BE623613A - - Google Patents
Info
- Publication number
- BE623613A BE623613A BE623613DA BE623613A BE 623613 A BE623613 A BE 623613A BE 623613D A BE623613D A BE 623613DA BE 623613 A BE623613 A BE 623613A
- Authority
- BE
- Belgium
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/108—Polyolefin or halogen containing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US145447A US3241973A (en) | 1961-10-16 | 1961-10-16 | Photopolymerizable element and process for preparing same |
Publications (1)
Publication Number | Publication Date |
---|---|
BE623613A true BE623613A (zh) |
Family
ID=22513159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BE623613D BE623613A (zh) | 1961-10-16 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3241973A (zh) |
BE (1) | BE623613A (zh) |
DE (1) | DE1447028B2 (zh) |
GB (1) | GB973955A (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL295625A (zh) * | 1962-07-26 | |||
NL129237C (zh) * | 1965-03-11 | |||
US3663222A (en) * | 1968-06-06 | 1972-05-16 | Asahi Chemical Ind | Process for preparing steric block with liquid photopolymerizable composition |
US4323636A (en) * | 1971-04-01 | 1982-04-06 | E. I. Du Pont De Nemours And Company | Photosensitive block copolymer composition and elements |
CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
US3918393A (en) * | 1971-09-10 | 1975-11-11 | Ppg Industries Inc | Method of producing flat (non-glossy) films |
BE789951A (fr) * | 1971-10-14 | 1973-04-11 | Hoechst Co American | Procede pour produire des images au moyen d'une couche photosensible |
JPS5837532B2 (ja) * | 1973-04-02 | 1983-08-17 | 帝人株式会社 | カンコウセイジユシヨウシジバン |
DE2415728A1 (de) * | 1973-04-13 | 1975-01-02 | Teijin Ltd | Traegerfuer fluessiges lichtempfindliches hharz |
US4124395A (en) * | 1973-08-10 | 1978-11-07 | Fuji Photo Film Co., Ltd. | Subbing layer on polyester film for light-sensitive material |
US4356251A (en) * | 1975-06-03 | 1982-10-26 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive element with solvent-soluble layer |
US4316951A (en) * | 1975-06-03 | 1982-02-23 | E. I. Du Pont De Nemours And Company | Multilayer photosensitive element with solvent-soluble layer |
US4053313A (en) * | 1975-06-03 | 1977-10-11 | E. I. Du Pont De Nemours And Company | Process for image reproduction using multilayer photosensitive solvent processable elements |
US4376158A (en) * | 1977-05-09 | 1983-03-08 | Keuffel & Esser Company | Color-proofing method |
EP0002321B1 (en) | 1977-11-29 | 1981-10-28 | Bexford Limited | Photopolymerisable elements and a process for the production of printing plates therefrom |
CA1123649A (en) * | 1978-06-22 | 1982-05-18 | Norman E. Hughes | Printing plates produced using a base layer with polymerization rate greater than that of the printing layer |
US4250242A (en) * | 1978-10-31 | 1981-02-10 | American Hoechst Corporation | Uniform exposure of positive-acting diazo type materials through support |
US4423135A (en) * | 1981-01-28 | 1983-12-27 | E. I. Du Pont De Nemours & Co. | Preparation of photosensitive block copolymer elements |
US4582777A (en) * | 1983-05-18 | 1986-04-15 | W. R. Grace & Co. | Compressible printing plate |
US5213949A (en) * | 1986-11-12 | 1993-05-25 | Asahi Kasei Kogyo Kabushiki Kaisha | Method for selectively curing a liquid photosensitive resin by masking exposure |
DE3704694A1 (de) * | 1987-02-14 | 1988-08-25 | Basf Ag | Verfahren zum beschichten von formzylindern oder formzylinder-huelsen mit einer druchgehenden lichtempfindlichen aufzeichnungsschicht |
US5342731A (en) * | 1990-11-21 | 1994-08-30 | Polaroid Corporation | Laminar thermal imaging medium actuatable in response to intense image-forming radiation utilizing polymeric hardenable adhesive layer that reduces tendency for delamination |
US5229247A (en) * | 1991-11-27 | 1993-07-20 | Polaroid Corporation | Method of preparing a laminar thermal imaging medium capable of converting brief and intense radiation into heat |
US5275914A (en) * | 1992-07-31 | 1994-01-04 | Polaroid Corporation | Laminar thermal imaging medium comprising an image-forming layer and two adhesive layers |
US5552259A (en) * | 1993-09-23 | 1996-09-03 | Polaroid Corporation | Adhesive composition, and imaging medium comprising this adhesive composition |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB864041A (en) * | 1944-01-20 | 1961-03-29 | Du Pont | Improvements relating to photopolymerisable elements and their production |
GB574244A (en) * | 1958-07-25 | 1945-12-28 | Sparklets Ltd | Improvements in or relating to means for producing a spray of atomised liquid |
NL87862C (zh) * | 1951-08-20 | |||
US2964401A (en) * | 1957-02-18 | 1960-12-13 | Du Pont | Photopolymerizable elements and processes |
GB841454A (en) * | 1957-09-16 | 1960-07-13 | Du Pont | Improvements in or relating to photopolymerisable elements |
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0
- BE BE623613D patent/BE623613A/xx unknown
-
1961
- 1961-10-16 US US145447A patent/US3241973A/en not_active Expired - Lifetime
-
1962
- 1962-10-05 GB GB37842/62A patent/GB973955A/en not_active Expired
- 1962-10-16 DE DE19621447028 patent/DE1447028B2/de active Pending
Also Published As
Publication number | Publication date |
---|---|
DE1447028B2 (de) | 1972-03-16 |
GB973955A (en) | 1964-11-04 |
US3241973A (en) | 1966-03-22 |
DE1447028A1 (de) | 1970-08-13 |