AU2003291443A1 - Compositions and processes for nanoimprinting - Google Patents
Compositions and processes for nanoimprintingInfo
- Publication number
- AU2003291443A1 AU2003291443A1 AU2003291443A AU2003291443A AU2003291443A1 AU 2003291443 A1 AU2003291443 A1 AU 2003291443A1 AU 2003291443 A AU2003291443 A AU 2003291443A AU 2003291443 A AU2003291443 A AU 2003291443A AU 2003291443 A1 AU2003291443 A1 AU 2003291443A1
- Authority
- AU
- Australia
- Prior art keywords
- nanoimprinting
- compositions
- processes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US42558702P | 2002-11-12 | 2002-11-12 | |
US60/425,587 | 2002-11-12 | ||
PCT/US2003/035796 WO2004044654A2 (en) | 2002-11-12 | 2003-11-12 | Compositions and processes for nanoimprinting |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003291443A8 AU2003291443A8 (en) | 2004-06-03 |
AU2003291443A1 true AU2003291443A1 (en) | 2004-06-03 |
Family
ID=32313021
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003291443A Abandoned AU2003291443A1 (en) | 2002-11-12 | 2003-11-12 | Compositions and processes for nanoimprinting |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN1726433B (en) |
AU (1) | AU2003291443A1 (en) |
WO (1) | WO2004044654A2 (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7641468B2 (en) | 2004-09-01 | 2010-01-05 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and method employing an effective pressure |
DE102004044111B4 (en) * | 2004-09-08 | 2015-05-07 | Seereal Technologies Gmbh | Method and device for coding and reconstructing computer-generated video holograms |
KR101169426B1 (en) | 2005-10-20 | 2012-07-27 | 에이전시 포 사이언스, 테크놀로지 앤드 리서치 | Hierarchical Nanopatterns by Nanoimprint Lithography |
CN1323025C (en) * | 2005-11-22 | 2007-06-27 | 华中科技大学 | Super hydrophobic surface possessing dual microtexture and preparation method |
KR100848559B1 (en) * | 2006-06-29 | 2008-07-25 | 엘지디스플레이 주식회사 | FABRICATING METHOD OF SOFT MOLD AND pattern forming METHOD USING THEREOF |
JP5002207B2 (en) | 2006-07-26 | 2012-08-15 | キヤノン株式会社 | Method for manufacturing structure having pattern |
WO2008070087A2 (en) * | 2006-12-05 | 2008-06-12 | Nano Terra Inc. | Method for patterning a surface |
JP4445538B2 (en) * | 2007-09-26 | 2010-04-07 | 株式会社東芝 | Pattern formation method |
US9337100B2 (en) * | 2009-06-03 | 2016-05-10 | Qualcomm Incorporated | Apparatus and method to fabricate an electronic device |
CN101923282B (en) * | 2009-06-09 | 2012-01-25 | 清华大学 | Nano-imprint resist and nano-imprint method adopting same |
CN101923279B (en) * | 2009-06-09 | 2012-03-28 | 清华大学 | Nano-imprint template and preparation method thereof |
CN101923283B (en) * | 2009-06-09 | 2012-01-25 | 清华大学 | Nano-imprint resist and nano-imprint method adopting same |
WO2012002413A1 (en) * | 2010-07-02 | 2012-01-05 | 株式会社トクヤマ | Composition for photocurable imprint, and method for formation of pattern using the composition |
US9731456B2 (en) | 2013-03-14 | 2017-08-15 | Sabic Global Technologies B.V. | Method of manufacturing a functionally graded article |
JP6029506B2 (en) | 2013-03-26 | 2016-11-24 | 富士フイルム株式会社 | Composition for forming underlayer film for imprint and pattern forming method |
SG11201510349TA (en) * | 2013-06-19 | 2016-01-28 | Ev Group E Thallner Gmbh | Embossing Material For Embossing Lithography |
CN104681641A (en) * | 2013-11-29 | 2015-06-03 | 比亚迪股份有限公司 | Etching resisting agent and preparation method thereof as well as SE (selective emitter) crystalline silicon solar cell and preparation method thereof |
CN110983404A (en) * | 2019-12-30 | 2020-04-10 | 江苏乐彩印刷材料有限公司 | Environment-friendly energy-saving CTP (computer to plate) lithographic printing material |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0762920B2 (en) * | 1986-03-17 | 1995-07-05 | 東レ株式会社 | Optical recording medium |
US5202366A (en) * | 1988-07-20 | 1993-04-13 | Union Carbide Chemicals & Plastics Technology Corporation | Crosslinkable polyester compositions with improved properties |
US6334960B1 (en) * | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
WO2002003142A2 (en) * | 2000-06-30 | 2002-01-10 | President And Fellows Of Harvard College | Electric microcontact printing method and apparatus |
-
2003
- 2003-11-12 WO PCT/US2003/035796 patent/WO2004044654A2/en not_active Application Discontinuation
- 2003-11-12 AU AU2003291443A patent/AU2003291443A1/en not_active Abandoned
- 2003-11-12 CN CN200380106100.2A patent/CN1726433B/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1726433B (en) | 2010-12-15 |
AU2003291443A8 (en) | 2004-06-03 |
WO2004044654A2 (en) | 2004-05-27 |
CN1726433A (en) | 2006-01-25 |
WO2004044654A3 (en) | 2005-06-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |