AU2002223088A1 - Chemical plasma cathode - Google Patents

Chemical plasma cathode

Info

Publication number
AU2002223088A1
AU2002223088A1 AU2002223088A AU2308802A AU2002223088A1 AU 2002223088 A1 AU2002223088 A1 AU 2002223088A1 AU 2002223088 A AU2002223088 A AU 2002223088A AU 2308802 A AU2308802 A AU 2308802A AU 2002223088 A1 AU2002223088 A1 AU 2002223088A1
Authority
AU
Australia
Prior art keywords
chemical plasma
plasma cathode
cathode
chemical
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002223088A
Inventor
Ivan Louise Berry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Axcelis Technologies Inc
Original Assignee
Axcelis Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axcelis Technologies Inc filed Critical Axcelis Technologies Inc
Publication of AU2002223088A1 publication Critical patent/AU2002223088A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/517—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using a combination of discharges covered by two or more of groups C23C16/503 - C23C16/515
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
AU2002223088A 2000-12-07 2001-11-27 Chemical plasma cathode Abandoned AU2002223088A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/732,064 US6503366B2 (en) 2000-12-07 2000-12-07 Chemical plasma cathode
US09/732,064 2000-12-07
PCT/GB2001/005219 WO2002047445A2 (en) 2000-12-07 2001-11-27 Chemical plasma cathode

Publications (1)

Publication Number Publication Date
AU2002223088A1 true AU2002223088A1 (en) 2002-06-18

Family

ID=24942043

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002223088A Abandoned AU2002223088A1 (en) 2000-12-07 2001-11-27 Chemical plasma cathode

Country Status (3)

Country Link
US (2) US6503366B2 (en)
AU (1) AU2002223088A1 (en)
WO (1) WO2002047445A2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6503366B2 (en) 2000-12-07 2003-01-07 Axcelis Technologies, Inc. Chemical plasma cathode
US20040003828A1 (en) * 2002-03-21 2004-01-08 Jackson David P. Precision surface treatments using dense fluids and a plasma
US20080190558A1 (en) * 2002-04-26 2008-08-14 Accretech Usa, Inc. Wafer processing apparatus and method
US20080011332A1 (en) * 2002-04-26 2008-01-17 Accretech Usa, Inc. Method and apparatus for cleaning a wafer substrate
US20080017316A1 (en) * 2002-04-26 2008-01-24 Accretech Usa, Inc. Clean ignition system for wafer substrate processing
US20040045578A1 (en) * 2002-05-03 2004-03-11 Jackson David P. Method and apparatus for selective treatment of a precision substrate surface
KR100464856B1 (en) * 2002-11-07 2005-01-05 삼성전자주식회사 Method for etching a surface of workpiece and a backside of silicon substrate
WO2006138727A2 (en) * 2005-06-17 2006-12-28 The Regents Of The University Of Michigan Apparatus and method of producing net-shape components from alloy sheets
WO2010068442A1 (en) * 2008-11-25 2010-06-17 The Procter & Gamble Company Improved cleaning oral care compositions
DE102009010497A1 (en) * 2008-12-19 2010-08-05 J-Fiber Gmbh Multi-nozzle tubular plasma deposition burner for the production of preforms as semi-finished products for optical fibers
US20100203287A1 (en) * 2009-02-10 2010-08-12 Ngimat Co. Hypertransparent Nanostructured Superhydrophobic and Surface Modification Coatings
US8826857B2 (en) * 2011-11-21 2014-09-09 Lam Research Corporation Plasma processing assemblies including hinge assemblies
DE102014219275A1 (en) * 2014-09-24 2016-03-24 Siemens Aktiengesellschaft Ignition of flames of an electropositive metal by plasmatization of the reaction gas

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5778131A (en) * 1980-11-04 1982-05-15 Seiko Epson Corp Manufacture of amorphous semiconductor fil,
JPS63199871A (en) * 1987-02-12 1988-08-18 Sumitomo Electric Ind Ltd Method for synthesizing high hardness boron nitride
US5330578A (en) 1991-03-12 1994-07-19 Semiconductor Energy Laboratory Co., Ltd. Plasma treatment apparatus
CA2077773A1 (en) * 1991-10-25 1993-04-26 Thomas R. Anthony Microwave, rf, or ac/dc discharge assisted flame deposition of cvd diamond
JP3276445B2 (en) * 1993-03-26 2002-04-22 三菱重工業株式会社 Plasma CVD equipment
US5888591A (en) * 1996-05-06 1999-03-30 Massachusetts Institute Of Technology Chemical vapor deposition of fluorocarbon polymer thin films
DE19716236C2 (en) 1997-04-18 2002-03-07 Deutsch Zentr Luft & Raumfahrt Plasma torch device
US6368665B1 (en) * 1998-04-29 2002-04-09 Microcoating Technologies, Inc. Apparatus and process for controlled atmosphere chemical vapor deposition
US6503366B2 (en) 2000-12-07 2003-01-07 Axcelis Technologies, Inc. Chemical plasma cathode

Also Published As

Publication number Publication date
US20030102085A1 (en) 2003-06-05
US20020069828A1 (en) 2002-06-13
US6673197B2 (en) 2004-01-06
WO2002047445A3 (en) 2002-08-15
US6503366B2 (en) 2003-01-07
WO2002047445A2 (en) 2002-06-13

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