AU2001273976A1 - Multi beam charged particle device - Google Patents

Multi beam charged particle device

Info

Publication number
AU2001273976A1
AU2001273976A1 AU2001273976A AU7397601A AU2001273976A1 AU 2001273976 A1 AU2001273976 A1 AU 2001273976A1 AU 2001273976 A AU2001273976 A AU 2001273976A AU 7397601 A AU7397601 A AU 7397601A AU 2001273976 A1 AU2001273976 A1 AU 2001273976A1
Authority
AU
Australia
Prior art keywords
charged particle
multi beam
particle device
beam charged
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001273976A
Inventor
Pavel Adamec
Ralf Degenhardt
Hans-Peter Feuerbaum
Harry Munack
Dieter Winkler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of AU2001273976A1 publication Critical patent/AU2001273976A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266Measurement of magnetic or electric fields in the object; Lorentzmicroscopy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
AU2001273976A 2000-04-27 2001-04-27 Multi beam charged particle device Abandoned AU2001273976A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00108973.9A EP1150327B1 (en) 2000-04-27 2000-04-27 Multi beam charged particle device
EP00108973 2000-04-27
PCT/EP2001/004787 WO2001084592A1 (en) 2000-04-27 2001-04-27 Multi beam charged particle device

Publications (1)

Publication Number Publication Date
AU2001273976A1 true AU2001273976A1 (en) 2001-11-12

Family

ID=8168566

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001273976A Abandoned AU2001273976A1 (en) 2000-04-27 2001-04-27 Multi beam charged particle device

Country Status (4)

Country Link
US (1) US6943349B2 (en)
EP (1) EP1150327B1 (en)
AU (1) AU2001273976A1 (en)
WO (1) WO2001084592A1 (en)

Families Citing this family (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6787772B2 (en) * 2000-01-25 2004-09-07 Hitachi, Ltd. Scanning electron microscope
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6946655B2 (en) * 2001-11-07 2005-09-20 Applied Materials, Inc. Spot grid array electron imaging system
JP3968334B2 (en) * 2002-09-11 2007-08-29 株式会社日立ハイテクノロジーズ Charged particle beam apparatus and charged particle beam irradiation method
WO2004072631A2 (en) * 2003-02-05 2004-08-26 Applied Materials Israel, Ltd. A method for measuring and reducing angular deviations of a charged particle beam
TWM273099U (en) * 2005-02-04 2005-08-11 King Lion Entpr Co Ltd Connector structure
NL1025500C2 (en) * 2004-02-17 2005-08-19 Fei Co Particle source with selectable beam current and energy distribution.
EP1577926A1 (en) * 2004-03-19 2005-09-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh High current density particle beam system
JP4611755B2 (en) * 2005-01-13 2011-01-12 株式会社日立ハイテクノロジーズ Scanning electron microscope and imaging method thereof
US7394069B1 (en) * 2005-08-30 2008-07-01 Kla-Tencor Technologies Corporation Large-field scanning of charged particles
US20090256075A1 (en) 2005-09-06 2009-10-15 Carl Zeiss Smt Ag Charged Particle Inspection Method and Charged Particle System
EP1783811A3 (en) * 2005-11-02 2008-02-27 FEI Company Corrector for the correction of chromatic aberrations in a particle-optical apparatus
US7276708B2 (en) * 2005-11-23 2007-10-02 Far-Tech, Inc. Diagnostic resonant cavity for a charged particle accelerator
EP1801838B1 (en) * 2005-12-20 2012-05-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam emitting device and method for operating a charged particle beam emitting device
US8134135B2 (en) 2006-07-25 2012-03-13 Mapper Lithography Ip B.V. Multiple beam charged particle optical system
EP2405459A1 (en) * 2006-07-25 2012-01-11 Mapper Lithography IP B.V. A multiple beam charged particle optical system
US7763851B2 (en) * 2006-12-22 2010-07-27 Ims Nanofabrication Ag Particle-beam apparatus with improved wien-type filter
JP2010517038A (en) * 2007-01-22 2010-05-20 カリフォルニア インスティテュート オブ テクノロジー Method and apparatus for quantitative three-dimensional imaging
US8089635B2 (en) 2007-01-22 2012-01-03 California Institute Of Technology Method and system for fast three-dimensional imaging using defocusing and feature recognition
JP2010526992A (en) 2007-04-23 2010-08-05 カリフォルニア インスティテュート オブ テクノロジー Single lens, single aperture, single sensor 3D imaging device
DE102008035297B4 (en) * 2007-07-31 2017-08-17 Hitachi High-Technologies Corporation A charged particle beam aberration correcting device in an optical system of a charged particle beam device and a charged particle beam device having the aberration correcting device
US8642959B2 (en) 2007-10-29 2014-02-04 Micron Technology, Inc. Method and system of performing three-dimensional imaging using an electron microscope
EP2128885A1 (en) * 2008-05-26 2009-12-02 FEI Company Charged particle source with integrated energy filter
EP2428932A1 (en) * 2008-08-27 2012-03-14 California Institute of Technology Method and device for high-resolution three-dimensional imaging which obtains camera pose using defocusing
US7932495B2 (en) * 2008-09-02 2011-04-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Fast wafer inspection system
EP2226830B1 (en) * 2009-03-06 2014-01-08 FEI Company Charged particle beam processing
CN102379005B (en) 2009-04-13 2016-08-24 应用材料公司 The magnetic changing film is injected with ion and neutral beam
US8773507B2 (en) * 2009-08-11 2014-07-08 California Institute Of Technology Defocusing feature matching system to measure camera pose with interchangeable lens cameras
US8773514B2 (en) * 2009-08-27 2014-07-08 California Institute Of Technology Accurate 3D object reconstruction using a handheld device with a projected light pattern
EP2325862A1 (en) 2009-11-18 2011-05-25 Fei Company Corrector for axial aberrations of a particle-optical lens
US9336981B2 (en) 2010-04-09 2016-05-10 Applied Materials Israel Ltd. Charged particle detection system and multi-beamlet inspection system
EP2378537B1 (en) * 2010-04-19 2014-02-12 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method of operating a charged particle beam device
EP2402475A1 (en) 2010-06-30 2012-01-04 Fei Company Beam-induced deposition at cryogenic temperatures
JP6007178B2 (en) 2010-09-03 2016-10-12 カリフォルニア インスティテュート オブ テクノロジー 3D imaging system
US8487252B2 (en) * 2010-09-29 2013-07-16 Carl Zeiss Nts Gmbh Particle beam microscope and method for operating the particle beam microscope
EP2511936B1 (en) 2011-04-13 2013-10-02 Fei Company Distortion free stigmation of a TEM
JP5890652B2 (en) * 2011-10-28 2016-03-22 株式会社荏原製作所 Sample observation apparatus and sample observation method
EP2665082A1 (en) * 2012-05-16 2013-11-20 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Element for fast magnetic beam deflection
NL2009053C2 (en) * 2012-06-22 2013-12-24 Univ Delft Tech Apparatus and method for inspecting a surface of a sample.
CN102956420B (en) * 2012-10-30 2016-11-16 中国科学院上海应用物理研究所 Electron ray source generation device and the method producing low dose rate electron ray
US10121635B2 (en) * 2013-09-30 2018-11-06 Carl Zeiss Microscopy Gmbh Charged particle beam system and method of operating the same
US10319558B2 (en) * 2013-09-30 2019-06-11 Hitachi High-Technologies Corporation Charged particle beam device
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
DE102015202172B4 (en) 2015-02-06 2017-01-19 Carl Zeiss Microscopy Gmbh Particle beam system and method for particle-optical examination of an object
US9691588B2 (en) 2015-03-10 2017-06-27 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US9607805B2 (en) * 2015-05-12 2017-03-28 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US9922799B2 (en) 2015-07-21 2018-03-20 Hermes Microvision, Inc. Apparatus of plural charged-particle beams
KR102007497B1 (en) 2015-07-22 2019-08-05 에이에스엠엘 네델란즈 비.브이. Apparatus using a plurality of charged particle beams
IL259602B (en) 2015-11-30 2022-07-01 Hermes Microvision Inc Apparatus of plural charged-particle beams
WO2017132165A1 (en) 2016-01-25 2017-08-03 California Institute Of Technology Non-invasive measurement of intraocular pressure
KR20230003379A (en) 2016-01-27 2023-01-05 에이에스엠엘 네델란즈 비.브이. Apparatus of Plural Charged-Particle Beams
JP6700152B2 (en) * 2016-10-18 2020-05-27 株式会社ニューフレアテクノロジー Multi-beam focus adjusting method and multi-beam focus measuring method
US9922796B1 (en) * 2016-12-01 2018-03-20 Applied Materials Israel Ltd. Method for inspecting a specimen and charged particle multi-beam device
US10347460B2 (en) 2017-03-01 2019-07-09 Dongfang Jingyuan Electron Limited Patterned substrate imaging using multiple electron beams
KR102582001B1 (en) 2017-04-28 2023-09-22 에이에스엠엘 네델란즈 비.브이. An apparatus using multiple beams of charged particles
DE102017208005B3 (en) * 2017-05-11 2018-08-16 Carl Zeiss Microscopy Gmbh Particle source for generating a particle beam and particle-optical device
WO2019048293A1 (en) 2017-09-07 2019-03-14 Asml Netherlands B.V. Methods of inspecting samples with multiple beams of charged particles
KR102444744B1 (en) 2017-09-29 2022-09-19 에이에스엠엘 네델란즈 비.브이. Dynamic Determination of Sample Inspection Recipes in Charged Particle Beam Inspection
KR102535162B1 (en) 2017-09-29 2023-05-26 에이에스엠엘 네델란즈 비.브이. Methods of inspecting samples with multiple beams of charged particles
KR102631001B1 (en) 2017-09-29 2024-01-30 에이에스엠엘 네델란즈 비.브이. Image contrast enhancement in sample inspection)
DE102018202428B3 (en) 2018-02-16 2019-05-09 Carl Zeiss Microscopy Gmbh Multibeam Teilchenmikroskop
DE102018202421B3 (en) 2018-02-16 2019-07-11 Carl Zeiss Microscopy Gmbh Multibeam particle beam
CN112055886A (en) 2018-02-27 2020-12-08 卡尔蔡司MultiSEM有限责任公司 Charged particle multi-beam system and method
US10811215B2 (en) 2018-05-21 2020-10-20 Carl Zeiss Multisem Gmbh Charged particle beam system
US11087950B2 (en) * 2018-05-29 2021-08-10 Kla-Tencor Corporation Charge control device for a system with multiple electron beams
DE102018007455B4 (en) 2018-09-21 2020-07-09 Carl Zeiss Multisem Gmbh Process for detector alignment when imaging objects using a multi-beam particle microscope, system and computer program product
DE102018007652B4 (en) 2018-09-27 2021-03-25 Carl Zeiss Multisem Gmbh Particle beam system and method for current regulation of single particle beams
DE102018124044B3 (en) 2018-09-28 2020-02-06 Carl Zeiss Microscopy Gmbh Method for operating a multi-beam particle beam microscope and multi-beam particle beam system
US10748739B2 (en) * 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
TWI743626B (en) 2019-01-24 2021-10-21 德商卡爾蔡司多重掃描電子顯微鏡有限公司 System comprising a multi-beam particle microscope, method for imaging a 3d sample layer by layer and computer program product
CN111477530B (en) 2019-01-24 2023-05-05 卡尔蔡司MultiSEM有限责任公司 Method for imaging 3D samples using a multi-beam particle microscope
DE102019005362A1 (en) 2019-07-31 2021-02-04 Carl Zeiss Multisem Gmbh Method for operating a multitude particle beam system with changing the numerical aperture, associated computer program product and multitude particle beam system

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3491236A (en) * 1967-09-28 1970-01-20 Gen Electric Electron beam fabrication of microelectronic circuit patterns
US3857034A (en) * 1970-08-31 1974-12-24 Max Planck Gesellschaft Scanning charged beam particle beam microscope
US4209698A (en) * 1971-12-28 1980-06-24 Max-Planck-Gesellschaft Zur Forderung Der Wissenschaften E.V. Transmission-type charged particle beam apparatus
JPS52119178A (en) * 1976-03-31 1977-10-06 Toshiba Corp Electron beam exposure device
JPS56114269A (en) * 1980-02-15 1981-09-08 Internatl Precision Inc Scanning type electronic microscope
FR2488043A1 (en) * 1980-07-30 1982-02-05 Le N Proizv Probe dia. variation device for electron beam analysis - uses two beam deflectors and has fixed multi-aperture plate
NL8200559A (en) * 1982-02-15 1983-09-01 Ir Jan Bart Le Poole Prof Dr IRRADIATION DEVICE WITH BUNDLE SPLIT.
US4694178A (en) * 1985-06-28 1987-09-15 Control Data Corporation Multiple channel electron beam optical column lithography system and method of operation
NL8502275A (en) * 1985-08-19 1987-03-16 Philips Nv BUNDLE LOADED PARTICULARS DIVIDED IN SLIM PART BUNDLES.
US4859856A (en) * 1988-01-11 1989-08-22 International Business Machines Corporation Telecentric sub-field deflection with vail
GB9005204D0 (en) * 1990-03-08 1990-05-02 Superion Ltd Apparatus and methods relating to scanning ion beams
US5892224A (en) * 1996-05-13 1999-04-06 Nikon Corporation Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams
JPH1062503A (en) * 1996-08-13 1998-03-06 Nikon Corp Defect inspection device
US5747801A (en) * 1997-01-24 1998-05-05 University Of Florida Method and device for improved trapping efficiency of injected ions for quadrupole ion traps
GB9802112D0 (en) * 1998-01-30 1998-04-01 Shimadzu Res Lab Europe Ltd Method of trapping ions in an ion trapping device
US6124592A (en) * 1998-03-18 2000-09-26 Technispan Llc Ion mobility storage trap and method
JP2000252207A (en) * 1998-08-19 2000-09-14 Ims Ionen Mikrofab Syst Gmbh Particle multibeam lithography
US6252412B1 (en) * 1999-01-08 2001-06-26 Schlumberger Technologies, Inc. Method of detecting defects in patterned substrates
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column
US6465783B1 (en) * 1999-06-24 2002-10-15 Nikon Corporation High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors
JP2001077002A (en) * 1999-09-02 2001-03-23 Nikon Corp Method and device for charged particle beam alignment and manufacture of semiconductor device
AU1926501A (en) * 1999-11-23 2001-06-04 Ion Diagnostics, Inc. Electron optics for multi-beam electron beam lithography tool
EP1150327B1 (en) * 2000-04-27 2018-02-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi beam charged particle device
US6586746B1 (en) * 2000-09-27 2003-07-01 International Business Machines Corporation Multipole electrostatic e-beam deflector
EP1273907A4 (en) * 2000-11-17 2006-08-30 Ebara Corp Wafer inspecting method, wafer inspecting instrument, and electron beam apparatus

