ATE552918T1 - Vorrichtung und verfahren zur erzeugung von schichten und herstellungsverfahren für einen piezoelektrischen aktuator - Google Patents

Vorrichtung und verfahren zur erzeugung von schichten und herstellungsverfahren für einen piezoelektrischen aktuator

Info

Publication number
ATE552918T1
ATE552918T1 AT06017585T AT06017585T ATE552918T1 AT E552918 T1 ATE552918 T1 AT E552918T1 AT 06017585 T AT06017585 T AT 06017585T AT 06017585 T AT06017585 T AT 06017585T AT E552918 T1 ATE552918 T1 AT E552918T1
Authority
AT
Austria
Prior art keywords
film forming
chamber
film
measuring
measuring chamber
Prior art date
Application number
AT06017585T
Other languages
English (en)
Inventor
Motohiro Yasui
Jun Akedo
Original Assignee
Brother Ind Ltd
Nat Inst Of Advanced Ind Scien
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brother Ind Ltd, Nat Inst Of Advanced Ind Scien filed Critical Brother Ind Ltd
Application granted granted Critical
Publication of ATE552918T1 publication Critical patent/ATE552918T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
    • H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Spray Control Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
AT06017585T 2005-08-24 2006-08-23 Vorrichtung und verfahren zur erzeugung von schichten und herstellungsverfahren für einen piezoelektrischen aktuator ATE552918T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005243130 2005-08-24

Publications (1)

Publication Number Publication Date
ATE552918T1 true ATE552918T1 (de) 2012-04-15

Family

ID=37526963

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06017585T ATE552918T1 (de) 2005-08-24 2006-08-23 Vorrichtung und verfahren zur erzeugung von schichten und herstellungsverfahren für einen piezoelektrischen aktuator

Country Status (4)

Country Link
US (1) US7908993B2 (de)
EP (1) EP1757373B1 (de)
CN (1) CN1920094B (de)
AT (1) ATE552918T1 (de)

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WO2009094622A2 (en) * 2008-01-24 2009-07-30 Microcontinuum, Inc. Vacuum coating techniques
US9604245B2 (en) 2008-06-13 2017-03-28 Kateeva, Inc. Gas enclosure systems and methods utilizing an auxiliary enclosure
US8899171B2 (en) 2008-06-13 2014-12-02 Kateeva, Inc. Gas enclosure assembly and system
US9048344B2 (en) 2008-06-13 2015-06-02 Kateeva, Inc. Gas enclosure assembly and system
US8383202B2 (en) 2008-06-13 2013-02-26 Kateeva, Inc. Method and apparatus for load-locked printing
US10442226B2 (en) 2008-06-13 2019-10-15 Kateeva, Inc. Gas enclosure assembly and system
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
JP5107285B2 (ja) * 2009-03-04 2012-12-26 東京エレクトロン株式会社 成膜装置、成膜方法、プログラム、およびコンピュータ可読記憶媒体
JP5921093B2 (ja) * 2010-12-10 2016-05-24 株式会社東芝 試料汚染方法
US9120344B2 (en) 2011-08-09 2015-09-01 Kateeva, Inc. Apparatus and method for control of print gap
KR20190101506A (ko) 2011-08-09 2019-08-30 카티바, 인크. 하향 인쇄 장치 및 방법
CN102433533B (zh) * 2011-12-26 2013-08-28 东北大学 一种制备高分子功能薄膜的真空喷射镀膜机
CN102534511B (zh) * 2012-02-28 2013-10-16 东北大学 一种气相沉积薄膜的装置及其使用方法
KR101878084B1 (ko) 2013-12-26 2018-07-12 카티바, 인크. 전자 장치의 열 처리를 위한 장치 및 기술
US9343678B2 (en) 2014-01-21 2016-05-17 Kateeva, Inc. Apparatus and techniques for electronic device encapsulation
KR102458181B1 (ko) 2014-01-21 2022-10-21 카티바, 인크. 전자 장치 인캡슐레이션을 위한 기기 및 기술
EP3138123B1 (de) 2014-04-30 2021-06-02 Kateeva, Inc. Gaspolstervorrichtung und techniken zur substratbeschichtung
KR102068882B1 (ko) 2014-11-26 2020-01-21 카티바, 인크. 환경적으로 제어되는 코팅 시스템
DE102015012425A1 (de) 2015-09-25 2017-03-30 Michaela Bruckner Vorrichtung zur aerosolbasierten Kaltabscheidung ( Aerosol-Depositions-Methode, ADM)
KR102117068B1 (ko) * 2018-01-30 2020-05-29 (주)에스티아이 잉크젯 인쇄장치 및 이를 이용한 인쇄방법
CN110370818B (zh) * 2019-07-26 2020-10-13 深圳市华星光电半导体显示技术有限公司 一种喷墨打印装置及方法
KR102649715B1 (ko) * 2020-10-30 2024-03-21 세메스 주식회사 표면 처리 장치 및 표면 처리 방법

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JP4111276B2 (ja) 2004-02-26 2008-07-02 Ｔｄｋ株式会社 磁気記録媒体及び磁気記録再生装置

Also Published As

Publication number Publication date
CN1920094A (zh) 2007-02-28
EP1757373B1 (de) 2012-04-11
CN1920094B (zh) 2010-05-12
US20070044713A1 (en) 2007-03-01
US7908993B2 (en) 2011-03-22
EP1757373A1 (de) 2007-02-28

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