AU2003285800A1 - Polishing pad having multi-windows - Google Patents

Polishing pad having multi-windows

Info

Publication number
AU2003285800A1
AU2003285800A1 AU2003285800A AU2003285800A AU2003285800A1 AU 2003285800 A1 AU2003285800 A1 AU 2003285800A1 AU 2003285800 A AU2003285800 A AU 2003285800A AU 2003285800 A AU2003285800 A AU 2003285800A AU 2003285800 A1 AU2003285800 A1 AU 2003285800A1
Authority
AU
Australia
Prior art keywords
windows
polishing pad
polishing
pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003285800A
Inventor
Geon Kim
Jae-Seok Kim
Sung-Min Kim
Hyun-Woo Lee
Jong-Myung Lee
Ju-Yeol Lee
In-Ha Park
Eu-Gene Song
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SKC Co Ltd
Original Assignee
SKC Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SKC Co Ltd filed Critical SKC Co Ltd
Publication of AU2003285800A1 publication Critical patent/AU2003285800A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/205Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
AU2003285800A 2002-12-28 2003-12-24 Polishing pad having multi-windows Abandoned AU2003285800A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2002-0085856 2002-12-28
KR20020085856 2002-12-28
PCT/KR2003/002831 WO2004058453A1 (en) 2002-12-28 2003-12-24 Polishing pad having multi-windows

Publications (1)

Publication Number Publication Date
AU2003285800A1 true AU2003285800A1 (en) 2004-07-22

Family

ID=32677806

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003285800A Abandoned AU2003285800A1 (en) 2002-12-28 2003-12-24 Polishing pad having multi-windows

Country Status (4)

Country Link
KR (1) KR100577470B1 (en)
AU (1) AU2003285800A1 (en)
MY (1) MY137723A (en)
WO (1) WO2004058453A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8535115B2 (en) * 2011-01-28 2013-09-17 Applied Materials, Inc. Gathering spectra from multiple optical heads
US10071461B2 (en) 2014-04-03 2018-09-11 3M Innovative Properties Company Polishing pads and systems and methods of making and using the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964643A (en) * 1995-03-28 1999-10-12 Applied Materials, Inc. Apparatus and method for in-situ monitoring of chemical mechanical polishing operations
JP2000223451A (en) * 1999-02-01 2000-08-11 Nikon Corp Polishing state measuring method
JP2001009699A (en) * 1999-07-05 2001-01-16 Nichiden Mach Ltd Plane surface grinding device
KR100729229B1 (en) * 2000-09-20 2007-06-15 삼성전자주식회사 End point detector of polishing in semiconductor processing

Also Published As

Publication number Publication date
KR20040060755A (en) 2004-07-06
MY137723A (en) 2009-03-31
WO2004058453A1 (en) 2004-07-15
KR100577470B1 (en) 2006-05-10

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase