AU2001270100A1 - Transmission and phase balance for phase-shifting mask - Google Patents

Transmission and phase balance for phase-shifting mask

Info

Publication number
AU2001270100A1
AU2001270100A1 AU2001270100A AU7010001A AU2001270100A1 AU 2001270100 A1 AU2001270100 A1 AU 2001270100A1 AU 2001270100 A AU2001270100 A AU 2001270100A AU 7010001 A AU7010001 A AU 7010001A AU 2001270100 A1 AU2001270100 A1 AU 2001270100A1
Authority
AU
Australia
Prior art keywords
phase
transmission
shifting mask
balance
phase balance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001270100A
Inventor
Qi-De Qian
Tsai Wilman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Intel Corp
Original Assignee
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corp filed Critical Intel Corp
Publication of AU2001270100A1 publication Critical patent/AU2001270100A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AU2001270100A 2000-06-30 2001-06-21 Transmission and phase balance for phase-shifting mask Abandoned AU2001270100A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/607,446 2000-06-30
US09/607,446 US6458495B1 (en) 2000-06-30 2000-06-30 Transmission and phase balance for phase-shifting mask
PCT/US2001/020050 WO2002003138A2 (en) 2000-06-30 2001-06-21 Transmission and phase balance for phase-shifting mask

Publications (1)

Publication Number Publication Date
AU2001270100A1 true AU2001270100A1 (en) 2002-01-14

Family

ID=24432314

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001270100A Abandoned AU2001270100A1 (en) 2000-06-30 2001-06-21 Transmission and phase balance for phase-shifting mask

Country Status (5)

Country Link
US (1) US6458495B1 (en)
EP (1) EP1295176A2 (en)
AU (1) AU2001270100A1 (en)
TW (1) TW535211B (en)
WO (1) WO2002003138A2 (en)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6512385B1 (en) 1999-07-26 2003-01-28 Paul Pfaff Method for testing a device under test including the interference of two beams
TW512424B (en) 2000-05-01 2002-12-01 Asml Masktools Bv Hybrid phase-shift mask
US6627359B2 (en) * 2000-05-17 2003-09-30 Dai Nippon Printing Co., Ltd. Phase-shift photomask manufacturing method and phase-shift photomask
JP2002251793A (en) * 2001-02-21 2002-09-06 Sony Corp Manufacturing method for master disk of optical recording medium
US6548417B2 (en) * 2001-09-19 2003-04-15 Intel Corporation In-situ balancing for phase-shifting mask
US9952161B2 (en) 2001-12-06 2018-04-24 Attofemto, Inc. Methods for obtaining and analyzing digital interferometric data for computer testing and developing semiconductor and anisotropic devices and materials
US8462350B2 (en) 2001-12-06 2013-06-11 Attofemto, Inc. Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and manufacture
US7733499B2 (en) 2001-12-06 2010-06-08 Attofemto, Inc. Method for optically testing semiconductor devices
US7293249B2 (en) * 2002-01-31 2007-11-06 Juan Andres Torres Robles Contrast based resolution enhancement for photolithographic processing
TWI274969B (en) 2002-09-11 2007-03-01 Asml Masktools Bv Method and computer program product of generating masks and mask generated thereby, device manufacturing method and device manufactured thereby, and method of printing pattern
US20040086787A1 (en) * 2002-11-05 2004-05-06 Waheed Nabila Lehachi Alternating aperture phase shift photomask having plasma etched isotropic quartz features
KR100508093B1 (en) * 2003-06-05 2005-08-17 삼성전자주식회사 Phase shift mask and method of fabricating the same
DE10327613B4 (en) * 2003-06-18 2007-10-31 Infineon Technologies Ag Method for forming an opening on an alternating phase mask
EP1494071A3 (en) * 2003-06-30 2008-04-09 ASML MaskTools B.V. Improved scattering bar OPC application method for sub-half wavelength lithography patterning
US20050019673A1 (en) * 2003-07-22 2005-01-27 Kunal Taravade Attenuated film with etched quartz phase shift mask
US7029803B2 (en) * 2003-09-05 2006-04-18 Schott Ag Attenuating phase shift mask blank and photomask
US7014962B2 (en) * 2003-09-13 2006-03-21 Chartered Semiconductor Manufacturing, Ltd Half tone alternating phase shift masks
TWI259935B (en) * 2004-01-08 2006-08-11 Samsung Electronics Co Ltd Method of adjusting deviation of critical dimension of patterns
JP4254603B2 (en) * 2004-04-23 2009-04-15 凸版印刷株式会社 Levenson type phase shift mask and manufacturing method thereof
US20060105520A1 (en) * 2004-11-18 2006-05-18 Tan Sia K Structure and method to fabricate a protective sidewall liner for an optical mask
KR100926389B1 (en) * 2004-12-15 2009-11-11 도판 인사츠 가부시키가이샤 Phase shift mask, phase shift mask manufacturing method, and semiconductor element manufacturing method
US7674562B2 (en) * 2005-12-07 2010-03-09 Chartered Semiconductor Manufacturing, Ltd. Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
US20070231712A1 (en) * 2006-03-30 2007-10-04 Song Pang Alternating phase shift masking
US8017029B2 (en) 2006-10-30 2011-09-13 Applied Materials, Inc. Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
US7967930B2 (en) * 2006-10-30 2011-06-28 Applied Materials, Inc. Plasma reactor for processing a workpiece and having a tunable cathode
US8002946B2 (en) * 2006-10-30 2011-08-23 Applied Materials, Inc. Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
US9218944B2 (en) 2006-10-30 2015-12-22 Applied Materials, Inc. Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
US7976671B2 (en) 2006-10-30 2011-07-12 Applied Materials, Inc. Mask etch plasma reactor with variable process gas distribution
US8012366B2 (en) * 2006-10-30 2011-09-06 Applied Materials, Inc. Process for etching a transparent workpiece including backside endpoint detection steps
US20080099450A1 (en) * 2006-10-30 2008-05-01 Applied Materials, Inc. Mask etch plasma reactor with backside optical sensors and multiple frequency control of etch distribution
US7763511B2 (en) * 2006-12-29 2010-07-27 Intel Corporation Dielectric barrier for nanocrystals
JP2009092789A (en) * 2007-10-05 2009-04-30 Elpida Memory Inc Method of manufacturing phase shift photomask, phase shift photomask, method of manufacturing semiconductor device, and semiconductor device
US8389183B2 (en) * 2010-02-09 2013-03-05 International Business Machines Corporation Chromeless phase-shifting photomask with undercut rim-shifting element
US9341939B1 (en) 2014-10-30 2016-05-17 Seagate Technology Llc Transmission balancing for phase shift mask with a trim mask
CN108091560B (en) * 2017-12-07 2020-04-10 上海华力微电子有限公司 Method for optimizing shallow slot isolation etching morphology under different light transmittances
US10859903B1 (en) 2017-12-15 2020-12-08 Seagate Technology Llc Alternating phase shift mask

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06180497A (en) * 1992-12-14 1994-06-28 Toppan Printing Co Ltd Production of phase shift mask
US5718829A (en) * 1995-09-01 1998-02-17 Micron Technology, Inc. Phase shift structure and method of fabrication
US5932377A (en) * 1998-02-24 1999-08-03 International Business Machines Corporation Exact transmission balanced alternating phase-shifting mask for photolithography

Also Published As

Publication number Publication date
US6458495B1 (en) 2002-10-01
WO2002003138A3 (en) 2002-08-15
WO2002003138A2 (en) 2002-01-10
TW535211B (en) 2003-06-01
EP1295176A2 (en) 2003-03-26

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