ATE551701T1 - Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren - Google Patents

Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren

Info

Publication number
ATE551701T1
ATE551701T1 AT07860354T AT07860354T ATE551701T1 AT E551701 T1 ATE551701 T1 AT E551701T1 AT 07860354 T AT07860354 T AT 07860354T AT 07860354 T AT07860354 T AT 07860354T AT E551701 T1 ATE551701 T1 AT E551701T1
Authority
AT
Austria
Prior art keywords
ray
intensity distribution
vicinity
wavefront
reflective surface
Prior art date
Application number
AT07860354T
Other languages
English (en)
Inventor
Kazuto Yamauchi
Hidekazu Mimura
Hiromi Okada
Original Assignee
Jtec Corp
Univ Osaka
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jtec Corp, Univ Osaka filed Critical Jtec Corp
Application granted granted Critical
Publication of ATE551701T1 publication Critical patent/ATE551701T1/de

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/10—Mirrors with curved faces
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
AT07860354T 2006-12-28 2007-12-27 Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren ATE551701T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006357566A JP4814782B2 (ja) 2006-12-28 2006-12-28 位相回復法を用いたｘ線集光方法及びその装置
PCT/JP2007/075132 WO2008081873A1 (ja) 2006-12-28 2007-12-27 位相回復法を用いたｘ線集光方法及びその装置

Publications (1)

Publication Number Publication Date
ATE551701T1 true ATE551701T1 (de) 2012-04-15

Family

ID=39588553

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07860354T ATE551701T1 (de) 2006-12-28 2007-12-27 Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren

Country Status (5)

Country Link
US (1) US7936860B2 (de)
EP (1) EP2063434B1 (de)
JP (1) JP4814782B2 (de)
AT (1) ATE551701T1 (de)
WO (1) WO2008081873A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2174170A1 (de) * 2007-07-27 2010-04-14 SELEX Galileo S.p.A. Vorläufige kontrollierte vordeformationsbehandlung zur herstellung von spiegeln
JP5343251B2 (ja) 2009-02-27 2013-11-13 株式会社ジェイテック Ｘ線ナノビーム強度分布の精密測定方法及びその装置
JP5756982B2 (ja) 2009-12-28 2015-07-29 株式会社ジェイテック Ｘ線集光方法、反射面形状制御ミラー装置及び反射面形状制御ミラーの製造方法
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
JP6074784B2 (ja) * 2011-12-08 2017-02-08 国立大学法人 千葉大学 ホログラムデータ作成プログラム
JP5942190B2 (ja) * 2012-06-27 2016-06-29 株式会社ジェイテック 二重反射型ｘ線ミラーを用いた斜入射ｘ線結像光学装置
JP6043906B2 (ja) * 2012-07-04 2016-12-14 株式会社ジェイテックコーポレーション 集光径可変なｘ線集光システム及びその使用方法
CN104376524B (zh) * 2014-09-16 2017-08-01 浙江农林大学 基于光阑加密和相位恢复算法的二值图像加密方法
CN104376526B (zh) * 2014-10-24 2017-06-09 浙江农林大学 基于涡旋光束和相位恢复算法的图像加密方法
CN104376525B (zh) * 2014-10-24 2017-07-18 浙江农林大学 基于迭代非线性双随机相位编码的图像加密方法
CN117941011A (zh) * 2021-10-01 2024-04-26 国立大学法人东海国立大学机构 可变形镜以及x射线装置
CN113936840B (zh) * 2021-10-22 2023-08-25 中国科学院上海高等研究院 一种温控x射线变形镜
CN114200664B (zh) * 2021-11-11 2023-09-05 常州北邮新一代信息技术研究院有限公司 基于改进相位差算法的自适应光学***

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4429953A (en) * 1980-09-29 1984-02-07 Visidyne, Inc. Curved glass reflector and method of making same
JPH06120121A (ja) * 1992-10-08 1994-04-28 Toshiba Corp Ｘ線リソグラフィ装置
JP3259373B2 (ja) * 1992-11-27 2002-02-25 株式会社日立製作所 露光方法及び露光装置
JPH08271697A (ja) 1995-03-28 1996-10-18 Canon Inc Ｘ線顕微鏡用光学装置
JP3634550B2 (ja) 1997-04-03 2005-03-30 株式会社ルネサステクノロジ 投影レンズの収差測定方法
US6014423A (en) * 1998-02-19 2000-01-11 Osmic, Inc. Multiple corner Kirkpatrick-Baez beam conditioning optic assembly
US6041099A (en) * 1998-02-19 2000-03-21 Osmic, Inc. Single corner kirkpatrick-baez beam conditioning optic assembly
JP2000091209A (ja) * 1998-09-14 2000-03-31 Nikon Corp 露光装置の製造方法、露光装置、及びデバイス製造方法
JP2000100685A (ja) * 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
US6555828B1 (en) * 1998-11-17 2003-04-29 The Regents Of The University Of California Method and apparatus for inspecting reflection masks for defects
JP3774588B2 (ja) 1999-04-06 2006-05-17 キヤノン株式会社 投影露光装置の波面測定方法、及び投影露光装置
JP2003515728A (ja) * 1999-11-24 2003-05-07 ビーティージー・インターナショナル・リミテッド Ｘ線ズームレンズ
JP2001272358A (ja) * 2000-03-24 2001-10-05 Nikon Corp Ｘ線試料検査装置
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
US6897940B2 (en) * 2002-06-21 2005-05-24 Nikon Corporation System for correcting aberrations and distortions in EUV lithography
US6803994B2 (en) * 2002-06-21 2004-10-12 Nikon Corporation Wavefront aberration correction system
US7125128B2 (en) * 2004-01-26 2006-10-24 Nikon Corporation Adaptive-optics actuator arrays and methods for using such arrays
JP2005308629A (ja) * 2004-04-23 2005-11-04 Canon Inc ミラーユニット及びそれの製造方法
US7403593B1 (en) * 2004-09-28 2008-07-22 Bruker Axs, Inc. Hybrid x-ray mirrors

Also Published As

Publication number Publication date
JP2008164553A (ja) 2008-07-17
US7936860B2 (en) 2011-05-03
WO2008081873A1 (ja) 2008-07-10
EP2063434A1 (de) 2009-05-27
JP4814782B2 (ja) 2011-11-16
EP2063434B1 (de) 2012-03-28
EP2063434A4 (de) 2010-12-29
US20100183122A1 (en) 2010-07-22

Similar Documents

Publication Publication Date Title
ATE551701T1 (de) Röntgenstrahlenverdichtungsverfahren und vorrichtung mit phasenwiederherstellungsverfahren
HK1139745A1 (en) Illumination optical system, exposure apparatus, and device manufacturing method
ATE424787T1 (de) Intraokularvorrichtung mit fokussierstärken/optiken
ATE512375T1 (de) Optoelektrischer ultraschallsensor und -system
MX2009004286A (es) Dispositivo para cirugia de ojo con laser optico.
WO2006102026A3 (en) Focusing system using light source and image sensor
TW200627086A (en) Lithographic apparatus and device manufacturing method
WO2006069040A3 (en) Method and apparatus for adjusting relative disposition of projection optics based on operating conditions
FR2985820B1 (fr) Appareil a objectif a focale variable avec reglage de mise au point et dispositif d'imagerie optique associe
TW200636316A (en) Method of fixing optical member and optical unit
RU2013126207A (ru) Бинокулярная лупа с изменяемой оптической силой, использующая технологию линзы, заполненной жидкостью
JP2010169496A5 (de)
TW200739034A (en) Light-plane projecting apparatus and lens
MY161574A (en) Method and device for measuring optical properties of an optically variable marking applied to an object
ATE451866T1 (de) Messung der oberflächentopographie und wellenaberration eines linsensystems
TW200606398A (en) Methods and apparatus for determining three dimensional configurations
WO2005069080A3 (de) Vorrichtung und verfahren zur optischen vermessung eines optischen systems, messstrukturträger und mikrolithographie-projektionsbelichtungsanlage
SG138552A1 (en) Wave front sensor with grey filter and lithographic apparatus comprising same
WO2009002574A3 (en) Ophthalmic endoilluminator with variable-wedge rotating-disk beam attenuator
ATE526867T1 (de) Endoilluminator für das auge mit rotationsscheibenstrahlabschwächer mit variablem keil
JP2011504247A5 (de)
JP2007206550A5 (de)
WO2008095738A3 (de) Verfahren und vorrichtung zum laserschweissen
WO2009016403A3 (en) Optical alignment apparatus and method therefor
TW200801838A (en) Lithographic apparatus, lens interferometer and device manufacturing method