AT278054B - Photopolymerisierbares Material - Google Patents

Photopolymerisierbares Material

Info

Publication number
AT278054B
AT278054B AT276467A AT276467A AT278054B AT 278054 B AT278054 B AT 278054B AT 276467 A AT276467 A AT 276467A AT 276467 A AT276467 A AT 276467A AT 278054 B AT278054 B AT 278054B
Authority
AT
Austria
Prior art keywords
photopolymerizable material
photopolymerizable
Prior art date
Application number
AT276467A
Other languages
English (en)
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Application granted granted Critical
Publication of AT278054B publication Critical patent/AT278054B/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/04—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polycarbonamides, polyesteramides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02—Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/118—Initiator containing with inhibitor or stabilizer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT276467A 1966-03-22 1967-03-22 Photopolymerisierbares Material AT278054B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1522463A DE1522463C3 (de) 1966-03-22 1966-03-22 Verfahren zum Herstellen von Reliefdruckformen

Publications (1)

Publication Number Publication Date
AT278054B true AT278054B (de) 1970-01-26

Family

ID=6983303

Family Applications (1)

Application Number Title Priority Date Filing Date
AT276467A AT278054B (de) 1966-03-22 1967-03-22 Photopolymerisierbares Material

Country Status (9)

Country Link
US (1) US3551148A (de)
AT (1) AT278054B (de)
BE (1) BE695700A (de)
CH (1) CH475094A (de)
DE (1) DE1522463C3 (de)
ES (1) ES338285A1 (de)
GB (1) GB1173043A (de)
NL (1) NL151521B (de)
SE (1) SE333689B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3881935A (en) * 1971-01-07 1975-05-06 Powers Chemco Inc Photosensitive polymer composition
US4145222A (en) * 1974-11-19 1979-03-20 Toyobo Co., Ltd. Water soluble photosensitive resin composition comprising a polyamide or its ammonium salt
DE2644986C3 (de) * 1976-10-06 1981-11-19 Basf Ag, 6700 Ludwigshafen Lichtempfindliches Gemisch für die Herstellung von Reliefformen
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
WO1980001212A1 (en) * 1978-12-01 1980-06-12 Toray Industries Light-sensitive polyamide resin composition
JPS5756259A (en) * 1980-09-19 1982-04-03 Dainippon Printing Co Ltd Manufacture of gravure plate
DE3540480A1 (de) * 1985-11-15 1987-05-21 Hoechst Ag Durch strahlung polymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von reliefaufzeichnungen
EP0273113B1 (de) * 1986-12-26 1991-01-23 Toray Industries, Inc. Lichtempfindliche Photopolymerzusammensetzung und Druckplatte
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten
US5221589A (en) * 1990-04-06 1993-06-22 Nippon Paint Co., Ltd. Photosensitive resin composition

Also Published As

Publication number Publication date
BE695700A (de) 1967-09-18
DE1522463A1 (de) 1969-07-24
DE1522463C3 (de) 1978-09-28
ES338285A1 (es) 1968-04-01
NL151521B (nl) 1976-11-15
DE1522463B2 (de) 1978-01-26
CH475094A (de) 1969-07-15
US3551148A (en) 1970-12-29
GB1173043A (en) 1969-12-03
SE333689B (de) 1971-03-22
NL6704185A (de) 1967-09-25

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Legal Events

Date Code Title Description
ELJ Ceased due to non-payment of the annual fee