ATE501464T1 - Nanoimprint lithographie in mehrschichtsystemem - Google Patents
Nanoimprint lithographie in mehrschichtsystememInfo
- Publication number
- ATE501464T1 ATE501464T1 AT03078683T AT03078683T ATE501464T1 AT E501464 T1 ATE501464 T1 AT E501464T1 AT 03078683 T AT03078683 T AT 03078683T AT 03078683 T AT03078683 T AT 03078683T AT E501464 T1 ATE501464 T1 AT E501464T1
- Authority
- AT
- Austria
- Prior art keywords
- substrate
- nanoimprint lithography
- mould
- layer system
- pattern
- Prior art date
Links
- 238000001127 nanoimprint lithography Methods 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 6
- 230000000181 anti-adherent effect Effects 0.000 abstract 1
- 239000011247 coating layer Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
- B29C33/60—Releasing, lubricating or separating agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Mechanical Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03078683A EP1533657B1 (de) | 2003-11-21 | 2003-11-21 | Nanoimprint Lithographie in Mehrschichtsystemem |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE501464T1 true ATE501464T1 (de) | 2011-03-15 |
Family
ID=34429454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03078683T ATE501464T1 (de) | 2003-11-21 | 2003-11-21 | Nanoimprint lithographie in mehrschichtsystemem |
Country Status (4)
Country | Link |
---|---|
US (2) | US20060040058A1 (de) |
EP (1) | EP1533657B1 (de) |
AT (1) | ATE501464T1 (de) |
DE (1) | DE60336322D1 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9040090B2 (en) | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
JP6067954B2 (ja) | 2003-12-19 | 2017-01-25 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒルThe University Of North Carolina At Chapel Hill | ナノサイズ物品、及びソフトリソグラフィー又はインプリントリソグラフィーを用いる分離構造の作製方法によって製造されたナノサイズ物品 |
CN101604124B (zh) * | 2005-06-08 | 2011-07-27 | 佳能株式会社 | 模子、图案形成方法以及图案形成设备 |
JP4290177B2 (ja) | 2005-06-08 | 2009-07-01 | キヤノン株式会社 | モールド、アライメント方法、パターン形成装置、パターン転写装置、及びチップの製造方法 |
US7854873B2 (en) | 2005-06-10 | 2010-12-21 | Obducat Ab | Imprint stamp comprising cyclic olefin copolymer |
EP1959299B1 (de) | 2005-06-10 | 2012-12-26 | Obducat AB | Musterreplikation mit Zwischenstempel |
US8808808B2 (en) | 2005-07-22 | 2014-08-19 | Molecular Imprints, Inc. | Method for imprint lithography utilizing an adhesion primer layer |
US7759407B2 (en) | 2005-07-22 | 2010-07-20 | Molecular Imprints, Inc. | Composition for adhering materials together |
US8846195B2 (en) | 2005-07-22 | 2014-09-30 | Canon Nanotechnologies, Inc. | Ultra-thin polymeric adhesion layer |
US8557351B2 (en) | 2005-07-22 | 2013-10-15 | Molecular Imprints, Inc. | Method for adhering materials together |
WO2007046110A1 (en) * | 2005-10-19 | 2007-04-26 | Indian Institute Of Technology, Kanpur | A method and apparatus for the formation of patterns on surfaces and an assembly and alignment of the structure thereof |
US7862756B2 (en) * | 2006-03-30 | 2011-01-04 | Asml Netherland B.V. | Imprint lithography |
US7780431B2 (en) * | 2006-09-14 | 2010-08-24 | Hewlett-Packard Development Company, L.P. | Nanoimprint molds and methods of forming the same |
WO2009034954A1 (ja) * | 2007-09-13 | 2009-03-19 | Asahi Glass Co., Ltd. | TiO2含有石英ガラス基板 |
JP5638523B2 (ja) * | 2008-07-17 | 2014-12-10 | エージェンシー・フォー・サイエンス・テクノロジー・アンド・リサーチ | ポリマー構造上にインプリントを作製する方法 |
US8361546B2 (en) | 2008-10-30 | 2013-01-29 | Molecular Imprints, Inc. | Facilitating adhesion between substrate and patterned layer |
EP2199854B1 (de) | 2008-12-19 | 2015-12-16 | Obducat AB | Hybridpolymerform für nanoimprintverfahren und verfahren zu seiner herstellung |
EP2199855B1 (de) | 2008-12-19 | 2016-07-20 | Obducat | Verfahren und Prozesse zur Modifizierung von Polymermaterialoberflächeninteraktionen |
WO2011066450A2 (en) * | 2009-11-24 | 2011-06-03 | Molecular Imprints, Inc. | Adhesion layers in nanoimprint lithography |
US9321214B2 (en) | 2011-07-13 | 2016-04-26 | University Of Utah Research Foundation | Maskless nanoimprint lithography |
EP2892638A4 (de) * | 2012-09-06 | 2016-06-01 | Univ Colorado Regents | Filtrationsmembranen mit strukturen in nanomassstab |
DE102012112550A1 (de) * | 2012-12-18 | 2014-06-18 | Lpkf Laser & Electronics Ag | Verfahren zur Metallisierung eines Werkstücks sowie ein Schichtaufbau aus einem Werkstück und einer Metallschicht |
CN104625559B (zh) * | 2015-01-08 | 2017-03-15 | 哈尔滨工业大学 | 一种金属微热压印成形模具装置及方法 |
KR102569627B1 (ko) * | 2017-03-16 | 2023-08-22 | 위니베르시떼 덱스-마르세이유 | 나노임프린트 리소그래피 프로세스 및 그것으로부터 획득가능한 패터닝된 기재 |
CN108931884A (zh) * | 2017-05-27 | 2018-12-04 | 蓝思科技(长沙)有限公司 | 压印膜及压印装置 |
WO2022232819A1 (en) * | 2021-04-30 | 2022-11-03 | Magic Leap, Inc. | Imprint lithography process and methods on curved surfaces |
US20220390839A1 (en) * | 2021-06-03 | 2022-12-08 | Viavi Solutions Inc. | Method of replicating a microstructure pattern |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3972924A (en) * | 1975-03-24 | 1976-08-03 | The United States Of America As Represented By The Secretary Of Agriculture | 1-(1H,1H-perfluorooctyl)-1,3-trimethylenediphosphonic tetrachloride |
US5277788A (en) * | 1990-10-01 | 1994-01-11 | Aluminum Company Of America | Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article |
US6309580B1 (en) * | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
US6284345B1 (en) * | 1997-12-08 | 2001-09-04 | Washington University | Designer particles of micron and submicron dimension |
US6517995B1 (en) * | 1999-09-14 | 2003-02-11 | Massachusetts Institute Of Technology | Fabrication of finely featured devices by liquid embossing |
SE515607C2 (sv) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
EP1257878B1 (de) * | 2000-01-21 | 2006-07-05 | Obducat Aktiebolag | Form zur nanobedruckung |
JP2002270541A (ja) * | 2001-03-08 | 2002-09-20 | Matsushita Electric Ind Co Ltd | モールド、モールドの製造方法及びパターン形成方法 |
WO2003000236A1 (en) * | 2001-06-23 | 2003-01-03 | Lyotropic Therapeutics, Inc | Particles with improved solubilization capacity |
US20030017424A1 (en) * | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
US6824882B2 (en) * | 2002-05-31 | 2004-11-30 | 3M Innovative Properties Company | Fluorinated phosphonic acids |
-
2003
- 2003-11-21 AT AT03078683T patent/ATE501464T1/de not_active IP Right Cessation
- 2003-11-21 DE DE60336322T patent/DE60336322D1/de not_active Expired - Lifetime
- 2003-11-21 EP EP03078683A patent/EP1533657B1/de not_active Expired - Lifetime
-
2004
- 2004-11-19 US US10/992,322 patent/US20060040058A1/en not_active Abandoned
-
2008
- 2008-01-15 US US12/007,750 patent/US20080138460A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
DE60336322D1 (de) | 2011-04-21 |
EP1533657A1 (de) | 2005-05-25 |
EP1533657B1 (de) | 2011-03-09 |
US20060040058A1 (en) | 2006-02-23 |
US20080138460A1 (en) | 2008-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |