AU2001250306A1 - Column for a charged particle beam device - Google Patents

Column for a charged particle beam device

Info

Publication number
AU2001250306A1
AU2001250306A1 AU2001250306A AU5030601A AU2001250306A1 AU 2001250306 A1 AU2001250306 A1 AU 2001250306A1 AU 2001250306 A AU2001250306 A AU 2001250306A AU 5030601 A AU5030601 A AU 5030601A AU 2001250306 A1 AU2001250306 A1 AU 2001250306A1
Authority
AU
Australia
Prior art keywords
column
charged particle
particle beam
beam device
charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001250306A
Inventor
Pavel Adamec
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of AU2001250306A1 publication Critical patent/AU2001250306A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H01J2237/04737—Changing particle velocity accelerating with electrostatic means radio-frequency quadrupole [RFQ]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems
    • H01J2237/04924—Lens systems electrostatic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
AU2001250306A 2000-01-24 2001-01-24 Column for a charged particle beam device Abandoned AU2001250306A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP00101373A EP1120810B1 (en) 2000-01-24 2000-01-24 Column for a charged particle beam device
EP00101373 2000-01-24
PCT/EP2001/000744 WO2001054162A1 (en) 2000-01-24 2001-01-24 Column for a charged particle beam device

Publications (1)

Publication Number Publication Date
AU2001250306A1 true AU2001250306A1 (en) 2001-07-31

Family

ID=8167690

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001250306A Abandoned AU2001250306A1 (en) 2000-01-24 2001-01-24 Column for a charged particle beam device

Country Status (8)

Country Link
US (1) US6825476B2 (en)
EP (1) EP1120810B1 (en)
JP (1) JP3787091B2 (en)
KR (1) KR100543382B1 (en)
CN (1) CN1229849C (en)
AU (1) AU2001250306A1 (en)
DE (1) DE60045439D1 (en)
WO (1) WO2001054162A1 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3968334B2 (en) * 2002-09-11 2007-08-29 株式会社日立ハイテクノロジーズ Charged particle beam apparatus and charged particle beam irradiation method
US6949895B2 (en) * 2003-09-03 2005-09-27 Axcelis Technologies, Inc. Unipolar electrostatic quadrupole lens and switching methods for charged beam transport
US7375326B2 (en) * 2004-06-21 2008-05-20 Applied Materials, Israel, Ltd. Method and system for focusing a charged particle beam
US7315029B2 (en) * 2005-09-30 2008-01-01 Applied Materials, Inc. Electrostatic deflection system with low aberrations and vertical beam incidence
KR101251432B1 (en) * 2005-11-16 2013-04-05 전자빔기술센터 주식회사 Magnetic deflector for electron column
EP1801838B1 (en) * 2005-12-20 2012-05-09 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam emitting device and method for operating a charged particle beam emitting device
EP1830385A1 (en) * 2006-03-01 2007-09-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Ion beam apparatus and method for aligning same
KR100946270B1 (en) * 2008-08-12 2010-03-09 주식회사 메가젠임플란트 Dental instrument for cutting soft tissue
WO2010039339A2 (en) * 2008-09-30 2010-04-08 Carl Zeiss Smt Inc. Aligning charged particle beams
EP2579265B1 (en) * 2010-05-27 2015-12-02 Mitsubishi Electric Corporation Particle beam irradiation system
US9171694B2 (en) 2013-11-26 2015-10-27 Kla-Tencor Corporation Asymmetric electrostatic quadrupole deflector for improved field uniformity
EP2879155B1 (en) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Multi-beam system for high throughput EBI
CN109637692B (en) * 2019-01-23 2023-12-19 深圳铭杰医疗科技有限公司 Trajectory corrector suitable for charged particle beam
CN112086332A (en) * 2020-09-27 2020-12-15 北京中科科仪股份有限公司 Electrostatic deflection device and deflection method thereof
CN116246923B (en) * 2022-12-30 2023-11-14 广东省科学院半导体研究所 Electron beam focusing deflection system and electron beam light column

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2584234B1 (en) * 1985-06-28 1988-12-09 Cameca INTEGRATED CIRCUIT TESTER WITH ELECTRON BEAM
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
JP2706192B2 (en) * 1991-11-06 1998-01-28 富士通株式会社 Electron beam exposure system
US5393985A (en) * 1992-11-26 1995-02-28 Shimadzu Corporation Apparatus for focusing an ion beam
JP3356270B2 (en) * 1997-11-27 2002-12-16 株式会社日立製作所 Scanning electron microscope
US6452175B1 (en) * 1999-04-15 2002-09-17 Applied Materials, Inc. Column for charged particle beam device
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column

Also Published As

Publication number Publication date
EP1120810B1 (en) 2010-12-29
US6825476B2 (en) 2004-11-30
EP1120810A1 (en) 2001-08-01
JP3787091B2 (en) 2006-06-21
KR100543382B1 (en) 2006-01-20
WO2001054162A1 (en) 2001-07-26
CN1404618A (en) 2003-03-19
KR20020070354A (en) 2002-09-05
US20030075686A1 (en) 2003-04-24
DE60045439D1 (en) 2011-02-10
CN1229849C (en) 2005-11-30
JP2003520408A (en) 2003-07-02

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