Also Published As

Publication number Publication date
WO2001084592A1 (en) 2001-11-08
EP1150327B1 (en) 2018-02-14
EP1150327A1 (en) 2001-10-31
US6943349B2 (en) 2005-09-13
US20030168606A1 (en) 2003-09-11

Similar Documents

Publication Publication Date Title
AU2001273976A1 (en) Multi beam charged particle device
AU2001228515A1 (en) Optical column for charged particle beam device
AU2002215304A1 (en) Particle guidance system
AU2003276900A1 (en) Charged particle beam system
AU5228200A (en) Ion generating device
AU2001252960A1 (en) Biological particle sorter
AU2002218476A1 (en) Ion generator
AU1995800A (en) Particle manipulation
AU2002222123A1 (en) Electrostatic device
AU2001288471A1 (en) Milled particles
EP1047101A3 (en) Ion implanter
AU2001291547A1 (en) Particle concentrator
AU2002305449A1 (en) Ion trap
AU2706200A (en) Uv-absorbing particles
AU2002216639A1 (en) Focused ion beam system
AU2001250306A1 (en) Column for a charged particle beam device
AU2002219349A1 (en) An improved sorting system
AU2002239190A1 (en) Ion sorces
AU2001288156A1 (en) Beam adjusting device
AU2001242546A1 (en) Cable deflector plate
AU1533801A (en) Particle size distribution analyser
AU2002346252A1 (en) Particle probe
AUPQ761900A0 (en) Structural beam
AU1275001A (en) Solid particles
AU4723800A (en) Focusing device