AU5303499A - Method and device for producing mask - Google Patents

Method and device for producing mask

Info

Publication number
AU5303499A
AU5303499A AU53034/99A AU5303499A AU5303499A AU 5303499 A AU5303499 A AU 5303499A AU 53034/99 A AU53034/99 A AU 53034/99A AU 5303499 A AU5303499 A AU 5303499A AU 5303499 A AU5303499 A AU 5303499A
Authority
AU
Australia
Prior art keywords
producing mask
mask
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU53034/99A
Inventor
Naomasa Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU5303499A publication Critical patent/AU5303499A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
AU53034/99A 1998-10-28 1999-08-20 Method and device for producing mask Abandoned AU5303499A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP10/306626 1998-10-28
JP30662698 1998-10-28
PCT/JP1999/004500 WO2000025351A1 (en) 1998-10-28 1999-08-20 Method and device for producing mask

Publications (1)

Publication Number Publication Date
AU5303499A true AU5303499A (en) 2000-05-15

Family

ID=17959360

Family Applications (1)

Application Number Title Priority Date Filing Date
AU53034/99A Abandoned AU5303499A (en) 1998-10-28 1999-08-20 Method and device for producing mask

Country Status (3)

Country Link
AU (1) AU5303499A (en)
TW (1) TW396295B (en)
WO (1) WO2000025351A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6465201B1 (en) * 1999-05-25 2002-10-15 Millipore Corporation Method for rapidly detecting and enumerating microorganisms in mammalian cell preparations using ATP bioluminescence
JP4510328B2 (en) * 2001-06-07 2010-07-21 株式会社ルネサステクノロジ Mask manufacturing system, mask manufacturing method, and semiconductor device manufacturing method using the same
DE102006004581A1 (en) 2006-02-01 2007-08-09 Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH Light-module for e.g. interior lighting of aeroplane, has surface mountable semiconductor components emitting radiation, and optical device e.g. diffractive unit, that focuses radiation, which is blended by optical unit of one component
KR102559894B1 (en) * 2018-06-15 2023-07-27 삼성디스플레이 주식회사 Mask assembly, deposition apparatus having the same, and method for manufacturing display device using the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335217A (en) * 1992-05-29 1993-12-17 Fujitsu Ltd Manufacture of mask for x-ray exposure
JPH06133206A (en) * 1992-10-19 1994-05-13 Canon Inc Automatic focusing system for image pickup device
JP3790872B2 (en) * 1996-05-22 2006-06-28 株式会社ニコン Charged particle beam transfer mask
JPH11288077A (en) * 1998-04-02 1999-10-19 Dainippon Printing Co Ltd Manufacture of photomask

Also Published As

Publication number Publication date
WO2000025351A1 (en) 2000-05-04
TW396295B (en) 2000-07-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase