AU7829800A - Optimal phase conflict removal for layout of alternating phase-shifting masks - Google Patents

Optimal phase conflict removal for layout of alternating phase-shifting masks

Info

Publication number
AU7829800A
AU7829800A AU78298/00A AU7829800A AU7829800A AU 7829800 A AU7829800 A AU 7829800A AU 78298/00 A AU78298/00 A AU 78298/00A AU 7829800 A AU7829800 A AU 7829800A AU 7829800 A AU7829800 A AU 7829800A
Authority
AU
Australia
Prior art keywords
phase
layout
shifting masks
optimal
alternating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU78298/00A
Inventor
Andrew B. Kahng
Huijuan Wang
Alexander Z. Zelikovsky
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
University of California
Original Assignee
University of California
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by University of California filed Critical University of California
Publication of AU7829800A publication Critical patent/AU7829800A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
AU78298/00A 1999-09-16 2000-09-18 Optimal phase conflict removal for layout of alternating phase-shifting masks Abandoned AU7829800A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US15426499P 1999-09-16 1999-09-16
US60154264 1999-09-16
PCT/US2000/025572 WO2001020502A1 (en) 1999-09-16 2000-09-18 Optimal phase conflict removal for layout of alternating phase-shifting masks

Publications (1)

Publication Number Publication Date
AU7829800A true AU7829800A (en) 2001-04-17

Family

ID=22550663

Family Applications (1)

Application Number Title Priority Date Filing Date
AU78298/00A Abandoned AU7829800A (en) 1999-09-16 2000-09-18 Optimal phase conflict removal for layout of alternating phase-shifting masks

Country Status (2)

Country Link
AU (1) AU7829800A (en)
WO (1) WO2001020502A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6832364B2 (en) 2002-10-03 2004-12-14 International Business Machines Corporation Integrated lithographic layout optimization
US6901576B2 (en) 2002-11-20 2005-05-31 International Business Machines Corporation Phase-width balanced alternating phase shift mask design

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5573890A (en) * 1994-07-18 1996-11-12 Advanced Micro Devices, Inc. Method of optical lithography using phase shift masking
US5537648A (en) * 1994-08-15 1996-07-16 International Business Machines Corporation Geometric autogeneration of "hard" phase-shift designs for VLSI
US5670281A (en) * 1996-06-17 1997-09-23 Industrial Technology Research Institute Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks
US5923562A (en) * 1996-10-18 1999-07-13 International Business Machines Corporation Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs
US5883813A (en) * 1997-03-04 1999-03-16 International Business Machines Corporation Automatic generation of phase shift masks using net coloring

Also Published As

Publication number Publication date
WO2001020502A1 (en) 2001-03-22
WO2001020502A9 (en) 2001-10-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase