AU2003277515A1 - Extreme ultraviolet light exposure system and vacuum chamber - Google Patents

Extreme ultraviolet light exposure system and vacuum chamber

Info

Publication number
AU2003277515A1
AU2003277515A1 AU2003277515A AU2003277515A AU2003277515A1 AU 2003277515 A1 AU2003277515 A1 AU 2003277515A1 AU 2003277515 A AU2003277515 A AU 2003277515A AU 2003277515 A AU2003277515 A AU 2003277515A AU 2003277515 A1 AU2003277515 A1 AU 2003277515A1
Authority
AU
Australia
Prior art keywords
ultraviolet light
vacuum chamber
light exposure
extreme ultraviolet
exposure system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003277515A
Other languages
English (en)
Inventor
Katsuhiko Murakami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2003277515A1 publication Critical patent/AU2003277515A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003277515A 2002-10-25 2003-10-23 Extreme ultraviolet light exposure system and vacuum chamber Abandoned AU2003277515A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002311741 2002-10-25
JP2002/311741 2002-10-25
PCT/JP2003/013515 WO2004038773A1 (ja) 2002-10-25 2003-10-23 極短紫外線露光装置及び真空チャンバ

Publications (1)

Publication Number Publication Date
AU2003277515A1 true AU2003277515A1 (en) 2004-05-13

Family

ID=32171096

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003277515A Abandoned AU2003277515A1 (en) 2002-10-25 2003-10-23 Extreme ultraviolet light exposure system and vacuum chamber

Country Status (3)

Country Link
JP (1) JPWO2004038773A1 (ja)
AU (1) AU2003277515A1 (ja)
WO (1) WO2004038773A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4518078B2 (ja) * 2004-09-22 2010-08-04 株式会社ニコン 照明装置、露光装置及びマイクロデバイスの製造方法
KR101119576B1 (ko) 2004-11-17 2012-03-16 가부시키가이샤 니콘 조명 장치, 노광 장치 및 마이크로 디바이스의 제조 방법
CN101069267A (zh) * 2005-02-03 2007-11-07 株式会社尼康 光学积分器、照明光学装置、曝光装置以及曝光方法
CN109143768A (zh) * 2018-09-13 2019-01-04 杭州行开科技有限公司 一种适于激光投影的裸眼3d显示***

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3366865D1 (en) * 1983-03-23 1986-11-20 Alfer Alu Fertigbau Back square
AU1053199A (en) * 1997-11-14 1999-06-07 Nikon Corporation Exposure apparatus and method of manufacturing the same, and exposure method
AU2549899A (en) * 1998-03-02 1999-09-20 Nikon Corporation Method and apparatus for exposure, method of manufacture of exposure tool, device, and method of manufacture of device
JP2000091220A (ja) * 1998-09-08 2000-03-31 Nikon Corp 投影露光装置及び投影露光方法
JP2000100694A (ja) * 1998-09-22 2000-04-07 Nikon Corp 反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法

Also Published As

Publication number Publication date
JPWO2004038773A1 (ja) 2006-02-23
WO2004038773A1 (ja) 2004-05-06

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase