AU7829800A - Optimal phase conflict removal for layout of alternating phase-shifting masks - Google Patents
Optimal phase conflict removal for layout of alternating phase-shifting masksInfo
- Publication number
- AU7829800A AU7829800A AU78298/00A AU7829800A AU7829800A AU 7829800 A AU7829800 A AU 7829800A AU 78298/00 A AU78298/00 A AU 78298/00A AU 7829800 A AU7829800 A AU 7829800A AU 7829800 A AU7829800 A AU 7829800A
- Authority
- AU
- Australia
- Prior art keywords
- phase
- layout
- shifting masks
- optimal
- alternating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US15426499P | 1999-09-16 | 1999-09-16 | |
US60154264 | 1999-09-16 | ||
PCT/US2000/025572 WO2001020502A1 (en) | 1999-09-16 | 2000-09-18 | Optimal phase conflict removal for layout of alternating phase-shifting masks |
Publications (1)
Publication Number | Publication Date |
---|---|
AU7829800A true AU7829800A (en) | 2001-04-17 |
Family
ID=22550663
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU78298/00A Abandoned AU7829800A (en) | 1999-09-16 | 2000-09-18 | Optimal phase conflict removal for layout of alternating phase-shifting masks |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU7829800A (en) |
WO (1) | WO2001020502A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6832364B2 (en) | 2002-10-03 | 2004-12-14 | International Business Machines Corporation | Integrated lithographic layout optimization |
US6901576B2 (en) | 2002-11-20 | 2005-05-31 | International Business Machines Corporation | Phase-width balanced alternating phase shift mask design |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5573890A (en) * | 1994-07-18 | 1996-11-12 | Advanced Micro Devices, Inc. | Method of optical lithography using phase shift masking |
US5537648A (en) * | 1994-08-15 | 1996-07-16 | International Business Machines Corporation | Geometric autogeneration of "hard" phase-shift designs for VLSI |
US5670281A (en) * | 1996-06-17 | 1997-09-23 | Industrial Technology Research Institute | Masks and methods of forming masks which avoid phase conflict problems in phase shifting masks |
US5923562A (en) * | 1996-10-18 | 1999-07-13 | International Business Machines Corporation | Method for automatically eliminating three way intersection design conflicts in phase edge, phase shift designs |
US5883813A (en) * | 1997-03-04 | 1999-03-16 | International Business Machines Corporation | Automatic generation of phase shift masks using net coloring |
-
2000
- 2000-09-18 WO PCT/US2000/025572 patent/WO2001020502A1/en active Application Filing
- 2000-09-18 AU AU78298/00A patent/AU7829800A/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
WO2001020502A1 (en) | 2001-03-22 |
WO2001020502A9 (en) | 2001-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |