WO2024011271A1 - Security element - Google Patents
Security element Download PDFInfo
- Publication number
- WO2024011271A1 WO2024011271A1 PCT/AT2023/060233 AT2023060233W WO2024011271A1 WO 2024011271 A1 WO2024011271 A1 WO 2024011271A1 AT 2023060233 W AT2023060233 W AT 2023060233W WO 2024011271 A1 WO2024011271 A1 WO 2024011271A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- oxide
- structures
- security element
- fluoride
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 33
- 229910052751 metal Inorganic materials 0.000 claims abstract description 23
- 239000002184 metal Substances 0.000 claims abstract description 23
- 230000000694 effects Effects 0.000 claims abstract description 8
- -1 sodium aluminum fluorides Chemical class 0.000 claims description 38
- 239000000463 material Substances 0.000 claims description 36
- SZVJSHCCFOBDDC-UHFFFAOYSA-N ferrosoferric oxide Chemical compound O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 claims description 24
- 239000006096 absorbing agent Substances 0.000 claims description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 22
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 21
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 18
- 229910045601 alloy Inorganic materials 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 15
- ZNOKGRXACCSDPY-UHFFFAOYSA-N tungsten trioxide Chemical compound O=[W](=O)=O ZNOKGRXACCSDPY-UHFFFAOYSA-N 0.000 claims description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 14
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 12
- 239000005083 Zinc sulfide Substances 0.000 claims description 12
- 229910000420 cerium oxide Inorganic materials 0.000 claims description 12
- 229910052804 chromium Inorganic materials 0.000 claims description 12
- 239000011651 chromium Substances 0.000 claims description 12
- 229910001940 europium oxide Inorganic materials 0.000 claims description 12
- AEBZCFFCDTZXHP-UHFFFAOYSA-N europium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Eu+3].[Eu+3] AEBZCFFCDTZXHP-UHFFFAOYSA-N 0.000 claims description 12
- WHJFNYXPKGDKBB-UHFFFAOYSA-N hafnium;methane Chemical compound C.[Hf] WHJFNYXPKGDKBB-UHFFFAOYSA-N 0.000 claims description 12
- 239000000395 magnesium oxide Substances 0.000 claims description 12
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 12
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 claims description 12
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims description 12
- 229910052984 zinc sulfide Inorganic materials 0.000 claims description 12
- 229910017052 cobalt Inorganic materials 0.000 claims description 11
- 239000010941 cobalt Substances 0.000 claims description 11
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 11
- 229910052759 nickel Inorganic materials 0.000 claims description 11
- 125000006850 spacer group Chemical group 0.000 claims description 11
- VFLXBUJKRRJAKY-UHFFFAOYSA-N 13768-86-0 Chemical compound O=[Se](=O)=O VFLXBUJKRRJAKY-UHFFFAOYSA-N 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 10
- 239000002318 adhesion promoter Substances 0.000 claims description 10
- 229910052782 aluminium Inorganic materials 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 239000010949 copper Substances 0.000 claims description 10
- 239000003989 dielectric material Substances 0.000 claims description 10
- 229910052758 niobium Inorganic materials 0.000 claims description 10
- 239000010955 niobium Substances 0.000 claims description 10
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 10
- 229910052719 titanium Inorganic materials 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052763 palladium Inorganic materials 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 9
- 229910052720 vanadium Inorganic materials 0.000 claims description 9
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims description 9
- 229910003437 indium oxide Inorganic materials 0.000 claims description 8
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000000178 monomer Substances 0.000 claims description 8
- 229920000620 organic polymer Polymers 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 8
- 239000004033 plastic Substances 0.000 claims description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 7
- 229910052799 carbon Inorganic materials 0.000 claims description 7
- 229910052742 iron Inorganic materials 0.000 claims description 7
- PLDDOISOJJCEMH-UHFFFAOYSA-N neodymium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Nd+3].[Nd+3] PLDDOISOJJCEMH-UHFFFAOYSA-N 0.000 claims description 7
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims description 6
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims description 6
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 6
- 239000002033 PVDF binder Substances 0.000 claims description 6
- 229930040373 Paraformaldehyde Natural products 0.000 claims description 6
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 6
- 239000004698 Polyethylene Substances 0.000 claims description 6
- 239000004642 Polyimide Substances 0.000 claims description 6
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 6
- 239000004743 Polypropylene Substances 0.000 claims description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 6
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 claims description 6
- 229910001632 barium fluoride Inorganic materials 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(iv) oxide Chemical compound O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 claims description 6
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 6
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N iron oxide Inorganic materials [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 claims description 6
- 235000013980 iron oxide Nutrition 0.000 claims description 6
- VBMVTYDPPZVILR-UHFFFAOYSA-N iron(2+);oxygen(2-) Chemical class [O-2].[Fe+2] VBMVTYDPPZVILR-UHFFFAOYSA-N 0.000 claims description 6
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 claims description 6
- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 claims description 6
- 239000011733 molybdenum Substances 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 claims description 6
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- 229920002492 poly(sulfone) Polymers 0.000 claims description 6
- 229920002647 polyamide Polymers 0.000 claims description 6
- 229920006260 polyaryletherketone Polymers 0.000 claims description 6
- 229920001707 polybutylene terephthalate Polymers 0.000 claims description 6
- 229920002530 polyetherether ketone Polymers 0.000 claims description 6
- 229920000573 polyethylene Polymers 0.000 claims description 6
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 6
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 6
- 229920001721 polyimide Polymers 0.000 claims description 6
- 229920006324 polyoxymethylene Polymers 0.000 claims description 6
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 6
- 229920001155 polypropylene Polymers 0.000 claims description 6
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 6
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 6
- 229920002620 polyvinyl fluoride Polymers 0.000 claims description 6
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 6
- 229910003447 praseodymium oxide Inorganic materials 0.000 claims description 6
- FKTOIHSPIPYAPE-UHFFFAOYSA-N samarium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[Sm+3].[Sm+3] FKTOIHSPIPYAPE-UHFFFAOYSA-N 0.000 claims description 6
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 6
- 229910052721 tungsten Inorganic materials 0.000 claims description 6
- 239000010937 tungsten Substances 0.000 claims description 6
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims description 6
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 5
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 5
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 5
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- 229910001887 tin oxide Inorganic materials 0.000 claims description 5
- 239000004922 lacquer Substances 0.000 claims description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 4
- 239000005014 poly(hydroxyalkanoate) Substances 0.000 claims description 4
- 229920002961 polybutylene succinate Polymers 0.000 claims description 4
- 239000004631 polybutylene succinate Substances 0.000 claims description 4
- 239000004632 polycaprolactone Substances 0.000 claims description 4
- 229920001610 polycaprolactone Polymers 0.000 claims description 4
- 229920000903 polyhydroxyalkanoate Polymers 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 239000004628 starch-based polymer Substances 0.000 claims description 4
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 claims description 4
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 3
- 229920008285 Poly(ether ketone) PEK Polymers 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 claims description 3
- 239000011127 biaxially oriented polypropylene Substances 0.000 claims description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims description 3
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 3
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 239000005026 oriented polypropylene Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 239000004629 polybutylene adipate terephthalate Substances 0.000 claims description 3
- 229920000515 polycarbonate Polymers 0.000 claims description 3
- 239000004417 polycarbonate Substances 0.000 claims description 3
- 229920000728 polyester Polymers 0.000 claims description 3
- 239000011112 polyethylene naphthalate Substances 0.000 claims description 3
- 229920001169 thermoplastic Polymers 0.000 claims description 3
- 239000011135 tin Substances 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000001913 cellulose Substances 0.000 claims description 2
- 229920002678 cellulose Polymers 0.000 claims description 2
- ZGDWHDKHJKZZIQ-UHFFFAOYSA-N cobalt nickel Chemical compound [Co].[Ni].[Ni].[Ni] ZGDWHDKHJKZZIQ-UHFFFAOYSA-N 0.000 claims description 2
- 229920006238 degradable plastic Polymers 0.000 claims description 2
- QHSJIZLJUFMIFP-UHFFFAOYSA-N ethene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F QHSJIZLJUFMIFP-UHFFFAOYSA-N 0.000 claims description 2
- 229920005610 lignin Polymers 0.000 claims description 2
- 239000004626 polylactic acid Substances 0.000 claims description 2
- OJIKOZJGHCVMDC-UHFFFAOYSA-K samarium(iii) fluoride Chemical compound F[Sm](F)F OJIKOZJGHCVMDC-UHFFFAOYSA-K 0.000 claims description 2
- 239000004416 thermosoftening plastic Substances 0.000 claims description 2
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 claims description 2
- XRADHEAKQRNYQQ-UHFFFAOYSA-K trifluoroneodymium Chemical compound F[Nd](F)F XRADHEAKQRNYQQ-UHFFFAOYSA-K 0.000 claims description 2
- 229920002554 vinyl polymer Polymers 0.000 claims description 2
- 229920008262 Thermoplastic starch Polymers 0.000 claims 2
- ZIFQMRCKKMHKAN-UHFFFAOYSA-N ethene;1,1,2,3,3,3-hexafluoroprop-1-ene;1,1,2,2-tetrafluoroethene Chemical group C=C.FC(F)=C(F)F.FC(F)=C(F)C(F)(F)F ZIFQMRCKKMHKAN-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 151
- 239000012790 adhesive layer Substances 0.000 abstract 1
- 238000004049 embossing Methods 0.000 description 5
- 229910001026 inconel Inorganic materials 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004920 heat-sealing lacquer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000013615 primer Substances 0.000 description 1
- 239000002987 primer (paints) Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910001954 samarium oxide Inorganic materials 0.000 description 1
- 229940075630 samarium oxide Drugs 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/324—Reliefs
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/328—Diffraction gratings; Holograms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/30—Identification or security features, e.g. for preventing forgery
- B42D25/36—Identification or security features, e.g. for preventing forgery comprising special materials
- B42D25/373—Metallic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/405—Marking
- B42D25/425—Marking by deformation, e.g. embossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
- B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
- B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
- B42D25/40—Manufacture
- B42D25/45—Associating two or more layers
Definitions
- the invention relates to a security element, in particular for securities, security paper or security objects, such as banknotes, ID cards, credit cards, wherein the security element has at least one area with structures, at least one having a color shift effect in the at least one first area when viewed from a first side of the security element color-shifting optical effect layer is provided and the structures are completely or partially covered by the at least one optical effect layer.
- This object is achieved according to the invention with a security element of the type mentioned in that the structures are coated with at least one layer made of at least one metal, the at least one layer made of the at least one metal being arranged between the structures and the optical effect layer as an adhesion promoter layer.
- the solution according to the invention enables good adhesion between the structures and the color-shifting optical effect layer.
- the adhesion promoter layer has an influence on the chemical resistance of the security element.
- the structures are light-diffracting structures. It has proven to be particularly advantageous that the structures have an aspect ratio of 0.05 - 3. It has been found that this variant of the invention, in conjunction with the metallic coating, enables the realization of a particularly good connection between light-diffracting structures and the color-shifting optical effect layer.
- the structures are embossed structures, in particular structures embossed into an embossed lacquer layer.
- a contour of the at least one layer of metal follows a contour of the structures at least in sections, with in particular an interface of the at least one layer of metal facing the optical effect layer following the contour of the structures.
- the at least one layer made of metal covers at least those areas of the structures on which the at least one optical effect layer is applied.
- This variant of the invention enables, on the one hand, the creation of transparent areas with a partial effect layer, which appear, for example, in the form of patterns, characters, images, etc. also called “clear text”, as well as ensuring good adhesion of the color-shifting effect layer to the structures.
- the at least one metal of the at least one metal layer is selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, Copper and/or alloys of these materials, in particular at least one nickel-chromium alloy, or is made from at least one of these materials.
- the metal layer serving as an adhesion promoter particularly preferably contains chromium and/or nickel.
- an alloy known as “Inconel” has proven to be particularly suitable. Inconel is a nickel-chrome alloy whose main component is nickel and which contains chromium as the most important minor component.
- Iron, moybdenum, niobium, cobalt, manganese, copper, aluminum, titanium, silicon, carbon, sulfur, phosphorus and boron may be present.
- Such alloys are characterized by good adhesion promoter properties, in particular a metal layer of the color-shifting effect layer, and good corrosion resistance, especially against hydrochloric acid.
- the optical effect layer is designed as a thin-film element and has at least one absorber layer and at least one spacer layer.
- the at least one absorber layer is at least one metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver , copper and / or alloys of these materials or is made from at least one of these materials.
- the at least one spacer layer is a low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group of aluminum oxide (AI2O3), metal fluorides, for example magnesium fluoride (MgF2), aluminum fluoride (AIF3 ), cerium fluoride (CeFs), sodium aluminum fluorides (e.g.
- AI2O3 aluminum oxide
- metal fluorides for example magnesium fluoride (MgF2), aluminum fluoride (AIF3 ), cerium fluoride (CeFs), sodium aluminum fluorides (e.g.
- the optical effect layer designed as a thin-film element further comprises at least one reflection layer and / or a second absorber layer, the at least one spacer layer between the at least one first absorber layer and the at least one reflection layer and / or the at least one second absorber layer is arranged.
- the optical effect layer designed as a thin-film element further comprises at least one reflection layer and / or a second absorber layer, the at least one spacer layer between the at least one first absorber layer and the at least one reflection layer and / or the at least a second absorber layer is arranged.
- the at least one reflection layer is at least one metallic material, in particular selected from the group of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys or at least one high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C ), indium oxide (ImOs), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III) oxide (Fe3O4) and iron(III) oxide (Fe2O3), hafnium nitride (ZnS), zinc oxide (Zn
- the security element comprises a carrier layer made of a plastic, in particular the plastic being formed from a translucent and/or thermoplastic, and that the carrier layer preferably comprises at least one of the materials from the group polyimide (PI), polypropylene ( PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK ), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET),
- the security element can be equipped with further color-shifting layers, in particular layers with color-shifting pigments or liquid crystals and/or with machine-readable features, the machine-readable features being in particular magnetic codings, electrically conductive layers, electromagnetic waves absorbing and/or re-emitting substances.
- the security element it is possible for the security element to have additional layers, which additional layers include in particular protective lacquers, heat sealing lacquers, adhesives, primers and/or films.
- Fig. 1 shows a layer structure of a security element according to the invention.
- a security element 1 according to the invention as used to protect securities, security papers or security objects such as banknotes, ID cards, credit cards, tickets, etc. against forgery, has an area 2 in which structures 3 are arranged.
- the area 2 can extend over part of the security element 1 or over the entire security element 1.
- Structures 3 are formed in area 2.
- the structures 3 are preferably light-diffractive or diffractive structures.
- the structures 3 can, for example, generate a hologram and advantageously have an aspect ratio of 0.05 - 3.
- the term aspect ratio means the ratio of depth T to width B of the structures 3.
- depth T of a structure 3 is understood to mean a normal distance between the level of the lowest point and the level of the highest point of the structure 3.
- the width B of a structure 3 corresponds to the width of a depression in the structure 3.
- the aspect ratio represents the ratio of depth T to a peak to peak distance of the structures.
- the structures 3 preferably have a depth T of greater than 100 nm, in particular between 100 - 2000 nm, in particular 150 - 1500 nm.
- the structures 3 are coated with a layer 5 made of at least one metal or an alloy.
- the layer 5 is arranged between the structures 3 and the optical effect layer 4 as an adhesion promoter layer.
- the material of layer 5 is selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials, in particular at least one nickel-chrome alloy, includes or is made from at least one of these materials. Particularly preferred is the material of layer 5 chromium or a nickel-chromium alloy, such as Inconel.
- a contour of the layer 5 preferably follows a contour of the structures 3, in particular an interface of the layer 5 facing the optical effect layer 4 of the contour of the Structures 3 follows.
- the at least one layer 5 made of metal covers at least those areas of the structures 3 on which the optical effect layer 4 is applied.
- the optical effect layer 4 is preferably designed as a thin-film element.
- the optical effect layer 4, designed as a thin-film element, comprises at least one absorber layer 6 and at least one spacer layer 7.
- the absorber layer 6 can comprise a metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials or at least be made from one of these materials.
- the at least one spacer layer 7 can be formed, for example, from a dielectric material. Furthermore, the at least one spacer layer 7 can contain at least one low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group of aluminum oxide (Al2O3), metal fluorides, for example magnesium fluoride (MgF2), aluminum fluoride (AIF3), cerium fluoride (CeFs ), sodium aluminum fluorides (e.g.
- Al2O3 aluminum oxide
- metal fluorides for example magnesium fluoride (MgF2), aluminum fluoride (AIF3), cerium fluoride (CeFs ), sodium aluminum fluorides (e.g.
- NasAIFr or NasAhFu
- silicon oxide SiOx
- silicon dioxide SiO2
- neodymium fluoride NdFs
- lanthanum fluoride LaFs
- samarium fluoride SmFs
- barium fluoride BaF2
- calcium fluoride CaF2
- lithium fluoride LiF
- low-refractive index organic monomers and/or low-refractive index organic polymers or at least one high-refractive index dielectric material with a refractive index greater than 1.65 in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2) , carbon (C), indium oxide (IroOs), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (I
- the layer thickness of the individual layers or layers forming the thin-film element is greatly exaggerated and not shown to scale.
- the color-shifting optical effect layer 4 also includes a reflection layer 8.
- the at least one spacer layer 7 is arranged between the absorber layer 6 and the reflection layer 8.
- the reflection layer 8 is applied here directly to the layer 5 serving as an adhesion promoter layer, and can in particular be printed and/or vapor-deposited onto it. It is also possible to reverse this order in the optical effect layer, so that the absorber layer is arranged on layer 5 and furthermore the distance layer and the reflection layer. The arrangement would therefore be in the order structures 3 metal layer 5 - absorber layer 6 - spacer layer 7 - reflection layer 8. If the layer 5 and the absorber layer 6 consist of the same materials, it can be advantageous if they are applied in one operation.
- the reflection layer 8 can be a metallic material, in particular selected from the group of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt.
- Nickel alloys or at least a high-index dielectric material with a refractive index of greater than 1.65 in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (IroOs), indium - Tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III) oxide (Fe3O4) and iron (III) oxide (Fe2O3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2Os), praseodymium oxide (PreOn), samarium oxide (Sm2O3), antimony
- the security element 1 can further comprise a carrier layer 9.
- the carrier layer 9 can be formed from a plastic material. Furthermore, several layers can also form the carrier layer 8.
- the plastic can be formed from a translucent and/or thermoplastic plastic material.
- the material for the carrier layer 9 can be at least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyether ketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryl ether ketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), Polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC
- Arranging or applying the optical effect layer 4 or its layers to the layer 5 can be done, for example, by a printing process and/or a vapor deposition process or by several of them.
- the structures 3 can be embossed directly into the carrier layer 9. For example, by heating the carrier layer 9 and embossing the structures using an embossing tool, such as an embossing roller.
- the further layer 10 can be applied directly to the carrier layer 9.
- the further layer 10 can be formed by an embossing varnish, which cher is shaped according to the arrangement of the structures 3. This can in turn be done using a molding device or a molding element in an embossing process.
- This further layer, in particular an embossed lacquer layer, with the structures 3 formed therein can, for example, have a thickness of 0.5 pm to 300 pm, in particular from 0.8 pm to 50 pm, preferably from 1 pm to 10 pm.
- At least one intermediate layer can be provided between the layer 10 and the carrier layer 9, which can be formed, for example, by an adhesion promoter, a primer, an adhesive or the like.
- a protective layer (not shown here) can be provided as the top or outermost layer on the optical effect layer 4, which protects the entire layer and/or layer structure from mechanical damage such as scratches, grooves or the like.
- the protective layer could also be arranged on the side of the carrier layer facing away from the optical effect layer. An arrangement on both sides would also be conceivable.
- a flat design of the security element 1 can also be achieved by means of the protective layer.
- the layer structure depends on the type of attachment of the security element to a security object, since the side of the security element to be viewed after attachment is crucial.
- the visible side can be viewed from above as shown in the figures, but it is also possible to view the security element from a visible side from below, for example through a carrier.
- a layer is applied to something
- the phrase “a layer is applied to something” should be understood to mean that the layer can be applied directly, or that there is another or between the applied layer and what the layer is applied to There can be several intermediate layers. It should also be noted at this point that one or more intermediate layers can be arranged between the layers described in this document. It is therefore not absolutely necessary that the layers described contact each other. Furthermore, it should be noted that the term layer in this document is to be understood to mean that a layer can also be made up of several sub-layers.
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Abstract
The invention relates to a security element, in particular for value papers, security papers, or security articles, such as banknotes, identification cards, or credit cards. The security element (1) has at least one region (2) with structures (3), wherein at least one color-tilting optical effect layer (4) is provided which produces a color-tilting effect in the at least one first region (2) when viewed from a first face of the security element, and the structures (3) are covered partially or over the entire surface thereof by the at least one optical effect layer (4). The structures (3) are coated with at least one layer (5) made of at least one metal, and the at least one layer (5) made of the at least one metal is arranged between the structures (3) and the optical effect layer (4) as an adhesive layer.
Description
Sicherheitselement Security element
Die Erfindung betrifft ein Sicherheitselement insbesondere für Wertpapiere, Sicherheitspapier oder Sicherheitsgegenstände, wie Banknoten, Ausweise, Kreditkarten, wobei das Sicherheitselement zumindest einen Bereich mit Strukturen aufweist, wobei zumindest eine, bei Betrachtung von einer ersten Seite des Sicherheitselements in dem zumindest einen ersten Bereich einen Farbkippeffekt hervorrufende farbkippende optische Effektschicht vorgesehen ist und die Strukturen vollflächig oder partiell von der zumindest einen optischen Effektschicht abgedeckt sind. The invention relates to a security element, in particular for securities, security paper or security objects, such as banknotes, ID cards, credit cards, wherein the security element has at least one area with structures, at least one having a color shift effect in the at least one first area when viewed from a first side of the security element color-shifting optical effect layer is provided and the structures are completely or partially covered by the at least one optical effect layer.
Bei Sicherheitselementen, welche Strukturen mit einer großen Oberfläche aufweisen, kann es zu Problemen mit der Haftung von farbkippenden optischen Effektschichten an den Strukturen kommen. Dies kann nicht nur in der Herstellung Probleme verursachen sondern auch die Lebensdauer der Sicherheitselemente beeinträchtigen. In the case of security elements that have structures with a large surface area, problems can arise with the adhesion of color-shifting optical effect layers to the structures. This can not only cause problems in production but also affect the lifespan of the security elements.
Es ist daher eine Aufgabe der vorliegenden Erfindung die oben genannten Nachteile zu überwinden und die Herstellung und Qualität eines Sicherheitselements mit Strukturen und einer farbkippenden Beschichtung zu verbessern. It is therefore an object of the present invention to overcome the above-mentioned disadvantages and to improve the production and quality of a security element with structures and a color-shifting coating.
Diese Aufgabe wird mit einem Sicherheitselement der eingangs genannten Art erfindungsgemäß dadurch gelöst, dass die Strukturen mit zumindest einer Schicht aus zumindest einem Metall beschichtet sind, wobei die zumindest eine Schicht aus dem zumindest einem Metall zwischen den Strukturen und der optischen Effektschicht als Haftvermittlerschicht angeordnet ist. This object is achieved according to the invention with a security element of the type mentioned in that the structures are coated with at least one layer made of at least one metal, the at least one layer made of the at least one metal being arranged between the structures and the optical effect layer as an adhesion promoter layer.
Die erfindungsgemäße Lösung ermöglicht eine gute Haftung zwischen den Strukturen und der farbkippenden optischen Effektschicht. Darüber hinaus hat die Haftvermittlerschicht einen Einfluss auf die chemischen Beständigkeiten des Sicherheitselements. The solution according to the invention enables good adhesion between the structures and the color-shifting optical effect layer. In addition, the adhesion promoter layer has an influence on the chemical resistance of the security element.
Gemäß einer vorteilhaften Variante der Erfindung ist es vorgesehen, dass die Strukturen lichtbeugende Strukturen sind.
Als besonders vorteilhaft hat sich herausgestellt, dass die Strukturen ein Aspektverhältnis von 0,05 - 3 aufweisen. Es hat sich herausgestellt, dass diese Variante der Erfindung in Zusammenspiel mit der metallischen Beschichtung die Realisierung einer besonders guten Verbindung zwischen lichtbeugenden Strukturen und der farbkippenden optischen Effektschicht ermöglicht. According to an advantageous variant of the invention, it is provided that the structures are light-diffracting structures. It has proven to be particularly advantageous that the structures have an aspect ratio of 0.05 - 3. It has been found that this variant of the invention, in conjunction with the metallic coating, enables the realization of a particularly good connection between light-diffracting structures and the color-shifting optical effect layer.
Gemäß einer bevorzugten Weiterbildung der Erfindung kann es vorgesehen sein, dass die Strukturen geprägte Strukturen, insbesondere in eine Prägelackschicht geprägte Strukturen, sind. According to a preferred development of the invention, it can be provided that the structures are embossed structures, in particular structures embossed into an embossed lacquer layer.
Darüber hinaus kann es vorgesehen sein, dass eine Kontur der zumindest einen Schicht aus Metall zumindest abschnittsweise einer Kontur der Strukturen folgt, wobei insbesondere eine der optischen Effektschicht zugewandte Grenzfläche der zumindest einen Schicht aus Metall der Kontur der Strukturen folgt. Durch diese Variante der Erfindung wird es ermöglicht, dass sowohl der Farbkippeffekt der der optischen Effektschicht und ein durch die Strukturen hervorgerufener Effekt, wie beispielsweise ein Hologramm, gleichzeitig gut wahrnehmbar sind. In addition, it can be provided that a contour of the at least one layer of metal follows a contour of the structures at least in sections, with in particular an interface of the at least one layer of metal facing the optical effect layer following the contour of the structures. This variant of the invention makes it possible for both the color shift effect of the optical effect layer and an effect caused by the structures, such as a hologram, to be easily perceptible at the same time.
Weiters hat sich als besonders günstig erwiesen, dass die zumindest eine Schicht aus Metall zumindest jene Bereiche der Strukturen bedeckt, auf welchen die zumindest eine optische Effektschicht aufgetragen ist. Diese Variante der Erfindung ermöglicht zum einen bei einer partiellen Effektschicht die Erzeugung von durchsichtigen Bereichen, die beispielsweise die Form von Mustern, Zeichen Bildern etc. auch „Cleartext“ genannt erscheinen, als auch eine gute Haftung der farbkippenden Effektschicht an den Strukturen zu gewährleisten. Furthermore, it has proven to be particularly advantageous that the at least one layer made of metal covers at least those areas of the structures on which the at least one optical effect layer is applied. This variant of the invention enables, on the one hand, the creation of transparent areas with a partial effect layer, which appear, for example, in the form of patterns, characters, images, etc. also called “clear text”, as well as ensuring good adhesion of the color-shifting effect layer to the structures.
Als besonders günstig hat sich erwiesen, dass das zumindest eine Metall der zumindest einen Schicht aus Metall ausgewählt ist aus der Gruppe von Nickel, Titan, Mangan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien, insbesondere zumindest eine Nickelchromlegierung, umfasst oder aus zumindest einem dieser Materialien hergestellt ist. Besonders bevorzugt enthält die als Haftvermittler dienende Metallschicht Chrom und/oder Nickel. Insbesondere hat sich eine unter der Bezeichnung „Inconel“ bekannt gewordene Legierung als besonders geeignet herausgestellt. Inconel ist eine Nickelchrom Legierung, deren Hauptkomponente Nickel ist, und die Chrom als wichtigste Nebenkomponente enthält. Zusätzlich können
Eisen, Moybdän, Niob, Kobalt, Mangan, Kupfer, Aluminium, Titan, Silizium, Kohlenstoff, Schwefel, Phosphor und Bor vorhanden sein. Derartige Legierungen zeichnen sich neben guten Haftvermittlereigenschaften, insbesondere zu einer Metallschicht der farbkippenden Effektschicht und einer guten Korrosionsbeständigkeit, insbesondere gegenüber Salzsäure, aus. It has proven to be particularly advantageous that the at least one metal of the at least one metal layer is selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, Copper and/or alloys of these materials, in particular at least one nickel-chromium alloy, or is made from at least one of these materials. The metal layer serving as an adhesion promoter particularly preferably contains chromium and/or nickel. In particular, an alloy known as “Inconel” has proven to be particularly suitable. Inconel is a nickel-chrome alloy whose main component is nickel and which contains chromium as the most important minor component. Additionally can Iron, moybdenum, niobium, cobalt, manganese, copper, aluminum, titanium, silicon, carbon, sulfur, phosphorus and boron may be present. Such alloys are characterized by good adhesion promoter properties, in particular a metal layer of the color-shifting effect layer, and good corrosion resistance, especially against hydrochloric acid.
Vorteilhafterweise kann es vorgesehen sein, dass die optische Effektschicht als Dünnschichtelement ausgebildet ist und zumindest eine Absorber schicht und zumindest eine Distanzschicht aufweist. Advantageously, it can be provided that the optical effect layer is designed as a thin-film element and has at least one absorber layer and at least one spacer layer.
Gemäß einer bevorzugten Weiterbildung der Erfindung kann es vorgesehen sein, dass die zumindest eine Absorberschicht zumindest ein metallisches Material, insbesondere ausgewählt aus der Gruppe von Nickel, Titan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien umfasst oder aus zumindest einem dieser Materialien hergestellt ist. According to a preferred development of the invention, it can be provided that the at least one absorber layer is at least one metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver , copper and / or alloys of these materials or is made from at least one of these materials.
Weiter hat es sich als günstig erwiesen, dass die zumindest eine Distanzschicht ein niederbrechendes dielektrisches Material mit einem Brechungsindex kleiner oder gleich 1,65, insbesondere ausgewählt aus der Gruppe Aluminiumoxid (AI2O3), Metallfluoride, beispielsweise Mag- nesiumfluorid (MgF2), Aluminiumfluorid (AIF3), Cerfluorid (CeFs), Natrium- Aluminium- Fluoride (z.B. NasAIFr, oder NasAhFu), Siliziumoxid (SIOX), Siliziumdioxid (SiO2), Neodymfluorid (NdFs), Lanthanfluorid (LaFs), Samariumfluorid (SinFs). Bariumfluorid (BaF2), Calciumfluorid (CaF2), Lithiumfluorid (LiF), niederbrechende organische Monomere und/oder niederbrechende organische Polymere oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (I112O3), Indium-Zinn-Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafniumcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2O3), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3), Zinnoxid (SnO2), Wolframtri- oxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfasst oder aus zumindest einem dieser Materialien hergestellt ist.
Gemäß einer vorteilhaften Weiterbildung der Erfindung kann es vorgesehen sein, dass die als Dünnschichtelement ausgebildete optische Effektschicht weiters noch zumindest eine Reflexionsschicht und/oder eine zweite Absorberschicht umfasst, wobei die zumindest eine Distanzschicht zwischen der zumindest einen ersten Absorberschicht und der zumindest einen Reflexionsschicht und/oder der zumindest einen zweiten Absorberschicht angeordnet ist. Furthermore, it has proven to be advantageous for the at least one spacer layer to be a low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group of aluminum oxide (AI2O3), metal fluorides, for example magnesium fluoride (MgF2), aluminum fluoride (AIF3 ), cerium fluoride (CeFs), sodium aluminum fluorides (e.g. NasAIFr, or NasAhFu ), silicon oxide (SIO Barium fluoride (BaF2), calcium fluoride (CaF2), lithium fluoride (LiF), low-refractive index organic monomers and/or low-refractive index organic polymers or at least one high-refractive index dielectric material with a refractive index greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (I112O3), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as for example iron (II,III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3 ), praseodymium oxide (PreOn), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (SisN4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), high refractive index organic monomers and / or high-refractive index organic polymers or is made from at least one of these materials. According to an advantageous development of the invention, it can be provided that the optical effect layer designed as a thin-film element further comprises at least one reflection layer and / or a second absorber layer, the at least one spacer layer between the at least one first absorber layer and the at least one reflection layer and / or the at least one second absorber layer is arranged.
Gemäß einer bevorzugten Ausführungsform ist es vorgesehen, dass die als Dünnschichtelement ausgebildete optische Effektschicht weiters noch zumindest eine Reflexionsschicht und/oder eine zweite Absorberschicht umfasst, wobei die zumindest eine Distanzschicht zwischen der zumindest einen ersten Absorberschicht und der zumindest einen Reflexions schicht und/oder der zumindest einen zweiten Absorberschicht angeordnet ist. According to a preferred embodiment, it is provided that the optical effect layer designed as a thin-film element further comprises at least one reflection layer and / or a second absorber layer, the at least one spacer layer between the at least one first absorber layer and the at least one reflection layer and / or the at least a second absorber layer is arranged.
Weiters hat es sich als vorteilhaft herausgestellt, dass die zumindest eine Reflexionsschicht zumindest ein metallisches Material, insbesondere ausgewählt aus der Gruppe Silber, Kupfer, Aluminium, Gold, Platin, Niob, Zinn, oder aus Nickel, Titan, Vanadium, Chrom, Kobalt und Palladium oder Legierungen dieser Materialien, insbesondere Kobalt-Nickel-Legierungen oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex von größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (ImOs), Indium-Zinn- Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafniumcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2O3), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3), Zinnoxid (SnO2), Wolframtrioxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfasst oder aus zumindest einem dieser Materialien hergestellt ist. Furthermore, it has proven to be advantageous for the at least one reflection layer to be at least one metallic material, in particular selected from the group of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys or at least one high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C ), indium oxide (ImOs), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III) oxide (Fe3O4) and iron(III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), praseodymium oxide (PreOn), samarium oxide (Sm2O3), Antimony trioxide (Sb 2 O 3 ), silicon carbide (SiC), silicon nitride (SisN4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), high-refractive index organic monomers and / or high-refractive index organic polymers at least one of these materials is made.
Als besonders günstig hat sich erwiesen, dass die zumindest eine Reflexions schicht oder zumindest eine der Absorber schichten direkt auf die als Haftvermittler dienende Schicht aus Metall aufgebracht ist, insbesondere aufgedruckt und/oder aufgedampft ist.
Weiters kann es vorgesehen sein, dass das Sicherheitselement eine Trägerschicht aus einem Kunststoff umfasst, wobei insbesondere der Kunststoff aus einem lichtdurchlässigen und/oder thermoplastischen Kunststoff gebildet ist, und dass die Trägerschicht bevorzugt zumindest eines der Materialien aus der Gruppe Polyimid (PI), Polypropylen (PP), monoaxial orientiertem Polypropylen (MOPP), biaxial orientierten Polypropylen (BOPP), Polyethylen (PE), Polyphenylensulfid (PPS), Polyetheretherketon, (PEEK) Polyetherketon (PEK), Polyethylenimid (PEI), Polysulfon (PSU), Polyaryletherketon (PAEK), Polyethylennaphthalat (PEN), flüssigkristalline Polymere (LCP), Polyester, Polybutylenterephthalat (PBT), Polyethylenterephtha- lat (PET), Polyamid (PA), Polycarbonat (PC), Cycloolefincopolymere (COC), Polyoximethy- len (POM), Acrylnitrilbutadienstyrol (ABS), Polyvinylcholrid (PVC) Ethylentetrafluorethylen (ETFE), Polytetrafluorethylen (PTFE), Polyvinylfluorid (PVF), Polyvinylidenfluorid (PVDF), Ethylen-Tetrafluorethylen-Hexafluorpropylen-Fluorterpolymer (EFEP), Cellulose- oder Lig- nin-basierte Kunststoffe, Polyhydroxyalkanoate (PHA), thermo-plastische Stärke (TPS), Polymilchsäure (PLA), Polycaprolacton (PCL), Polybutylensuccinat (PBS), und Polybutylenadi- pat-terephthalat (PB AT) und/oder zumindest einen recycelten und/oder biologisch und/oder marin abbaubare Kunststoff und/oder Mischungen und/oder Co-Polymere dieser Materialien umfasst oder aus zumindest einem dieser Materialien hergestellt ist. It has proven to be particularly advantageous that the at least one reflection layer or at least one of the absorber layers is applied directly to the metal layer serving as an adhesion promoter, in particular printed and/or vapor-deposited. Furthermore, it can be provided that the security element comprises a carrier layer made of a plastic, in particular the plastic being formed from a translucent and/or thermoplastic, and that the carrier layer preferably comprises at least one of the materials from the group polyimide (PI), polypropylene ( PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyetherketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryletherketone (PAEK ), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl cholride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF), ethylene-tetrafluoroethylene-hexafluoropropylene fluoroterpolymer (EFEP), cellulose or lignin-based plastics, polyhydroxyalkanoates (PHA), thermo-plastic starch (TPS), polylactic acid (PLA), polycaprolactone (PCL), polybutylene succinate (PBS), and polybutylene adipate terephthalate (PB AT) and / or at least one recycled and / or organic and / or includes marine-degradable plastic and/or mixtures and/or co-polymers of these materials or is made from at least one of these materials.
Weiteres vorteilhaft kann es sein, dass das Sicherheitselement mit weiteren farbkippenden Schichten, insbesondere Schichten mit farbkippenden Pigmenten oder Flüssigkristallen und/oder mit maschinenlesbaren Merkmalen, ausgestattet ist, wobei es sich bei den maschinenlesbaren Merkmalen insbesondere um Magnet-codierungen, elektrisch leitfähige Schichten, elektromagnetische Wellen absorbierende und/oder reemittierende Stoffe handelt. Insbesondere ist es möglich, dass das Sicherheitselement zusätzliche Schichten aufweist, welche zusätzlichen Schichten insbesondere Schutzlacke, Heißsiegellacke, Kleber, Primer und/oder Folien umfassen. It can be further advantageous for the security element to be equipped with further color-shifting layers, in particular layers with color-shifting pigments or liquid crystals and/or with machine-readable features, the machine-readable features being in particular magnetic codings, electrically conductive layers, electromagnetic waves absorbing and/or re-emitting substances. In particular, it is possible for the security element to have additional layers, which additional layers include in particular protective lacquers, heat sealing lacquers, adhesives, primers and/or films.
Zum besseren Verständnis der Erfindung wird diese anhand der nachfolgenden Figuren näher erläutert. For a better understanding of the invention, it will be explained in more detail using the following figures.
Es zeigt in stark vereinfachter, schematischer Darstellung: It shows in a highly simplified, schematic representation:
Fig. 1 einen Schichtaufbau eines erfindungsgemäßen Sicherheitselements.
Gemäß Fig. 1 weist ein erfindungsgemäßes Sicherheitselement 1, wie es zur Fälschungssicherheit von Wertpapieren, Sicherheitspapieren oder Sicherheitsgegenständen, wie Banknoten, Ausweisen, Kreditkarten, Tickets, etc. verwendet wird, einen Bereich 2 auf, in dem Strukturen 3 angeordnet sind. Der Bereich 2 kann sich über einen Teil des Sicherheitselements 1 oder aber auch über das gesamte Sicherheitselement 1 erstrecken. In dem Bereich 2 sind Strukturen 3 ausgebildet. Bevorzugt handelt es sich bei den Strukturen 3 um lichtbeugende bzw. diffraktive Strukturen. Die Strukturen 3 können beispielsweise ein Hologramm erzeugen und weisen günstiger Weise ein Aspektverhältnis von 0,05 - 3 auf. Unter Aspektverhältnis wird für Strukturen mit einem rechtwinkeligen Neigungswinkel, beispielsweise säulenartige Strukturen, das Verhältnis von Tiefe T zu Breite B der Strukturen 3 verstanden. Unter Tiefe T einer Struktur 3 wird in dem vorliegenden Zusammenhang ein Normalabstand zwischen dem Niveau des tiefsten Punktes und dem Niveau des höchsten Punktes der Struktur 3 verstanden. Die Breite B einer Struktur 3 entspricht hierbei der Breite einer Vertiefung der Struktur 3. Bei Strukturen mit einem Neigungswinkel abweichend von 90°, beispielsweise sägezahnartige Strukturen, stellt das Aspektverhältnis das Verhältnis von Tiefe T zu einem Peak zu Peak Abstand der Strukturen dar. Fig. 1 shows a layer structure of a security element according to the invention. 1, a security element 1 according to the invention, as used to protect securities, security papers or security objects such as banknotes, ID cards, credit cards, tickets, etc. against forgery, has an area 2 in which structures 3 are arranged. The area 2 can extend over part of the security element 1 or over the entire security element 1. Structures 3 are formed in area 2. The structures 3 are preferably light-diffractive or diffractive structures. The structures 3 can, for example, generate a hologram and advantageously have an aspect ratio of 0.05 - 3. For structures with a right-angled inclination angle, for example column-like structures, the term aspect ratio means the ratio of depth T to width B of the structures 3. In the present context, depth T of a structure 3 is understood to mean a normal distance between the level of the lowest point and the level of the highest point of the structure 3. The width B of a structure 3 corresponds to the width of a depression in the structure 3. For structures with an angle of inclination other than 90°, for example sawtooth-like structures, the aspect ratio represents the ratio of depth T to a peak to peak distance of the structures.
Bevorzugt weisen die Strukturen 3 eine Tiefe T von größer als 100 nm, insbesondere zwischen 100 - 2000 nm, insbesondere 150 - 1500 nm, auf. The structures 3 preferably have a depth T of greater than 100 nm, in particular between 100 - 2000 nm, in particular 150 - 1500 nm.
Die Strukturen 3 sind mit einer Schicht 5 aus mindestens einem Metall oder einer Legierung beschichtet. Die Schicht 5 ist zwischen den Strukturen 3 und der optischen Effektschicht 4 als Haftvermittlerschicht angeordnet ist. The structures 3 are coated with a layer 5 made of at least one metal or an alloy. The layer 5 is arranged between the structures 3 and the optical effect layer 4 as an adhesion promoter layer.
Das Material der Schicht 5 ist ausgewählt aus der Gruppe von Nickel, Titan, Mangan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien, insbesondere zumindest eine Nickelchromlegierung, umfasst oder aus zumindest einem dieser Materialien hergestellt ist. Besonders bevorzugt ist das Material der Schicht 5 Chrom oder eine Nickelchromlegierung, wie beispielsweise Inconel. The material of layer 5 is selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials, in particular at least one nickel-chrome alloy, includes or is made from at least one of these materials. Particularly preferred is the material of layer 5 chromium or a nickel-chromium alloy, such as Inconel.
Eine Kontur der Schicht 5 folgt bevorzugt einer Kontur der Strukturen 3, wobei insbesondere eine der optischen Effektschicht 4 zugewandte Grenzfläche der Schicht 5 der Kontur der
Strukturen 3 folgt. Die zumindest eine Schicht 5 aus Metall bedeckt zumindest jene Bereiche der Strukturen 3, auf welchen die optische Effektschicht 4 aufgetragen ist. A contour of the layer 5 preferably follows a contour of the structures 3, in particular an interface of the layer 5 facing the optical effect layer 4 of the contour of the Structures 3 follows. The at least one layer 5 made of metal covers at least those areas of the structures 3 on which the optical effect layer 4 is applied.
Die optische Effektschicht 4 ist bevorzugt als Dünnschichtelement ausgebildet. Die als Dünnschichtelement ausgebildete optische Effektschicht 4 umfasst zumindest eine Absorberschicht 6 und zumindest eine Distanzschicht 7. The optical effect layer 4 is preferably designed as a thin-film element. The optical effect layer 4, designed as a thin-film element, comprises at least one absorber layer 6 and at least one spacer layer 7.
Die Absorber schicht 6 kann ein metallische Material, insbesondere ausgewählt aus der Gruppe von Nickel, Titan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien umfassen oder aus zumindest einem dieser Materialien hergestellt sein. The absorber layer 6 can comprise a metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials or at least be made from one of these materials.
Die zumindest eine Distanzschicht 7 kann z.B. aus einem dielektrischen Material gebildet sein. Weiters kann die zumindest eine Distanzschicht 7 zumindest ein niederbrechendes dielektrisches Material mit einem Brechungsindex kleiner oder gleich 1,65, insbesondere ausgewählt aus der Gruppe Aluminiumoxid (AI2O3), Metallfluoride, beispielsweise Magnesiumflu- orid (MgF2), Aluminiumfluorid (AIF3), Cerfluorid (CeFs), Natrium- Aluminium-Fluoride (z.B. NasAIFr, oder NasAhFu), Siliziumoxid (SIOx), Siliziumdioxid (SiO2), Neodymfluorid (NdFs), Lanthanfluorid (LaFs), Samariumfluorid (SmFs), Bariumfluorid (BaF2), Calciumfluo- rid (CaF2), Lithiumfluorid (LiF), niederbrechende organische Monomere und/oder niederbrechende organische Polymere oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (IroOs), Indium- Zinn-Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafniumcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2O3), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3), Zinnoxid (SnO2), Wolframtrioxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfassen oder aus zumindest einem dieser Materialien hergestellt sein.
Die als Dünnschichtelement ausgebildete optische Effektschicht 4 ist auf der Schicht 5, welche auf den Strukturen 3 angeordnet ist, aufgebracht. The at least one spacer layer 7 can be formed, for example, from a dielectric material. Furthermore, the at least one spacer layer 7 can contain at least one low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group of aluminum oxide (Al2O3), metal fluorides, for example magnesium fluoride (MgF2), aluminum fluoride (AIF3), cerium fluoride (CeFs ), sodium aluminum fluorides (e.g. NasAIFr, or NasAhFu), silicon oxide (SIOx), silicon dioxide (SiO2), neodymium fluoride (NdFs), lanthanum fluoride (LaFs), samarium fluoride (SmFs), barium fluoride (BaF2), calcium fluoride (CaF2 ), lithium fluoride (LiF), low-refractive index organic monomers and/or low-refractive index organic polymers or at least one high-refractive index dielectric material with a refractive index greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2) , carbon (C), indium oxide (IroOs), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), praseodymium oxide (PreOn), samarium oxide include or be made from at least one of these materials. The optical effect layer 4, designed as a thin-film element, is applied to the layer 5, which is arranged on the structures 3.
Die Schichtstärke der einzelnen das Dünnschichtelement bildenden Schichten oder Lagen ist stark übertrieben und unmaßstäblich dargestellt. The layer thickness of the individual layers or layers forming the thin-film element is greatly exaggerated and not shown to scale.
Die farbkippende optische Effektschicht 4 auch noch eine Reflexions schicht 8 umfassen. Die zumindest eine Distanzschicht 7 ist dabei zwischen der Absorberschicht 6 und der Reflexionsschicht 8 angeordnet. Die Reflexionsschicht 8 ist hier direkt auf der als Haftvermittlerschicht dienenden Schicht 5 aufgebracht, und kann insbesondere auf diese aufgedruckt und/oder aufgedampft werden. Ebenfalls ist es möglich, diese Reihenfolge in der optischen Effektschicht auch umzukehren, sodass die Absorberschicht auf der Schicht 5 angeordnet ist und weiters die Distanzschicht und die Reflexions schicht. Somit wäre die Anordnung entsprechend der Reihenfolge Strukturen 3 Metallschicht 5 - Absorberschicht 6 - Distanzschicht 7 - Reflexionsschicht 8. Wenn die Schicht 5 und die Absorber schicht 6 aus den gleichen Materialen bestehen, kann es vorteilhaft sein, wenn sie in einem Arbeitsgang aufgebracht werden. The color-shifting optical effect layer 4 also includes a reflection layer 8. The at least one spacer layer 7 is arranged between the absorber layer 6 and the reflection layer 8. The reflection layer 8 is applied here directly to the layer 5 serving as an adhesion promoter layer, and can in particular be printed and/or vapor-deposited onto it. It is also possible to reverse this order in the optical effect layer, so that the absorber layer is arranged on layer 5 and furthermore the distance layer and the reflection layer. The arrangement would therefore be in the order structures 3 metal layer 5 - absorber layer 6 - spacer layer 7 - reflection layer 8. If the layer 5 and the absorber layer 6 consist of the same materials, it can be advantageous if they are applied in one operation.
Die Reflexionsschicht 8 kann ein metallisches Material, insbesondere ausgewählt aus der Gruppe, Silber, Kupfer, Aluminium Gold, Platin, Niob, Zinn, oder aus Nickel, Titan, Vanadium, Chrom, Kobalt und Palladium oder Legierungen dieser Materialien, insbesondere Ko- balt-Nickel-Legierungen oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex von größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (IroOs), Indium- Zinn-Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafniumcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2Os), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3), Zinnoxid (SnO2), Wolframtrioxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfassen oder aus zumindest einem dieser Materialien hergestellt sein. Dies gilt für alle in den Ausführungsbeispielen beschriebenen Reflexionsschichten 8.
Anstelle der oben genannten Reflexions schicht 8 kann aber auch eine weitere Absorberschicht vorgesehen sein. The reflection layer 8 can be a metallic material, in particular selected from the group of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt. Nickel alloys or at least a high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (IroOs), indium - Tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III) oxide (Fe3O4) and iron (III) oxide (Fe2O3 ), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2Os), praseodymium oxide (PreOn), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC ), silicon nitride (SisN4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), high-index organic monomers and / or high-index organic polymers or be made from at least one of these materials. This applies to all reflection layers 8 described in the exemplary embodiments. Instead of the above-mentioned reflection layer 8, a further absorber layer can also be provided.
Das Sicherheitselement 1 kann weiters eine Trägerschicht 9 umfassen. Die Trägerschicht 9 kann aus einem Kunststoffwerkstoff gebildet sein. Weiters können auch mehrere Lagen die Trägerschicht 8 bilden. Der Kunststoff kann aus einem lichtdurchlässigen und/oder thermoplastischen Kunststoffmaterial gebildet sein. Als Werkstoff für die Trägerschicht 9 kann zumindest eines der Materialien aus der Gruppe Polyimid (PI), Polypropylen (PP), monoaxial orientiertem Polypropylen (MOPP), biaxial orientierten Polypropylen (BOPP), Polyethylen (PE), Polyphenylensulfid (PPS), Polyetheretherketon, (PEEK) Polyetherketon (PEK), Po- lyethylenimid (PEI), Polysulfon (PSU), Polyaryletherketon (PAEK), Polyethylennaphthalat (PEN), flüssigkristalline Polymere (LCP), Polyester, Polybutylenterephthalat (PBT), Po- lyethylenterephthalat (PET), Polyamid (PA), Polycarbonat (PC), Cycloolefincopolymere (COC), Polyoximethylen (POM), Acrylnitrilbutadienstyrol (ABS), Polyvinylchlorid (PVC) Ethylentetrafluorethylen (ETFE), Polytetrafluorethylen (PTFE), Polyvinylfluorid (PVF), Poly vinylidenfluorid (PVDF) und Ethylen-Tetrafluorethylen-Hexafluorpropylen-Fluorterpoly- mer (EFEP) und/oder Mischungen und/oder Co-Polymere dieser Materialien umfassen oder aus zumindest einem dieser Materialien hergestellt sein. Die Trägerschicht kann dabei eine Dicke von 5 pm bis 1000 pm, besonders bevorzugt eine Dicke von 10 pm bis 50 pm, aufweisen. The security element 1 can further comprise a carrier layer 9. The carrier layer 9 can be formed from a plastic material. Furthermore, several layers can also form the carrier layer 8. The plastic can be formed from a translucent and/or thermoplastic plastic material. The material for the carrier layer 9 can be at least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyether ketone (PEK), polyethyleneimide (PEI), polysulfone (PSU), polyaryl ether ketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), Polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl chloride (PVC) ethylenetetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF) and Ethylene-tetrafluoroethylene-hexafluoropropylene fluoroterpolymer (EFEP) and/or mixtures and/or co-polymers of these materials or be made from at least one of these materials. The carrier layer can have a thickness of 5 pm to 1000 pm, particularly preferably a thickness of 10 pm to 50 pm.
Das Anordnen oder Aufbringen der optischen Effektschicht 4 oder deren Lagen auf die Schicht 5 kann z.B. durch einen Druckvorgang und/oder einen Bedampfungsvorgang oder von mehreren derselben erfolgen. Arranging or applying the optical effect layer 4 or its layers to the layer 5 can be done, for example, by a printing process and/or a vapor deposition process or by several of them.
Die Strukturen 3 können direkt in die Trägerschicht 9 eingeprägt werden. Beispielsweise durch Erwärmen der Trägerschicht 9 und Einprägen der Strukturen mittels eines Prägewerkzeuges, wie einer Prägewalze. The structures 3 can be embossed directly into the carrier layer 9. For example, by heating the carrier layer 9 and embossing the structures using an embossing tool, such as an embossing roller.
Eine weitere alternative Möglichkeit besteht darin, zur Aufnahme der Strukturen 3 eine eigene weitere Schicht 10 vorzusehen. Die weitere Schicht 10 kann direkt auf die Trägerschicht 9 aufgebracht sein. So kann z.B. die weitere Schicht 10 von einem Prägelack gebildet sein, wel-
cher entsprechend zur Anordnung der Strukturen 3 umgeformt ist. Dies kann wiederum mittels einer Abformvorrichtung oder eines Abformelements in einem Prägeverfahren erfolgen. Diese weitere Schicht, insbesondere eine Prägelackschicht, mit den darin ausgeformten Strukturen 3 kann beispielsweise eine Dicke von 0,5 pm bis 300 pm, insbesondere von 0,8 pm bis 50 pm, bevorzugt von 1 pm bis 10 pm aufweisen. Another alternative possibility is to provide a separate additional layer 10 to accommodate the structures 3. The further layer 10 can be applied directly to the carrier layer 9. For example, the further layer 10 can be formed by an embossing varnish, which cher is shaped according to the arrangement of the structures 3. This can in turn be done using a molding device or a molding element in an embossing process. This further layer, in particular an embossed lacquer layer, with the structures 3 formed therein can, for example, have a thickness of 0.5 pm to 300 pm, in particular from 0.8 pm to 50 pm, preferably from 1 pm to 10 pm.
Weiters kann zwischen der Schicht 10 und der Trägerschicht 9 zumindest eine Zwischenschicht vorgesehen sein, welche z.B. durch einen Haftvermittler, einen Primer, einen Kleber oder dergleichen ausgebildet sein kann. Furthermore, at least one intermediate layer can be provided between the layer 10 and the carrier layer 9, which can be formed, for example, by an adhesion promoter, a primer, an adhesive or the like.
Als oberste bzw. äußerste Schicht auf der optischen Effektschicht 4 kann z.B. eine hier nicht dargestellte Schutzschicht vorgesehen sein, welche den gesamten Schicht- und/oder Lagenaufbau vor mechanischen Beschädigungen wie z.B. Kratzern, Riefen oder dergleichen schützt. Es könnte die Schutzschicht auch auf der von der optischen Effektschicht abgewendeten Seite der Trägerschicht angeordnet sein. Eine beidseitige Anordnung wäre auch denkbar. Bevorzugt kann mittels der Schutzschicht auch eine ebenflächige Ausbildung des Sicherheitselements 1 erzielt werden. For example, a protective layer (not shown here) can be provided as the top or outermost layer on the optical effect layer 4, which protects the entire layer and/or layer structure from mechanical damage such as scratches, grooves or the like. The protective layer could also be arranged on the side of the carrier layer facing away from the optical effect layer. An arrangement on both sides would also be conceivable. Preferably, a flat design of the security element 1 can also be achieved by means of the protective layer.
Es sei erwähnt, dass der Schichtaufbau, sowie die Anordnung weiterer Schichten abhängig von der Art der Anbringung des Sicherheitselementes auf einem Sicherheitsgegenstand ist, da hierbei die zu betrachtende Seite des Sicherheitselementes nach der Anbringung ausschlaggebend ist. Somit kann die Sichtseite wie in den Figuren dargestellt, von oben betrachtet sein, es ist aber auch möglich, das Sicherheitselement von einer Sichtseite von unten zu betrachten, z.B. durch einen Träger. It should be mentioned that the layer structure, as well as the arrangement of further layers, depends on the type of attachment of the security element to a security object, since the side of the security element to be viewed after attachment is crucial. Thus, the visible side can be viewed from above as shown in the figures, but it is also possible to view the security element from a visible side from below, for example through a carrier.
An dieser Stelle sei darauf hingewiesen, dass die Formulierung „eine Schicht ist auf etwas aufgebracht“ so zu verstehen ist, dass die Schicht direkt aufgebracht sein kann, oder dass sich zwischen der aufgebrachten Schicht und dem, worauf die Schicht aufgebracht ist, noch eine oder mehrere Zwischenschichten befinden können. An dieser Stelle sei auch darauf hingewiesen, dass zwischen den in diesem Dokument beschriebenen Schichten eine oder auch mehrere Zwischenschichten angeordnet sein können. Es ist somit nicht zwingend erforderlich, dass die
beschriebenen Schichten einander kontaktieren. Weiters sei darauf hingewiesen, dass der Begriff Schicht in diesem Dokument so zu verstehen ist, dass eine Schicht auch aus mehreren Teilschichten aufgebaut sein kann.
At this point it should be noted that the phrase “a layer is applied to something” should be understood to mean that the layer can be applied directly, or that there is another or between the applied layer and what the layer is applied to There can be several intermediate layers. It should also be noted at this point that one or more intermediate layers can be arranged between the layers described in this document. It is therefore not absolutely necessary that the layers described contact each other. Furthermore, it should be noted that the term layer in this document is to be understood to mean that a layer can also be made up of several sub-layers.
Bezugszeichenaufstellung List of reference symbols
Sicherheitselement Bereich Strukturen Effektschicht Schicht Security element area structures effect layer layer
Absorber schicht Distanzschicht Reflexions schicht Trägerschicht Absorber layer, distance layer, reflection layer, carrier layer
Schicht
layer
Claims
1. Sicherheitselement insbesondere für Wertpapiere, Sicherheitspapier oder Sicherheitsgegenstände, wie Banknoten, Ausweise, Kreditkarten, wobei das Sicherheitselement (1) zumindest einen Bereich (2) mit Strukturen (3) aufweist, wobei zumindest eine, bei Betrachtung von einer ersten Seite des Sicherheitselements in dem zumindest einen ersten Bereich (2) einen Farbkippeffekt hervorrufende farbkippende optische Effektschicht (4) vorgesehen ist und die Strukturen (3) vollflächig oder partiell von der zumindest einen farbkippenden optischen Effektschicht (4) abgedeckt sind, dadurch gekennzeichnet, dass die Strukturen (3) mit zumindest einer Schicht (5) aus zumindest einem Metall beschichtet sind, wobei die zumindest eine Schicht (5) aus dem zumindest einem Metall zwischen den Strukturen (3) und der optischen Effektschicht (4) als Haftvermittlerschicht angeordnet ist. 1. Security element in particular for securities, security paper or security objects, such as banknotes, ID cards, credit cards, wherein the security element (1) has at least one area (2) with structures (3), at least one, when viewed from a first side of the security element the at least one first region (2) is provided with a color-shifting optical effect layer (4) which causes a color-shifting effect and the structures (3) are completely or partially covered by the at least one color-shifting optical effect layer (4), characterized in that the structures (3) are coated with at least one layer (5) made of at least one metal, the at least one layer (5) made of the at least one metal being arranged between the structures (3) and the optical effect layer (4) as an adhesion promoter layer.
2. Sicherheitselement nach Anspruch 1, dadurch gekennzeichnet, dass die Strukturen (3) lichtbeugende Strukturen sind. 2. Security element according to claim 1, characterized in that the structures (3) are light-diffracting structures.
3. Sicherheitselement nach Anspruch 1 oder 2, dadurch gekennzeichnet, dass die Strukturen (3) ein Aspektverhältnis von 0,05 - 3 aufweist. 3. Security element according to claim 1 or 2, characterized in that the structures (3) have an aspect ratio of 0.05 - 3.
4. Sicherheitselement nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, dass die Strukturen (3) geprägte Strukturen, insbesondere in eine Prägelackschicht geprägte Strukturen, sind. 4. Security element according to one of claims 1 to 3, characterized in that the structures (3) are embossed structures, in particular structures embossed in an embossed lacquer layer.
5. Sicherheitselement nach einem der Ansprüche 1 bis 4, dadurch gekennzeichnet, dass eine Kontur der zumindest einen Schicht (5) aus Metall zumindest abschnittsweise einer Kontur der Strukturen folgt, wobei insbesondere eine der optischen Effektschicht (4) zugewandte Grenzfläche der zumindest einen Schicht (5) aus Metall der Kontur der Strukturen (3) folgt. 5. Security element according to one of claims 1 to 4, characterized in that a contour of the at least one layer (5) made of metal follows a contour of the structures at least in sections, in particular an interface of the at least one layer facing the optical effect layer (4). 5) made of metal follows the contour of the structures (3).
6. Sicherheitselement nach einem der Ansprüche 1 bis 5, dadurch gekennzeichnet, dass die zumindest eine Schicht (5) aus Metall zumindest jene Bereiche der Strukturen (3) bedeckt, auf welchen die zumindest eine optische Effektschicht (4) aufgetragen ist.
6. Security element according to one of claims 1 to 5, characterized in that the at least one layer (5) made of metal covers at least those areas of the structures (3) on which the at least one optical effect layer (4) is applied.
7. Sicherheitselement nach einem der Ansprüche 1 bis 6, dadurch gekennzeichnet, dass das zumindest eine Metall der zumindest einen Schicht (5) aus Metall ausgewählt ist aus der Gruppe von Nickel, Titan, Mangan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien, insbesondere zumindest eine Nickelchromlegierung, umfasst oder aus zumindest einem dieser Materialien hergestellt ist. 7. Security element according to one of claims 1 to 6, characterized in that the at least one metal of the at least one layer (5) of metal is selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, Tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials, in particular at least one nickel-chrome alloy, or is made from at least one of these materials.
8. Sicherheitselement nach einem der Ansprüche 1 bis 7, dadurch gekennzeichnet, dass die optische Effektschicht (4) als Dünnschichtelement ausgebildet ist und zumindest eine Absorberschicht (6) und zumindest eine Distanzschicht (7) aufweist. 8. Security element according to one of claims 1 to 7, characterized in that the optical effect layer (4) is designed as a thin-film element and has at least one absorber layer (6) and at least one spacer layer (7).
9. Sicherheitselement nach Anspruch 8, dadurch gekennzeichnet, dass die zumindest eine Absorber schicht (6) zumindest ein metallisches Material, insbesondere ausgewählt aus der Gruppe von Nickel, Titan, Vanadium, Chrom, Kobalt, Palladium, Eisen, Wolfram, Molybdän, Niob, Aluminium, Silber, Kupfer und/oder Legierungen dieser Materialien umfasst oder aus zumindest einem dieser Materialien hergestellt ist. 9. Security element according to claim 8, characterized in that the at least one absorber layer (6) comprises at least one metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, Aluminum, silver, copper and / or alloys of these materials or is made from at least one of these materials.
10. Sicherheitselement nach Anspruch 8 oder 9, dadurch gekennzeichnet, dass die zumindest eine Distanzschicht (7) ein niederbrechendes dielektrisches Material mit einem Brechungsindex kleiner oder gleich 1,65, insbesondere ausgewählt aus der Gruppe Aluminiumoxid (AI2O3), Metallfluoride, beispielsweise Magnesiumfluorid (MgF2), Aluminiumfluorid (AIF3), Cerfluorid (CeFs), Natrium- Aluminium- Fluoride (z.B. NasAIFr, oder NasAhFu), Siliziumoxid (SIOx), Siliziumdioxid (SiO2), Neodymfluorid (NdFs), Lanthanfluorid (LaFs), Samariumfluorid (SmFs), Bariumfluorid (BaF2), Calciumfluorid (CaF2), Lithiumfluorid (LiF), niederbrechende organische Monomere und/oder niederbrechende organische Polymere oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (I112O3), Indium-Zinn-Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafni- umcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2O3), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3),
Zinnoxid (SnCh), Wolframtrioxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfasst oder aus zumindest einem dieser Materialien hergestellt ist. 10. Security element according to claim 8 or 9, characterized in that the at least one spacer layer (7) is a low-refractive dielectric material with a refractive index less than or equal to 1.65, in particular selected from the group of aluminum oxide (Al2O3), metal fluorides, for example magnesium fluoride (MgF2 ), aluminum fluoride (AIF3), cerium fluoride (CeFs), sodium aluminum fluorides (e.g. NasAIFr, or NasAhFu), silicon oxide (SIOx), silicon dioxide (SiO2), neodymium fluoride (NdFs), lanthanum fluoride (LaFs), samarium fluoride (SmFs), Barium fluoride (BaF2), calcium fluoride (CaF2), lithium fluoride (LiF), low-refractive index organic monomers and/or low-refractive index organic polymers or at least one high-refractive index dielectric material with a refractive index greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (I112O3), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as for example iron(II,III) oxide (Fe3O4) and iron(III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), praseodymium oxide (PreOn), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (SisN4), silicon monoxide (SiO), selenium trioxide (Se2O3), Tin oxide (SnCh), tungsten trioxide (WO3), high-index organic monomers and / or high-index organic polymers or is made from at least one of these materials.
11. Sicherheitselement nach einem der Ansprüche 8 bis 10, dadurch gekennzeichnet, dass die als Dünnschichtelement ausgebildete optische Effektschicht (4) weiters noch zumindest eine Reflexionsschicht (8) und/oder eine zweite Absorberschicht umfasst, wobei die zumindest eine Distanzschicht (7) zwischen der zumindest einen ersten Absorberschicht (6) und der zumindest einen Reflexionsschicht (8) und/oder der zumindest einen zweiten Absorberschicht angeordnet ist. 11. Security element according to one of claims 8 to 10, characterized in that the optical effect layer (4) designed as a thin-film element further comprises at least one reflection layer (8) and / or a second absorber layer, the at least one spacer layer (7) between the at least one first absorber layer (6) and the at least one reflection layer (8) and / or the at least one second absorber layer is arranged.
12. Sicherheitselement nach Anspruch 11, dadurch gekennzeichnet, dass die zumindest eine Reflexionsschicht (8) zumindest ein metallisches Material, insbesondere ausgewählt aus der Gruppe Silber, Kupfer, Aluminium, Gold, Platin, Niob, Zinn, oder aus Nickel, Titan, Vanadium, Chrom, Kobalt und Palladium oder Legierungen dieser Materialien, insbesondere Kobalt-Nickel-Legierungen oder zumindest ein hochbrechendes dielektrisches Material mit einem Brechungsindex von größer als 1,65, insbesondere ausgewählt aus der Gruppe Zinksulfid (ZnS), Zinkoxid (ZnO), Titandioxid (TiO2), Kohlenstoff (C), Indiumoxid (ImOs), Indium- Zinn-Oxid (ITO), Tantalpentoxid (Ta2Os), Ceroxid (CeO2), Yttriumoxid (Y2O3), Europiumoxid (EU2O3), Eisenoxide wie zum Beispiel Eisen(II,III)oxid (Fe3O4) und Eisen(III)oxid (Fe2O3), Hafniumnitrid (HfN), Hafniumcarbid (HfC), Hafniumoxid (HfO2), Lanthanoxid (La2O3), Magnesiumoxid (MgO), Neodymoxid (Nd2O3), Praseodymoxid (PreOn), Samariumoxid (Sm2O3), Antimontrioxid (Sb2O3), Siliziumcarbid (SiC), Siliziumnitrid (SisN4), Siliziummonoxid (SiO), Selentrioxid (Se2O3), Zinnoxid (SnO2), Wolframtrioxid (WO3), hochbrechende organische Monomere und/oder hochbrechende organische Polymere umfasst oder aus zumindest einem dieser Materialien hergestellt ist. 12. Security element according to claim 11, characterized in that the at least one reflection layer (8) comprises at least one metallic material, in particular selected from the group of silver, copper, aluminum, gold, platinum, niobium, tin, or nickel, titanium, vanadium, Chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys or at least a high-index dielectric material with a refractive index of greater than 1.65, in particular selected from the group zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2 ), carbon (C), indium oxide (ImOs), indium tin oxide (ITO), tantalum pentoxide (Ta2Os), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (EU2O3), iron oxides such as iron (II,III )oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), praseodymium oxide (PreOn), Samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (SisN4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), high-index organic monomers and / or high-index organic polymers or is made from at least one of these materials.
13. Sicherheitselement nach Anspruch 10 oder 11, dadurch gekennzeichnet, dass die zumindest eine Reflexions schicht (8) oder zumindest eine der Absorber schichten direkt auf die als Haftvermittler dienende Schicht (5) aus Metall aufgebracht ist, insbesondere aufgedruckt und/oder aufgedampft ist.
13. Security element according to claim 10 or 11, characterized in that the at least one reflection layer (8) or at least one of the absorber layers is applied directly to the metal layer (5) serving as an adhesion promoter, in particular printed and / or vapor deposited.
14. Sicherheitselement nach einem der Ansprüche 1 bis 13, dadurch gekennzeichnet, dass es eine Trägerschicht (9) aus einem Kunststoff umfasst, wobei insbesondere der Kunststoff aus einem lichtdurchlässigen und/oder thermoplastischen Kunststoff gebildet ist, und dass die Trägerschicht bevorzugt zumindest eines der Materialien aus der Gruppe Polyimid (PI), Polypropylen (PP), monoaxial orientiertem Polypropylen (MOPP), biaxial orientierten Polypropylen (BOPP), Polyethylen (PE), Polyphenylensulfid (PPS), Polyetheretherketon, (PEEK) Polyetherketon (PEK), Polyethylenimid (PEI), Polysulfon (PSU), Polyaryletherketon (PAEK), Polyethylennaphthalat (PEN), flüssigkristalline Polymere (LCP), Polyester, Polyb- utylenterephthalat (PBT), Polyethylenterephthalat (PET), Polyamid (PA), Polycarbonat (PC), Cycloolefincopolymere (COC), Polyoximethylen (POM), Acrylnitrilbutadienstyrol (ABS), Polyvinylcholrid (PVC) Ethylentetrafluorethylen (ETFE), Polytetrafluorethylen (PTFE), Po- lyvinylfluorid (PVF), Polyvinylidenfluorid (PVDF), Ethylen-Tetrafluorethylen-Hexafluorpro- pylen-Fluorterpolymer (EFEP), Cellulose- oder Lignin-basierte Kunststoffe, Polyhydroxyal- kanoate (PHA), thermo-plastische Stärke (TPS), Polymilchsäure (PLA), Polycaprolacton (PCL), Polybutylensuccinat (PBS), und Polybutylenadipat-terephthalat (PBAT) und/oder zumindest einen recycelten und/oder biologisch und/oder marin abbaubare Kunststoff und/oder Mischungen und/oder Co-Polymere dieser Materialien umfasst oder aus zumindest einem dieser Materialien hergestellt ist.
14. Security element according to one of claims 1 to 13, characterized in that it comprises a carrier layer (9) made of a plastic, in particular the plastic being formed from a translucent and / or thermoplastic, and that the carrier layer preferably comprises at least one of the materials from the group polyimide (PI), polypropylene (PP), monoaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone, (PEEK) polyetherketone (PEK), polyethyleneimide (PEI ), polysulfone (PSU), polyaryl ether ketone (PAEK), polyethylene naphthalate (PEN), liquid crystalline polymers (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymers (COC ), polyoxymethylene (POM), acrylonitrile butadiene styrene (ABS), polyvinyl cholride (PVC) ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF), ethylene tetrafluoroethylene hexafluoropropylene fluoroterpolymer (EFEP) , cellulose or lignin-based plastics, polyhydroxyalkanoates (PHA), thermoplastic starch (TPS), polylactic acid (PLA), polycaprolactone (PCL), polybutylene succinate (PBS), and polybutylene adipate terephthalate (PBAT) and / or at least comprises a recycled and/or biologically and/or marine degradable plastic and/or mixtures and/or co-polymers of these materials or is made from at least one of these materials.
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DE102017106545A1 (en) * | 2017-03-27 | 2018-09-27 | Ovd Kinegram Ag | A method for producing an optical security feature and a security element and a security document |
EP3643511A1 (en) * | 2018-10-15 | 2020-04-29 | Giesecke+Devrient Currency Technology GmbH | Security element and data carrier provided with the security element |
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DE102006012732A1 (en) * | 2006-03-17 | 2007-09-20 | Giesecke & Devrient Gmbh | grid image |
DE102015010744A1 (en) * | 2015-08-17 | 2017-02-23 | Giesecke & Devrient Gmbh | Security element, method for producing the same and equipped with the security element disk |
-
2022
- 2022-07-15 EP EP22185201.5A patent/EP4306329A1/en active Pending
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DE102017106545A1 (en) * | 2017-03-27 | 2018-09-27 | Ovd Kinegram Ag | A method for producing an optical security feature and a security element and a security document |
EP3643511A1 (en) * | 2018-10-15 | 2020-04-29 | Giesecke+Devrient Currency Technology GmbH | Security element and data carrier provided with the security element |
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