WO2024051334A1 - Isopropanol and nitrogen mixing tank applied to wafer drying devices - Google Patents

Isopropanol and nitrogen mixing tank applied to wafer drying devices Download PDF

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Publication number
WO2024051334A1
WO2024051334A1 PCT/CN2023/106065 CN2023106065W WO2024051334A1 WO 2024051334 A1 WO2024051334 A1 WO 2024051334A1 CN 2023106065 W CN2023106065 W CN 2023106065W WO 2024051334 A1 WO2024051334 A1 WO 2024051334A1
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WIPO (PCT)
Prior art keywords
mixing tank
tank
mixing
nitrogen
liquid level
Prior art date
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PCT/CN2023/106065
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French (fr)
Chinese (zh)
Inventor
李盼盼
吕芳毅
刘传龙
许程
Original Assignee
上海至纯洁净***科技股份有限公司
江苏启微半导体设备有限公司
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Publication of WO2024051334A1 publication Critical patent/WO2024051334A1/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F33/00—Other mixers; Mixing plants; Combinations of mixers
    • B01F33/80—Mixing plants; Combinations of mixers
    • B01F33/81—Combinations of similar mixers, e.g. with rotary stirring devices in two or more receptacles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/40—Mounting or supporting mixing devices or receptacles; Clamping or holding arrangements therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/45—Closures or doors specially adapted for mixing receptacles; Operating mechanisms therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/50—Mixing receptacles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90—Heating or cooling systems
    • B01F35/92—Heating or cooling systems for heating the outside of the receptacle, e.g. heated jackets or burners
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B9/00—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards
    • F26B9/06—Machines or apparatus for drying solid materials or objects at rest or with only local agitation; Domestic airing cupboards in stationary drums or chambers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere

Definitions

  • the utility model relates to the field of semiconductor equipment, in particular to an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device.
  • wafer drying In wafer manufacturing, wet wafer cleaning accounts for a large part and has become the mainstream of wafer cleaning at present. Based on the demand for semiconductor wafer cleaning technology, wafer drying technology is indispensable. So far, different wafer drying technologies have been developed according to different wafer products. After the wafer wet cleaning is completed, the wafer needs to be dried. Isopropyl alcohol (IPA) is usually used to dry the wafer. Wafer drying, as the final step in the wet cleaning process, needs to ensure the effective removal of residual moisture on the wafer surface and the control of surface cleanliness, which requires continuous optimization of drying methods and improvement of drying efficiency. This has become a point that needs special attention in the development of wafer cleaning equipment and technology.
  • IPA isopropyl alcohol
  • Chinese utility model patent 200910029506.4 mentions an isopropyl alcohol steam cleaning and drying device.
  • nitrogen at a set pressure is used to turn isopropyl alcohol liquid into steam to clean the glass wafer that needs to be cleaned, and then a heating lamp is used to clean the glass wafer.
  • the cleaned glass wafer is dried. It is believed that the device and method make the surface of the glass wafer evenly and thoroughly cleaned, and there are no drying marks on the surface of the glass wafer after cleaning and drying.
  • the above structure and cleaning method directly spray isopropyl alcohol vapor onto the glass wafer, which will cause misalignment and collision of the wafers under the condition of multiple wafer groups, resulting in wafer damage.
  • the purity of the isopropyl alcohol The temperature and temperature are difficult to meet the needs of high-quality wafer cleaning, and the stability is difficult to guarantee.
  • the purpose of this utility model is to overcome the above-mentioned shortcomings of the prior art and provide an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device.
  • the isopropyl alcohol and nitrogen mixing tank used in the wafer drying device of the utility model can stably and controllably provide the mixed liquid formed by liquid isopropyl alcohol and heated nitrogen, and then stably and controllably provide the mixed liquid to the drying module, thereby providing the wafer Rapid drying provides gas and liquid atmospheres.
  • An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device The inside of the mixing tank has a three-layer structure including a vortex mixing channel, a buffer return tank and a hot water bath area.
  • the vortex mixing channel is set in the center of the mixing tank.
  • a tank inlet is provided at the bottom center of the mixing tank, and a tank outlet is provided at the top center of the mixing tank.
  • the tank inlet is connected to the vortex mixing channel, so
  • the upper position of the buffer reflux tank is connected to the heated nitrogen input port, the hot water bath area in the mixing tank is connected to the ultrapure water input port and the ultrapure water output port, and the tank outlet is connected to the The output port of the mixed gas-liquid coexistence body.
  • the mixing tank is cylindrical in shape.
  • the mixing tank is clamped and fixed up and down in a shell through an upper mounting block and a lower mounting block.
  • At least one liquid level detector penetrating inside and outside is provided on the side wall of the mixing tank.
  • each liquid level detector there are three liquid level detectors on the side wall of each mixing tank. From top to bottom, they are the upper liquid level detector, the middle liquid level detector and the lower liquid level detector. The exteriors of the three liquid level detectors are all fixed on the same positioning bar, which is connected to the housing through its upper and lower ends.
  • the upper liquid level detector, middle liquid level detector and lower liquid level detector are Each instrument is equipped with a thermocouple temperature controller corresponding to the temperature outside the tank.
  • the liquid level detector combined with the thermocouple thermostat forms a composite detector.
  • the mixing tank is made of a transparent cylinder made of tempered glass.
  • the vortex mixing channel is an inverted conical funnel vortex discharge channel.
  • the mixing tank of the present utility model is used as a part of the integrated module in a special suitable IPA wafer drying method.
  • the following technical effects have been achieved through practical application:
  • the structure of the isopropyl alcohol and nitrogen mixing tank used in the wafer drying device of this utility model is a transparent cylinder made of tempered glass.
  • a vortex mixing channel, a buffer return tank and a hot water bath area are designed inside the mixing tank, where
  • the vortex mixing channel is an inverted cone-shaped cavity set in the center of the mixing tank. It serves as an inverted conical funnel vortex discharge channel.
  • Isopropyl alcohol is injected from the bottom into the vortex mixing channel, and then pressurized and heated nitrogen is injected to provide buffering.
  • the reflux tank is used to cope with overflow, and ultrapure water is circulated to provide a stable temperature supply, so that isopropyl alcohol and heated nitrogen are fully mixed, thereby obtaining high-purity isopropyl alcohol and temperature-controlled heated nitrogen.
  • thermocouple thermostat connected to the external environment is used for detection. It mainly corresponds to the aluminum plate on the outer edge of the tank and the comparison of the ambient temperature. Through the configuration of the thermocouple thermostat, a clear comparison and analysis can be achieved The temperature difference between the inside and outside can effectively control the temperature range of the inside and outside environment to determine whether the overall heating environment requires turning on the heating device for auxiliary adjustment.
