AU642827B2 - Cleaning compositions - Google Patents
Cleaning compositions Download PDFInfo
- Publication number
- AU642827B2 AU642827B2 AU19657/92A AU1965792A AU642827B2 AU 642827 B2 AU642827 B2 AU 642827B2 AU 19657/92 A AU19657/92 A AU 19657/92A AU 1965792 A AU1965792 A AU 1965792A AU 642827 B2 AU642827 B2 AU 642827B2
- Authority
- AU
- Australia
- Prior art keywords
- cleaning
- composition
- ethanol
- propanol
- blend
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5004—Organic solvents
- C11D7/5022—Organic solvents containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/43—Solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/032—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing oxygen-containing compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Emergency Medicine (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Detergent Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Feed For Specific Animals (AREA)
- Heat-Pump Type And Storage Water Heaters (AREA)
- Surgical Instruments (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Fodder In General (AREA)
- Devices For Conveying Motion By Means Of Endless Flexible Members (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Photoreceptors In Electrophotography (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
Abstract
This invention relates to a composition for cleaning contaminated electronic substrates. The compossition comprises a blend of 2-30% w/w of ethoxyethoxy ethanol and at least one other glycol ether derivative selected from butoxyethoxy ethanol, methoxypropoxy propanol, ethoxypropoxy propanol and C1-C5 monocarboxylic acid esters thereof. These esters are more environmentally safe and more user friendly than halohydrocarbons used hitherto for cleaning fluxes and solders from circuit boards.
Description
1 -1- P/00/011 Regulation 3.2 62i 2
AUSTRALIA
Patents Act 1990
ORIGINAL
COMPLETE SPECIFICATION STANDARD PATENT Invention Title: CLEANING COMPOSITIONS ~srt reiu c, onrs r~ ac so aonaar a The following statement is a full description of this invention, including the best method of performing it known to us: GH&CO REF: P11535-EX:PJW:RK Case 7851(2) CLEANING COMPOSITIONS The present invention relates to cleaning compositions comprising blends of solvents suitable for cleaning electronic components.
It is well known to use various solvents and solvent blends as a cleaning agent for the removal of oil and other contaminants from substrates such as drill cuttings, beaches and clothing. Most of these solvents cannot be used for the removal of inorganic/organic fluxes or other contaminants encountered on electronic circuit boards and printed circuit boards. Removal of flux from such circuit boards is not orly necessary for cosmetic reasons but also to prevent corrosion by such fluxes on the boards and prevent automatic testing of such boards. Hitherto the solvents primarily used for cleaning of electronic boards and components have been halogenated hydrocarbons such as the chlorofluorocarbons, the so called CFC's. Due to increasing restrictions on the production of CFC's, there has been a need to develop alternative cleaners which are environmentally more acceptable. Moreover, the presence of chlorine in these solvents have made them less acceptable, especially with a view to protecting the environment. The same is true of the use of such halogenated solvents for general degreasing and cleaning of metal, polymer, ceramic or glass substrates.
Several alternatives to CFC cleaners are already known. These are based on isopropyl alcohol or limonene which have been used in aqueous or semi-aqueous systems. Such systems have the disadvantage that they give rise to large volumes of effluent water. Isopropanol -1A- -2 (hereafter "IPA") based cleaners also have to contend with the flammability of the solvent. Limonene based cleaners have a low flash point It has now be-i found that a selective blend of glycol ethers is particularly suitable for removing fluxes and ionic contaminants from electronic substrates and mitigates the problems of excessive effluent water, high flammability and low flash point.
Accordingly, the present invention is a cleaning composition for cleaning contaminated electronic substrates said composition comprising a blend of 2-30% w/w of ethoxyethoxy ethanol with at least one other glycol ether derivative selected from butoxyethoxy ethanol, methoxypropoxy propanol, ethoxypropoxy propanol and C 1
-C
4 monocarboxylic acid esters thereof.
By the expression "contaminated electronic substrates" is meant here and throughout the specification that the substrate is a circuit board such as an electronic circuit board or a printed circuit board; electronic components whether based on glass, ceramics, metal, polymer or wood; semi-conductor devices; fibre optic cables; precision engineering components and the like contaminated with fluxes and/or ionic contaminants whether or not such boards have surface mounted technology (hereafter "SMT") components thereon. These circuit boards will hereafter be referred to as "CB" for convenience. Similarly ethoxyethoxy ethanol, butoxy ethoxy ethanol, methoxypropoxy propanol, and ethoxypropoxy propanol will hereafter be referred to as "EDGE", "BDGE", "MDP" and "EDP" respectively for convenience.
The cleaning composition of the present invention suitably comprises at least three glycol ethers, i.e. EDGE, EDGE and MDP and/or EDP. In such a composition, which has three glycol ethers, the amounts of each of the glycol ethers is suitably 10-20% EDGE, 70-90% w/w EDGE and 2-10% MDP or EDP. A more specific example of the cleanj- composition is a blend of 15% EDGE, 80% EDGE and MDP or EDP.
Where the monocarboxylic acid esters are used, these are suitably selected from the acetate and propionate esters, most 2 ^C I- 3 preferably the acetate esters.
The cleaning compositions of the present invention have a flash point of above In use, the contaminated CB can be bought into contact with the composition for a few seconds by immersing the contaminated CB in a bath of the cleaning composition or by applying the composition on the contaminated CB by spraying or brush coating.
After application of the cleaning composition on to the electronic substrate, the cleaning composition on the contaminated CB may be agitated by, eg ultrasonic energy, by stirring or by brushing.
°o 0 The cleaning composition is suitably applied on the substrate to be cleaned at ambient temperature but it would also be possible to gently warm the substrate being cleaned to a temperature up to oo 0 15 ,o After this operation, the cleaning composition can be removed from the treated substrate by rinsing with an appropriate fluid one or more times. The fluids that may be used to perform the rinsing 0oo° operation are suitably the same blends that have been used as the 00 0 20 cleaning composition. However, it would also be possible to rinse the cleaned substrate with water, an aqueous solution of a surfactant, isopropyl alcohol or a small amount of a HCFC, HFC or 0000 perfluoralkane.
After rinsing, the cleaned substrate is thoroughly dried before S0 25 use. The present invention is further illustrated with reference to 0 0 "the following Examples and Comparative Tests: SExamples and Comparative Tests General Procedure Tests were undertaken in which copper foil rectangles (area per side 12.5 cm 2 were cleaned with dichloromethane and commercial solder applied (ERSIN (Registered Trade Mark) Multicore 60/40 5 core tin-lead solder with 362 flux applied by means of a hand held soldering iron, set to 250°C, ex Multicore Solders Ltd). The copper foils were then cleaned by immersing in blends of these solvents at 35°C for 1 minute. The treated foils were rinsed in fresh solvent, -3 c I 4 having the same composition as the cleaner and dried by means of blowing hot air across them. For comparison, similar soldered copper foil samples were cleaned by immersing in boiling trichlorotrifluorethane (CFC113)/methanol mixtures (composition 94/6 w/w) as detailed below.
The samples were examined for visual cleanliness and the amount of ionic contamination assessed by immersing in a 50/50 v/v mixture of isopropyl alcohol (IPA) deionised water for 15 minutes and monitoring the rise in conductivity. (The isopropanol/water mixture was purged with nitrogen before and during this test to eliminate conductivity rises due to carbon dioxide in the air absorbing into the mixture). As is conventionally done in the electronics industry, the rise in the conductivity of the IPA/water mixture was used to assess the equivalent amount of sodium chloride which, had 15 this been leached from the surface of the substrate, would have given the same rise in conductivity of the IPA/water solution.
Results: Comparative Tests Cleaning composition (CFC113 94% by wt, methanol 6% wt) Cleaning method: The copper foils were suspended in the vapour above the refluxing CFC/methanol mix for 5 seconds, immersed in boiling liquid for 1 minute, then suspended in vapour again for
U
seconds then finally allowed to dry in air.
Visual appearance: Clean with no stains or residue.
Residual ionic contamination: 0.25 micro g of NaC1 equivalent /cm 2 Examples (Blends according to the Invention) Blend 1: BDGE 80%, EDP EDGE 15% by weight.
Cleaning method: Test foils were gently stirred in 100 g of cleaner at 35°C for 1 minute, rinsed in a fresh, similar solution for 5 seconds and blown dry with hot air.
Cleanliness: Visual: Clean, with no stains or residue.
Residual ionic contamination: 0.20 micro g of NaC1 equivalent /cm 2 -4i.il-~-ili_ -~X 5 Blend 2: Cleaning formulation 95% EDP, 5% EDGE by weight.
Blend 3: Cleaning formulation 85% BDGE, 15% EDGE by weight.
Blend 4: Cleaning composition 90% EDP, 5% BDGE, 5% EDGE by weight.
(Same method as for Blend 1) These systems gave the following: Blend 2: Visually clean, no stains or residue, 0.24 micro g NaCl/cm 2 equivalent.
Blend 3: Visual assessment: Very slight stains remain, 0.18 micro g/cm 2 NaC1 equivalent.
Blend 4: Visually clean, no stains or residue, 0.23 micro g/cm' NaC1 equivalent.
Comparative Tests By comparison, similar tests with the individual solvents when used alone gave the following results: BDGE alone: Slight stains remain, 0.22 micro g/cm 2 equivalent.
EDP alone: Slight residue, 0.27 micro g/cm 2 NaCl equivalent.
EDGE alone: Slight residue remains, 0.14 micro g/cm 2 NaC1 equivalent.
These Comparative Tests show that blends of EDGE/BDGE/EDP are more effective than the individual glycol ethers when used alone.
Examnles with Ponulated Boards 2 os a FD o ooi c o oi n ~1Jco nroo
O
Di J o~a oc
D
o a o rJ e ooo oa a a~oa a ooeo oa o~ 15 20 Electronic circuit boards, 225 cm 2 onto which had been fixed through hole components on one side of the t and various surface mount technology (SMT) compon'. :s on er side of the board, were cleaned by immersing for 1 minute in a blend of butoxyethanol (90% by weight) and EDGE (10% by weight), rinsed in the same solvent blend, blown dry, and then placed in Alpha Metals model 500M ionograph, filled with 75/25 isopropanol/water mixture until no more ionic contamination leached from these boards. These cleaned boards, having thus been cleaned to similar conditions, were then coated with solder fluxes as follows: 2 g of Multicore type 362 or 366 flux (ex Multicore Solders Ltd) were dissolved in 3 g of isopropanol (IPA) and were spread evenly onto one side of the populated boards (the side covered with I i 6 surface mount technology components). The side of the board which was covered with flux was then briefly touched onto the surface of a bath of molten 60/40 tin/lead solder (ex Multicore Solders Ltd) heated to 250*C. In an alternative method of applying flux to these test substrates, Multicore type RM92 solder paste was applied sparingly to component legs on the SMT side of the board.
This was heated with a soldering iron set to 300'C.
The boards were cleaned by the following general method: The boards were gently stirred in the solvent blend litres) at the appropriate temperature and time (see below), rinsed in 2 litres of fresh solvent for 10 seconds, and blown dry with hot air.
Comparative Tests: For comparison, boards prepared similarly were cleaned in boiling CFC113/methanol (94/6 w/w) mixtures as follows: The boards were gently stirred in boiling solvent (3.5 litres) for 1 minute rinsed in 2 litres of fresh boiling CF113/methanol mix for 30 seconds and left to dry in air.
S'The cleanliness of the boards was assessed visually, and by 20 monitoring the residual ionic contamination by means of a Alpha Metals 500M ionograph. The results were as follows: 8 362 Flux Boards cleaned in CFC113/methanol mixture Visual appearance after cleaning: Clean, no stains or residue.
Residual ionic contamination: 1.34 micro g NaCl equivalent/cm 2 366 Flux Boards cleaned in CFC113/methanol mixture SVisual appearance after cleaning: Clean, no stains or residue.
Residual ionic contamination: 1.7 micro g NaC1 equivalent/cm 2 RM92 Solder Paste Boards cleaned in CFC113/methanol mixture Visual appearance after cleaning: Clean, no stains or residue.
Residue ionic contamination: 1.92 micro g NaCl equivalent/cm 2 Examples: Blend 5: Boards cleaned in EDGE (15%)/BDGE (80%)/EDP 6 7mixtures: Boards covered with 362 flux, and cleaned at 45°C for seconds.
Visual appearance: Clean, no stains or residue.
Residual ionic contamination: 0.51 micro g NaCl equivalent/cm 2 (ii) Boards covered with 366 flux, cleaned at 45*C for seconds.
Visual appearance: Clean, no stains or residue.
Residual ionic contamination: 0.81 micro g NaCl equivalent/cm 2 (iii) Boards contaminated with RM92 paste, cleaned at 55*C for seconds.
Visual appearance: Clean, no stains or residue.
Residual ionic contamination: 0.71 micro g/cm 2 Blend 6: Boards cleaned in EDGE EDP mixtures: (iv) Boards covered with 362 flux, and cleaned at 45°C for seconds.
Visual appearance: Clean, no residues or stains.
Residual ionic contamination: 1.10 micro g NaCl equivalent/cm 2 Boards covered with 366 flux, cleaned at 45"C for seconds.
Visual appearance: Clean, no stains or residue.
Residual ionic contamination: 0.91 micro g NaC1 equivalent/cm 2 (vi) Boards contaminated with RM92 paste, cleaned at 55*C for seconds.
Visual appearance: Clean, no stains or residue.
Residue ionic contamination: 0.15 micro g/cm 2 Comparative Test Board cleaned in BDGE (100%).
Board covered with 366 flux, and cleaned at 45°C for seconds.
Visual appearance: Slight stains and residue on SMT.
7 B -8 Residual ionic contamination: 1.04 mg NaC1 equivalent/cm 2 Examples (Blends according to the Invention): Blend 6: BDGE 80%, MDP EDGE 15% by weight.
The circuit board used was a single-sided FR4 (a fire hazard standard) with surface mounted devices only. This board was initially cleaned with a 75%/25% mixture of isopropyl alcohol and water. On the cleaned board a flux of Multicore 6831/35 was applied by immersion. The soldering was carried out on this board at 250"C for 30 seconds. The fluxed and soldered board thus generated was not cleaned and had a contamination of 40.42 micro g of NaC1 equivalent/cm 2 The board was then cleaned with the aforementioned Blend 6 of solvents as previously for a 3 minute wash at 30*C under the influence of ultrasonics and then rinsed for 30 seconds using the same solvent at 22*C but without the intluence of ultrasonics.
The resultant cleaned board had a clean appearance on visual examination and had a contamination level of only 0.4 micro g of NaC1 equivalent/cm 2 These results demonstrate that the new cleansing formulations are effective cleaners for electronic substrates.
8
Claims (4)
1. A cleaning composition for cleaning contaminated electronic substrates said composition comprising a blend of 2-30% w/w of ethoxyethoxy ethanol with at least one other glycol ether derivative selected from butoxyethoxy ethanol, methoxypropoxy propanol, ethoxypropoxy propanol and C 1 -C 5 monocarboxylic acid esters thereof.
2. A cleaning composition according to Claim 1 wherein said composition comprises a blend of ethoxyethoxy ethanol and butoxy ethoxy ethanol with methoxypropoxy proparol and/or ethoxypropoxy propanol.
3. A cleaning composition according to Claim 2 wherein said composition comprises a blend of 10-20% w/w of ethoxyethoxy ethanol,
70-90% w/w of butoxyethoxy ethanol and 2-10% w/w of methoxypropoxy propanol or ethoxypropoxy propanol. 4. A cleaning composition according to Claim 1 wherein the monocarboxylic acid esters used are acetate and/or propionate esters. A cleaning composition according to any one of the preceding Claims wherein said composition hac a flash point above k 6. A process for cleaning contaminated electronic substrates said process comprisi- bringing the contaminated electronic substrate into contact with a composition as claimed in Claim i and agitating the composition by ultrasonic energy, by stirring or by brishing. 7. A process according to Claim 6 wherein any of the cleaning composition adhersnt to the cleaned substrate is removed therefrom by rinsing the cl.anad substrate one or more times with an 9 I- i ii iiL1_ ii~i ii;ii; 10 appropriate fluid capable of dissolving the cleaning compositions. 8. A process according to Claim 7 wherein the appropriate fluid is selected from water, an aqueous solution of a surfactant, isopropyl alcohol and small amounts of hydrogenated chlorofluorocarbons, hydrogenated fluorocarbons and perfluoroalkanes. 9. A cleaning composition for cleaning contaminated electronic substrates substantially as herein described with reference to any one of Blends 1-6. A process for cleaning contaminated electronic substrates substantially as herein described with 4 reference to any non-comparative Example. 0 ,11 0 0 o S. 15 Dated this 10th day of July 1992 o THE BRITISH PETROLEUM COMPANY P.L.C. u°o° By their Patent Attorney GRIFFITH HACK CO. 10 1 It i a i;i Case 7851(2) ABSTRACT CLEANING COMPOSITIONS This invention relates to a composition for cleaning contaminated electronic substrates. The compossition comprises a blend of 2-30% w/w of ethoxyethoxy ethanol and at least one other glycol ether derivative selected from butoxyethoxy ethanol, methoxypropoxy propanol, ethoxypropoxy propanol and monocarboxylic acid esters thereof. These esters are more environmentally safe and more user friendly than halohydrocarbons used hitherto for cleaning fluxes and solders from circuit boards.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB919115513A GB9115513D0 (en) | 1991-07-18 | 1991-07-18 | Cleaning compositions |
GB9115513 | 1991-07-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
AU1965792A AU1965792A (en) | 1993-01-21 |
AU642827B2 true AU642827B2 (en) | 1993-10-28 |
Family
ID=10698550
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU19657/92A Ceased AU642827B2 (en) | 1991-07-18 | 1992-07-13 | Cleaning compositions |
Country Status (20)
Country | Link |
---|---|
EP (1) | EP0523892B1 (en) |
JP (1) | JPH05194993A (en) |
KR (1) | KR930002500A (en) |
AT (1) | ATE116360T1 (en) |
AU (1) | AU642827B2 (en) |
CA (1) | CA2073733A1 (en) |
DE (1) | DE69201028T2 (en) |
DK (1) | DK0523892T3 (en) |
ES (1) | ES2066560T3 (en) |
FI (1) | FI923282A (en) |
GB (1) | GB9115513D0 (en) |
GR (1) | GR3015535T3 (en) |
HK (1) | HK89195A (en) |
HU (1) | HUT61585A (en) |
IE (1) | IE67182B1 (en) |
MX (1) | MX9204151A (en) |
NZ (1) | NZ243583A (en) |
TR (1) | TR28591A (en) |
TW (1) | TW221460B (en) |
ZA (1) | ZA925144B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5795217A (en) * | 1995-11-22 | 1998-08-18 | International Business Machines Corporation | Stressed burnisher |
US5643818A (en) * | 1996-05-02 | 1997-07-01 | International Business Machines Corporation | Removal of residues from metallic insert used in manufacture of multi-layer ceramic substrate with cavity for microelectronic chip |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3839234A (en) * | 1973-01-26 | 1974-10-01 | C Roscoe | Multi-purpose cleaning concentrate |
FR2571279B1 (en) * | 1984-10-04 | 1987-01-30 | Dow Chemical France | RINSING AGENT FOR SPRAYING AND ATOMIZING ASSEMBLIES, PARTICULARLY FOR AGRICULTURAL USE, BASED ON A GLYCOL ETHER DERIVED FROM PROPYLENE GLYCOL |
EP0330379A3 (en) * | 1988-02-26 | 1990-04-18 | The British Petroleum Company p.l.c. | Cleansing compositions |
-
1991
- 1991-07-18 GB GB919115513A patent/GB9115513D0/en active Pending
-
1992
- 1992-07-03 DE DE69201028T patent/DE69201028T2/en not_active Expired - Fee Related
- 1992-07-03 EP EP92306177A patent/EP0523892B1/en not_active Expired - Lifetime
- 1992-07-03 AT AT92306177T patent/ATE116360T1/en not_active IP Right Cessation
- 1992-07-03 DK DK92306177.4T patent/DK0523892T3/en active
- 1992-07-03 ES ES92306177T patent/ES2066560T3/en not_active Expired - Lifetime
- 1992-07-09 ZA ZA925144A patent/ZA925144B/en unknown
- 1992-07-13 CA CA002073733A patent/CA2073733A1/en not_active Abandoned
- 1992-07-13 AU AU19657/92A patent/AU642827B2/en not_active Ceased
- 1992-07-15 TW TW081105597A patent/TW221460B/zh active
- 1992-07-15 MX MX9204151A patent/MX9204151A/en not_active IP Right Cessation
- 1992-07-16 NZ NZ243583A patent/NZ243583A/en unknown
- 1992-07-16 TR TR00674/92A patent/TR28591A/en unknown
- 1992-07-17 JP JP4190481A patent/JPH05194993A/en active Pending
- 1992-07-17 FI FI923282A patent/FI923282A/en unknown
- 1992-07-17 HU HU9202357A patent/HUT61585A/en unknown
- 1992-07-17 IE IE922332A patent/IE67182B1/en not_active IP Right Cessation
- 1992-07-18 KR KR1019920012836A patent/KR930002500A/en active IP Right Grant
-
1995
- 1995-03-23 GR GR940404182T patent/GR3015535T3/en unknown
- 1995-06-08 HK HK89195A patent/HK89195A/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
GB9115513D0 (en) | 1991-09-04 |
DE69201028T2 (en) | 1995-05-11 |
IE922332A1 (en) | 1993-01-27 |
FI923282A0 (en) | 1992-07-17 |
MX9204151A (en) | 1993-01-01 |
DK0523892T3 (en) | 1995-03-06 |
CA2073733A1 (en) | 1993-01-19 |
KR930002500A (en) | 1993-02-23 |
GR3015535T3 (en) | 1995-06-30 |
DE69201028D1 (en) | 1995-02-09 |
FI923282A (en) | 1993-01-19 |
IE67182B1 (en) | 1996-03-06 |
HU9202357D0 (en) | 1992-10-28 |
TR28591A (en) | 1996-11-01 |
ES2066560T3 (en) | 1995-03-01 |
JPH05194993A (en) | 1993-08-03 |
EP0523892A1 (en) | 1993-01-20 |
ZA925144B (en) | 1994-01-10 |
EP0523892B1 (en) | 1994-12-28 |
AU1965792A (en) | 1993-01-21 |
ATE116360T1 (en) | 1995-01-15 |
HUT61585A (en) | 1993-01-28 |
TW221460B (en) | 1994-03-01 |
NZ243583A (en) | 1995-04-27 |
HK89195A (en) | 1995-06-16 |
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