WO2024061253A1 - Emraclidine的晶型及其制备方法和用途 - Google Patents

Emraclidine的晶型及其制备方法和用途 Download PDF

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WO2024061253A1
WO2024061253A1 PCT/CN2023/119900 CN2023119900W WO2024061253A1 WO 2024061253 A1 WO2024061253 A1 WO 2024061253A1 CN 2023119900 W CN2023119900 W CN 2023119900W WO 2024061253 A1 WO2024061253 A1 WO 2024061253A1
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Prior art keywords
crystal form
ray powder
powder diffraction
compound
diffraction pattern
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PCT/CN2023/119900
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English (en)
French (fr)
Inventor
钱佳乐
黄春香
孟丽苹
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苏州科睿思制药有限公司
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Publication of WO2024061253A1 publication Critical patent/WO2024061253A1/zh

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    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K31/00—Medicinal preparations containing organic active ingredients
    • A61K31/33—Heterocyclic compounds
    • A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
    • A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
    • A61K31/4353—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom ortho- or peri-condensed with heterocyclic ring systems
    • A61K31/437—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom ortho- or peri-condensed with heterocyclic ring systems the heterocyclic ring system containing a five-membered ring having nitrogen as a ring hetero atom, e.g. indolizine, beta-carboline
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
    • A61P25/00—Drugs for disorders of the nervous system
    • A61P25/18—Antipsychotics, i.e. neuroleptics; Drugs for mania or schizophrenia
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems

Definitions

  • the present invention relates to the field of crystal chemistry, and in particular to a crystal form of Emraclidine and a preparation method and use thereof.
  • Schizophrenia is a severe, complex and debilitating mental health disorder characterized by a range of symptoms including delusions, hallucinations, disorganized speech or behavior, slowed speech and blunted affect.
  • Emraclidine (CVL-231), developed by Cerevel Therapeutics, is a positive allosteric modulator (PAM) that selectively targets the muscarinic acetylcholine 4 (M4) receptor for the treatment of schizophrenia. Its Phase Ib clinical results showed that emraclidine demonstrated clinically meaningful antipsychotic activity compared with placebo.
  • PAM positive allosteric modulator
  • Emraclidine 1-(2,4-dimethyl-5,7-dihydro-6H-pyrrolo[3,4-b]pyridin-6-yl)-2- ⁇ 1-[2-( Trifluoromethyl)pyridin-4-yl]azetidin-3-yl ⁇ ethanone (hereinafter referred to as "Compound I"), this compound is disclosed in WO2018002760A1.
  • the structural formula of compound I is as follows:
  • a crystal is a solid in which compound molecules are arranged in a three-dimensional orderly manner in a microstructure to form a lattice.
  • Polymorphism refers to the phenomenon that a compound exists in multiple crystal forms.
  • a compound may exist in one or more crystal forms, but its existence and characteristics cannot be specifically expected.
  • APIs of different crystal forms have different physicochemical properties, including chemical stability, thermal stability, solubility, hygroscopicity and/or particle size, which may cause different dissolution and absorption of the drug in the body, thereby affecting the clinical efficacy of the drug to a certain extent.
  • APIs of different crystal forms have different manufacturability, including yield, purification properties, filtration properties, drying properties and milling properties, and the stability relative to pressure during tableting may affect the processing and treatment during the production process of the API. Therefore, polymorphism is an important part of drug research and drug quality control. At least for these reasons, it is necessary to find a solid form of Compound I.
  • the inventor of the present application unexpectedly discovered that the crystal of Compound I provided by the present invention has good physical and chemical stability, good stability under mechanical force, and low hygroscopicity, which is of great significance for the development of drugs containing Compound I.
  • the present invention provides a crystal of compound I and a preparation method thereof, including a crystal pharmaceutical composition and use thereof.
  • the present invention provides crystalline form CSI of Compound I (hereinafter referred to as "crystalline form CSI").
  • the X-ray powder diffraction pattern of the crystalline form CSI at the diffraction angle 2 ⁇ is There are characteristic peaks at 1, 2, or 3 of 11.9° ⁇ 0.2°, 5.9° ⁇ 0.2°, and 9.5° ⁇ 0.2°; preferably, the X-ray powder diffraction pattern of the crystal form CSI is at the diffraction angle There are characteristic peaks at 2 ⁇ values of 11.9° ⁇ 0.2°, 5.9° ⁇ 0.2°, and 9.5° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSI has a diffraction angle 2 ⁇ value of 10.7° ⁇ 0.2°, 14.1° ⁇ 0.2°, 22.2° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSI has characteristic peaks at diffraction angle 2 ⁇ values of 10.7° ⁇ 0.2°, 14.1° ⁇ 0.2°, and 22.2° ⁇ 0.2° .
  • the X-ray powder diffraction pattern of the crystal form CSI has a diffraction angle 2 ⁇ value of 10.4° ⁇ 0.2°, 16.3° ⁇ 0.2°, 19.1° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSI has characteristic peaks at diffraction angle 2 ⁇ values of 10.4° ⁇ 0.2°, 16.3° ⁇ 0.2°, and 19.1° ⁇ 0.2° .
  • the X-ray powder diffraction pattern of the crystalline form CSI has diffraction angle 2 ⁇ values of 11.9° ⁇ 0.2°, 5.9° ⁇ 0.2°, 9.5° ⁇ 0.2°, 10.7° ⁇ 0.2°, 14.1° ⁇ 0.2°, 22.2° ⁇ 0.2°, 10.4° ⁇ 0.2°, 16.3° ⁇ 0.2°, 19.1° ⁇ 0.2°, 27.1° ⁇ 0.2°, 21.0° ⁇ 0.2°, 26.7° ⁇ 0.2°, 21.5° Any 1 place, or 2 places, or 3 places, or 4 places, or 5 places, or 6 places, or 7 places, or 8 places, or 9 places, or 10 places, or 11 places, or within ⁇ 0.2° There are characteristic peaks at 12 or 13 places.
  • the X-ray powder diffraction pattern of crystalline form CSI is substantially as shown in Figure 1 using Cu-K ⁇ radiation.
  • the present invention also provides a preparation method of crystalline form CSI.
  • the preparation method includes: dissolving compound I in a ketone solvent and volatilizing to obtain crystalline form CSI.
  • volatilization temperature is preferably -20°C to 50°C.
  • the present invention provides a crystalline form of Compound I, which is, without limitation, crystalline form CSII (hereinafter referred to as "crystalline form CSII").
  • the X-ray powder diffraction pattern of the crystal form CSII has a diffraction angle 2 ⁇ value at 1 of 12.8° ⁇ 0.2°, 19.8° ⁇ 0.2°, 24.4° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSII has characteristic peaks at diffraction angle 2 ⁇ values of 12.8° ⁇ 0.2°, 19.8° ⁇ 0.2°, and 24.4° ⁇ 0.2° .
  • the X-ray powder diffraction pattern of the crystal form CSII has a diffraction angle 2 ⁇ value of 1 of 21.5° ⁇ 0.2°, 22.5° ⁇ 0.2°, 23.3° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSII has characteristic peaks at diffraction angle 2 ⁇ values of 21.5° ⁇ 0.2°, 22.5° ⁇ 0.2°, and 23.3° ⁇ 0.2° .
  • the X-ray powder diffraction pattern of the crystal form CSII has a diffraction angle 2 ⁇ value of 19.2° ⁇ 0.2°, 20.8° ⁇ 0.2°, 25.8° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSII has characteristic peaks at diffraction angle 2 ⁇ values of 19.2° ⁇ 0.2°, 20.8° ⁇ 0.2°, and 25.8° ⁇ 0.2°. .
  • the X-ray powder diffraction pattern of the crystalline form CSII at diffraction angle 2 ⁇ values are 12.8° ⁇ 0.2°, 19.8° ⁇ 0.2°, 24.4° ⁇ 0.2°, and 21.5° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of crystal form CSII is substantially as shown in Figure 2.
  • thermogravimetric analysis diagram of crystal form CSII is basically as shown in Figure 3, and there is basically no weight loss when heated from room temperature to 180°C.
  • differential scanning calorimetry analysis diagram of crystal form CSII is basically as shown in Figure 4. There is an endothermic peak that begins to appear near 183°C. This endothermic peak is a melting endothermic peak.
  • Form CSII is anhydrous.
  • the present invention also provides a preparation method of crystal form CSII.
  • the preparation method includes: placing compound I in a mixed system of methyl tert-butyl ether and alcohols and stirring to obtain crystal form CSII.
  • the alcohol is preferably methanol; the stirring temperature is preferably 0°C-50°C; and the stirring time is preferably 1-10 days.
  • the present invention provides a crystalline form of Compound I, which is, without limitation, crystalline form CSIII (hereinafter referred to as "crystalline form CSIII").
  • the X-ray powder diffraction pattern of the crystal form CSIII has diffraction angle 2 ⁇ values of 12.5° ⁇ 0.2°, 6.2° ⁇ 0.2°, 18.8° ⁇ 0.2°, and 17.5° ⁇ 0.2°. There are characteristic peaks at 1, 2, 3, or 4; preferably, the X-ray powder diffraction pattern of the crystal form CSIII has a diffraction angle 2 ⁇ value of 12.5° ⁇ 0.2° and 6.2° ⁇ 0.2°. There are characteristic peaks at , 18.8° ⁇ 0.2° and 17.5° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSIII has characteristic peaks at one or two of the diffraction angle 2 ⁇ values of 18.1° ⁇ 0.2°, 21.7° ⁇ 0.2°; preferably The X-ray powder diffraction pattern of the crystal form CSIII has characteristic peaks at diffraction angle 2 ⁇ values of 18.1° ⁇ 0.2° and 21.7° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSIII at the diffraction angle 2 ⁇ values are 12.5° ⁇ 0.2°, 6.2° ⁇ 0.2°, 18.8° ⁇ 0.2°, and 17.5° ⁇ 0.2°. , 18.1° ⁇ 0.2°, 21.7° ⁇ 0.2°, 11.6° ⁇ 0.2°, 24.2 ⁇ 0.2°, any 1 place, or 2 places, or 3 places, or 4 places, or 5 places, or 6 places, or There are characteristic peaks at 7 or 8 places.
  • the X-ray powder diffraction pattern of Form CSIII is substantially as shown in Figure 5 using Cu-K ⁇ radiation.
  • thermogravimetric analysis graph of Form CSIII is substantially as shown in FIG6 , and there is substantially no weight loss when heated from room temperature to 170° C.
  • Form CSIII is anhydrous.
  • the present invention also provides a preparation method of crystal form CSIII.
  • the preparation method includes: dissolving compound I in a mixed solvent of ethers and alkanes, and volatilizing to obtain crystal form CSIII.
  • the ether is preferably tetrahydrofuran; the alkane is preferably n-heptane; and the volatilization temperature is preferably 40-60°C.
  • the present invention provides a crystalline form of Compound I, which is, without limitation, crystalline form CSIV (hereinafter referred to as "crystalline form CSIV").
  • the X-ray powder diffraction pattern of the crystal form CSIV has diffraction angle 2 ⁇ values of 13.0° ⁇ 0.2°, 16.4° ⁇ 0.2°, 23.1° ⁇ 0.2°, and 22.0° ⁇ 0.2°. 1 place, or 2 places, or 3 places, or 4 places It has characteristic peaks; preferably, the X-ray powder diffraction pattern of the crystal form CSIV has characteristics at diffraction angle 2 ⁇ values of 13.0° ⁇ 0.2°, 16.4° ⁇ 0.2°, 23.1° ⁇ 0.2°, and 22.0° ⁇ 0.2°. peak.
  • the X-ray powder diffraction pattern of the crystal form CSIV has a diffraction angle 2 ⁇ value of 1 of 24.0° ⁇ 0.2°, 14.2° ⁇ 0.2°, 17.2° ⁇ 0.2°, or 2 or 3; preferably, the X-ray powder diffraction pattern of the crystal form CSIV has characteristic peaks at diffraction angle 2 ⁇ values of 24.0° ⁇ 0.2°, 14.2° ⁇ 0.2°, and 17.2° ⁇ 0.2° .
  • the X-ray powder diffraction pattern of the crystalline form CSIV has characteristic peaks at one, two, or three of the diffraction angles 2 ⁇ of 18.1° ⁇ 0.2°, 20.8° ⁇ 0.2°, and 27.2° ⁇ 0.2°; preferably, the X-ray powder diffraction pattern of the crystalline form CSIV has characteristic peaks at diffraction angles 2 ⁇ of 18.1° ⁇ 0.2°, 20.8° ⁇ 0.2°, and 27.2° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystalline form CSIV has characteristic peaks at any one, or two, or three, or four, or five, or six, or seven, or eight, or nine, or ten of the diffraction angle 2 ⁇ values of 13.0° ⁇ 0.2°, 16.4° ⁇ 0.2°, 23.1° ⁇ 0.2°, 22.0° ⁇ 0.2°, 24.0° ⁇ 0.2°, 14.2° ⁇ 0.2°, 17.2° ⁇ 0.2°, 18.1° ⁇ 0.2°, 20.8° ⁇ 0.2°, 27.2° ⁇ 0.2°, 6.5° ⁇ 0.2°, 8.6° ⁇ 0.2°, 11.5° ⁇ 0.2°, 20.0° ⁇ 0.2°, 20.4° ⁇ 0.2°, and 26.4° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of crystal form CSIV is substantially as shown in Figure 7.
  • thermogravimetric analysis diagram of crystal form CSIV is basically as shown in Figure 8, and there is basically no weight loss when heated from room temperature to 180°C.
  • crystalline form CSIV is anhydrous.
  • the present invention also provides a preparation method of crystal form CSIV, which preparation method includes: heating compound I to 185°C-190°C to obtain crystal form CSIV.
  • the present invention provides a crystalline form of Compound I, which is, without limitation, crystalline form CSV (hereinafter referred to as "crystalline form CSV").
  • the X-ray powder diffraction pattern of the crystal form CSV has diffraction angle 2 ⁇ values of 10.3° ⁇ 0.2°, 19.2° ⁇ 0.2°, 13.5° ⁇ 0.2°, and 14.5° ⁇ 0.2°.
  • peaks at 1, or 2, or 3, or 4 places preferably, the X-ray powder diffraction pattern of the crystal form CSV has a diffraction angle 2 ⁇ value of 10.3° ⁇ 0.2° and 19.2° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSV has characteristic peaks at one or two of the diffraction angle 2 ⁇ values of 18.1° ⁇ 0.2°, 20.0° ⁇ 0.2°; preferably The X-ray powder diffraction pattern of the crystal form CSV has characteristic peaks at diffraction angle 2 ⁇ values of 18.1° ⁇ 0.2° and 20.0° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSV has characteristic peaks at one or two of the diffraction angle 2 ⁇ values of 20.6° ⁇ 0.2°, 12.5° ⁇ 0.2°; preferably The X-ray powder diffraction pattern of the crystal form CSV has characteristic peaks at diffraction angle 2 ⁇ values of 20.6° ⁇ 0.2° and 12.5° ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSV has diffraction angle 2 ⁇ values of 10.3° ⁇ 0.2°, 19.2° ⁇ 0.2°, 13.5° ⁇ 0.2°, and 14.5° ⁇ 0.2°. ,18.1° ⁇ 0.2°, 20.0° ⁇ 0.2°, 20.6° ⁇ 0.2°, 12.5° ⁇ 0.2°, 11.5° ⁇ 0.2°, 24.9° ⁇ 0.2°, 25.4° ⁇ 0.2°, 22.5° ⁇ 0.2°, 22.0° ⁇ 0.2°, 23.2° ⁇ 0.2°, 30.7° There is a characteristic peak at any 1, or 2, or 3, or 4, or 5, or 6, or 7, or 8, or 9 places within ⁇ 0.2°.
  • the X-ray powder diffraction pattern of the crystal form CSV is substantially as shown in Figure 9 using Cu-K ⁇ radiation.
  • thermogravimetric analysis diagram of crystal form CSV is basically as shown in Figure 10, and the weight loss when heated from 35°C to 150°C is about 3.8%.
  • the present invention also provides a preparation method of crystal form CSV.
  • the preparation method includes: placing compound I in a mixed system of dimethyl sulfoxide and water and stirring to obtain crystal form CSV.
  • the stirring temperature is preferably 0°C to 50°C, and further preferably 25°C to 50°C.
  • the stirring time is preferably 1-10 days, more preferably 4-6 days.
  • the present invention provides the use of crystalline form CSI, crystalline form CSII, crystalline form CSIII, crystalline form CSIV and/or crystalline form CSV for preparing other crystalline forms or co-crystals of compound I and its salts.
  • the present invention provides a pharmaceutical composition
  • a pharmaceutical composition comprising an effective therapeutic amount of crystalline form CSI, crystalline form CSII, crystalline form CSIII, crystalline form CSIV and/or crystalline form CSV and pharmaceutically acceptable excipients .
  • the present invention provides the use of crystal form CSI, crystal form CSII, crystal form CSIII, crystal form CSIV and/or crystal form CSV in the preparation of M4 receptor modulator drugs.
  • the present invention provides the use of crystalline form CSI, crystalline form CSII, crystalline form CSIII, crystalline form CSIV and/or crystalline form CSV in the preparation of drugs for the treatment of schizophrenia.
  • the present invention provides excellent properties of crystalline forms
  • the crystal form CSI provided by the present invention has the following excellent properties:
  • the crystalline CSI raw materials and preparations provided by the present invention have good physical and chemical stability.
  • the crystalline CSI raw material of the present invention can be stable for at least 6 months under the conditions of 40°C/75% RH, and the purity remains basically unchanged during storage; after the crystalline CSI of the present invention is mixed with auxiliary materials to make a pharmaceutical preparation, it will be stable at 25 It can be stable for at least 1 month under the conditions of °C/60%RH and 40°C/75%RH, and the purity remains basically unchanged during storage; the crystalline CSI API undergoes 30%-90%-0%-90% After the humidity cycle of RH, the sample properties did not change significantly and the crystal form did not change.
  • Crystalline CSI raw materials and preparations have good physical and chemical stability, which is helpful to avoid the impact on drug quality due to crystallization or purity decrease during drug storage.
  • the crystalline CSI provided by the present invention has a low weight gain due to moisture absorption.
  • the weight gain due to moisture absorption of the crystalline CSI under 30%-80% RH conditions is 0.36%.
  • Strong hygroscopicity can easily cause chemical degradation and crystal transformation of the API, thereby affecting the physicochemical stability of the API.
  • highly hygroscopic drugs place higher demands on production. Low hygroscopic crystals are not demanding on the environment, reduce the cost of material production, storage and quality control, and have strong economic value.
  • the crystal form CSI provided by the present invention has good physical stability under the action of mechanical force.
  • the crystal form of CSI API remains unchanged after grinding and formulation process. During preparation processing, APIs often need to be ground or pulverized. Good physical stability can reduce the decrease in crystallinity of APIs during preparation processing. Low risk of crystallization and crystallization.
  • the crystalline CSI API also has good physical stability under pressure, which is beneficial to maintaining the stability of the crystalline form during the tableting process.
  • the crystal form CSII provided by the invention has the following excellent properties:
  • the crystalline CSII raw materials and preparations provided by the present invention have good physical and chemical stability.
  • the crystalline CSII raw material of the present invention is stable for at least 6 months under the conditions of 25°C/60%RH and 40°C/75%RH, and is stable for at least 1 month under the conditions of 60°C/75%RH, and during storage
  • the average purity remains basically unchanged; after the crystal form CSII of the present invention is mixed with auxiliary materials to make a pharmaceutical preparation, it can be stable for at least 1 month under the conditions of 25°C/60%RH and 40°C/75%RH, and the purity during storage
  • the crystalline CSII API remained basically unchanged; the sample properties did not change significantly and the crystalline form did not change after experiencing a humidity cycle of 0%-90%-0%RH.
  • Crystalline CSII raw materials and preparations have good physical and chemical stability, which is helpful to avoid the impact on drug quality due to crystallization or purity decrease during drug storage.
  • the crystal form CSII provided by the present invention has little weight gain due to moisture absorption.
  • the moisture-induced weight gain of crystal form CSII is 0.28% under the conditions of 0%-80%RH. Strong hygroscopicity can easily cause chemical degradation and crystalline transformation of raw materials, thus affecting the physical and chemical stability of raw materials.
  • highly hygroscopic drugs place higher requirements on production.
  • the low hygroscopicity crystal form has no strict environmental requirements, reduces the cost of material production, storage and quality control, and has strong economic value.
  • the crystal form CSII provided by the present invention has good physical stability under the action of mechanical force.
  • the crystal form of CSII API remains unchanged after grinding and formulation process. APIs often need to be ground or pulverized during preparation processing. Good physical stability can reduce the risk of reduced crystallinity and crystallization of APIs during preparation processing.
  • the crystalline CSII API also has good physical stability under pressure, which is beneficial to maintaining the stability of the crystalline form during the tableting process.
  • the crystal form CSIII provided by the present invention has the following excellent properties:
  • the crystal form CSIII API provided by the present invention has good physical and chemical stability.
  • the crystal form CSIII raw material of the present invention is stable for at least 2 months under the conditions of 40°C/75%RH.
  • the sample properties of the crystal form CSIII API did not change significantly and the crystal form did not change after experiencing a humidity cycle of 0%-90%-0% RH.
  • Crystal form CSIII API has good physical and chemical stability, which is helpful to avoid the impact on drug quality due to crystallization or purity decrease during drug storage.
  • the crystal form CSIII provided by the present invention has little weight gain due to moisture absorption.
  • the moisture gain of crystal form CSIII under the conditions of 0%-80% RH is 0.21%.
  • Strong hygroscopicity can easily cause chemical degradation and crystalline transformation of raw materials, thus affecting the physical and chemical stability of raw materials.
  • highly hygroscopic drugs place higher requirements on production.
  • the low hygroscopicity crystal form has no strict environmental requirements, reduces the cost of material production, storage and quality control, and has strong economic value.
  • the crystal form CSIII provided by the present invention has good physical stability under the action of mechanical force.
  • the crystalline form CSIII API remains unchanged after grinding. APIs often need to be ground or pulverized during preparation processing. Good physical stability can reduce the risk of reduced crystallinity and crystallization of APIs during preparation processing.
  • the crystal form CSIV provided by the present invention has the following excellent properties:
  • the crystalline CSIV raw material provided by the present invention has good physical and chemical stability.
  • the crystalline CSIV raw material of the present invention is stable for at least 6 months under the conditions of 25°C/60%RH and 40°C/75%RH, and is stable for at least 1 month under the conditions of 60°C/75%RH.
  • the crystal form of CSIV API has no obvious change in sample properties and the crystal form does not change after experiencing a humidity cycle of 0%-90%-0% RH.
  • Crystalline CSIV raw materials have good physical and chemical stability, which is helpful to avoid the impact on drug quality due to crystallization or purity decrease during drug storage.
  • the crystal form CSIV provided by the present invention has little weight gain due to moisture absorption.
  • the moisture-induced weight gain of crystal form CSIV is 0.11% under the conditions of 0%-80%RH. Strong hygroscopicity can easily cause chemical degradation and crystalline transformation of raw materials, thus affecting the physical and chemical stability of raw materials.
  • highly hygroscopic drugs place higher requirements on production.
  • the low hygroscopicity crystal form has no strict environmental requirements, reduces the cost of material production, storage and quality control, and has strong economic value.
  • the crystal form CSIV provided by the present invention has good physical stability under the action of mechanical force.
  • the crystal form of CSIV API remains unchanged after grinding. APIs often need to be ground or pulverized during preparation processing. Good physical stability can reduce the risk of reduced crystallinity and crystallization of APIs during preparation processing.
  • the crystal form CSV provided by the present invention has the following excellent properties:
  • the crystalline CSV raw materials and preparations provided by the present invention have good physical and chemical stability.
  • the crystal form CSV raw material of the present invention is stable for at least 6 months under the conditions of 25°C/60%RH and 40°C/75%RH, and is stable for at least 2 months under the conditions of 60°C/75%RH;
  • the crystal form of the invention After CSV is mixed with excipients to make pharmaceutical preparations, it can be stable for at least 1 month under the conditions of 25°C/60%RH and 40°C/75%RH, and the purity remains basically unchanged during storage;
  • the crystalline CSV API is After experiencing the humidity cycle of 30%-90%-0%-90%RH, the sample properties had no obvious changes and the crystal form did not change.
  • Crystalline CSV APIs have good physical and chemical stability, which helps to avoid the impact on drug quality due to crystal transformation or purity reduction during drug storage.
  • the crystal form CSV provided by the present invention has a small weight gain due to moisture absorption.
  • the moisture gain of crystal form CSV under the condition of 30%-80% RH is 0.29%.
  • Strong hygroscopicity can easily cause chemical degradation and crystalline transformation of raw materials, thus affecting the physical and chemical stability of raw materials.
  • highly hygroscopic drugs place higher requirements on production.
  • the low hygroscopicity crystal form has no strict environmental requirements, reduces the cost of material production, storage and quality control, and has strong economic value.
  • the crystal form CSV provided by the present invention has good physical stability under the action of mechanical force.
  • the crystalline form of CSV API remains unchanged after grinding and formulation process. APIs often need to be ground or pulverized during preparation processing. Good physical stability can reduce the risk of reduced crystallinity and crystallization of APIs during preparation processing.
  • the crystalline CSV API also has good physical stability under pressure, which is beneficial to maintaining the stability of the crystalline form during the tableting process.
  • Figure 1 shows the XRPD pattern of crystalline CSI
  • Figure 2 shows the XRPD pattern of crystal form CSII
  • Figure 3 is the TGA diagram of crystal form CSII
  • Figure 4 is the DSC diagram of crystal form CSII
  • Figure 5 shows the XRPD pattern of crystal form CSIII.
  • Figure 6 is the TGA diagram of crystal form CSIII.
  • Figure 7 shows the XRPD pattern of crystal form CSIV
  • Figure 8 is the TGA diagram of crystal form CSIV
  • Figure 9 is the XRPD diagram of the crystalline form CSV
  • Figure 10 is the TGA diagram of crystal form CSV
  • Figure 11 is the XRPD comparison chart of crystalline CSI before and after being placed at 40°C/75%RH for a period of time (from bottom to top: before placement, after being placed at 40°C/75%RH for 6 months)
  • Figure 12 is the XRPD comparison chart of crystalline CSI before and after ball milling (from bottom to top, before and after ball milling)
  • Figure 13 is the DVS diagram of crystalline CSI
  • Figure 14 XRPD diagrams of crystalline CSI and preparations (from bottom to top: crystalline CSI raw material, after crystalline CSI preparation process, and after blank powder mixing preparation process)
  • Figure 15 XRPD comparison chart of the crystalline CSI preparation placed under different conditions (from bottom to top: before placement, after placement at 25°C/60%RH for 1 month, after placement at 40°C/75%RH for 1 month) )
  • Figure 16 is the XRPD comparison chart of crystal form CSII before and after being placed under different conditions for a period of time (from bottom to top: before placement, after placement at 25°C/60%RH for 6 months, and after placement at 40°C/75%RH for 6 months After 1 month, after 1 month at 60°C/75%RH)
  • Figure 17 is the XRPD comparison chart of crystal form CSII before and after ball milling (from bottom to top, before and after ball milling)
  • Figure 18 is the DVS diagram of crystal form CSII
  • Figure 19 XRPD diagram of crystal form CSII and preparation (from bottom to top: crystal form CSII raw material, crystal form CSI after preparation process, blank powder mixing preparation process)
  • Figure 20 XRPD comparison chart of the crystalline CSII preparation placed under different conditions (from bottom to top: before placement, after placement at 25°C/60%RH for 1 month, after placement at 40°C/75%RH for 1 month )
  • Figure 21 is the XRPD comparison chart of crystal form CSIII before and after being placed at 40°C/75%RH for a period of time (from bottom to top: before placement, after being sealed at 40°C/75%RH for 2 months)
  • Figure 22 is the XRPD comparison chart of crystal form CSIII before and after ball milling (from bottom to top, before and after ball milling)
  • Figure 23 is the DVS diagram of crystal form CSIII.
  • Figure 24 is the XRPD comparison chart of crystalline CSIV before and after being placed under different conditions for a period of time (from bottom to top: before placement, after placement at 25°C/60%RH for 6 months, and after placement at 40°C/75%RH for 6 months After 1 month, after 1 month at 60°C/75%RH)
  • Figure 25 is the XRPD comparison chart of crystalline CSIV before and after ball milling (from bottom to top, before and after ball milling)
  • Figure 26 is the DVS diagram of crystal form CSIV
  • Figure 27 is the XRPD comparison chart of crystalline CSV before and after being placed under different conditions for a period of time ((from bottom to top: before placement, after placement at 25°C/60%RH for 6 months, after placement at 40°C/75%RH for 6 months) After 2 months, sealed at 60°C/75%RH for 2 months)
  • Figure 28 is the XRPD comparison chart of crystalline CSV before and after ball milling (from bottom to top, before and after ball milling)
  • Figure 29 is the DVS diagram of crystal form CSV
  • Figure 31 XRPD comparison chart of the crystalline CSV preparation placed under different conditions (from bottom to top: before placement, after placement at 25°C/60%RH for 1 month, after placement at 40°C/75%RH for 1 month )
  • the X-ray powder diffraction pattern of the present invention is collected on a Bruker ray powder diffractometer.
  • the method parameters of X-ray powder diffraction according to the present invention are as follows:
  • thermogravimetric analysis (TGA) graph of the present invention is collected on TA Q500.
  • the method parameters of the thermogravimetric analysis (TGA) of the present invention are as follows:
  • differential scanning calorimetry (DSC) chart described in the present invention was collected on TA Q2000.
  • the method parameters of differential scanning calorimetry (DSC) according to the present invention are as follows:
  • the dynamic moisture adsorption (DVS) diagram described in this experiment was collected on an Intrinsic dynamic moisture adsorption instrument produced by SMS Company (Surface Measurement Systems Ltd.).
  • the instrument control software is DVS-Intrinsic control software.
  • the method parameters of the dynamic moisture adsorption instrument are as follows:
  • Relative humidity range 0%RH-95%RH
  • the "drying" is accomplished by conventional methods in this field, such as vacuum drying, air drying or natural drying.
  • the drying temperature may be room temperature or higher, preferably room temperature to about 60°C, or to 50°C, or to 40°C. Drying time can be 2-48 hours, or overnight. Drying takes place in a fume hood, forced air oven or vacuum oven.
  • the "volatilization” is accomplished by conventional methods in this field, such as slow volatilization or rapid volatilization.
  • Slow evaporation means sealing the container with a sealing film, punching holes, and leaving it to evaporate; rapid evaporation means leaving the container open to evaporate.
  • room temperature is not a specific temperature value, but refers to the temperature range of 10-30°C.
  • the “stirring” is accomplished by conventional methods in the field, such as magnetic stirring or mechanical stirring, the stirring speed is 50-1800 rpm, wherein the magnetic stirring speed is preferably 300-900 rpm, and the mechanical stirring speed is preferably 100-1800 rpm. 300 rpm.
  • the “separation” is accomplished by conventional methods in the art, such as centrifugation or filtration.
  • the operation of "centrifugation” is as follows: place the sample to be separated in a centrifuge tube, and centrifuge at a speed of 10,000 rpm until all solids sink to the bottom of the centrifuge tube.
  • the “characteristic peak” refers to the representative diffraction peak used to identify crystals.
  • the peak position can usually have an error of ⁇ 0.2°.
  • amorphous refers to an amorphous material that does not have long-range order, and its X-ray powder diffraction pattern usually shows a wider "steamed bun peak”.
  • crystal or “crystal form” can be characterized by X-ray powder diffraction.
  • X-ray powder diffraction patterns are affected by instrument conditions, sample preparation and sample purity.
  • the relative intensity of the diffraction peaks in the X-ray powder diffraction pattern may also change with changes in experimental conditions, so the intensity of the diffraction peaks cannot be used as the only or decisive factor in determining the crystal form.
  • the relative intensity of the diffraction peaks in the X-ray powder diffraction pattern is related to the preferred orientation of the crystal.
  • the intensity of the diffraction peaks shown in the present invention is illustrative and not used for absolute comparison.
  • the X-ray powder diffraction pattern of the protected crystalline form of the present invention does not have to be completely consistent with the X-ray powder diffraction pattern in the embodiments referred to here. Any characteristic peaks with the same characteristics in these patterns Crystal forms with the same or similar X-ray powder diffraction patterns fall within the scope of the present invention. Those skilled in the art can compare the X-ray powder diffraction pattern listed in the present invention with the X-ray powder diffraction pattern of an unknown crystal form to confirm whether the two sets of patterns reflect the same or different crystal forms.
  • the Form CSI, Form CSII, Form CSIII, Form CSIV, Form CSV of the present invention is pure, with substantially no admixture of any other crystalline forms.
  • substantially no when used to refer to a new crystal form means that the crystal form contains less than 20% (weight) of other crystal forms, especially less than 10% (weight) of other crystal forms, and even less Less than 5% (weight) of other crystalline forms refers to less than 1% (weight) of other crystalline forms.
  • the compound I as a raw material includes but is not limited to solid form (crystalline or amorphous), oily, liquid form and solution.
  • the compound I as a raw material is in solid form.
  • Compound I used in the following examples can be prepared according to the existing technology, for example, according to the method described in the WO2018002760A1 document, combined with the conventional salt-breaking method in the art.
  • the obtained dry solid is the crystal form CSI of the present invention, and its X-ray powder diffraction pattern is shown in FIG1 , and the X-ray powder diffraction data are shown in Table 2.
  • the obtained crystalline solid is the crystal form CSII of the present invention. Its X-ray powder diffraction pattern is shown in Figure 2, and the X-ray powder diffraction data is shown in Table 3.
  • TGA has almost no weight loss when heated from room temperature to 180°C.
  • DSC is shown in Figure 4. It has an endothermic peak that begins to appear near 183°C. This endothermic peak is the melting endothermic peak.
  • TGA has almost no weight loss when heated from room temperature to 170°C.
  • Compound I was heated to 190°C at 10°C/min under nitrogen protection and kept at the temperature for 1 minute to obtain a crystalline solid. After detection, the obtained crystalline solid is the crystal form CSIV of the present invention. Its X-ray powder diffraction pattern is shown in Figure 7, and its X-ray powder diffraction data is shown in Table 5.
  • TGA has almost no weight loss when heated from room temperature to 180°C.
  • Open Place the sample in a glass vial, uncover it, and place it in the corresponding environment.
  • Example 8 Stability of crystalline form CSI under the action of mechanical force
  • the crystal form CSI was ball milled using a ball mill at a vibration speed of 500 rpm for 5 minutes.
  • the samples before and after ball milling were tested by XRPD.
  • the test results are shown in Figure 12. There was no change in the crystal form of CSI after ball milling.
  • the crystalline CSI preparation was prepared using the preparation prescription in Table 8 and the preparation process in Table 10, and the blank prescription is shown in Table 9.
  • the XRPD of the blank mixed powder and the samples before and after the preparation prescription were tested, and the results are shown in Figure 14. The results show that the crystalline form of the crystalline CSI did not change after the preparation prescription process.
  • Example 11 Formulation stability of crystalline form CSI
  • the crystal form CSI preparation samples were packaged under corresponding conditions and placed under 25°C/60% RH conditions, and HPLC and XRPD were used to determine the purity and crystal form.
  • the results are shown in Table 11, and the XRPD patterns before and after placement are shown in Figure 15. The results show that the crystalline CSI preparation sample can be stable for at least 1 month at 25°C/60% RH with almost no change in purity.
  • Sealing Place the sample in a glass vial, seal it with a lid in a double-layer PE bag, and then seal it in a layer of aluminum foil bag.
  • crystal form CSII is stable for at least 6 months at 25°C/60%RH and 40°C/75%RH, and at least 1 month at 60°C/75%RH, with good physical and chemical properties. stability.
  • Example 13 Stability of crystal form CSII under the action of mechanical force
  • the crystalline CSII preparation was prepared using the preparation recipe in Table 8 and the preparation process in Table 10, and the blank prescription was as shown in Table 9. Test the XRPD of the blank mixed powder and samples before and after formulation. The results are shown in Figure 19. The results showed that the crystal form of CSII did not change after the formulation process.
  • Crystal form CSII preparation samples were packaged under corresponding conditions and placed under 25°C/60%RH and 40°C/75%RH conditions, and HPLC and XRPD were used to determine the purity and crystal form. The results are shown in Table 13, and the XRPD patterns before and after placement are shown in Figure 20. The results show that the crystalline CSII preparation sample can be stable for at least 1 month under the conditions of 25°C/60%RH and 40°C/75%RH, with almost no change in purity.
  • Sealing Place the sample in a glass vial, seal it with a lid in a double-layer PE bag, and then seal it in a layer of aluminum foil bag.
  • Sealing Place the sample in a glass vial, seal it with the lid in a double-layer PE bag, and then seal it in one layer In aluminum foil bag.
  • crystalline CSIV is stable for at least 6 months at 25°C/60% RH and 40°C/75% RH, and is stable for at least 1 month at 60°C/75% RH, and has good physicochemical stability.
  • Example 21 Stability of crystal form CSIV under the action of mechanical force
  • Sealing Place the sample in a glass vial, seal it with a lid in a double-layer PE bag, and then seal it in a layer of aluminum foil bag.
  • the crystalline CSV preparation was prepared using the preparation recipe in Table 8 and the preparation process in Table 10.
  • the blank prescription is as shown in Table 9.
  • the crystal form CSV preparation samples were packaged under corresponding conditions and placed under the conditions of 25°C/60%RH and 40°C/75%RH, and the purity and crystal form were determined using HPLC and XRPD. The results are shown in Table 17, and the XRPD patterns before and after placement are shown in Figure 31. The results show that the crystalline CSV preparation sample can be stable for at least 1 month under the conditions of 25°C/60%RH and 40°C/75%RH, with almost no change in purity.

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Abstract

涉及Emraclidine(以下称为"化合物I")的晶型及其制备方法，含有该晶型的药物组合物，以及该晶型在制备M4受体调节剂药物和治疗精神***症药物中的用途。

Description

Emraclidine的晶型及其制备方法和用途 技术领域
本发明涉及晶体化学领域。具体而言，涉及Emraclidine的晶型及其制备方法和用途。
背景技术
精神***症是一种严重、复杂且使人衰弱的精神健康障碍，其表现为一系列症状，包括妄想、幻觉、言语或行为紊乱、言语缓慢和情感迟钝。
Emraclidine(CVL-231)是由Cerevel Therapeutics开发的，一种选择性靶向蕈毒碱型乙酰胆碱4(M4)受体的正向变构调节剂(PAM)，用于治疗精神***症。其Ib期临床结果显示，与安慰剂相比，Emraclidine显示出具有临床意义的抗精神病活性。
Emraclidine的化学名称为1-(2,4-二甲基-5,7-二氢-6H-吡咯并[3,4-b]吡啶-6-基)-2-{1-[2-(三氟甲基)吡啶-4-基]氮杂环丁烷-3-基}乙酮(以下称为“化合物I”)，WO2018002760A1公开了该化合物。化合物I结构式如下：
本领域公知，在小分子药物开发中，药物多晶型是药物研发中的常见现象，是影响药物质量的重要因素。晶体是化合物分子在微观结构中三维有序排列而形成晶格的固体。多晶型是指一种化合物存在多种晶体形式的现象。化合物可能以一种或多种晶型存在，但是无法具体预期其存在与特性。不同晶型的原料药有不同的理化性质，包括化学稳定性、热稳定性、溶解性、吸湿性和/或粒子大小，可能导致药物在体内有不同的溶出、吸收，进而在一定程度上影响药物的临床疗效。此外，不同晶型的原料药有不同的可制造性，包括产率、提纯性质、过滤性质、干燥性质和碾磨性质，压片期间相对于压力的稳定性，可能会对原料药的生产过程中的加工处理产生影响。因此，多晶型是药物研究和药物质量控制的重要内容。至少基于这些原因，需要寻找化合物I的固体形式。
本申请的发明人意外发现了本发明提供的化合物I的结晶，其物理化学稳定性好、机械作用力下稳定性好、引湿性低，对含化合物I的药物开发具有非常重要的意义。
发明内容
本发明提供化合物I的结晶及其制备方法，包含该结晶药物组合物以及用途。
根据本发明的目的，本发明提供化合物I的晶型CSI(以下称作“晶型CSI”)。
一方面，使用Cu-Kα辐射，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为 11.9°±0.2°、5.9°±0.2°、9.5°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为11.9°±0.2°、5.9°±0.2°、9.5°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为10.7°±0.2°、14.1°±0.2°、22.2°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为10.7°±0.2°、14.1°±0.2°、22.2°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为10.4°±0.2°、16.3°±0.2°、19.1°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为10.4°±0.2°、16.3°±0.2°、19.1°±0.2°处有特征峰。
另一方面，使用Cu-Kα辐射，所述晶型CSI的X射线粉末衍射图在衍射角2θ值为11.9±0.2°、5.9°±0.2°、9.5°±0.2°、10.7°±0.2°、14.1°±0.2°、22.2°±0.2°、10.4°±0.2°、16.3°±0.2°、19.1°±0.2°、27.1°±0.2°、21.0°±0.2°、26.7°±0.2°、21.5°±0.2°中的任意1处、或2处、或3处、或4处、或5处，或6处，或7处，或8处、或9处、或10处、或11处、或12处、或13处有特征峰。
非限制性地，使用Cu-Kα辐射，晶型CSI的X射线粉末衍射图基本如图1所示。
根据本发明的目的，本发明还提供晶型CSI的制备方法，所述制备方法包括：将化合物I溶于酮类溶剂中，挥发得到晶型CSI。
进一步地，所述挥发的温度优选-20℃-50℃。
根据本发明的目的，本发明提供化合物I的晶型，非限制性地，该晶型为晶型CSII(以下称作“晶型CSII”)。
一方面，使用Cu-Kα辐射，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为12.8°±0.2°、19.8°±0.2°、24.4°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为12.8°±0.2°、19.8°±0.2°、24.4°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为21.5°±0.2°、22.5°±0.2°、23.3°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为21.5°±0.2°、22.5°±0.2°、23.3°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为19.2°±0.2°、20.8°±0.2°、25.8°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为19.2°±0.2°、20.8°±0.2°、25.8°±0.2°处有特征峰。
另一方面，使用Cu-Kα辐射，所述晶型CSII的X射线粉末衍射图在衍射角2θ值为12.8°±0.2°、19.8°±0.2°、24.4°±0.2°、21.5°±0.2°、22.5°±0.2°、23.3°±0.2°、19.2°±0.2°、20.8°±0.2°、25.8°±0.2°、6.4°±0.2°、9.0°±0.2°、14.6°±0.2°、16.3°±0.2° 中的任意1处、或2处、或3处、或4处、或5处，或6处，或7处，或8处、或9处、或10处、或11处、或12处、或13处有特征峰。
非限制性地，使用Cu-Kα辐射，晶型CSII的X射线粉末衍射图基本如图2所示。
非限制性地，晶型CSII的热重分析图基本如图3所示，从室温加热至180℃基本无失重。
非限制性地，晶型CSII的差示扫描量热分析图基本如图4所示，有一个吸热峰，在183℃附近开始出现这个吸热峰，该吸热峰为熔化吸热峰。
非限制性地，晶型CSII为无水物。
根据本发明的目的，本发明还提供晶型CSII的制备方法，所述制备方法包括：将化合物I置于甲基叔丁基醚与醇类的混合体系中搅拌，得到晶型CSII。
进一步地，所述醇类优选甲醇；所述搅拌的温度优选0℃-50℃；所述搅拌的时间优选1-10天。
根据本发明的目的，本发明提供化合物I的晶型，非限制性地，该晶型为晶型CSIII(以下称作“晶型CSIII”)。
一方面，使用Cu-Kα辐射，所述晶型CSIII的X射线粉末衍射图在衍射角2θ值为12.5°±0.2°、6.2°±0.2°、18.8°±0.2°、17.5°±0.2°中的1处、或2处、或3处、或4处具有特征峰；优选地，所述晶型CSIII的X射线粉末衍射图在衍射角2θ值为12.5°±0.2°、6.2°±0.2°、18.8°±0.2°、17.5°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSIII的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、21.7°±0.2°中的1处、或2处具有特征峰；优选地，所述晶型CSIII的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、21.7°±0.2°处有特征峰。
另一方面，使用Cu-Kα辐射，所述晶型CSIII的X射线粉末衍射图在衍射角2θ值为12.5°±0.2°、6.2°±0.2°、18.8°±0.2°、17.5°±0.2°、18.1°±0.2°、21.7°±0.2°、11.6°±0.2°、24.2±0.2°中的任意1处、或2处、或3处、或4处、或5处，或6处，或7处，或8处有特征峰。
非限制性地，使用Cu-Kα辐射，晶型CSIII的X射线粉末衍射图基本如图5所示。
非限制性地，晶型CSIII的热重分析图基本如图6所示，从室温加热至170℃基本无失重。
非限制性地，晶型CSIII为无水物。
根据本发明的目的，本发明还提供晶型CSIII的制备方法，所述制备方法包括：将化合物I溶于醚类与烷烃的混合溶剂中，挥发得到晶型CSIII。
进一步地，所述醚类优选四氢呋喃；所述烷烃优选正庚烷；所述挥发的温度优选40-60℃。
根据本发明的目的，本发明提供化合物I的晶型，非限制性地，该晶型为晶型CSIV(以下称作“晶型CSIV”)。
一方面，使用Cu-Kα辐射，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为13.0°±0.2°、16.4°±0.2°、23.1°±0.2°、22.0°±0.2°中的1处、或2处、或3处、或4处 具有特征峰；优选地，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为13.0°±0.2°、16.4°±0.2°、23.1°±0.2°、22.0°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为24.0°±0.2°、14.2°±0.2°、17.2°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为24.0°±0.2°、14.2°±0.2°、17.2°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、20.8°±0.2°、27.2°±0.2°中的1处、或2处、或3处具有特征峰；优选地，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、20.8°±0.2°、27.2°±0.2°处有特征峰。
另一方面，使用Cu-Kα辐射，所述晶型CSIV的X射线粉末衍射图在衍射角2θ值为13.0°±0.2°、16.4°±0.2°、23.1°±0.2°、22.0°±0.2°、24.0°±0.2°、14.2°±0.2°、17.2°±0.2°、18.1°±0.2°、20.8°±0.2°、27.2°±0.2°、6.5°±0.2°、8.6°±0.2°、11.5°±0.2°、20.0°±0.2°、20.4°±0.2°、26.4°±0.2°中的任意1处、或2处、或3处、或4处、或5处、或6处、或7处、或8处、或9处、或10处有特征峰。
非限制性地，使用Cu-Kα辐射，晶型CSIV的X射线粉末衍射图基本如图7所示。
非限制性地，晶型CSIV的热重分析图基本如图8所示，从室温加热至180℃基本无失重。
非限制性地，晶型CSIV为无水物。
根据本发明的目的，本发明还提供晶型CSIV的制备方法，所述制备方法包括：将化合物I加热至185℃-190℃得到晶型CSIV。
根据本发明的目的，本发明提供化合物I的晶型，非限制性地，该晶型为晶型CSV(以下称作“晶型CSV”)。
一方面，使用Cu-Kα辐射，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为10.3°±0.2°、19.2°±0.2°、13.5°±0.2°、14.5°±0.2°中的1处、或2处、或3处、或4处具有特征峰；优选地，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为10.3°±0.2°、19.2°±0.2°、13.5°±0.2°、14.5°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、20.0°±0.2°中的1处、或2处具有特征峰；优选地，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为18.1°±0.2°、20.0°±0.2°处有特征峰。
进一步地，使用Cu-Kα辐射，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为20.6°±0.2°、12.5°±0.2°中的1处、或2处具有特征峰；优选地，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为20.6°±0.2°、12.5°±0.2°处有特征峰。
另一方面，使用Cu-Kα辐射，所述晶型CSV的X射线粉末衍射图在衍射角2θ值为10.3°±0.2°、19.2°±0.2°、13.5°±0.2°、14.5°±0.2°、18.1°±0.2°、20.0°±0.2°、 20.6°±0.2°、12.5°±0.2°、11.5°±0.2°、24.9°±0.2°、25.4°±0.2°、22.5°±0.2°、22.0°±0.2°、23.2°±0.2°、30.7°±0.2°中的任意1处、或2处、或3处、或4处、或5处，或6处，或7处，或8处、或9处有特征峰。
非限制性地，使用Cu-Kα辐射，晶型CSV的X射线粉末衍射图基本如图9所示。
非限制性地，晶型CSV的热重分析图基本如图10所示，从35℃加热至150℃的失重约为3.8％。
根据本发明的目的，本发明还提供晶型CSV的制备方法，所述制备方法包括：将化合物I置于二甲基亚砜与水的混合体系中搅拌，得到晶型CSV。
进一步地，所述搅拌的温度优选0℃-50℃，进一步优选25℃-50℃。所述搅拌的时间优选1-10天，进一步优选4-6天。
根据本发明的目的，本发明提供晶型CSI、晶型CSII、晶型CSIII、晶型CSIV和/或晶型CSV用于制备化合物I及其盐的其他晶型或共晶的用途。
进一步地，本发明提供一种药物组合物，所述药物组合物包含有效治疗量的晶型CSI、晶型CSII、晶型CSIII、晶型CSIV和/或晶型CSV及药学上可接受的辅料。
进一步地，根据本发明的目的，本发明提供晶型CSI、晶型CSII、晶型CSIII、晶型CSIV和/或晶型CSV制备M4受体调节剂药物中的用途。
进一步地，根据本发明的目的，本发明提供晶型CSI、晶型CSII、晶型CSIII、晶型CSIV和/或晶型CSV在制备治疗精神***症药物中的用途。
本发明提供晶型的优异性质
本发明提供的晶型CSI具有以下优异性质：
(1)本发明提供的晶型CSI原料药和制剂均具有良好的物理化学稳定性。本发明晶型CSI原料药在40℃/75％RH条件下至少可稳定6个月，并且在储存过程中纯度基本保持不变；本发明晶型CSI与辅料混合做成药物制剂后，在25℃/60％RH和40℃/75％RH条件下至少可稳定1个月，并且在储存过程中纯度基本保持不变；晶型CSI原料药在经历30％-90％-0％-90％RH的湿度循环后样品性状无明显变化且晶型未发生改变。
季节差异、不同地区气候差异和环境因素等带来的高温和高湿条件会影响原料药和制剂的储存、运输、生产。晶型CSI原料药和制剂具有良好的物理化学稳定性，有利于避免药物储存过程中因转晶或纯度下降对药物质量产生影响。
(2)本发明提供的晶型CSI引湿增重小。晶型CSI在30％-80％RH条件下的引湿增重为0.36％。强吸湿性易引起原料药发生化学降解和晶型转变，从而影响原料药的物理化学稳定性。同时，强吸湿性的药物对生产提出更高的要求。低引湿性晶型对环境要求不苛刻，降低了物料生产、保存和质量控制成本，具有很强的经济价值。
(3)本发明提供的晶型CSI在机械力作用下具有良好的物理稳定性。晶型CSI原料药研磨后和在制剂处方工艺后保持晶型不变。制剂加工过程中常需要将原料药研磨或粉碎，良好的物理稳定性能够降低制剂加工过程中原料药结晶度降 低和转晶的风险。此外，在压力作用下，晶型CSI原料药也具有良好的物理稳定性，有利于在制剂压片工艺中保持晶型稳定。
本发明提供的晶型CSII具有以下优异性质：
(1)本发明提供的晶型CSII原料药和制剂均具有良好的物理化学稳定性。本发明晶型CSII原料药在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH下至少可稳定1个月，并且在储存过程中均纯度基本保持不变；本发明晶型CSII与辅料混合做成药物制剂后，在25℃/60％RH和40℃/75％RH条件下至少可稳定1个月，并且在储存过程中纯度基本保持不变；晶型CSII原料药在经历0％-90％-0％RH的湿度循环后样品性状无明显变化且晶型未发生改变。
季节差异、不同地区气候差异和环境因素等带来的高温和高湿条件会影响原料药和制剂的储存、运输、生产。晶型CSII原料药和制剂具有良好的物理化学稳定性，有利于避免药物储存过程中因转晶或纯度下降对药物质量产生影响。
(2)本发明提供的晶型CSII引湿增重小。晶型CSII在0％-80％RH条件下的引湿增重为0.28％。强吸湿性易引起原料药发生化学降解和晶型转变，从而影响原料药的物理化学稳定性。同时，强吸湿性的药物对生产提出更高的要求。低引湿性晶型对环境要求不苛刻，降低了物料生产、保存和质量控制成本，具有很强的经济价值。
(3)本发明提供的晶型CSII在机械力作用下具有良好的物理稳定性。晶型CSII原料药研磨后和在制剂处方工艺后保持晶型不变。制剂加工过程中常需要将原料药研磨或粉碎，良好的物理稳定性能够降低制剂加工过程中原料药结晶度降低和转晶的风险。此外，在压力作用下，晶型CSII原料药也具有良好的物理稳定性，有利于在制剂压片工艺中保持晶型稳定。
本发明提供的晶型CSIII具有以下优异性质：
(1)本发明提供的晶型CSIII原料药具有良好的物理化学稳定性。本发明晶型CSIII原料药在40℃/75％RH条件下至少可稳定2个月。晶型CSIII原料药在经历0％-90％-0％RH的湿度循环后样品性状无明显变化且晶型未发生改变。
季节差异、不同地区气候差异和环境因素等带来的高温和高湿条件会影响原料药和制剂的储存、运输、生产。晶型CSIII原料药具有良好的物理化学稳定性，有利于避免药物储存过程中因转晶或纯度下降对药物质量产生影响。
(2)本发明提供的晶型CSIII引湿增重小。晶型CSIII在0％-80％RH条件下的引湿增重为0.21％。强吸湿性易引起原料药发生化学降解和晶型转变，从而影响原料药的物理化学稳定性。同时，强吸湿性的药物对生产提出更高的要求。低引湿性晶型对环境要求不苛刻，降低了物料生产、保存和质量控制成本，具有很强的经济价值。
(3)本发明提供的晶型CSIII在机械力作用下具有良好的物理稳定性。晶型CSIII原料药研磨后保持晶型不变。制剂加工过程中常需要将原料药研磨或粉碎，良好的物理稳定性能够降低制剂加工过程中原料药结晶度降低和转晶的风险。
本发明提供的晶型CSIV具有以下优异性质：
(1)本发明提供的晶型CSIV原料药具有良好的物理化学稳定性。本发明晶型CSIV原料药在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH下至少可稳定1个月。晶型CSIV原料药在经历0％-90％-0％RH的湿度循环后样品性状无明显变化且晶型未发生改变。
季节差异、不同地区气候差异和环境因素等带来的高温和高湿条件会影响原料药和制剂的储存、运输、生产。晶型CSIV原料药具有良好的物理化学稳定性，有利于避免药物储存过程中因转晶或纯度下降对药物质量产生影响。
(2)本发明提供的晶型CSIV引湿增重小。晶型CSIV在0％-80％RH条件下的引湿增重为0.11％。强吸湿性易引起原料药发生化学降解和晶型转变，从而影响原料药的物理化学稳定性。同时，强吸湿性的药物对生产提出更高的要求。低引湿性晶型对环境要求不苛刻，降低了物料生产、保存和质量控制成本，具有很强的经济价值。
(3)本发明提供的晶型CSIV在机械力作用下具有良好的物理稳定性。晶型CSIV原料药研磨后保持晶型不变。制剂加工过程中常需要将原料药研磨或粉碎，良好的物理稳定性能够降低制剂加工过程中原料药结晶度降低和转晶的风险。
本发明提供的晶型CSV具有以下优异性质：
(1)本发明提供的晶型CSV原料药和制剂均具有良好的物理化学稳定性。本发明晶型CSV原料药在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH条件下至少可稳定2个月；本发明晶型CSV与辅料混合做成药物制剂后，在25℃/60％RH和40℃/75％RH条件下至少可稳定1个月，并且在储存过程中纯度基本保持不变；晶型CSV原料药在经历30％-90％-0％-90％RH的湿度循环后样品性状无明显变化且晶型未发生改变。
季节差异、不同地区气候差异和环境因素等带来的高温和高湿条件会影响原料药和制剂的储存、运输、生产。晶型CSV原料药具有良好的物理化学稳定性，有利于避免药物储存过程中因转晶或纯度下降对药物质量产生影响。
(2)本发明提供的晶型CSV引湿增重小。晶型CSV在30％-80％RH条件下的引湿增重为0.29％。强吸湿性易引起原料药发生化学降解和晶型转变，从而影响原料药的物理化学稳定性。同时，强吸湿性的药物对生产提出更高的要求。低引湿性晶型对环境要求不苛刻，降低了物料生产、保存和质量控制成本，具有很强的经济价值。
(3)本发明提供的晶型CSV在机械力作用下具有良好的物理稳定性。晶型CSV原料药研磨后和在制剂处方工艺后保持晶型不变。制剂加工过程中常需要将原料药研磨或粉碎，良好的物理稳定性能够降低制剂加工过程中原料药结晶度降低和转晶的风险。此外，在压力作用下，晶型CSV原料药也具有良好的物理稳定性，有利于在制剂压片工艺中保持晶型稳定。
附图说明
图1为晶型CSI的XRPD图
图2为晶型CSII的XRPD图
图3为晶型CSII的TGA图
图4为晶型CSII的DSC图
图5为晶型CSIII的XRPD图
图6为晶型CSIII的TGA图
图7为晶型CSIV的XRPD图
图8为晶型CSIV的TGA图
图9为晶型CSV的XRPD图
图10为晶型CSV的TGA图
图11为晶型CSI在40℃/75％RH条件下放置一段时间前后的XRPD对比图(从下至上依次为：放置前，40℃/75％RH敞口放置6个月后)
图12为晶型CSI球磨前后的XRPD对比图(从下至上依次为球磨前，球磨后)
图13为晶型CSI的DVS图
图14晶型CSI及制剂XRPD图(从下到上依次为：晶型CSI原料药，晶型CSI制剂工艺后，空白混粉制剂工艺后)
图15晶型CSI制剂在不同条件放置的XRPD对比图(从下到上依次为：放置前，在25℃/60％RH放置1个月后，在40℃/75％RH放置1个月后)
图16为晶型CSII在不同条件下放置一段时间前后的XRPD对比图(从下至上依次为：放置前，在25℃/60％RH放置6个月后，40℃/75％RH放置6个月后,60℃/75％RH放置1个月后)
图17为晶型CSII球磨前后的XRPD对比图(从下至上依次为球磨前，球磨后)
图18为晶型CSII的DVS图
图19晶型CSII及制剂XRPD图(从下到上依次为：晶型CSII原料药，晶型CSI制剂工艺后，空白混粉制剂工艺后)
图20晶型CSII制剂在不同条件放置的XRPD对比图(从下到上依次为：放置前，在25℃/60％RH放置1个月后，在40℃/75％RH放置1个月后)
图21为晶型CSIII在40℃/75％RH条件下放置一段时间前后的XRPD对比图(从下至上依次为：放置前，40℃/75％RH密封放置2个月后)
图22为晶型CSIII球磨前后的XRPD对比图(从下至上依次为球磨前，球磨后)
图23为晶型CSIII的DVS图
图24为晶型CSIV在不同条件下放置一段时间前后的XRPD对比图(从下至上依次为：放置前，在25℃/60％RH放置6个月后，40℃/75％RH放置6个月后,60℃/75％RH放置1个月后)
图25为晶型CSIV球磨前后的XRPD对比图(从下至上依次为球磨前，球磨后)
图26为晶型CSIV的DVS图
图27为晶型CSV在不同条件下放置一段时间前后的XRPD对比图((从下至上依次为：放置前，在25℃/60％RH放置6个月后，40℃/75％RH放置6个月后，在60℃/75％RH密封放置2个月后)
图28为晶型CSV球磨前后的XRPD对比图(从下至上依次为球磨前，球磨后)
图29为晶型CSV的DVS图
图30晶型CSV及制剂XRPD图(从下到上依次为：晶型CSV原料药，晶型CSI制剂工艺后，空白混粉制剂工艺后)
图31晶型CSV制剂在不同条件放置的XRPD对比图(从下到上依次为：放置前，在25℃/60％RH放置1个月后，在40℃/75％RH放置1个月后)
具体实施方式
结合以下实施例对本发明做详细说明，所述实施例详细描述本发明的晶型的制备和使用方法。对本领域技术人员显而易见的是，对于材料和方法两者的许多改变可在不脱离本发明范围的情况下实施。
本发明中所用到的缩写的解释如下：
XRPD：X射线粉末衍射
TGA：热重分析
DSC：差式扫描量热分析
DVS：动态水分吸附
HPLC：高效液相色谱
RH：相对湿度
采集数据所用的仪器及方法：
本发明所述的X射线粉末衍射图在Bruker射线粉末衍射仪上采集。本发明所述的X射线粉末衍射的方法参数如下：
X射线光源：Cu,Kα
Kα11.54060；Kα21.54439
Kα2/Kα1强度比例：0.50
本发明所述的热重分析(TGA)图在TA Q500上采集。本发明所述的热重分析(TGA)的方法参数如下：
扫描速率：10℃/min
保护气体：N2
本发明所述的差示扫描量热分析(DSC)图在TA Q2000上采集。本发明所述的差示扫描量热分析(DSC)的方法参数如下：
扫描速率：10℃/min
保护气体：N2
本实验所述动态水分吸附(DVS)图在由SMS公司(Surface Measurement Systems Ltd.)生产的Intrinsic动态水分吸附仪上采集。仪器控制软件是DVS-Intrinsic control software。所述的动态水分吸附仪的方法参数如下：
温度：25℃
载气，流速：N2，200毫升/分钟
单位时间质量变化：0.002％/分钟
相对湿度范围：0％RH-95％RH
本发明有关物质测试方法如表1所示：
表1
本发明中，所述“干燥”，采用本领域的常规方法完成，例如真空干燥，鼓风干燥或自然晾干。干燥温度可以是室温或更高，优选室温到约60℃，或者到50℃，或者到40℃。干燥时间可以为2-48小时，或者过夜。干燥在通风橱、鼓风烘箱或真空烘箱里进行。
所述“挥发”，采用本领域的常规方法完成，例如缓慢挥发或快速挥发。缓慢挥发是将容器封上封口膜，扎孔，静置挥发；快速挥发是将容器敞口放置挥发。
所述“室温”不是特定的温度值，是指10-30℃温度范围。
所述“搅拌”，采用本领域的常规方法完成，例如磁力搅拌或机械搅拌，搅拌速度为50-1800转/分钟，其中，磁力搅拌速度优选300-900转/分钟，机械搅拌速度优选100-300转/分钟。
所述“分离”，采用本领域的常规方法完成，例如离心或过滤。“离心”的操作为：将欲分离的样品置于离心管中，以10000转/分的速率进行离心，至固体全部沉至离心管底部。
所述“特征峰”是指用于甄别晶体的有代表性的衍射峰，使用Cu-Kα辐射测试时，峰位置通常可以有±0.2°的误差。
本发明中，无定形是不具有长程有序的非晶型材料，其X射线粉末衍射图通常表现为较宽的“馒头峰”。
本发明中，“晶体”或“晶型”可以用X射线粉末衍射表征。本领域技术人员能够理解，X射线粉末衍射图受仪器的条件、样品的准备和样品纯度的影响而有所改变。X射线粉末衍射图中衍射峰的相对强度也可能随着实验条件的变化而变化，所以衍射峰强度不能作为判定晶型的唯一或决定性因素。事实上，X射线粉末衍射图中衍射峰的相对强度与晶体的择优取向有关，本发明所示的衍射峰强度为说明性而非用于绝对比较。因而，本领域技术人员可以理解的是，本发明所保护晶型的X射线粉末衍射图不必和这里所指的实施例中的X射线粉末衍射图完全一致，任何具有和这些图谱中的特征峰相同或相似的X射线粉末衍射图的晶型均属于本发明的范畴之内。本领域技术人员能够将本发明所列的X射线粉末衍射图和一个未知晶型的X射线粉末衍射图相比较，以证实这两组图反映的是相同还是不同的晶型。
在一些实施方案中，本发明的晶型CSI、晶型CSII、晶型CSIII、晶型CSIV、晶型CSV是纯的，基本没有混合任何其他晶型。本发明中，“基本没有”当用来指新晶型时指这个晶型含有少于20％(重量)的其他晶型，尤其指少于10％(重量)的其他晶型，更指少于5％(重量)的其他晶型，更指少于1％(重量)的其他晶型。
本发明中术语“约”，当用来指可测量的数值时，例如质量、时间、温度等，意味着可围绕具体数值有一定的浮动的范围，该范围可以为±10％、±5％、±1％、±0.5％、或±0.1％。
除非特殊说明，以下实施例均在室温条件下操作。
根据本发明，作为原料的所述化合物I包括但不限于固体形式(结晶或无定形)、油状、液体形式和溶液。优选地，作为原料的化合物I为固体形式。
以下实施例中所使用的化合物I可根据现有技术制备得到，例如根据WO2018002760A1文献所记载的方法，结合本领域常规破盐方法制备获得。
实施例1晶型CSI的制备方法
称量9.5mg的化合物I于小瓶中，加入0.4mL丙酮，得到澄清溶液。过滤，滤液置于室温挥发得到固体，于25℃真空干燥约20小时，得到结晶固体。
经检测，所得干燥固体为本发明晶型CSI，其X射线粉末衍射图如图1，X射线粉末衍射数据如表2所示。
表2

实施例2晶型CSII的制备方法
称量9.1mg化合物I于小瓶中，随后加入0.2mL甲醇/甲基叔丁基醚(1:9，v/v)混合溶剂，室温搅拌约68小时，离心分离固体，25℃真空干燥约20小时，得到结晶固体。
经检测，所得结晶固体为本发明所述晶型CSII，其X射线粉末衍射图如图2，X射线粉末衍射数据如表3所示。
TGA如图3示，从室温加热至180℃基本无失重。
DSC如图4所示，其有一个吸热峰，在183℃附近开始出现这个吸热峰，该吸热峰为熔化吸热峰。
表3

实施例3晶型CSIII的制备方法
称取14.6mg的化合物I于小瓶中，加入2mL四氢呋喃/正庚烷(1:1,v/v)混合溶剂，得到澄清溶液。过滤，取一半滤液置于50℃挥发得到固体，于室温真空干燥约24小时，得到结晶固体。经检测，所得结晶固体为本发明所述晶型CSIII，其X射线粉末衍射图如图5，X射线粉末衍射数据如表4所示。
TGA如图6所示，从室温加热至170℃基本无失重。
表4
实施例4晶型CSIV的制备方法
将化合物I在氮气保护下以10℃/min加热至190℃并保温1分钟，得到结晶固体。经检测，所得结晶固体为本发明所述晶型CSIV，其X射线粉末衍射图如图7，其X射线粉末衍射数据如表5所示。
TGA如图8所示，从室温加热至180℃基本无失重。 表5
实施例5晶型CSV的制备方法
称取3.8mg的化合物I于小瓶中，加入0.1mL二甲基亚砜/水(1:1,v/v)混合溶剂，置于50℃搅拌4天，得到结晶固体。经检测，所得结晶固体为本发明所述晶型CSV，其X射线粉末衍射图如图9，X射线粉末衍射数据如表6所示。
表6

实施例6晶型CSV的TGA
晶型CSV的TGA如图10所示，从35℃加热至150℃的失重约为3.8％。实施例7晶型CSI的稳定性
取适量晶型CSI采用对应包装条件包装后在40℃/75％RH条件下放置一段时间，采用HPLC和XRPD测定纯度与晶型，结果如表7所示。晶型CSI放置前后的XRPD图如图11所示。
表7
敞口：将样品置于玻璃小瓶中，不盖盖子，敞口于对应环境下放置。
结果表明，晶型CSI在40℃/75％RH条件下至少可稳定6个月，具有良好的物理化学稳定性。
实施例8晶型CSI在机械力作用下的稳定性
采用球磨机将晶型CSI以500rpm的振动速度球磨5分，球磨前后样品进行XRPD检测，测试结果如图12所示，球磨后晶型CSI晶型无变化。
取适量晶型CSI，选择Φ6mm圆形平冲，在手动压片机下用15KN的压力压制成片，压片前后进行XRPD测试，测试结果表明压片后晶型CSI晶型无变化。
结果表明，晶型CSI在机械力作用下具有好的稳定性。
实施例9晶型CSI的引湿性
取约10mg的晶型CSI采用动态水分吸附(DVS)仪测试其引湿性，在30％-90％-0％-90％RH相对湿度下循环一次，记录每个湿度下的质量变化。并在DVS测试前后，用XRPD对样品进行检测。实验结果表明，DVS测试后晶型CSI晶型无变化。晶型CSI的DVS图如图13所示，晶型CSI在30％-80％RH条件下引湿性增重为0.36％。
实施例10晶型CSI的制剂制备
采用如表8的制剂处方和表10制剂工艺制备晶型CSI制剂，空白处方如表9所示。测试空白混粉和制剂处方前后样品的XRPD，结果如图14所示。结果表明，晶型CSI在制剂处方工艺后晶型无变化。
表8
表9
表10
实施例11晶型CSI的制剂稳定性
将晶型CSI制剂样品采用对应条件包装后放置在25℃/60％RH条件下，采用HPLC和XRPD测定纯度与晶型。结果如表11所示，放置前后的XRPD图如图15所示。结果表明，晶型CSI制剂样品可在25℃/60％RH条件下至少稳定1个月，且纯度几乎无变化。
表11
实施例12晶型CSII的稳定性
取适量晶型CSII采用对应包装条件包装后在25℃/60％RH、40℃/75％RH和60℃/75％RH条件下放置一段时间，采用HPLC和XRPD测定纯度与晶型，结果如表12所示。晶型CSII放置前后的XRPD图如图16所示。
表12
密封：将样品置于玻璃小瓶中，盖盖子密封于双层PE袋中后再密封于一层铝箔袋中。
结果表明，晶型CSII在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH条件下至少可稳定1个月，具有良好的物理化学稳定性。
实施例13晶型CSII在机械力作用下的稳定性
采用球磨机将晶型CSII以500rpm的振动速度球磨5分，球磨前后样品进行XRPD检测，测试结果如图17所示，球磨后晶型CSII晶型无变化。
取适量晶型CSII，选择Φ6mm圆形平冲，在手动压片机下用15KN的压力压制成片，压片前后进行XRPD测试，测试结果表明压片后晶型CSII晶型无变化。
结果表明，晶型CSII在机械力作用下具有好的稳定性。
实施例14晶型CSII的引湿性
取约10mg的晶型CSII采用动态水分吸附(DVS)仪测试其引湿性，在0％-90％-0％RH相对湿度下循环一次，记录每个湿度下的质量变化。并在DVS测试前后，用XRPD对样品进行检测。实验结果表明，DVS测试后晶型CSII晶型无变化。晶型CSII的DVS图如图18所示，晶型CSII在0％-80％RH条件下引湿性增重为0.28％。
实施例15晶型CSII的制剂制备
采用如表8的制剂处方和表10制剂工艺制备晶型CSII制剂，空白处方如表9所示。测试空白混粉和制剂处方前后样品的XRPD，结果如图19所示。结果表明，晶型CSII在制剂处方工艺后晶型无变化。
实施例16晶型CSII的制剂稳定性
将晶型CSII制剂样品采用对应条件包装后放置在25℃/60％RH和40℃/75％RH条件下，采用HPLC和XRPD测定纯度与晶型。结果如表13所示，放置前后的XRPD图如图20所示。结果表明，晶型CSII制剂样品可在25℃/60％RH和40℃/75％RH条件下至少稳定1个月，且纯度几乎无变化。
表13
实施例17晶型CSIII的稳定性
取适量晶型CSIII采用对应包装条件包装后在40℃/75％RH条件下放置一段时间，采用XRPD测定晶型，结果如表14所示。晶型CSIII放置前后的XRPD图如图21所示。
表14
密封：将样品置于玻璃小瓶中，盖盖子密封于双层PE袋中后再密封于一层铝箔袋中。
结果表明，晶型CSIII在40℃/75％RH条件下至少可稳定2个月，具有良好的物理稳定性。
实施例18晶型CSIII在机械力作用下的稳定性
采用球磨机将晶型CSIII以500rpm的振动速度球磨5分，球磨前后样品进行XRPD检测，测试结果如图22所示，球磨后晶型CSIII晶型无变化。
结果表明，晶型CSIII在机械力作用下具有好的稳定性。
实施例19晶型CSIII的引湿性
取约10mg的晶型CSIII采用动态水分吸附(DVS)仪测试其引湿性，在0％-90％-0％RH相对湿度下循环一次，记录每个湿度下的质量变化。并在DVS测试前后，用XRPD对样品进行检测。实验结果表明，DVS测试后晶型CSIII晶型无变化。晶型CSIII的DVS图23如示，晶型CSIII在0％-80％RH条件下引湿性增重为0.21％。
实施例20晶型CSIV的稳定性
取适量晶型CSIV采用对应包装条件包装后在25℃/60％RH、40℃/75％RH和60℃/75％RH条件下放置一段时间，采XRPD测定晶型，结果如表15所示。晶型CSIV放置前后的XRPD图24如所示。
表15
密封：将样品置于玻璃小瓶中，盖盖子密封于双层PE袋中后再密封于一层 铝箔袋中。
结果表明，晶型CSIV在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH条件下至少可稳定1个月，具有良好的物理化学稳定性。
实施例21晶型CSIV在机械力作用下的稳定性
采用球磨机将晶型CSIV以500rpm的振动速度球磨5分，球磨前后样品进行XRPD检测，测试结果如图25所示，球磨后晶型CSIV晶型无变化。
结果表明，晶型CSIV在机械力作用下具有好的稳定性。
实施例22晶型CSIV的引湿性
取约10mg的晶型CSIV采用动态水分吸附(DVS)仪测试其引湿性，在0％-90％-0％RH相对湿度下循环一次，记录每个湿度下的质量变化。并在DVS测试前后，用XRPD对样品进行检测。实验结果表明，DVS测试后晶型CSIV晶型无变化。晶型CSIV的DVS如图26示，晶型CSIV在0％-80％RH条件下引湿性增重为0.11％。
实施例23晶型CSV的稳定性
取适量晶型CSV采用对应包装条件包装后在25℃/60％RH、40℃/75％RH和60℃/75％RH条件下放置一段时间，采用HPLC和XRPD测定纯度与晶型，结果如表16所示。晶型CSV放置前后的XRPD图如图27所示。
表16
密封：将样品置于玻璃小瓶中，盖盖子密封于双层PE袋中后再密封于一层铝箔袋中。
结果表明，晶型CSV在25℃/60％RH和40℃/75％RH条件下至少可稳定6个月，在60℃/75％RH条件下至少可稳定2个月，具有良好的物理化学稳定性。
实施例24晶型CSV在机械力作用下的稳定性
采用球磨机将晶型CSV以500rpm的振动速度球磨5分，球磨前后样品进行XRPD检测，测试结果如图28所示，球磨后晶型CSV晶型无变化。
取适量晶型CSV，选择Φ6mm圆形平冲，在手动压片机下用15KN的压力压制成片，压片前后进行XRPD测试，测试结果表明压片后晶型CSV晶型无变化。
结果表明，晶型CSV在机械力作用下具有好的稳定性。
实施例25晶型CSV的引湿性
取约10mg的晶型CSV采用动态水分吸附(DVS)仪测试其引湿性，在30％-90％-0％-90％RH下循环一次，记录每个湿度下的质量变化。并在DVS测试前后， 用XRPD对样品进行检测。实验结果表明，DVS测试后晶型CSV晶型无变化。晶型CSV的DVS图如图29所示，晶型CSV在30％-80％RH条件下引湿性增重为0.29％。
实施例26晶型CSV的制剂制备
采用如表8的制剂处方和表10制剂工艺制备晶型CSV制剂，空白处方如表9所示。测试空白混粉和制剂处方前后样品的XRPD，结果如图30所示。结果表明，晶型CSV在制剂处方工艺后晶型无变化。
实施例27晶型CSV的制剂稳定性
将晶型CSV制剂样品采用对应条件包装后放置在25℃/60％RH和40℃/75％RH条件下，采用HPLC和XRPD测定纯度与晶型。结果如表17所示，放置前后的XRPD图如图31所示。结果表明，晶型CSV制剂样品可在25℃/60％RH和40℃/75％RH条件下至少稳定1个月，且纯度几乎无变化。
表17
上述实施例只为说明本发明的技术构思及特点，其目的在于让熟悉此项技术的人士能够了解本发明的内容并据以实施，并不能以此限制本发明的保护范围。凡根据本发明精神实质所作的等效变化或修饰，都应涵盖在本发明保护范围之内。

Claims (27)

  1. 一种化合物I的晶型CSI，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为11.9°±0.2°、5.9°±0.2°、9.5°±0.2°处具有特征峰，
  2. 根据权利要求1所述的化合物I的晶型CSI，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为10.7°±0.2°、14.1°±0.2°、22.2°±0.2°的至少1处具有特征峰。
  3. 根据权利要求1所述的化合物I的晶型CSI，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为10.4°±0.2°、16.3°±0.2°、19.1°±0.2°的至少1处具有特征峰。
  4. 根据权利要求2所述的化合物I的晶型CSI，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为10.4°±0.2°、16.3°±0.2°、19.1°±0.2°的至少1处具有特征峰。
  5. 根据权利要求1所述的化合物I的晶型CSI，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图基本如图1所示。
  6. 一种化合物I的晶型CSII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为12.8°±0.2°、19.8°±0.2°、24.4°±0.2°处具有特征峰,
  7. 根据权利要求6所述的化合物I的晶型CSII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为21.5°±0.2°、22.5°±0.2°、23.3°±0.2°的至少1处具有特征峰。
  8. 根据权利要求6所述的化合物I的晶型CSII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为19.2°±0.2°、20.8°±0.2°、25.8°±0.2°的至少1处具有特征峰。
  9. 根据权利要求7所述的化合物I的晶型CSII，其特征在于，使用Cu-Kα辐射，其 X射线粉末衍射图在2θ值为19.2°±0.2°、20.8°±0.2°、25.8°±0.2°的至少1处具有特征峰。
  10. 根据权利要求6所述的化合物I的晶型CSII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图基本如图2所示。
  11. 一种化合物I的晶型CSIII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为12.5°±0.2°、6.2°±0.2°、18.8°±0.2°、17.5°±0.2°处具有特征峰，
  12. 根据权利要求11所述的化合物I的晶型CSIII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为18.1°±0.2°、21.7°±0.2°的至少1处具有特征峰。
  13. 根据权利要求11所述的化合物I的晶型CSIII，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图基本如图5所示。
  14. 一种化合物I的晶型CSIV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为13.0°±0.2°、16.4°±0.2°、23.1°±0.2°、22.0°±0.2°处具有特征峰，
  15. 根据权利要求14所述的化合物I的晶型CSIV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为24.0°±0.2°、14.2°±0.2°、17.2°±0.2°的至少1处具有特征峰。
  16. 根据权利要求14所述的化合物I的晶型CSIV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为18.1°±0.2°、20.8°±0.2°、27.2°±0.2°的至少1处具有特征峰。
  17. 根据权利要求15所述的化合物I的晶型CSIV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为18.1°±0.2°、20.8°±0.2°、27.2°±0.2°的至少1处具有特征峰。
  18. 根据权利要求14所述的化合物I的晶型CSIV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图基本如图7所示。
  19. 一种化合物I的晶型CSV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为10.3°±0.2°、19.2°±0.2°、13.5°±0.2°、14.5°±0.2°处具有特征峰,
  20. 根据权利要求19所述的化合物I的晶型CSV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为18.1°±0.2°、20.0°±0.2°的至少1处具有特征峰。
  21. 根据权利要求19所述的化合物I的晶型CSV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为20.6°±0.2°、12.5°±0.2°的至少1处具有特征峰。
  22. 根据权利要求20所述的化合物I的晶型CSV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图在2θ值为20.6°±0.2°、12.5°±0.2°的至少1处具有特征峰。
  23. 根据权利要求19所述的化合物I的晶型CSV，其特征在于，使用Cu-Kα辐射，其X射线粉末衍射图基本如图9所示。
  24. 一种化合物I的晶型，其特征在于，为无水物。
  25. 一种药物组合物，所述药物组合物包含有效治疗量的权利要求1、权利要求6、权利要求11、权利要求14和/或权利要求19所述的化合物I的晶型及药学上可接受的辅料。
  26. 权利要求1、权利要求6、权利要求11、权利要求14和/或权利要求19所述的化合物I的晶型在制备M4受体调节剂药物中的用途。
  27. 权利要求1、权利要求6、权利要求11、权利要求14和/或权利要求19所述的化合物I的晶型在制备治疗精神***症药物中的用途。
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CN109641898A (zh) * 2016-07-01 2019-04-16 辉瑞公司 用于治疗神经和神经退行性疾病的5,7-二氢-吡咯并-吡啶衍生物
WO2022226078A1 (en) * 2021-04-20 2022-10-27 The Regents Of The University Of California Therapy for alcohol-related liver disease

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