AU2940600A - Exposure method and apparatus - Google Patents

Exposure method and apparatus

Info

Publication number: AU2940600A
Authority: AU; Australia
Prior art keywords: exposure method; exposure
Prior art date: 1999-03-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU29406/00A

Inventor

Kenichi Shiraishi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-03-24

Filing date

2000-03-10

Publication date

2000-10-09

2000-03-10 Application filed by Nikon Corp filed Critical Nikon Corp

2000-10-09 Publication of AU2940600A publication Critical patent/AU2940600A/en

Status Abandoned legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU29406/00A 1999-03-24 2000-03-10 Exposure method and apparatus Abandoned AU2940600A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP7882099		1999-03-24
JP11/78820		1999-03-24
PCT/JP2000/001449 WO2000057459A1 (en)	1999-03-24	2000-03-10	Exposure method and apparatus

Publications (1)

Publication Number	Publication Date
AU2940600A true AU2940600A (en)	2000-10-09

Family

ID=13672481

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU29406/00A Abandoned AU2940600A (en)	1999-03-24	2000-03-10	Exposure method and apparatus

Country Status (2)

Country	Link
AU (1)	AU2940600A (en)
WO (1)	WO2000057459A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US6784976B2 (en) *	2002-04-23	2004-08-31	Asml Holding N.V.	System and method for improving line width control in a lithography device using an illumination system having pre-numerical aperture control
US7636149B2 (en)	2003-05-09	2009-12-22	Nikon Corporation	Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same
WO2005015314A2 (en)	2003-07-30	2005-02-17	Carl Zeiss Smt Ag	An illumination system for microlithography
US7391499B2 (en) *	2004-12-02	2008-06-24	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP5157945B2 (en) *	2009-02-09	2013-03-06	ウシオ電機株式会社	Light irradiation device
KR101437210B1 (en) *	2010-02-24	2014-11-03	엔에스케이 테쿠노로지 가부시키가이샤	Optical projection device for exposure apparatus, exposure apparatus, method for exposure, method for fabricating substrate, mask, and exposed substrate
JP6544972B2 (en) *	2015-04-08	2019-07-17	キヤノン株式会社	Illumination optical apparatus and device manufacturing method
JP6588766B2 (en) *	2015-08-10	2019-10-09	キヤノン株式会社	Evaluation method, exposure method, exposure apparatus, program, and article manufacturing method
JP6761306B2 (en) *	2016-08-30	2020-09-23	キヤノン株式会社	Illumination optics, lithography equipment, and article manufacturing methods
JP6740107B2 (en) *	2016-11-30	2020-08-12	Hoya株式会社	Mask blank, transfer mask, and semiconductor device manufacturing method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH01303123A (en) *	1988-06-01	1989-12-07	Toshiba Corp	Electronic endoscope device
JPH0922869A (en) *	1995-07-07	1997-01-21	Nikon Corp	Aligner
JP4310816B2 (en) *	1997-03-14	2009-08-12	株式会社ニコン	Illumination apparatus, projection exposure apparatus, device manufacturing method, and projection exposure apparatus adjustment method
JPH1154417A (en) *	1997-07-29	1999-02-26	Nikon Corp	Lighting device and projection and exposure device

2000
- 2000-03-10 AU AU29406/00A patent/AU2940600A/en not_active Abandoned
- 2000-03-10 WO PCT/JP2000/001449 patent/WO2000057459A1/en active Application Filing

Also Published As

Publication number	Publication date
WO2000057459A1 (en)	2000-09-28

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Legal Events

Date	Code	Title	Description
2002-02-28	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase