WO2022052197A1 - 皮米尺 - Google Patents

皮米尺 Download PDF

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Publication number
WO2022052197A1
WO2022052197A1 PCT/CN2020/120368 CN2020120368W WO2022052197A1 WO 2022052197 A1 WO2022052197 A1 WO 2022052197A1 CN 2020120368 W CN2020120368 W CN 2020120368W WO 2022052197 A1 WO2022052197 A1 WO 2022052197A1
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Prior art keywords
picometer
interference
light field
measurement
field
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PCT/CN2020/120368
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English (en)
French (fr)
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周常河
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中国科学院上海光学精密机械研究所
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Publication of WO2022052197A1 publication Critical patent/WO2022052197A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration

Definitions

  • the invention relates to a metrology tool, particularly a picometer ruler, which is a picometer to nanometer scale metrology tool, and is applied to various fields such as picometer lithography, picometer imaging and picometer physics.
  • the picometer is a measurement tool on the picometer scale, and is the physical basis for picometer imaging, picometer measurement, and picometer lithography.
  • the measurement of the picometer scale is the frontier of current science and technology, and the development of an advanced picometer scale is the key to solving the picometer measurement today.
  • Pico-optics studies the theory, components and applications of pico-scale optics, including pico-optical principles, pico-optical devices, pico-optical measurement technology, and pico-optical applications, among which the pico-meter ruler is the measurement benchmark at the pico-meter scale , is the most critical measurement tool for the application of Pico science and technology.
  • the picometer scale is too small, no physical device such as the picometer has been developed.
  • the laser interferometer since the laser interferometer has various error sources, including: optical, electronic noise, environmental interference, etc., when the laser interferometer is subdivided to the picometer scale, the measurement signal will be particularly sensitive to noise, which makes the laser interference
  • the reliability of the meter for picometer measurements deteriorates.
  • Using laser gravitational wave technology, or using Fabry-Perot cavity measurement technology it may be possible to obtain picometer-level signals measured at a single point, but it cannot meet the needs of large-scale, high-precision, stable, and reliable picometer measurements. For example, next-generation semiconductor lithography requires a large range of picometers for high-precision measurement and positioning.
  • Grating-based picometer measurements offer a promising technological path for picometers.
  • the Massachusetts Institute of Technology invented the nanolithography technology (Nanoruler), in which the periodic measurement of the interference field has reached the picometer level (see Prior Art 1: Chen C G. Beam alignment and image metrology for scanning beam interference lithography: fabricating gratings with nanometer phase accuracy, Ph.D. dissertation, Massachusetts Institute of Technology, 2003).
  • the picometer optical comb invented in the prior art 4 does provide picometer scale modulation of grating openings, but cannot be directly used for picometer microscopy measurements. The reasons are as follows: we cannot guarantee to make objects with continuous picometer scale variation, because there is currently no picometer scale modulated photoresist and corresponding developing and fixing technology. It is difficult to realize the picometer microscopic measurement function.
  • the picometer-structured light field modulation includes the use of wavelength coding, time-domain coding, or structured light to achieve picometer-scale microscopic measurements.
  • Pico measurement technology (previous technology 1-3), pico optical comb (previous technology 4), pico microscope (previous technology 5) involves pico measurement, pico modulation, pico microscopic imaging, etc.
  • This provides a strong early technical support for the picometer of the present invention, but the prior art 1-5 did not solve the key problem of the picometer, and the picometer is the basis of the picometer measurement. Therefore, it is necessary to invent the picometer.
  • the meter ruler is a picometer-scale measuring device.
  • the picometer ruler of the present invention is a picometer-scale measurement tool, and can have various manifestations and traceability methods.
  • a laser interferometer is used to calibrate and trace the source to the laser wavelength; it can pass the picometer scale of different periods of the high-density grating. It can also be obtained by changing the angle between the multiple beams of the picometer optical comb light field to obtain the picometer structured light field; or using different laser wavelengths to provide picometer scale movement of the picometer optical comb light field;
  • the parallel laser direct writing technology of rotating diffractive optical elements such as Daman gratings, can be used to realize the picometer-scale control of the distance of laser direct writing.
  • the relative movement between the pico-meter structured light field and the pico-meter optical comb or between the two pico-meter optical combs can also be controlled by feedback to provide the function of a pico-meter ruler.
  • a picometer ruler is a picometer scale measuring tool, which is characterized by including an interference light field generating mechanism, a precision adjustment platform and a detector in the transmission direction or reflection direction of the interference light field, the detector is used for recording and measuring precision adjustment When the platform moves, the interference signal of the interference light field realizes picometer measurement.
  • the generation mechanism of the interference light field includes an interference beam combining device of the left beam and the right beam, and the interference beam combining device of the left beam and the right beam is a prism pair or a grating with the same density as the interference field.
  • the left beam and the right beam are combined to generate an interference signal; the precise adjustment platform continuously adjusts the angle between the two beams to obtain structured light fields with different picometer scale differences, and the detector records the difference Interferometric field periodic signal of picometer scale difference to realize picometer measurement.
  • the generation mechanism of the interference light field is formed by the interference of a left beam and two right beams to form a picometer light comb light field, and the precision adjustment platform is used to precisely adjust the one left beam and the two right beams respectively.
  • the included angle can be adjusted from nano-radians to micro-radians, so as to realize the precise adjustment of the picometer scale of the picometer optical comb light field.
  • the generation mechanism of the interference light field is a left beam and a double beam on the other side of the picometer light comb light field.
  • the picometer light comb is realized.
  • the movement of the field on the picometer scale, the detector records the precise interference field signal of the picometer optical comb light field, and realizes picometer measurement.
  • the generation mechanism of the interference light field uses diffractive optical elements to generate multiple focal points, including a parallel laser direct writing device of Daman grating, and the precision adjustment platform is an electronically controlled precision turntable.
  • the turntable rotates the diffractive optical element slightly, and the rotation angle is controlled in the order of milliradians, and the multiple foci of the diffractive optical element will rotate an angle correspondingly.
  • Scale adjustment the detector records the precise interference field signal of the laser direct writing optical field spacing, and realizes picometer measurement.
  • the generation mechanism of the interference light field is that the picometer structured light field is irradiated on the picometer optical comb, and the precise adjustment platform can change the phase retardation, wavelength, angle between the beams, etc. of the incident light of the picometer structured light field.
  • the relative distance between the picometer structured light field and the picometer optical comb is feedback-controlled, and the detector records the interference field signal of the relative distance between the picometer structured light field and the picometer optical comb to realize picometer measurement.
  • the generation mechanism of the interference light field uses the picometer optical comb field to make two picometer optical combs, and the distance between the two picometer optical combs is changed through the precise adjustment platform, so as to obtain the periodicity of different widths and intensities.
  • the picometer light field and then through the periodic feedback control of the relative distance of the picometer light field with different widths and intensities, the detector records the precise interference field signal between the two picometer optical combs to realize picometer measurement .
  • the detector is a laser interferometer.
  • the picometer of the present invention has two traceability approaches: one is to trace the source to the laser wavelength, that is, one nanometer of the laser wavelength is subdivided into 1000 parts as the benchmark of picometer measurement; the second is to trace the source based on the laws of physics For example, when the Daman grating laser direct writing grating is used, when the Damman grating is rotated, assuming that the rotation angle is controlled in microradians, the period increment or decrement of the laser direct writing grating can be controlled in the order of picometers.
  • the present invention provides a metrological basis on the picometer scale.
  • the movement and positioning of objects at the picometer scale can be determined, and when the picometer light field is used to observe the interaction process of light and matter at the picometer scale, we have a picometer scale reference.
  • Benchmark observe the optical world at the picometer scale, discover new optical phenomena, principles, and develop their wide range of applications.
  • the picometer based on the present invention is also beneficial to the development of picometer lithography, picometer measurement, picometer scale linear or nonlinear optical technology, and is beneficial to the development of emerging disciplines such as picometer femtosecond optics and picometer attosecond optics. , widely used in semiconductor lithography, picometer physics, interaction of light and matter at the picometer scale and many other fields.
  • Fig. 1 is the schematic diagram of picometer embodiment 1 of the present invention
  • Embodiment 2 is a schematic diagram of measurement and calibration in Embodiment 1 of the picometer of the present invention; wherein (a) is a schematic diagram of double beams 11, 12 interfering to form a holographic grating; (b) a schematic diagram of the combination of double beams 11, 12 by prism method; (c) is a schematic diagram of combining the double beams 11 and 12 by the grating method. (d) Schematic diagram of measuring the period of the holographic grating with a laser interferometer;
  • Embodiment 3 is a schematic diagram of Embodiment 2 of the picometer of the present invention, wherein (a) is one of the above-mentioned precision adjustment platforms, the mirror 31a and the mirror 32a have a moving amount ⁇ X 1 , and (b) is the above-mentioned
  • the second precision adjustment platform is a module that produces double beams with a certain angle.
  • (c) is the picometer comb light field formed by the interference of light beams 31c, 32c, 33c;
  • Fig. 4 is the schematic diagram of picometer embodiment 3 of the present invention.
  • Fig. 5 is the schematic diagram of picometer embodiment 4 of the present invention.
  • Embodiment 5 is a schematic diagram of Embodiment 5 of the picometer of the present invention, wherein (a) the mirror 31a and the mirror 32a have a movement amount ⁇ X 1 , and (b) there are double beams with a certain angle;
  • Fig. 7 is the schematic diagram of embodiment 6 of the picometer of the present invention
  • FIG. 1 is a schematic diagram of Embodiment 1 of the picometer of the present invention.
  • the picometer of the present invention includes an interference light field generating mechanism, a precision adjustment platform and a detector in the transmission direction or reflection direction of the interference light field.
  • An interference field 15, 16, 17 is formed, and this interference field is measured by a laser interferometer 18 to form picometers 19 of different lengths.
  • the right beam 12 reaches the position of the holographic beam 13 after being rotated by an angle ⁇ N through the precision adjustment platform, and the period d of the interference field also changes by ⁇ d N .
  • This change ⁇ d N is accurately measured by the laser interferometer 18.
  • the measurement process can refer to the prior art 3. Since the holographic interference field can be accurately measured to the picometer level, different holographic grating period values (d+ ⁇ d 1 ), (d+ ⁇ d N ), etc. can be obtained by rotating different angles ⁇ N , so as to realize the picometer level. The benchmark of the ruler.
  • the period of the interference field formed by the left beam 11 and the right beam 12 at time t 1 is (d+ ⁇ d 1 ); the period of the interference field formed by the left beam 11 and the right beam 13 at time t N is (d+ ⁇ d N ). Since the angle ⁇ N can take any value, ⁇ d 1 , ⁇ d 2 , ⁇ d N can obtain any value with picometer precision.
  • Figure 2(a) is a schematic diagram of the holographic grating formed by the interference of the double beams 11 and 12.
  • the grating period is d
  • the grating period is
  • Figure 2(b) is the interference beam combining device of the double beams 11 and 12, of which 23 is a prism pair, and the thin solid line in the middle is the beam combining surface.
  • the double beams 11 and 12 pass through the middle beam combining surface to form 11', 12'
  • the combined beam of light forms an interference signal between the two on the detector 25 .
  • Figure 2(c) is a beam combining device using a grating 24, wherein the period of the grating 24 is exactly the same as the interference period formed by the double beams 11 and 12, both of which are d.
  • a combined Beam signals 11 ′, 12 ′, and the interference signal between them is recorded on the detector 25 .
  • FIG. 2( d ) is a calibration method of the picometer 20 . 21, 22 , . 28 measured.
  • the interferometric field period picometer measuring device 28 may include a scanning reference grating, a mobile stage, a laser interferometer, etc.
  • Fig. 3 is the schematic diagram of picometer embodiment 2 of the present invention
  • Fig. 3(a) is one of the above-mentioned precision adjustment platforms.
  • the mirror 31a and the mirror 32a have a moving amount ⁇ X 1 .
  • Figure 3(c), Figure 4 Figure 5 requirements for beam polarization angle accuracy.
  • Figure 3(b) is the second precision adjustment platform, a module that generates double beams with a certain angle.
  • a ⁇ module can be formed, the purpose of which is to generate double beams 32c, 33c with precise angles.
  • Figure 3(c) is a schematic diagram of Embodiment 2 of the picometer of the present invention.
  • the picometer comb light field is formed by the interference of light beams 31c, 32c, and 33c. Part of the interference field is 34c, 35c, and 36c, and the period between them is d+ ⁇ d.
  • the width of 35c is ⁇ X 3
  • the width of 34c on the left side is 34c.
  • the width of the right side 36c is ⁇ X 3 + ⁇ d, since ⁇ d can be set by the angle ⁇ 3 between the beams 32c, 33c, so that ⁇ d can be continuously selected from 10pm-1000pm, or larger to nanometers magnitude.
  • Fig. 4 is the embodiment 3 of the picometer of the present invention.
  • the light beam 41 is the left light beam of the interference light field
  • the light beams 42 and 43 are the two right light beams of the interference light field.
  • the rotation angle ⁇ 4 can be controlled in the order of nanoradians to microradians according to the needs. Therefore, the movement of the light fields 47 to 48 of the picometer structure can be controlled in the order of picometers.
  • Meter scale which is also an example of a picometer.
  • Figure 5 is Example 4 of a picometer.
  • the right beams 51, 52, and the left beams 53, 54 of different wavelengths form interference fields 55, 56, 57, wherein the beams 51, 53 are beams of the same wavelength ⁇ 1 , and 52, 54 are beams of the same wavelength ⁇ 2 .
  • FIG. 6( a ) is the incident laser beam used, and 62 is a diffractive optical element such as a Damman grating or the like.
  • 63 is the diffraction distribution of the incident laser light 61 after passing through the diffractive optical element 62, 64 is a focusing lens, which focuses the multiple beams generated by the diffractive optical element 62, for example, a Daman grating on the focal plane to form multiple foci, 66, 67, 68 etc.
  • the multi-focus generated by the diffractive optical element 62 will also rotate by an angle ⁇ 6 on the focal plane of the lens 64 , and the focus 68 will rotate to the position of 69 .
  • the focus distance d before rotation will be shortened by a distance ⁇ d.
  • Fig. 7 is Embodiment 6 of the picometer of the present invention.
  • 71 is the illumination light
  • 72 is the focusing lens
  • 73 is the focused light after passing through the focusing lens
  • 74 is the left beam for generating the picometer comb light field
  • 75 and 76 are The combined action of the right beams, 74, 75, and 76 produces a picometer comb light field 78, of which 77 is the light field distribution in one cycle of the picometer comb light field.
  • 79 is a picometer optical comb, on which there are picometer modulation structures such as ⁇ d, 2 ⁇ d, 3 ⁇ d, etc.
  • 80 is one of the picometer structures, between the picometer light field structure 77 and the picometer structure 80 on the picometer comb light field
  • the relative distance is ⁇ X 8
  • the movement of the picometer comb can be expressed as X 8 .
  • 81 is the light beam after the focused light 73 passes through the picometer light field structure 77 and the picometer light comb structure 80
  • 82 is the condensing lens
  • 83 is the condensing beam of the condensing lens 82
  • 84 is the imaging point corresponding to the condensing lens 82
  • the laser wavelength can be selected by the Laser ⁇ module, which is used to provide the phase Incident light for the delay module (indicated by the dashed box) and the ⁇ module.
  • Fig. 8 is the working principle of Embodiment 7 of the picometer of the present invention.
  • Figure 8(a) illustrates the use of laser beams 74, 75, 76 to generate picometer comb light fields for use in the manufacture of picometer combs 88,89.
  • Fig. 8(a) illustrates the use of laser beams 74, 75, 76 to generate picometer comb light fields for use in the manufacture of picometer combs 88,89.
  • the ⁇ d light field as shown in 90, 91, and 92, by detecting the picometer light field 90, 91, and 92, the distance between 88 and 89 can be feedback locked.
  • 93 is from the picometer structured light field 90
  • the light is collected by the focusing lens 94 to form a convergent light 95, which is irradiated on the detector 96, and is controlled by the feedback device 97 to control the movement X between the picometer combs 88 and 89 to realize the function of the picometer.
  • there will be a light field with a width of N ⁇ d picometers in each period. Since the change of the light intensity I 87 is related to the distance between 88 and 89 , and this light intensity value is obtained in the dark field, when the detector is sensitive enough, the resolution of picometer scale can be obtained, for example, ⁇ d 100pm.
  • the present invention discloses at least seven embodiments of the picometer. These seven picometers can be regarded as two traceability methods.
  • Figures 1 and 2 are traced to the laser wavelength of the laser interferometer 18 from the reference of the picometer scale, that is, one nanometer of the used laser interferometer is subdivided by a thousand times, which is one picometer. Higher subdivision multiples take into account the wavelength stability of the laser interferometer. If the wavelength of the laser interferometer used is accurate and stable after calibration, the picometer subdivision accuracy here is guaranteed.
  • the reference traceability of the picometer in Figure 3(c) is also based on the wavelength of the laser interferometer used, so the difference ⁇ d of the picometer structure is also guaranteed.
  • Figure 4 is obtained based on the rotation of the angle between the two beams of light that generate the picometer comb light field. Therefore, using the structure of Figure 3(a), (b), the rotation angle can be locked at the nanoradian level, then the picometer structure
  • the moving amount ⁇ X 4 of the light field is also controllable, that is, it can be scaled. This calibration can be achieved by theoretical calculation or by experimental comparison. After calibration, it can be actually used as a picometer.
  • the picometer of Figure 5 can also be used by calibration. Because the laser wavelength ⁇ is proportional to the distance X 5 of the resulting picometre structure, this calibration can be calibrated both by theoretical calculations and experimental tests. After calibration, it can also be used as a picometer.
  • the variation ⁇ d of the picometer in Fig. 6 is completely determined by the rotation angle ⁇ 6.
  • the precision electronic turntable provides a micro-radian-level rotation angle accuracy, or the structure shown in Fig. 3(a)(b) can be calibrated by ⁇ 6 .
  • the range of ⁇ d can be determined. After calibration, it can also be used as a picometer.
  • FIG. 7 is Embodiment 6 of the picometer ruler of the present invention, the key of which is the measurement technique of the mutual distance ⁇ X 8 between the picometer optical comb light field 78 and the picometer optical comb 79 .
  • the pico-meter optical comb structure shown in Figure 7 is the simplest structure among them. As shown in the prior art 4, the pico-meter optical comb has a very rich pico-meter optical field structure, and because there is currently no commercialized pico-meter-resolved photoresist , developer, etc., these factors are combined, the picometer measurement system shown in Figure 7 is extremely challenging, but its realization of the function of the picometer is the most practical.
  • Figure 8 illustrates the use of the picometer comb light field to make picometer combs 88, 89.
  • periodic picometer light fields 90, 91, 92, etc. can be generated to detect the positions of these light intensities, Feedback control of the distance X between the picometer combs 88 and 89 can realize the function of the picometer.
  • prior art 1-3 discussed the interference field picometer measurement technology, not a separate device, not a picometer; prior art 4 was a picometer comb device, not a picometer; prior art 5
  • the picometer microscope discussed is the generation and imaging of the picometer structured light field, not the measurement system and technology of the picometer ruler.
  • the present invention introduces the concept of picometer for the first time, clearly defines the picometer and its application, and points out six kinds of embodiments, which is the prior art 1 -5 Innovative content that doesn't exist. According to the principles of the present invention, more embodiments of the picometer can be constructed, which are not all listed here, and the scope of the present invention should not be limited by this.
