WO2022135909A1 - Vorrichtung zur strahlbeeinflussung eines laserstrahls - Google Patents
Vorrichtung zur strahlbeeinflussung eines laserstrahls Download PDFInfo
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- WO2022135909A1 WO2022135909A1 PCT/EP2021/084568 EP2021084568W WO2022135909A1 WO 2022135909 A1 WO2022135909 A1 WO 2022135909A1 EP 2021084568 W EP2021084568 W EP 2021084568W WO 2022135909 A1 WO2022135909 A1 WO 2022135909A1
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- deflector
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- laser beam
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- transformation
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0652—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multifocusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0808—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more diffracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/106—Scanning systems having diffraction gratings as scanning elements, e.g. holographic scanners
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1828—Diffraction gratings having means for producing variable diffraction
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/29—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the position or the direction of light beams, i.e. deflection
- G02F1/295—Analog deflection from or in an optical waveguide structure]
- G02F1/2955—Analog deflection from or in an optical waveguide structure] by controlled diffraction or phased-array beam steering
Definitions
- the present invention relates to a device for influencing the beam of a laser beam, in particular for use with an ultra-short pulse laser with higher average powers.
- Ultrashort-pulse lasers can be used to process materials, in which case the laser energy introduced into the material to be processed brings about the desired material processing.
- the laser beam and the material are moved relative to each other with a feed along a feed trajectory, with the ultrashort pulse laser emitting laser pulses which are then introduced into the material at different points of the feed trajectory.
- the pulse frequency of the laser pulses is often fixed or can only be changed to a limited extent, so that when the movement speed varies, such as a sudden change of direction in connection with inertial movement systems, the spatial distance of the laser pulses along the feed trajectory in the material varies.
- a device for influencing a laser beam of an ultrashort pulse laser comprising a pulse-precise deflector unit which is set up to deflect the laser beam in at least one direction perpendicular to the beam propagation direction, with a transformation optics arrangement having at least two components, those of the pulse-precise deflector unit downstream, which is set up to transform a spatial deflection and/or angular deflection of the laser beam by the pulse-accurate deflector unit with a spatial-to-angle and/or an angle-to-spatial transformation into an angular deflection and/or a spatial deflection and / or to transform back, and processing optics, which is arranged downstream of the transformation optics arrangement and is set up to guide the laser beam into the image-side focal plane of the processing optics.
- the ultra-short pulse laser provides ultra-short laser pulses.
- ultra-short can mean that the pulse length is between 500 picoseconds and 10 femtoseconds, for example, and in particular between 10 picoseconds and 100 femtoseconds.
- the laser can also provide bursts of ultra-short laser pulses, each burst comprising the emission of several laser pulses at a time interval of less than 100 ns within a period of less than 10 microseconds.
- a time-shaped pulse that has a significant change in amplitude, for example of more than 50%, within a range between 50 and 5000 femtoseconds is also considered to be an ultra-short laser pulse.
- the ultra-short laser pulses move in the beam propagation direction along the laser beam formed by them.
- a pulse-accurate deflector unit is set up to deflect the laser beam in at least one direction perpendicular to the beam propagation direction.
- a beam deflection can consist in influencing the direction of propagation of the laser beam, in which case the incident laser beam in particular can be shifted parallel to its original direction of propagation, ie a spatial parallel offset can be imposed on the laser beam.
- beam deflection can also consist in impressing an angular offset on the laser beam, so that the direction of propagation of the laser beam changes by an angle due to the influencing of the beam.
- a pulse-precise deflector unit here comprises one or more pulse-precise deflectors.
- a deflector is pulse-accurate if it is possible to individually deflect each laser pulse of the ultrashort pulse laser.
- the working frequency of the pulse-precise deflector can be synchronized with a basic frequency of the laser, for example, so that the working frequency of the pulse-precise deflector corresponds at least to the repetition frequency of the ultrashort pulse laser.
- the following text only speaks of deflectors, always meaning a pulse-precise deflector or a pulse-precise deflector unit.
- a deflector can be, for example, a microelectronic mechanical element or an electro-optical deflector or an acousto-optical deflector. The functionality of an acousto-optical deflector is described below.
- an acoustic wave is generated in an optically adjacent material, for example via an alternating voltage on a piezoelectric crystal, which acoustic wave periodically modulates the refractive index of the optical material.
- the wave can propagate through the optical material, for example as a propagating wave or as wave packets, or be in the form of a standing wave.
- a diffraction grating for an incident laser beam is realized here by the periodic modulation of the refractive index.
- the diffraction pattern that results for the laser beam corresponds to the transformed lattice function, for example and preferably the Fourier-transformed lattice function.
- An incident laser beam is thus diffracted at the diffraction grating and thereby at least partially deflected at an angle ⁇ to its original beam propagation direction.
- the angular offset causes the laser beam to be deflected in a direction perpendicular to the original direction of propagation of the laser beam.
- the grating constant of the diffraction grating and thus the angle a depend, among other things, on the wavelength or the periodicity of the standing grating oscillation or on the frequency of the AC voltage applied. For example, a large angular displacement for the first diffraction order is achieved by an acoustic wave with a small wavelength.
- a transformation optics arrangement is an optical structure of a component system which comprises at least two components.
- a component can in particular be an optical component with imaging properties, such as, for example, with a focusing or collimating effect.
- imaging properties such as, for example, with a focusing or collimating effect.
- imaging or curved mirrors beam-shaping elements, diffractive optical elements, lenses such as for example converging lenses or diffusing lenses, Fresnel zone plates and other free-form components.
- the laser beam When passing through the deflector unit, the laser beam is subjected to a spatial and/or angular deflection in the front deflector plane.
- the front deflector plane can lie inside or outside the outer mechanical configuration of the deflector. Accordingly, the front deflector plane does not necessarily coincide with the mechanical end of the deflector unit.
- the first component of the transformation optics arrangement can be arranged at a first distance from the front deflector plane.
- the front deflector plane can be in the object-side focal point of the first component or between the object-side focal point and the first component itself.
- the first component produces a transformation of the spatial and/or angular deflection of the front deflector plane into an angular and/or spatial deflection in the first transformation plane.
- a local deflection is transformed into an angular deflection, or an angular deflection is transformed into a local deflection.
- part of the laser beam for example a particularly divergent part of the laser beam, can be separated and, for example, as shown below, filtered out of the beam path.
- the second component can be arranged at a second distance from the first component, with the second component generating an inverse transformation or an extensive inverse transformation, in particular an inverse transformation from the first filtered transformation plane into the so-called corresponding deflector plane.
- the corresponding deflector plane is at a third distance from the last element of the transformation optics arrangement.
- the corresponding deflector plane may be located between the last element and the image-side focal plane of the element, or in the image-side focal plane itself. Since the second component generates an inverse transformation of the filtered transformation plane, a cleaned laser beam is created in the corresponding deflector plane, which, for example, no longer contains any diverging beam parts.
- the transformation plane is also referred to herein as a Fourier plane.
- the transformation optics arrangement is arranged downstream of the deflector unit or is provided separately from it. This can achieve that the laser beam deflected in the deflector unit can be subjected to downstream beam shaping. This is particularly important because the deflector unit usually has only a small acceptance of position deviations and beam shape deviations and in particular angular deviations at its entrance in order to provide precise beam influencing and in particular beam deflection. Since the beam shaping is performed downstream by the transformation optics arrangement, a stable input can be provided for the deflector unit and thus a simple and stably reproducible behavior of the deflector unit can be achieved.
- Processing optics are provided downstream of the transformation optics arrangement, which are set up to guide the deflected and transformed laser beam into the image-side focal plane of the processing optics.
- the processing optics produce a final angle-to-space transformation.
- all beam-deflecting elements i.e. the influence of the deflector unit, are transferred to the processing level according to their desired effect.
- the processing optics can in particular also be the second component of the transformation optics arrangement.
- the processing optics can preferably form a telescope with a preferably reducing effect with the final component of the transformation optics arrangement.
- the corresponding planes described above are generally defined as the planes linked by an angular to spatial transformation and a subsequent inverse spatial to angular transformation (also referred to as inverse transformation), for example by a transformation optics arrangement.
- a transformation optics arrangement the front deflector plane in front of the first component can be linked to the corresponding deflector plane behind the second plane by this relationship. This therefore corresponds to a mapping of the front deflector plane into the corresponding deflector plane.
- the planes described above are flat surfaces which are oriented perpendicularly to the direction of beam propagation and, in particular, are not curved and only extend two-dimensionally.
- the optical components lead to slight curvatures and distortions of these surfaces, so that these surfaces are usually at least locally curved.
- the focal point also has a finite volume due to the components used. The components used can also result in a curved focal volume instead of a flat, two-dimensional focal plane, in which an image of the laser beam is still sufficiently sharp, as specified below.
- a positioning tolerance can be up to 20%, so that a component that is to be at a first distance from a reference point of, for example, 10 cm still enables a sufficiently sharp image even at 9 cm and 11 cm.
- the images are automatically sufficiently “sharp” if the components are all positioned within the positioning tolerance.
- a "coincidence" of two planes or two points means that the associated volumes at least partially overlap.
- two components can also directly follow one another in largely collimated beam areas.
- the term "focus” can also be understood in general as a targeted increase in intensity, with the laser energy converging in a "focus area”.
- the term “focus” is therefore used in the following regardless of the beam shape actually used and the methods for bringing about an intensity increase.
- the location of the increase in intensity along the direction of beam propagation can also be influenced by "focusing".
- the increase in intensity can be more or less punctiform and the focal area can have a Gaussian intensity cross section, as is provided by a Gaussian laser beam.
- the increase in intensity can also be in the form of a line, with a Bessel-shaped focus area being produced around the focus position, as can be provided by a non-diffracting beam.
- other more complex beam shapes are also possible, the focus position of which extends in three dimensions, such as a multi-spot profile of Gaussian laser beams and/or non-Gaussian intensity distributions.
- first corresponding plane of a first transformation optics arrangement can be the starting plane for a further transformation with a further transformation optics arrangement.
- second corresponding level which corresponds to the first level, is then linked by a corresponding transformation.
- several transformation optics arrangements can also be lined up in a row.
- a number of corresponding planes can thus also be generated by lining up or cascading transformation optics arrangements.
- a corresponding plane can also lie in front of a corresponding component, for example a transformation optics arrangement or a deflector unit. These planes are called back planes.
- the beam shaping can then take place, for example, before or after the deflector unit.
- the deflector unit can then be used to deflect or hide or add the various partial laser beams, while the beam shaping or the shaping of the beam profile is achieved in the downstream Fourier optics arrangement with the beam-shaping element.
- the deflector unit can include a first deflector, with the laser beam being coupled into the input of the first deflector and the first deflector being set up to deflect the laser beam in a first direction perpendicular to the beam propagation direction and thereby preferably impose a first angular offset on it
- the deflector unit can additionally comprise a second deflector, wherein the laser beam, after passing through the first deflector, is coupled into the input of the second deflector with the imposed first angular offset and the second deflector is set up to deflect the laser beam in a second direction perpendicular to the direction of beam propagation , which is preferably perpendicular to the first direction, and thereby preferably impose a second angular offset in addition to the first angular offset.
- two deflectors for example, deflections or parallel displacements of the laser beam in the x and y directions, i.e. in the x/y plane, can be generated.
- the first deflector to split the incident laser beam into a large number of partial laser beams.
- the multiplicity of partial laser beams then impinge on the second deflector, in which each of the multiplicity of incoming partial laser beams is split up again, for example perpendicular to the first splitting direction.
- a matrix-shaped or rectangular multi-spot geometry of the resulting partial laser beams can be generated.
- the incident laser beam can be split by the first deflector into five partial laser beams, which have a first angular difference from one another along the x-direction.
- the five partial laser beams can then be split by the second deflector into ten partial laser beams, for example, with the splitting of each partial laser beam taking place at an angle to the y-direction.
- the partial laser beams can thus have a second angular difference from one another in the y direction, for example.
- fifty partial laser beams can be generated during the passage through the deflector unit, the partial laser beams being arranged on a grid according to an angle-to-space transformation.
- the deflectors of the deflector unit can be acousto-optical deflectors, with at least one acousto-optical deflector comprising a phased array transducer and preferably having a diffraction efficiency of over 75% over a wide output range, preferably of at least 0.05°.
- a phased array transducer is a device with which an acoustic wave that is introduced into the optical material and is adapted as a function of the deflection angle or the control frequency can be achieved, so that a homogeneous diffraction grating is formed in a large proportion of the volume of the optical material and so that a particularly efficient diffraction grating can be provided.
- the acoustic wave can also be adjusted as a function of the applied frequency, which means that the Bragg angle can be very precisely approximated at a wide variety of deflection angles.
- a high diffraction efficiency of, for example, over 70% can be achieved over a wide deflection range of, for example, 15 mrad (approximately 0.8°).
- the diffraction efficiency of an acousto-optic deflector can be given, for example, by the fraction of the intensity in the first diffraction order compared to the incident laser intensity be. In particular, it can be achieved that a high level of laser energy is available for machining processes via the partial laser beams.
- the focus diameter of the laser beam is the diameter of the laser beam in the processing plane.
- the acousto-optic deflector can exhibit the above diffraction efficiency over a range of about fifteen focal diameters. Accordingly, by means of two combined acousto-optical deflectors in a range of approximately 15 ⁇ 15 focus diameters, a large number of partial laser beams can be provided with high intensity.
- the laser beam can couple into a polarization rotating device that is set up to rotate the polarization of the laser beam.
- the polarization direction of the laser beam can be rotated in a preferred direction by the polarization rotating device. For example, this allows the laser beam to be prepared for subsequent shaping or filtering.
- the polarization rotation device can be designed, for example, as a lambda/2 plate.
- the deflector unit can comprise a filter element, the filter element being arranged between the first and the second deflector and the filter element preferably being set up to filter out the zeroth diffraction order of the first deflector, and/or the filter element being arranged after the second deflector and the filter element is preferably set up to filter out parts of the beam, for example a zeroth diffraction order of the deflector unit after the second deflector, and/or wherein the deflector unit has a further transformation optics arrangement with two components, which is set up for spatial deflection and/or To transform angular deflection of the laser beam with a position-to-angle and/or an angle-to-position transformation into an angular deflection and/or a position deflection and/or to transform it back, wherein the filter element is arranged in a transformation plane of the transformation optics arrangement and the filter element is preferably set up to filter out the zeroth diffraction order.
- an imaging from the first deflector into the second deflector must be ensured, with the filtering taking place in the angle-to-space transform of the first deflector.
- the incident laser beam is diffracted in the deflector by the diffraction grating formed there. This also results in a zeroth order of diffraction, which runs through the deflector without deflection.
- the zeroth order of diffraction runs behind the deflector like the incident laser beam, or with a parallel offset.
- Around the zero diffraction order are the higher and possibly also the negative diffraction orders, for example the first diffraction order or the second diffraction order.
- the first diffraction order has the angular offset a to the zeroth diffraction order.
- a filter element can now be arranged in the deflector unit, for example between the first and the second deflector, in order to filter out the zeroth diffraction order.
- the higher orders of diffraction ie the orders of diffraction from the first order of diffraction, are directed into the second deflector. Accordingly, only the deflected rays - ie the higher orders of diffraction - can finally leave the deflector unit.
- a filter element can also be arranged behind the second deflector, with the zeroth order of diffraction of the partial laser beams and the zeroth order of diffraction of the original laser beam being filtered out in each case.
- filtering can filter out or at least weaken these uncontrollable partial laser beams.
- a further transformation optics arrangement with two components can also be provided in the deflector unit, which are arranged behind the second deflector, for example, in which case the filter element can then be arranged in a transformation plane of the transformation optics arrangement and can preferably be set up to filter out the zeroth diffraction order.
- This further transformation optics arrangement is independent of the transformation optics arrangement of the device and is only assigned to the deflector unit.
- the image behind the second deflector is split according to its spatial frequencies, or linked by an angle-to-space transformation (such as a Fourier transformation).
- an angle-to-space transformation such as a Fourier transformation.
- the partial laser beams of the higher diffraction order can be fanned out according to a grid, while the zero diffraction orders break with this periodicity.
- the zeroth diffraction orders are assigned to a different location in the transformation plane than the diffraction orders that are, for example, on a grid.
- the zeroth diffraction orders can be filtered out by a filter element in the transformation plane.
- a filter element can also be a graduated filter, for example, so that the different spatial frequency components are attenuated to different degrees, for example in the transformation plane. This weighting of the different spatial frequency components makes it possible to influence the beam shape in the processing plane.
- a filter element can also be designed to be reflective and direct the transmitted or reflected portion into a beam trap.
- a filter element can also be a polarization element, which preferably imposes a locally variable polarization change on the laser beam. This encodes the aperture function in a local polarization.
- the various components can then be filtered out of the laser beam using a polarization splitter. For example, local s-polarization then corresponds to complete transmission and local p-polarization to vanishing transmission.
- the gradient functions can also be generated by means of intermediate states, for example by proportionate p and s polarization, with which a local 50 percent transmission at the polarization splitter is achieved, for example.
- the laser beam then leaves the deflector unit in a precise shape and high-quality beam shaping can be achieved in the subsequent transformation optics arrangement.
- the transformation optics arrangement can be a Fourier optics arrangement, with the front deflector plane of the deflector unit being arranged in the object-side focal plane of the first component, the image-side focal plane of the first component coinciding with the object-side focal plane of the second component, and the front deflector plane of the deflector unit is imaged in the image-side focal plane of the second component, and the laser beam can be deflected in the image-side focal plane of the second component in accordance with the deflection by the deflector unit.
- a Fourier optics arrangement is an optical structure of a component system in which the distances between the components, the distances between the components and the object to be imaged and the distances between the components and the image plane in which the object is imaged are have a special relationship.
- the Fourier optics arrangement can comprise at least two components, with the components preferably having the same focal length. However, the components can also have different focal lengths if, for example, an enlarging or reducing effect is to be achieved with the component arrangement.
- the Fourier optics arrangement essentially performs an angle-to-space transformation and then a space-to-angle transformation again.
- the positioning of the components relative to the deflector as described above results in so-called 4f optics, which makes it possible to use the front deflector plane and thus the laser beam deflected by the deflector unit, in particular possible spatial and angular deviations of the laser beam as well as the Beam profile and beam geometry to be converted into a corresponding deflector level.
- the laser beam is deflected in the corresponding deflector plane according to the deflection by the acousto-optical deflector unit.
- a beam-shaping element can preferably be arranged in a corresponding deflector plane or in a transformation plane or in a corresponding transformation plane, with the beam-shaping element being set up to give the laser beam a predetermined intensity distribution and/or phase distribution and/or or to impose polarization distribution.
- a beam-shaping element is understood to mean a device which is set up to influence an incident laser beam in two spatial dimensions in one or more properties, it being set up in particular to produce a lateral phase distribution, a polarization distribution, an intensity or amplitude distribution and/or or a propagation direction of the laser beam.
- the propagation direction can also be influenced, preferably indirectly, by influencing the phase distribution in particular.
- the beam shaping or beam-shaping unit is arranged in front of the deflector unit, it is advantageous if the input angle distribution that the beam-shaping unit makes available to the deflector unit is as small as possible, so that an angle-dependent diffraction efficiency of the deflector is negligible or can be compensated for is.
- the entrance aperture of the deflector unit which can be 2mm to 20mm, for example, should not represent a limitation of the beam shape.
- a non-diffracting beam for example a Bessel-Gauss beam, can be generated in front of the deflector unit, the intensity distribution of which in the far field is, for example, a ring-shaped intensity distribution that is guided through the deflector unit. The non-diffracting beams then arise around the downstream transformation levels and can be quickly repositioned with the deflector unit.
- beam-shaping units in front of the deflector unit are particularly suitable for influencing the beam profile.
- a flat-top beam profile can be prepared from a Gaussian laser beam, with the modified beam then being deflected in the deflector unit.
- the deflector unit or also downstream beam shaping can be used for splitting into partial laser beams and/or shaping. Each partial laser beam can then have a flat-top beam profile, for example.
- Beam shapes with high accuracy requirements can benefit from additional shaping or filtering of the corresponding transformation level.
- certain spatial frequencies can be attenuated by a corresponding filter element in the corresponding transformation level, so that the contrast in the processing level increases, for example.
- the angle dependency of the deflection can also be compensated in this way.
- the beam-shaping element can be designed, for example, as a diffractive optical element (DOE), a free-form surface or an axicon or a microaxicon, or contain a combination of several of these components or functionalities.
- DOE diffractive optical element
- a diffractive optical element is set up to influence the incident laser beam in one or more properties in two spatial dimensions.
- a diffractive optical element is a fixed component that can be used to produce exactly one beam shape from the incident laser beam.
- a diffractive optical element is typically a specially shaped diffraction grating, with the laser beam adopting the desired beam shape as a result of the diffraction.
- a beam splitting unit is provided, preferably a diffractive beam splitting unit in a corresponding deflector plane or in a Is arranged transformation plane or in a corresponding transformation plane and is adapted to adjust the angular displacement of the acousto-optical deflector unit.
- the laser beam can only be deflected particularly effectively over a certain angular range.
- a beam deflection unit preferably a galvano scanner, can preferably be arranged in a corresponding acousto-optical deflector plane or in a transformation plane or in a corresponding transformation plane and set up to deflect the laser beam.
- a beam deflection unit can be set up to deflect the laser beam from its beam direction.
- a beam deflection is given by a parallel offset or an angular offset of the transmitted laser beam to the original laser beam. This makes it possible to reposition the laser beam.
- a galvanic scanner is a component in this context, whereby the laser beam can be positioned with high accuracy and repeatability using a rotatable mirror.
- a one-dimensional galvano scanner deflects the laser beam in only one direction
- a two-dimensional galvano scanner deflects the laser beam in two different directions, which are preferably orthogonal to one another.
- a scanner preferably a piezo scanner, is set up to move the beam-shaping element and/or the beam splitting unit and/or the beam deflection unit perpendicular to the direction of beam propagation, with the beam deflection of the acousto-optical deflector unit and the movement of the scanner being synchronously adapted to one another are.
- this can be advantageous if a continuous, scanning movement of the laser beam is to take place in the processing plane.
- the points of impact of the laser beam in the processing plane can be manipulated by deflection with the acousto-optical deflector unit, while the beam shape of the introduced laser beam in the processing plane is always the same with the tracking of the beam-shaping element.
- a piezo shifter is an electronic component that changes its thickness when a DC voltage is applied. It is thus possible by applying a voltage to move a filter element fastened to this for this purpose.
- a beam correction element preferably an aperture, can be arranged in a corresponding processing plane.
- An aperture or a mask are components that block certain parts of the beam and thus influence the amplitude distribution of the laser beam.
- a diaphragm in particular an iris diaphragm, can block beam components that are distant from the beam center, while a mask can have a more complex shape in order to be able to filter out more specific beam components.
- a rasterized beam-shaping element can be arranged in a corresponding processing plane, with each raster element preferably being an individual beam-shaping partial element.
- a rasterized beam-shaping element has in particular a spatial division, for example a two-dimensional division. Each element of this spatial division is also called a grid element.
- the rastered beam-shaping element can be, for example, a gradient filter and have a checkerboard-shaped gradient, or it can be a spatial light modulator.
- a spatial light modulator can be a nanogrid or a hybrid element, for example, which can impress a defined phase distribution on the laser beam due to their inherent structure or design.
- a light modulator can also be a spatial light modulator whose cells or pixels influence the laser beam through adjustable birefringent properties.
- Rasterized beam-shaping elements are particularly advantageous if the beam properties of the laser beam change as a result of the selection of the raster element through which the laser beam is to be transmitted.
- one raster element may correspond to a Gaussian beam profile while another raster element corresponds to a flat-top beam profile.
- a tool change in laser machining processes is possible to a certain extent by means of a rastered beam-shaping element.
- raster elements it is also possible to cover a larger scanning area with high spatial resolution on the workpiece.
- the limited deflection range of the deflector e.g. 15mrad
- the combination with a short focal length processing optics thus leads to a reduced effect of the raster element or the beam shape generated by the raster element on the workpiece.
- a large area on the raster element can thus be addressed, and the local structure can be greatly reduced or implemented on the workpiece with large angular proportions.
- Non-diffracting beam can be generated in this way from a diffracting beam or Gaussian beam.
- Non-diffracting rays are rays commonly known as Bessel rays, or the practical realization thereof.
- non-diffracting beams have a particularly large focal position tolerance, since the beam profile in the direction of propagation is clearly elongated compared to the lateral extension in the plane perpendicular to the direction of propagation.
- the image is deliberately generated in a way that deviates from the mathematically ideal Fourier optics arrangement.
- the element such as a microaxicon array
- the object-side focal plane of the following optic can be deliberately shifted. As a result, this is not in the segmented element, but in the intermediate focus generated by the segmented element.
- the following optics transfer this intermediate focus to the processing level. In this case, the positional deviation of the optics following the segmented element can also be more than the aforementioned 20%.
- a control device can be provided to control the deflector unit, which is set up to effect the deflection of the incident laser beam in such a way that each pulse of the laser beam hits a different raster element of the rastered beam-shaping element or the laser beam is directed to a specific raster element or the laser beam sweeps over a plurality of raster elements or a plurality of partial laser beams are guided to a plurality of raster elements in a targeted manner.
- the control device can provide control signals for the deflector unit.
- the grating constant of the optical grating of the acousto-optical deflector can be defined by the period or the frequency of the control signal of the control device, so that the grating constant of the optical grating determines the diffraction angle of the laser beam.
- the control signal can be changed by the control device, so that the way and the extent of the influencing of the beam can be controlled by the control device.
- the strength of the formation of the diffraction grating in the optical material of the acousto-optical deflector can be adjusted via the amplitude.
- a fast beam deflection can be realized, whereby the laser beam can be freely positioned in the working field of the deflector unit at a rate of up to 1 MHz or 10 MHz or 100 MHz.
- a corresponding control device is therefore typically based on an FPGA (Field Programmable Gate Array) with rapidly connected memories, with processing parameters such as beam geometry, beam profile and beam deflection being able to be stored for a specific machining operation or process.
- FPGA Field Programmable Gate Array
- control signal can be composed of several periodic, electronic signals of different frequencies. Due to the different frequency components of the signal, the optical grating generated by the acousto-optical deflector unit also has different or superimposed grating constants. The different lattice constants accordingly lead to a large number of possible diffraction orders.
- the incident laser beam is thereby split into a plurality of partial laser beams, with the angular offset of the partial laser beams ultimately being given by the frequency components of the control signal.
- a multi-spot geometry can thus be generated with the deflector unit.
- the control signal for the deflector unit can also be an arbitrary signal, in which case an arbitrary signal can be composed of a large number of signals and/or the frequency can be varied over time.
- an arbitrary signal can be composed of a large number of signals and/or the frequency can be varied over time.
- complex diffraction gratings are produced, which in particular can also influence the beam profile of the laser beam or the partial laser beams.
- the diffraction image corresponds, for example, to the Fourier transform of the grating function
- image errors that occur or are to be expected due to the previous or further passage of the laser beam through optical components, such as astigmatism and aberrations, can be largely compensated for by appropriately selected diffraction gratings.
- Arbitrary signals also make it possible to influence the beam deflection continuously or abruptly, so that a continuous process of the deflected laser beam or an abrupt but precise positioning of the laser beam is made possible.
- a Arbitrary signal with increasing frequency i.e. shorter wavelength of the acoustic wave in the deflector unit, cause an increased deflection of the laser beam.
- a sudden change in the excitation frequency can lead to a jump or a repositioning of the laser beam.
- a multi-spot geometry can thus also be generated, with the partial laser beams of the multi-spot geometry being directed at specific mask positions.
- processing optics are provided downstream of the transformation optics arrangement, which are set up to guide the laser beam through the beam-shaping element and/or the beam splitting unit and/or the beam deflection unit into the image-side focal plane of the processing optics, with the processing optics preferably together with the final Element of the transformation optics arrangement has a reducing effect, is particularly preferably designed with a large numerical aperture and short focal length and / or is designed as a transmissive or reflective optics.
- the numerical aperture NA describes the ability of an optical element to focus light.
- the numerical aperture results from the opening angle of the lens and the refractive index of the material between the lens and the focal point.
- a maximum numerical aperture is reached when the opening angle is 90° between the marginal ray and the optical axis.
- the maximum resolution or the minimum structure size that can be imaged through the lens is then directly proportional to the wavelength of the laser light divided by the numerical aperture.
- a high NA lens is a lens that has a large numerical aperture, i.e. a large opening angle.
- microstructures can be introduced into the material with high resolution using a high-NA lens.
- the numerical aperture can be greater than 0.1, in particular greater than 0.2.
- the lens is not a high-NA lens.
- both long focal length and short focal length optics can be used.
- An optical system is referred to as transmissive optics, in which the light is influenced as it passes through an optical medium.
- a lens is a transmissive optic.
- the optics can also be designed as reflective optics. Reflective optics affect beam propagation without the light having to propagate through an optical medium. The influencing is realized in particular by a mirror system.
- a telescope mirror is a reflective optic.
- a Schwarzschild lens is also a reflective lens.
- the processing optics form a final angle-to-space transformation, with the processing plane corresponding to a transformation plane.
- all beam-shaping, beam-dividing or beam-deflecting elements are transferred to the processing level according to their desired effect.
- a feed device is preferably provided which is set up to receive a material to be processed, to arrange it in the image-side focal plane of the processing optics and to move the material relative to the laser beam, as a result of which the laser beam is guided over the material.
- the feed device can, for example, have a fastening device on which the material can be fixed.
- a fixation can be accomplished, for example, by gluing or clamping.
- a fixation can also work via a negative pressure using a suction device.
- the feed device can be movable in at least two spatial axes.
- the feed device includes a further translation axis, in particular in the case of curved or tilted workpiece surfaces, further rotation or tilting elements are used to position the laser beam relative to the workpiece.
- the feed device can therefore also be an XY table or an XYZ table.
- a feed device can be moved or shifted in an automated or motorized manner with a feed.
- the feed here is a movement with a feed rate, the feed taking place along a feed trajectory.
- the laser beam is guided over the material along the feed trajectory, which makes it possible to process the material at the locations of the feed trajectory and, if necessary, also to control the angle of incidence of the laser radiation to the workpiece.
- the material in the image-side focal plane of the processing optics, it is possible to guide the laser beam guided through the beam-shaping element onto or into the material.
- the laser energy is introduced into the material according to the impressed beam shape, which means that the material is heated, for example, or goes directly into a plasma state. This can lead to a modification of the material and, for example, to a modification of the glass network structure in the case of a glass. If the input of light is sufficiently high, however, such an energy deposition can also lead to an ablation and can therefore be used in a drilling process, for example in a percussion drilling process.
- the feed device can be connected to a control device for the exchange of control signals, and the control device can be set up to adjust the position of the feed device relative to the activation of the acousto-optical deflector unit.
- the control device is the control device that also controls the acousto-optical deflector unit or is at least connected to it in terms of data technology.
- a first beam shape can be introduced into a first area during a slow translation by the feed device, while after a certain period of time the first area transitions into the second area and a second beam shape is to be introduced there.
- System-wide coordination of the material processing is possible by coupling the feed device and the acousto-optical deflector unit to the control device.
- control device can compensate or equalize the beam offset by one between two pulses in the focal plane of the processing optics with the feed device or the acousto-optical deflector unit.
- the spatial distance between the introduction of successive laser pulses, which are emitted at a fixed time interval can change as a result of a varying feed rate along the feed trajectory.
- a varying feed speed occurs in the case of feed or deflection units subject to inertia, in particular when there are changes in direction, for example in curves or corners of the feed trajectory. In these areas, it can therefore be useful to compensate for the changes in speed of the feed device with a corresponding control of the acousto-optical deflector unit.
- the feed device has at least one axis encoder, the control device being set up to read out the axis encoder position, the laser being set up to transmit to the control device the basic frequency for the controlling cycle for deflecting the laser beam through the acousto-optical deflector unit and for reading out the axis encoder position, the control device being set up to calculate a position error for the subsequent pulse in real time from the current axis encoder position, the control device correcting the position error by adapting the control signal of the acousto-optical deflector unit.
- the current location can be processed in the control device via the axis encoder positions that have been read out. Since the basic frequency of the laser provides the clock and thus a common time base, the feed, the pulse output and the beam deflection can be coordinated or synchronized via the control device.
- a position error for the subsequent incoming pulse can be calculated in real time. This error can then be compensated for with the acousto-optical deflector unit, provided that the error lies within the processing area accessible to the acousto-optical deflector unit. Neither a complex model nor large amounts of memory are required.
- the reduction in the repetition frequency of the pulses can be counteracted in the case of a slow advance.
- maintaining the repetition frequency of the laser has a positive effect on its energy stability.
- Figure 1 shows a schematic structure of the device for influencing a beam
- FIG. 2 A, B shows a schematic representation of the influencing of the beam by an acousto-optical deflector and an acousto-optical deflector unit;
- FIG. 3 A, B shows a schematic representation of the Fourier optics arrangement
- FIG. 4 A, B shows a possibility for realizing a filter and a filter element
- Figure 5 A, B, C, D is a schematic representation of the Fourier optics arrangement with beam-shaping
- FIG. 6 A, B, C, D different rastered beam-shaping elements
- FIG. 7 A, B, C, D the schematic functioning of an acousto-optical deflector unit in
- FIG. 8 shows a schematic representation of the processing optics
- FIG. 9 shows a schematic representation of the beam influencing system
- FIG. 10 A, B shows a schematic representation of the processing of a material along a feed trajectory with and without compensation of the feed speed by the deflector unit.
- a device 1 for influencing the beam of a laser beam 20 is shown schematically in FIG.
- a schematically illustrated ultra-short pulse laser 2 is provided here to generate a laser beam 20 .
- the laser beam 20 is directed through a deflector unit 3 in which the laser beam 20 is deflected.
- the deflector unit 3 is connected to a control device 5 , with the control device 5 being able to send electronic control signals to the deflector unit 3 .
- the deflector unit 3 can include acousto-optical deflectors.
- the electronic control signals in the optical material of the deflector unit 3 generate acoustic waves which lead to a modulation of the refractive index of the optical material.
- the modulation of the refractive index results in optical gratings on which a laser beam 20 passing through can be diffracted.
- the resulting diffraction pattern is specific to the respective design of the acoustic wave. It is thus possible to influence the diffraction pattern via the acoustic waves.
- the laser beam 20 deflected by the deflector unit 3 is then guided through a transformation optics arrangement 4, in which filtering, shaping, beam manipulation and further beam processing can take place, and a processing optics 9 into a focal plane 90, with the laser beam 20 in the focal plane 90 corresponding to the Deflection influenced by the deflector unit 3 and is deflected or repositioned in particular with regard to the angle.
- An acousto-optical deflector 30 of the deflector unit 3 is shown as an example in FIG. 2A.
- the laser beam 20 is coupled into the input of the acousto-optical deflector 30 .
- coupling refers to a simple transmission through an entry opening 300 of the acousto-optical deflector 30.
- the laser beam 20 is partially transmitted through the acousto-optical deflector 30 without being deflected by the refractive index modulation.
- the undeflected beam portion is called the zeroth diffraction order 302 of the acousto-optic deflector 30 .
- at least the first diffraction order 304 of the acousto-optical deflector 30 also exists.
- the first diffraction order 304 encloses the angle ⁇ with the zeroth diffraction order 302 .
- the angle a can be controlled here by the electronic control signals of the control device 5 and thus via the acoustic wave structure generated in the acousto-optical deflector 30 . For example, the angle a can be reduced or increased.
- the acousto-optical deflector 30 is taking into account the parameters of the Laser beam 20 designed and aligned relative to the laser beam 20 that for the desired angular range a of the first diffraction order 304 there is a combination of maximum diffraction efficiency and minimum beam deformation that is optimal for the application.
- the acousto-optic deflector 30 may further comprise a phased array transducer, whereby a diffraction efficiency of over 5% to over 90% can be achieved over a wide deflection range while at the same time achieving negligible beam deformation.
- the deflection range can be 15 times the angle relative to the opening angle of the laser beam 20 and correspondingly have a range of approximately 15 focus diameters of the deflected laser beam 20 after an angle-location transformation.
- the acousto-optic deflector 30 causes beam deflection along the y-axis. In order to bring about a beam deflection in the x-direction, the acousto-optical deflector 30 can be rotated by 90°, for example.
- FIG. 2B A combination of two acousto-optical deflectors 30, 32 to form a deflector unit 3 is shown in FIG. 2B.
- the first acousto-optical deflector 30 produces a beam deflection in the y-direction, as in FIG. 2A.
- the first diffraction order 304 of the first acousto-optical deflector 30 then hits the entrance opening 320 of the second acousto-optical deflector 32.
- the direction of sound propagation of the second acousto-optical deflector 32 is rotated in this example by almost 90° compared to that of the first acousto-optical deflector 30 in such a way that the deflection is the second acousto-optical deflector 32 in the y-direction. Furthermore, the sound propagation direction of the second acousto-optical deflector 32 is aligned with the beams of the first diffraction order 304 deflected by the acousto-optical deflector 30 in such a way that high diffraction efficiency and low beam deformation of the first diffraction order 324 by the angle ⁇ can be achieved.
- the angle ⁇ relates to the angle to the zeroth diffraction order 322 of the second deflector 32, which is formed by the non-diffracted beam components from the first diffraction order 304 of the first deflector 30.
- the first diffraction order 324 of the second acousto-optical deflector 32 has a total angular offset ⁇ to the incident laser beam in the y-direction and an angular offset ⁇ to the incident laser beam 20 in the x-direction.
- the deflections of the laser beam perpendicular to the original beam propagation direction are thus influenced independently of one another via the two acousto-optical deflectors 30, 32.
- the image can also be rotated by 90° between the acousto-optical deflectors.
- the deflection by the first acousto-optical deflector can also take place in the x-direction at the angle a and the y-direction can be transformed by means of image rotation before this first diffraction order 304 of the first acousto-optical deflector 30 is coupled into the second acousto-optical deflector 32 in order to generate a first Provide diffraction order 324 with the angle a in the x-direction.
- acousto-optical deflectors have a diffraction efficiency that is dependent on the input polarization.
- a rotation of the polarization between the two acousto-optical deflectors 30 and 32 is appropriate, for example by means of a polarization rotator or a half-wave delay element aligned at 45° to the polarization.
- the image rotation is preferably performed without polarization rotation.
- a multiplicity of partial laser beams 200 can also be generated by the acousto-optical deflectors 30 and 32 in FIGS. 2A, 2B, which can be represented in particular by the dashed arrows. Accordingly, it is possible with the first acousto-optical deflector 30 to generate, for example, three partial laser beams, while these three partial laser beams are then split again into three partial laser beams each via the second acousto-optical deflector 32, resulting in a total of nine partial laser beams (see Figure 4B).
- FIG. 3A shows a transformation optics arrangement 4 which comprises a first component 40 and a second component 42 .
- the first component 40 has a first focal length 400
- the second component 42 has a second focal length 420 .
- the two focal lengths 400, 420 are preferably of the same size.
- the focal plane of the transformation optics arrangement 4 on the image side is also called the corresponding deflector plane E2.
- the front deflector plane E1 is in the object-side focal plane of the first component 40.
- the image-side focal plane of the first component 40 coincides with the object-side focal plane of the second component 42, so that the transformation optics arrangement 4 is a Fourier optics arrangement. Accordingly, the distance of the first component 40 from the second component 42 is the sum of the two focal lengths 400, 420.
- the plane in which the two focal planes coincide is the so-called transformation plane F1.
- the object ie the affected laser beam 20
- the deflector unit 3 is split up by the deflector unit 3 according to its spatial frequencies.
- filtering and further beam shaping of the beams can take place in the transformation plane F1.
- the transformation optics arrangement 4 is arranged downstream of the deflector unit 3 .
- the downstream transformation optics arrangement 4 can be used to shape the laser beam that is deflected by the deflector unit 3 and possibly processed by filtering the zeroth diffraction order.
- the transverse beam profile can be shaped, such as a rectangle or ring focus, by a beam-shaping element 6, e.g., a DOE, in plane E2.
- FIG. 3A the splitting of the beams in front of the component 40 is shown particularly large to illustrate the invention.
- the beams of the zeroth and first diffraction order run almost parallel, so that the two diffraction orders can only be separated by splitting them into the spatial frequencies in the transformation plane F1.
- the deflector unit 3 itself can optionally have a filter element 34 .
- the filter element 34 can be fitted behind the first deflector 30 so that, for example, the zeroth diffraction order is filtered out between the first and second deflectors.
- the filter element 34 also includes optical components in order to image the deflector 30 into the deflector 32 and thus enable filtering. Such filtering can be implemented by an iris diaphragm, for example.
- the entrance opening of the deflector can also serve as an aperture, provided that the splitting of nu liter and the first diffraction order of the first deflector 30 at the entrance opening 320 generates a larger spatial displacement than can be coupled in through the entrance opening, as already shown schematically in FIG. 2B.
- a filter element 34 can also be fitted behind the second acousto-optical deflector 32, preferably in the transformation plane F1.
- the filter element 34 can be an iris diaphragm, for example, and can filter out different orders of diffraction or fanned-out partial laser beams from the beam path.
- the filter functionality can be integrated in a beam influencing component arranged in the area of the transformation plane F1.
- the corresponding deflector plane E2 is transferred to the focal plane 90 on the image side with a cascaded second transformation optics arrangement 4′ and processing optics 9 .
- the processing optics 9 can be a telescope, for example, or can form a telescope with the final component of the transformation optics arrangement and thus in particular can comprise a plurality of lenses or mirrors.
- the telescope can have a reducing effect, so that the beam shape displayed in the deflector plane is reduced in the processing plane.
- a lens with a large numerical aperture can be used for this purpose, with the large numerical aperture representing a large opening angle of the lens. This opening angle is shown schematically in FIG. 3B by the obtusely tapering angle behind the processing optics 9 .
- FIG. 4A shows a further possibility for implementing filtering.
- the deflector unit 3 itself has a further transformation optics arrangement 4'.
- the transformation optics arrangement 4' can also be a Fourier optics arrangement.
- the transformation optics arrangement 4' can be attached in addition to the transformation optics arrangement 4 shown in FIG. Unit 3 can split the beam splitting by the combined deflectors 30, 32 into their spatial frequency components and guide them in the transformation plane FT.
- the spatial frequency components of the laser beam can be filtered and weighted with a filter element 34 in the transformation plane FT.
- a filter element 34 can, for example, filter out certain spatial frequency components or weaken them so that, for example, a sharpening or an increase in contrast of the image in the processing plane is achieved.
- the rough frequencies are reassembled into an image that corresponds to the filtered variant of the image at the output of the second acousto-optical deflector 32. This image is then made available in the front deflector plane E1.
- a corresponding filter element 34 is shown in FIG. 4B.
- all of the partial laser beams 200 into which the laser beam 20 is split by the deflectors 30, 32 have a regular spatial offset to one another, which provides high-frequency and low-frequency spatial frequency components in the transformation level.
- the low-frequency spatial components are arranged approximately at the origin of the coordinate system, while the high-frequency components generate signals at a great distance from the origin of the coordinate system.
- the filter element 34 can have transparent partial areas 342 as well as opaque partial areas 340 . This makes it possible to filter out certain spatial frequency components from the transformation level. For example, the zeroth diffraction order can also be filtered out in this way.
- FIG. 5A shows a further possibility of realizing the device with a Fourier optics arrangement 4 .
- the downstream transformation optics arrangement 4 can extend behind the front deflector plane E1.
- the front deflector plane E1 is transferred into the corresponding front deflector plane E2 by the component arrangement, for example.
- the transformation optics arrangement 4 converts the transformation plane F1 into the corresponding transformation plane F2.
- the corresponding deflector plane E2 is further converted by the transformation optics arrangement 4 into the corresponding deflector plane E3, etc.
- the transformation optics arrangement 4 can also be composed of a plurality of transformation optics arrangements, in particular Fourier optics arrangements, and an Nf optics can thus be produced, with N being a natural even number. It is only relevant that the last created plane coincides with the focal plane of the added component. In this way, any number of image layers and transformation layers can be created, in each of which a filter element can be inserted, for example.
- a beam-shaping element 6 is placed in the corresponding deflector plane E2.
- a beam-shaping element 6 can be a diffractive optical element, for example, which can convert a Gaussian beam profile in FIG. 5B into a flat-top beam profile in FIG. 5C, for example.
- the laser beam 20 has a Gaussian beam profile in front of the corresponding deflector plane E2, which means that the beam cross section perpendicular to the beam propagation direction of the laser beam 20 is a Gaussian bell curve, as shown schematically in Figure 5B as a lateral beam cross section.
- a flat-top beam profile is impressed on the laser beam 20.
- a flat-top beam profile has an intensity of the same magnitude over the beam cross-section and drops very quickly to a vanishingly low intensity at the edge of the beam, as shown schematically as a lateral beam cross-section in FIG. 5C.
- a flat-top beam profile has the advantage that a material can be processed homogeneously in one processing level.
- a flat-top beam profile has the advantage that more complicated beam shapes can also be formed from the flat-top beam profile, for example by further filtering in a corresponding transformation plane or a corresponding deflector plane.
- a beam splitting unit 7 can be introduced in FIG. 5A in the corresponding deflector plane E2 or another corresponding deflector plane.
- a beam deflection unit 9 can also be attached in a corresponding deflector plane, for example plane E3, preferably a so-called galvano scanner, which deflects the laser beam.
- a further offset of the beams is typically generated by a galvanic scanner, so that, for example, the specified angular offset can be increased.
- FIG. 5D shows the rear planes of the deflector unit 3, the identifiers of which are provided with a negative sign.
- Beam-shaping elements 6 , 7 , 9 can also be introduced in the rear transformation plane or deflector planes in order to effect beam shaping before the laser beam is deflected by the deflector unit 3 .
- FIGS. 6A to 6C Various rastered beam-shaping elements 6 are shown in FIGS. 6A to 6C, whereas the associated optical structure is shown in FIG. 6D.
- the laser beam 20 or a partial laser beam 200 can be directed into a specific grid element of the gridded beam-shaping element 6 .
- FIG. 6A shows that the partial laser beam 200 is guided into three different raster elements in succession, so that the partial laser beams are influenced according to the raster elements.
- a beam geometry can be generated in which three partial beams 200 pass through the three different raster elements shown at the same time.
- the raster elements are arranged in or close to transformation planes, in contrast to classic beam-shaping elements.
- a beam-shaping element 6 is shown in FIG.
- this grid can be given by the pixel cells of a spatial light modulator.
- rasterization can be performed by grouping pixel cells and pixel areas.
- the phase, intensity or polarization component of the laser beam 20 can be influenced by each raster element or each pixel. It is thus possible for the beam profile of the laser beam 20 to be manipulated by driving the various pixel elements. For example, such a manipulation can be used to generate a laser beam with a flat-top beam profile from a Gaussian beam profile.
- a rasterized beam-shaping element 6 is shown in FIG. 6C, with each raster element being its own phase mask. If the laser beam 20 falls through this phase mask, the phase front of the laser beam 20 can be influenced and thus both the direction of propagation and the beam profile, as well as the phase front in general.
- all the raster elements can be adjusted individually in the shown FIGS. 6A to 6C, so that each raster element brings about an individual beam shaping.
- one raster element can make a flat-top beam profile from a Gaussian beam profile, while another raster element imposes an elliptical beam shape, or merely rotates the polarization by a certain angle, or merely attenuates the laser beam 20, or merely deflects it, etc.
- the raster elements of the beam-shaping element 6, as in the case of the spatial light modulator can also be controlled jointly or individually.
- FIG. 6D shows the associated optical structure from FIG. 5A, with the beam-shaping element 6 here being arranged in the plane F2, but alternatively it can also be arranged in the plane F1.
- FIGS. 7A to 7D show how the periodicity of the electronic control signal of the control device determines the deflection of the incident laser beam 20 into an acousto-optical deflector 30,32.
- the acoustic wave in the optical material of the acousto-optical deflector 30, 32 is shown as a representative of the acousto-optical deflector 30, 32, which has a periodicity which has the frequency of the electronic control signal.
- An acoustic wave in an acousto-optic deflector 30, 32 is shown in FIG. 7A.
- the acousto-optical deflector is a so-called traveling wave modulator.
- the acoustic wave has a very small periodicity, or a high spatial frequency.
- the incident laser beam 20 is diffracted at the resulting optical grating, with the zeroth diffraction order being removed from the beam path (indicated by a cross) by an aperture device (not shown).
- the partial beam 200 which is diffracted away from the zeroth diffraction order at a diffraction angle ⁇ , remains in the beam path.
- the partial beam 200 then (after passing through an optical component that is not shown) strikes the rasterized beam-shaping element 6 in the transformation plane, with the partial ray 200 being directed to a specific raster element becomes.
- FIG. 7B shows the same structure as FIG. 7A, but the periodicity of the optical grating is significantly larger, as a result of which the spatial frequencies are smaller.
- the applied diffraction angle a is therefore significantly smaller in comparison to FIG. 7A, as a result of which the partial beam 200 runs closer to the zeroth diffraction order. Accordingly, the partial beam 200 is directed onto a different specific raster element than in FIG. 7A.
- the acoustic wave that produces the optical grating is propagated from left to right as the laser beam 20 impinges on the grating.
- the distances in the optical grating for the points of incidence of the laser beam become smaller with increasing time, which means that the periodicity of the optical grating decreases and the spatial frequencies thus increase.
- the distance variation of the optical grating takes place continuously, for example, so that the partial beam is shifted over the rastered beam-shaping element 6, with the partial beam sweeping over several raster elements.
- a discrete control of the raster elements can also be achieved by matching the laser pulses with the wave field, see below. It should be noted that when ultrashort laser pulses are used, the diffraction structure can be regarded as constant in time for the propagation time of the pulse through the deflector.
- FIG. 7D shows the same device as in FIGS. 7A to 7C, with the acoustic wave now not being continuously varied in its periodicity, but instead jumping from a very small periodicity to a very large periodicity.
- This can be achieved, for example, by the control device 5 suddenly applying a control signal with a different frequency to the acousto-optical deflector 30 , 32 .
- the variation of the periodicity occurs suddenly for the incident laser beam 20 on the optical grating, so that the partial beam 200 changes from one raster element to one other grid element jumps.
- the raster elements lying between the start and destination raster elements are not swept over.
