2,4-triazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D249/12—Oxygen or sulfur atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/34—Fog-inhibitors; Stabilisers; Agents inhibiting latent image regression
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Plural Heterocyclic Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB865368A GB1239017A (de) | 1968-02-22 | 1968-02-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
BE728728A true BE728728A (de) | 1969-08-21 |
Family
ID=9856631
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE728728D BE728728A (de) | 1968-02-22 | 1969-02-21 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS4751896B1 (de) |
BE (1) | BE728728A (de) |
DE (1) | DE1906952C2 (de) |
FR (1) | FR2002373A1 (de) |
GB (1) | GB1239017A (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3216843C2 (de) * | 1982-05-05 | 1986-10-23 | Ludwig Heumann & Co GmbH, 8500 Nürnberg | 3-Thiomethyl-pyridin-Derivate, Verfahren zu ihrer Herstellung und diese Verbindungen enthaltende Arzneimittel |
EP0218753B1 (de) * | 1985-10-10 | 1989-08-09 | Agfa-Gevaert N.V. | Bildempfangselement für das Silbersalzdiffusions-übertragungsumkehrverfahren |
JPH0833642B2 (ja) * | 1986-10-24 | 1996-03-29 | 富士写真フイルム株式会社 | ハロゲン化銀写真感光材料の現像処理方法 |
DE69327217T2 (de) * | 1992-10-01 | 2000-05-18 | Sterling Diagnostic Imaging, Inc. | Silberhalogenidemulsionen stabilisiert mit verbesserten Antischleiermitteln |
KR101540145B1 (ko) * | 2012-02-15 | 2015-07-28 | 삼성전기주식회사 | 알킬 설폰화된 테트라졸 화합물, 이의 제조방법, 이를 함유하는 에폭시 수지, 및 이로부터 제조된 기판 |
KR101747259B1 (ko) * | 2012-12-28 | 2017-06-14 | 삼성전기주식회사 | 알킬 설폰화된 테트라졸 화합물로 표면 개질된 실리카, 이의 제조방법 및 이를 함유하는 수지조성물 |
KR101956273B1 (ko) * | 2013-08-13 | 2019-03-08 | 삼성전기주식회사 | 수지 조성물, 이를 이용한 인쇄회로기판 및 그 제조방법 |
KR101956281B1 (ko) * | 2013-08-13 | 2019-03-08 | 삼성전기주식회사 | 수지 조성물, 이를 이용한 인쇄회로기판 및 그 제조방법 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE498286A (de) * | 1949-09-24 | |||
BE498287A (de) * | 1949-09-24 | |||
DE1177481B (de) * | 1963-05-18 | 1964-09-03 | Agfa Ag | Lichtempfindliches photographisches Material mit mindestens einer sensibilisierten Halogensilberemulsionsschicht |
DE1213240B (de) * | 1964-02-13 | 1966-03-24 | Agfa Gevaert Ag | Lichtempfindliches photographisches Material mit mindestens einer Azofarbstoff enthaltenden optisch sensibilisierten Halogensilber-Emulsions-schicht fuer das Silberfarbbleichverfahren |
-
1968
- 1968-02-22 GB GB865368A patent/GB1239017A/en not_active Expired
-
1969
- 1969-02-07 FR FR6902993A patent/FR2002373A1/fr not_active Withdrawn
- 1969-02-12 DE DE19691906952 patent/DE1906952C2/de not_active Expired
- 1969-02-20 JP JP1315169A patent/JPS4751896B1/ja active Pending
- 1969-02-21 BE BE728728D patent/BE728728A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
DE1906952C2 (de) | 1983-04-07 |
DE1906952A1 (de) | 1969-09-25 |
GB1239017A (de) | 1971-07-14 |
JPS4751896B1 (de) | 1972-12-27 |
FR2002373A1 (de) | 1969-10-17 |