AU1891299A - Illuminating device and exposure apparatus - Google Patents

Illuminating device and exposure apparatus

Info

Publication number
AU1891299A
AU1891299A AU18912/99A AU1891299A AU1891299A AU 1891299 A AU1891299 A AU 1891299A AU 18912/99 A AU18912/99 A AU 18912/99A AU 1891299 A AU1891299 A AU 1891299A AU 1891299 A AU1891299 A AU 1891299A
Authority
AU
Australia
Prior art keywords
exposure apparatus
illuminating device
illuminating
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU18912/99A
Other languages
English (en)
Inventor
Noriaki Tokuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU1891299A publication Critical patent/AU1891299A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU18912/99A 1998-01-19 1999-01-19 Illuminating device and exposure apparatus Abandoned AU1891299A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP10-7452 1998-01-19
JP745298 1998-01-19
JP10-38960 1998-02-20
JP3896098 1998-02-20
PCT/JP1999/000160 WO1999036832A1 (fr) 1998-01-19 1999-01-19 Dispositif d'eclairement et appareil de sensibilisation

Publications (1)

Publication Number Publication Date
AU1891299A true AU1891299A (en) 1999-08-02

Family

ID=26341747

Family Applications (1)

Application Number Title Priority Date Filing Date
AU18912/99A Abandoned AU1891299A (en) 1998-01-19 1999-01-19 Illuminating device and exposure apparatus

Country Status (2)

Country Link
AU (1) AU1891299A (fr)
WO (1) WO1999036832A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6628370B1 (en) * 1996-11-25 2003-09-30 Mccullough Andrew W. Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
WO2003023832A1 (fr) * 2001-09-07 2003-03-20 Nikon Corporation Procede et systeme d'exposition, et procede de construction de dispositif associe
JP4268813B2 (ja) * 2003-02-14 2009-05-27 大日本印刷株式会社 露光方法及び露光装置
JP5225433B2 (ja) * 2004-06-04 2013-07-03 キヤノン株式会社 照明光学系及び露光装置
US7173688B2 (en) * 2004-12-28 2007-02-06 Asml Holding N.V. Method for calculating an intensity integral for use in lithography systems
JP2008544531A (ja) * 2005-06-21 2008-12-04 カール ツァイス エスエムテー アーゲー 瞳ファセットミラー上に減衰素子を備えた二重ファセット照明光学系
JP4310349B2 (ja) * 2007-04-20 2009-08-05 キヤノン株式会社 露光装置及びデバイス製造方法
US7843549B2 (en) * 2007-05-23 2010-11-30 Asml Holding N.V. Light attenuating filter for correcting field dependent ellipticity and uniformity
JP5182588B2 (ja) * 2008-04-29 2013-04-17 株式会社ニコン オプティカルインテグレータ、照明光学系、露光装置、およびデバイス製造方法
KR101653009B1 (ko) * 2008-07-14 2016-08-31 가부시키가이샤 니콘 조명 광학계, 노광 장치, 및 노광 방법
JP4921512B2 (ja) 2009-04-13 2012-04-25 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
CN109196423B (zh) * 2016-05-06 2021-08-27 株式会社尼康 光束扫描装置
JP6761306B2 (ja) * 2016-08-30 2020-09-23 キヤノン株式会社 照明光学系、リソグラフィ装置、及び物品製造方法
JP6740107B2 (ja) * 2016-11-30 2020-08-12 Hoya株式会社 マスクブランク、転写用マスク及び半導体デバイスの製造方法
JP7446068B2 (ja) * 2019-09-03 2024-03-08 キヤノン株式会社 露光装置、および、物品の製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0540240A (ja) * 1991-08-08 1993-02-19 Matsushita Electric Ind Co Ltd 照明光学系
JP3277589B2 (ja) * 1992-02-26 2002-04-22 株式会社ニコン 投影露光装置及び方法
JPH09223661A (ja) * 1996-02-15 1997-08-26 Nikon Corp 露光装置

Also Published As

Publication number Publication date
WO1999036832A1 (fr) 1999-07-22

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase