ATE363455T1 - Mesoporöser siliciumdioxidfilm ausgehend von tensid enthaltender lösung und verfahren zu dessen herstellung - Google Patents
Mesoporöser siliciumdioxidfilm ausgehend von tensid enthaltender lösung und verfahren zu dessen herstellungInfo
- Publication number
- ATE363455T1 ATE363455T1 AT99967535T AT99967535T ATE363455T1 AT E363455 T1 ATE363455 T1 AT E363455T1 AT 99967535 T AT99967535 T AT 99967535T AT 99967535 T AT99967535 T AT 99967535T AT E363455 T1 ATE363455 T1 AT E363455T1
- Authority
- AT
- Austria
- Prior art keywords
- film
- dehydroxylating
- present
- gas
- mesoporous
- Prior art date
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 10
- 238000000034 method Methods 0.000 title abstract 5
- 239000000377 silicon dioxide Substances 0.000 title abstract 5
- 239000004094 surface-active agent Substances 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 235000012239 silicon dioxide Nutrition 0.000 title 1
- 239000007789 gas Substances 0.000 abstract 4
- 238000005906 dihydroxylation reaction Methods 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- -1 silicon organic compound Chemical class 0.000 abstract 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 229940051841 polyoxyethylene ether Drugs 0.000 abstract 1
- 229920000056 polyoxyethylene ether Polymers 0.000 abstract 1
- 239000011148 porous material Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 238000002791 soaking Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 238000004528 spin coating Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
- C01B33/185—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process of crystalline silica-polymorphs having molecular sieve properties, e.g. silicalites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
- C01B37/02—Crystalline silica-polymorphs, e.g. silicalites dealuminated aluminosilicate zeolites
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02203—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen
- H01L21/02216—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Landscapes
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Compounds (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
- Paints Or Removers (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22088298A | 1998-12-23 | 1998-12-23 | |
US09/222,569 US6383466B1 (en) | 1998-12-28 | 1998-12-28 | Method of dehydroxylating a hydroxylated material and method of making a mesoporous film |
US33521099A | 1999-06-17 | 1999-06-17 | |
US36149999A | 1999-07-23 | 1999-07-23 | |
US09/413,062 US6329017B1 (en) | 1998-12-23 | 1999-10-04 | Mesoporous silica film from a solution containing a surfactant and methods of making same |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE363455T1 true ATE363455T1 (de) | 2007-06-15 |
Family
ID=27539816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT99967535T ATE363455T1 (de) | 1998-12-23 | 1999-12-23 | Mesoporöser siliciumdioxidfilm ausgehend von tensid enthaltender lösung und verfahren zu dessen herstellung |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP1144310B1 (de) |
JP (1) | JP4040255B2 (de) |
KR (1) | KR100536178B1 (de) |
CN (1) | CN1219700C (de) |
AT (1) | ATE363455T1 (de) |
AU (1) | AU2379900A (de) |
DE (1) | DE69936228T2 (de) |
IL (1) | IL143589A0 (de) |
WO (1) | WO2000039028A1 (de) |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6592980B1 (en) | 1999-12-07 | 2003-07-15 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
US6365266B1 (en) | 1999-12-07 | 2002-04-02 | Air Products And Chemicals, Inc. | Mesoporous films having reduced dielectric constants |
JP4856307B2 (ja) * | 2000-11-24 | 2012-01-18 | 株式会社アルバック | 多孔質sog膜の疎水化処理方法 |
US6559070B1 (en) * | 2000-04-11 | 2003-05-06 | Applied Materials, Inc. | Mesoporous silica films with mobile ion gettering and accelerated processing |
JP2001335652A (ja) * | 2000-05-29 | 2001-12-04 | Jsr Corp | 膜の製造方法および絶縁膜 |
AU2001273734B2 (en) * | 2000-06-09 | 2005-04-07 | The University Of Queensland | Improved silica membranes and process of production thereof |
AUPQ811300A0 (en) | 2000-06-09 | 2000-07-06 | University Of Queensland, The | Improved silica membrane and process of production therefor |
US6573131B2 (en) | 2000-07-13 | 2003-06-03 | The Regents Of The University Of California | Silica zeolite low-k dielectric thin films and methods for their production |
JP2002050620A (ja) * | 2000-08-07 | 2002-02-15 | Ulvac Japan Ltd | 多孔質絶縁膜形成装置 |
JP4855567B2 (ja) * | 2000-08-10 | 2012-01-18 | 達也 大久保 | シリカ系被膜の製造方法 |
US6548892B1 (en) * | 2000-08-31 | 2003-04-15 | Agere Systems Inc. | Low k dielectric insulator and method of forming semiconductor circuit structures |
JP4167388B2 (ja) | 2000-09-27 | 2008-10-15 | 株式会社東芝 | 半導体装置の製造方法 |
JP4889896B2 (ja) * | 2000-11-09 | 2012-03-07 | バッテル メモリアル インスティテュート | 多孔質シリカの脱ヒドロキシル化およびアルキル化のための真空/気相反応器 |
JP2002211914A (ja) * | 2001-01-15 | 2002-07-31 | Hitachi Chem Co Ltd | 薄膜製造用塗布液およびその製造方法 |
KR20040039368A (ko) * | 2001-09-17 | 2004-05-10 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 전자 장치 및 조성물 |
TW561634B (en) * | 2001-09-25 | 2003-11-11 | Rohm Co Ltd | Method for producing semiconductor device |
US7122880B2 (en) * | 2002-05-30 | 2006-10-17 | Air Products And Chemicals, Inc. | Compositions for preparing low dielectric materials |
JP4284083B2 (ja) | 2002-08-27 | 2009-06-24 | 株式会社アルバック | 多孔質シリカ膜の形成方法 |
TWI273090B (en) | 2002-09-09 | 2007-02-11 | Mitsui Chemicals Inc | Method for modifying porous film, modified porous film and use of same |
AU2003259447A1 (en) * | 2002-10-11 | 2004-05-04 | Koninklijke Philips Electronics N.V. | Electric device comprising phase change material |
US6699797B1 (en) | 2002-12-17 | 2004-03-02 | Intel Corporation | Method of fabrication of low dielectric constant porous metal silicate films |
USRE48202E1 (en) | 2002-12-19 | 2020-09-08 | Iii Holdings 6, Llc | Electric device comprising phase change material |
JP2004273786A (ja) * | 2003-03-10 | 2004-09-30 | Ulvac Japan Ltd | 疎水性多孔質sog膜の作製方法 |
CN101252030A (zh) * | 2004-03-02 | 2008-08-27 | 气体产品与化学公司 | 用于制备含溶剂的低介电材料的组合物 |
FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
EP1890964B1 (de) * | 2005-06-16 | 2016-08-10 | Agency for Science, Technology and Research | Mesozelluläre schaumstoffteilchen |
JP5165914B2 (ja) * | 2007-03-30 | 2013-03-21 | 三井化学株式会社 | 多孔質シリカフィルム及びその製造方法 |
US20100267553A1 (en) * | 2007-09-14 | 2010-10-21 | Nippon Oil Corporation | Tungsten-containing Mesoporous Silica Thin Film, Highly Hydrophilic Material Containing the Same, and Method for Producing Tungsten-Containing Mesoporous Silica Thin Film |
JP4598876B2 (ja) | 2008-04-02 | 2010-12-15 | 三井化学株式会社 | 組成物の製造方法、多孔質材料及びその形成方法、層間絶縁膜、半導体材料、半導体装置、並びに低屈折率表面保護膜 |
TW201407185A (zh) * | 2012-05-29 | 2014-02-16 | Kuraray Co | 抗反射膜 |
CN103803573B (zh) * | 2012-11-07 | 2016-01-20 | 中国石油化工股份有限公司 | 一种介孔二氧化硅分子筛的制备方法 |
WO2014148230A1 (ja) * | 2013-03-19 | 2014-09-25 | 株式会社クラレ | コーティング組成物及びそれを用いるメソポーラスシリカの製造方法 |
KR101601454B1 (ko) | 2014-07-25 | 2016-03-08 | 아주대학교산학협력단 | 2차원 템플레이트, 이의 제조 방법, 다공성 나노 시트, 이의 제조 방법 및 전극 구조체 |
CN105153446B (zh) * | 2015-10-09 | 2018-11-06 | 中国科学院深圳先进技术研究院 | 一种pmo薄膜的制备方法及应用 |
KR101866940B1 (ko) * | 2016-10-14 | 2018-07-24 | 한국에너지기술연구원 | 3차원 기공구조의 메조포러스 실리카 지지체를 포함하는 포름산 탈수소화 촉매 및 이의 제조방법 |
KR102267504B1 (ko) * | 2017-12-22 | 2021-06-21 | 주식회사 엘지화학 | 메조포러스 실리카 코팅층을 포함하는 광학 부재의 제조방법 및 이를 이용하여 제조된 광학 부재 |
WO2020143483A1 (zh) | 2019-01-11 | 2020-07-16 | 惠科股份有限公司 | X射线探测器、x射线探测器制造方法及医用设备 |
CN109841636B (zh) * | 2019-01-11 | 2021-04-16 | 惠科股份有限公司 | X射线探测器、x射线探测器光电转换层的制造方法及医用设备 |
CN115613012A (zh) * | 2022-09-22 | 2023-01-17 | 辽宁师范大学 | 一种图案化薄膜的制备方法 |
CN115537963B (zh) * | 2022-10-26 | 2023-10-27 | 湖州草本源新材料有限公司 | 一种二氧化硅气凝胶纤维、制备方法及其应用 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5470802A (en) * | 1994-05-20 | 1995-11-28 | Texas Instruments Incorporated | Method of making a semiconductor device using a low dielectric constant material |
US5504042A (en) * | 1994-06-23 | 1996-04-02 | Texas Instruments Incorporated | Porous dielectric material with improved pore surface properties for electronics applications |
US5622684A (en) * | 1995-06-06 | 1997-04-22 | Board Of Trustees Operating Michigan State University | Porous inorganic oxide materials prepared by non-ionic surfactant templating route |
US5736425A (en) * | 1995-11-16 | 1998-04-07 | Texas Instruments Incorporated | Glycol-based method for forming a thin-film nanoporous dielectric |
US5922299A (en) * | 1996-11-26 | 1999-07-13 | Battelle Memorial Institute | Mesoporous-silica films, fibers, and powders by evaporation |
US5858457A (en) * | 1997-09-25 | 1999-01-12 | Sandia Corporation | Process to form mesostructured films |
-
1999
- 1999-12-23 JP JP2000590948A patent/JP4040255B2/ja not_active Expired - Fee Related
- 1999-12-23 IL IL14358999A patent/IL143589A0/xx unknown
- 1999-12-23 WO PCT/US1999/030655 patent/WO2000039028A1/en active IP Right Grant
- 1999-12-23 CN CNB998150665A patent/CN1219700C/zh not_active Expired - Fee Related
- 1999-12-23 AU AU23799/00A patent/AU2379900A/en not_active Abandoned
- 1999-12-23 DE DE69936228T patent/DE69936228T2/de not_active Expired - Fee Related
- 1999-12-23 AT AT99967535T patent/ATE363455T1/de not_active IP Right Cessation
- 1999-12-23 EP EP99967535A patent/EP1144310B1/de not_active Expired - Lifetime
- 1999-12-23 KR KR20017008107A patent/KR100536178B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100536178B1 (ko) | 2005-12-12 |
CN1219700C (zh) | 2005-09-21 |
CN1335820A (zh) | 2002-02-13 |
JP4040255B2 (ja) | 2008-01-30 |
EP1144310A1 (de) | 2001-10-17 |
DE69936228T2 (de) | 2008-02-07 |
EP1144310B1 (de) | 2007-05-30 |
WO2000039028A1 (en) | 2000-07-06 |
JP2003520745A (ja) | 2003-07-08 |
AU2379900A (en) | 2000-07-31 |
KR20020024573A (ko) | 2002-03-30 |
DE69936228D1 (de) | 2007-07-12 |
IL143589A0 (en) | 2002-04-21 |
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