AU2002218517A1 - Cerium-based abrasive and production process thereof - Google Patents

Cerium-based abrasive and production process thereof

Info

Publication number
AU2002218517A1
AU2002218517A1 AU2002218517A AU1851702A AU2002218517A1 AU 2002218517 A1 AU2002218517 A1 AU 2002218517A1 AU 2002218517 A AU2002218517 A AU 2002218517A AU 1851702 A AU1851702 A AU 1851702A AU 2002218517 A1 AU2002218517 A1 AU 2002218517A1
Authority
AU
Australia
Prior art keywords
rare earth
cerium
mixed
production process
yield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002218517A
Inventor
Naoki Bessho
Hideo Tamamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of AU2002218517A1 publication Critical patent/AU2002218517A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/206—Compounds containing only rare earth metals as the metal element oxide or hydroxide being the only anion
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • C01F17/20—Compounds containing only rare earth metals as the metal element
    • C01F17/253—Halides
    • C01F17/265—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1409—Abrasive particles per se
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1463—Aqueous liquid suspensions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/76—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by a space-group or by other symmetry indications
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/31051—Planarisation of the insulating layers
    • H01L21/31053—Planarisation of the insulating layers involving a dielectric removal step

Abstract

A mixed light rare earth compound which has been obtained by chemically removing medium-to-heavy rare earth elements, Nd and impurities other than rare earth elements from an ore containing rare earth elements is fired at 500 to 1100° C. to yield a mixed rare earth oxide. A cerium-based rare earth oxy-fluoride is added to the mixed rare earth oxide to obtain a mixture. The mixture is subjected to wet-pulverization, drying, firing, disintegration and classification to thereby yield a cerium-containing abrasive.
AU2002218517A 2000-11-30 2001-11-30 Cerium-based abrasive and production process thereof Abandoned AU2002218517A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2000-365600 2000-11-30
JP2000365600 2000-11-30
US26984301P 2001-02-21 2001-02-21
US60/269,843 2001-02-21
PCT/JP2001/010500 WO2002044300A2 (en) 2000-11-30 2001-11-30 Cerium-based abrasive and production process thereof

Publications (1)

Publication Number Publication Date
AU2002218517A1 true AU2002218517A1 (en) 2002-06-11

Family

ID=26604984

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002218517A Abandoned AU2002218517A1 (en) 2000-11-30 2001-11-30 Cerium-based abrasive and production process thereof

Country Status (7)

Country Link
US (2) US6986798B2 (en)
EP (1) EP1346003B1 (en)
KR (1) KR100647023B1 (en)
AT (1) ATE449827T1 (en)
AU (1) AU2002218517A1 (en)
DE (1) DE60140621D1 (en)
WO (1) WO2002044300A2 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY126099A (en) * 2000-09-20 2006-09-29 Mitsui Mining & Smelting Co Cerium-based abrasive, method of examining quality thereof, and method of producing the same
JP4002740B2 (en) * 2001-05-29 2007-11-07 三井金属鉱業株式会社 Method for producing cerium-based abrasive
JP4236857B2 (en) * 2002-03-22 2009-03-11 三井金属鉱業株式会社 Cerium-based abrasive and method for producing the same
US20100187178A1 (en) * 2003-01-29 2010-07-29 Molycorp Minerals, Llc Process for removing and sequestering contaminants from aqueous streams
US6863825B2 (en) * 2003-01-29 2005-03-08 Union Oil Company Of California Process for removing arsenic from aqueous streams
JP3875668B2 (en) * 2003-08-26 2007-01-31 三井金属鉱業株式会社 Cerium-based abrasive containing fluorine and method for producing the same
KR100638317B1 (en) * 2004-07-28 2006-10-25 주식회사 케이씨텍 Slurry for polishing and mehod of manufacturing the same and method of polishing substrates
WO2006025614A1 (en) * 2004-09-03 2006-03-09 Showa Denko K.K. Mixed rare earth oxide, mixed rare earth fluoride, cerium-based abrasive using the materials and production processes thereof
KR20060066799A (en) * 2004-12-14 2006-06-19 한국기초과학지원연구원 Simultaneous measurement of the integrated x-ray reflectivity for different orders of reflections by using continuous x-ray and apparatus for measurement thereof
TWI338036B (en) * 2005-04-04 2011-03-01 Showa Denko Kk Cerium-based oxide abrasive, and producing method and use thereof
US8066874B2 (en) * 2006-12-28 2011-11-29 Molycorp Minerals, Llc Apparatus for treating a flow of an aqueous solution containing arsenic
US8252087B2 (en) * 2007-10-31 2012-08-28 Molycorp Minerals, Llc Process and apparatus for treating a gas containing a contaminant
US8349764B2 (en) 2007-10-31 2013-01-08 Molycorp Minerals, Llc Composition for treating a fluid
US20090107919A1 (en) * 2007-10-31 2009-04-30 Chevron U.S.A. Inc. Apparatus and process for treating an aqueous solution containing chemical contaminants
TW201038510A (en) * 2009-03-16 2010-11-01 Molycorp Minerals Llc Porous and durable ceramic filter monolith coated with a rare earth for removing contaminates from water
WO2010118368A1 (en) * 2009-04-09 2010-10-14 Molycorp Minerals Llc Use of a rare earth for the removal of antimony and bismuth
US8727833B2 (en) * 2009-04-15 2014-05-20 Rhodia (China) Co., Ltd. Cerium-based particle composition and the preparation thereof
EP2499679A4 (en) * 2009-11-09 2014-01-01 Molycorp Minerals Llc Rare earth removal of colorants
US9233863B2 (en) 2011-04-13 2016-01-12 Molycorp Minerals, Llc Rare earth removal of hydrated and hydroxyl species
CN102585707B (en) * 2012-02-28 2014-01-29 上海华明高纳稀土新材料有限公司 Preparation method of cerium-based mixed rare earth polishing powder
JP2015120844A (en) * 2013-12-24 2015-07-02 旭硝子株式会社 Polishing agent production method, polishing method, and semiconductor integrated circuit device production method
AU2015226889B2 (en) 2014-03-07 2019-09-19 Secure Natural Resources Llc Cerium (IV) oxide with exceptional arsenic removal properties
CN104194646B (en) * 2014-09-02 2016-09-28 包头市金蒙研磨材料有限责任公司 A kind of rare earth cerio rubbing paste production method
KR102463863B1 (en) 2015-07-20 2022-11-04 삼성전자주식회사 Polishing compositions and methods of manufacturing semiconductor devices using the same
CN113772713A (en) * 2021-08-26 2021-12-10 北京工业大学 Roasting preparation method of rare earth fluoride lanthanum cerium polishing powder

