ATA81890A - METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE - Google Patents

METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE

Info

Publication number
ATA81890A
ATA81890A AT81890A AT81890A ATA81890A AT A81890 A ATA81890 A AT A81890A AT 81890 A AT81890 A AT 81890A AT 81890 A AT81890 A AT 81890A AT A81890 A ATA81890 A AT A81890A
Authority
AT
Austria
Prior art keywords
nitrid
thin
producing
oxide layer
oxide
Prior art date
Application number
AT81890A
Other languages
German (de)
Other versions
AT395019B (en
Inventor
Ibrahim Adnan Dr Saracoglu
Erich Josef Dr Schiefer
Original Assignee
Avl Verbrennungskraft Messtech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avl Verbrennungskraft Messtech filed Critical Avl Verbrennungskraft Messtech
Priority to AT81890A priority Critical patent/AT395019B/en
Priority to DE19914110930 priority patent/DE4110930A1/en
Publication of ATA81890A publication Critical patent/ATA81890A/en
Application granted granted Critical
Publication of AT395019B publication Critical patent/AT395019B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
AT81890A 1990-04-05 1990-04-05 METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE AT395019B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AT81890A AT395019B (en) 1990-04-05 1990-04-05 METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE
DE19914110930 DE4110930A1 (en) 1990-04-05 1991-04-04 Prodn. of thin layers of nitride or oxide - using helium in plasma gas contg. argon, oxygen and nitrogen, in reactive or magnetron cathodic sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
AT81890A AT395019B (en) 1990-04-05 1990-04-05 METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE

Publications (2)

Publication Number Publication Date
ATA81890A true ATA81890A (en) 1992-01-15
AT395019B AT395019B (en) 1992-08-25

Family

ID=3500455

Family Applications (1)

Application Number Title Priority Date Filing Date
AT81890A AT395019B (en) 1990-04-05 1990-04-05 METHOD FOR PRODUCING A THIN NITRID OR OXIDE LAYER ON A SURFACE

Country Status (2)

Country Link
AT (1) AT395019B (en)
DE (1) DE4110930A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0691419A1 (en) * 1994-07-05 1996-01-10 General Electric Company A process and apparatus for forming multi-layer optical films
DE10224990B3 (en) * 2002-06-05 2004-03-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Process for the deposition of transparent conductive layers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3802998A1 (en) * 1988-02-02 1989-08-10 Basf Ag METHOD FOR PRODUCING A THIN ROENGENAMORPHEN ALUMINUM NITRIDE OR ALUMINUM SILICON NITRIDE LAYER ON A SURFACE

Also Published As

Publication number Publication date
AT395019B (en) 1992-08-25
DE4110930A1 (en) 1991-10-10

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Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee
ELJ Ceased due to non-payment of the annual fee