- the frequency change can be synchronized with the pulsed laser, so that the frequency change in the acousto-optical deflector 30, 32 takes place precisely when no laser pulse is emitted by the ultra-short pulse laser.
- a longitudinal acoustic wave in quartz typically has a speed of 5700 m/s.
- the acoustic field has an extension of 3-5mm, so a change of the entire acoustic field is accomplished in less than 1 ps (that's how long it takes for the acoustic field to propagate 5mm).
- a change in frequency within the acoustic field is accomplished within significantly less than 1 ms, for example in less than 100 ns.
- the laser pulses and the acoustic fields must therefore preferably be synchronized to one another with an accuracy of less than 20 ns.
- the frequencies for operating the acousto-optical deflector unit are in the range from 1 MHz to 500 MHz, with the switching times of the frequencies typically being less than 500 ns at 200 MHz.
- the repetition rates of the laser are typically in the range of less than 100MHz.
- FIG. 9 A further embodiment of the device 1 is shown in FIG. 9, the device 1 having a feed device 10 on which a material 11 to be processed can be fastened.
- the feed device 10 can be used to bring the material into the image-side focal plane of the processing optics, so that the laser beams that are influenced by the optical system can be introduced into the material 11 .
- the material 11 can be processed in accordance with the laser beams 20 or the laser beam geometry.
- the feed device 10 can move the material 11 held on it relative to the laser beam, as a result of which the laser beam is guided over the material.
- the feed device can be guided along a specific feed trajectory with a feed so that the laser energy is introduced into the material along this feed trajectory.
- the feed device 10 can be connected to the control device 5 so that the control device 5 and the feed device 10 can exchange control signals.
- this allows the feed trajectory to be traversed, while the laser beams can be deflected synchronously with the acousto-optical deflector unit 3, can be guided through beam-shaping elements 6, 7, 8 and the laser beams manipulated in this way can be imaged in the material 11 in order to to achieve processing of the material 11 in this way.
- the laser 2 can be a pulsed laser, for example, which has a basic frequency, the so-called seed frequency.
- the seed frequency can be forwarded to the control device 5, as a result of which a common time base can be made available in the entire device 1.
- the control device 5 is now able to coordinate the various processes or process steps in the individual dynamically assignable sub-units of the device 1 .
- this makes it possible to compensate for the beam offset by a relative movement between workpiece 11 and processing optics 9 between two pulses in the focal plane of the processing optics and then, preferably between two consecutive pulses, to reposition it on the workpiece.
- a predetermined beam offset between two laser pulses can also be implemented in connection with inertia-loaded feed units. Due to inertia, for example, the distance between the points of impact in the material 11 of the laser pulses can change as a function of the feed rate, as shown in FIG. 10A. This behavior is particularly problematic in curves or corners of the feed trajectory, where the feed rate is typically reduced using feed devices subjected to inertia. With a fixed repetition frequency of the pulsed laser, the distance between the laser pulses is therefore varied, which can lead to inhomogeneous processing of the material 11.
- the feed rate variations can be compensated for with the deflector unit 3, as shown in Figure 10 B, so that laser pulses penetrate the material 11 can be brought in. As a result, significantly more uniform processing is possible; in particular, this avoids an unwanted overlapping of the pulses and overheating of the material 11.
- the feed device 10 can have at least one axis encoder 100, the axis encoder 100 being connected to the control device 5. From the axis encoder 100, the control device 5 can read the axis encoder position, which is correlated with the current position or alignment of the feed device 10. In particular, the axis encoder position can be read synchronously with the basic pulse frequency of the laser 2.
- the control device 5 can calculate a corresponding position error and compensate for it by controlling the deflector unit 3 by repositioning the laser beam. Accordingly, the position error of the feed device 10 is compensated for by adapting the control signal to the deflector unit 3 .
- the superimposed inertia-free beam positioning with the deflector unit 3 can thus avoid the variation of the pulse frequency of the pulsed laser 2 and thus optimize the material throughput.
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CN202180087125.0A CN116685434A (zh) | 2020-12-21 | 2021-12-07 | 用于激光射束的射束影响的设备 |
EP21836375.2A EP4263118A1 (de) | 2020-12-21 | 2021-12-07 | Vorrichtung zur strahlbeeinflussung eines laserstrahls |
KR1020237023923A KR20230117235A (ko) | 2020-12-21 | 2021-12-07 | 레이저 빔에 영향을 주기 위한 장치 |
US18/337,071 US20230330770A1 (en) | 2020-12-21 | 2023-06-19 | Apparatus for beam-influencing a laser beam |
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DE102020134422.8A DE102020134422A1 (de) | 2020-12-21 | 2020-12-21 | Vorrichtung zur Strahlbeeinflussung eines Laserstrahls |
DE102020134422.8 | 2020-12-21 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
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US7176409B2 (en) * | 2001-06-13 | 2007-02-13 | Orbotech Ltd | Multiple beam micromachining system for removing at least two different layers of a substrate |
US20120241427A1 (en) * | 2009-12-30 | 2012-09-27 | Gsi Group Corporation | Predictive link processing |
US8680430B2 (en) * | 2008-12-08 | 2014-03-25 | Electro Scientific Industries, Inc. | Controlling dynamic and thermal loads on laser beam positioning system to achieve high-throughput laser processing of workpiece features |
US20170242232A1 (en) * | 2014-10-15 | 2017-08-24 | Institut National De La Sante Et La Rescherche Medicale (Inserm) | Method for analyzing a sample with a non-linear microscopy technique and non-linear microscope associated |
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WO2020178813A1 (en) | 2019-03-06 | 2020-09-10 | Orbotech Ltd. | High-speed dynamic beam shaping |
DE102019116803A1 (de) | 2019-06-21 | 2020-12-24 | Trumpf Laser- Und Systemtechnik Gmbh | Verfahren und Vorrichtung zur Bearbeitung eines Werkstücks |
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2020
- 2020-12-21 DE DE102020134422.8A patent/DE102020134422A1/de active Pending
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2021
- 2021-12-07 KR KR1020237023923A patent/KR20230117235A/ko unknown
- 2021-12-07 EP EP21836375.2A patent/EP4263118A1/de active Pending
- 2021-12-07 CN CN202180087125.0A patent/CN116685434A/zh active Pending
- 2021-12-07 WO PCT/EP2021/084568 patent/WO2022135909A1/de active Application Filing
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7176409B2 (en) * | 2001-06-13 | 2007-02-13 | Orbotech Ltd | Multiple beam micromachining system for removing at least two different layers of a substrate |
US8680430B2 (en) * | 2008-12-08 | 2014-03-25 | Electro Scientific Industries, Inc. | Controlling dynamic and thermal loads on laser beam positioning system to achieve high-throughput laser processing of workpiece features |
US20120241427A1 (en) * | 2009-12-30 | 2012-09-27 | Gsi Group Corporation | Predictive link processing |
US20170242232A1 (en) * | 2014-10-15 | 2017-08-24 | Institut National De La Sante Et La Rescherche Medicale (Inserm) | Method for analyzing a sample with a non-linear microscopy technique and non-linear microscope associated |
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US20230330770A1 (en) | 2023-10-19 |
EP4263118A1 (de) | 2023-10-25 |
CN116685434A (zh) | 2023-09-01 |
KR20230117235A (ko) | 2023-08-07 |
DE102020134422A1 (de) | 2022-06-23 |
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