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2472601A1 (en) * 1979-12-27 1981-07-03 Rhone Poulenc Ind PROCESS FOR PRODUCING CERIUM POLISHING COMPOSITIONS
SU1249045A1 (en) * 1984-11-02 1986-08-07 Предприятие П/Я Р-6670 Method of producing suspension for polishing optical glass
US5258167A (en) * 1990-06-01 1993-11-02 Lion Corporation Extractant for rare earth metal and method for extracting the same
RU2001934C1 (en) * 1992-02-10 1993-10-30 Научно-производственный кооператив "Экорунд" Suspension for optical glass polishing
KR950013315B1 (en) * 1993-05-07 1995-11-02 주식회사엘지금속 Retreatment method for sludge containing fluorine
JPH0848969A (en) * 1994-08-09 1996-02-20 Mitsui Mining & Smelting Co Ltd Abrasive
JPH09183966A (en) 1995-12-29 1997-07-15 Seimi Chem Co Ltd Production of cerium abrasive
JP3602670B2 (en) * 1996-12-25 2004-12-15 セイミケミカル株式会社 Manufacturing method of cerium-based abrasive
JP3600725B2 (en) * 1998-03-24 2004-12-15 三井金属鉱業株式会社 Manufacturing method of cerium-based abrasive
JP3480323B2 (en) 1998-06-30 2003-12-15 日立化成工業株式会社 Cerium oxide abrasive, substrate polishing method, and semiconductor device
JP2000026840A (en) 1998-07-09 2000-01-25 Toray Ind Inc Abrasive
RU2139949C1 (en) * 1998-07-10 1999-10-20 Всероссийский научно-исследовательский институт химической технологии Method of preparing cerium oxide
JP2000109813A (en) 1998-10-08 2000-04-18 Hitachi Chem Co Ltd Polishing agent for cmp and polishing of substrate
JP2000303060A (en) * 1999-04-19 2000-10-31 Seimi Chem Co Ltd Abrasive material for semiconductor containing fluorocompound abrasive grains
JP3392398B2 (en) 2000-09-20 2003-03-31 三井金属鉱業株式会社 Cerium-based abrasive, its quality inspection method and manufacturing method
MY126099A (en) 2000-09-20 2006-09-29 Mitsui Mining & Smelting Co Cerium-based abrasive, method of examining quality thereof, and method of producing the same

Also Published As

Publication number Publication date
WO2002044300A2 (en) 2002-06-06
US20040043613A1 (en) 2004-03-04
US6986798B2 (en) 2006-01-17
EP1346003A2 (en) 2003-09-24
ATE449827T1 (en) 2009-12-15
EP1346003B1 (en) 2009-11-25
US20050271570A1 (en) 2005-12-08
US7470297B2 (en) 2008-12-30
DE60140621D1 (en) 2010-01-07
KR20040062417A (en) 2004-07-07
KR100647023B1 (en) 2006-11-17
WO2002044300A3 (en) 2002-08-29

Similar Documents

Publication Publication Date Title
AU2002218517A1 (en) Cerium-based abrasive and production process thereof
EA200200170A1 (en) ABRASIVE ON THE BASIS OF CERIA, THE ORIGINAL MATERIAL FOR IT AND THE METHODS OF THEIR RECEIVING
AU2003288756A1 (en) Barium titanate and electronic parts using the material
AU7283787A (en) Alkaline earth metal spinels and processes for making and using same
CA2502971A1 (en) Process for production of a borohydride compound
TW200619366A (en) Mixed rare earth oxide, mixed rare earth fluoride, cerium-based abrasive using the materials and production processes thereof
CN108654844B (en) Application of organic phosphoric acid compound in scheelite flotation
MY115656A (en) Method for recovering reusable elements from rare aerth-iron alloy
EP1296192A3 (en) Mixed substance of triphenylamine dimers
WO2004079798A3 (en) Efficient, size-selected green-emitting phosphors
AU2680000A (en) Cementitious compositions
EP0371264A3 (en) Phosphonate reagent compositions and methods of making same
JPS62187112A (en) Method for recovering rare earth element from rare earth element-iron type magnet material
DE602004019925D1 (en) PROCESS FOR PREPARING CEROIDIDE ABRASIVES BY ADJUSTING THE COMBUSTION TEMPERATURE OF CERCARBONATE
JPH0733487A (en) Pulverizing method for cement clinker
KR920009702A (en) Method for preparing ammonium rare earth double oxalate and rare earth oxide obtained therefrom
CN208378732U (en) Raw materials for cement is crushed ingredient mixing arrangement
JPS5222580A (en) Production process of fluorescent substance for gas discharge panel
JPS56155280A (en) Bluish green-luminescent fluorescent substance
JPS5735642A (en) Enhancing method for productivity of sintered ore in its manufacture using fine iron ore
AU778634B2 (en) Method for separating metal ions
JPS531180A (en) Fluorescent substance and production thereof
JPS57212286A (en) Production of fluorescent substance
RU2003103814A (en) BATTERY FOR PRODUCING MINERAL WOOL
RU2043980C1 (en) Thinning agent of ferrite drosses