ATE359384T1 - Verfahren zur herstellung eines zerstäubungstargets - Google Patents
Verfahren zur herstellung eines zerstäubungstargetsInfo
- Publication number
- ATE359384T1 ATE359384T1 AT03714926T AT03714926T ATE359384T1 AT E359384 T1 ATE359384 T1 AT E359384T1 AT 03714926 T AT03714926 T AT 03714926T AT 03714926 T AT03714926 T AT 03714926T AT E359384 T1 ATE359384 T1 AT E359384T1
- Authority
- AT
- Austria
- Prior art keywords
- coefficient
- thermal expansion
- target
- producing
- compound
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/EP2003/050026 WO2004074541A1 (en) | 2003-02-20 | 2003-02-20 | A method of manufacturing a sputter target |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE359384T1 true ATE359384T1 (de) | 2007-05-15 |
Family
ID=32892840
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT03714926T ATE359384T1 (de) | 2003-02-20 | 2003-02-20 | Verfahren zur herstellung eines zerstäubungstargets |
Country Status (8)
Country | Link |
---|---|
US (1) | US20060175198A1 (de) |
EP (1) | EP1592823B1 (de) |
JP (1) | JP2006514160A (de) |
CN (1) | CN100471986C (de) |
AT (1) | ATE359384T1 (de) |
AU (1) | AU2003219135A1 (de) |
DE (1) | DE60313222T2 (de) |
WO (1) | WO2004074541A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2607091C (en) * | 2005-05-05 | 2014-08-12 | H.C. Starck Gmbh | Coating process for manufacture or reprocessing of sputter targets and x-ray anodes |
DE102006009749A1 (de) * | 2006-03-02 | 2007-09-06 | FNE Forschungsinstitut für Nichteisen-Metalle Freiberg GmbH | Targetanordnung |
US20080078268A1 (en) | 2006-10-03 | 2008-04-03 | H.C. Starck Inc. | Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof |
US20080145688A1 (en) | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
US8741158B2 (en) | 2010-10-08 | 2014-06-03 | Ut-Battelle, Llc | Superhydrophobic transparent glass (STG) thin film articles |
US8246903B2 (en) | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
JP5348394B2 (ja) * | 2009-03-13 | 2013-11-20 | 三菱マテリアル株式会社 | 太陽電池用の(Zn,Al)O系透明電極層およびその形成に用いられるZnO−Al2O3系スパッタリングターゲット |
JP5348399B2 (ja) * | 2009-03-31 | 2013-11-20 | 三菱マテリアル株式会社 | 太陽電池用の(Zn,Ga,Al)O系透明電極層およびその形成に用いられるZnO−Ga2O3−Al系スパッタリングターゲット |
EP2287356A1 (de) | 2009-07-31 | 2011-02-23 | Bekaert Advanced Coatings NV. | Sputtertarget, Verfahren und Vorrichtung zur Herstellung von Sputtertargets |
US11292919B2 (en) | 2010-10-08 | 2022-04-05 | Ut-Battelle, Llc | Anti-fingerprint coatings |
US9120183B2 (en) | 2011-09-29 | 2015-09-01 | H.C. Starck Inc. | Methods of manufacturing large-area sputtering targets |
WO2013122927A1 (en) | 2012-02-14 | 2013-08-22 | Tosoh Smd, Inc. | Low deflection sputtering target assembly and methods of making same |
JP6014451B2 (ja) * | 2012-03-02 | 2016-10-25 | 住友化学株式会社 | 酸化亜鉛系焼結体の製造方法 |
US9771656B2 (en) * | 2012-08-28 | 2017-09-26 | Ut-Battelle, Llc | Superhydrophobic films and methods for making superhydrophobic films |
US20150239773A1 (en) | 2014-02-21 | 2015-08-27 | Ut-Battelle, Llc | Transparent omniphobic thin film articles |
CN106607667B (zh) * | 2015-10-26 | 2018-05-08 | 宁波江丰电子材料股份有限公司 | 靶材组件的制造方法 |
BE1028481B1 (nl) * | 2020-07-14 | 2022-02-14 | Soleras Advanced Coatings Bv | Sputterdoel met grote densiteit |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992017622A1 (en) * | 1991-04-08 | 1992-10-15 | Tosoh Smd, Inc. | Thermally compatible sputter target and backing plate assembly |
DE4242079A1 (de) * | 1992-12-14 | 1994-06-16 | Leybold Ag | Target für eine in einer evakuierbaren mit einem Prozeßgas flutbaren Prozeßkammer angeordneten Kathode |
US5338999A (en) * | 1993-05-05 | 1994-08-16 | Motorola, Inc. | Piezoelectric lead zirconium titanate device and method for forming same |
US5836506A (en) * | 1995-04-21 | 1998-11-17 | Sony Corporation | Sputter target/backing plate assembly and method of making same |
EP0761838B1 (de) * | 1995-08-18 | 2001-08-08 | W.C. Heraeus GmbH & Co. KG | Target für die Kathodenzerstäubung und Verfahren zur Herstellung eines solchen Targets |
JP4046407B2 (ja) * | 1998-04-01 | 2008-02-13 | ヤマハ株式会社 | スパッタ法及び配線形成法 |
JP3628554B2 (ja) * | 1999-07-15 | 2005-03-16 | 株式会社日鉱マテリアルズ | スパッタリングターゲット |
JP2001262326A (ja) * | 2000-03-16 | 2001-09-26 | Nikko Materials Co Ltd | 酸化インジウム−金属錫混合粉末及び同混合粉末を原料とするitoスパッタリングターゲット並びに同ターゲットの製造方法 |
US6596131B1 (en) * | 2000-10-30 | 2003-07-22 | Honeywell International Inc. | Carbon fiber and copper support for physical vapor deposition target assembly and method of forming |
-
2003
- 2003-02-20 WO PCT/EP2003/050026 patent/WO2004074541A1/en active IP Right Grant
- 2003-02-20 US US10/546,172 patent/US20060175198A1/en not_active Abandoned
- 2003-02-20 JP JP2004568422A patent/JP2006514160A/ja active Pending
- 2003-02-20 DE DE60313222T patent/DE60313222T2/de not_active Revoked
- 2003-02-20 AT AT03714926T patent/ATE359384T1/de not_active IP Right Cessation
- 2003-02-20 AU AU2003219135A patent/AU2003219135A1/en not_active Abandoned
- 2003-02-20 EP EP03714926A patent/EP1592823B1/de not_active Revoked
- 2003-02-20 CN CNB038259990A patent/CN100471986C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1592823B1 (de) | 2007-04-11 |
WO2004074541A1 (en) | 2004-09-02 |
DE60313222D1 (de) | 2007-05-24 |
EP1592823A1 (de) | 2005-11-09 |
JP2006514160A (ja) | 2006-04-27 |
US20060175198A1 (en) | 2006-08-10 |
CN1742111A (zh) | 2006-03-01 |
CN100471986C (zh) | 2009-03-25 |
DE60313222T2 (de) | 2008-01-03 |
AU2003219135A1 (en) | 2004-09-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |