ATE524056T1 - Interferometervorrichtung und verfahren - Google Patents

Interferometervorrichtung und verfahren

Info

Publication number
ATE524056T1
ATE524056T1 AT08168889T AT08168889T ATE524056T1 AT E524056 T1 ATE524056 T1 AT E524056T1 AT 08168889 T AT08168889 T AT 08168889T AT 08168889 T AT08168889 T AT 08168889T AT E524056 T1 ATE524056 T1 AT E524056T1
Authority
AT
Austria
Prior art keywords
grating
detector
phase
phase grating
electromagnetic radiation
Prior art date
Application number
AT08168889T
Other languages
English (en)
Inventor
Christian Kottler
Rolf Kaufmann
Original Assignee
Suisse Electronique Microtech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suisse Electronique Microtech filed Critical Suisse Electronique Microtech
Application granted granted Critical
Publication of ATE524056T1 publication Critical patent/ATE524056T1/de

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness
    • G01B15/025—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness by measuring absorption
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02024—Measuring in transmission, i.e. light traverses the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/041—Phase-contrast imaging, e.g. using grating interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/30—Grating as beam-splitter
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
    • G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Radiology & Medical Imaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Biochemistry (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
AT08168889T 2007-11-15 2008-11-12 Interferometervorrichtung und verfahren ATE524056T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US98827807P 2007-11-15 2007-11-15

Publications (1)

Publication Number Publication Date
ATE524056T1 true ATE524056T1 (de) 2011-09-15

Family

ID=40403911

Family Applications (1)

Application Number Title Priority Date Filing Date
AT08168889T ATE524056T1 (de) 2007-11-15 2008-11-12 Interferometervorrichtung und verfahren

Country Status (4)

Country Link
US (1) US7924973B2 (de)
EP (1) EP2060909B1 (de)
JP (1) JP5583336B2 (de)
AT (1) ATE524056T1 (de)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5339975B2 (ja) * 2008-03-13 2013-11-13 キヤノン株式会社 Ｘ線位相イメージングに用いられる位相格子、該位相格子を用いたｘ線位相コントラスト像の撮像装置、ｘ線コンピューター断層撮影システム
CN101413905B (zh) * 2008-10-10 2011-03-16 深圳大学 X射线微分干涉相衬成像***
CN102395877B (zh) * 2009-04-17 2014-04-09 西门子公司 用于进行相衬测量的检测装置和x射线断层摄影仪以及进行相衬测量的方法
JP5586899B2 (ja) * 2009-08-26 2014-09-10 キヤノン株式会社 Ｘ線用位相格子及びその製造方法
US9025725B2 (en) 2009-09-16 2015-05-05 Konica Minolta Medical & Graphic, Inc. X-ray image capturing apparatus, X-ray imaging system and X-ray image creation method
CN102781327B (zh) * 2009-12-10 2015-06-17 皇家飞利浦电子股份有限公司 相衬成像
WO2011114845A1 (ja) * 2010-03-18 2011-09-22 コニカミノルタエムジー株式会社 Ｘ線撮影システム
JP5548085B2 (ja) * 2010-03-30 2014-07-16 富士フイルム株式会社 回折格子の調整方法
CN102221565B (zh) * 2010-04-19 2013-06-12 清华大学 X射线源光栅步进成像***与成像方法
KR101180067B1 (ko) 2010-05-25 2012-09-05 단국대학교 산학협력단 엑스선 직렬 격자 간섭계
US8995614B2 (en) 2010-09-29 2015-03-31 Konica Minolta Medical & Graphic, Inc. Method for displaying medical images and medical image display system
US9861330B2 (en) * 2010-10-19 2018-01-09 Koninklijke Philips N.V. Differential phase-contrast imaging
WO2012052881A1 (en) * 2010-10-19 2012-04-26 Koninklijke Philips Electronics N.V. Differential phase-contrast imaging
KR101904033B1 (ko) 2010-10-27 2018-10-04 코넬 유니버시티 광 필드 이미지 센서, 방법들 및 응용들
JP2012095865A (ja) * 2010-11-02 2012-05-24 Fujifilm Corp 放射線撮影装置、放射線撮影システム
JP2012120653A (ja) * 2010-12-07 2012-06-28 Fujifilm Corp 放射線撮影装置、及び放射線撮影システム
JP2012157690A (ja) * 2011-01-14 2012-08-23 Fujifilm Corp 放射線画像撮影装置および放射線画像検出器
JP6126535B2 (ja) * 2011-02-01 2017-05-10 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 集束偏向構造板を用いた微分位相コントラスト撮像法
CN103348415B (zh) * 2011-02-07 2016-05-25 皇家飞利浦有限公司 具有增大的动态范围的微分相衬成像
AU2012264598B2 (en) * 2011-06-01 2016-03-10 Total Sa An X-ray tomography device
WO2012164090A1 (en) * 2011-06-01 2012-12-06 Total Sa An x-ray tomography device
JP6353361B2 (ja) * 2011-07-04 2018-07-04 コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． 位相コントラストイメージング装置
US9486175B2 (en) 2011-07-04 2016-11-08 Koninklijke Philips N.V. Phase contrast imaging apparatus
WO2013028196A1 (en) 2011-08-25 2013-02-28 Alliance For Sustainable Energy, Llc On-line, continuous monitoring in solar cell and fuel cell manufacturing using spectral reflectance imaging
EP2761586B1 (de) * 2011-08-31 2022-10-12 Koninklijke Philips N.V. Differenzielle phasenkontrastbildgebung mit energieempfindlichem nachweis
EP2586373B1 (de) 2011-10-28 2014-12-03 CSEM Centre Suisse D'electronique Et De Microtechnique SA Röntgenstrahleninterferometer
US9655576B2 (en) 2011-11-08 2017-05-23 NanoRay Biotech Co., Ltd. X-ray phase-shift contrast imaging method and system thereof
TWI476506B (zh) * 2011-11-08 2015-03-11 Gamc Biotech Dev Co Ltd Ｘ光相位差對比成像的方法及其系統
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
WO2013111050A1 (en) * 2012-01-24 2013-08-01 Koninklijke Philips N.V. Multi-directional phase contrast x-ray imaging
US20130226330A1 (en) * 2012-02-24 2013-08-29 Alliance For Sustainable Energy, Llc Optical techniques for monitoring continuous manufacturing of proton exchange membrane fuel cell components
EP2822468B1 (de) * 2012-03-05 2017-11-01 University Of Rochester Verfahren und vorrichtung für differenzielle phasenkontrast-fächerstrahl-ct, kegelstrahl-ct und hybrid-kegelstrahl-ct
CN103356223B (zh) * 2012-04-01 2015-07-08 中国科学院高能物理研究所 用于人体医学检测的 ct 成像***及方法
WO2013184213A2 (en) * 2012-05-14 2013-12-12 The General Hospital Corporation A distributed, field emission-based x-ray source for phase contrast imaging
KR101378757B1 (ko) * 2012-08-30 2014-03-27 한국원자력연구원 물질 원소 정보 획득 및 영상 차원의 선택이 가능한 방사선 영상화 장치
US8989347B2 (en) 2012-12-19 2015-03-24 General Electric Company Image reconstruction method for differential phase contrast X-ray imaging
US9360439B2 (en) 2012-12-19 2016-06-07 Industrial Technology Research Institute Imaging system
US10578563B2 (en) 2012-12-21 2020-03-03 Carestream Health, Inc. Phase contrast imaging computed tomography scanner
WO2014100063A1 (en) * 2012-12-21 2014-06-26 Carestream Health, Inc. Medical radiographic grating based differential phase contrast imaging
US9014333B2 (en) 2012-12-31 2015-04-21 General Electric Company Image reconstruction methods for differential phase contrast X-ray imaging
KR20140111818A (ko) * 2013-03-12 2014-09-22 삼성전자주식회사 엑스선 영상 장치 및 그 제어 방법
US10297359B2 (en) 2013-09-19 2019-05-21 Sigray, Inc. X-ray illumination system with multiple target microstructures
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
US10269528B2 (en) 2013-09-19 2019-04-23 Sigray, Inc. Diverging X-ray sources using linear accumulation
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
US10304580B2 (en) 2013-10-31 2019-05-28 Sigray, Inc. Talbot X-ray microscope
CN104622492A (zh) * 2013-11-11 2015-05-20 中国科学技术大学 一种x射线光栅相位衬度成像装置和方法
JP2015166676A (ja) * 2014-03-03 2015-09-24 キヤノン株式会社 Ｘ線撮像システム
WO2015135003A2 (en) * 2014-03-04 2015-09-11 California Institute Of Technology Directional optical receiver
US10401309B2 (en) 2014-05-15 2019-09-03 Sigray, Inc. X-ray techniques using structured illumination
CN105628718A (zh) * 2014-11-04 2016-06-01 同方威视技术股份有限公司 多能谱x射线光栅成像***与成像方法
US10117629B2 (en) 2014-12-03 2018-11-06 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College High energy grating techniques
JP6451400B2 (ja) * 2015-02-26 2019-01-16 コニカミノルタ株式会社 画像処理システム及び画像処理装置
US10352880B2 (en) 2015-04-29 2019-07-16 Sigray, Inc. Method and apparatus for x-ray microscopy
US9581434B2 (en) * 2015-06-30 2017-02-28 National Taiwan University Of Science And Technology Apparatus and method for measuring pattern of a grating device
US10295486B2 (en) 2015-08-18 2019-05-21 Sigray, Inc. Detector for X-rays with high spatial and high spectral resolution
EP3232934B1 (de) * 2015-12-25 2022-03-16 Shanghai United Imaging Healthcare Co., Ltd. Vorrichtung, system und verfahren für strahlungsbasierte bildgebung
CN107807139B (zh) * 2016-09-05 2020-04-24 天津工业大学 一种无步进装置的双能x射线相衬成像***及其实现方法
CN109964118A (zh) * 2016-11-10 2019-07-02 皇家飞利浦有限公司 基于光栅的相位对比成像
US10480935B2 (en) 2016-12-02 2019-11-19 Alliance For Sustainable Energy, Llc Thickness mapping using multispectral imaging
US10247683B2 (en) 2016-12-03 2019-04-02 Sigray, Inc. Material measurement techniques using multiple X-ray micro-beams
CN106618623B (zh) * 2017-01-11 2019-08-30 合肥工业大学 一次曝光的硬x射线光栅干涉仪的成像方法
JP6753342B2 (ja) * 2017-03-15 2020-09-09 株式会社島津製作所 放射線格子検出器およびｘ線検査装置
JP6937380B2 (ja) 2017-03-22 2021-09-22 シグレイ、インコーポレイテッド Ｘ線分光を実施するための方法およびｘ線吸収分光システム
EP3378396A1 (de) 2017-03-23 2018-09-26 Koninklijke Philips N.V. Röntgenbilddatenverarbeitungsvorrichtung und verfahren
US10578566B2 (en) 2018-04-03 2020-03-03 Sigray, Inc. X-ray emission spectrometer system
US10845491B2 (en) 2018-06-04 2020-11-24 Sigray, Inc. Energy-resolving x-ray detection system
GB2591630B (en) 2018-07-26 2023-05-24 Sigray Inc High brightness x-ray reflection source
US10656105B2 (en) 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
US10962491B2 (en) 2018-09-04 2021-03-30 Sigray, Inc. System and method for x-ray fluorescence with filtering
DE112019004478T5 (de) 2018-09-07 2021-07-08 Sigray, Inc. System und verfahren zur röntgenanalyse mit wählbarer tiefe
US11143605B2 (en) 2019-09-03 2021-10-12 Sigray, Inc. System and method for computed laminography x-ray fluorescence imaging
US11175243B1 (en) 2020-02-06 2021-11-16 Sigray, Inc. X-ray dark-field in-line inspection for semiconductor samples
JP7395775B2 (ja) 2020-05-18 2023-12-11 シグレイ、インコーポレイテッド 結晶解析装置及び複数の検出器素子を使用するｘ線吸収分光法のためのシステム及び方法
WO2022061347A1 (en) 2020-09-17 2022-03-24 Sigray, Inc. System and method using x-rays for depth-resolving metrology and analysis
US11686692B2 (en) 2020-12-07 2023-06-27 Sigray, Inc. High throughput 3D x-ray imaging system using a transmission x-ray source
WO2023177981A1 (en) 2022-03-15 2023-09-21 Sigray, Inc. System and method for compact laminography utilizing microfocus transmission x-ray source and variable magnification x-ray detector
US11885755B2 (en) 2022-05-02 2024-01-30 Sigray, Inc. X-ray sequential array wavelength dispersive spectrometer

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5812629A (en) * 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
US6804324B2 (en) * 2001-03-01 2004-10-12 Osmo, Inc. X-ray phase contrast imaging using a fabry-perot interferometer concept
JP4445397B2 (ja) * 2002-12-26 2010-04-07 敦 百生 Ｘ線撮像装置および撮像方法
EP1447046A1 (de) 2003-02-14 2004-08-18 Paul Scherrer Institut Vorrichtung und Verfahren zur Aufnahme von Phasenkontrast-Röntgenbildern
US20050190882A1 (en) 2003-04-04 2005-09-01 Mcguire Edward L. Multi-spectral x-ray image processing
JP4608679B2 (ja) * 2005-03-17 2011-01-12 財団法人新産業創造研究機構 Ｘ線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法
EP1731099A1 (de) 2005-06-06 2006-12-13 Paul Scherrer Institut Interferometer zur quantitativen Phasenkontrastbildgebung und -tomographie mit einer inkohärenten polychromatischen Röntgenquelle
WO2007074029A1 (de) 2005-12-27 2007-07-05 Siemens Aktiengesellschaft Fokus- detektor- anordnung zur erzeugung von phasenkontrast-röntgenaufnahmen und verfahren hierzu
DE102006046034A1 (de) * 2006-02-01 2007-08-16 Siemens Ag Röntgen-CT-System zur Erzeugung projektiver und tomographischer Phasenkontrastaufnahmen
DE102006037256B4 (de) * 2006-02-01 2017-03-30 Paul Scherer Institut Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen sowie Röntgensystem, Röntgen-C-Bogen-System und Röntgen-CT-System
DE102006015356B4 (de) * 2006-02-01 2016-09-22 Siemens Healthcare Gmbh Verfahren zur Erzeugung projektiver und tomographischer Phasenkontrastaufnahmen mit einem Röntgen-System
DE102006017291B4 (de) * 2006-02-01 2017-05-24 Paul Scherer Institut Fokus/Detektor-System einer Röntgenapparatur zur Erzeugung von Phasenkontrastaufnahmen, Röntgensystem mit einem solchen Fokus/Detektor-System sowie zugehöriges Speichermedium und Verfahren
DE102006037281A1 (de) * 2006-02-01 2007-08-09 Siemens Ag Röntgenoptisches Durchstrahlungsgitter einer Fokus-Detektor-Anordnung einer Röntgenapparatur zur Erzeugung projektiver oder tomographischer Phasenkontrastaufnahmen von einem Untersuchungsobjekt
DE102006017290B4 (de) * 2006-02-01 2017-06-22 Siemens Healthcare Gmbh Fokus/Detektor-System einer Röntgenapparatur, Röntgen-System und Verfahren zur Erzeugung von Phasenkontrastaufnahmen

Also Published As

Publication number Publication date
US7924973B2 (en) 2011-04-12
EP2060909A1 (de) 2009-05-20
EP2060909B1 (de) 2011-09-07
JP5583336B2 (ja) 2014-09-03
JP2009150875A (ja) 2009-07-09
US20090128830A1 (en) 2009-05-21

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