WO2022113443A1 - 回転式ホイルトラップおよび光源装置 - Google Patents
回転式ホイルトラップおよび光源装置 Download PDFInfo
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- WO2022113443A1 WO2022113443A1 PCT/JP2021/030807 JP2021030807W WO2022113443A1 WO 2022113443 A1 WO2022113443 A1 WO 2022113443A1 JP 2021030807 W JP2021030807 W JP 2021030807W WO 2022113443 A1 WO2022113443 A1 WO 2022113443A1
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- Prior art keywords
- plasma
- rotary
- debris
- foil trap
- foil
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- 239000011888 foil Substances 0.000 title claims abstract description 196
- 238000005096 rolling process Methods 0.000 claims abstract description 60
- 239000002994 raw material Substances 0.000 claims description 54
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- 238000002844 melting Methods 0.000 claims description 6
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Definitions
- the present invention relates to a rotary foil trap that captures debris emitted from high-temperature plasma, and a light source device including the rotary foil trap.
- EUV light source device As a next-generation semiconductor exposure light source, an extreme ultraviolet light source device (hereinafter, “EUV light source device”) that emits extreme ultraviolet light having a wavelength of 13.5 nm (hereinafter, also referred to as “EUV (Extreme Ultra Violet) light”). ”) Is under development.
- EUV radiation extreme ultraviolet light
- One of these methods is a method of generating high-temperature plasma by heating and exciting an extreme ultraviolet light emitting species (hereinafter, also referred to as "EUV emitting species”), and extracting EUV light from the high-temperature plasma. There is.
- the EUV light source device that employs such a method is divided into an LPP (Laser Produced Plasma) method and a DPP (Discharge Produced Plasma) method according to the high temperature plasma generation method.
- the DPP type EUV light source device applies a high voltage to the gap between the electrodes to which the discharge gas containing the EUV radiant species (gas phase plasma raw material) is supplied, and generates high-density high-temperature plasma by discharge from there. It utilizes the emitted extreme ultraviolet light.
- a DPP method for example, as described in Patent Document 1 (Japanese Unexamined Patent Publication No.
- a liquid high-temperature plasma raw material for example, Sn (tin)
- an energy beam such as a laser beam
- a high-temperature plasma is generated by electric discharge.
- Such a method is sometimes called an LDP (Laser Assisted Discharge Plasma) method.
- the EUV light source device is used as a light source device for a lithography device in semiconductor device manufacturing.
- the EUV light source device is used as a light source device for a mask inspection device used for lithography. That is, the EUV light source device is used as a light source device for another optical system device (utilization device) that uses EUV light. Since EUV light is easily attenuated in the atmosphere, the plasma and the equipment used are placed in a decompressed atmosphere, that is, a vacuum environment.
- the debris includes particles of a high temperature plasma raw material (tin particles when the plasma raw material is tin) and material particles of a discharge electrode that are sputtered with the generation of plasma.
- a debris reduction device also referred to as DMT (Debris Mitigation Tool)
- DMT Debris Mitigation Tool
- the debris reduction device includes a foil trap having a plurality of foils (thin films or thin flat plates) arranged so as to divide the space into small pieces.
- a foil trap having a plurality of foils (thin films or thin flat plates) arranged so as to divide the space into small pieces.
- the function of lowering the conductance in the space and increasing the pressure is played.
- the probability of collision between the debris and the atmospheric gas in this region where the pressure rises increases.
- the debris scattering speed is reduced and the traveling direction of the debris is changed, so that the debris is captured by the debris reducing device.
- Foil traps include fixed foil traps in which the positions of a plurality of foils are fixed, and rotary foil traps in which a plurality of foils actively collide with debris.
- the rotary foil trap includes a plurality of foils arranged radially around a rotation axis arranged in the center, and debris flying from the plasma by rotating the plurality of foils around the rotation axis. Collide with the foil.
- one debris reduction device may include both a rotary foil trap and a fixed foil trap, or may include only one of them.
- the present inventor operates an EUV light source device, and while performing a debris reduction operation by rotating a rotary wheel trap constituting the debris reduction device, a plurality of rotary wheel traps constituting the rotary wheel trap may be used.
- a part of the foil of the wheel broke after a relatively short period of operation.
- the above problem occurs only in some rotary foil traps, and in a relatively large number of rotary foil traps, the above problem occurs even after several times the usage time of the rotary foil trap in which the above problem occurs. I wasn't.
- the present invention is a rotary foil trap that is placed in the vicinity of a plasma, transmits light emitted from the plasma, and captures debris emitted from the plasma, and defects such as foil breakage occur in a short period of time. It is an object of the present invention to provide a rotary foil trap having a relatively long operating life and a light source device equipped with the rotary foil trap.
- one aspect of the rotary foil trap according to the present invention is arranged in the vicinity of the plasma generated by the plasma generating unit and rotates, transmits the light radiated from the plasma, and is said to be the same.
- a rotary foil trap that captures debris emitted from plasma has a plurality of foils and a support member that supports the foils, wherein the foils are rolled lamellae that have been pulled by rolling.
- the rotation of the rotary foil trap in an environment subject to various loads such as heat radiation from plasma, collision of debris, and irradiation of light. It is possible to suppress the occurrence of problems such as foil breakage due to operation.
- the angle between the direction of the centrifugal force and the rolling direction may be 0 ° or more and 20 ° or less. In this case, it is possible to reliably suppress the occurrence of problems such as breakage of the foil due to the rotational operation of the rotary foil trap.
- the plasma generating unit is configured to excite the raw material radiating the light to generate the plasma, and the foil has a temperature corresponding to the melting point of the raw material.
- Rotational operation may be performed in the above state.
- the raw material (debris) adhering to the foil is liquefied, and the debris that has become droplets moves on the rotating foil in the radial direction of rotation due to centrifugal force and separates from the foil. Can be prevented from accumulating. Even when the rotary wheel trap is rotated in such a high temperature environment, it is possible to appropriately suppress the occurrence of problems such as breakage of the foil due to the rotational operation.
- the rolling direction can be the direction in which the crystal grains constituting the rolled thin plate are elongated.
- the major axis direction of the crystal grains can be configured to coincide with or substantially coincide with the centrifugal force direction.
- the rolling direction of the foil can be easily determined by an SEM (Scanning Electron Microscope) or the like.
- one aspect of the light source device includes the above-mentioned rotary foil trap and the above-mentioned plasma generating unit.
- the light emitted from the plasma generating portion may include extreme ultraviolet light. This makes it possible to obtain a light source device (extreme ultraviolet light light source device) equipped with a rotary foil trap having a relatively long operating life.
- the rotary wheel trap of the present invention is a rotary wheel trap that is placed in the vicinity of the plasma and captures debris emitted from the plasma, and is relatively free from problems such as foil breakage in a short period of time. It can have a long operating life.
- FIG. 1 is a schematic view showing an extreme ultraviolet light source device according to the present embodiment.
- FIG. 2 is a side sectional view showing a part of an extreme ultraviolet light source device.
- FIG. 3 is a front view of the rotary foil trap.
- FIG. 4 is a top view of the foil of the fixed foil trap.
- FIG. 5 is a front view of the fixed foil trap.
- FIG. 6 is a diagram illustrating a rolling direction of the foil.
- FIG. 7 is a diagram illustrating a longitudinal direction and a lateral direction of the foil.
- FIG. 8A is a diagram illustrating a tensile test in the rolling direction of the sample.
- FIG. 8B is a diagram illustrating a tensile test in a direction orthogonal to the rolling direction of the sample.
- FIG. 8A is a diagram illustrating a tensile test in the rolling direction of the sample.
- FIG. 8B is a diagram illustrating a tensile test in a direction orthogon
- FIG. 9 is a diagram showing the relationship between the rolling direction and the centrifugal force direction.
- FIG. 10 is a diagram showing an angle formed by the rolling direction and the centrifugal force direction.
- FIG. 11 shows the results of investigation of the allowable range of the angle formed by the rolling direction and the centrifugal force direction.
- FIG. 1 is a cross-sectional view showing the inside of the chamber and the inside of the connection chamber of the extreme ultraviolet light source device according to the embodiment cut horizontally
- FIG. 2 shows a schematic configuration of a debris reduction portion and a debris accommodating portion according to the embodiment. It is sectional drawing which shows.
- the LDP type extreme ultraviolet light source device (EUV light source device) is taken as an example.
- the EUV light source device 1 emits extreme ultraviolet light (EUV light).
- the wavelength of this extreme ultraviolet light is, for example, 13.5 nm.
- the EUV light source device 1 irradiates the liquid phase plasma raw materials SA and SB supplied to the surfaces of the pair of discharge electrodes EA and EB that generate discharge with an energy beam such as a laser beam LB.
- the plasma raw materials SA and SB are vaporized.
- plasma P is generated by discharging the discharge region D between the discharge electrodes EA and EB. EUV light is emitted from the plasma P.
- the EUV light source device 1 can be used, for example, as a light source device of a lithography device in semiconductor device manufacturing or a light source device of a mask inspection device used for lithography.
- a part of the EUV light emitted from the plasma P is taken out and guided to the mask inspection device.
- the mask inspection device performs a blank inspection or a pattern inspection of the mask using the EUV light emitted from the EUV light source device 1 as the inspection light.
- EUV light taken out from the EUV light source device 1 is defined by the opening KA provided in the heat shield plate 23 of FIG.
- the EUV light source device 1 includes a light source unit 2, a debris reduction unit 3, and a debris accommodating unit 4.
- the light source unit 2 generates EUV light based on the LDP method.
- the debris reduction unit 3 captures the debris scattered together with the EUV light emitted from the light source unit 2.
- the debris accommodating unit 4 accommodates debris generated by the light source unit 2 and debris captured by the debris reduction unit 3.
- the EUV light source device 1 includes a chamber 11 that isolates the plasma P generated inside from the outside.
- the chamber 11 is made of a rigid body, for example metal.
- the chamber 11 is a vacuum housing, and the inside thereof is made into a reduced pressure atmosphere in order to satisfactorily generate a discharge for heating and exciting the plasma raw materials SA and SB and to suppress the attenuation of EUV light.
- the light source unit 2 is arranged inside the chamber 11.
- the light source unit 2 includes a pair of discharge electrodes EA and EB.
- the discharge electrodes EA and EB are disk-shaped members having the same shape and size.
- the discharge electrode EA is used as a cathode and the discharge electrode EB is used as an anode.
- the discharge electrodes EA and EB are formed from a refractory metal such as molybdenum (Mo), tungsten (W) or tantalum (Ta).
- Mo molybdenum
- W tungsten
- Ta tantalum
- the discharge electrodes EA and EB are arranged at positions separated from each other, and the peripheral portions of the discharge electrodes EA and EB are close to each other.
- the discharge region D in which the plasma P is generated is located in the gap between the discharge electrodes EA and EB where the peripheral portions of the discharge electrodes EA and EB are closest to each other.
- discharge is generated in the discharge region D.
- the plasma raw materials SA and SB transported to the discharge region D based on the rotation of the discharge electrodes EA and EB are heated and excited by the current flowing between the discharge electrodes EA and EB at the time of discharge, and the plasma P that emits EUV light is emitted. Occurs.
- the discharge electrode EA is connected to the rotation shaft JA of the motor MA and rotates around the axis of the discharge electrode EA.
- the discharge electrode EB is connected to the rotation shaft JB of the motor MB and rotates around the axis of the discharge electrode EB.
- the motors MA and MB are arranged outside the chamber 11, and the rotation axes JA and JB of the motors MA and MB extend from the outside of the chamber 11 to the inside.
- the gap between the rotating shaft JA and the wall of the chamber 11 is sealed with the sealing member PA, and the gap between the rotating shaft JB and the wall of the chamber 11 is sealed with the sealing member PB.
- the seal members PA and PB are, for example, mechanical seals.
- Each of the seal members PA and PB rotatably supports the rotation shafts JA and JB while maintaining the reduced pressure atmosphere in the chamber 11.
- each of the discharge electrodes EA and EB is driven by individual motors MA and MB via the rotation shafts JA and JB, respectively.
- the rotational drive of these motors MA and MB is controlled by the control unit 12.
- a container CA in which the liquid phase plasma raw material SA is stored and a container CB in which the liquid phase plasma raw material SB is stored are arranged inside the chamber 11.
- the heated liquid phase plasma raw materials SA and SB are supplied to each of the containers CA and CB.
- the plasma raw materials SA and SB in the liquid phase are, for example, tin.
- the container CA accommodates the plasma raw material SA so that the lower portion of the discharge electrode EA is immersed in the liquid phase plasma raw material SA.
- the container CB accommodates the plasma raw material SB so that the lower portion of the discharge electrode EB is immersed in the liquid phase plasma raw material SB. Therefore, the liquid phase plasma raw materials SA and SB adhere to the lower portions of the discharge electrodes EA and EB.
- the liquid phase plasma raw materials SA and SB attached to the lower portions of the discharge electrodes EA and EB are transported to the discharge region D where the plasma P is generated as the discharge electrodes EA and EB rotate.
- a laser source (energy beam irradiation device) 14 is arranged outside the chamber 11.
- the laser source 14 irradiates the plasma raw material SA attached to the discharge electrode EA transported to the discharge region D with an energy beam to vaporize the plasma raw material SA.
- the laser source 14 is, for example, a Nd: YVO 4 (neodymium-topped Ytrium Orthovandate) laser apparatus.
- the laser source 14 emits a laser beam LB in the infrared region having a wavelength of 1064 nm.
- the energy beam irradiation device may be a device that emits an energy beam other than the laser beam LB as long as the plasma raw material SA can be vaporized.
- the irradiation timing of the laser beam LB by the laser source 14 is controlled by the control unit 12.
- the laser beam LB emitted from the laser source 14 is guided to the movable mirror 16 via, for example, a condensing means including a condensing lens 15.
- the condensing means adjusts the spot diameter of the laser beam LB at the laser beam irradiation position of the discharge electrode EA.
- the condenser lens 15 and the movable mirror 16 are arranged outside the chamber 11.
- the laser beam LB focused by the condenser lens 15 is reflected by the movable mirror 16 and passes through the transparent window 20 provided on the wall of the chamber 11 to irradiate the peripheral edge of the discharge electrode EA near the discharge region D. Will be done.
- the posture of the movable mirror 16 may be adjusted manually by the worker, or the control unit 12 may control the posture of the movable mirror 16 based on the EUV light intensity information from the monitoring device 43 described later. good.
- the movable mirror 16 is driven by a movable mirror driving unit (not shown).
- the axes of the discharge electrodes EA and EB are not parallel in order to facilitate irradiating the peripheral portion of the discharge electrode EA near the discharge region D with the laser beam LB.
- the distance between the rotating shafts JA and JB is narrow on the motor MA and MB sides and wide on the discharge electrodes EA and EB sides.
- the opposite side of the discharge electrodes EA and EB can be retracted from the irradiation path of the laser beam LB while the facing surfaces of the discharge electrodes EA and EB are brought close to each other, and the discharge electrode near the discharge region D can be retracted. It is possible to easily irradiate the peripheral portion of the EA with the laser beam LB.
- the discharge electrode EB is arranged between the discharge electrode EA and the movable mirror 16.
- the laser beam LB reflected by the movable mirror 16 passes near the outer peripheral surface of the discharge electrode EB and then reaches the outer peripheral surface of the discharge electrode EA.
- the discharge electrode EB is retracted in the direction toward the motor MB side (left side in FIG. 1) with respect to the discharge electrode EA so that the laser beam LB is not shielded by the discharge electrode EB.
- the liquid phase plasma raw material SA adhered to the outer peripheral surface of the discharge electrode EA near the discharge region D is vaporized by irradiation with the laser beam LB and is supplied to the discharge region D as the gas phase plasma raw material SA.
- the pulse power supply unit 13 supplies power to the discharge electrodes EA and EB. Then, when the plasma raw material SA of the gas phase is supplied to the discharge region D by the irradiation of the laser beam LB, a discharge occurs between the discharge electrodes EA and EB in the discharge region D. At this time, the pulse power supply unit 13 periodically supplies the pulse power to the discharge electrodes EA and EB.
- the pulse power supply unit 13 is arranged outside the chamber 11.
- the feeder line extending from the pulse power supply unit 13 passes through the feedthrough FA and FB and extends to the inside of the chamber 11.
- the feedthrough FA and FB are seal members embedded in the wall of the chamber 11 to maintain a reduced pressure atmosphere in the chamber 11.
- the operation of the laser source 14 and the operation of the pulse power supply unit 13 for generating the plasma P are controlled by the control unit 12.
- the two feeder lines extending from the pulse power supply unit 13 are connected to the container CA and CB, respectively, via the feedthrough FA and FB.
- the containers CA and CB are formed of a conductive material, and the plasma raw materials SA and SB housed inside the containers CA and CB are also conductive materials such as tin.
- the lower portions of the discharge electrodes EA and EB are immersed in the plasma raw materials SA and SB housed inside the containers CA and CB, respectively. Therefore, when the pulse power is supplied from the pulse power supply unit 13 to the containers CA and CB, the pulse power is supplied to the discharge electrodes EA and EB via the plasma raw materials SA and SB, respectively.
- the plasma material SA of the gas phase in the discharge region D is heated and excited by the electric current, and the plasma P is generated.
- EUV light is emitted from the plasma P.
- EUV light is used in a utilization device (lithography device or mask inspection device) which is another optical system device. In this embodiment, EUV light is used in the mask inspection device.
- connection chamber 21 is arranged between the chamber 11 and the utilization device.
- the connection chamber 21 is made of a rigid body, for example metal.
- the connection chamber 21 is a vacuum housing, and the inside thereof is also made into a reduced pressure atmosphere in order to suppress the attenuation of EUV light, like the inside of the chamber 11.
- connection chamber 21 communicates with the chamber 11 via a window portion 17 which is a through hole formed in the wall of the chamber 11. Further, the internal space of the connection chamber 21 communicates with the utilization device (mask inspection device) 42 via the window portion 27 which is a through hole formed in the wall of the connection chamber 21.
- FIG. 2 shows only a part of the utilization device 42. The EUV light emitted from the plasma P in the discharge region D is introduced into the utilization device (mask inspection device) 42 through the windows 17 and 27.
- the debris DB is emitted from the plasma P together with EUV light at high speed in various directions.
- the debris DB includes tin particles which are plasma raw materials SA and SB, and material particles of discharge electrodes EA and EB which are sputtered with the generation of plasma P. These debris DBs obtain a large amount of kinetic energy through the contraction and expansion processes of plasma P. That is, the debris DB generated from the plasma P contains ions, neutral atoms and electrons that move at high speed, and when such a debris DB reaches the utilization device 42, it forms a reflective film of an optical element in the utilization device 42. May damage or contaminate and reduce performance.
- a debris reduction unit 3 for capturing the debris DB is provided in the connection chamber 21 so that the debris DB does not invade the utilization device 42.
- the debris reduction unit 3 includes a fixed foil trap 24 in which the positions of a plurality of foils are fixed, and a rotary foil trap 22 in which the foil actively collides with the debris.
- the fixed foil trap 24 is provided between the rotary foil trap 22 and the utilization device 24 on the optical path of EUV light traveling from the connection chamber 21 to the utilization device (mask inspection device) 42.
- both the rotary foil trap 22 and the fixed foil trap 24 may be provided, or either one may be provided.
- FIG. 3 is a front view showing a configuration example of the rotary foil trap of FIG.
- the rotary foil trap 22 includes a plurality of foils (blades) 51, an outer ring 52, and a central hub (support member) 53.
- the outer ring 52 is concentric with the hub 53, and each blade 51 is disposed between the outer ring 52 and the hub 53.
- each blade 51 is a thin film or a thin flat plate.
- the blades 51 are arranged radially at approximately equal angular spacing.
- Each blade 51 is on a plane including the central axis JM of the hub 53.
- the material of the rotary foil trap 22 is a refractory metal such as tungsten and / or molybdenum.
- the plurality of blades 51 of the rotary wheel trap 22 are arranged parallel to the light ray direction of the EUV light traveling toward the window 27 so as not to block the EUV light traveling from the plasma P (light emitting point) toward the window 27. Will be done. That is, as shown in FIG. 2, the rotary foil trap 22 in which each blade 51 is arranged on a plane including the central axis JM of the hub 53 has a plasma P (light emitting point) on an extension of the central axis JM of the hub 53. Is arranged to exist.
- the hub 53 is connected to the rotation axis JC of the motor (rotation drive device) MC, and the center axis JM of the hub 53 matches the center axis of the rotation axis JC.
- the rotary shaft JC of the motor MC can be regarded as the rotary shaft of the rotary foil trap 22.
- the rotary foil trap 22 is driven by the motor MC to rotate, and the rotating blade 51 collides with the debris DB arriving from the plasma P to capture the debris DB, and the debris DB invades the utilization device 42. To prevent.
- the rotary foil trap 22 is arranged inside the connection chamber 21, while the motor MC is arranged outside the connection chamber 21.
- a through hole through which the rotation axis JC passes is formed in the wall of the connection chamber 21.
- the gap between the rotating shaft JC and the wall of the connecting chamber 21 is sealed with, for example, a sealing member PC made of a mechanical seal.
- the seal member PC rotatably supports the rotation shaft JC of the motor MC while maintaining the reduced pressure atmosphere in the connection chamber 21.
- the rotary foil trap 22 becomes hot due to radiation from the plasma P. Therefore, in order to prevent the rotary foil trap 22 from overheating, the rotary shaft JC may be made hollow to allow cooling water to flow to cool the rotary foil trap 22. Further, since the motor MC itself during rotation also generates heat, the water cooling pipe 41 may be wound around the motor MC to remove heat. Water flows through the water cooling pipe 41 and cools the motor MC by heat exchange.
- a heat shield plate 23 is arranged in the connection chamber 21.
- the heat shield plate 23 includes an opening KA having an arbitrary shape (for example, a circle) for extracting a part of EUV light emitted from the plasma P. Since the heat shield plate 23 is arranged in the vicinity of the plasma P, it is made of a melting point material such as molybdenum or tungsten.
- the opening KA is provided at a position eccentric from the rotation axis JM of the rotary foil trap 22.
- the rotary foil trap 22 is arranged so that the blade 51 is located on the main ray UL of the EUV light bundle (hereinafter, also referred to as EUV extraction light) that has passed through the opening KA of the heat shield plate 23. ..
- EUV extraction light the EUV light bundle
- the EUV light taken out from the opening KA of the heat shield plate 23 passes through the debris reduction unit 3 and is introduced into the utilization device (mask inspection device) 42 via the window section 27.
- the rotary foil trap 22 captures a relatively low-speed debris DB among the debris DBs emitted from the plasma P, while the fixed foil trap 24 captures the rotary foil trap among the debris DBs emitted from the plasma P.
- the debris DB that progresses at high speed that could not be captured in 22 is captured.
- the fixed foil trap 24 is arranged on the main ray UL of the EUV extraction light. Further, the fixed foil trap 24 has a shape corresponding to a region through which EUV extraction light, which is EUV light whose traveling direction is restricted by the opening KA of the heat shield plate 23, passes through.
- FIG. 4 is a top view showing a configuration example of the fixed foil trap of FIG. 2, and FIG. 5 is a cross-sectional view showing a configuration example of the fixed foil trap of FIG.
- the fixed foil trap 24 includes a plurality of foils 61 and a fixed frame (fixing member) 60 that supports the foils 61.
- the foils 61 are arranged at equal intervals in a cross section orthogonal to the UL direction of the EUV extraction light.
- the fixed frame 60 has, for example, a rectangular shape when viewed from the front.
- the outer shape of the fixed frame 60 may have any shape.
- the plurality of foils 61 are arranged radially so as to extend in the ray direction of the EUV extraction light when viewed from a direction orthogonal to the main ray UL direction.
- the plurality of foils 61 of the fixed foil trap 24 serve to lower the conductance of the portion and raise the pressure locally by finely dividing the space in which the fixed foil trap 24 is arranged.
- the pressure in the fixed foil trap 24 is increased.
- the gas supplied to the fixed foil trap 24 is preferably a gas having a high transmittance for EUV light, for example, a rare gas such as helium (He) or argon (Ar) or hydrogen (H 2 ). Used.
- the high-speed debris DB that could not be captured by the rotary foil trap 22 slows down because the probability of collision with gas increases in the region where the pressure in the fixed foil trap 24 increases.
- the traveling direction of the debris DB changes due to the collision with the gas.
- the fixed foil trap 24 captures the debris DB whose speed has decreased and the traveling direction has changed in this way by the foil 61 or the fixed frame 60.
- the cover member 25 is arranged in the connection chamber 21.
- the cover member 25 surrounds the rotary foil trap 22 and prevents the debris DB captured by the rotary foil trap 22 from scattering inside the connection chamber 21.
- the cover member 25 includes an incident side opening KI and an emitting side opening KOA and KOB.
- the incident side opening KI is provided at a position where the EUV light incident on the rotary foil trap 22 is not shielded.
- the exit side opening KOA is provided at a position where EUV light that passes through the incident side opening KI and the rotary foil trap 22 and is incident on the fixed foil trap 24 is not blocked.
- the exit side opening KOB is provided at a position where EUV light that passes through the incident side opening KI and the rotary foil trap 22 and is incident on the monitoring device 43 is not shielded from light.
- At least a part of the debris DB captured by the rotary foil trap 22 moves radially on the blade 51 of the rotary foil trap 22 by centrifugal force, separates from the end of the blade 51, and is separated from the end of the blade 51 to cover member 25. Adheres to the inner surface.
- the cover member 25 is heated by a heating means (not shown) or secondary radiation from a heat shield plate 23 that receives EUV radiation, and the debris DB adhering to the inner surface of the cover member 25 due to the heating does not solidify and is in a liquid phase state. To hold.
- the debris DB adhering to the inner surface of the cover member 25 gathers at the lower part of the cover member 25 due to gravity, is discharged from the lower part of the cover member 25 to the outside of the cover member 25 via the discharge pipe 26, and becomes a waste raw material. It is housed in 4. As a result, the cover member 25 can prevent the debris DB separated from the end of the blade 51 of the rotary foil trap 22 from being scattered inside the connection chamber 21.
- the debris storage unit 4 includes a debris storage container 31.
- the debris storage container 31 is arranged outside the connection chamber 21 and is attached to the connection chamber 21.
- the debris storage container 31 stores the debris DB and the container SU containing the waste raw material.
- a through hole 37 is formed in the bottom wall of the connection chamber 21 to communicate the internal space of the debris storage container 31 and the internal space of the connection chamber 21.
- the debris storage container 31 is provided with a flange 32 at the top. The opening of the debris storage container 31 surrounded by the flange 32 is overlapped with the through hole 37 of the connection chamber 21. Then, the flange 32 is fixed to the bottom wall of the connection chamber 21, for example, with a screw, so that the debris storage container 31 is attached to the connection chamber 21. The gap between the flange 32 and the bottom wall of the connecting chamber 21 is sealed by the gasket 33.
- the heat shield plate 23 is arranged above the through hole 37 in an upright state.
- the discharge port of the discharge pipe 26 is arranged above the through hole 37. At this time, the debris storage container 32 is arranged at the drop position of the debris DB from the heat shield plate 23 and the discharge pipe 26.
- the waste raw material discharged to the outside of the cover member 25 via the discharge pipe 26 falls in the direction of gravity and is stored in the debris storage container 31 arranged below the connection chamber 21 (lower side of FIG. 2).
- the debris DB emitted from the plasma P in various directions enters the connection chamber 21 through the window portion 17 of the chamber 11, it is deposited on the surface of the heat shield plate 23 facing the window portion 17.
- the debris DB deposited on the heat shield plate 23 is melted by radiation from the plasma P, and when it reaches a certain amount, it becomes droplets and moves below the heat shield plate 23 by gravity. Then, the debris DB that has moved below the heat shield plate 23 separates from the heat shield plate 23 and falls below the connection chamber 21, so that the debris DB is stored in the debris storage container 31.
- the heat shield plate 23 limits EUV radiation from the plasma P to the rotary wheel trap 22 to prevent the rotary wheel trap 22 from overheating, and the EUV light emitted from the plasma P by the opening KA. Not only a part of the debris DB is taken out, but also the debris DB traveling toward the rotary wheel trap 22 is reduced as much as possible, and the load of the rotary wheel trap 22 is reduced.
- a part of the plasma raw materials (tin) SA and SB supplied to the discharge unit may leak.
- a part of the plasma raw materials SA and SB may leak from the container CA and CB. Since the leaked plasma raw materials SA and SB do not contribute to the generation of plasma P, they are waste raw materials.
- the plasma raw materials SA and SB leaked from the discharge portion described above are collected by a surrounding member (not shown).
- a receiving plate member (shovel) 18 is installed in the connection chamber 21 in order to guide the plasma raw materials SA and SB collected as waste raw materials by the surrounding member to the debris storage container 31.
- the receiving plate member 18 is supported in an inclined posture so as to be hung from the window portion 17 to the through hole 37.
- the receiving plate member 18 is heated by a heating means (heater) (not shown) so that the plasma raw materials SA and SB collected as waste raw materials are maintained above the melting point on the receiving plate member 18. Then, the plasma raw materials SA and SB collected as waste raw materials by the surrounding member and a part of the debris DB that has invaded the connection chamber 21 are guided by the receiving plate member 18 and fall into the debris storage container 31.
- the debris storage container 31 can also be called a tin recovery container.
- a heater wiring 34 as a heating means for heating the debris storage container 31 is wound around the debris storage container 31.
- the heating means may be embedded in the main body of the debris storage container 31. While the EUV light source device 1 is in operation, the inside of the debris storage container is heated to a temperature equal to or higher than the melting point of tin by supplying power to the heater wiring 34, and the tin accumulated inside the debris storage container 31 is made into a liquid phase.
- the reason why the tin inside the debris storage container 31 is used as the liquid phase is that when the debris DB accumulated inside the debris storage container 31 solidifies, the accumulation at the point where the debris DB tends to fall is as if it were a stalagmite in a limestone cave. Because it grows like that.
- the discharge pipe 26 of the cover member 25 is blocked by the debris DB, and the debris DB is accumulated in the cover member 25.
- the debris DB accumulated in the cover member 25 may come into contact with the rotary foil trap 22 to hinder the rotation of the rotary foil trap 22 or damage the rotary foil trap 22. be.
- a part of the exit side openings KOA and KOB provided in the cover member 25 is blocked by the debris DB accumulated in the cover member 25, and one of the EUV light passing through the exit side openings KOA and KOB.
- the part may be blocked. Therefore, by making the tin contained inside the debris storage container 31 into a liquid phase, the tin is flattened in the debris storage container 31 and tin is placed in the debris storage container 31 while avoiding growth like a stalagmite. It can be stored.
- the power supply to the heater wiring 34 is stopped to stop the heating inside the debris storage container 31. Then, the temperature of the debris storage container 31 reaches room temperature to solidify the tin stored in the debris storage container 31, and then the inside of the connection chamber 21 is returned to atmospheric pressure. After that, the debris storage container 31 is removed from the connection chamber 21, and a new debris storage container in which tin is not accumulated is attached to the connection chamber 21.
- the tin inside the debris storage container 31 removed from the connection chamber 21 is in a solid phase, but by reheating the debris storage container 31 to make the tin inside into a liquid phase again, the debris storage container 31 Tin can be taken out from.
- the debris storage container 31 removed from the connection chamber 21 and having tin removed from the inside can be reused.
- a monitoring device 43 for monitoring EUV light is arranged outside the connection chamber 21.
- the monitoring device 43 is a detector that detects EUV light or a measuring device that measures the intensity of EUV light.
- An EUV light guide hole 28, which is a through hole through which EUV light passes, is formed on the wall of the connection chamber 21, and EUV light leaks out of the connection chamber 21 between the EUV light guide hole 28 and the monitoring device 43.
- a guide pipe 29 is provided to pass through without passing through.
- the heat shield plate 23 is provided with an opening KB having an arbitrary shape (for example, a circle) for extracting a part of EUV light emitted from the plasma P at a position different from the opening KA.
- a monitoring device 43, an EUV optical guide hole 28, and a guide tube 29 are arranged on an extension of a straight line connecting the plasma P and the center of the opening KB. Therefore, a part of the EUV light emitted from the plasma P includes the window portion 17 of the chamber 11, the opening KB of the heat shield plate 23, the incident side opening KI of the cover member 25, and the plurality of blades of the rotary foil trap 22.
- the rotary foil trap 22 has a plurality of foils (blades) 51 arranged radially at substantially equal angular intervals.
- Each blade 51 is a thin film or a thin flat plate made of a refractory metal. More specifically, each blade 51 is made of, for example, a molybdenum thin plate manufactured by tensile processing by rolling a plurality of times, and the thickness thereof is, for example, 0.1 to 0.3 mm.
- the blade 51 may also be made of a rolled thin plate made of tungsten.
- a problem occurs in which a part of the blades breaks, for example, in the vicinity of a hub (rotary shaft) after a relatively short operation time.
- the operation referred to here means an operation of rotating the rotary foil trap during the EUV light emission operation of the EUV light source device to capture debris.
- the above problem occurs only in some rotary foil traps, and in a relatively large number of rotary foil traps, the problem occurs even after several times the usage time of the rotary foil trap in which the above problem occurred. There wasn't.
- the present inventor investigated the degree of occurrence of defects in a plurality of rotary foil traps manufactured in the same lot. As a result, it was found that this defect does not occur in all rotary foil traps manufactured in the same lot (especially blades manufactured in the same lot).
- the present inventor further investigated the rotary foil traps manufactured in the same lot, and investigated the relationship between the rolling direction of the rolled thin plate made of refractory metal constituting the blade and the shape of the blade.
- the direction of tension processing by rolling is referred to as "rolling direction". More specifically, as shown in FIG. 6, the “rolling direction” refers to the direction in which the crystal grains 101 of the metal rolled thin plate 100 are elongated (the major axis direction of the crystal grains 101).
- the rolling direction in which the crystal grains 101 are more elongated is called the rolling direction.
- the crystal structure of the rolled metal plate 100 can be easily observed by an SEM (Scanning Electron Microscope) or the like.
- the longitudinal direction of the blade is the long side direction of the blade 51A, and the direction A substantially orthogonal to the rotation axis JM of the rotary foil trap 22A.
- the lateral direction of the blade is the short side direction of the blade 51A, and is the direction B substantially parallel to the rotation axis JM of the rotary wheel trap.
- the rolling direction of all the blades in which defects such as breakage occurred almost coincided with the blade short direction. It turned out.
- the force applied to each blade of the rotary foil trap is centrifugal force.
- the direction of the centrifugal force is a direction parallel to the blade longitudinal direction A.
- the direction of the centrifugal force is orthogonal to the rotation axis JM and goes outward from the rotation axis JM. It becomes the direction F.
- a tensile test in the direction of tensile processing (rolling direction) and a tensile test in a direction other than the rolling direction were performed on a rolled sheet made of refractory metal formed by tensile processing by rolling.
- the direction other than the rolling direction was set to be orthogonal to the rolling direction.
- a metal rolled thin plate used as a test sample for the tensile test a rolled thin plate made of molybdenum and having a thickness of 0.15 mm was used.
- FIG. 8A is a diagram showing a tensile test in the rolling direction R of the metal rolled thin plate 100
- FIG. 8B is a diagram showing a tensile test in a direction orthogonal to the rolling direction R of the metal rolled thin plate 100.
- the maximum value of the tensile test force T until the metal rolled thin plate 100 breaks is 1.04 kN, and the tensile strength is It was 680 MPa. That is, it was found that the tensile strength in the rolling direction R was about 120 MPa stronger than the tensile strength in the direction orthogonal to the rolling direction R.
- the rotary wheel trap is the rotary wheel trap. It was also found that it was clearly larger than the magnitude of the centrifugal force applied to each blade during the rotational operation.
- the magnitude of the centrifugal force applied to each blade during the rotational operation of the rotary foil trap is calculated to be about 60 N. Therefore, it is considered that the above-mentioned defect is not only due to the centrifugal force but also a defect that occurs during light emission peculiar to the EUV light source device. Actually, when the rotary foil trap was rotated independently without the EUV emission operation and the state of occurrence of the defect was investigated, the centrifugal force direction F acting on the blade and the rolling direction R of the blade did not match. However, no problems such as blade breakage were confirmed (even if they were orthogonal).
- the rotary foil trap 22 which is a part of the debris reduction device is arranged in the connection chamber 21. Its position is relatively close to the plasma P generated in the chamber 11, and the rotary foil trap 22 receives the heat radiated from the plasma P. Therefore, the temperature of the rotary foil trap 22 becomes high while the EUV light source device 1 is in operation. As described above, in order to prevent the rotary foil trap 22 from overheating, a heat shield plate 23 is arranged in the connection chamber 21. After the EUV light source device 1 was stopped, when each blade 51 made of molybdenum (Mo) of the rotary foil trap 22 was observed, Mo was not recrystallized.
- Mo molybdenum
- the temperature of the rotary foil trap 22 is suppressed to less than the recrystallization temperature of Mo by the heat shield plate 23.
- the debris (tin) captured by each blade 51 moves radially outward on the blade 51 of the rotary foil trap 22 by centrifugal force without solidifying, separates from the end of the blade 51, and covers. It adheres to the inner surface of the member 25. Therefore, the rotary foil trap 22 is kept at a temperature higher than the melting point of tin (about 232 ° C.). That is, it is considered that the temperature of the rotary foil trap 22 is 250 to 800 ° C.
- each blade 51 of the rotary foil trap 22 collides with the debris.
- the debris obtains a large amount of kinetic energy through the contraction and expansion processes of the plasma P, and high-speed neutral atoms and the like contained in the debris collide with each blade 51.
- the plasma P is generated by injecting electric energy into the plasma raw material (tin) by electric discharge between the electrodes and exciting the plasma raw material. At that time, since the plasma raw material is excited to various levels, not only EUV light but also light of various wavelengths is emitted from the plasma P.
- each blade of the rotary foil trap emits heat from the plasma P, collides with debris containing fast neutral atoms (tin), EUV light and light of other wavelengths. It receives various loads of irradiation. Therefore, when the direction of the centrifugal force acting on the blade is different from the rolling direction of the blade (for example, the direction orthogonal to the rolling direction), the tensile strength is relatively weak and the load is affected. As a result, it is probable that a problem occurred in which the blade broke after a relatively short period of operation. Further, since the blade breakage occurs in the vicinity of the hub (rotating shaft) that is not directly exposed to EUV light, it is considered that the influence of heat and debris (particularly heat) is large among the above loads.
- the present inventor is a rotary wheel trap that is arranged in a high temperature environment in the vicinity of the plasma and rotates, transmits the light emitted from the plasma, and captures the debris emitted from the plasma.
- a new finding was obtained that when the rolling direction of the blade and the direction of the centrifugal force acting on the blade are different (orthogonal or substantially orthogonal), a peculiar defect such as foil breakage occurs in a short period of time. It was also found that the above-mentioned problems can be suppressed by matching the rolling direction of the blade with the centrifugal force direction acting on the blade.
- the rotary foil trap is not necessarily configured so that the blade longitudinal direction A is orthogonal to the rotation axis JM as shown in FIG. 7.
- the blade 51 may be arranged so that the blade longitudinal direction A is slanted with respect to the rotation axis JM. Also in this case, as shown in FIG. 9, it is preferable that the rolling direction R of the blade 51 coincides with the centrifugal force direction F (blade longitudinal direction A) acting on the blade 51.
- the rotary wheel trap 22 In the case of the rotary wheel trap 22 in which the blade 51 is arranged so that the blade longitudinal direction A is slanted with respect to the rotation axis JM as described above, the rotary wheel trap 22 is compared with the rotary wheel trap 22A shown in FIG. It is possible to increase the probability of debris being captured by the blade at a point far from the rotation axis JM. This point will be described below.
- the longitudinal direction of the blade is orthogonal to the rotation axis JM as shown by the broken line in FIG.
- the plasma P side end of the blade is closer to the plasma P.
- the difference between the distance Pd1'from the plasma P to the plasma P side end of the blade 51A and the distance Pd1 from the plasma P to the plasma P side end of the blade 51 is small.
- the distance Pd2 is significantly shorter than the distance Pd2'.
- the blade longitudinal direction is configured to be oblique with respect to the rotation axis JM as shown by the solid line in FIG. 9, the distance between adjacent blades at a point farther than the rotation axis JM is the plasma P. As shown by the broken line in FIG. 9, it is narrower than the case where the blade longitudinal direction is configured to be orthogonal to the rotation axis JM. Therefore, it is possible to increase the probability of debris being captured by the blade at a point far from the rotation axis JM.
- the rolling direction of the blade which is a rolled thin plate constituting the rotary foil trap, and the centrifugal force direction applied to the blade during the rotational operation of the rotary foil trap are the same.
- the relationship between the shape of each blade and the rolling direction is not always the desired relationship.
- the desired relationship is such that when the blades are attached to the rotary foil trap and rotated, the rolling direction of the blades and the centrifugal force direction acting on the blades coincide with each other.
- ⁇ indicates the degree of deviation between the rolling direction of the blade and the centrifugal force direction acting on the blade, and is defined by the angle formed by the rolling direction R and the centrifugal force direction F as shown in FIG. ..
- ⁇ indicates a case where the blade does not break
- ⁇ indicates a case where the blade breaks.
- the operating conditions were 9 kW for the input power to the electrodes and 8 hours for the operating time per day.
- the angle ⁇ formed by the rolling direction R and the centrifugal force direction F is preferably 0 ° or more and 20 ° or less.
- the rotary wheel trap 22 in the present embodiment is arranged in the vicinity of the plasma P generated by the light source unit 2 which is the plasma generating unit, rotates and operates, and transmits the light radiated from the plasma P. , Capture the debris emitted from the plasma P.
- the rotary foil trap 22 has a plurality of foils 51 that can rotate about an axis passing through the plasma P as a rotation axis, and a hub (support member) 53 that is arranged on the rotation axis and supports the foil (blade) 51. ..
- the blade 51 is a rolled thin plate stretched by rolling, and is configured such that the centrifugal force direction F applied to the blade 51 by the rotational operation coincides with or substantially coincides with the rolling direction R of the blade 51.
- the angle formed by the centrifugal force direction F and the rolling direction R is preferably 0 ° or more and 20 ° or less.
- the thickness of the blade 51 is set to, for example, 0.15 mm, so that the occurrence of problems such as breakage of the foil (blade) is suppressed while maintaining high transmittance of EUV light. It can be a rotary foil trap having a relatively long operating life.
- the LPP method is a method in which a driver laser for plasma generation is irradiated on a target material to excite the target material to generate plasma.
- the light source device provided with the rotary wheel trap 22 is an EUV light source device
- the light source device includes a VUV light source device for extracting VUV (vacuum ultraviolet light) and X-rays. It may be an X-ray generator to be taken out.
- this VUV light source device can also be used as a surface modification light source for a substrate, an ozone generation light source, and a substrate bonding light source.
- this X-ray generator should be used for chest X-ray photography, dental X-ray photography, CT (Computer Tomogram), etc. in the medical field.
- this X-ray generator can also be used for applications such as non-destructive inspection for observing the inside of substances such as structures and welds, and non-destructive inspection for faults. Further, in the field of research, this X-ray generator is used for applications such as X-ray analysis for analyzing the crystal structure of a substance and X-ray spectroscopy (fluorescent X-ray analysis) for analyzing constituent elements of a substance. You can also do it.
- EUV light source device Extreme ultraviolet light source device
- Light source unit 2
- Light source unit 3
- Debris reduction unit 4
- Debris accommodating unit 11 ... Chamber, 21 ... Connection chamber, 22
- Rotary foil trap 23
- Heat shield Plate 24
- Fixed foil trap 31
- Debris storage container 51
- Foil 52
- Outer ring 53
- Hub DB
- Debris F
- Centrifugal force direction R ... Rolling direction
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Abstract
Description
EUV光源装置において、EUV光(EUV放射)を発生させる方法はいくつか知られている。それらの方法のうちの一つに、極端紫外光放射種(以下、「EUV放射種」ともいう。)を加熱して励起することにより高温プラズマを発生させ、その高温プラズマからEUV光を取り出す方法がある。
DPP方式のEUV光源装置は、EUV放射種(気相のプラズマ原料)を含む放電ガスが供給された電極間の間隙に高電圧を印加して、放電により高密度高温プラズマを生成し、そこから放射される極端紫外光を利用するものである。DPP方式としては、例えば、特許文献1(特開2017-219698号公報)に記載されているように、放電を発生させる電極表面に液体状の高温プラズマ原料(例えば、Sn(スズ))を供給し、当該原料に対してレーザビーム等のエネルギービームを照射して当該原料を気化し、その後、放電によって高温プラズマを生成する方法が提案されている。このような方式は、LDP(Laser Assisted Discharge Plasma)方式と呼ばれることもある。
EUV光は大気中では減衰しやすいので、プラズマから利用装置までは、減圧雰囲気つまり真空環境におかれている。
複数のホイルにより細かく分割された各空間においては、当該空間でのコンダクタンスを下げて圧力を上げる機能が奏される。デブリがこれらのホイルにより分割された各空間(圧力が上昇した領域)を進行すると、この圧力が上昇した領域におけるデブリと雰囲気ガスとの衝突確率が上がる。その結果、デブリの飛散速度が低下し、またデブリの進行方向が変わるため、デブリはデブリ低減装置に捕捉される。
なお、一つのデブリ低減装置は、回転式ホイルトラップと固定式ホイルトラップとの双方を備えていてもよいし、いずれか一方のみを備えていてもよい。
上記不具合は、一部の回転式ホイルトラップのみで発生し、比較的多くの回転式ホイルトラップでは、上記不具合が発生した回転式ホイルトラップよりも数倍の使用時間を経ても上記不具合は発生していなかった。
そこで、同一ロットで製造した複数の回転式ホイルトラップについて、不具合の発生度合いを調査した。その結果、この不具合は同一ロットで製造した全ての回転式ホイルトラップ(特に、同一ロットで製造したホイル)で発生するわけではないことが分かった。具体的には、同一ロットで製造した回転式ホイルトラップのうち、ある回転式ホイルトラップでは約44時間後にホイルの一部が破断したが、約2ヵ月稼働しても一切ホイルの破断が発生しない回転式ホイルトラップも存在した。
この場合、回転式ホイルトラップの回転動作に伴うホイルの破断等の不具合の発生を確実に抑制することができる。
この場合、ホイルに付着した原料(デブリ)が液化して、液滴となったデブリが回転するホイル上を遠心力により回転の半径方向に移動してホイル外に離脱するため、ホイル上にデブリが堆積しないようにすることができる。そして、このような高温環境下で回転式ホイルトラップを回転動作させた場合であっても、当該回転動作に伴うホイルの破断等の不具合の発生を適切に抑制することができる。
この場合、結晶粒の長径方向が遠心力方向と一致または略一致するように構成することができる。ホイルの圧延方向は、SEM(Scanning Electron Microscope)等により容易に判断することができる。
これにより、比較的長期間の稼働寿命を有する回転式ホイルトラップを備えた光源装置(極端紫外光光源装置)とすることができる。
上記した本発明の目的、態様及び効果並びに上記されなかった本発明の目的、態様及び効果は、当業者であれば添付図面及び請求の範囲の記載を参照することにより下記の発明を実施するための形態(発明の詳細な説明)から理解できるであろう。
具体的には、EUV光源装置1は、放電を発生させる一対の放電電極EA、EBの表面にそれぞれ供給された液相のプラズマ原料SA、SBにレーザビームLB等のエネルギービームを照射して当該プラズマ原料SA、SBを気化させる。その後、放電電極EA、EB間の放電領域Dの放電によってプラズマPを発生させる。プラズマPからはEUV光が放出される。
このように各放電電極EA、EBは、個別のモータMA、MBによって回転軸JA、JBを介してそれぞれ駆動される。これらのモータMA、MBの回転駆動は、制御部12によって制御される。
ここで、可動ミラー16の姿勢を調整することにより、放電電極EAにおける赤外レーザビームLBの照射位置が調整される。可動ミラー16の姿勢の調整は、作業員が手動で実施してもよいし、後述する監視装置43からのEUV光の強度情報に基づき、制御部12が可動ミラー16の姿勢制御を行ってもよい。この場合、可動ミラー16は、図示を省略した可動ミラー駆動部により駆動される。
放電領域D付近の放電電極EAの外周面に付着された液相のプラズマ原料SAは、レーザビームLBの照射により気化され、気相のプラズマ原料SAとして放電領域Dに供給される。
パルス電力供給部13は、チャンバ11の外部に配置される。パルス電力供給部13から延びる給電線は、フィードスルーFA、FBを通過して、チャンバ11の内部に延びる。フィードスルーFA、FBは、チャンバ11の壁に埋設されてチャンバ11内の減圧雰囲気を維持するシール部材である。なお、プラズマPを発生させるためのレーザ源14の動作およびパルス電力供給部13の動作は、制御部12により制御される。
これらのデブリDBは、プラズマPの収縮および膨張過程を経て、大きな運動エネルギーを得る。すなわち、プラズマPから発生するデブリDBは、高速で移動するイオン、中性原子および電子を含み、このようなデブリDBは、利用装置42に到達すると、利用装置42内の光学素子の反射膜を損傷または汚染させ、性能を低下させることがある。
図3において、回転式ホイルトラップ22は、複数のホイル(ブレード)51と、外側リング52と、中心のハブ(支持部材)53と、を備える。外側リング52はハブ53に同心であり、各ブレード51は、外側リング52とハブ53との間に配置されている。ここで、各ブレード51は、薄膜または薄い平板である。各ブレード51は、ほぼ等しい角間隔をおいて放射状に配置される。各ブレード51は、ハブ53の中心軸線JMを含む平面上にある。回転式ホイルトラップ22の材料は、例えば、タングステンおよび/またはモリブデンなどの高融点金属である。
すなわち、図2に示すように、各ブレード51がハブ53の中心軸線JMを含む平面上に配置された回転式ホイルトラップ22は、ハブ53の中心軸線JMの延長線上にプラズマP(発光点)が存在するように配置される。これにより、ハブ53および外側リング52を除けば、EUV光は各ブレード51の厚みの分のみ遮光され、回転式ホイルトラップ22を通過するEUV光の割合(透過率ともいう)を最大にすることが可能となる。
開口部KAは、回転式ホイルトラップ22の回転軸JMから偏心した位置に設けられる。このとき、プラズマPから放出されるEUV光の一部は、開口部KAを介し、回転式ホイルトラップ22の回転軸方向(図2における左右方向)に対して傾斜角度をもって所定の立体角で遮熱板23から取り出される。
また、固定式ホイルトラップ24は、遮熱板23の開口部KAにより進行方向が制限されたEUV光であるEUV取出光が通過する領域に対応させた形状を備える。
図4および図5において、固定式ホイルトラップ24は、複数のホイル61と、ホイル61を支持する固定枠(固定部材)60とを備える。
ホイル61は、図5に示すように、EUV取出光の主光線UL方向に直交する断面において、それぞれ等間隔に配置される。また、固定枠60は、例えば、正面から見て矩形状となっている。なお、固定枠60の外形は、任意の形状であってよい。さらに、複数のホイル61は、図4に示すように、主光線UL方向に直交する方向から見ると、EUV取出光の光線方向に伸びるように放射状に配置される。
カバー部材25は、図示を省略した加熱手段またはEUV放射を受ける遮熱板23からの二次輻射によって加熱され、当該加熱によりカバー部材25の内面に付着したデブリDBは固化せず、液相状態を保持する。カバー部材25の内面に付着したデブリDBは、重力によりカバー部材25の下部に集まり、カバー部材25の下部から排出管26を介してカバー部材25の外に排出されて廃原料となり、デブリ収容部4に収容される。これにより、カバー部材25は、回転式ホイルトラップ22のブレード51の端部から離脱したデブリDBが接続チャンバ21の内部に飛散するのを防止することができる。
EUV光源装置1の稼働中では、ヒータ配線34に給電することによって、デブリ収容容器の内部は、スズの融点以上に加熱され、デブリ収容容器31内部に蓄積されたスズは液相にされる。
あるいは、カバー部材25に設けられている出射側開口部KOA、KOBの一部がカバー部材25内に蓄積されたデブリDBにより封鎖されて、出射側開口部KOA、KOBを通過するEUV光の一部が遮られることもある。
よって、デブリ収容容器31の内部の収容物であるスズを液相にすることで、デブリ収納容器31内でスズを平坦化し、石筍のような成長を回避しながらデブリ収納容器31内にスズを貯蔵することが可能となる。
接続チャンバ21から取り外されたデブリ収容容器31の内部のスズは固相になっているが、そのデブリ収容容器31を再加熱して内部のスズを再度液相とすることによって、デブリ収容容器31からスズを取り出すことができる。接続チャンバ21から取り外し、内部からスズを除去したデブリ収容容器31は再利用することができる。
プラズマPと開口部KBの中心部を結ぶ直線の延長線上には、監視装置43、EUV光案内孔28および案内管29が配置されている。従って、プラズマPから放出されるEUV光の一部は、チャンバ11の窓部17、遮熱板23の開口部KB、カバー部材25の入射側開口部KI、回転式ホイルトラップ22の複数のブレード51の隙間、カバー部材25の出射側開口部KOB、接続チャンバ21の壁のEUV光案内孔28および案内管29の内腔を順次通過して、監視装置43に到達する。このようにして、EUV光を監視装置43によって監視することができる。
上記不具合は、一部の回転式ホイルトラップのみで発生し、比較的多くの回転式ホイルトラップでは、上記不具合が発生した回転式ホイルトラップよりも数倍の使用時間を経ても不具合が発生していなかった。そのため、上記不具合は回転式ホイルトラップの稼働寿命によるものとは考えにくく、本発明者は、ある特定の同一ロットで製造された回転式ホイルトラップにおいて起こる不具合ではないかと考えた。
そこで、本発明者は、同一ロットで製造された複数の回転式ホイルトラップについて、不具合の発生度合いを調査した。その結果、この不具合は同一ロットで製造された全ての回転式ホイルトラップ(特に、同一ロットで製造したブレード)で発生するわけではないことが分かった。
なお、ここでは、圧延により引張加工された方向を「圧延方向」と称することにする。より具体的には、「圧延方向」とは、図6に示すように、金属製圧延薄板100の結晶粒101が伸長している方向(結晶粒101の長径方向)をいう。引張加工する方向を変えて複数回の圧延を行っている場合には、より結晶粒101が伸長している方向を圧延方向という。
金属製圧延薄板100の結晶構造は、SEM(Scanning Electron Microscope)等により容易に観察することが可能である。
ここで、図7に回転式ホイルトラップ22Aを模式的に示すように、ブレードの長手方向とは、ブレード51Aの長辺方向であり、回転式ホイルトラップ22Aの回転軸JMにほぼ直交する方向Aである。また、ブレードの短手方向とは、ブレード51Aの短辺方向であり、回転式ホイルトラップの回転軸JMにほぼ平行な方向Bである。
回転式ホイルトラップの回転動作中に、回転式ホイルトラップの各ブレードにかかる力は遠心力である。ここで、遠心力の方向は、ブレード長手方向Aと平行な方向である。図7に示す回転式ホイルトラップ22Aのようにブレード長手方向Aが回転軸JMに対して直交する場合、遠心力の方向は、回転軸JMに対して直交し、回転軸JMから外方に向かう方向Fとなる。
つまり、ブレードの圧延方向が、回転式ホイルトラップが回転動作した際にブレードに作用する遠心力方向Fとほぼ直交する場合に、回転式ホイルトラップの回転動作に伴うブレードの破断等の不具合が発生していることが分かった。
図8Aに示すように、圧延方向Rの引張試験を行った結果、金属製圧延薄板100が破断に至るまでの引張試験力Tの最大値は1.22kN、引張強度は801MPaであった。一方、図8Bに示すように、圧延方向Rに直交する方向の引張試験を行った結果、金属製圧延薄板100が破断に至るまでの引張試験力Tの最大値は1.04kN、引張強度は680MPaであった。
すなわち、圧延方向Rの引張強度は、圧延方向Rに直交する方向の引張強度よりも約120MPa強いことが分かった。
また同時に、圧延方向Rの引張試験力Tの最大値である1.22kNのみならず、圧延方向Rに直交する方向の引張試験力Tの最大値である1.04kNは、回転式ホイルトラップの回転動作中に各ブレードにかかる遠心力の大きさよりも明らかに大きいことも分かった。
したがって、上記不具合は、単なる遠心力のみによるものではなく、EUV光源装置特有の発光中に発生する不具合であると考えられる。
実際に、EUV発光動作をせずに回転式ホイルトラップを単独で回転させて不具合の発生状況を調査したところ、ブレードに作用する遠心力方向Fとブレードの圧延方向Rとが一致していなくても(直交していても)、ブレードの破断等の不具合は確認されなかった。
上記のように、回転式ホイルトラップ22の過熱を防止するため、接続チャンバ21内には遮熱板23が配置されている。EUV光源装置1の停止後、回転式ホイルトラップ22のモリブデン(Mo)製の各ブレード51を観察したところ、Moの再結晶化には至っていなかった。このことから、遮熱板23により、回転式ホイルトラップ22の温度は、Moの再結晶化温度未満に抑えられていることがわかる。
一方で、各ブレード51が捕捉したデブリ(スズ)は、固化することなく遠心力により回転式ホイルトラップ22のブレード51上を径方向外側に移動し、ブレード51の端部から離脱して、カバー部材25の内面に付着する。よって、回転式ホイルトラップ22は、スズの融点(約232℃)よりも高い温度に保たれている。
つまり、回転式ホイルトラップ22の温度は250~800℃になっているものと考えられる。
さらに、プラズマPは、電極間の放電によりプラズマ原料(スズ)に電気エネルギーが注入され、プラズマ原料が励起されることで生成される。その際、プラズマ原料は様々な準位に励起されるので、プラズマPからはEUV光のみならず、様々な波長の光が放射される。
そのため、ブレードに作用する遠心力方向がブレードの圧延方向とは異なる方向(例えば圧延方向に直交する方向)である場合には、引張強度が比較的弱いことに加えて上記負荷の影響を受けることにより、比較的短時間の稼働にてブレードが破断するという不具合が発生したものと考えられる。また、ブレードの破断は、EUV光が直接当たらないハブ(回転軸)近傍で発生していることから、上記負荷のうち、熱とデブリ(特に熱)の影響が大きいものと考えられる。
例えば図9の実線で示す回転式ホイルトラップ22のように、ブレード長手方向Aが回転軸JMに対して斜めになるようにブレード51が配置される場合もある。この場合にも、図9に示すように、ブレード51の圧延方向Rは、ブレード51に作用する遠心力方向F(ブレード長手方向A)と一致することが好ましい。
そのため、図9の実線で示すようにブレード長手方向が回転軸JMに対して斜めになるように構成されている場合、回転軸JMよりも遠い地点での隣り合うブレード間の間隔は、プラズマPから望むと、図9の破線で示すようにブレード長手方向が回転軸JMと直交するように構成されている場合よりも、より狭くなる。したがって、回転軸JMから遠い地点におけるブレードによるデブリの捕捉確率を高めることができる。
ここで、所望の関係とは、各ブレードを回転式ホイルトラップに取り付けて回転動作をさせた際、ブレードの圧延方向とブレードに作用する遠心力方向とが一致するような関係である。
図11において、θは、ブレードの圧延方向とブレードに作用する遠心力方向とのずれ具合を示しており、図10に示すように、圧延方向Rと遠心力方向Fとのなす角度で定義した。また、この図11において、「〇」はブレードの破断が発生しなかった場合、「×」はブレードの破断が発生した場合を示す。
なお、稼働条件は、電極への入力電力を9kW、1日あたりの稼働時間を8hとした。
一方、θ=0°、θ=8°、θ=20°の場合は、累積稼働時間が約64時間に到達しても破断は発生しなかった。これらの3つの水準においては、更に累積稼働時間が約2ヵ月となるまで継続したが、不具合は発生しなかった。
このように、少なくともθが0°以上20°以下の場合は、上記不具合が確実に抑制されることが確認できた。したがって、圧延方向Rと遠心力方向Fとのなす角度θは、0°以上20°以下とすることが好ましい。
そして、ブレード51は、圧延により引張加工された圧延薄板であって、回転動作によって当該ブレード51にかかる遠心力方向Fと、ブレード51の圧延方向Rとが一致または略一致するように構成されている。ここで、遠心力方向Fと圧延方向Rとのなす角は、0°以上20°以下であることが好ましい。
なお、ブレード51の破断等の不具合を回避するためには、ブレード51の厚みを厚くして強度を上げることも考えられる。しかしながら、回転式ホイルトラップ22においては、EUV光は各ブレード51の厚み分だけ遮光される。そのため、回転式ホイルトラップ22を通過するEUV光の割合(透過率)を、例えば90%といった高い透過率で維持するためには、各ブレード51の厚みを厚くすることはできない。
本実施形態における回転式ホイルトラップ22は、ブレード51の厚みを例えば0.15mmとすることでEUV光の高い透過率を維持しつつ、ホイル(ブレード)の破断といった不具合の発生が抑制された、比較的長期間の稼働寿命を有する回転式ホイルトラップとすることができる。
上記実施形態においては、高温プラズマ原料に照射するエネルギービームとしてレーザを用いる場合について説明したが、レーザに代えてイオンビームや電子ビーム等を用いることもできる。
また、上記実施形態においては、DPP方式のEUV光源装置に適用する場合について説明したが、LPP方式のEUV光源装置にも適用可能である。なお、LPP方式とは、プラズマ生成用ドライバレーザをターゲット材料に照射し、当該ターゲット材料を励起させてプラズマを生成する方式である。
光源装置をVUV光源装置として機能させる場合、このVUV光源装置は、基板の表面改質用光源、オゾン発生用光源、基板の貼り合わせ用光源として用いることもできる。
一方、光源装置をX線発生装置として機能させる場合、このX線発生装置は、医療用分野においては、胸部X線写真撮影や、歯科X線写真撮影、CT(Computer Tomogram)といった用途に用いることもできる。また、このX線発生装置は、工業用分野においては、構造物や溶接部などの物質内部を観察する非破壊検査、断層非破壊検査といった用途に用いることもできる。さらに、このX線発生装置は、研究用分野においては、物質の結晶構造を解析するためのX線解析、物質の構成元素を分析するためのX線分光(蛍光X線分析)といった用途に用いることもできる。
Claims (6)
- プラズマ発生部が発生させるプラズマの近傍に配置されて回転動作し、前記プラズマから放射される光を透過し、当該プラズマから放出されるデブリを捕捉する回転式ホイルトラップであって、
複数のホイルと、
前記ホイルを支持する支持部材と、を有し、
前記ホイルは、圧延により引張加工された圧延薄板であり、
前記回転動作によって当該ホイルにかかる遠心力の方向と、前記ホイルの前記引張加工された方向である圧延方向とが一致または略一致していることを特徴とする回転式ホイルトラップ。 - 前記遠心力の方向と前記圧延方向とのなす角が、0°以上20°以下であることを特徴とする請求項1に記載の回転式ホイルトラップ。
- 前記プラズマ発生部は、前記光を放射する原料を励起し、前記プラズマを発生させるように構成されており、
前記ホイルは、前記原料の融点に相当する温度以上の状態で回転動作することを特徴とする請求項1または2に記載の回転式ホイルトラップ。 - 前記圧延方向は、前記圧延薄板を構成する結晶粒が伸長している方向であることを特徴とする請求項1または2に記載の回転式ホイルトラップ。
- 請求項1または2に記載の回転式ホイルトラップと、
前記プラズマ発生部と、を備えることを特徴とする光源装置。 - 前記光は、極端紫外光を含むことを特徴とする請求項5に記載の光源装置。
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JP2020195077A JP7347402B2 (ja) | 2020-11-25 | 2020-11-25 | 回転式ホイルトラップおよび光源装置 |
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US (1) | US20240004317A1 (ja) |
EP (1) | EP4235304A1 (ja) |
JP (1) | JP7347402B2 (ja) |
KR (1) | KR20230097183A (ja) |
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WO (1) | WO2022113443A1 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2006196890A (ja) * | 2004-12-28 | 2006-07-27 | Asml Netherlands Bv | 放射ビームから粒子をフィルタ除去するように動作可能なフィルタ・システムを提供する方法、フィルタ・システム、装置、及びフィルタ・システムを含むリソグラフィ装置 |
JP2009531854A (ja) * | 2006-03-29 | 2009-09-03 | エーエスエムエル ネザーランズ ビー.ブイ. | 汚染バリア及び汚染バリアを備えるリソグラフィ装置 |
JP2013505573A (ja) * | 2009-09-18 | 2013-02-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 改善された耐熱性を持つホイルトラップ装置 |
JP2015053365A (ja) * | 2013-09-06 | 2015-03-19 | ウシオ電機株式会社 | ホイルトラップ及びこのホイルトラップを用いた光源装置 |
JP2017219698A (ja) | 2016-06-08 | 2017-12-14 | ウシオ電機株式会社 | デブリトラップおよび光源装置 |
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JP5303678B1 (ja) | 2012-01-06 | 2013-10-02 | 三菱マテリアル株式会社 | 電子・電気機器用銅合金、電子・電気機器用銅合金薄板、電子・電気機器用導電部品および端子 |
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2020
- 2020-11-25 JP JP2020195077A patent/JP7347402B2/ja active Active
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2021
- 2021-08-23 WO PCT/JP2021/030807 patent/WO2022113443A1/ja active Application Filing
- 2021-08-23 US US18/038,514 patent/US20240004317A1/en active Pending
- 2021-08-23 EP EP21897421.0A patent/EP4235304A1/en active Pending
- 2021-08-23 KR KR1020237018961A patent/KR20230097183A/ko unknown
- 2021-11-10 TW TW110141792A patent/TW202236024A/zh unknown
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006196890A (ja) * | 2004-12-28 | 2006-07-27 | Asml Netherlands Bv | 放射ビームから粒子をフィルタ除去するように動作可能なフィルタ・システムを提供する方法、フィルタ・システム、装置、及びフィルタ・システムを含むリソグラフィ装置 |
JP2009531854A (ja) * | 2006-03-29 | 2009-09-03 | エーエスエムエル ネザーランズ ビー.ブイ. | 汚染バリア及び汚染バリアを備えるリソグラフィ装置 |
JP2013505573A (ja) * | 2009-09-18 | 2013-02-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 改善された耐熱性を持つホイルトラップ装置 |
JP2015053365A (ja) * | 2013-09-06 | 2015-03-19 | ウシオ電機株式会社 | ホイルトラップ及びこのホイルトラップを用いた光源装置 |
JP2017219698A (ja) | 2016-06-08 | 2017-12-14 | ウシオ電機株式会社 | デブリトラップおよび光源装置 |
Also Published As
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TW202236024A (zh) | 2022-09-16 |
EP4235304A1 (en) | 2023-08-30 |
US20240004317A1 (en) | 2024-01-04 |
KR20230097183A (ko) | 2023-06-30 |
JP7347402B2 (ja) | 2023-09-20 |
JP2022083644A (ja) | 2022-06-06 |
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