WO2024125354A1 - 喷淋板、喷淋方法及处理装置 - Google Patents

喷淋板、喷淋方法及处理装置 Download PDF

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Publication number
WO2024125354A1
WO2024125354A1 PCT/CN2023/136680 CN2023136680W WO2024125354A1 WO 2024125354 A1 WO2024125354 A1 WO 2024125354A1 CN 2023136680 W CN2023136680 W CN 2023136680W WO 2024125354 A1 WO2024125354 A1 WO 2024125354A1
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WIPO (PCT)
Prior art keywords
channel
spray
channels
transition
plate according
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PCT/CN2023/136680
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English (en)
French (fr)
Inventor
康旭
严大
施述鹏
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江苏微导纳米科技股份有限公司
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Publication of WO2024125354A1 publication Critical patent/WO2024125354A1/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus

Definitions

  • the present application relates to the field of vacuum coating technology, and in particular to a spray plate, a spray method and a processing device.
  • a plurality of the transition channels and the spray channels are provided, and the plurality of transition channels and the spray channels correspond one to one, each of the spray channels is connected to the corresponding transition channel through a plurality of connecting channels, the plurality of connecting channels are spaced apart along the extension direction of the spray channel, and the main air intake channel is connected to the plurality of transition channels in sequence.
  • each of the spray channels is in an elongated strip shape and extends along a first direction, and a plurality of the spray channels are arranged at intervals along a second direction perpendicular to the first direction.
  • each of the transition channels is in an elongated strip shape and extends along the first direction, and each of the transition channels and the corresponding spray channel are spaced apart from each other along a third direction perpendicular to the first direction and the second direction.
  • the main air intake passage is in an elongated shape and extends along the second direction.
  • connection point between the main intake channel and each of the transition channels is offset toward one end of the transition channel relative to the midpoint of the transition channel.
  • the inner diameter of the transition channel at a side of the connecting portion facing away from the center is smaller than the inner diameter at a side of the connecting portion facing the center.
  • connection point between the main intake passage and each of the transition passages is located at the midpoint of the transition passage.
  • the number of the connecting channels on both sides of the connecting point along the first direction is the same.
  • air inlets are provided at both ends of the main air inlet passage in the extending direction.
  • connection point between the inlet channel and the diversion channel is offset toward one end of the diversion channel relative to the midpoint of the diversion channel.
  • the inner diameter of the diversion channel at the side of the connecting portion facing away from the center is smaller than the inner diameter at the side of the connecting portion facing the center.
  • connection point between the inlet channel and the diversion channel is located at the midpoint of the diversion channel.
  • two of the inlet channel and the diversion channel are provided, and the two diversion channels are distributed at both ends of the plate body along the second direction, one end of the two outlet channels is connected to both ends of one of the diversion channels, and the other end of the two outlet channels is connected to both ends of the other diversion channel.
  • At least two of the gas distribution systems are disposed in the plate body, and the spray channels of at least two of the gas distribution systems are alternately disposed along the second direction.
  • a plurality of the transition channels and the spray channels are provided, and the plurality of transition channels and the spray channels correspond one to one, each of the spray channels is connected to the corresponding transition channel through a plurality of connecting channels, the plurality of connecting channels are spaced apart along the extension direction of the spray channel, and the main air intake channel is connected to the plurality of transition channels in sequence.
  • each of the spray channels is in an elongated strip shape and extends along a first direction, and a plurality of the spray channels are arranged at intervals along a second direction, and the first direction and the second direction are arranged at an angle.
  • each of the transition channels is in an elongated strip shape and extends along the first direction, and each of the transition channels and the corresponding spray channel are spaced apart along a third direction, and the third direction is arranged at an angle to both the first direction and the second direction.
  • the main air intake passage is in an elongated shape and extends along the second direction.
  • connection between the main air inlet passage and each of the transition passages is The transition channel is offset toward one end of the transition channel relative to the midpoint of the transition channel.
  • connection point between the main intake passage and each of the transition passages is located at the midpoint of the transition passage.
  • the number of the connecting channels on both sides of the transition channel at the connecting point along the first direction is the same.
  • air inlets are provided at both ends of the main air inlet passage in the extending direction.
  • the main air intake channel includes an inlet channel, a bypass channel extending along the first direction, and two outlet channels extending along the second direction, the inlet channel is connected to the bypass channel, the two outlet channels are connected to the two ends of the bypass channel respectively, and one of the outlet channels is connected to one end of the plurality of transition channels in sequence, and the other outlet channel is connected to the other end of the plurality of transition channels in sequence.
  • connection point between the inlet channel and the diversion channel is offset toward one end of the diversion channel relative to the midpoint of the diversion channel.
  • the diversion channel includes a third channel portion and a fourth channel portion located on both sides of the connecting point, the length of the third channel portion is smaller than the length of the fourth channel portion, and the inner diameter of the third channel portion is smaller than the inner diameter of the fourth channel portion.
  • connection point between the inlet channel and the diversion channel is located at the midpoint of the diversion channel.
  • two of the outlet channels and two of the diversion channels are provided, and the two diversion channels are distributed at both ends of the plate body along the second direction, one end of the two outlet channels is connected to both ends of one of the diversion channels, and the other end of the two outlet channels is connected to both ends of the other diversion channel.
  • At least two of the gas distribution systems are disposed in the plate body, and the spray channels of at least two of the gas distribution systems are alternately disposed along the second direction.
  • a processing device comprising a shower plate and a processing chamber as described in any one of the above preferred embodiments, wherein the shower plate is installed in the processing chamber and the gas outlet surface faces the processing chamber. Inside.
  • the process gas first enters the interior of the plate body through the main air inlet channel, then enters the spray channel after transiting through the transition channel, and finally is introduced into the processing chamber from the air outlet surface through the spray hole.
  • the transition channel can play a buffering role to prevent the air pressure in the spray channel from being directly affected by the air pressure fluctuation in the main air inlet channel, so the air pressure in the spray channel can maintain good consistency. Therefore, after transiting through the transition channel, the amount of gas ejected from each area of the air outlet surface is also more balanced, thereby improving the uniformity of the distribution of the process gas in the processing chamber.
  • a spraying method comprises the steps of:
  • the process gas is introduced into the spray channel connected to the transition channel after transitioning through the transition channel;
  • the process gas entering the spray channel is transported along the spray channel and sprayed to the processing chamber through a plurality of spray holes distributed along the extension direction of the spray channel.
  • the process gas is first introduced into the transition channel through the main air inlet channel, and then enters the spray channel after being transferred through the transition channel.
  • the transition channel can play a buffering role to prevent the air pressure in the spray channel from being directly affected by the air pressure fluctuation in the main air inlet channel, so the air pressure in the spray channel can maintain good consistency. Therefore, after being transferred through the transition channel, the gas flow rate sprayed from the spray hole is also more balanced, thereby improving the uniformity of the distribution of the process gas in the processing chamber.
  • FIG1 is a schematic diagram of a partial structure of a processing device in one embodiment of the present application.
  • FIG2 is a front perspective view of a shower plate in the processing device shown in FIG1;
  • FIG3 is a schematic diagram of a gas distribution system in the shower plate shown in FIG2 ;
  • FIG4 is a front perspective view of a shower plate in another embodiment of the present application.
  • FIG5 is a schematic diagram of the gas distribution system of the shower plate shown in FIG4;
  • FIG. 6 is a schematic flow chart of a spraying method in one embodiment of the present application.
  • first and second are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as “first” and “second” may explicitly or implicitly include at least one of the features. In the description of this application, the meaning of "plurality” is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.
  • the terms “installed”, “connected”, “connected”, “fixed” and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined.
  • installed can be a fixed connection, a detachable connection, or an integral connection
  • it can be a mechanical connection or an electrical connection
  • it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined.
  • the specific meanings of the above terms in this application can be understood according to specific circumstances.
  • a first feature "on” or “under” a second feature may be that the first and second features are in direct contact, or the first and second features are in contact with each other through an intermediate medium. Indirect contact.
  • the first feature being “above”, “above” and “above” the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature.
  • the first feature being “below”, “below” and “below” the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.
  • the present application provides a processing device 10 and a shower plate 100 .
  • the processing device 10 includes the shower plate 100 and a processing chamber 200 .
  • a vacuum can be formed in the processing chamber 200, and the shower plate 100 has a gas outlet surface 111.
  • the shower plate 100 is installed in the processing chamber 200, and the gas outlet surface 111 faces the inner side of the processing chamber 200. After the process gas is introduced into the shower plate 100, it is sprayed into the processing chamber 200 through the spray holes 1231 on the gas outlet surface 111, so that a reaction occurs in the processing chamber 200.
  • a reaction occurs in the processing chamber 200.
  • an aluminum oxide film is plated on the surface of a silicon wafer.
  • the processing device 10 is an atomic layer deposition coating device, so a coating reaction can occur after the process gas enters the processing chamber 200.
  • the processing device 10 can also be applied to other fields.
  • the shower plate 100 in one embodiment of the present application includes a plate body 110 and a gas distribution system 120 .
  • the plate body 110 is generally formed of a metal material, and its outer contour matches the contour of the processing chamber 200.
  • the gas outlet surface 111 is formed on one side of the plate body 110.
  • the gas distribution system 120 can introduce and distribute the process gas, and finally spray the process gas from the spray hole 1231 into the processing chamber 200. Since at least two process gases are required for coating, at least two (generally two) gas distribution systems 120 are provided, and the at least two gas distribution systems 120 are independent of each other and have the same structure.
  • Each gas distribution system 120 includes a main air inlet passage 121 , a transition passage 122 , and a spray passage 123 .
  • the plate body 110 may be an integrally formed structure, and the flow channel structure of the gas distribution system 120 may be processed in the plate body 110 by drilling.
  • the plate body 110 may also be composed of two parts, and grooves are processed on the two parts constituting the plate body 110 and then combined to obtain the flow channel structure of the gas distribution system 120.
  • the main air inlet channel 121 has an air inlet, which can be connected to the gas source to achieve the introduction of process gas.
  • the spray channels 123 are evenly distributed in the plate body 110.
  • the spray channel 123 is formed with a plurality of spray holes 1231 extending to the gas outlet surface 111 along its extension direction; that is, the spray channel 123 is connected with a plurality of spray holes 1231, each spray hole 1231 is arranged at intervals along the extension direction of the spray channel 123, and each spray hole 123 can extend to the gas outlet surface 111.
  • the spray channel 123 is connected to the main air inlet channel 121 through the transition channel 122.
  • the process gas introduced into the plate body 110 by the main air inlet channel 121 can enter the spray channel 123 after being transferred through the transition channel 122, and finally sprayed into the processing chamber 200 by the spray hole 1231.
  • the transition channel 122 can play a buffering role, preventing the air pressure in the spray channel 123 from being directly affected by the air pressure fluctuation in the main air inlet channel 121, so the air pressure in the spray channel 123 can maintain good consistency. Therefore, the flow rate of the process gas sprayed from each area of the gas outlet surface 111 is more consistent, and the gas flow is more balanced, so that the uniformity of the distribution of the process gas in the processing chamber 200 can be improved, thereby improving the uniformity of the coating film thickness.
  • a plurality of transition channels 122 and spray channels 123 are provided, and the plurality of transition channels 122 and spray channels 123 correspond one to one, each spray channel 123 is connected to the corresponding transition channel 122 through a plurality of connecting channels 124, and the plurality of connecting channels 124 are spaced apart along the extension direction of the spray channel 123, and the main air intake channel 121 is connected to the plurality of transition channels 122 in sequence.
  • the multiple connecting channels 124 between the spray channels 123 and the transition channels 122 can be arranged at equal intervals or at unequal intervals, and the connecting channels 124 can also be arranged to be three, four, five or other numbers according to actual needs.
  • the multiple spray channels 123 can make the process gas spray more evenly, and the multiple transition channels 122 transfer the process gas respectively, which can ensure that each spray channel 123 can obtain a process gas with a comparable flow rate.
  • the multiple connecting channels 124 can make the process gas in the transition channel 122 enter the spray channel 123 from multiple different positions at the same time, so that the distribution of the process gas in the spray channel 123 can also be more uniform.
  • the spray channel 123 can be in the shape of a strip, an arc, or a wave. Due to the complexity of the process, the spray channel 123 in this embodiment is in the shape of an elongated strip and extends along a first direction.
  • the first direction refers to the left-right direction shown in FIG. 2 , that is, the width direction of the plate body 110.
  • a plurality of spray channels 123 are arranged at intervals along a second direction perpendicular to the first direction.
  • the second direction refers to the up-down direction shown in FIG. 2 , that is, the length direction of the plate body 110.
  • the second direction may not be perpendicular to the first direction, that is, the second direction may also be at an angle other than 90 degrees to the first direction, which is also feasible.
  • the distance between two adjacent spray channels 123 is approximately the same.
  • each transition channel 122 is in the shape of an elongated strip and extends along the first direction, and each transition channel 122 and the corresponding spray channel 123 are arranged at intervals along a third direction perpendicular to the first direction and the second direction.
  • the third direction refers to the direction perpendicular to the plane of the drawing as shown in FIG. 2, that is, the thickness direction of the plate body 110. It should be understood that the third direction may not be perpendicular to the first direction and the second direction, that is, the third direction may also be at an angle of non-90 degrees with the first direction and the second direction, which is also feasible.
  • Such an arrangement can reasonably utilize the space of the plate body 110 along the first direction (such as the thickness direction), and facilitate the arrangement of at least two gas distribution systems 120 in the plate body 110.
  • the transition channel 122 is parallel to the spray channel 123, the distance between the transition channel 122 and the corresponding spray channel 123 remains unchanged in the extension direction of the transition channel 122 and the spray channel 123, so when the process gas is transferred, the process gas in the transition channel 122 can enter the corresponding spray channel 123 more evenly.
  • the spray channels 123 of at least two gas distribution systems 120 are alternately arranged along the second direction. Specifically, a spray channel 123 of another gas distribution system 120 is arranged between two spray channels 123 belonging to the same gas distribution system 120. In this way, at least two different types of process gases can be evenly distributed in the processing chamber 200 and fully react, which is conducive to further improving the uniformity of the distribution of the process gas in the processing chamber 200.
  • the main air inlet channel 121 is in a long strip shape and extends along the second direction. In this way, the flow path of the process gas from the main air inlet channel 121 to each transition channel 122 is shorter, which is conducive to allowing the process gas to quickly reach the transition channel 122 and reducing the flow rate difference of the process gas when entering each transition channel 122 due to the long flow path.
  • the main intake passage 121 is sequentially connected to the middle portions of the plurality of transition passages 122 . After the process gas enters the transition channel 122 from the main air inlet channel 121, it will be diverted from the middle to the two ends of the transition channel 122, so that the process gas is more evenly distributed in the transition channel 122, thereby improving the uniformity of the process gas in the spray channel 123, and finally improving the uniformity of the distribution of the process gas in the processing chamber 200.
  • connection point between the main air inlet channel 121 and the transition channel 122 is generally located between the two connecting pipes 124.
  • the number of connecting channels 124 is the same on both sides of the connection point between the main air inlet channel 121 and the transition channel 122 along the first direction.
  • the transition channel 122 is connected to the corresponding spray channel 123 through four connecting channels 124, and two connecting channels 124 are respectively distributed on both sides of the connection point between the main air inlet channel 121 and the transition channel 122. In this way, the process gas in the transition channel 122 can enter the corresponding spray channel 123 more evenly.
  • both ends of the main air inlet channel 121 in the extension direction are provided with air inlets. Therefore, when the process gas is introduced into the gas distribution system 120, two air flows can be introduced from both ends of the main air inlet channel 121 at the same time, and the two air flows can flow to the multiple transition channels 122 at the same time. In this way, the difference in gas flow rate at the connection point between the main air inlet channel 121 and the multiple transition channels 122 can be further reduced, and the consistency of the gas pressure in the multiple transition channels 122 is higher, which helps to further improve the uniformity of the distribution of the process gas in the processing chamber 200.
  • the main air inlet channel 121 is usually offset to one side (i.e., not centrally arranged) along the width direction of the plate body 110.
  • the connection point between the main air inlet channel 121 and each transition channel 122 is offset to one end of the transition channel 122 relative to the midpoint of the transition channel 122.
  • the inner diameter of the transition channel 122 at the connecting part facing away from the center is smaller than the inner diameter at the connecting part facing the center.
  • the two sides of the transition channel 122 at the connecting part may be referred to as the first channel portion and the second channel portion, respectively, wherein the length of the first channel portion is smaller than the length of the second channel portion, so that the first channel portion is located at the connecting part of the transition channel 122 facing away from the center, and the second channel portion is located at the connecting part of the transition channel 122 facing the center.
  • the inner diameters at different positions are different.
  • the connection between the main air inlet channel 121 and the transition channel 122 of one gas distribution system 120 is offset to the left relative to the midpoint of the transition channel 122, the inner diameter of the left side (i.e., the first channel portion) of the transition channel 122 is smaller than the inner diameter of the right side (i.e., the second channel portion).
  • the side with a larger inner diameter can obtain a larger flow rate, so that a more uniform distribution of the process gas in the transition channel 122 can be achieved.
  • connection point between the main intake channel 121 and each transition channel 122 may be located at the midpoint of the transition channel 122 .
  • the main air inlet channel 121 includes an inlet channel 1211 , a branch channel 1212 and an outlet channel 1213 .
  • the introduction channel 1211 has an air inlet, which can realize the introduction of process gas.
  • the shunt channel 1212 extends along the first direction, and the introduction channel 1211 is connected to the middle of the shunt channel 1212.
  • Two outlet channels 1213 are provided, and the two outlet channels 1213 extend along the second direction, and the two outlet channels 1213 are respectively connected to the two ends of the shunt channel 1212.
  • One of the outlet channels 1213 is sequentially connected to one end of the plurality of transition channels 122, and the other outlet channel 1213 is sequentially connected to the other end of the plurality of transition channels 122.
  • the two outlet channels 1213 are distributed on the left and right sides of the plate body 110 (refer to the orientation and position relationship in FIG. 4 ), and the outlet channel 1213 on the left side is connected to the left ends of the multiple transition channels 122, while the outlet channel 1213 on the right side is connected to the right ends of the multiple transition channels 122.
  • the process gas is introduced through the introduction channel 1211, it is split in the diversion channel 1212 and divided into two to obtain two air flows, and the two separated air flows enter the transition channel 122 from both ends of the transition channel 122 through the two outlet channels 1213 respectively. In this way, the uniformity of the process gas can be further improved.
  • two inlet channels 1211 and two shunt channels 1212 are provided, and the two shunt channels 1212 are distributed at both ends of the plate body 110 along the second direction, and one end of the two outlet channels 1213 is connected to both ends of one of the shunt channels 1212, and the other end of the two outlet channels 1213 is connected to both ends of the other shunt channel 1212.
  • the airflows of the two process gases can be simultaneously introduced into the gas distribution system 120 by the two inlet channels 1211.
  • the difference in gas flow rate at the connection point between the main inlet channel 121 and the multiple transition channels 122 can be further reduced, and the consistency of the gas pressure in the multiple transition channels 122 is higher, which helps to further improve the uniformity of the distribution of the process gas in the processing chamber 200.
  • the introduction channel 1211 is usually offset to one side (i.e., not centrally arranged) along the width direction of the plate body 110.
  • the connection point between the introduction channel 1211 and the diversion channel 1212 is offset to one end of the diversion channel 1212 relative to the midpoint of the diversion channel 1212.
  • the inner diameter of the shunt channel 1212 at the side of the connection away from the center is smaller than the inner diameter at the side of the connection toward the center.
  • the two sides of the shunt channel 1212 at the connection can be referred to as the third channel portion and the fourth channel portion, respectively, wherein the length of the third channel portion is smaller than the length of the fourth channel portion, so that the third channel portion is located at the side of the connection of the shunt channel 1212 away from the center, and the fourth channel portion is located at the side of the connection of the shunt channel 1212 toward the center.
  • the inner diameters at different positions are different.
  • the connection between the inlet channel 1211 of one gas distribution system 120 and the shunt channel 1212 is offset to the left relative to the midpoint of the shunt channel 1212, and the inner diameter of the left side (i.e., the third channel portion) of the shunt channel 1212 is smaller than the inner diameter of the right side (i.e., the fourth channel portion).
  • the side with a larger inner diameter can obtain a larger flow rate. In this way, a more uniform distribution of the process gas in the shunt channel 1212 can be achieved, so that the two outlet channels 1213 can obtain process gases with equivalent flow rates.
  • connection point between the inlet channel 1211 and the bypass channel 1212 can also be located at the midpoint of the bypass channel 1212 .
  • the process gas first enters the interior of the plate body 110 through the main air inlet channel 121, then enters the spray channel 123 after being transferred through the transition channel 122, and finally is introduced into the processing chamber 200 from the gas outlet surface 111 through the spray hole 1231.
  • the transition channel 122 can play a buffering role to prevent the air pressure in the spray channel 123 from being directly affected by the air pressure fluctuation in the main air inlet channel 121, so the air pressure in the spray channel 123 can maintain good consistency. Therefore, after being transferred through the transition channel 122, the amount of gas sprayed from each area of the gas outlet surface 111 is also more balanced, thereby improving the uniformity of the distribution of the process gas in the processing chamber 200.
  • the present application also provides a spraying method, which can be implemented with the aid of the above-mentioned spray plate 100, or can be implemented with other spraying devices.
  • the spraying method in one embodiment of the present application includes steps S201 to S203 . Among them:
  • Step S201 introducing process gas into the transition channel through the main air inlet channel.
  • Step S202 the process gas is introduced into a spray channel connected to the transition channel after transitioning through the transition channel.
  • Step S203 the process gas entering the spray channel is transported along the spray channel and is A plurality of spray holes distributed in the extending direction of the channel spray water into the processing chamber.
  • the main air inlet channel has an air inlet, which can be connected to the gas source to realize the introduction of process gas.
  • the spray channel is formed with a plurality of spray holes along its extension direction, and the spray channel is connected to the main air inlet channel through a transition channel. Therefore, the process gas introduced into the plate body by the main air inlet channel can be introduced into the spray channel after transitioning through the transition channel, and finally sprayed into the processing chamber through the spray hole.
  • the transition channel can play a buffering role to prevent the air pressure in the spray channel from being directly affected by the air pressure fluctuation in the main air inlet channel, so the air pressure in the spray channel can maintain good consistency. Therefore, the flow rate consistency of the process gas sprayed from the spray hole is better, and the gas flow rate is more balanced, thereby improving the uniformity of the distribution of the process gas in the processing chamber.

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  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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Abstract

一种喷淋板（100）、处理装置（10）及喷淋方法，喷淋板（100）包括板体（110），板体内形成有气体分配***（120）。气体分配***（120）包括主进气通道（121）、过渡通道（122）及喷淋通道（123）。工艺气体先由主进气通道（121）进入板体（110）的内部，再经过过渡通道（122）中转后进入喷淋通道（123），最终由喷淋孔（1231）从出气面（111）导入处理腔体（100）内。过渡通道（122）能够起到缓冲作用，避免喷淋通道（123）内的气压直接受到主进气通道（121）内气压波动的影响，故喷淋通道（123）内的气压能够保持较好的一致性。因此，经过过渡通道（122）中转后，从出气面（111）的各区域喷出的气流量也更均衡，从而能够提升工艺气体在处理腔体（100）内分布的均匀性。

Description

喷淋板、喷淋方法及处理装置
本申请要求于2022年12月15日提交中国专利局、申请号为202211612666.3、发明名称为“喷淋板、喷淋方法及处理装置”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。
技术领域
本申请涉及真空镀膜技术领域，特别涉及一种喷淋板、喷淋方法及处理装置。
背景技术
在工业生产过程中，通常需要通过喷淋板向处理腔体内喷淋特定的工艺气体，以促成相应的反应，从而达到特定的生产目的。譬如，原子层沉积(Atomic0layer deposition，ALD)技术是以表面化学气相反应为基础的薄膜沉积技术，可以将物质以单原子膜形式镀在基底表面，并能够对所沉积的薄膜的厚度及均匀度精确控制在原子层厚度范围内。原子层沉积技术由于其优越性，已被广泛应用于半导体、光伏电池等领域。原子层沉积镀膜装置进行镀膜操作时，需要先由喷淋板将工艺气体导入反应腔体内，从而发生镀膜反应。
但是，由于受结构的限制，现有喷淋板不同区域的气体流速呈现出较大差异，从而导致进入处理腔体的工艺气体在处理腔体内分布的均匀性较差。对于原子层沉积镀膜工艺而言，工艺气体分布不均将会导致镀膜膜厚的均匀性不好。
发明内容
基于此，有必要针对上述问题，提供一种能够改善工艺气体在处理腔体内分布的均匀性的喷淋板、喷淋方法及处理装置。
一种喷淋板，包括具有出气面的板体，所述板体内形成有气体分配***，所述气体分配***包括主进气通道、过渡通道及喷淋通道，所述喷淋 通道沿其延伸方向形成有多个延伸至所述出气面的喷淋孔，且所述喷淋通道通过所述过渡通道与所述主进气通道连通。
在其中一个实施例中，所述过渡通道及所述喷淋通道均设置有多个，且多个所述过渡通道及所述喷淋通道一一对应，每个所述喷淋通道均通过多个连接通道与对应的过渡通道连通，多个所述连接通道沿所述喷淋通道的延伸方向间隔分布，所述主进气通道依次与多个所述过渡通道连通。
在其中一个实施例中，每个所述喷淋通道呈长条形并沿第一方向延伸，且多个所述喷淋通道沿垂直于所述第一方向的第二方向间隔设置。
在其中一个实施例中，每个所述过渡通道呈长条形并沿所述第一方向延伸，且每个所述过渡通道与对应的所述喷淋通道沿垂直于所述第一方向及所述第二方向的第三方向间隔设置。
在其中一个实施例中，所述主进气通道呈长条形并沿所述第二方向延伸。
在其中一个实施例中，所述主进气通道依次与多个所述过渡通道的中部连通。
在其中一个实施例中，所述主进气通道与每个所述过渡通道的连通处相对于所述过渡通道的中点处向所述过渡通道的一端偏移。
在其中一个实施例中，所述过渡通道位于所述连通处背向所述中心处一侧的内径小于位于所述连通处朝向所述中心处一侧的内径。
在其中一个实施例中，所述主进气通道与每个所述过渡通道的连通处位于所述过渡通道的中点处。
在其中一个实施例中，所述连通处沿所述第一方向的两侧，所述连接通道的数量相同。
在其中一个实施例中，所述主进气通道延伸方向的两端均设置有进气口。
在其中一个实施例中，所述主进气通道包括导入通道、沿所述第一方向延伸的分流通道及两个沿所述第二方向延伸的导出通道，所述导入通道与所述分流通道的中部连通，两个所述导出通道分别与所述分流通道的两端连通，且其中一个所述导出通道依次与多个所述过渡通道的一端连通，另一个所述导出通道依次与多个所述过渡通道的另一端连通。
在其中一个实施例中，所述导入通道与所述分流通道的连通处相对于所述分流通道的中点处向所述分流通道的一端偏移。
在其中一个实施例中，所述分流通道位于所述连通处背向所述中心处一侧的内径小于位于所述连通处朝向所述中心处一侧的内径。
在其中一个实施例中，所述导入通道与所述分流通道的连通处位于所述分流通道的中点处。
在其中一个实施例中，所述导入通道及所述分流通道均设置有两个，两个所述分流通道分布于所述板体沿所述第二方向的两端，两个所述导出通道的一端与其中一个所述分流通道的两端连通，两个所述导出通道的另一端与另一个所述分流通道的两端连通。
在其中一个实施例中，所述板体内设置有至少两个所述气体分配***，且至少两个所述气体分配***的所述喷淋通道沿所述第二方向交替设置。
一种喷淋板，包括具有出气面的板体，所述板体内形成有气体分配***，所述气体分配***包括主进气通道、过渡通道及喷淋通道，所述喷淋通道还连通有多个的喷淋孔，各所述喷淋孔沿所述喷淋通道的延伸方向间隔设置，各所述喷淋孔能够延伸至所述出气面，且所述喷淋通道通过所述过渡通道与所述主进气通道连通。
在其中一个实施例中，所述过渡通道及所述喷淋通道均设置有多个，且多个所述过渡通道及所述喷淋通道一一对应，每个所述喷淋通道均通过多个连接通道与对应的所述过渡通道连通，多个所述连接通道沿所述喷淋通道的延伸方向间隔分布，所述主进气通道依次与多个所述过渡通道连通。
在其中一个实施例中，每个所述喷淋通道呈长条形并沿第一方向延伸，且多个所述喷淋通道沿第二方向间隔设置，所述第一方向和所述第二方向呈夹角设置。
在其中一个实施例中，每个所述过渡通道呈长条形并沿所述第一方向延伸，且每个所述过渡通道与对应的所述喷淋通道沿第三方向间隔设置，所述第三方向与所述第一方向及所述第二方向均呈夹角设置。
在其中一个实施例中，所述主进气通道呈长条形并沿所述第二方向延伸。
在其中一个实施例中，所述主进气通道与每个所述过渡通道的连通处 相对于所述过渡通道的中点处向所述过渡通道的一端偏移。
在其中一个实施例中，所述过渡通道包括位于所述连通处两侧的第一通道部和第二通道部，所述第一通道部的长度小于所述第二通道部，所述第一通道部的内径小于所述第二通道部的内径。
在其中一个实施例中，所述主进气通道与每个所述过渡通道的连通处位于所述过渡通道的中点处。
在其中一个实施例中，所述过渡通道在其连通处沿所述第一方向的两侧，所述连接通道的数量相同。
在其中一个实施例中，所述主进气通道延伸方向的两端均设置有进气口。
在其中一个实施例中，所述主进气通道包括导入通道、沿所述第一方向延伸的分流通道及两个沿所述第二方向延伸的导出通道，所述导入通道与所述分流通道连通，两个所述导出通道分别与所述分流通道的两端连通，且其中一个所述导出通道依次与多个所述过渡通道的一端连通，另一个所述导出通道依次与多个所述过渡通道的另一端连通。
在其中一个实施例中，所述导入通道与所述分流通道的连通处相对于所述分流通道的中点处向所述分流通道的一端偏移。
在其中一个实施例中，所述分流通道包括位于所述连通处两侧的第三通道部和第四通道部，所述第三通道部的长度小于所述第四通道部的长度，所述第三通道部的内径小于所述第四通道部的内径。
在其中一个实施例中，所述导入通道与所述分流通道的连通处位于所述分流通道的中点处。
在其中一个实施例中，所述导出通道及所述分流通道均设置有两个，两个所述分流通道分布于所述板体沿所述第二方向的两端，两个所述导出通道的一端与其中一个所述分流通道的两端连通，两个所述导出通道的另一端与另一个所述分流通道的两端连通。
在其中一个实施例中，所述板体内设置有至少两个所述气体分配***，且至少两个所述气体分配***的所述喷淋通道沿所述第二方向交替设置。
一种处理装置，包括如上述优选实施例中任一项所述的喷淋板及处理腔体，所述喷淋板安装于所述处理腔体且所述出气面朝向所述处理腔体的 内侧。
上述喷淋板及处理装置，工艺气体先由主进气通道进入板体的内部，再经过过渡通道中转后进入喷淋通道，最终由喷淋孔从出气面导入处理腔体内。过渡通道能够起到缓冲作用，避免喷淋通道内的气压直接受到主进气通道内气压波动的影响，故喷淋通道内的气压能够保持较好的一致性。因此，经过过渡通道中转后，从出气面的各区域喷出的气流量也更均衡，从而能够提升工艺气体在处理腔体内分布的均匀性。
一种喷淋方法，包括步骤：
经主进气通道将工艺气体导入过渡通道；
工艺气体经所述过渡通道过渡后导入与所述过渡通道连通的喷淋通道内；
进入所述喷淋通道的工艺气体沿所述喷淋通道输送，并由沿所述喷淋通道的延伸方向分布的多个喷淋孔喷淋至处理腔体。
上述喷淋方法，工艺气体先经主进气通道导入过渡通道，经过渡通道中转后进入喷淋通道。过渡通道能够起到缓冲作用，避免喷淋通道内的气压直接受到主进气通道内气压波动的影响，故喷淋通道内的气压能够保持较好的一致性。因此，经过过渡通道中转后，从喷淋孔喷出的气流量也更均衡，从而能够提升工艺气体在处理腔体内分布的均匀性。
附图说明
为了更清楚地说明本申请实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本申请的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1为本申请一个实施例中处理装置的局部结构示意图；
图2为图1所示处理装置中喷淋板的正面透视图；
图3为图2所示喷淋板中气体分配***的示意图；
图4为本申请另一个实施例中喷淋板的正面透视图；
图5为图4所示喷淋板气体分配***的示意图；
图6为本申请一个实施例中喷淋方法的流程示意图。
具体实施方式
为使本申请的上述目的、特征和优点能够更加明显易懂，下面结合附图对本申请的具体实施方式做详细的说明。在下面的描述中阐述了很多具体细节以便于充分理解本申请。但是本申请能够以很多不同于在此描述的其它方式来实施，本领域技术人员可以在不违背本申请内涵的情况下做类似改进，因此本申请不受下面公开的具体实施例的限制。
在本申请的描述中，需要理解的是，术语“中心”、“纵向”、“横向”、“长度”、“宽度”、“厚度”、“上”、“下”、“前”、“后”、“左”、“右”、“竖直”、“水平”、“顶”、“底”、“内”、“外”、“顺时针”、“逆时针”、“轴向”、“径向”、“周向”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本申请和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本申请的限制。
此外，术语“第一”、“第二”仅用于描述目的，而不能理解为指示或暗示相对重要性或者隐含指明所指示的技术特征的数量。由此，限定有“第一”、“第二”的特征可以明示或者隐含地包括至少一个该特征。在本申请的描述中，“多个”的含义是至少两个，例如两个，三个等，除非另有明确具体的限定。
在本申请中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系，除非另有明确的限定。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本申请中的具体含义。
在本申请中，除非另有明确的规定和限定，第一特征在第二特征“上”或“下”可以是第一和第二特征直接接触，或第一和第二特征通过中间媒 介间接接触。而且，第一特征在第二特征“之上”、“上方”和“上面”可是第一特征在第二特征正上方或斜上方，或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”可以是第一特征在第二特征正下方或斜下方，或仅仅表示第一特征水平高度小于第二特征。
需要说明的是，当元件被称为“固定于”或“设置于”另一个元件，它可以直接在另一个元件上或者也可以存在居中的元件。当一个元件被认为是“连接”另一个元件，它可以是直接连接到另一个元件或者可能同时存在居中元件。本文所使用的术语“垂直的”、“水平的”、“上”、“下”、“左”、“右”以及类似的表述只是为了说明的目的，并不表示是唯一的实施方式。
请参阅图1，本申请提供了一种处理装置10及喷淋板100。其中，处理装置10包括喷淋板100及处理腔体200。
处理腔体200内能够形成真空，喷淋板100具有出气面111。喷淋板100安装于处理腔体200，且出气面111朝向处理腔体200的内侧。工艺气体能够导入喷淋板100后，并由出气面111上的喷淋孔1231喷淋至处理腔体200内，从而使处理腔体200内发生反应。譬如，在硅片的表面镀氧化铝膜。
具体在本实施例中，处理装置10为原子层沉积镀膜装置，故工艺气体进入处理腔体200内后能够发生镀膜反应。显然，处理装置10也可应用于其他领域。
请一并参阅图2及图3，本申请一个实施例中的喷淋板100包括板体110及气体分配***120。
板体110一般由金属材料成型，其外部轮廓与处理腔体200的轮廓相匹配，上述出气面111形成于板体110的一侧。气体分配***120能够进行工艺气体的导入、分配，并最终将工艺气体由喷淋孔1231喷淋至处理腔体200内。由于镀膜时所需的工艺气体至少为两种，故气体分配***120设置有至少两个(一般为两个)，至少两个气体分配***120彼此独立，且结构相同。
每个气体分配***120包括主进气通道121、过渡通道122及喷淋通道123。
板体110可以是一体成型的结构，通过钻孔的方式能够在板体110内加工出气体分配***120的流道结构。此外，板体110也可由两部分拼接构成，分别在构成板体110的两部分上加工出凹槽后再进行组合，也可得到气体分配***120的流道结构。
主进气通道121具有进气口，进气口能够与气源连通，从而实现工艺气体的导入。喷淋通道123均匀分布于板体110内。喷淋通道123沿其延伸方向形成有多个延伸至出气面111的喷淋孔1231；即喷淋通道123连通有多个喷淋孔1231，各喷淋孔1231沿喷淋通道123的延伸方向间隔设置，且各喷淋孔123均能够延伸至出气面111。喷淋通道123通过过渡通道122与主进气通道121连通。因此，由主进气通道121导入板体110的工艺气体在经过过渡通道122中转后能够进入喷淋通道123，并最终由喷淋孔1231喷淋至处理腔体200内。过渡通道122能够起到缓冲作用，避免喷淋通道123内的气压直接受到主进气通道121内气压波动的影响，故喷淋通道123内的气压能够保持较好的一致性。因此，从出气面111的各区域喷出的工艺气体的流速一致性较好，气流量也更均衡，从而能够提升工艺气体在处理腔体200内分布的均匀性，进而改善镀膜膜厚的均匀性。
具体在本实施例中，过渡通道122及喷淋通道123均设置有多个，且多个过渡通道122及喷淋通道123一一对应，每个喷淋通道123均通过多个连接通道124与对应的过渡通道122连通，多个连接通道124沿喷淋通道123的延伸方向间隔分布，主进气通道121依次与多个过渡通道122连通。
譬如，过渡通道122设置有十个，则喷淋通道123也设置有十个。喷淋通道123与过渡通道122之间的多个连接通道124可以是等间隔设置，也可以是非等间隔设置，连接通道124也可根据实际需要设置成三个、四个、五个或其他数量。多个喷淋通道123能够使工艺气体更均匀的喷淋，而多个过渡通道122分别进行工艺气体的中转，能够保证每个喷淋通道123均能够获得流量相当的工艺气体。而且，多个连接通道124能够使得过渡通道122内的工艺气体从多个不同的位置同时进入到喷淋通道123，从而能够使得喷淋通道123内的工艺气体的分布也更均匀。
喷淋通道123可以呈长条形、圆弧形或者波浪形等形状，考虑到成型 工艺的复杂程度，本实施例中的喷淋通道123呈长条形，并沿第一方向延伸。第一方向指的是图2所示的左右方向，即板体110的宽度方向。而且，多个喷淋通道123沿垂直于第一方向的第二方向间隔设置。第二方向指的是图2所示的上下方向，即板体110的长度方向。应理解，第二方向也可以不和第一方向相垂直，即第二方向也可以是和第一方向呈非90度的夹角，这样也是可行的。相邻两个喷淋通道123之间的距离大致相同，通过使多个喷淋通道123沿第二方向间隔设置，可实现多个喷淋通道123在板体110内的均匀分布。
在本实施例中，每个过渡通道122呈长条形并沿第一方向延伸，且每个过渡通道122与对应的喷淋通道123沿垂直于第一方向及第二方向的第三方向间隔设置。第三方向指的是图2所示垂直于图纸平面的方向，即板体110的厚度方向。应理解，第三方向也可以不和第一方向、第二方向相垂直，即第三方向也可以和第一方向、第二方向呈非90度的夹角，这样也是可行的。
如此设置，能够合理利用板体110沿第一方向(如厚度方向)的空间，方便至少两个气体分配***120在板体110内进行布置。而且，由于过渡通道122与喷淋通道123平行，故在过渡通道122及喷淋通道123的延伸方向上，过渡通道122与对应的喷淋通道123之间距离保持不变，故在进行工艺气体的中转时，能够使过渡通道122内的工艺气体更均衡地进入对应的喷淋通道123内。
请再次参阅图2，在本实施例中，至少两个气体分配***120的喷淋通道123沿第二方向交替设置。具体的，属于同一气体分配***120的两个喷淋通道123之间设置有另一个气体分配***120的喷淋通道123。如此，至少两种不同类型的工艺气体能够在处理腔体200内分布均匀并充分反应，有利于进一步提升工艺气体在处理腔体200内分布的均匀性。
请再次参阅图3，在本实施例中，主进气通道121呈长条形并沿第二方向延伸。如此，工艺气体由主进气通道121流向各过渡通道122的流动路线较短，有利于使工艺气体快速到达过渡通道122，并减小因流动路线过长而导致工艺气体进入各过渡通道122时的流速差距。
在本实施例中，主进气通道121依次与多个过渡通道122的中部连通。 工艺气体由主进气通道121进入过渡通道122后，将从中部向过渡通道122的两端分流，从而使得工艺气体在过渡通道122内分布更均匀，进而提升喷淋通道123内工艺气体的均匀性，最终提升工艺气体在处理腔体200内分布的均匀性。
具体的，主进气通道121与过渡通道122的连通处一般位于两个连接管道124之间。在本实施例中，在主进气通道121与过渡通道122的连通处沿第一方向的两侧，连接通道124的数量相同。譬如，过渡通道122通过四个连接通道124与对应的喷淋通道123连通，则主进气通道121与该过渡通道122连通处的两侧分别分布有两个连接通道124。如此，可使过渡通道122内的工艺气体更加均衡的进入对应的喷淋通道123内。
此外，在本实施例中，主进气通道121延伸方向的两端均设置有进气口。因此，在将工艺气体导入气体分配***120时，能够由主进气通道121的两端同时导入两路气流，两路气流能够同时向多个过渡通道122流动。如此，主进气通道121与多个过渡通道122连通处的气体流速的差距能够进一步减小，多个过渡通道122内气压的一致性更高，从而有助于进一步提升工艺气体在处理腔体200内分布的均匀性。
为了至少两个气体分配***120能够在板体110内实现分布，主进气通道121通常沿板体110的宽度方向朝一侧偏移(即，非居中设置)。具体在本实施例中，主进气通道121与每个过渡通道122的连通处相对于过渡通道122的中点处向过渡通道122的一端偏移。
在本实施例中，过渡通道122位于连通处背向中心处一侧的内径小于位于连通处朝向中心处一侧的内径。为便于描述，可以将过渡通道122位于连通处的两侧分别称之为第一通道部和第二通道部，其中，第一通道部的长度小于第二通道部的长度，这样，第一通道部即位于过渡通道122的连通处背向中心处的一侧，第二通道部即位于过渡通道122的连通处朝向中心处的一侧。
