KR100471018B1
(en)
*
|
2000-11-28 |
2005-03-08 |
스미도모쥬기가이고교 가부시키가이샤 |
Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
|
DE60219871T2
(en)
*
|
2001-11-07 |
2008-01-17 |
Asml Netherlands B.V. |
Lithographic apparatus and method of making a device
|
US7813634B2
(en)
|
2005-02-28 |
2010-10-12 |
Tessera MEMS Technologies, Inc. |
Autofocus camera
|
US7359130B1
(en)
*
|
2002-02-04 |
2008-04-15 |
Siimpel Corporation |
Lens mount and alignment method
|
DE10226655A1
(en)
*
|
2002-06-14 |
2004-01-08 |
Carl Zeiss Smt Ag |
Device for positioning an optical element in a structure
|
US6873478B2
(en)
|
2002-06-21 |
2005-03-29 |
Nikon Corporation |
Kinematic lens mount with reduced clamping force
|
JP4565261B2
(en)
|
2002-06-24 |
2010-10-20 |
株式会社ニコン |
Optical element holding mechanism, optical system barrel, and exposure apparatus
|
US6922293B2
(en)
|
2002-07-02 |
2005-07-26 |
Nikon Corporation |
Kinematic optical mounting assembly with flexures
|
TW200412617A
(en)
*
|
2002-12-03 |
2004-07-16 |
Nikon Corp |
Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
|
US7221463B2
(en)
*
|
2003-03-14 |
2007-05-22 |
Canon Kabushiki Kaisha |
Positioning apparatus, exposure apparatus, and method for producing device
|
US7002759B2
(en)
*
|
2003-03-20 |
2006-02-21 |
Pentax Corporation |
Lens unit for multibeam scanning device
|
WO2004086148A1
(en)
*
|
2003-03-26 |
2004-10-07 |
Carl Zeiss Smt Ag |
Device for the low-deformation replaceable mounting of an optical element
|
EP3226073A3
(en)
|
2003-04-09 |
2017-10-11 |
Nikon Corporation |
Exposure method and apparatus, and method for fabricating device
|
JP2004327529A
(en)
*
|
2003-04-22 |
2004-11-18 |
Canon Inc |
Aligner
|
JP4574206B2
(en)
*
|
2003-04-25 |
2010-11-04 |
キヤノン株式会社 |
Driving device, exposure apparatus using the same, and device manufacturing method
|
US7760452B2
(en)
*
|
2003-04-25 |
2010-07-20 |
Canon Kabushiki Kaisha |
Driving apparatus, optical system, exposure apparatus and device fabrication method
|
DE602004024302D1
(en)
*
|
2003-06-06 |
2010-01-07 |
Nippon Kogaku Kk |
HOLDING DEVICE FOR OPTICAL ELEMENTS, OBJECTIVE TUBE, EXPOSURE DEVICE AND MANUFACTURING METHOD FOR COMPONENTS
|
ATE489724T1
(en)
|
2003-07-09 |
2010-12-15 |
Nikon Corp |
EXPOSURE DEVICE AND METHOD FOR PRODUCING COMPONENTS
|
CN102854755A
(en)
*
|
2003-07-09 |
2013-01-02 |
株式会社尼康 |
Exposure apparatus
|
CN101470361A
(en)
*
|
2003-07-09 |
2009-07-01 |
株式会社尼康 |
Exposure apparatus and device manufacturing method
|
AU2003254364A1
(en)
*
|
2003-07-17 |
2005-03-07 |
Carl Zeiss Smt Ag |
Device for mounting an optical element, particularly a lens in an objective
|
EP1662553A1
(en)
*
|
2003-07-24 |
2006-05-31 |
Nikon Corporation |
Illuminating optical system, exposure system and exposure method
|
KR101129119B1
(en)
|
2003-09-12 |
2012-03-26 |
칼 짜이스 에스엠테 게엠베하 |
Apparatus for manipulation of an optical element
|
US7760327B2
(en)
|
2003-10-02 |
2010-07-20 |
Carl Zeiss Smt Ag |
Reflecting optical element with eccentric optical passageway
|
KR101134210B1
(en)
*
|
2003-10-02 |
2012-04-09 |
칼 짜이스 에스엠테 게엠베하 |
Optical subassembly and projection objective for semiconductor lithography
|
DE102004025832A1
(en)
|
2004-05-24 |
2005-12-22 |
Carl Zeiss Smt Ag |
Optics module for a lens
|
TWI457712B
(en)
|
2003-10-28 |
2014-10-21 |
尼康股份有限公司 |
Optical illumination device, projection exposure device, exposure method and device manufacturing method
|
TWI519819B
(en)
|
2003-11-20 |
2016-02-01 |
尼康股份有限公司 |
Light beam converter, optical illuminating apparatus, exposure device, and exposure method
|
KR100577696B1
(en)
*
|
2003-12-15 |
2006-05-10 |
삼성전자주식회사 |
Liquid crystal on silicon having uniform cell gap
|
US7265917B2
(en)
*
|
2003-12-23 |
2007-09-04 |
Carl Zeiss Smt Ag |
Replacement apparatus for an optical element
|
WO2005064382A1
(en)
*
|
2003-12-25 |
2005-07-14 |
Nikon Corporation |
Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
|
TWI494972B
(en)
|
2004-02-06 |
2015-08-01 |
尼康股份有限公司 |
Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
|
JP2007528125A
(en)
|
2004-02-25 |
2007-10-04 |
カール ツァイス エスエムテー アクチェンゲゼルシャフト |
Equipment consisting of at least one optical component
|
JP5008551B2
(en)
*
|
2004-02-26 |
2012-08-22 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
Housing structure
|
US7581305B2
(en)
*
|
2004-04-12 |
2009-09-01 |
Carl Zeiss Smt Ag |
Method of manufacturing an optical component
|
DE102004018659A1
(en)
*
|
2004-04-13 |
2005-11-03 |
Carl Zeiss Smt Ag |
Termination module for an optical arrangement
|
DE102004018656A1
(en)
*
|
2004-04-13 |
2005-11-03 |
Carl Zeiss Smt Ag |
Optical element
|
WO2005101131A1
(en)
*
|
2004-04-14 |
2005-10-27 |
Carl Zeiss Smt Ag |
Support device for positioning an optical element
|
DE102004018228B4
(en)
*
|
2004-04-15 |
2006-02-16 |
Forschungszentrum Karlsruhe Gmbh |
Adjustable platform
|
US7633691B2
(en)
*
|
2004-06-07 |
2009-12-15 |
Raytheon Company |
Optical mounting for high-g environment
|
JP4532545B2
(en)
|
2004-06-29 |
2010-08-25 |
カール・ツァイス・エスエムティー・アーゲー |
Positioning unit and adjusting device for optical elements
|
JP2006023359A
(en)
*
|
2004-07-06 |
2006-01-26 |
Fujinon Corp |
Lens supporting frame of lens device and manufacture method for lens device
|
JPWO2006016469A1
(en)
*
|
2004-08-10 |
2008-05-01 |
株式会社ニコン |
Illumination optical apparatus, exposure apparatus, and exposure method
|
US20060077572A1
(en)
*
|
2004-10-13 |
2006-04-13 |
3M Innovative Properties Company |
Split optic support structure and optical system using split optic support structure
|
WO2006059549A1
(en)
*
|
2004-12-03 |
2006-06-08 |
Nikon Corporation |
Illumination optical device, manufacturing method thereof, exposure device, and exposure method
|
US20060176460A1
(en)
*
|
2005-02-10 |
2006-08-10 |
Nikon Corporation |
Lithographic optical systems including exchangeable optical-element sets
|
US20090002670A1
(en)
*
|
2005-03-04 |
2009-01-01 |
Carl Zeiss Smt Ag |
Apparatus for the manipulation and/or adjustment of an optical element
|
JP4994598B2
(en)
*
|
2005-03-18 |
2012-08-08 |
キヤノン株式会社 |
Drive device
|
WO2006119970A2
(en)
*
|
2005-05-09 |
2006-11-16 |
Carl Zeiss Smt Ag |
Assembly for adjusting an optical element
|
KR20170089028A
(en)
|
2005-05-12 |
2017-08-02 |
가부시키가이샤 니콘 |
Projection optical system, exposure apparatus and device manufacturing method
|
US8693006B2
(en)
*
|
2005-06-28 |
2014-04-08 |
Nikon Corporation |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
|
EP1899756A2
(en)
|
2005-07-01 |
2008-03-19 |
Carl Zeiss SMT AG |
Arrangement for mounting an optical component
|
WO2007086557A1
(en)
*
|
2006-01-30 |
2007-08-02 |
Nikon Corporation |
Optical member holding apparatus, method for adjusting position of optical member, and exposure apparatus
|
US8441747B2
(en)
*
|
2006-09-14 |
2013-05-14 |
Carl Zeiss Smt Gmbh |
Optical module with minimized overrun of the optical element
|
EP1901101A1
(en)
*
|
2006-09-14 |
2008-03-19 |
Carl Zeiss SMT AG |
Optical element unit and method of supporting an optical element
|
JP2008107667A
(en)
*
|
2006-10-27 |
2008-05-08 |
Canon Inc |
Device for holding optical element, adjustment method therefor and exposure device equipped therewith
|
US7573659B2
(en)
*
|
2006-10-27 |
2009-08-11 |
Canon Kabushiki Kaisha |
Optical element holding apparatus and exposure apparatus
|
JP2008112756A
(en)
*
|
2006-10-27 |
2008-05-15 |
Canon Inc |
Optical element driving device and control method thereof, exposure apparatus, and manufacturing method of device
|
JP2008203418A
(en)
*
|
2007-02-19 |
2008-09-04 |
Alps Electric Co Ltd |
Optical lens and manufacturing method of the same
|
JP5043468B2
(en)
*
|
2007-02-23 |
2012-10-10 |
キヤノン株式会社 |
Holding device
|
JP5013906B2
(en)
*
|
2007-03-05 |
2012-08-29 |
キヤノン株式会社 |
Optical element holding device
|
US8416386B2
(en)
*
|
2007-03-13 |
2013-04-09 |
Nikon Corporation |
Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
|
CN101681009B
(en)
*
|
2007-04-23 |
2012-09-05 |
株式会社尼康 |
Optical element holding device, lens barrel, exposure device, and device manufacturing method
|
CN101681008A
(en)
*
|
2007-05-11 |
2010-03-24 |
株式会社尼康 |
Optical element driver, lens-barrel and exposure apparatus and method for fabricating device
|
US9371855B2
(en)
*
|
2007-05-21 |
2016-06-21 |
The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration |
Flexure based linear and rotary bearings
|
WO2008146655A1
(en)
*
|
2007-05-25 |
2008-12-04 |
Nikon Corporation |
Optical element holding apparatus, lens barrel, exposure apparatus and device manufacturing method
|
JP2008309903A
(en)
*
|
2007-06-12 |
2008-12-25 |
Canon Inc |
Optical element holding structure, exposing device, and device manufacturing method
|
DE102008040218A1
(en)
|
2007-07-11 |
2009-01-15 |
Carl Zeiss Smt Ag |
Optical device e.g. illumination system, operating method for use in projection exposure system, involves storing element such that no parasitic adjustments or changes of element develop during or after rotation in imaging characteristics
|
KR101490191B1
(en)
*
|
2007-08-23 |
2015-03-17 |
칼 짜이스 에스엠테 게엠베하 |
Optical element module with minimized parasitic loads
|
US7990628B1
(en)
*
|
2007-08-29 |
2011-08-02 |
Tessera MEMS Technologies, Inc. |
Planar flexure system with high pitch stiffness
|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
Nikon Corporation |
Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
|
DE102007047109A1
(en)
*
|
2007-10-01 |
2009-04-09 |
Carl Zeiss Smt Ag |
Optical system, in particular projection lens of microlithography
|
JP5267029B2
(en)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
Illumination optical apparatus, exposure apparatus, and device manufacturing method
|
KR101546987B1
(en)
|
2007-10-16 |
2015-08-24 |
가부시키가이샤 니콘 |
Illumination optical system, exposure apparatus, and device manufacturing method
|
CN101681123B
(en)
|
2007-10-16 |
2013-06-12 |
株式会社尼康 |
Illumination optical system, exposure apparatus, and device manufacturing method
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
US20090219497A1
(en)
*
|
2008-02-28 |
2009-09-03 |
Carl Zeiss Smt Ag |
Optical device with stiff housing
|
DE202008004018U1
(en)
*
|
2008-03-20 |
2008-05-21 |
Oculus Optikgeräte GmbH |
Positioning device for an optical element
|
DE102008000967B4
(en)
|
2008-04-03 |
2015-04-09 |
Carl Zeiss Smt Gmbh |
Projection exposure machine for EUV microlithography
|
JP5324251B2
(en)
*
|
2008-05-16 |
2013-10-23 |
キヤノンアネルバ株式会社 |
Substrate holding device
|
WO2009145048A1
(en)
|
2008-05-28 |
2009-12-03 |
株式会社ニコン |
Inspection device and inspecting method for spatial light modulator, illuminating optical system, method for adjusting the illuminating optical system, exposure device, and device manufacturing method
|
JP2010021526A
(en)
*
|
2008-06-11 |
2010-01-28 |
Canon Inc |
Positioning apparatus, positioning method, exposure apparatus, device manufacturing method, and methods of manufacturing positioning apparatus and exposure apparatus
|
US8305701B2
(en)
*
|
2008-09-17 |
2012-11-06 |
Carl Zeiss Smt Gmbh |
Connecting arrangement for an optical device
|
DE102009044957A1
(en)
|
2008-09-30 |
2010-04-08 |
Carl Zeiss Smt Ag |
Support elements for an optical element
|
JP2010135492A
(en)
*
|
2008-12-03 |
2010-06-17 |
Canon Inc |
Aligner and device manufacturing method
|
CN102265219B
(en)
|
2008-12-11 |
2014-07-16 |
卡尔蔡司Smt有限责任公司 |
Gravitation compensation for optical elements in projection lighting systems
|
US8294406B2
(en)
*
|
2009-04-06 |
2012-10-23 |
Bhargav Ishwarlal Gajjar |
Parallel kinematics micro-positioning system
|
FR2945638B1
(en)
*
|
2009-05-14 |
2012-01-06 |
Commissariat Energie Atomique |
DEVICE FOR MAINTAINING WITH PRECISION A COMPONENT, IN PARTICULAR OPTICAL, AND ASSEMBLY COMPRISING AT LEAST ONE SUCH DEVICE
|
US20110001945A1
(en)
|
2009-07-01 |
2011-01-06 |
Masayuki Shiraishi |
Projection optical system, exposure apparatus, and assembly method thereof
|
CN102194835A
(en)
*
|
2010-03-01 |
2011-09-21 |
奇景光电股份有限公司 |
Wafer-level camera lens module, manufacturing method thereof and wafer-level camera
|
US20110249176A1
(en)
*
|
2010-04-13 |
2011-10-13 |
Chuan-Ching Hsueh |
Wafer level lens module and related method for forming the same
|
DE102010018224A1
(en)
|
2010-04-23 |
2012-02-16 |
Carl Zeiss Smt Gmbh |
Optical module with an adjustable optical element
|
DE102010028941B4
(en)
*
|
2010-05-12 |
2012-03-22 |
Carl Zeiss Smt Gmbh |
Optical device and method for positioning an optical element of an optical device
|
DE102010021539B4
(en)
|
2010-05-19 |
2014-10-09 |
Carl Zeiss Smt Gmbh |
Projection lens with apertures
|
DE102010022934A1
(en)
*
|
2010-06-04 |
2011-12-08 |
Carl Zeiss Ag |
Optical assembly has optical element with rotational-symmetrical cross-section that is approximately perpendicular to symmetrical axis, where lamp holder is provided for optical element with three holding assemblies
|
CN103064230B
(en)
*
|
2011-10-19 |
2016-03-09 |
鸿富锦精密工业(深圳)有限公司 |
Focus control
|
JP2013137393A
(en)
|
2011-12-28 |
2013-07-11 |
Canon Inc |
Microscope
|
US20140133897A1
(en)
*
|
2012-11-12 |
2014-05-15 |
Micheal Brendan O Ceallaigh |
Flexurally mounted kinematic coupling with improved repeatability
|
US20160041361A1
(en)
*
|
2014-08-06 |
2016-02-11 |
Sandia Corporation |
Mounting apparatus
|
DE102014113733B3
(en)
*
|
2014-09-23 |
2016-01-14 |
Jenoptik Optical Systems Gmbh |
Optical lens with holding elements and socket assembly with optical lens
|
US9823466B2
(en)
*
|
2015-07-03 |
2017-11-21 |
Panasonic Intellectual Property Management Co., Ltd. |
Optical path changing device and projection image display apparatus
|
JP6240142B2
(en)
*
|
2015-11-26 |
2017-11-29 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
Parasitic load minimizing optical element module
|
JP2017211409A
(en)
*
|
2016-05-23 |
2017-11-30 |
キヤノン株式会社 |
Retainer, lithography device, and method of manufacturing article
|
WO2017207016A1
(en)
*
|
2016-05-30 |
2017-12-07 |
Carl Zeiss Smt Gmbh |
Optical imaging arrangement with a piezoelectric device
|
DE102016215540A1
(en)
*
|
2016-08-18 |
2018-02-22 |
Carl Zeiss Smt Gmbh |
OPTICAL SYSTEM, LITHOGRAPHY SYSTEM AND METHOD
|
KR20180068228A
(en)
|
2016-12-13 |
2018-06-21 |
삼성전자주식회사 |
Adjusting unit of optical element and maskless exposure apparatus having the same
|
US10678018B2
(en)
*
|
2017-10-23 |
2020-06-09 |
Magna Electronics Inc. |
Camera for vehicle vision system with replaceable lens
|
DE102018203925A1
(en)
*
|
2018-03-15 |
2019-09-19 |
Carl Zeiss Smt Gmbh |
Beam shaping and illumination system for a lithography system and method
|
US11692816B2
(en)
|
2018-04-27 |
2023-07-04 |
Cognex Corporation |
Mounting arrangement for optical systems
|
EP3608627B1
(en)
|
2018-08-09 |
2023-11-08 |
Cognex Corporation |
Positioning system for components of optical systems
|
CN111505785B
(en)
*
|
2019-01-31 |
2023-04-07 |
中强光电股份有限公司 |
Fixing base and projection device
|
DE102021201126A1
(en)
|
2020-06-26 |
2021-12-30 |
Carl Zeiss Smt Gmbh |
COMPONENT CONNECTION, LITHOGRAPHY SYSTEM AND METHOD FOR DESIGNING A COMPONENT CONNECTION
|
DE102020212870A1
(en)
*
|
2020-10-13 |
2022-04-14 |
Carl Zeiss Smt Gmbh |
Optical components and methods for adjusting the optical components and projection exposure system
|
CN114137804B
(en)
*
|
2021-12-16 |
2022-10-04 |
哈尔滨工业大学 |
Multi-connecting-rod coupling two-shaft driving mechanism for flexible illuminator
|