ATE360666T1 - Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren - Google Patents
Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatorenInfo
- Publication number
- ATE360666T1 ATE360666T1 AT01974127T AT01974127T ATE360666T1 AT E360666 T1 ATE360666 T1 AT E360666T1 AT 01974127 T AT01974127 T AT 01974127T AT 01974127 T AT01974127 T AT 01974127T AT E360666 T1 ATE360666 T1 AT E360666T1
- Authority
- AT
- Austria
- Prior art keywords
- photoinitiators
- collecting
- formulation
- producing coatings
- exposure
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000009472 formulation Methods 0.000 abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 abstract 1
- 230000005670 electromagnetic radiation Effects 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000006120 scratch resistant coating Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
- C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
- C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
- C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Inorganic Chemistry (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Silicon Polymers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00810720 | 2000-08-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE360666T1 true ATE360666T1 (de) | 2007-05-15 |
Family
ID=8174856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01974127T ATE360666T1 (de) | 2000-08-14 | 2001-08-07 | Verfahren zur herstellung von beschichtungen unter verwendung von sich an der oberfläche ansammelnden photoinitiatoren |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US7279200B2 (de) |
| EP (1) | EP1311627B1 (de) |
| JP (1) | JP5068413B2 (de) |
| KR (1) | KR100818643B1 (de) |
| CN (1) | CN1211439C (de) |
| AT (1) | ATE360666T1 (de) |
| AU (1) | AU2001293732A1 (de) |
| BR (1) | BR0113233B1 (de) |
| CA (1) | CA2417112A1 (de) |
| DE (1) | DE60128105T8 (de) |
| MX (1) | MXPA03001383A (de) |
| TW (1) | TWI244495B (de) |
| WO (1) | WO2002014439A2 (de) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10022352A1 (de) * | 2000-05-08 | 2001-11-22 | Georg Gros | Verfahren zur Beschichtung von elektrolytisch- oder feuerverzinkten Blechen |
| EP1325089A2 (de) * | 2000-09-25 | 2003-07-09 | Chemetall GmbH | Verfahren zur vorbehandlung und beschichtung von metallischen oberflächen vor der umformung mit einem lackähnlichen überzug und verwendung der derart beschichteten substrate |
| EP1472296B1 (de) * | 2002-02-04 | 2008-03-26 | Ciba SC Holding AG | Fluorierte photoinitiatoren in hochfluorierten monomeren |
| US7105582B2 (en) | 2002-02-04 | 2006-09-12 | Ciba Specialty Chemicals Corp. | Surface-active siloxane photoinitiators |
| BR0308200A (pt) * | 2002-03-06 | 2005-01-04 | Ciba Sc Holding Ag | Processo enzimático para preparação de fotoiniciadores que contém grupo organossilìcio |
| WO2003091287A1 (en) * | 2002-04-26 | 2003-11-06 | Ciba Specialty Chemicals Holding Inc. | Incorporable photoinitiator |
| US20040115363A1 (en) * | 2002-12-13 | 2004-06-17 | Desai Umesh C. | Sealant and sound dampening composition |
| KR101081758B1 (ko) * | 2003-06-06 | 2011-11-10 | 시바 홀딩 인크 | 신규한 표면 활성 폴리실록산 광개시제 |
| EP1781750A4 (de) * | 2004-07-27 | 2012-08-08 | Duluxgroup Australia Pty Ltd | System zur bereitstellung eines pulverlackierten holzwerkstoffs |
| US20080038544A1 (en) * | 2004-10-22 | 2008-02-14 | Mitsubishi Rayon Co., Ltd. | Matt Acrylic Resin Filmy Product For Thermoforming, Process For Production Thereof, and Laminates Comprising the Product |
| US20060234026A1 (en) * | 2005-04-18 | 2006-10-19 | Huusken Robert W M | Non-combustible high pressure laminate |
| US7919222B2 (en) * | 2006-01-29 | 2011-04-05 | Rohm And Haas Electronics Materials Llc | Coating compositions for use with an overcoated photoresist |
| CN101523289A (zh) * | 2006-10-03 | 2009-09-02 | 西巴控股有限公司 | 包含苯甲酰甲酸酯型光引发剂的可光固化组合物 |
| US8680176B2 (en) * | 2007-03-21 | 2014-03-25 | The University Of Southern Mississippi | Nanoencapsulation of isocyanates via aqueous media |
| CN105111924A (zh) * | 2009-04-30 | 2015-12-02 | 阿姆斯特郎世界工业公司 | Uvv可固化的涂料组合物和使用其来涂覆地板和其他基材的方法 |
| CN101880482B (zh) * | 2010-07-12 | 2012-10-24 | 重庆大学 | 一种偶合接枝改性纳米金属氧化物的方法 |
| DE102014107518A1 (de) * | 2014-05-28 | 2015-12-03 | Heraeus Kulzer Gmbh | Reaktiver Mikro-Applikator mit Metall enthaltenden Additiven zur Verwendung mit dental Adhäsiven |
| EP3341792A1 (de) * | 2015-12-22 | 2018-07-04 | Carbon, Inc. | Doppelvorläufer-harzsysteme zur generativen fertigung mit doppelhärtungsharzen |
| JP7296692B2 (ja) | 2016-03-03 | 2023-06-23 | 日本製鉄株式会社 | 車両用構造部材 |
| JP6531729B2 (ja) * | 2016-07-19 | 2019-06-19 | 株式会社Sumco | シリコン試料の炭素濃度評価方法、シリコンウェーハ製造工程の評価方法、シリコンウェーハの製造方法およびシリコン単結晶インゴットの製造方法 |
| US11458673B2 (en) | 2017-06-21 | 2022-10-04 | Carbon, Inc. | Resin dispenser for additive manufacturing |
| US11793289B2 (en) | 2018-03-08 | 2023-10-24 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| US11304492B2 (en) * | 2018-03-08 | 2022-04-19 | Applied Lacquer Industries Inc. | Artificial nail tip and curing composition set and applying method thereof |
| CN113583539B (zh) * | 2021-08-11 | 2022-05-10 | 武汉工程大学 | 一种光学树脂组合物及其制备方法和应用 |
| CN114409902B (zh) * | 2021-12-27 | 2023-04-25 | 北京化工大学 | 多功能型pdms基预聚体、基于该预聚体的膜及其制备 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4038164A (en) * | 1975-09-18 | 1977-07-26 | Stauffer Chemical Company | Photopolymerizable aryl and heterocyclic glyoxylate compositions and process |
| US3991416A (en) * | 1975-09-18 | 1976-11-09 | Hughes Aircraft Company | AC biased and resonated liquid crystal display |
| WO1998033761A1 (en) * | 1997-01-30 | 1998-08-06 | Ciba Specialty Chemicals Holding Inc. | Non-volatile phenylglyoxalic esters |
| TW557298B (en) * | 2000-08-14 | 2003-10-11 | Ciba Sc Holding Ag | A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings |
-
2001
- 2001-07-31 TW TW090118671A patent/TWI244495B/zh not_active IP Right Cessation
- 2001-08-07 MX MXPA03001383A patent/MXPA03001383A/es active IP Right Grant
- 2001-08-07 DE DE60128105T patent/DE60128105T8/de active Active
- 2001-08-07 US US10/343,620 patent/US7279200B2/en not_active Expired - Lifetime
- 2001-08-07 EP EP01974127A patent/EP1311627B1/de not_active Expired - Lifetime
- 2001-08-07 AT AT01974127T patent/ATE360666T1/de not_active IP Right Cessation
- 2001-08-07 BR BRPI0113233-4B1A patent/BR0113233B1/pt not_active IP Right Cessation
- 2001-08-07 WO PCT/EP2001/009123 patent/WO2002014439A2/en active IP Right Grant
- 2001-08-07 JP JP2002519570A patent/JP5068413B2/ja not_active Expired - Lifetime
- 2001-08-07 AU AU2001293732A patent/AU2001293732A1/en not_active Abandoned
- 2001-08-07 CN CNB018141595A patent/CN1211439C/zh not_active Expired - Lifetime
- 2001-08-07 CA CA002417112A patent/CA2417112A1/en not_active Abandoned
- 2001-08-07 KR KR1020037002201A patent/KR100818643B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2001293732A1 (en) | 2002-02-25 |
| DE60128105T2 (de) | 2007-12-27 |
| DE60128105T8 (de) | 2008-04-30 |
| MXPA03001383A (es) | 2003-06-06 |
| US20030213931A1 (en) | 2003-11-20 |
| EP1311627A2 (de) | 2003-05-21 |
| BR0113233B1 (pt) | 2013-10-01 |
| KR100818643B1 (ko) | 2008-04-04 |
| CA2417112A1 (en) | 2002-02-21 |
| EP1311627B1 (de) | 2007-04-25 |
| CN1211439C (zh) | 2005-07-20 |
| CN1447844A (zh) | 2003-10-08 |
| KR20030055249A (ko) | 2003-07-02 |
| JP5068413B2 (ja) | 2012-11-07 |
| WO2002014439A2 (en) | 2002-02-21 |
| BR0113233A (pt) | 2003-06-24 |
| DE60128105D1 (de) | 2007-06-06 |
| US7279200B2 (en) | 2007-10-09 |
| TWI244495B (en) | 2005-12-01 |
| JP2004506776A (ja) | 2004-03-04 |
| WO2002014439A3 (en) | 2002-06-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |