ATE438197T1 - Ein halterungssystem und ein verfahren zum modulieren von substratformen - Google Patents
Ein halterungssystem und ein verfahren zum modulieren von substratformenInfo
- Publication number
- ATE438197T1 ATE438197T1 AT03768879T AT03768879T ATE438197T1 AT E438197 T1 ATE438197 T1 AT E438197T1 AT 03768879 T AT03768879 T AT 03768879T AT 03768879 T AT03768879 T AT 03768879T AT E438197 T1 ATE438197 T1 AT E438197T1
- Authority
- AT
- Austria
- Prior art keywords
- chuck body
- recess
- recesses
- support region
- support system
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/62—Holders for the original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Toxicology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Theoretical Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Mathematical Physics (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Manufacturing Optical Record Carriers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/293,224 US7019819B2 (en) | 2002-11-13 | 2002-11-13 | Chucking system for modulating shapes of substrates |
US10/316,963 US6980282B2 (en) | 2002-12-11 | 2002-12-11 | Method for modulating shapes of substrates |
PCT/US2003/036012 WO2004044651A1 (en) | 2002-11-13 | 2003-11-12 | A chucking system and method for modulating shapes of substrates |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE438197T1 true ATE438197T1 (de) | 2009-08-15 |
Family
ID=32314388
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT10183090T ATE549743T1 (de) | 2002-11-13 | 2003-11-12 | Ein lithographiesystem mit einem halterungssystem |
AT09163924T ATE540427T1 (de) | 2002-11-13 | 2003-11-12 | Ein verfahren um formen von substraten zu modulieren |
AT03768879T ATE438197T1 (de) | 2002-11-13 | 2003-11-12 | Ein halterungssystem und ein verfahren zum modulieren von substratformen |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT10183090T ATE549743T1 (de) | 2002-11-13 | 2003-11-12 | Ein lithographiesystem mit einem halterungssystem |
AT09163924T ATE540427T1 (de) | 2002-11-13 | 2003-11-12 | Ein verfahren um formen von substraten zu modulieren |
Country Status (9)
Country | Link |
---|---|
EP (3) | EP2261966B1 (de) |
JP (1) | JP4391420B2 (de) |
KR (1) | KR101056505B1 (de) |
AT (3) | ATE549743T1 (de) |
AU (1) | AU2003291477A1 (de) |
DE (2) | DE20320446U1 (de) |
MY (1) | MY133312A (de) |
TW (1) | TWI302228B (de) |
WO (1) | WO2004044651A1 (de) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7019819B2 (en) | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
US7442336B2 (en) | 2003-08-21 | 2008-10-28 | Molecular Imprints, Inc. | Capillary imprinting technique |
JP4937750B2 (ja) * | 2003-05-14 | 2012-05-23 | モレキュラー・インプリンツ・インコーポレーテッド | インプリント・リソグラフィ・プロセス中にテンプレートを移動させるための方法、システム、ホルダ、アセンブリ |
US7019835B2 (en) * | 2004-02-19 | 2006-03-28 | Molecular Imprints, Inc. | Method and system to measure characteristics of a film disposed on a substrate |
US20050275311A1 (en) * | 2004-06-01 | 2005-12-15 | Molecular Imprints, Inc. | Compliant device for nano-scale manufacturing |
