US6787772B2
(en)
*
|
2000-01-25 |
2004-09-07 |
Hitachi, Ltd. |
Scanning electron microscope
|
EP1150327B1
(en)
*
|
2000-04-27 |
2018-02-14 |
ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Multi beam charged particle device
|
US6946655B2
(en)
*
|
2001-11-07 |
2005-09-20 |
Applied Materials, Inc. |
Spot grid array electron imaging system
|
JP3968334B2
(en)
*
|
2002-09-11 |
2007-08-29 |
株式会社日立ハイテクノロジーズ |
Charged particle beam apparatus and charged particle beam irradiation method
|
WO2004072631A2
(en)
*
|
2003-02-05 |
2004-08-26 |
Applied Materials Israel, Ltd. |
A method for measuring and reducing angular deviations of a charged particle beam
|
TWM273099U
(en)
*
|
2005-02-04 |
2005-08-11 |
King Lion Entpr Co Ltd |
Connector structure
|
NL1025500C2
(en)
*
|
2004-02-17 |
2005-08-19 |
Fei Co |
Particle source with selectable beam current and energy distribution.
|
EP1577926A1
(en)
*
|
2004-03-19 |
2005-09-21 |
ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh |
High current density particle beam system
|
JP4611755B2
(en)
*
|
2005-01-13 |
2011-01-12 |
株式会社日立ハイテクノロジーズ |
Scanning electron microscope and imaging method thereof
|
US7394069B1
(en)
*
|
2005-08-30 |
2008-07-01 |
Kla-Tencor Technologies Corporation |
Large-field scanning of charged particles
|
US20090256075A1
(en)
|
2005-09-06 |
2009-10-15 |
Carl Zeiss Smt Ag |
Charged Particle Inspection Method and Charged Particle System
|
EP1783811A3
(en)
*
|
2005-11-02 |
2008-02-27 |
FEI Company |
Corrector for the correction of chromatic aberrations in a particle-optical apparatus
|
US7276708B2
(en)
*
|
2005-11-23 |
2007-10-02 |
Far-Tech, Inc. |
Diagnostic resonant cavity for a charged particle accelerator
|
EP1801838B1
(en)
*
|
2005-12-20 |
2012-05-09 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Charged particle beam emitting device and method for operating a charged particle beam emitting device
|
US8134135B2
(en)
|
2006-07-25 |
2012-03-13 |
Mapper Lithography Ip B.V. |
Multiple beam charged particle optical system
|
EP2405459A1
(en)
*
|
2006-07-25 |
2012-01-11 |
Mapper Lithography IP B.V. |
A multiple beam charged particle optical system
|
US7763851B2
(en)
*
|
2006-12-22 |
2010-07-27 |
Ims Nanofabrication Ag |
Particle-beam apparatus with improved wien-type filter
|
JP2010517038A
(en)
*
|
2007-01-22 |
2010-05-20 |
カリフォルニア インスティテュート オブ テクノロジー |
Method and apparatus for quantitative three-dimensional imaging
|
US8089635B2
(en)
|
2007-01-22 |
2012-01-03 |
California Institute Of Technology |
Method and system for fast three-dimensional imaging using defocusing and feature recognition
|
JP2010526992A
(en)
|
2007-04-23 |
2010-08-05 |
カリフォルニア インスティテュート オブ テクノロジー |
Single lens, single aperture, single sensor 3D imaging device
|
DE102008035297B4
(en)
*
|
2007-07-31 |
2017-08-17 |
Hitachi High-Technologies Corporation |
A charged particle beam aberration correcting device in an optical system of a charged particle beam device and a charged particle beam device having the aberration correcting device
|
US8642959B2
(en)
|
2007-10-29 |
2014-02-04 |
Micron Technology, Inc. |
Method and system of performing three-dimensional imaging using an electron microscope
|
EP2128885A1
(en)
*
|
2008-05-26 |
2009-12-02 |
FEI Company |
Charged particle source with integrated energy filter
|
EP2428932A1
(en)
*
|
2008-08-27 |
2012-03-14 |
California Institute of Technology |
Method and device for high-resolution three-dimensional imaging which obtains camera pose using defocusing
|
US7932495B2
(en)
*
|
2008-09-02 |
2011-04-26 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Fast wafer inspection system
|
EP2226830B1
(en)
*
|
2009-03-06 |
2014-01-08 |
FEI Company |
Charged particle beam processing
|
CN102379005B
(en)
|
2009-04-13 |
2016-08-24 |
应用材料公司 |
The magnetic changing film is injected with ion and neutral beam
|
US8773507B2
(en)
*
|
2009-08-11 |
2014-07-08 |
California Institute Of Technology |
Defocusing feature matching system to measure camera pose with interchangeable lens cameras
|
US8773514B2
(en)
*
|
2009-08-27 |
2014-07-08 |
California Institute Of Technology |
Accurate 3D object reconstruction using a handheld device with a projected light pattern
|
EP2325862A1
(en)
|
2009-11-18 |
2011-05-25 |
Fei Company |
Corrector for axial aberrations of a particle-optical lens
|
US9336981B2
(en)
|
2010-04-09 |
2016-05-10 |
Applied Materials Israel Ltd. |
Charged particle detection system and multi-beamlet inspection system
|
EP2378537B1
(en)
*
|
2010-04-19 |
2014-02-12 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Method of operating a charged particle beam device
|
EP2402475A1
(en)
|
2010-06-30 |
2012-01-04 |
Fei Company |
Beam-induced deposition at cryogenic temperatures
|
JP6007178B2
(en)
|
2010-09-03 |
2016-10-12 |
カリフォルニア インスティテュート オブ テクノロジー |
3D imaging system
|
US8487252B2
(en)
*
|
2010-09-29 |
2013-07-16 |
Carl Zeiss Nts Gmbh |
Particle beam microscope and method for operating the particle beam microscope
|
EP2511936B1
(en)
|
2011-04-13 |
2013-10-02 |
Fei Company |
Distortion free stigmation of a TEM
|
JP5890652B2
(en)
*
|
2011-10-28 |
2016-03-22 |
株式会社荏原製作所 |
Sample observation apparatus and sample observation method
|
EP2665082A1
(en)
*
|
2012-05-16 |
2013-11-20 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Element for fast magnetic beam deflection
|
NL2009053C2
(en)
*
|
2012-06-22 |
2013-12-24 |
Univ Delft Tech |
Apparatus and method for inspecting a surface of a sample.
|
CN102956420B
(en)
*
|
2012-10-30 |
2016-11-16 |
中国科学院上海应用物理研究所 |
Electron ray source generation device and the method producing low dose rate electron ray
|
US10121635B2
(en)
*
|
2013-09-30 |
2018-11-06 |
Carl Zeiss Microscopy Gmbh |
Charged particle beam system and method of operating the same
|
US10319558B2
(en)
*
|
2013-09-30 |
2019-06-11 |
Hitachi High-Technologies Corporation |
Charged particle beam device
|
EP2879155B1
(en)
*
|
2013-12-02 |
2018-04-25 |
ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH |
Multi-beam system for high throughput EBI
|
DE102015202172B4
(en)
|
2015-02-06 |
2017-01-19 |
Carl Zeiss Microscopy Gmbh |
Particle beam system and method for particle-optical examination of an object
|
US9691588B2
(en)
|
2015-03-10 |
2017-06-27 |
Hermes Microvision, Inc. |
Apparatus of plural charged-particle beams
|
US10236156B2
(en)
|
2015-03-25 |
2019-03-19 |
Hermes Microvision Inc. |
Apparatus of plural charged-particle beams
|
US9607805B2
(en)
*
|
2015-05-12 |
2017-03-28 |
Hermes Microvision Inc. |
Apparatus of plural charged-particle beams
|
US9922799B2
(en)
|
2015-07-21 |
2018-03-20 |
Hermes Microvision, Inc. |
Apparatus of plural charged-particle beams
|
KR102007497B1
(en)
|
2015-07-22 |
2019-08-05 |
에이에스엠엘 네델란즈 비.브이. |
Apparatus using a plurality of charged particle beams
|
IL259602B
(en)
|
2015-11-30 |
2022-07-01 |
Hermes Microvision Inc |
Apparatus of plural charged-particle beams
|
WO2017132165A1
(en)
|
2016-01-25 |
2017-08-03 |
California Institute Of Technology |
Non-invasive measurement of intraocular pressure
|
KR20230003379A
(en)
|
2016-01-27 |
2023-01-05 |
에이에스엠엘 네델란즈 비.브이. |
Apparatus of Plural Charged-Particle Beams
|
JP6700152B2
(en)
*
|
2016-10-18 |
2020-05-27 |
株式会社ニューフレアテクノロジー |
Multi-beam focus adjusting method and multi-beam focus measuring method
|
US9922796B1
(en)
*
|
2016-12-01 |
2018-03-20 |
Applied Materials Israel Ltd. |
Method for inspecting a specimen and charged particle multi-beam device
|
US10347460B2
(en)
|
2017-03-01 |
2019-07-09 |
Dongfang Jingyuan Electron Limited |
Patterned substrate imaging using multiple electron beams
|
KR102582001B1
(en)
|
2017-04-28 |
2023-09-22 |
에이에스엠엘 네델란즈 비.브이. |
An apparatus using multiple beams of charged particles
|
DE102017208005B3
(en)
*
|
2017-05-11 |
2018-08-16 |
Carl Zeiss Microscopy Gmbh |
Particle source for generating a particle beam and particle-optical device
|
WO2019048293A1
(en)
|
2017-09-07 |
2019-03-14 |
Asml Netherlands B.V. |
Methods of inspecting samples with multiple beams of charged particles
|
KR102444744B1
(en)
|
2017-09-29 |
2022-09-19 |
에이에스엠엘 네델란즈 비.브이. |
Dynamic Determination of Sample Inspection Recipes in Charged Particle Beam Inspection
|
KR102535162B1
(en)
|
2017-09-29 |
2023-05-26 |
에이에스엠엘 네델란즈 비.브이. |
Methods of inspecting samples with multiple beams of charged particles
|
KR102631001B1
(en)
|
2017-09-29 |
2024-01-30 |
에이에스엠엘 네델란즈 비.브이. |
Image contrast enhancement in sample inspection)
|
DE102018202428B3
(en)
|
2018-02-16 |
2019-05-09 |
Carl Zeiss Microscopy Gmbh |
Multibeam Teilchenmikroskop
|
DE102018202421B3
(en)
|
2018-02-16 |
2019-07-11 |
Carl Zeiss Microscopy Gmbh |
Multibeam particle beam
|
CN112055886A
(en)
|
2018-02-27 |
2020-12-08 |
卡尔蔡司MultiSEM有限责任公司 |
Charged particle multi-beam system and method
|
US10811215B2
(en)
|
2018-05-21 |
2020-10-20 |
Carl Zeiss Multisem Gmbh |
Charged particle beam system
|
US11087950B2
(en)
*
|
2018-05-29 |
2021-08-10 |
Kla-Tencor Corporation |
Charge control device for a system with multiple electron beams
|
DE102018007455B4
(en)
|
2018-09-21 |
2020-07-09 |
Carl Zeiss Multisem Gmbh |
Process for detector alignment when imaging objects using a multi-beam particle microscope, system and computer program product
|
DE102018007652B4
(en)
|
2018-09-27 |
2021-03-25 |
Carl Zeiss Multisem Gmbh |
Particle beam system and method for current regulation of single particle beams
|
DE102018124044B3
(en)
|
2018-09-28 |
2020-02-06 |
Carl Zeiss Microscopy Gmbh |
Method for operating a multi-beam particle beam microscope and multi-beam particle beam system
|
US10748739B2
(en)
*
|
2018-10-12 |
2020-08-18 |
Kla-Tencor Corporation |
Deflection array apparatus for multi-electron beam system
|
TWI743626B
(en)
|
2019-01-24 |
2021-10-21 |
德商卡爾蔡司多重掃描電子顯微鏡有限公司 |
System comprising a multi-beam particle microscope, method for imaging a 3d sample layer by layer and computer program product
|
CN111477530B
(en)
|
2019-01-24 |
2023-05-05 |
卡尔蔡司MultiSEM有限责任公司 |
Method for imaging 3D samples using a multi-beam particle microscope
|
DE102019005362A1
(en)
|
2019-07-31 |
2021-02-04 |
Carl Zeiss Multisem Gmbh |
Method for operating a multitude particle beam system with changing the numerical aperture, associated computer program product and multitude particle beam system
|