ATE463462T1 - Verfahren zur herstellung von mikrobearbeiteten anordnungen - Google Patents
Verfahren zur herstellung von mikrobearbeiteten anordnungenInfo
- Publication number
- ATE463462T1 ATE463462T1 AT01870213T AT01870213T ATE463462T1 AT E463462 T1 ATE463462 T1 AT E463462T1 AT 01870213 T AT01870213 T AT 01870213T AT 01870213 T AT01870213 T AT 01870213T AT E463462 T1 ATE463462 T1 AT E463462T1
- Authority
- AT
- Austria
- Prior art keywords
- wafer
- machined
- arrangements
- plane
- cleavage
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000003776 cleavage reaction Methods 0.000 abstract 3
- 230000007017 scission Effects 0.000 abstract 3
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00388—Etch mask forming
- B81C1/00404—Mask characterised by its size, orientation or shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/973—Substrate orientation
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Micromachines (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP00870227A EP1195352A1 (de) | 2000-10-09 | 2000-10-09 | Verfahren zur Herstellung von mikrobearbeiteten Anordnungen und derart hergestellte Anordnungen |
US23922600P | 2000-10-10 | 2000-10-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE463462T1 true ATE463462T1 (de) | 2010-04-15 |
Family
ID=26074298
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT01870213T ATE463462T1 (de) | 2000-10-09 | 2001-10-08 | Verfahren zur herstellung von mikrobearbeiteten anordnungen |
Country Status (4)
Country | Link |
---|---|
US (1) | US6740542B2 (de) |
JP (1) | JP4128764B2 (de) |
AT (1) | ATE463462T1 (de) |
DE (1) | DE60141737D1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004058267A (ja) * | 2002-06-03 | 2004-02-26 | Japan Science & Technology Corp | シリコン微小細線からなる3次元構造体、その製造方法及びそれを利用した装置 |
JP4836483B2 (ja) * | 2005-04-15 | 2011-12-14 | セイコーインスツル株式会社 | 半導体装置 |
US8389099B1 (en) | 2007-06-01 | 2013-03-05 | Rubicon Technology, Inc. | Asymmetrical wafer configurations and method for creating the same |
JP5724342B2 (ja) * | 2009-12-10 | 2015-05-27 | 大日本印刷株式会社 | パターン配置方法並びにシリコンウェハ及び半導体デバイスの製造方法 |
JP6091108B2 (ja) * | 2012-08-03 | 2017-03-08 | アズビル株式会社 | シリコンチューブの製造方法 |
JP2014137305A (ja) * | 2013-01-17 | 2014-07-28 | Seiko Instruments Inc | 変位検知装置及び変位検知装置の製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4278987A (en) * | 1977-10-17 | 1981-07-14 | Hitachi, Ltd. | Junction isolated IC with thick EPI portion having sides at least 20 degrees from (110) orientations |
DE3435138A1 (de) | 1984-09-25 | 1986-04-03 | Siemens AG, 1000 Berlin und 8000 München | Verbesserung zu einem verfahren zum vereinzeln von halbleiter-bauelementen, die durch brechen aus halbleiter-wafern gewonnen sind |
US4969359A (en) * | 1989-04-06 | 1990-11-13 | Ford Motor Company | Silicon accelerometer responsive to three orthogonal force components and method for fabricating |
JPH03219618A (ja) | 1990-01-24 | 1991-09-27 | Sony Corp | 描画方法と描画装置 |
US5349211A (en) | 1992-03-26 | 1994-09-20 | Nec Corporation | Semiconductor infrared emitting device with oblique side surface with respect to the cleavage |
DE4342767A1 (de) | 1993-12-15 | 1995-06-22 | Ant Nachrichtentech | Verfahren zur Herstellung einer quaderförmigen Vertiefung zur Aufnahme eines Bauelementes in einer Trägerplatte |
JP3219618B2 (ja) | 1994-12-13 | 2001-10-15 | 三菱重工業株式会社 | タイヤ加硫設備 |
US6213050B1 (en) * | 1998-12-01 | 2001-04-10 | Silicon Genesis Corporation | Enhanced plasma mode and computer system for plasma immersion ion implantation |
US6245584B1 (en) * | 1999-07-01 | 2001-06-12 | Advanced Micro Devices | Method for detecting adjustment error in photolithographic stepping printer |
US6440616B1 (en) * | 1999-09-28 | 2002-08-27 | Kabushiki Kaisha Toshiba | Mask and method for focus monitoring |
-
2001
- 2001-10-08 AT AT01870213T patent/ATE463462T1/de not_active IP Right Cessation
- 2001-10-08 DE DE60141737T patent/DE60141737D1/de not_active Expired - Lifetime
- 2001-10-09 US US09/973,277 patent/US6740542B2/en not_active Expired - Fee Related
- 2001-10-09 JP JP2001311468A patent/JP4128764B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2002192498A (ja) | 2002-07-10 |
US20020108926A1 (en) | 2002-08-15 |
JP4128764B2 (ja) | 2008-07-30 |
DE60141737D1 (de) | 2010-05-20 |
US6740542B2 (en) | 2004-05-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |