WO2022151628A1 - Oled显示面板 - Google Patents

Oled显示面板 Download PDF

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Publication number
WO2022151628A1
WO2022151628A1 PCT/CN2021/095692 CN2021095692W WO2022151628A1 WO 2022151628 A1 WO2022151628 A1 WO 2022151628A1 CN 2021095692 W CN2021095692 W CN 2021095692W WO 2022151628 A1 WO2022151628 A1 WO 2022151628A1
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WO
WIPO (PCT)
Prior art keywords
light
layer
emitting
area
substrate
Prior art date
Application number
PCT/CN2021/095692
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English (en)
French (fr)
Inventor
陈黎暄
Original Assignee
深圳市华星光电半导体显示技术有限公司
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Application filed by 深圳市华星光电半导体显示技术有限公司 filed Critical 深圳市华星光电半导体显示技术有限公司
Priority to US17/419,719 priority Critical patent/US20230157139A1/en
Publication of WO2022151628A1 publication Critical patent/WO2022151628A1/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K50/865—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. light-blocking layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/38—Devices specially adapted for multicolour light emission comprising colour filters or colour changing media [CCM]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/8791—Arrangements for improving contrast, e.g. preventing reflection of ambient light
    • H10K59/8792—Arrangements for improving contrast, e.g. preventing reflection of ambient light comprising light absorbing layers, e.g. black layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30—Devices specially adapted for multicolour light emission
    • H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Definitions

  • the present application relates to the field of display technology, and in particular, to an OLED display panel.
  • OLED displays have a wide range of advantages, such as high color gamut, good viewing angles, and fast response times. However, OLED displays also have some drawbacks of their own. For example, OLED displays have lower brightness and less stability than other displays.
  • OLED displays based on the inkjet printing process
  • many improvement methods have been proposed. For example, optical microstructures (eg, microlens arrays, gratings, etc.) are added to the exit surface, or a refractive index matching layer is added between the light exit interfaces. These methods have certain effects, but the feasibility of mass production is not high.
  • a scheme of adding scattering particles to the thin-film encapsulation layer is proposed.
  • This scheme has its own advantages, such as simple manufacturing process, no need for patterning, and controllable particles.
  • the tetrafluoroethylene layer is a functional layer that acts as a thin film encapsulation to isolate water and oxygen.
  • the scattering particles are incorporated, if the dispersion is uneven or other reasons, it may lead to partial penetration of the TFE layer, affecting the packaging. Effect.
  • the circular polarizer needs to be attached to the surface, thereby greatly reducing the reflectivity of ambient light, but the circular polarizer will reduce the efficiency of the outgoing light by more than 50%, which is an impact A key element of the brightness of OLED display devices.
  • the thickness of the circular polarizer itself is often more than 100 microns, and it is attached to the outside of the OLED display device, which is not conducive to the curling, flexibility, folding and other functions of the OLED display device.
  • RGB color filters combined with thin anti-reflection AR films to remove polarizing films.
  • the color filter cannot completely filter out the reflected light from the anode, resulting in a reflectivity of about 10%, which will be poor in places with slightly strong ambient light. Visual effects.
  • FIG. 1 is a schematic structural diagram of an OLED display panel in the prior art.
  • the light transmittance of the color filter layer 100 is generally high, when the color filter layer 100 is used to reduce reflected light, the effect that can be achieved depends on the light absorption degree of the color filter layer 100 .
  • the purpose of the embodiments of the present application is to provide an OLED display panel.
  • a light-absorbing material layer in the light-emitting direction of the organic light-emitting layer to filter out the reflected light of the anode metal layer of the organic light-emitting layer, it is possible to avoid strong ambient light. where poor visual effects appear, which can improve the user experience.
  • Embodiments of the present application provide an OLED display panel, which includes:
  • organic light-emitting layer the organic light-emitting layer is disposed on the substrate, and the organic light-emitting layer is provided with a plurality of organic light-emitting monomers;
  • the color filter layer is disposed in the light-emitting direction of the organic light-emitting layer
  • a light-absorbing material layer, the light-absorbing material layer is disposed in the light-emitting direction of the light-emitting layer.
  • the organic light-emitting layer includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is composed of the A plurality of organic light-emitting monomers are formed; the light-emitting layer emits light toward the side away from the substrate; wherein,
  • the color filter layer is disposed on the side of the cathode metal layer away from the substrate, and the light absorbing material layer is disposed on the side of the color filter layer away from the substrate.
  • the organic light-emitting layer includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is composed of the A plurality of organic light-emitting monomers are formed; the light-emitting layer emits light toward the side close to the substrate; wherein,
  • the color filter layer is disposed on the side of the anode metal layer close to the substrate, and the light absorbing material layer is disposed on the side of the color filter layer close to the substrate.
  • the light-absorbing material layer includes a pixel area opposite to the plurality of organic light-emitting monomers
  • the thickness of the light absorbing material layer in the pixel region is 50 nanometers to 2000 nanometers.
  • the light-absorbing material layer includes a pixel area opposite to the plurality of organic light-emitting monomers
  • the absorption rate of the light absorbing material layer for light with a wavelength of 380 nanometers to 700 nanometers in the pixel region is less than 95%.
  • the light-absorbing material layer includes a pixel area opposite to the plurality of organic light-emitting monomers; the light-absorbing material layer further includes a pixel region opposite to the plurality of organic light-emitting monomers. The non-pixel area relative to the spacer area;
  • the absorbance of the non-pixel area is greater than the absorbance of the pixel area.
  • the light-absorbing material layer includes a pixel area opposite to the plurality of organic light-emitting monomers; the light-absorbing material layer further includes a pixel region opposite to the plurality of organic light-emitting monomers. a non-pixel area opposite to the spaced area; the substrate includes a first substrate area and a second substrate area;
  • the color filter layer includes a first color filter area and a second color filter area
  • the first color filter area is opposite to the second substrate area
  • the second color filter area is opposite to the first substrate area
  • the pixel area and the non-pixel area are opposite to the first substrate area .
  • the light absorbing material layer further includes a first area, and the first area is opposite to the first color filter area.
  • the light absorption rate of the light absorbing material layer in the first region is greater than or equal to the light absorption rate in the non-pixel region.
  • the thickness of the light absorbing material layer in the non-pixel region is greater than the thickness in the pixel region.
  • the non-pixel area protrudes from the pixel area to form a plurality of pixel holes, each One of the organic light-emitting monomers is disposed in one of the pixel holes.
  • the non-pixel region is coated with a light-shielding material layer.
  • Embodiments of the present application also provide an OLED display panel, which includes:
  • organic light-emitting layer the organic light-emitting layer is disposed on the substrate, and the organic light-emitting layer is provided with a plurality of organic light-emitting monomers;
  • the color filter layer is disposed in the light-emitting direction of the organic light-emitting layer
  • the light-absorbing material layer is disposed in the light-emitting direction of the organic light-emitting layer
  • the light absorbing material layer includes a pixel area opposite to the plurality of organic light emitting monomers
  • the thickness of the light-absorbing material layer in the pixel region is 50 nanometers to 2000 nanometers;
  • the absorption rate of the light absorbing material layer for light with a wavelength of 380 nanometers to 700 nanometers in the pixel region is less than 95%.
  • the organic light-emitting layer includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is composed of the A plurality of organic light-emitting monomers are formed; the light-emitting layer emits light toward the side away from the substrate; wherein,
  • the color filter layer is disposed on the side of the cathode metal layer away from the substrate, and the light absorbing material layer is disposed on the side of the color filter layer away from the substrate.
  • the organic light-emitting layer includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is composed of the A plurality of organic light-emitting monomers are formed; the light-emitting layer emits light toward the side close to the substrate; wherein,
  • the color filter layer is disposed on the side of the anode metal layer close to the substrate, and the light absorbing material layer is disposed on the side of the color filter layer close to the substrate.
  • the light absorbing material layer further includes a non-pixel region opposite to the spacing regions of the plurality of organic light emitting monomers
  • the absorbance of the non-pixel area is greater than the absorbance of the pixel area.
  • the light absorbing material layer further includes a non-pixel region opposite to the spaced regions of the plurality of organic light emitting monomers;
  • the substrate includes a first substrate region and a second substrate area;
  • the color filter layer includes a first color filter area and a second color filter area
  • the first color filter area is opposite to the second substrate area
  • the second color filter area is opposite to the first substrate area
  • the pixel area and the non-pixel area are opposite to the first substrate area .
  • the light absorbing material layer further includes a first area, and the first area is opposite to the first color filter area.
  • the light absorption rate of the light absorbing material layer in the first region is greater than or equal to the light absorption rate in the non-pixel region.
  • the thickness of the light absorbing material layer in the non-pixel region is greater than the thickness in the pixel region.
  • the OLED display panel and the OLED display device provided by the embodiments of the present application can filter out the reflected light of the anode metal layer of the organic light-emitting layer by arranging the light-absorbing material layer in the light-emitting direction of the organic light-emitting layer, which can avoid the environmental impact. Poorer visual effects appear where the light is stronger, which can improve the user experience.
  • FIG. 1 is a schematic structural diagram of an OLED display panel in the prior art.
  • FIG. 2 is a spectrum diagram of transmitted light of a color filter layer in the prior art.
  • FIG. 3 is a schematic diagram of a first structure of an OLED display panel in an embodiment of the present application.
  • FIG. 4 is a schematic diagram of a second structure of the OLED display panel in the embodiment of the present application.
  • FIG. 5 is a schematic diagram of a third structure of the OLED display panel in the embodiment of the present application.
  • FIG. 6 is a schematic diagram of a fourth structure of the OLED display panel in the embodiment of the present application.
  • FIG. 7 is a schematic diagram of a fifth structure of the OLED display panel in the embodiment of the present application.
  • the application provides an OLED display panel, comprising: a substrate; an organic light-emitting layer, the organic light-emitting layer is disposed on the substrate, the organic light-emitting layer is provided with a plurality of organic light-emitting monomers; a color filter layer, the The color filter layer is arranged in the light-emitting direction of the organic light-emitting layer; the light-absorbing material layer is arranged in the light-emitting direction of the organic light-emitting layer.
  • a light-absorbing material layer is arranged in the light-emitting direction of the organic light-emitting layer, so as to filter out the reflected light of the anode metal layer of the organic light-emitting layer, so that poor visual effects can be avoided in places with strong ambient light, so that the Improve user experience.
  • the luminous brightness of the OLED display panel will be The increase is more than 60%, and there is enough brightness space to use a light-absorbing material that absorbs in the visible light band.
  • FIG. 3 is a schematic diagram of a first structure of an OLED display panel in an embodiment of the present application.
  • the OLED display panel includes: a substrate 10 , an organic light-emitting layer 20 , a light-absorbing material layer 30 and a color filter layer 40 .
  • the OLED display panel in the embodiment of the present application is an OLED display panel of a bottom light-emitting type. That is, the OLED display panel of the embodiment of the present application emits light toward the side close to the substrate 10 .
  • the organic light-emitting layer 20 is disposed on the substrate 10 ; the color filter layer 40 is disposed in the light-emitting direction of the organic light-emitting layer 20 ; the light-absorbing material layer 30 is disposed in the light-emitting direction of the organic light-emitting layer 20 .
  • the substrate 10 , the light absorbing material layer 30 , the color filter layer 40 , and the organic light-emitting layer 20 are stacked in sequence.
  • the substrate 10 includes a substrate body and a TFT array layer disposed on the substrate body.
  • the substrate body may be a transparent glass substrate or a transparent PV material substrate.
  • the organic light-emitting layer 20 has the same structure as the organic light-emitting layer in the prior art, including an anode metal layer, an electron injection layer, an electron transport layer, a light-emitting layer, a hole transport layer, a hole injection layer and a cathode metal layer. It belongs to the prior art and needs no further description.
  • the color filter layer 40 may be a quantum dot color filter layer. In some embodiments, the color filter layer 40 may also be a conventional color filter layer.
  • FIG. 4 is a schematic diagram of a second structure of the OLED display panel in the embodiment of the present application.
  • the substrate 10 includes a first substrate area 11 and a second substrate area 12 .
  • the light absorbing material layer 30 includes a pixel area 31 , a non-pixel area 32 and a first area.
  • the color filter layer 40 includes a first color filter area 41 and a second color filter area 42 .
  • the light-emitting layer includes a plurality of organic light-emitting monomers distributed in an array and spaced apart.
  • the plurality of organic light-emitting monomers include blue organic light-emitting monomers 20a, green organic light-emitting monomers 20b, and red organic light-emitting monomers 20c.
  • the organic light-emitting layer 20 includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is formed by a plurality of organic light-emitting monomers; the light-emitting layer faces the side away from the substrate Lighting; wherein, the color filter layer is arranged on the side of the cathode metal layer away from the substrate, and the light absorbing material layer is arranged on the side of the color filter layer away from the substrate.
  • the plurality of pixel regions 31 are disposed opposite to the plurality of organic light-emitting monomers.
  • the non-pixel region 32 is disposed opposite to the spacing regions of the plurality of organic light-emitting monomers.
  • the first color filter area 41 is disposed opposite to the second substrate area 12 of the substrate 10 and the first area 33 of the light absorbing material layer 30 . That is, it is arranged opposite to the TFT array layer, and is used for shielding the thin film transistors and metal wirings of the TFT array layer.
  • the second color filter area 42 is disposed opposite to the first substrate area of the substrate.
  • the pixel area 31 and the non-pixel area 32 are disposed opposite to the first substrate area of the substrate.
  • the thickness of the light absorbing material layer 30 in the pixel region 31 is 50 nanometers to 2000 nanometers.
  • the absorption rate of the light absorbing material layer for light with a wavelength of 380 nanometers to 700 nanometers in the pixel area is less than 95%.
  • the light absorption rate of the light absorbing material layer 30 in the pixel area is lower than that in the non-pixel area, so that the reflected light from the metal traces in the spaced area can be better absorbed.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area.
  • the non-pixel region 32 is coated with a light-shielding material layer.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area, and the non-pixel area 32 is coated with a light-shielding material layer.
  • FIG. 5 is a schematic diagram of a third structure of an OLED display panel in an embodiment of the present application.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area 32 .
  • the non-pixel area 32 protrudes from the pixel area 31 to form a plurality of pixel holes, each pixel hole An organic light-emitting monomer is arranged in the middle.
  • the organic light-emitting monomers of the organic light-emitting layer include blue organic light-emitting monomers 20a, green organic light-emitting monomers 20b, and red organic light-emitting monomers 20c.
  • the pixel area is thinned by a photolithography process to obtain a plurality of pixel holes, so that no black matrix is required, which can reduce the process flow, improve the efficiency, and reduce the cost.
  • the non-pixel region 32 can also be coated with a light-shielding material layer to improve the light absorption rate of the non-pixel region.
  • the OLED display panel provided by the embodiment of the present application adopts a light-absorbing material layer in the light-emitting direction of the organic light-emitting layer to filter out the reflected light of the anode metal layer of the organic light-emitting layer, so as to avoid the situation where the ambient light is strong. Where poor visuals appear, the user experience can be improved.
  • FIG. 6 is a schematic diagram of a fourth structure of the OLED display panel in the embodiment of the present application.
  • the OLED display panel includes: a substrate 10 , an organic light-emitting layer 20 , a light-absorbing material layer 30 and a color filter layer 40 .
  • the OLED display panel in this embodiment is a top-emitting OLED display panel. That is, the OLED display panel of the embodiment of the present application emits light toward the side away from the substrate 10 .
  • the organic light-emitting layer is disposed on the substrate; the color filter layer is disposed in the light-emitting direction of the organic light-emitting layer; and the light-absorbing material layer is disposed in the light-emitting direction of the organic light-emitting layer.
  • the substrate 10 , the organic light-emitting layer 20 , the color filter layer 40 , and the light-absorbing material layer 30 are stacked in sequence.
  • the substrate 10 includes a substrate body and a TFT array layer disposed on the substrate body.
  • the substrate body may be a transparent glass substrate or a transparent PV material substrate.
  • the organic light-emitting layer 20 has the same structure as the organic light-emitting layer in the prior art, including an anode metal layer, an electron injection layer, an electron transport layer, a light-emitting layer, a hole transport layer, a hole injection layer and a cathode metal layer. It belongs to the prior art and needs no further description.
  • the color filter layer 40 may be a quantum dot color filter layer. In some embodiments, the color filter layer 40 may also be a conventional color filter layer.
  • FIG. 7 is a schematic diagram of a fifth structure of the OLED display panel in the embodiment of the present application.
  • the substrate 10 includes a first substrate area 11 and a second substrate area 12 .
  • the light absorbing material layer 30 includes a pixel area 31 , a non-pixel area 32 and a first area.
  • the color filter layer 40 includes a first color filter area 41 and a second color filter area 42 .
  • the light-emitting layer includes a plurality of organic light-emitting monomers distributed in an array and spaced apart.
  • the plurality of organic light-emitting monomers include blue organic light-emitting monomers 20a, green organic light-emitting monomers 20b, and red organic light-emitting monomers 20c.
  • the organic light-emitting layer 20 includes a cathode metal layer, an anode metal layer, and a light-emitting layer located between the cathode metal layer and the anode metal layer; the light-emitting layer is formed by a plurality of organic light-emitting monomers; the light-emitting layer faces the side away from the substrate Lighting; wherein, the color filter layer is arranged on the side of the cathode metal layer away from the substrate, and the light absorbing material layer is arranged on the side of the color filter layer away from the substrate.
  • the plurality of pixel regions 31 are disposed opposite to the plurality of organic light-emitting monomers.
  • the non-pixel region 32 is disposed opposite to the spaced regions of the plurality of organic light-emitting monomers.
  • the first color filter region 41 is disposed opposite to the second substrate region 12 of the substrate 10 and the first region 33 of the light absorbing material layer 30 . That is, it is arranged opposite to the TFT array layer, and is used for shielding the thin film transistors and metal wirings of the TFT array layer.
  • the second color filter area 42 is disposed opposite to the first substrate area of the substrate.
  • the pixel area 31 and the non-pixel area 32 are disposed opposite to the first substrate area of the substrate.
  • the thickness of the light absorbing material layer 30 in the pixel region 31 is 50 nanometers to 2000 nanometers.
  • the absorption rate of the light absorbing material layer for light with a wavelength of 380 nanometers to 700 nanometers in the pixel area is less than 95%.
  • the light absorption rate of the light absorbing material layer 30 in the pixel area is lower than that in the non-pixel area, so that the reflected light from the metal traces in the spaced area can be better absorbed.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area.
  • the non-pixel region 32 is coated with a light-shielding material layer.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area, and the non-pixel area 32 is coated with a light-shielding material layer.
  • the thickness of the pixel area 31 is smaller than the thickness of the non-pixel area 32 .
  • the non-pixel area 32 protrudes from the pixel area 31 to form a plurality of pixel holes, each pixel hole An organic light-emitting monomer is arranged in the middle.
  • the organic light-emitting monomers of the organic light-emitting layer include blue organic light-emitting monomers 20a, green organic light-emitting monomers 20b, and red organic light-emitting monomers 20c.
  • the pixel area is thinned by a photolithography process to obtain a plurality of pixel holes, so that no black matrix is required, which can reduce the process flow, improve the efficiency, and reduce the cost.
  • the non-pixel region 32 can also be coated with a light-shielding material layer to improve the light absorption rate of the non-pixel region.
  • the OLED display panel provided by the embodiment of the present application adopts a light-absorbing material layer in the light-emitting direction of the organic light-emitting layer to filter out the reflected light of the anode metal layer of the organic light-emitting layer, so as to avoid the situation where the ambient light is strong. Where poor visuals appear, the user experience can be improved.

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Abstract

本申请提供了一种OLED显示面板。其中，该OLED显示面板，包括：基板；有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；吸光材料层，所述吸光材料层设置于所述发光层的出光方向上。

Description

OLED显示面板 技术领域
本申请涉及显示技术领域，特别涉及一种OLED显示面板。
 背景技术
OLED显示器具有广泛的优点，例如，色域高、视角好、响应时间快等。但是，OLED显示器也具有自身的一些缺陷。例如，OLED显示器的亮度较低、稳定性相比其他显示器较差。
另一方面，对于基于喷墨打印工艺的OLED显示器来说，存在视角色偏的风险。这是由于OLED显示器的红色/绿色/蓝色子像素有机发光单体存在微腔效应。而为了改善OLED的视角和亮度，提出了很多改进方法。例如在出射面增加光学微结构(例如，微透镜阵列、光栅等)，或在光出射界面之间增加折射率匹配层等。这些方法有一定效果，但量产可行性不高。
在一种技术中提出了一种在薄膜封装层中加入散射粒子的方案，这一方案有其特有的优势，例如：制程简便、不需要图案化、粒子可控等。但是也存在问题，四氟乙烯层是起薄膜封装隔绝水氧作用的功能层，当散射粒子掺入后，若因为分散不均匀或其他原因，有可能导致TFE层的局部出现上下贯通，影响封装效果。另一方面，由于OLED显示器因为自身较强的反射问题，需要在表面贴合圆偏光片，从而大幅降低环境光反射率，但是圆偏光片会导致出射光的效率降低50%以上，这是影响OLED显示器件的亮度的一大关键要素。同时，圆偏光片自身的厚度往往在100微米以上，贴合在OLED显示器件外侧，会不利于该OLED显示器件的卷曲、柔性、折叠等功能。
为了改善上述问题，业内已经开始采用RGB彩膜结合薄型抗反射AR膜的方案，从而移除偏光膜。但是，由于OLED显示器的阳极具有极强的反射率，彩膜无法完全滤除阳极的反射光线，导致反射率维持在10%左右，这样的反射率在环境光稍微强烈的地方都会有较差的视觉效果。
请参阅图1，图1是现有技术中的OLED显示面板的结构示意图。如图1所示，由于其中的彩膜层100的光透过率一般较高，利用彩膜层100降低反射光时，能达到的效果依赖于彩膜层100的光吸收程度。进一步的，请参阅图2，是现有技术中的彩膜层的透过光的光谱图。如图2所示，彩膜层100在绿色光、蓝色光以及红色光波段峰值的透过率都在80%以上，这样反射光往返的透过可以简单计算为T=0.8*0.8*阳极反射率，依然很大。
因此，现有技术存在缺陷，急需改进。
 技术问题
本申请实施例的目的在于提供一种OLED显示面板，通过采用在有机发光层的出光方向上设置吸光材料层从而滤除该有机发光层的阳极金属层的反射光，可以避免在环境光较强的地方出现较差的视觉效果，从而可以提高用户体验。
 技术解决方案
本申请实施例提供了一种OLED显示面板，其包括：
基板；
有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；
彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；
吸光材料层，所述吸光材料层设置于所述发光层的出光方向上。
在本申请实施例所述的OLED显示面板中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向远离所述基板的一面发光；其中，
所述彩膜层设置于所述阴极金属层远离所述基板的一面上，所述吸光材料层设置于所述彩膜层远离所述基板的一面上。
在本申请实施例所述的OLED显示面板中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向靠近所述基板的一面发光；其中，
所述彩膜层设置于所述阳极金属层靠近所述基板的一面上，所述吸光材料层设置于所述彩膜层靠近所述基板的一面上。
在本申请实施例所述的OLED显示面板中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
所述吸光材料层在所述像素区域的厚度为50纳米至2000纳米。
在本申请实施例所述的OLED显示面板中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
所述吸光材料层在所述像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。
在本申请实施例所述的OLED显示面板中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；
所述非像素区域的吸光率大于所述像素区域的吸光率。
在本申请实施例所述的OLED显示面板中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；所述基板包括第一基板区域以及第二基板区域；
所述彩膜层包括第一彩膜区域以及第二彩膜区域；
所述第一彩膜区域与所述第二基板区域相对，所述第二彩膜区域与所述第一基板区域相对，所述像素区域以及所述非像素区域与所述第一基板区域相对。
在本申请实施例所述的OLED显示面板中，所述吸光材料层还包括第一区域，所述第一区域与所述第一彩膜区域相对。
在本申请实施例所述的OLED显示面板中，所述吸光材料层在所述第一区域的吸光率大于或等于在所述非像素区域的吸光率。
在本申请实施例所述的OLED显示面板中，所述吸光材料层在所述非像素区域的厚度大于在所述像素区域的厚度。
在本申请实施例所述的OLED显示面板中，在所述吸光材料层的背向所述出光方向的一面上，所述非像素区域凸出于所述像素区域以形成多个像素孔，每一所述像素孔中设置一所述有机发光单体。
在本申请实施例所述的OLED显示面板中，所述非像素区域涂布有遮光材料层。
本申请实施例还提供了一种OLED显示面板，其包括：
基板；
有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；
彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；
吸光材料层，所述吸光材料层设置于所述有机发光层的出光方向上；
所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
所述吸光材料层在所述像素区域的厚度为50纳米至2000纳米；
所述吸光材料层在所述像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。
在本申请实施例所述的OLED显示面板中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向远离所述基板的一面发光；其中，
所述彩膜层设置于所述阴极金属层远离所述基板的一面上，所述吸光材料层设置于所述彩膜层远离所述基板的一面上。
在本申请实施例所述的OLED显示面板中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向靠近所述基板的一面发光；其中，
所述彩膜层设置于所述阳极金属层靠近所述基板的一面上，所述吸光材料层设置于所述彩膜层靠近所述基板的一面上。
在本申请实施例所述的OLED显示面板中，所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；
所述非像素区域的吸光率大于所述像素区域的吸光率。
在本申请实施例所述的OLED显示面板中，所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；所述基板包括第一基板区域以及第二基板区域；
所述彩膜层包括第一彩膜区域以及第二彩膜区域；
所述第一彩膜区域与所述第二基板区域相对，所述第二彩膜区域与所述第一基板区域相对，所述像素区域以及所述非像素区域与所述第一基板区域相对。
在本申请实施例所述的OLED显示面板中，所述吸光材料层还包括第一区域，所述第一区域与所述第一彩膜区域相对。
在本申请实施例所述的OLED显示面板中，所述吸光材料层在所述第一区域的吸光率大于或等于在所述非像素区域的吸光率。
在本申请实施例所述的OLED显示面板中，所述吸光材料层在所述非像素区域的厚度大于在所述像素区域的厚度。
 有益效果
由上可知，本申请实施例提供的OLED显示面板及OLED显示装置通过采用在有机发光层的出光方向上设置吸光材料层从而滤除该有机发光层的阳极金属层的反射光，可以避免在环境光较强的地方出现较差的视觉效果，从而可以提高用户体验。
 附图说明
为了更清楚地说明本申请实施例的技术方案，下面将对本申请实施例中所需要使用的附图作简单地介绍，应当理解，以下附图仅示出了本申请的某些实施例，因此不应被看作是对范围的限定，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他相关的附图。
图1是现有技术中的OLED显示面板的结构示意图。
图2是现有技术中的彩膜层的透过光的光谱图。
图3是本申请实施例中的OLED显示面板的第一种结构示意图。
图4是本申请实施例中的OLED显示面板的第二种结构示意图。
图5是本申请实施例中的OLED显示面板的第三种结构示意图。
图6是本申请实施例中的OLED显示面板的第四种结构示意图。
图7是本申请实施例中的OLED显示面板的第五种结构示意图。
 本发明的实施方式
下面将结合本申请实施例中的附图，对本申请实施例中的技术方案进行清楚、完整地描述。
本申请提供了一种OLED显示面板，包括：基板；有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；吸光材料层，所述吸光材料层设置于所述有机发光层的出光方向上。本申请通过采用在有机发光层的出光方向上设置吸光材料层，从而滤除该有机发光层的阳极金属层的反射光，可以避免在环境光较强的地方出现较差的视觉效果，从而可以提高用户体验。
结合图1、图2所示的说明，采用一种吸光材料层来涂布于彩膜层上，实现进一步的对反射光的吸收处理是可行的。由于彩膜层100自身对有机发光层200以及有机发光层300发出的绿色光、蓝色光以及红色光的优异的透过性能，移除偏光膜并加入彩膜后，OLED显示面板的发光亮度将提升60%以上，此时有足够的亮度空间来采用一种在可见光波段均有吸收的吸光材料。
请参照图3，图3是本申请实施例中的OLED显示面板的第一种结构示意图。如图3所示，该OLED显示面板，包括：基板10、有机发光层20、吸光材料层30以及彩膜层40。
其中，本申请实施例中的OLED显示面板为底层发光式的OLED显示面板。也即，本申请实施例的OLED显示面板朝靠近基板10的一侧出光。具体的，有机发光层20设置于基板10上；彩膜层40设置于有机发光层20的出光方向上；吸光材料层30设置于有机发光层20的出光方向上。在本申请实施例中，基板10、吸光材料层30、彩膜层40、有机发光层20依次层叠设置。
具体的，该基板10包括一个基板本体以及设置于该基板本体上的TFT阵列层。其中，该基板本体可以为透明玻璃基板或者透明的PV材料基板。该有机发光层20与现有技术中的有机发光层的结构相同，均包括阳极金属层、电子注入层、电子传输层、发光层、空穴传输层、空穴注入层以及阴极金属层，其属于现有技术无需过多描述。该彩膜层40可以为量子点彩膜层。在一些实施例中，该彩膜层40也可以为常规的彩膜层。
在一些实施例中，请参照图4，图4是本申请实施例中的OLED显示面板的第二种结构示意图。如图4所示，该基板10包括第一基板区域11以及第二基板区域12。吸光材料层30包括像素区域31、非像素区域32以及第一区域。彩膜层40包括第一彩膜区域41以及第二彩膜区域42。
其中，该发光层包括多个呈阵列间隔分布的有机发光单体。该多个有机发光单体包括蓝色有机发光单体20a、绿色有机发光单体20b以及红色有机发光单体20c。
需要说明的是，有机发光层20包括阴极金属层、阳极金属层以及位于阴极金属层和阳极金属层之间的发光层；发光层由多个有机发光单体形成；发光层朝向远离基板的一面发光；其中，彩膜层设置于阴极金属层远离基板的一面上，吸光材料层设置于彩膜层远离所述基板的一面上。
其中，该多个像素区域31与该多个有机发光单体相对设置。该非像素区域32与该多个有机发光单体的间隔区域相对设置。该第一彩膜区域41与该基板10的第二基板区域12以及该吸光材料层30的第一区域33相对设置。也即是与TFT阵列层相对设置，用于对该TFT阵列层的薄膜晶体管以及金属走线进行遮挡。第二彩膜区域42与该基板的第一基板区域相对设置。该像素区域31以及该非像素区域32与该基板的第一基板区域相对设置。
具体的，吸光材料层30在像素区域31的厚度为50纳米至2000纳米。吸光材料层在像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。并且，该吸光材料层30在像素区域的吸光率小于在该非像素区域的吸光率，从而能够更好地吸收该间隔区域内的金属走线的反射光线。
当然，实现吸光材料层在像素区域31的吸光率小于在该非像素区域的吸光率的方法多种多样。在一些实施例中，该像素区域31的厚度小于该非像素区域的厚度。在一些实施例中，在该非像素区域32涂布有遮光材料层。或者在一些实施例中，该像素区域31的厚度小于该非像素区域的厚度，且在该非像素区域32涂布有遮光材料层。
在一些实施例中，请参照图5，图5是本申请实施例中的OLED显示面板的第三种结构示意图。如图5所示，该像素区域31的厚度小于该非像素区域32的厚度。具体为，在该吸光材料层30的背向出光方向的一面上，也即是远离该基板10的一面上，非像素区域32凸出于像素区域31以形成多个像素孔，每一像素孔中设置一有机发光单体。其中，该有机发光层的多个有机发光单体包括蓝色有机发光单体20a、绿色有机发光单体20b以及红色有机发光单体20c。具体在制备过程中，通过光刻工艺对像素区域进行减薄处理以得到多个像素孔，从而无需设置黑矩阵，可以减少工艺流程，提高效率，降低成本。
当然，可以理解地，在一些实施例中，还可以在该非像素区域32涂布有遮光材料层的方式来提高该非像素区域的吸光率。
由上可知，本申请实施例提供的OLED显示面板通过采用在有机发光层的出光方向上设置吸光材料层从而滤除该有机发光层的阳极金属层的反射光，可以避免在环境光较强的地方出现较差的视觉效果，从而可以提高用户体验。
请参照图6，图6是本申请实施例中的OLED显示面板的第四种结构示意图。该OLED显示面板，包括：基板10、有机发光层20、吸光材料层30以及彩膜层40。
其中，该实施例中的OLED显示面板为顶层发光式的OLED显示面板。也即，本申请实施例的OLED显示面板朝远离基板10的一侧出光。具体的，有机发光层设置于基板上；彩膜层设置于有机发光层的出光方向上；吸光材料层设置于有机发光层的出光方向上。在本申请实施例中，基板10、有机发光层20、彩膜层40、吸光材料层30依次层叠设置。
具体的，该基板10包括一个基板本体以及设置于该基板本体上的TFT阵列层。其中，该基板本体可以为透明玻璃基板或者透明的PV材料基板。该有机发光层20与现有技术中的有机发光层的结构相同，均包括阳极金属层、电子注入层、电子传输层、发光层、空穴传输层、空穴注入层以及阴极金属层，其属于现有技术无需过多描述。该彩膜层40可以为量子点彩膜层。在一些实施例中，该彩膜层40也可以为常规的彩膜层。
在一些实施例中，请参照图7，图7是本申请实施例中的OLED显示面板的第五种结构示意图。如图7所示，该基板10包括第一基板区域11以及第二基板区域12。吸光材料层30包括像素区域31、非像素区域32以及第一区域。彩膜层40包括第一彩膜区域41以及第二彩膜区域42。
其中，该发光层包括多个呈阵列间隔分布的有机发光单体。该多个有机发光单体包括蓝色有机发光单体20a、绿色有机发光单体20b以及红色有机发光单体20c。
需要说明的是，有机发光层20包括阴极金属层、阳极金属层以及位于阴极金属层和阳极金属层之间的发光层；发光层由多个有机发光单体形成；发光层朝向远离基板的一面发光；其中，彩膜层设置于阴极金属层远离基板的一面上，吸光材料层设置于彩膜层远离所述基板的一面上。
其中，该多个像素区域31与该多个有机发光单体相对设置。该非像素区域32与该多个有机发光单体的间隔区域相对设置。该第一彩膜区域41与该基板10的第二基板区域12以及该吸光材料层30的第一区域33相对设置。也即是与TFT阵列层相对设置，用于对该TFT阵列层的薄膜晶体管以及金属走线进行遮挡。第二彩膜区域42与该基板的第一基板区域相对设置。该像素区域31以及该非像素区域32与该基板的第一基板区域相对设置。
具体的，吸光材料层30在像素区域31的厚度为50纳米至2000纳米。吸光材料层在像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。并且，该吸光材料层30在像素区域的吸光率小于在该非像素区域的吸光率，从而能够更好地吸收该间隔区域内的金属走线的反射光线。
当然，实现吸光材料层在像素区域31的吸光率小于在该非像素区域的吸光率的方法多种多样。在一些实施例中，该像素区域31的厚度小于该非像素区域的厚度。在一些实施例中，在该非像素区域32涂布有遮光材料层。或者在一些实施例中，该像素区域31的厚度小于该非像素区域的厚度，且在该非像素区域32涂布有遮光材料层。
进一步的，该像素区域31的厚度小于该非像素区域32的厚度。具体为，在该吸光材料层30的背向出光方向的一面上，也即是远离该基板10的一面上，非像素区域32凸出于像素区域31以形成多个像素孔，每一像素孔中设置一有机发光单体。其中，该有机发光层的多个有机发光单体包括蓝色有机发光单体20a、绿色有机发光单体20b以及红色有机发光单体20c。具体在制备过程中，通过光刻工艺对像素区域进行减薄处理以得到多个像素孔，从而无需设置黑矩阵，可以减少工艺流程，提高效率，降低成本。
当然，可以理解地，在一些实施例中，还可以在该非像素区域32涂布有遮光材料层的方式来提高该非像素区域的吸光率。
由上可知，本申请实施例提供的OLED显示面板通过采用在有机发光层的出光方向上设置吸光材料层从而滤除该有机发光层的阳极金属层的反射光，可以避免在环境光较强的地方出现较差的视觉效果，从而可以提高用户体验。
以上所述仅为本申请的实施例而已，并不用于限制本申请的保护范围，对于本领域的技术人员来说，本申请可以有各种更改和变化。凡在本申请的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本申请的保护范围之内。

Claims (20)

  1. 一种OLED显示面板，其包括：
    基板；
    有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；
    彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；
    吸光材料层，所述吸光材料层设置于所述有机发光层的出光方向上。
  2. 根据权利要求1所述的OLED显示面板，其中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向远离所述基板的一面发光；其中，
    所述彩膜层设置于所述阴极金属层远离所述基板的一面上，所述吸光材料层设置于所述彩膜层远离所述基板的一面上。
  3. 根据权利要求1所述的OLED显示面板，其中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向靠近所述基板的一面发光；其中，
    所述彩膜层设置于所述阳极金属层靠近所述基板的一面上，所述吸光材料层设置于所述彩膜层靠近所述基板的一面上。
  4. 根据权利要求1所述的OLED显示面板，其中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
    所述吸光材料层在所述像素区域的厚度为50纳米至2000纳米。
  5. 根据权利要求1所述的OLED显示面板，其中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
    所述吸光材料层在所述像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。
  6. 根据权利要求1所述的OLED显示面板，其中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；
    所述非像素区域的吸光率大于所述像素区域的吸光率。
  7. 根据权利要求1所述的OLED显示面板，其中，所述吸光材料层包括与所述多个有机发光单体相对的像素区域；所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；所述基板包括第一基板区域以及第二基板区域；
    所述彩膜层包括第一彩膜区域以及第二彩膜区域；
    所述第一彩膜区域与所述第二基板区域相对，所述第二彩膜区域与所述第一基板区域相对，所述像素区域以及所述非像素区域与所述第一基板区域相对。
  8. 根据权利要求7所述的OLED显示面板，其中，所述吸光材料层还包括第一区域，所述第一区域与所述第一彩膜区域相对。
  9. 根据权利要求8所述的OLED显示面板，其中，所述吸光材料层在所述第一区域的吸光率大于或等于在所述非像素区域的吸光率。
  10. 根据权利要求7所述的OLED显示面板，其中，所述吸光材料层在所述非像素区域的厚度大于在所述像素区域的厚度。
  11. 根据权利要求7所述的OLED显示面板，其中，在所述吸光材料层的背向所述出光方向的一面上，所述非像素区域凸出于所述像素区域以形成多个像素孔，每一所述像素孔中设置一所述有机发光单体。
  12. 根据权利要求7所述的OLED显示面板，其中，所述非像素区域涂布有遮光材料层。
  13. 一种OLED显示面板，其包括：
    基板；
    有机发光层，所述有机发光层设置于所述基板上，所述有机发光层设有多个有机发光单体；
    彩膜层，所述彩膜层设置于所述有机发光层的出光方向上；
    吸光材料层，所述吸光材料层设置于所述有机发光层的出光方向上；
    所述吸光材料层包括与所述多个有机发光单体相对的像素区域；
    所述吸光材料层在所述像素区域的厚度为50纳米至2000纳米；
    所述吸光材料层在所述像素区域对于波长为380纳米至700纳米的光线的吸收率小于95%。
  14. 根据权利要求13所述的OLED显示面板，其中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向远离所述基板的一面发光；其中，
    所述彩膜层设置于所述阴极金属层远离所述基板的一面上，所述吸光材料层设置于所述彩膜层远离所述基板的一面上。
  15. 根据权利要求13所述的OLED显示面板，其中，所述有机发光层包括阴极金属层、阳极金属层以及位于所述阴极金属层和阳极金属层之间的发光层；所述发光层由所述多个有机发光单体形成；所述发光层朝向靠近所述基板的一面发光；其中，
    所述彩膜层设置于所述阳极金属层靠近所述基板的一面上，所述吸光材料层设置于所述彩膜层靠近所述基板的一面上。
  16. 根据权利要求13所述的OLED显示面板，其中，所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；
    所述非像素区域的吸光率大于所述像素区域的吸光率。
  17. 根据权利要求13所述的OLED显示面板，其中，所述吸光材料层还包括与所述多个有机发光单体的间隔区域相对的非像素区域；所述基板包括第一基板区域以及第二基板区域；
    所述彩膜层包括第一彩膜区域以及第二彩膜区域；
    所述第一彩膜区域与所述第二基板区域相对，所述第二彩膜区域与所述第一基板区域相对，所述像素区域以及所述非像素区域与所述第一基板区域相对。
  18. 根据权利要求17所述的OLED显示面板，其中，所述吸光材料层还包括第一区域，所述第一区域与所述第一彩膜区域相对。
  19. 根据权利要求18所述的OLED显示面板，其中，所述吸光材料层在所述第一区域的吸光率大于或等于在所述非像素区域的吸光率。
  20. 根据权利要求17所述的OLED显示面板，其中，所述吸光材料层在所述非像素区域的厚度大于在所述像素区域的厚度。
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