ATE7823T1 - Entwickler und verfahren zum entwickeln strahlenempfindlicher platten unter verwendung derselben. - Google Patents

Entwickler und verfahren zum entwickeln strahlenempfindlicher platten unter verwendung derselben.

Info

Publication number
ATE7823T1
ATE7823T1 AT81300301T AT81300301T ATE7823T1 AT E7823 T1 ATE7823 T1 AT E7823T1 AT 81300301 T AT81300301 T AT 81300301T AT 81300301 T AT81300301 T AT 81300301T AT E7823 T1 ATE7823 T1 AT E7823T1
Authority
AT
Austria
Prior art keywords
radiation sensitive
developers
same
developer
sensitive plates
Prior art date
Application number
AT81300301T
Other languages
English (en)
Inventor
Jeremy Russel Burch
David Edward Murray
Original Assignee
Vickers Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=10510965&utm_source=***_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE7823(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Vickers Limited filed Critical Vickers Limited
Application granted granted Critical
Publication of ATE7823T1 publication Critical patent/ATE7823T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
  • Electrotherapy Devices (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT81300301T 1980-01-29 1981-01-23 Entwickler und verfahren zum entwickeln strahlenempfindlicher platten unter verwendung derselben. ATE7823T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8002934 1980-01-29
EP81300301A EP0033232B2 (de) 1980-01-29 1981-01-23 Entwickler und Verfahren zum Entwickeln strahlenempfindlicher Platten unter Verwendung derselben

Publications (1)

Publication Number Publication Date
ATE7823T1 true ATE7823T1 (de) 1984-06-15

Family

ID=10510965

Family Applications (1)

Application Number Title Priority Date Filing Date
AT81300301T ATE7823T1 (de) 1980-01-29 1981-01-23 Entwickler und verfahren zum entwickeln strahlenempfindlicher platten unter verwendung derselben.

Country Status (19)

Country Link
US (1) US4350756A (de)
EP (1) EP0033232B2 (de)
AT (1) ATE7823T1 (de)
AU (1) AU543918B2 (de)
BR (1) BR8100520A (de)
CA (1) CA1165610A (de)
DE (1) DE3162627D1 (de)
DK (1) DK160848C (de)
ES (1) ES498879A0 (de)
FI (1) FI72395C (de)
GB (1) GB2068136B (de)
HU (1) HU187293B (de)
IE (1) IE50592B1 (de)
KE (1) KE3465A (de)
MW (1) MW481A1 (de)
NO (1) NO810299L (de)
NZ (1) NZ196110A (de)
ZA (1) ZA81518B (de)
ZW (1) ZW1781A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
DE3140186A1 (de) * 1981-10-09 1983-04-28 Hoechst Ag, 6230 Frankfurt Entwickler und verfahren zum entwickeln fuer belichtete negativ-arbeitende reproduktionsschichten
US4436807A (en) 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
US4824769A (en) * 1984-10-15 1989-04-25 Allied Corporation High contrast photoresist developer
DE3439597A1 (de) * 1984-10-30 1986-04-30 Hoechst Ag, 6230 Frankfurt Entwickler fuer belichtete negativ arbeitende reproduktionsschichten sowie verfahren zur herstellung von druckformen und verwendung des entwicklers
GB2167572A (en) * 1984-11-23 1986-05-29 Colin George Thompson Photo mechanical imaging
US4786582A (en) * 1985-08-02 1988-11-22 Hoechst Celanese Corporation Organic solvent free developer for photosensitive coatings
US4714670A (en) * 1986-06-09 1987-12-22 Imperial Metal & Chemical Company Developer including an aliphatic cyclic carbonate in the oil phase emulsion
US4780396A (en) * 1987-02-17 1988-10-25 Hoechst Celanese Corporation Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant
US5081003A (en) * 1987-07-27 1992-01-14 Hoechst Celanese Corporation Developer compositions for newspaper plates
US4851324A (en) * 1987-07-27 1989-07-25 Hoechst Celanese Corporation Phenoxy propanol containing developer compositions for lithographic plates having neutral pH
US4873174A (en) * 1988-02-03 1989-10-10 Hoechst Celanese Corporation Method of using developer-finisher compositions for lithographic plates
US4912021A (en) * 1988-02-03 1990-03-27 Hoechst Celanese Corporation Developer-finisher compositions for lithographic plates
US5278030A (en) * 1988-10-24 1994-01-11 Du Pont-Howson Limited Developer solution comprising ethyl hexyl sulphate, a surfactant, an alkaline material and having a pH of not less than 12
GB8918161D0 (en) * 1989-08-09 1989-09-20 Du Pont Improvements in or relating to radiation sensitive compounds
US5122438A (en) * 1989-11-02 1992-06-16 Konica Corporation Method for developing a waterless light-sensitive lithographic plate
US5279927A (en) * 1992-07-23 1994-01-18 Eastman Kodak Company Aqueous developer for lithographic printing plates with improved desensitizing capability
US5316892A (en) * 1992-07-23 1994-05-31 Eastman Kodak Company Method for developing lithographic printing plates
US5380623A (en) * 1992-12-17 1995-01-10 Eastman Kodak Company Aqueous developer for lithographic printing plates which provides improved oleophilicity
EP0602736B1 (de) * 1992-12-17 1997-11-05 Eastman Kodak Company Wässriger Entwickler für lithographische Druckplatten der zu einer verringerten Schlammbildung führt
US5582964A (en) * 1994-04-14 1996-12-10 Fuji Photo Film Co., Ltd. Photographic material having a syndiotactic styrenic polymer containing support
EP0732628A1 (de) 1995-03-07 1996-09-18 Minnesota Mining And Manufacturing Company Wässrig-alkalische Lösung zum Entwickeln von Flachdruckplatten
US6383717B1 (en) 2000-10-11 2002-05-07 Kodak Polychrome Graphics, Llc Aqueous developer for negative working lithographic printing plates
US7316891B2 (en) * 2002-03-06 2008-01-08 Agfa Graphics Nv Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution
CN100573342C (zh) * 2004-05-19 2009-12-23 爱克发印艺公司 制造光聚合物印版的方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE624160A (de) * 1961-10-30
GB1220808A (en) * 1967-05-18 1971-01-27 Howson Algraphy Ltd Processing of presensitized photolithographic printing plate
US3547632A (en) * 1967-11-16 1970-12-15 Eastman Kodak Co Method of lithographic reproduction and solution to render image areas oleophilic
DE1767384A1 (de) * 1968-05-04 1971-11-18 Henkel & Cie Gmbh Schaumarme Spuel- und Reinigungsmittel fuer die Geschirreinigung
US3707373A (en) * 1969-03-17 1972-12-26 Eastman Kodak Co Lithographic plate developers
US3745028A (en) * 1971-04-26 1973-07-10 Eastman Kodak Co Lithographic plate desensitizer formulations
US4147545A (en) * 1972-11-02 1979-04-03 Polychrome Corporation Photolithographic developing composition with organic lithium compound
US4055515A (en) * 1975-12-31 1977-10-25 Borden, Inc. Developer for printing plates
DE2925363C2 (de) * 1978-06-23 1985-09-05 Fuji Photo Film Co., Ltd., Minami-Ashigara, Kanagawa Schutzmittel vom Emulsionstyp für die Oberfläche von lithographischen Druckplatten
JPS5542890A (en) * 1978-09-22 1980-03-26 Fuji Photo Film Co Ltd Desensitizing solution for lithographic printing
US4287082A (en) * 1980-02-22 1981-09-01 The Procter & Gamble Company Homogeneous enzyme-containing liquid detergent compositions containing saturated acids

Also Published As

Publication number Publication date
NO810299L (no) 1981-07-30
GB2068136B (en) 1984-09-05
AU543918B2 (en) 1985-05-09
EP0033232B1 (de) 1984-06-06
HU187293B (en) 1985-12-28
FI810229L (fi) 1981-07-30
FI72395B (fi) 1987-01-30
EP0033232B2 (de) 1988-08-24
US4350756A (en) 1982-09-21
AU6669981A (en) 1981-08-06
ES8204348A1 (es) 1982-05-01
EP0033232A1 (de) 1981-08-05
DK160848C (da) 1991-10-07
FI72395C (fi) 1987-05-11
DE3162627D1 (en) 1984-07-12
NZ196110A (en) 1983-06-17
CA1165610A (en) 1984-04-17
IE50592B1 (en) 1986-05-14
GB2068136A (en) 1981-08-05
ZW1781A1 (en) 1981-12-09
ZA81518B (en) 1982-02-24
DK160848B (da) 1991-04-22
ES498879A0 (es) 1982-05-01
MW481A1 (en) 1982-07-14
DK37881A (da) 1981-07-30
KE3465A (en) 1984-11-09
BR8100520A (pt) 1981-08-18
IE810163L (en) 1981-07-29

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
UEP Publication of translation of european patent specification
EEIH Change in the person of patent owner
REN Ceased due to non-payment of the annual fee