ATE518249T1 - Abstimmbares halbleiterbauelement - Google Patents

Abstimmbares halbleiterbauelement

Info

Publication number
ATE518249T1
ATE518249T1 AT04822011T AT04822011T ATE518249T1 AT E518249 T1 ATE518249 T1 AT E518249T1 AT 04822011 T AT04822011 T AT 04822011T AT 04822011 T AT04822011 T AT 04822011T AT E518249 T1 ATE518249 T1 AT E518249T1
Authority
AT
Austria
Prior art keywords
collector
sub
discontinuous
active area
performance characteristics
Prior art date
Application number
AT04822011T
Other languages
English (en)
Inventor
Gregory Freeman
Jae-Sung Rieh
David Sheridan
Onge Stephen St
Andreas Stricker
Steven Voldman
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of ATE518249T1 publication Critical patent/ATE518249T1/de

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66363—Thyristors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821—Collector regions of bipolar transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083—Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834—Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66242—Heterojunction transistors [HBT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73—Bipolar junction transistors
    • H01L29/737—Hetero-junction transistors
    • H01L29/7371—Vertical transistors
    • H01L29/7378—Vertical transistors comprising lattice mismatched active layers, e.g. SiGe strained layer transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/872—Schottky diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/92—Capacitors having potential barriers
    • H01L29/93—Variable capacitance diodes, e.g. varactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
AT04822011T 2004-04-22 2004-04-22 Abstimmbares halbleiterbauelement ATE518249T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2004/012321 WO2005114738A1 (en) 2004-04-22 2004-04-22 Tuneable semiconductor device

Publications (1)

Publication Number Publication Date
ATE518249T1 true ATE518249T1 (de) 2011-08-15

Family

ID=35428622

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04822011T ATE518249T1 (de) 2004-04-22 2004-04-22 Abstimmbares halbleiterbauelement

Country Status (7)

Country Link
US (1) US7709930B2 (de)
EP (1) EP1745515B1 (de)
JP (1) JP4979573B2 (de)
KR (1) KR100951241B1 (de)
CN (1) CN1943034B (de)
AT (1) ATE518249T1 (de)
WO (1) WO2005114738A1 (de)

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US7550787B2 (en) * 2005-05-31 2009-06-23 International Business Machines Corporation Varied impurity profile region formation for varying breakdown voltage of devices
US7888745B2 (en) * 2006-06-21 2011-02-15 International Business Machines Corporation Bipolar transistor with dual shallow trench isolation and low base resistance
US7390720B2 (en) 2006-10-05 2008-06-24 International Business Machines Corporation Local collector implant structure for heterojunction bipolar transistors and method of forming the same
US7927958B1 (en) * 2007-05-15 2011-04-19 National Semiconductor Corporation System and method for providing a self aligned bipolar transistor using a silicon nitride ring
US8796809B2 (en) * 2008-09-08 2014-08-05 Cree, Inc. Varactor diode with doped voltage blocking layer
CN101819994A (zh) * 2010-04-29 2010-09-01 上海宏力半导体制造有限公司 SiGe异质结双极型晶体管及其制备方法
CN101916725B (zh) * 2010-07-23 2015-03-18 上海华虹宏力半导体制造有限公司 一种双极型晶体管的制作方法
CN102412274B (zh) * 2011-01-13 2014-02-26 上海华虹宏力半导体制造有限公司 锗硅hbt工艺中垂直寄生型pnp器件及制造方法
US8415763B2 (en) 2011-03-31 2013-04-09 International Business Machines Corporation Tunable semiconductor device
CN102412275B (zh) * 2011-09-22 2013-06-12 上海华虹Nec电子有限公司 锗硅BiCMOS工艺中纵向PNP器件及制作方法
US8377754B1 (en) * 2011-10-10 2013-02-19 International Business Machines Corporation Stress enhanced junction engineering for latchup SCR
CN102412279B (zh) * 2011-10-24 2014-08-13 上海华虹宏力半导体制造有限公司 锗硅bicmos工艺中垂直寄生型pnp三极管及制造方法
CN102412284B (zh) * 2011-10-24 2014-10-08 上海华虹宏力半导体制造有限公司 锗硅hbt工艺中垂直寄生型pnp三极管及其制造方法
CN103094329B (zh) * 2011-11-08 2016-02-10 上海华虹宏力半导体制造有限公司 具有深赝埋层的锗硅hbt器件及其制造方法
CN102412287B (zh) * 2011-11-08 2013-07-24 上海华虹Nec电子有限公司 锗硅hbt器件及其制造方法
US9059138B2 (en) 2012-01-25 2015-06-16 International Business Machines Corporation Heterojunction bipolar transistor with reduced sub-collector length, method of manufacture and design structure
US8786051B2 (en) 2012-02-21 2014-07-22 International Business Machines Corporation Transistor having a monocrystalline center section and a polycrystalline outer section, and narrow in-substrate collector region for reduced base-collector junction capacitance
EP2725615B1 (de) 2012-10-29 2019-01-23 IMEC vzw Halbleiterbauelement mit einer Diode und mit einem Bipolartransistor und Verfahren zur Herstellung einer solchen Vorrichtung
US8796149B1 (en) * 2013-02-18 2014-08-05 International Business Machines Corporation Collector-up bipolar junction transistors in BiCMOS technology
US9496250B2 (en) * 2014-12-08 2016-11-15 Globalfoundries Inc. Tunable scaling of current gain in bipolar junction transistors
WO2016178837A1 (en) * 2015-05-07 2016-11-10 Finscale Inc. Semiconductor devices made of vertical planar elements and methods of their fabrication
US11069797B2 (en) 2016-05-25 2021-07-20 Ideal Power Inc. Ruggedized symmetrically bidirectional bipolar power transistor
US10319716B2 (en) 2017-05-05 2019-06-11 Newport Fab, Llc Substrate isolation for low-loss radio frequency (RF) circuits
US10290631B2 (en) 2017-05-05 2019-05-14 Newport Fab, Llc Linearity and lateral isolation in a BiCMOS process through counter-doping of epitaxial silicon region
CN109103241A (zh) * 2018-08-23 2018-12-28 盛世瑶兰（深圳）科技有限公司 碳化硅肖特基器件及其制备方法
WO2023188867A1 (ja) * 2022-03-30 2023-10-05 ローム株式会社 半導体装置

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Also Published As

Publication number Publication date
JP2007534173A (ja) 2007-11-22
KR100951241B1 (ko) 2010-04-05
US20070215978A1 (en) 2007-09-20
WO2005114738A1 (en) 2005-12-01
CN1943034B (zh) 2011-11-16
CN1943034A (zh) 2007-04-04
EP1745515A1 (de) 2007-01-24
JP4979573B2 (ja) 2012-07-18
KR20070004035A (ko) 2007-01-05
EP1745515B1 (de) 2011-07-27
US7709930B2 (en) 2010-05-04
EP1745515A4 (de) 2009-04-01

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