AU2002222663A1 - Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure - Google Patents

Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure

Info

Publication number
AU2002222663A1
AU2002222663A1 AU2002222663A AU2266302A AU2002222663A1 AU 2002222663 A1 AU2002222663 A1 AU 2002222663A1 AU 2002222663 A AU2002222663 A AU 2002222663A AU 2266302 A AU2266302 A AU 2266302A AU 2002222663 A1 AU2002222663 A1 AU 2002222663A1
Authority
AU
Australia
Prior art keywords
focusing characteristics
apparatusfor
managing
usage
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002222663A
Inventor
Tetsuo Taniguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002222663A1 publication Critical patent/AU2002222663A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
    • G01M11/0264—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested by using targets or reference patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2002222663A 2000-12-18 2001-12-17 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure Abandoned AU2002222663A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000-383081 2000-12-18
JP2000-383086 2000-12-18
JP2000383086 2000-12-18
JP2000383081 2000-12-18
PCT/JP2001/011044 WO2002050506A1 (en) 2000-12-18 2001-12-17 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatus for exposure

Publications (1)

Publication Number Publication Date
AU2002222663A1 true AU2002222663A1 (en) 2002-07-01

Family

ID=26605990

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002222663A Abandoned AU2002222663A1 (en) 2000-12-18 2001-12-17 Wavefront measuring apparatus and its usage, method and apparatus for determining focusing characteristics, method and apparatus for correcting focusing characteristics, method for managing focusing characteristics, and method and apparatusfor exposure

Country Status (3)

Country Link
JP (1) JPWO2002050506A1 (en)
AU (1) AU2002222663A1 (en)
WO (1) WO2002050506A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100346150C (en) 2000-12-28 2007-10-31 株式会社尼康 Imaging characteristics measuring method, imaging characteristics adjusting method, exposure method and equipment, program and recording medium, and device producing method
TW591694B (en) * 2001-02-13 2004-06-11 Nikon Corp Specification determining method, making method and adjusting method of projection optical system, exposure apparatus and making method thereof, and computer system
JP4415674B2 (en) 2002-01-29 2010-02-17 株式会社ニコン Image forming state adjusting system, exposure method, exposure apparatus, program, and information recording medium
WO2003075328A1 (en) 2002-03-01 2003-09-12 Nikon Corporation Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method, exposure device, program, and device manufacturing method
JP4513747B2 (en) * 2003-10-31 2010-07-28 株式会社ニコン Exposure apparatus and device manufacturing method
DE102004035595B4 (en) 2004-04-09 2008-02-07 Carl Zeiss Smt Ag Method for adjusting a projection objective
US7333175B2 (en) * 2004-09-13 2008-02-19 Asml Netherlands, B.V. Method and system for aligning a first and second marker
JP4977068B2 (en) * 2008-03-18 2012-07-18 株式会社東芝 Image acquisition device and sample inspection device
JP5859263B2 (en) 2011-09-29 2016-02-10 株式会社ニューフレアテクノロジー Charged particle beam drawing apparatus and charged particle beam drawing method
JP6661371B2 (en) * 2015-12-25 2020-03-11 キヤノン株式会社 Evaluation method, exposure method, and article manufacturing method

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0599673A (en) * 1991-10-09 1993-04-23 Topcon Corp Optical measuring device
JPH0623654A (en) * 1992-04-03 1994-02-01 Murata Mach Ltd Thermal displacement correction control method for plate processing machine
JPH0764164A (en) * 1993-08-30 1995-03-10 Sony Corp Conversion lens
JP3203972B2 (en) * 1994-09-16 2001-09-04 三菱電機株式会社 Wavefront sensor
JP3551570B2 (en) * 1995-08-09 2004-08-11 株式会社ニコン Scanning exposure apparatus and exposure method
JPH10177206A (en) * 1996-12-18 1998-06-30 Kyocera Corp Camera
JPH10289865A (en) * 1997-04-11 1998-10-27 Nikon Corp Projection exposing device and method therefor
JP2000091209A (en) * 1998-09-14 2000-03-31 Nikon Corp Aligner and manufacture thereof, and device manufacturing method
JPH11251225A (en) * 1998-03-05 1999-09-17 Nikon Corp Image-forming system, aligner comprising the same, method for using the image-forming system, and manufacture of device using the aligner
JP2000047103A (en) * 1998-07-27 2000-02-18 Nikon Corp Adjusting method of projection optical system
JP3774588B2 (en) * 1999-04-06 2006-05-17 キヤノン株式会社 Method for measuring wavefront of projection exposure apparatus and projection exposure apparatus

Also Published As

Publication number Publication date
WO2002050506A1 (en) 2002-06-27
JPWO2002050506A1 (en) 2004-04-22

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