也就是说，在过渡通道122的延伸方向上，其不同位置的内径是不同的。以图2所示为例，其中一个气体分配***120的主进气通道121与过渡通道122的连通处相对于过渡通道122的中点处向左偏移，则过渡通道122左侧(即第一通道部)的内径要小于右侧(即第二通道部)的内径。 内径较大的一侧能够获得更大的流量。如此，能够实现工艺气体在过渡通道122内更加均匀的分布。
显然，在其他实施例中，通过优化布局，也可使得主进气通道121与每个过渡通道122的连通处位于过渡通道122的中点处。
请一并参阅图4及图5，在另一个实施例中，主进气通道121包括导入通道1211、分流通道1212及导出通道1213。
导入通道1211具有进气口，能够实现工艺气体的导入。分流通道1212沿第一方向延伸，导入通道1211与分流通道1212的中部连通。导出通道1213设置有两个，两个导出通道1213均沿第二方向延伸，且两个导出通道1213分别与分流通道1212的两端连通。其中一个导出通道1213依次与多个过渡通道122的一端连通，另一个导出通道1213依次与多个过渡通道122的另一端连通。
具体的，两个导出通道1213分布于板体110的左侧及右侧(参照图4中的方位和位置关系)，位于左侧的导出通道1213与多个过渡通道122的左端连通，而位于右侧的导出通道1213则与多个过渡通道122的右端连通。工艺气体经导入通道1211导入后，在分流通道1212进行分流并一分为二得到两路气流，分出的两路气流分别经过两个导出通道1213从过渡通道122的两端进入过渡通道122。如此，能够进一步提升工艺气体的均匀性。
在该实施例中，导入通道1211及分流通道1212均设置有两个，两个分流通道1212分布于板体110沿第二方向的两端，两个导出通道1213的一端与其中一个分流通道1212的两端连通，两个导出通道1213的另一端与另一个分流通道1212的两端连通。如此，两路工艺气体的气流能够同时由两个导入通道1211导入气体分配***120。因此，主进气通道121与多个过渡通道122连通处的气体流速的差距能够进一步减小，多个过渡通道122内气压的一致性更高，从而有助于进一步提升工艺气体在处理腔体200内分布的均匀性。
同样的，为了至少两个气体分配***120能够在板体110内实现分布，导入通道1211通常沿板体110的宽度方向朝一侧偏移(即，非居中设置)。具体的，在该实施例中，导入通道1211与分流通道1212的连通处相对于分流通道1212的中点处向分流通道1212的一端偏移。
在该实施例中，分流通道1212位于连通处背向中心处一侧的内径小于位于连通处朝向中心处一侧的内径。为便于描述，可以将分流通道1212位于连通处的两侧分别称之为第三通道部和第四通道部，其中，第三通道部的长度小于第四通道部的长度，这样，第三通道部即位于分流通道1212的连通处背向中心处的一侧，第四通道部即位于分流通道1212的连通处朝向中心处的一侧。
也就是说，在分流通道1212的延伸方向上，其不同位置的内径是不同的。以图4所示为例，其中一个气体分配***120的导入通道1211与分流通道1212的连通处相对于分流通道1212的中点处向左偏移，则分流通道1212左侧(即第三通道部)的内径要小于右侧(即第四通道部)的内径。内径较大的一侧能够获得更大的流量。如此，能够实现工艺气体在分流通道1212内更加均匀的分布，从而使得两个导出通道1213能够获得流量相当的工艺气体。
显然，在其他实施例中，通过优化布局，也可使得导入通道1211与分流通道1212的连通处位于分流通道1212的中点处。
上述喷淋板100及处理装置10，工艺气体先由主进气通道121进入板体110的内部，再经过过渡通道122中转后进入喷淋通道123，最终由喷淋孔1231从出气面111导入处理腔体200内。过渡通道122能够起到缓冲作用，避免喷淋通道123内的气压直接受到主进气通道121内气压波动的影响，故喷淋通道123内的气压能够保持较好的一致性。因此，经过过渡通道122中转后，从出气面111的各区域喷出的气流量也更均衡，从而能够提升工艺气体在处理腔体200内分布的均匀性。
此外，本申请还提供一种喷淋方法，该喷淋方法可借助上述喷淋板100实现，也可采用其他喷淋装置实现。
请一并参阅图6，本申请一个实施例中的喷淋方法包括步骤S201至S203。其中：
步骤S201，经主进气通道将工艺气体导入过渡通道。
步骤S202，工艺气体经过渡通道过渡后导入与过渡通道连通的喷淋通道内。
步骤S203，进入喷淋通道的工艺气体沿喷淋通道输送，并由沿喷淋通 道的延伸方向分布的多个喷淋孔喷淋至处理腔体。
主进气通道具有进气口，进气口能够与气源连通，从而实现工艺气体的导入。喷淋通道沿其延伸方向形成有多个喷淋孔，喷淋通道通过过渡通道与主进气通道连通。因此，由主进气通道导入板体的工艺气体在经过过渡通道过渡后能够导入喷淋通道，并最终由喷淋孔喷淋至处理腔体内。过渡通道能够起到缓冲作用，避免喷淋通道内的气压直接受到主进气通道内气压波动的影响，故喷淋通道内的气压能够保持较好的一致性。因此，从喷淋孔喷出的工艺气体的流速一致性较好，气流量也更均衡，从而能够提升工艺气体在处理腔体内分布的均匀性。
以上所述实施例的各技术特征可以进行任意的组合，为使描述简洁，未对上述实施例中的各个技术特征所有可能的组合都进行描述，然而，只要这些技术特征的组合不存在矛盾，都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本申请的几种实施方式，其描述较为具体和详细，但并不能因此而理解为对申请专利范围的限制。应当指出的是，对于本领域的普通技术人员来说，在不脱离本申请构思的前提下，还可以做出若干变形和改进，这些都属于本申请的保护范围。因此，本申请专利的保护范围应以所附权利要求为准。

Claims (35)

  1. 一种喷淋板，包括具有出气面的板体，所述板体内形成有气体分配***，其特征在于，所述气体分配***包括主进气通道、过渡通道及喷淋通道，所述喷淋通道沿其延伸方向形成有多个延伸至所述出气面的喷淋孔，且所述喷淋通道通过所述过渡通道与所述主进气通道连通。
  2. 根据权利要求1所述的喷淋板，其特征在于，所述过渡通道及所述喷淋通道均设置有多个，且多个所述过渡通道及所述喷淋通道一一对应，每个所述喷淋通道均通过多个连接通道与对应的所述过渡通道连通，多个所述连接通道沿所述喷淋通道的延伸方向间隔分布，所述主进气通道依次与多个所述过渡通道连通。
  3. 根据权利要求2所述的喷淋板，其特征在于，每个所述喷淋通道呈长条形并沿第一方向延伸，且多个所述喷淋通道沿垂直于所述第一方向的第二方向间隔设置。
  4. 根据权利要求3所述的喷淋板，其特征在于，每个所述过渡通道呈长条形并沿所述第一方向延伸，且每个所述过渡通道与对应的所述喷淋通道沿垂直于所述第一方向及所述第二方向的第三方向间隔设置。
  5. 根据权利要求3所述的喷淋板，其特征在于，所述主进气通道呈长条形并沿所述第二方向延伸。
  6. 根据权利要求5所述的喷淋板，其特征在于，所述主进气通道依次与多个所述过渡通道的中部连通。
  7. 根据权利要求6所述的喷淋板，其特征在于，所述主进气通道与每个所述过渡通道的连通处相对于所述过渡通道的中点处向所述过渡通道的一端偏移。
  8. 根据权利要求7所述的喷淋板，其特征在于，所述过渡通道位于所述连通处背向所述中心处一侧的内径小于位于所述连通处朝向所述中心处一侧的内径。
  9. 根据权利要求6所述的喷淋板，其特征在于，所述主进气通道与每个所述过渡通道的连通处位于所述过渡通道的中点处。
  10. 根据权利要求7至9任一项所述的喷淋板，其特征在于，所述连通 处沿所述第一方向的两侧，所述连接通道的数量相同。
  11. 根据权利要求5所述的喷淋板，其特征在于，所述主进气通道延伸方向的两端均设置有进气口。
  12. 根据权利要求3所述的喷淋板，其特征在于，所述主进气通道包括导入通道、沿所述第一方向延伸的分流通道及两个沿所述第二方向延伸的导出通道，所述导入通道与所述分流通道的中部连通，两个所述导出通道分别与所述分流通道的两端连通，且其中一个所述导出通道依次与多个所述过渡通道的一端连通，另一个所述导出通道依次与多个所述过渡通道的另一端连通。
  13. 根据权利要求12所述的喷淋板，其特征在于，所述导入通道与所述分流通道的连通处相对于所述分流通道的中点处向所述分流通道的一端偏移。
  14. 根据权利要求13所述的喷淋板，其特征在于，所述分流通道位于所述连通处背向所述中心处一侧的内径小于位于所述连通处朝向所述中心处一侧的内径。
  15. 根据权利要求12所述的喷淋板，其特征在于，所述导入通道与所述分流通道的连通处位于所述分流通道的中点处。
  16. 根据权利要求12所述的喷淋板，其特征在于，所述导入通道及所述分流通道均设置有两个，两个所述分流通道分布于所述板体沿所述第二方向的两端，两个所述导出通道的一端与其中一个所述分流通道的两端连通，两个所述导出通道的另一端与另一个所述分流通道的两端连通。
  17. 根据权利要求3所述的喷淋板，其特征在于，所述板体内设置有至少两个所述气体分配***，且至少两个所述气体分配***的所述喷淋通道沿所述第二方向交替设置。
  18. 一种喷淋板，包括具有出气面的板体，所述板体内形成有气体分配***，其特征在于，所述气体分配***包括主进气通道、过渡通道及喷淋通道，所述喷淋通道还连通有多个的喷淋孔，各所述喷淋孔沿所述喷淋通道的延伸方向间隔设置，各所述喷淋孔能够延伸至所述出气面，且所述喷淋通道通过所述过渡通道与所述主进气通道连通。
  19. 根据权利要求18所述的喷淋板，其特征在于，所述过渡通道及所 述喷淋通道均设置有多个，且多个所述过渡通道及所述喷淋通道一一对应，每个所述喷淋通道均通过多个连接通道与对应的所述过渡通道连通，多个所述连接通道沿所述喷淋通道的延伸方向间隔分布，所述主进气通道依次与多个所述过渡通道连通。
  20. 根据权利要求19所述的喷淋板，其特征在于，每个所述喷淋通道呈长条形并沿第一方向延伸，且多个所述喷淋通道沿第二方向间隔设置，所述第一方向和所述第二方向呈夹角设置。
  21. 根据权利要求20所述的喷淋板，其特征在于，每个所述过渡通道呈长条形并沿所述第一方向延伸，且每个所述过渡通道与对应的所述喷淋通道沿第三方向间隔设置，所述第三方向与所述第一方向及所述第二方向均呈夹角设置。
  22. 根据权利要求20所述的喷淋板，其特征在于，所述主进气通道呈长条形并沿所述第二方向延伸。
  23. 根据权利要求22所述的喷淋板，其特征在于，所述主进气通道与每个所述过渡通道的连通处相对于所述过渡通道的中点处向所述过渡通道的一端偏移。
  24. 根据权利要求23所述的喷淋板，其特征在于，所述过渡通道包括位于所述连通处两侧的第一通道部和第二通道部，所述第一通道部的长度小于所述第二通道部，所述第一通道部的内径小于所述第二通道部的内径。
  25. 根据权利要求22所述的喷淋板，其特征在于，所述主进气通道与每个所述过渡通道的连通处位于所述过渡通道的中点处。
  26. 根据权利要求23至25任一项所述的喷淋板，其特征在于，所述过渡通道在其连通处沿所述第一方向的两侧，所述连接通道的数量相同。
  27. 根据权利要求22所述的喷淋板，其特征在于，所述主进气通道延伸方向的两端均设置有进气口。
  28. 根据权利要求20所述的喷淋板，其特征在于，所述主进气通道包括导入通道、沿所述第一方向延伸的分流通道及两个沿所述第二方向延伸的导出通道，所述导入通道与所述分流通道连通，两个所述导出通道分别与所述分流通道的两端连通，且其中一个所述导出通道依次与多个所述过渡通道的一端连通，另一个所述导出通道依次与多个所述过渡通道的另一 端连通。
  29. 根据权利要求28所述的喷淋板，其特征在于，所述导入通道与所述分流通道的连通处相对于所述分流通道的中点处向所述分流通道的一端偏移。
  30. 根据权利要求29所述的喷淋板，其特征在于，所述分流通道包括位于所述连通处两侧的第三通道部和第四通道部，所述第三通道部的长度小于所述第四通道部的长度，所述第三通道部的内径小于所述第四通道部的内径。
  31. 根据权利要求28所述的喷淋板，其特征在于，所述导入通道与所述分流通道的连通处位于所述分流通道的中点处。
  32. 根据权利要求28所述的喷淋板，其特征在于，所述导出通道及所述分流通道均设置有两个，两个所述分流通道分布于所述板体沿所述第二方向的两端，两个所述导出通道的一端与其中一个所述分流通道的两端连通，两个所述导出通道的另一端与另一个所述分流通道的两端连通。
  33. 根据权利要求20所述的喷淋板，其特征在于，所述板体内设置有至少两个所述气体分配***，且至少两个所述气体分配***的所述喷淋通道沿所述第二方向交替设置。
  34. 一种处理装置，其特征在于，包括如上述权利要求1至33任一项所述的喷淋板及处理腔体，所述喷淋板安装于所述处理腔体且所述出气面朝向所述处理腔体的内侧。
  35. 一种喷淋方法，其特征在于，包括步骤：
    经主进气通道将工艺气体导入过渡通道；
    工艺气体经所述过渡通道过渡后导入与所述过渡通道连通的喷淋通道内；
    进入所述喷淋通道的工艺气体沿所述喷淋通道输送，并由沿所述喷淋通道的延伸方向分布的多个喷淋孔喷淋至处理腔体。
PCT/CN2023/136680 2022-12-15 2023-12-06 喷淋板、喷淋方法及处理装置 WO2024125354A1 (zh)

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US20140174362A1 (en) * 2012-12-21 2014-06-26 Chien-Teh Kao Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
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CN209412313U (zh) * 2018-12-30 2019-09-20 东泰高科装备科技有限公司 一种喷淋单元及喷淋模块
WO2022077637A1 (zh) * 2020-10-13 2022-04-21 东部超导科技（苏州）有限公司 喷淋板、配置喷淋板的mocvd反应***及其使用方法
CN114774887A (zh) * 2022-06-22 2022-07-22 拓荆科技(北京)有限公司 气体传输装置、方法和半导体沉积设备
CN116240525A (zh) * 2022-12-15 2023-06-09 江苏微导纳米科技股份有限公司 喷淋板、喷淋方法及处理装置

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US20140174362A1 (en) * 2012-12-21 2014-06-26 Chien-Teh Kao Apparatus And Methods For Symmetrical Gas Distribution With High Purge Efficiency
CN103966574A (zh) * 2013-01-30 2014-08-06 纽富来科技股份有限公司 气相生长装置及气相生长方法
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