US20050270516A1 (en) * | 2004-06-03 | 2005-12-08 | Molecular Imprints, Inc. | System for magnification and distortion correction during nano-scale manufacturing |
JP4574240B2 (ja) | 2004-06-11 | 2010-11-04 | キヤノン株式会社 | 加工装置、加工方法、デバイス製造方法 |
US7635263B2 (en) | 2005-01-31 | 2009-12-22 | Molecular Imprints, Inc. | Chucking system comprising an array of fluid chambers |
JP3958344B2 (ja) | 2005-06-07 | 2007-08-15 | キヤノン株式会社 | インプリント装置、インプリント方法及びチップの製造方法 |
US7927089B2 (en) | 2005-06-08 | 2011-04-19 | Canon Kabushiki Kaisha | Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method |
EP1958025B1 (de) * | 2005-12-08 | 2011-05-18 | Molecular Imprints, Inc. | Verfahren zum ausstossen von zwischen einem substrat und einer form befindlichen gas |
JP4667524B2 (ja) * | 2006-04-03 | 2011-04-13 | モレキュラー・インプリンツ・インコーポレーテッド | 流体チャンバのアレイを備えるチャック・システム |
US8215946B2 (en) * | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
EP2548972A1 (de) | 2006-06-14 | 2013-01-23 | Verinata Health, Inc | Verfahren zur Diagnose fötaler Missbildungen |
NL2003380A (en) * | 2008-10-17 | 2010-04-20 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
US8652393B2 (en) | 2008-10-24 | 2014-02-18 | Molecular Imprints, Inc. | Strain and kinetics control during separation phase of imprint process |
US8309008B2 (en) * | 2008-10-30 | 2012-11-13 | Molecular Imprints, Inc. | Separation in an imprint lithography process |
KR101319353B1 (ko) * | 2009-12-23 | 2013-10-16 | 엘지디스플레이 주식회사 | 평판 표시 소자의 제조 장치 및 방법 |
TWI576229B (zh) * | 2010-04-27 | 2017-04-01 | 分子壓模公司 | 奈米壓印之安全分離技術 |
JP6004738B2 (ja) * | 2011-09-07 | 2016-10-12 | キヤノン株式会社 | インプリント装置、それを用いた物品の製造方法 |
JP5938218B2 (ja) * | 2012-01-16 | 2016-06-22 | キヤノン株式会社 | インプリント装置、物品の製造方法およびインプリント方法 |
JP6252098B2 (ja) | 2012-11-01 | 2017-12-27 | 信越化学工業株式会社 | 角形金型用基板 |
CN105934711B (zh) * | 2013-11-08 | 2019-10-25 | 佳能纳米技术公司 | 用于改进的覆盖纠正的低接触式压印光刻术模板卡盘*** |
JP6333031B2 (ja) * | 2014-04-09 | 2018-05-30 | キヤノン株式会社 | インプリント装置および物品の製造方法 |
KR102394754B1 (ko) | 2014-04-22 | 2022-05-04 | 에베 그룹 에. 탈너 게엠베하 | 나노구조를 엠보싱하기 위한 방법 및 장치 |
JP6497761B2 (ja) * | 2015-02-23 | 2019-04-10 | エム キューブド テクノロジーズ,インコーポレーテッドM Cubed Technologies, Inc. | 静電チャック用薄膜電極 |
US11454883B2 (en) * | 2016-11-14 | 2022-09-27 | Canon Kabushiki Kaisha | Template replication |
US10996560B2 (en) * | 2017-07-31 | 2021-05-04 | Canon Kabushiki Kaisha | Real-time correction of template deformation in nanoimprint lithography |
JP7134717B2 (ja) * | 2018-05-31 | 2022-09-12 | キヤノン株式会社 | インプリント装置、インプリント方法および物品製造方法 |
CN109895235B (zh) * | 2019-03-01 | 2023-09-15 | 佛山三劦智能科技有限公司 | 一种陶瓷自动注浆成型的模具夹具 |
JP7507641B2 (ja) | 2020-09-08 | 2024-06-28 | キヤノン株式会社 | 成形装置及び物品の製造方法 |
CN113370078A (zh) * | 2021-06-28 | 2021-09-10 | 徐州超杰电动车配件有限公司 | 一种电动车配件用的加工操作台 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06244269A (ja) * | 1992-09-07 | 1994-09-02 | Mitsubishi Electric Corp | 半導体製造装置並びに半導体製造装置におけるウエハ真空チャック装置及びガスクリーニング方法及び窒化膜形成方法 |
US5515167A (en) * | 1994-09-13 | 1996-05-07 | Hughes Aircraft Company | Transparent optical chuck incorporating optical monitoring |
US5772905A (en) | 1995-11-15 | 1998-06-30 | Regents Of The University Of Minnesota | Nanoimprint lithography |
US20030179354A1 (en) * | 1996-03-22 | 2003-09-25 | Nikon Corporation | Mask-holding apparatus for a light exposure apparatus and related scanning-exposure method |
JPH10172897A (ja) * | 1996-12-05 | 1998-06-26 | Nikon Corp | 基板アダプタ,基板保持装置及び基板保持方法 |
JPH11111819A (ja) | 1997-09-30 | 1999-04-23 | Asahi Kasei Micro Syst Co Ltd | ウェハーの固定方法及び露光装置 |
US6032997A (en) * | 1998-04-16 | 2000-03-07 | Excimer Laser Systems | Vacuum chuck |
US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
JP2000340510A (ja) * | 1999-05-31 | 2000-12-08 | Matsushita Electric Ind Co Ltd | プラズマ処理装置およびプラズマ処理方法 |
CA2399908A1 (en) * | 2000-02-10 | 2001-08-16 | Todd Dickinson | Array of individual arrays as substrate for bead-based simultaneous processing of samples and manufacturing method therefor |
CN1260778C (zh) * | 2000-12-04 | 2006-06-21 | 株式会社荏原制作所 | 基片加工方法 |
-
2003
- 2003-11-12 WO PCT/US2003/036012 patent/WO2004044651A1/en active Application Filing
- 2003-11-12 MY MYPI20034332A patent/MY133312A/en unknown
- 2003-11-12 DE DE20320446U patent/DE20320446U1/de not_active Expired - Lifetime
- 2003-11-12 TW TW092131719A patent/TWI302228B/zh active
- 2003-11-12 AT AT10183090T patent/ATE549743T1/de active
- 2003-11-12 DE DE60328626T patent/DE60328626D1/de not_active Expired - Lifetime
- 2003-11-12 AT AT09163924T patent/ATE540427T1/de active
- 2003-11-12 KR KR1020057008538A patent/KR101056505B1/ko active IP Right Grant
- 2003-11-12 EP EP10183090A patent/EP2261966B1/de not_active Expired - Lifetime
- 2003-11-12 EP EP03768879A patent/EP1567913B1/de not_active Expired - Lifetime
- 2003-11-12 AT AT03768879T patent/ATE438197T1/de active
- 2003-11-12 EP EP09163924A patent/EP2099066B1/de not_active Expired - Lifetime
- 2003-11-12 JP JP2004552099A patent/JP4391420B2/ja not_active Expired - Fee Related
- 2003-11-12 AU AU2003291477A patent/AU2003291477A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
TW200411340A (en) | 2004-07-01 |
AU2003291477A8 (en) | 2004-06-03 |
MY133312A (en) | 2007-11-30 |
EP2261966A3 (de) | 2010-12-29 |
DE60328626D1 (de) | 2009-09-10 |
JP4391420B2 (ja) | 2009-12-24 |
TWI302228B (en) | 2008-10-21 |
EP1567913B1 (de) | 2009-07-29 |
ATE549743T1 (de) | 2012-03-15 |
KR101056505B1 (ko) | 2011-08-11 |
EP2099066B1 (de) | 2012-01-04 |
DE20320446U1 (de) | 2005-01-27 |
ATE540427T1 (de) | 2012-01-15 |
WO2004044651A1 (en) | 2004-05-27 |
KR20050086591A (ko) | 2005-08-30 |
EP1567913A4 (de) | 2008-08-13 |
EP2261966B1 (de) | 2012-03-14 |
EP2099066A1 (de) | 2009-09-09 |
EP2261966A2 (de) | 2010-12-15 |
WO2004044651B1 (en) | 2004-08-05 |
AU2003291477A1 (en) | 2004-06-03 |
JP2006506814A (ja) | 2006-02-23 |
EP1567913A1 (de) | 2005-08-31 |
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Legal Events
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UEP | Publication of translation of european patent specification |
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