  • Figure 1 is a schematic structural diagram of the wafer drying device of the present invention.
  • Figure 2 is a schematic diagram of the front structure of the mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device of the present invention.
  • Figure 3 is a schematic diagram of the rear structural composition of the mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device of the present invention.
  • Figure 4 is a mixture of isopropyl alcohol and nitrogen used in a wafer drying device according to the present invention. Schematic diagram of the mixing principle of a mix-in-tank tank.
  • Figure 5 is a schematic cross-sectional view of a mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to the present invention.
  • the utility model is an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device.
  • the mixing tank is a core component of a dedicated integrated module for the wafer drying method.
  • the above-mentioned integrated module functions to provide isopropyl alcohol (IPA for short in English) and heated nitrogen for drying the wafer after wet cleaning, and to provide liquid for the wafer drying process.
  • Interfacial tension control provides a mixed atmosphere of gas phase and liquid phase to reduce the liquid tension above the ultrapure water interface and accelerate the detachment of water molecules in ultrapure water on the wafer surface.
  • the wafer drying equipment adopts a special IPA wafer drying method.
  • a special integrated module provides a mixture of isopropyl alcohol and heated nitrogen into the drying tank of the drying module.
  • the mixing process of isopropyl alcohol and nitrogen takes place in the mixing tank of the present invention.
  • the mixing tank and its connecting control pipeline are used as a dedicated integrated module to stably and controllably supply IPA and heated nitrogen to the wafer drying equipment.
  • It consists of a mixing tank 201 and an isopropyl alcohol input pipe. Road 202, heated nitrogen input pipeline 203, mixed gas-liquid coexistence liquid output pipeline 204, circulating ultrapure water input pipeline 205, and circulating ultrapure water output pipeline 206.
  • the above-mentioned mixing tank 201 receives isopropyl alcohol and heated nitrogen for mixing. With the cooperation of circulating ultrapure water, it is mixed into a mixture of isopropyl alcohol and heated nitrogen that meets the required pressure and concentration.
  • the mixed gas-liquid coexistence liquid output pipe The path 204 is input into the drying module.
  • the output end of the mixed gas-liquid coexistence liquid output pipeline 204 is connected to the upper cover 102 of the tank body.
  • the upper cover 102 of the tank body is merged with the drying tank body 101.
  • a closed drying space is formed.
  • a swing mechanism 103 carries the wafer to be cleaned and dried and places it in the drying tank 101. The cleaning and drying of the wafer is completed with the cooperation of ultrapure water, isopropyl alcohol and heated nitrogen mixture. .
  • the figure shows an overall structural form of the mixing tank 201.
  • the structure of the mixing tank 201 includes a shell and a mixing tank 207.
  • the shell is provided with a tank door panel 219.
  • the box-like structure is provided with at least one mixing tank 207 inside the housing.
  • two mixing tanks 207 are arranged side by side in the same shell. The first is able to increase mixing efficiency and the second is able to provide a minimal supply of ultrapure water and isopropyl alcohol and heated nitrogen mixture in a damaged state.
  • the outer shell in addition to placing and protecting the mixing tank 207, the outer shell also assumes the function of connecting external pipelines.
  • An isopropyl alcohol input port 211 is provided on the front side wall of the housing near the bottom, and an isopropyl alcohol input pipeline 203 is connected to the isopropyl alcohol input port 211 .
  • An ultrapure water input port 212 and an ultrapure water output port 213 are provided on one side wall of the housing, and a circulating ultrapure water input pipeline 205 and a circulating ultrapure water output pipeline 206 are respectively connected.
  • ultrapure water with stable and controllable temperature needs to be provided to form a hot water bath area in the mixing tank 201.
  • an ultrapure water circulation system pipeline is designed.
  • the circulating ultrapure water input pipeline 205 is connected to an ultrapure water supplier, and a heater is provided on the circulating ultrapure water input pipeline 205.
  • the heater provides heat to heat the ultrapure water input from the circulation pipeline to the mixing tank 201, and uses a heating detector to sense the temperature after heating, so that the heating temperature is controllable.
  • the recycled ultrapure water after use passes through
  • the circulating ultrapure water output pipeline 206 is recycled to the ultrapure water supplier, and needs to be cooled before entering the ultrapure water supplier.
  • a heated nitrogen input port 214 is provided on the rear side wall of the housing, and the heated nitrogen input port 214 is connected to a heated nitrogen input pipeline 203 .
  • a nitrogen recovery port is also provided at the heated nitrogen input port 214.
  • One end of the heated nitrogen input pipeline 203 is connected to the heated nitrogen input port 214, and the other end of the heated nitrogen input pipeline is connected to a nitrogen supplier.
  • a heater is provided on the heated nitrogen input pipeline, and the nitrogen recovery port is connected to a nitrogen supplier through a pipeline to recover and purify used nitrogen.
  • the rear side wall of the housing is also provided with a mixed gas-liquid coexistence body output port 215.
  • the mixed gas-liquid coexistence body output port 215 is connected to one end of the mixed gas-liquid coexistence liquid output pipeline 204.
  • the mixed gas-liquid coexistence body output port 215 The other end of the liquid coexistence liquid output pipeline 204 is connected to the upper cover 102 of the tank to transport the mixture of isopropyl alcohol and heated nitrogen into the drying tank 101 .
  • the mixing tank of the present invention is a core component of the mixing tank body 201.
  • the mixing tank 207 is cylindrical in shape.
  • the mixing tank 207 is installed through an upper mounting block 220 and a lower mounting block.
  • the block 221 is clamped and fixed up and down in the housing.
  • the mixing tank 207 is made of a transparent cylinder made of tempered glass. Made of tempered glass, it is easy to observe the internal mixing process and mixing conditions, and it is easier to control as needed.
  • the liquid level detector functions to detect air pressure, temperature and capacity information in the mixing tank in real time.
  • three liquid level detectors are provided on the side wall of each mixing tank 207. From top to bottom, they are an upper liquid level detector 208, a middle liquid level detector 209 and a lower liquid level detector.
  • Liquid level detector 210, the exteriors of the three liquid level detectors are all fixed on the same positioning bar, and the positioning bar is connected in the housing through the upper end and the lower end.
  • the upper liquid level detector 208, the middle liquid level detector 209 and the lower liquid level detector 210 are respectively provided with a thermocouple temperature controller corresponding to the temperature outside the tank, and are combined with a thermocouple temperature controller.
  • the liquid level detector is formed into a composite detector.
  • the above-mentioned thermocouple thermostat corresponding to the temperature outside the tank is used for detection as a thermocouple thermostat connected to the external environment. It mainly corresponds to the aluminum plate on the outer edge of the tank and the contrast corresponding to the ambient temperature. pass The configuration of the thermocouple thermostat can clearly compare and analyze the temperature difference between the inside and outside and effectively control the temperature range of the inside and outside environment, and determine whether the overall heating environment requires turning on the heating device for auxiliary adjustment.
  • a three-layer structure of a vortex mixing channel 216, a buffer return tank 217 and a hot water bath area 218 is designed inside the mixing tank 207, where the vortex mixing channel 216 is the center of the mixing tank 207
  • An inverse conical cavity is provided, and further, the vortex mixing channel 216 is an inverse conical funnel vortex discharge channel.
  • a tank inlet 222 is provided at the bottom center of the mixing tank 207, and a tank outlet 223 is provided at the top center of the mixing tank 207.
  • the tank inlet 222 is connected to the isopropyl alcohol input port 211 to receive isopropyl alcohol. Alcohol is input into the vortex mixing channel 216.
  • the position above the buffer reflux tank 217 in the mixing tank 207 is connected to the heated nitrogen input port 214 to receive heated nitrogen.
  • the hot water bath area 218 in the mixing tank 207 is connected to the ultrapure water input port 212 and
  • the ultrapure water output port 213 is used to receive circulating ultrapure water, and the tank outlet 223 is connected to the mixed gas-liquid coexistence body output port 215.
  • the above-mentioned mixing tank adopts an embedded combined double-layer tank design.
  • the inner tank can be assembled on the wall of the outer tank and sealed with bolts to ensure that the atmosphere is sealed and does not leak out.
  • the inner tank adopts the same
  • the distance between the inner tank body and the outer tank body is preferably 10-12mm. The appropriate width spacing allows the liquid to be discharged without causing liquid leakage due to too narrow a spacing.
  • the viscous effect of liquid surface tension is generated in the interlayer area, so that liquid discharge can be effectively and smoothly discharged.
  • the utility model realizes gas-liquid mixing control corresponding to flow control, heating control, and pressurization, thereby forming a stable mixing output system, which is output to the upper cover of the tank in combination with the above-mentioned pipeline.
  • the spray structure outputs and supplies the gas-liquid mixture in a stable and controllable manner.
  • Two liquid mixing tanks made of tempered glass are used to mix the introduced isopropyl alcohol solvent and heated nitrogen input. In the mixing tank, configure the vortex
  • the inverted conical funnel vortex discharge channel for flow mixing increases the mixing path and increases the mixing ability on the path of the vortex channel.
  • the utility model improves the drying efficiency by improving and optimizing the drying air flow path, thereby improving the effective drying of wafer products during the drying process, increasing the path correction of isopropyl alcohol and hot nitrogen gas flow, and achieving a composite effect. Drying efficiency and time ratio achieve a perfect relative value presentation.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
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  • Cleaning Or Drying Semiconductors (AREA)

Abstract

An isopropanol and nitrogen mixing tank applied to wafer drying devices. The interior of a mixing tank (207) is of a three-layer structure comprising a vortex mixing channel (216), a buffer backflow tank (217) and a hot water bath area (218). A tank body inlet (222) is formed at the bottom of the mixing tank (207), and a tank body outlet (223) is formed at the top of the mixing tank (207); the tank body inlet (222) is communicated with the vortex mixing channel (216); the buffer backflow tank (217) is communicated with a heated nitrogen input port (214); the hot water bath area (218) is communicated with an ultrapure water input port (212) and an ultrapure water output port (213); the tank body outlet (223) is communicated with a mixed gas-liquid coexistence body output port (215); the mixing tank (207) is clamped by means of an upper mounting block (220) and a lower mounting block (221), so as to be fixed in a housing. The isopropanol and nitrogen mixing tank stably and controllably provides a mixed liquid formed by liquid isopropanol and heated nitrogen to provide gas and liquid atmospheres for rapid drying of wafers.

Description

一种应用于晶圆干燥装置中的异丙醇和氮气混合罐An isopropyl alcohol and nitrogen mixing tank used in wafer drying equipment 技术领域Technical field
本实用新型涉及半导体设备领域，特别涉及到一种应用于晶圆干燥装置中的异丙醇和氮气混合罐。The utility model relates to the field of semiconductor equipment, in particular to an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device.
背景技术Background technique
在晶圆制造中采用湿法形式进行晶圆清洗占了很大部分，成为目前晶圆清洗的主流。基于半导体晶圆清洗技术的需求，晶圆干燥技术是不可或缺的，至今已因应不同的晶圆产品而有不同的晶圆干燥技术。在晶圆湿法清洗完成后需要对晶圆进行干燥，通常采用的是异丙醇IPA来实现对晶圆的干燥。晶圆干燥作为湿法清洗工艺为最后收尾的动作，需要确保有效的移除晶圆表面的残余水分以及表面洁净度的控制，这就要求对干燥的方法进行不断的优化并提升干燥效率，这就成为晶圆清洗设备与技术开发中需要特别去重视的点。对使用晶圆干燥工艺的多种方法中，而在指定的时间内有效进行批量干燥则会影响到整体晶圆清洗工艺整体的工作效率，故建立一种有效的干燥效率的晶圆干燥方法成为现在晶圆湿法清洗技术中需要特别重视的一个环节。In wafer manufacturing, wet wafer cleaning accounts for a large part and has become the mainstream of wafer cleaning at present. Based on the demand for semiconductor wafer cleaning technology, wafer drying technology is indispensable. So far, different wafer drying technologies have been developed according to different wafer products. After the wafer wet cleaning is completed, the wafer needs to be dried. Isopropyl alcohol (IPA) is usually used to dry the wafer. Wafer drying, as the final step in the wet cleaning process, needs to ensure the effective removal of residual moisture on the wafer surface and the control of surface cleanliness, which requires continuous optimization of drying methods and improvement of drying efficiency. This has become a point that needs special attention in the development of wafer cleaning equipment and technology. Among the various methods of using the wafer drying process, effective batch drying within a specified time will affect the overall efficiency of the overall wafer cleaning process. Therefore, it is necessary to establish an effective drying efficiency wafer drying method. Nowadays, there is a link that needs special attention in wafer wet cleaning technology.
中国实用新型专利200910029506.4提到了一种异丙醇蒸汽清洗干燥装置，该专利中用设定压力的氮气将异丙醇液体打成蒸汽对需要清洗的玻璃晶圆进行清洗，然后再用加热灯对清洗过的玻璃晶圆进行干燥，其认为该装置和方法使得玻璃晶圆表面清洗的均匀又彻底，玻璃晶圆清洗干燥后表面无干燥纹。但是，上述结构和清洗方法直接将异丙醇达成蒸汽喷向玻璃晶圆，在具有多个晶圆组的条件下会造成晶圆错位碰撞，从而导致晶圆损坏，此外其异丙醇的纯度和温度也难以满足高质量的晶圆清洗，稳定性也难以保证。Chinese utility model patent 200910029506.4 mentions an isopropyl alcohol steam cleaning and drying device. In this patent, nitrogen at a set pressure is used to turn isopropyl alcohol liquid into steam to clean the glass wafer that needs to be cleaned, and then a heating lamp is used to clean the glass wafer. The cleaned glass wafer is dried. It is believed that the device and method make the surface of the glass wafer evenly and thoroughly cleaned, and there are no drying marks on the surface of the glass wafer after cleaning and drying. However, the above structure and cleaning method directly spray isopropyl alcohol vapor onto the glass wafer, which will cause misalignment and collision of the wafers under the condition of multiple wafer groups, resulting in wafer damage. In addition, the purity of the isopropyl alcohol The temperature and temperature are difficult to meet the needs of high-quality wafer cleaning, and the stability is difficult to guarantee.
在上述现有技术的情况下，如何设计一种应用于晶圆干燥装置中的 异丙醇和氮气混合罐，以稳定可控地提供异丙醇和热氮气的混合液体是湿法清洗过程中重要技术点。In the case of the above-mentioned prior art, how to design a wafer drying device used in The isopropyl alcohol and nitrogen mixing tank is an important technical point in the wet cleaning process to stably and controllably provide the mixed liquid of isopropyl alcohol and hot nitrogen.
实用新型内容Utility model content
本实用新型的目的在于克服上述现有技术存在的不足，提供一种应用于晶圆干燥装置中的异丙醇和氮气混合罐。本实用新型的应用于晶圆干燥装置中的异丙醇和氮气混合罐能稳定可控地提供液态异丙醇和加热氮气形成的混合液体，进而稳定可控地提供给干燥模组，从而为晶圆快速干燥提供气体和液体氛围。The purpose of this utility model is to overcome the above-mentioned shortcomings of the prior art and provide an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device. The isopropyl alcohol and nitrogen mixing tank used in the wafer drying device of the utility model can stably and controllably provide the mixed liquid formed by liquid isopropyl alcohol and heated nitrogen, and then stably and controllably provide the mixed liquid to the drying module, thereby providing the wafer Rapid drying provides gas and liquid atmospheres.
为了达到上述实用新型目的，本实用新型提供的技术方案如下：In order to achieve the above-mentioned purpose of the utility model, the technical solutions provided by the utility model are as follows:
一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，该混合罐内部为包括涡流混合道、缓冲回流槽和热水浴区域的三层结构，其中涡流混合道为混合罐中心设置的倒锥形空腔，在所述混合罐的底部中心位置设有罐体入口，所述混合罐的顶部中心位置设有罐体出口，所述的罐体入口联通所述的涡流混合道，所述缓冲回流槽上方位置联通所述的加热氮气输入端口，所述混合罐内的热水浴区域联通所述的超纯水输入端口和超纯水输出端口，所述的罐体出口联通所述的混合后气液共存体输出端口。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device. The inside of the mixing tank has a three-layer structure including a vortex mixing channel, a buffer return tank and a hot water bath area. The vortex mixing channel is set in the center of the mixing tank. In the inverted cone-shaped cavity, a tank inlet is provided at the bottom center of the mixing tank, and a tank outlet is provided at the top center of the mixing tank. The tank inlet is connected to the vortex mixing channel, so The upper position of the buffer reflux tank is connected to the heated nitrogen input port, the hot water bath area in the mixing tank is connected to the ultrapure water input port and the ultrapure water output port, and the tank outlet is connected to the The output port of the mixed gas-liquid coexistence body.
作为优化设计，所述的混合罐外形呈圆柱体，该混合罐通过一个上安装块和一个下安装块上下夹持固定于一个外壳内。As an optimized design, the mixing tank is cylindrical in shape. The mixing tank is clamped and fixed up and down in a shell through an upper mounting block and a lower mounting block.
作为优化设计，同一个外壳内并排设有两个混合罐。As an optimized design, there are two mixing tanks side by side in the same housing.
作为优化设计，在混合罐的侧壁上设有至少一个贯穿内外的液位侦测仪。As an optimized design, at least one liquid level detector penetrating inside and outside is provided on the side wall of the mixing tank.
作为优化设计，每个所述混合罐的侧壁上设有三个液位侦测仪，自上而下分别为上液位侦测仪、中液位侦测仪和下液位侦测仪，三个液位侦测仪的外部均固定在同一个定位条上，该定位条通过上端和下端连接在外壳中。As an optimized design, there are three liquid level detectors on the side wall of each mixing tank. From top to bottom, they are the upper liquid level detector, the middle liquid level detector and the lower liquid level detector. The exteriors of the three liquid level detectors are all fixed on the same positioning bar, which is connected to the housing through its upper and lower ends.
作为优化设计，在所述上液位侦测仪、中液位侦测仪和下液位侦测 仪上分别设有一个对应槽体外侧温度的热电偶温控器，组合有热电偶温控器的液位侦测仪形成为复合侦测器。As an optimized design, the upper liquid level detector, middle liquid level detector and lower liquid level detector are Each instrument is equipped with a thermocouple temperature controller corresponding to the temperature outside the tank. The liquid level detector combined with the thermocouple thermostat forms a composite detector.
作为优化设计，所述的混合罐由强化玻璃制成的透明圆柱体。As an optimized design, the mixing tank is made of a transparent cylinder made of tempered glass.
作为优化设计，所述的涡流混合道为倒锥形漏斗涡流排道。As an optimized design, the vortex mixing channel is an inverted conical funnel vortex discharge channel.
基于上述技术方案，本实用新型的混合罐作为集成模组的一部分应用在特殊的适合IPA晶圆干燥方法中，经过实践应用取得了如下技术效果：Based on the above technical solution, the mixing tank of the present utility model is used as a part of the integrated module in a special suitable IPA wafer drying method. The following technical effects have been achieved through practical application:
1.本实用新型应用于晶圆干燥装置中的异丙醇和氮气混合罐结构选用强化玻璃制成的透明圆柱体，在混合罐内部设计了涡流混合道、缓冲回流槽和热水浴区域，其中涡流混合道为混合罐中心设置的倒锥形空腔，作为倒锥形漏斗涡流排道，通过将异丙醇从底部注入到涡流混合道，再将加压加热后的氮气注入，并提供缓冲回流槽来应对满溢，另外通过循环超纯水来提供稳定的温度供应，使得异丙醇与加热氮气充分混合，从而获得高纯的异丙醇和温度可控的加热氮气。1. The structure of the isopropyl alcohol and nitrogen mixing tank used in the wafer drying device of this utility model is a transparent cylinder made of tempered glass. A vortex mixing channel, a buffer return tank and a hot water bath area are designed inside the mixing tank, where The vortex mixing channel is an inverted cone-shaped cavity set in the center of the mixing tank. It serves as an inverted conical funnel vortex discharge channel. Isopropyl alcohol is injected from the bottom into the vortex mixing channel, and then pressurized and heated nitrogen is injected to provide buffering. The reflux tank is used to cope with overflow, and ultrapure water is circulated to provide a stable temperature supply, so that isopropyl alcohol and heated nitrogen are fully mixed, thereby obtaining high-purity isopropyl alcohol and temperature-controlled heated nitrogen.
3.本实用新型应用于晶圆干燥装置中的异丙醇和氮气混合罐结构通过上液位侦测仪、中液位侦测仪和下液位侦测仪的设计，实现了混合过程中温度和液位的监控测量，利用连通在外在环境的热电偶温控器用于侦测，主要对应于槽体外缘铝板以及对应于环境温度的对比，通过热电偶温控器的配置，能清楚对比分析内外温度差及有效控制内外环境温度区间，判断整体的加热环境是否所需开启加热装置进行辅助调节。3. The structure of the isopropyl alcohol and nitrogen mixing tank used in the wafer drying device of this utility model realizes the temperature control during the mixing process through the design of the upper liquid level detector, the middle liquid level detector and the lower liquid level detector. To monitor and measure the liquid level, a thermocouple thermostat connected to the external environment is used for detection. It mainly corresponds to the aluminum plate on the outer edge of the tank and the comparison of the ambient temperature. Through the configuration of the thermocouple thermostat, a clear comparison and analysis can be achieved The temperature difference between the inside and outside can effectively control the temperature range of the inside and outside environment to determine whether the overall heating environment requires turning on the heating device for auxiliary adjustment.
附图说明Description of the drawings
图1是本实用新型的晶圆干燥装置的结构示意图。Figure 1 is a schematic structural diagram of the wafer drying device of the present invention.
图2是本实用新型一种应用于晶圆干燥装置中的异丙醇和氮气混合罐中混合罐体的前部结构组成示意图。Figure 2 is a schematic diagram of the front structure of the mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device of the present invention.
图3是本实用新型一种应用于晶圆干燥装置中的异丙醇和氮气混合罐中混合罐体的后部结构组成示意图。Figure 3 is a schematic diagram of the rear structural composition of the mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device of the present invention.
图4是本实用新型一种应用于晶圆干燥装置中的异丙醇和氮气混合 罐中混合罐的混合原理示意图。Figure 4 is a mixture of isopropyl alcohol and nitrogen used in a wafer drying device according to the present invention. Schematic diagram of the mixing principle of a mix-in-tank tank.
图5是本实用新型一种应用于晶圆干燥装置中的异丙醇和氮气混合罐中混合罐的剖视结构示意图。Figure 5 is a schematic cross-sectional view of a mixing tank of an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to the present invention.
其中，附图说明如下：
101-干燥槽体；102-槽体上盖；103-摆荡机构；201-混合罐体；202-异
丙醇输入管路；203-异丙醇输入管路；204-混合后气液共存液体输出管路；205-循环超纯水输入管路；206-循环超纯水输出管路；207-混合罐；208-上液位侦测仪；209-中液位侦测仪；210-下液位侦测仪；211-异丙醇输入端口；212-超纯水输入端口；213-超纯水输出端口；214-加热氮气输入端口；215-混合后气液共存体输出端口；216-涡流混合道；217-缓冲回流槽；218-热水浴区域；219-罐体门板；220-上安装块；221-下安装块；222-罐体入口；223-罐体出口。Among them, the description of the drawings is as follows:
101-drying tank; 102-tank upper cover; 103-oscillation mechanism; 201-mixing tank; 202-isopropyl alcohol input pipeline; 203-isopropyl alcohol input pipeline; 204-mixed gas-liquid coexistence liquid Output pipeline; 205-circulating ultrapure water input pipeline; 206-circulating ultrapure water output pipeline; 207-mixing tank; 208-upper liquid level detector; 209-middle liquid level detector; 210-lower Liquid level detector; 211-isopropyl alcohol input port; 212-ultrapure water input port; 213-ultrapure water output port; 214-heated nitrogen input port; 215-mixed gas-liquid coexistence output port; 216- Vortex mixing channel; 217-buffer return tank; 218-hot water bath area; 219-tank door panel; 220-upper mounting block; 221-lower mounting block; 222-tank inlet; 223-tank outlet.
具体实施方式Detailed ways
下面我们结合附图和具体的实施例来对本实用新型一种应用于晶圆干燥装置中的异丙醇和氮气混合罐做进一步的详细阐述，以求更为清楚明了地理解其结构组成和工作方式，但不能以此来限制本实用新型的保护范围。Below, we will further elaborate on the isopropyl alcohol and nitrogen mixing tank used in wafer drying devices according to the present invention in conjunction with the accompanying drawings and specific examples, in order to understand its structural composition and working mode more clearly. , but this cannot be used to limit the scope of protection of the present invention.
本实用新型是一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，该混合罐是晶圆干燥方法专用集成模组中的一个核心部件。上述的集成模组作为晶圆干燥设备的一个重要组成部分，其功能是为晶圆在湿法清洗后进行干燥提供异丙醇(英文简称为IPA)和加热氮气，为晶圆干燥过程中液体界面张力控制提供气相和液相混合氛围，以减低超纯水界面以上的液体张力，加速晶圆片表面超纯水中水分子的加速脱离。在晶圆片的干燥过程中，该晶圆干燥设备中采用了特殊的IPA晶圆干燥方法，具体是通过一个专门的集成模组向干燥模组的干燥槽体内提供异丙醇和加热氮气混合物，而异丙醇和氮气的混合过程则在本实用新型的混合罐中发生。 The utility model is an isopropyl alcohol and nitrogen mixing tank used in a wafer drying device. The mixing tank is a core component of a dedicated integrated module for the wafer drying method. As an important part of the wafer drying equipment, the above-mentioned integrated module functions to provide isopropyl alcohol (IPA for short in English) and heated nitrogen for drying the wafer after wet cleaning, and to provide liquid for the wafer drying process. Interfacial tension control provides a mixed atmosphere of gas phase and liquid phase to reduce the liquid tension above the ultrapure water interface and accelerate the detachment of water molecules in ultrapure water on the wafer surface. During the drying process of the wafers, the wafer drying equipment adopts a special IPA wafer drying method. Specifically, a special integrated module provides a mixture of isopropyl alcohol and heated nitrogen into the drying tank of the drying module. The mixing process of isopropyl alcohol and nitrogen takes place in the mixing tank of the present invention.
如图1所示，将混合罐及其连接控制管路作为稳定可控地为晶圆干燥设备供应IPA和加热氮气的专用集成模组，其组成包括有混合罐体201、异丙醇输入管路202、加热氮气输入管路203、混合后气液共存液体输出管路204、循环超纯水输入管路205以及循环超纯水输出管路206。上述的混合罐体201通过接收异丙醇和加热氮气进行混合，在循环超纯水的配合下，混合成为符合要求的压力和浓度的异丙醇和加热氮气混合物，通过混合后气液共存液体输出管路204输入到干燥模组中，在干燥模组中，混合后气液共存液体输出管路204的输出端连接到槽体上盖102上，该槽体上盖102合并于干燥槽体101上形成封闭干燥空间，一个摆荡机构103携带待清洗干燥的晶圆片放置于所述的干燥槽体101内，在超纯水和异丙醇和加热氮气混合物配合下完成对晶圆片的清洗和干燥。As shown in Figure 1, the mixing tank and its connecting control pipeline are used as a dedicated integrated module to stably and controllably supply IPA and heated nitrogen to the wafer drying equipment. It consists of a mixing tank 201 and an isopropyl alcohol input pipe. Road 202, heated nitrogen input pipeline 203, mixed gas-liquid coexistence liquid output pipeline 204, circulating ultrapure water input pipeline 205, and circulating ultrapure water output pipeline 206. The above-mentioned mixing tank 201 receives isopropyl alcohol and heated nitrogen for mixing. With the cooperation of circulating ultrapure water, it is mixed into a mixture of isopropyl alcohol and heated nitrogen that meets the required pressure and concentration. The mixed gas-liquid coexistence liquid output pipe The path 204 is input into the drying module. In the drying module, the output end of the mixed gas-liquid coexistence liquid output pipeline 204 is connected to the upper cover 102 of the tank body. The upper cover 102 of the tank body is merged with the drying tank body 101. A closed drying space is formed. A swing mechanism 103 carries the wafer to be cleaned and dried and places it in the drying tank 101. The cleaning and drying of the wafer is completed with the cooperation of ultrapure water, isopropyl alcohol and heated nitrogen mixture. .
如图2和图3所示，图中显示了混合罐体201的一种整体结构形式，所述混合罐体201结构上包括有外壳和混合罐207，所述外壳为带有罐体门板219的箱状结构，在所述外壳内设有至少一个混合罐207。在所述的混合罐体201的优化设计中，同一个外壳内并排设有两个混合罐207。第一能够提高混合效率，第二能够在一个损坏还能够提供最低的超纯水和异丙醇和加热氮气混合物供应。对混合罐体201而言，所述外壳除了放置并保护混合罐207以外，还承担了连接外部管路的功能。As shown in Figures 2 and 3, the figure shows an overall structural form of the mixing tank 201. The structure of the mixing tank 201 includes a shell and a mixing tank 207. The shell is provided with a tank door panel 219. The box-like structure is provided with at least one mixing tank 207 inside the housing. In the optimized design of the mixing tank 201, two mixing tanks 207 are arranged side by side in the same shell. The first is able to increase mixing efficiency and the second is able to provide a minimal supply of ultrapure water and isopropyl alcohol and heated nitrogen mixture in a damaged state. For the mixing tank 201, in addition to placing and protecting the mixing tank 207, the outer shell also assumes the function of connecting external pipelines.
在所述外壳前侧壁靠近底部位置设有异丙醇输入端口211，该异丙醇输入端口211连接有一个异丙醇输入管路203。在所述外壳的一侧壁设有超纯水输入端口212和超纯水输出端口213，分别对应连接有循环超纯水输入管路205和循环超纯水输出管路206。对于混合罐体201而言，需要提供温度稳定可控的超纯水以在混合罐体201中形成热水浴区域，为了达到上述目的设计了超纯水循环***管路。其中，所述的循环超纯水输入管路205联通一个超纯水供应器，并在循环超纯水输入管路205上设有加热器。其中通过加热器提供热量来对循环管路输入至混合罐体201中超纯水进行加热，并通过加热侦测器来感知加热后温度，做到加热温度可控，经过混合罐体201中混合罐使用后的循环超纯水经过 所述的循环超纯水输出管路206再循环到超纯水供应器中，在进入到超纯水供应器之前还需要进行冷却。An isopropyl alcohol input port 211 is provided on the front side wall of the housing near the bottom, and an isopropyl alcohol input pipeline 203 is connected to the isopropyl alcohol input port 211 . An ultrapure water input port 212 and an ultrapure water output port 213 are provided on one side wall of the housing, and a circulating ultrapure water input pipeline 205 and a circulating ultrapure water output pipeline 206 are respectively connected. For the mixing tank 201, ultrapure water with stable and controllable temperature needs to be provided to form a hot water bath area in the mixing tank 201. In order to achieve the above purpose, an ultrapure water circulation system pipeline is designed. Among them, the circulating ultrapure water input pipeline 205 is connected to an ultrapure water supplier, and a heater is provided on the circulating ultrapure water input pipeline 205. The heater provides heat to heat the ultrapure water input from the circulation pipeline to the mixing tank 201, and uses a heating detector to sense the temperature after heating, so that the heating temperature is controllable. The recycled ultrapure water after use passes through The circulating ultrapure water output pipeline 206 is recycled to the ultrapure water supplier, and needs to be cooled before entering the ultrapure water supplier.
在所述外壳的后侧壁上设有加热氮气输入端口214，该加热氮气输入端口214连接有加热氮气输入管路203。在所述加热氮气输入端口214处还设有一个氮气回收端口，加热氮气输入管路203的一端连接至所述加热氮气输入端口214，加热氮气输入管路另一端连接至一个氮气供应器上，在加热氮气输入管路上设有加热器，所述的氮气回收端口通过管路连接氮气供应器以对使用过的氮气回收纯化。A heated nitrogen input port 214 is provided on the rear side wall of the housing, and the heated nitrogen input port 214 is connected to a heated nitrogen input pipeline 203 . A nitrogen recovery port is also provided at the heated nitrogen input port 214. One end of the heated nitrogen input pipeline 203 is connected to the heated nitrogen input port 214, and the other end of the heated nitrogen input pipeline is connected to a nitrogen supplier. A heater is provided on the heated nitrogen input pipeline, and the nitrogen recovery port is connected to a nitrogen supplier through a pipeline to recover and purify used nitrogen.
在所述外壳的后侧壁上还设有混合后气液共存体输出端口215，该混合后气液共存体输出端口215连接混合后气液共存液体输出管路204的一端，该混合后气液共存液体输出管路204的另一端联通至槽体上盖102上，以将异丙醇和加热氮气混合物输送至干燥槽体101内。The rear side wall of the housing is also provided with a mixed gas-liquid coexistence body output port 215. The mixed gas-liquid coexistence body output port 215 is connected to one end of the mixed gas-liquid coexistence liquid output pipeline 204. The mixed gas-liquid coexistence body output port 215 The other end of the liquid coexistence liquid output pipeline 204 is connected to the upper cover 102 of the tank to transport the mixture of isopropyl alcohol and heated nitrogen into the drying tank 101 .
如图4和图5所示，本实用新型的混合罐作为混合罐体201的核心组成部件，所述的混合罐207外形呈圆柱体，该混合罐207通过一个上安装块220和一个下安装块221上下夹持固定于所述的外壳内。优化设计中，所述的混合罐207由强化玻璃制成的透明圆柱体。利用强化玻璃制作，可以起到便于观察内部混合过程和混合情况，更便于根据需要进行控制。As shown in Figures 4 and 5, the mixing tank of the present invention is a core component of the mixing tank body 201. The mixing tank 207 is cylindrical in shape. The mixing tank 207 is installed through an upper mounting block 220 and a lower mounting block. The block 221 is clamped and fixed up and down in the housing. In the optimized design, the mixing tank 207 is made of a transparent cylinder made of tempered glass. Made of tempered glass, it is easy to observe the internal mixing process and mixing conditions, and it is easier to control as needed.
在混合罐207的侧壁上设有至少一个贯穿内外的液位侦测仪，液位侦测仪的作用时实时侦测混合罐中的气压压力，温度和容量信息。在一个具体应用案例中，每个所述混合罐207的侧壁上设有三个液位侦测仪，自上而下分别为上液位侦测仪208、中液位侦测仪209和下液位侦测仪210，三个液位侦测仪的外部均固定在同一个定位条上，该定位条通过上端和下端连接在外壳中。在所述上液位侦测仪208、中液位侦测仪209和下液位侦测仪210上分别设有一个对应槽体外侧温度的热电偶温控器，组合有热电偶温控器的液位侦测仪形成为复合侦测器。上述对应槽体外侧温度的热电偶温控器，作为连通在外在环境的一种热电偶温控器用于侦测，主要对应于槽体外缘铝板以及对应于环境温度的对比。通过 热电偶温控器的配置，能清楚对比分析内外温度差及有效控制内外环境温度区间，判断整体的加热环境是否所需开启加热装置进行辅助调节。There is at least one liquid level detector penetrating inside and outside the side wall of the mixing tank 207. The liquid level detector functions to detect air pressure, temperature and capacity information in the mixing tank in real time. In a specific application case, three liquid level detectors are provided on the side wall of each mixing tank 207. From top to bottom, they are an upper liquid level detector 208, a middle liquid level detector 209 and a lower liquid level detector. Liquid level detector 210, the exteriors of the three liquid level detectors are all fixed on the same positioning bar, and the positioning bar is connected in the housing through the upper end and the lower end. The upper liquid level detector 208, the middle liquid level detector 209 and the lower liquid level detector 210 are respectively provided with a thermocouple temperature controller corresponding to the temperature outside the tank, and are combined with a thermocouple temperature controller. The liquid level detector is formed into a composite detector. The above-mentioned thermocouple thermostat corresponding to the temperature outside the tank is used for detection as a thermocouple thermostat connected to the external environment. It mainly corresponds to the aluminum plate on the outer edge of the tank and the contrast corresponding to the ambient temperature. pass The configuration of the thermocouple thermostat can clearly compare and analyze the temperature difference between the inside and outside and effectively control the temperature range of the inside and outside environment, and determine whether the overall heating environment requires turning on the heating device for auxiliary adjustment.
为了实现加热氮气与异丙醇的混合，在所述混合罐207内部设计了涡流混合道216、缓冲回流槽217和热水浴区域218的三层结构，其中涡流混合道216为混合罐207中心设置的倒锥形空腔，进一步地，所述的涡流混合道216为倒锥形漏斗涡流排道。通过倒锥形设计，结合从底部进入到混合罐内的异丙醇，可以起到延缓流动速度，延长混合时间提高混合效率的作用。In order to achieve the mixing of heated nitrogen and isopropyl alcohol, a three-layer structure of a vortex mixing channel 216, a buffer return tank 217 and a hot water bath area 218 is designed inside the mixing tank 207, where the vortex mixing channel 216 is the center of the mixing tank 207 An inverse conical cavity is provided, and further, the vortex mixing channel 216 is an inverse conical funnel vortex discharge channel. Through the inverted conical design, combined with the isopropyl alcohol entering the mixing tank from the bottom, it can slow down the flow speed, extend the mixing time and improve the mixing efficiency.
所述混合罐207的底部中心位置设有罐体入口222，所述混合罐207的顶部中心位置设有罐体出口223，所述的罐体入口222联通异丙醇输入端口211以接收异丙醇输入至涡流混合道216内。所述混合罐207内的缓冲回流槽217上方位置联通所述的加热氮气输入端口214以接收加热氮气，所述混合罐207内的热水浴区域218联通所述的超纯水输入端口212和超纯水输出端口213以接收循环超纯水，所述的罐体出口223联通所述的混合后气液共存体输出端口215。A tank inlet 222 is provided at the bottom center of the mixing tank 207, and a tank outlet 223 is provided at the top center of the mixing tank 207. The tank inlet 222 is connected to the isopropyl alcohol input port 211 to receive isopropyl alcohol. Alcohol is input into the vortex mixing channel 216. The position above the buffer reflux tank 217 in the mixing tank 207 is connected to the heated nitrogen input port 214 to receive heated nitrogen. The hot water bath area 218 in the mixing tank 207 is connected to the ultrapure water input port 212 and The ultrapure water output port 213 is used to receive circulating ultrapure water, and the tank outlet 223 is connected to the mixed gas-liquid coexistence body output port 215.
上述的混合罐采取内嵌型的组合式双层槽体设计，在内层槽可以组装在外层槽的壁上，以螺栓固定密封处理，确保气氛的封闭不外泄，在内层槽采取与槽体底部的倾斜面有一镂空的空间，其两个面的高度优选为2mm，促使在排气过程中气流可以迅速的进入内槽与外槽形成的夹层区，藉由外槽体配置的快速排气管道排放。此一设计亦不影响再排液过程中的液体排放，在内槽体与外槽体的间距采取优选为10-12mm，适当的宽度间距使在排放液体的同时不因过窄的间距造成液体在夹层区产生液体表面张力的粘滞效应，使液体排放可以有效顺畅的排放。The above-mentioned mixing tank adopts an embedded combined double-layer tank design. The inner tank can be assembled on the wall of the outer tank and sealed with bolts to ensure that the atmosphere is sealed and does not leak out. The inner tank adopts the same There is a hollow space on the inclined surface at the bottom of the tank, and the height of the two surfaces is preferably 2mm, which allows the airflow to quickly enter the interlayer area formed by the inner tank and the outer tank during the exhaust process. Through the rapid configuration of the outer tank, Exhaust duct emissions. This design does not affect the liquid discharge during the re-drainage process. The distance between the inner tank body and the outer tank body is preferably 10-12mm. The appropriate width spacing allows the liquid to be discharged without causing liquid leakage due to too narrow a spacing. The viscous effect of liquid surface tension is generated in the interlayer area, so that liquid discharge can be effectively and smoothly discharged.
本实用新型通过配置一种特殊的混合装置,实现对应流量控制、加热控制、加压打气进行气液混合控制，进而构成一稳定化的混合输出***，结合上述的管路输出于槽体上盖的喷淋结构进行气液混合物的输出与稳定可控地供应。利用混合罐体重配置的两个强化玻璃制作的液体混合罐，将导入的异丙醇溶剂与加热氮气输入进行混合。在混合罐中,配置产生涡 流混合的倒锥形漏斗涡流排道,增加混合的路径,在涡流道的路径上增加混合的能力。By configuring a special mixing device, the utility model realizes gas-liquid mixing control corresponding to flow control, heating control, and pressurization, thereby forming a stable mixing output system, which is output to the upper cover of the tank in combination with the above-mentioned pipeline. The spray structure outputs and supplies the gas-liquid mixture in a stable and controllable manner. Two liquid mixing tanks made of tempered glass are used to mix the introduced isopropyl alcohol solvent and heated nitrogen input. In the mixing tank, configure the vortex The inverted conical funnel vortex discharge channel for flow mixing increases the mixing path and increases the mixing ability on the path of the vortex channel.
本实用新型通过利用干燥气流路径的改善与优化，进而提升晶圆产品在干燥过程中的有效干燥，来提升干燥效率，增加异丙醇与热氮气气流的路径修正，达成复合性的成效，在干燥效率以及时间比达成一个完美的相对值的呈现。 The utility model improves the drying efficiency by improving and optimizing the drying air flow path, thereby improving the effective drying of wafer products during the drying process, increasing the path correction of isopropyl alcohol and hot nitrogen gas flow, and achieving a composite effect. Drying efficiency and time ratio achieve a perfect relative value presentation.

Claims (8)

  1. 一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，该混合罐(207)内部为包括涡流混合道(216)、缓冲回流槽(217)和热水浴区域(218)的三层结构，其中涡流混合道(216)为混合罐(207)中心设置的倒锥形空腔，在所述混合罐(207)的底部中心位置设有罐体入口(222)，所述混合罐(207)的顶部中心位置设有罐体出口(223)，所述罐体入口(222)联通所述涡流混合道(216)，所述缓冲回流槽(217)上方位置联通所述加热氮气输入端口(214)，所述混合罐(207)内的热水浴区域(218)联通所述的超纯水输入端口(212)和超纯水输出端口(213)，所述罐体出口(223)联通所述混合后气液共存体输出端口(215)；An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device, characterized in that the inside of the mixing tank (207) includes a vortex mixing channel (216), a buffer return tank (217) and a hot water bath area (218) ) has a three-layer structure, in which the vortex mixing channel (216) is an inverted cone-shaped cavity provided in the center of the mixing tank (207), and a tank inlet (222) is provided at the center of the bottom of the mixing tank (207), so A tank outlet (223) is provided at the top center of the mixing tank (207), the tank inlet (222) is connected to the vortex mixing channel (216), and the upper position of the buffer return tank (217) is connected to the Heated nitrogen input port (214), the hot water bath area (218) in the mixing tank (207) is connected to the ultrapure water input port (212) and the ultrapure water output port (213), and the tank body The outlet (223) is connected to the output port (215) of the mixed gas-liquid coexistence body;
  2. 根据权利要求1所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，所述混合罐(207)外形呈圆柱体，该混合罐(207)通过一个上安装块(220)和一个下安装块(221)上下夹持固定于一个外壳内。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 1, characterized in that the mixing tank (207) is cylindrical in shape, and the mixing tank (207) is mounted on a The block (220) and a lower mounting block (221) are clamped and fixed up and down in a shell.
  3. 根据权利要求2所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，同一个外壳内并排设有两个混合罐(207)。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 2, characterized in that two mixing tanks (207) are arranged side by side in the same shell.
  4. 根据权利要求1所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，在混合罐(207)的侧壁上设有至少一个贯穿内外的液位侦测仪。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 1, characterized in that at least one liquid level detector penetrating inside and outside is provided on the side wall of the mixing tank (207). .
  5. 根据权利要求4所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，每个所述混合罐(207)的侧壁上设有三个液位侦测仪，自上而下分别为上液位侦测仪(208)、中液位侦测仪(209)和下液位侦测仪(210)，三个液位侦测仪的外部均固定在同一个定位条上，该定位条通过上端和下端连接在外壳中。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 4, characterized in that three liquid level detectors are provided on the side wall of each mixing tank (207). From top to bottom, they are the upper liquid level detector (208), the middle liquid level detector (209) and the lower liquid level detector (210). The exteriors of the three liquid level detectors are all fixed on the same On the positioning strip, the positioning strip is connected in the housing through the upper and lower ends.
  6. 根据权利要求5所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，在所述上液位侦测仪(208)、中液位侦测仪(209)和下液位侦测仪(210)上分别设有一个对应槽体外侧温度的热电偶温控器，组合有热电偶温控器的液位侦测仪形成为复合侦测器。 An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 5, characterized in that, in the upper liquid level detector (208) and the middle liquid level detector (209) The lower liquid level detector (210) and the lower liquid level detector (210) are respectively provided with a thermocouple temperature controller corresponding to the temperature outside the tank. The liquid level detector combined with the thermocouple temperature controller forms a composite detector.
  7. 根据权利要求1所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，所述的混合罐(207)由强化玻璃制成的透明圆柱体。An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 1, characterized in that the mixing tank (207) is made of a transparent cylinder made of tempered glass.
  8. 根据权利要求1所述的一种应用于晶圆干燥装置中的异丙醇和氮气混合罐，其特征在于，所述的涡流混合道(216)为倒锥形漏斗涡流排道。 An isopropyl alcohol and nitrogen mixing tank used in a wafer drying device according to claim 1, characterized in that the vortex mixing channel (216) is an inverted conical funnel vortex discharge channel.
PCT/CN2023/106065 2022-09-08 2023-07-06 Isopropanol and nitrogen mixing tank applied to wafer drying devices WO2024051334A1 (en)

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CN218553709U (en) * 2022-09-08 2023-03-03 上海至纯洁净***科技股份有限公司 Be applied to isopropanol and nitrogen gas blending tank among wafer drying device

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US20090315197A1 (en) * 2008-06-19 2009-12-24 Hung-Liang Hsieh Constant temperature gas/liquid mixture generating system for use in wafer drying process
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