  • the picometer of the invention provides a reliable and high signal-to-noise ratio of picometer-scale signals and a rich picometer-structured light field.
  • measurement devices for the interaction of light and matter under various picometer structured light fields can be developed, which can be used to observe the interaction between light and matter under the action of various picometer structured light fields.
  • the process allows us to discover new optical principles, phenomena and laws in the picometer world from the perspective of picometer measurement, and develop reliable picometer measurement tools and systems.
  • the picometer scale of the invention is helpful for the development of picometer imaging, picometer lithography, and picometer scale optical technologies, opens up research directions of emerging disciplines such as picometer femtosecond optics, picometer attosecond optics, etc., and is applied to semiconductor lithography, picometer Physics, the interaction of light and matter at the picometer scale and many other fields.

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Abstract

一种皮米尺，是皮米尺度的计量工具，其特点在于包括干涉光场产生机构、精密调节平台和在干涉光场的透射方向或反射方向的探测器，该探测器用于记录测量精密调节平台运动时干涉光场的干涉信号，实现皮米计量。其核心是通过皮米结构光场实现皮米尺的计量和测量。皮米尺可以用于皮米光刻、皮米测量，皮米成像、皮米相机等需要皮米测量的场合，是发展皮米光学技术，皮米飞秒光学、皮米阿秒光学、皮米物理、皮米尺度光与物质相互作用等新兴学科必不可少的计量工具。

Description

皮米尺 技术领域
本发明涉及计量工具，特别是一种皮米尺，是皮米到纳米尺度的计量工具，应用于皮米光刻、皮米成像和皮米物理等多个领域。
背景技术
皮米尺是皮米尺度的计量工具，是皮米成像、皮米测量、皮米光刻的物理基础。皮米尺度的测量是目前科学技术的前沿，发展先进的皮米尺是当今解决皮米测量的关键。
精密光学测量一直是当今科学技术的学科前沿和驱动力。光学的前沿研究从目前已有的微纳光学，进入到皮米光学这个领域。皮米光学研究皮米尺度光学理论、元件及应用，包括皮米光学原理、皮米光学器件、皮米光学测量技术以及皮米光学应用等，其中皮米尺，也就是皮米尺度的计量基准，是目前皮米科学技术应用最关键的计量工具。
由于皮米尺度太小，现在并没有发展出皮米尺这样的物理器件。采用激光干涉仪，由于激光干涉仪有各种误差源，包括：光学、电子噪声、环境干扰等，导致激光干涉仪细分到皮米尺度时，测量信号会对噪声特别敏感，这使得激光干涉仪用于皮米测量的可靠性变差。采用激光引力波技术，或采用法布里波罗腔的测量技术，或许可以得到单点测量的皮米量级信号，但无法满足大范围、高精度、稳定、可靠的皮米测量的需求，例如，下一代半导体光刻技术就需要大量程皮米尺实现高精度的测量与定位。
基于光栅的皮米测量技术为皮米尺提供一种有前途的技术路径。我们知道，在大尺寸光栅激光直写装置的研制过程中，美国麻省理工学院发明了纳米光刻技术(Nanoruler),其中干涉场的周期测量达到了皮米量级(参见在先技术1：Chen C G.Beam alignment and image metrology for scanning beam interference lithography:fabricating gratings with nanometer phase accuracy，美国麻省理工学院博士论文,2003)。上海光机所周常河课题组对干涉场周期精度测量也达到了皮米量级(参见在先技术2：Applied Optics 57,4777-4784(2018))；特别是上海光机所周常河课题组发明的扫描参考光栅技术，对双光束干涉场测量得到了 长程皮米精度的实验结果(参见在先技术3，Applied Optics 58,2929-2935(2019)).
我们可以理解，虽然上述在先技术1、2或3均提供激光干涉场周期皮米精度测量，但它们都不能直接应用于物体的皮米尺度测量。基于利用不同光栅周期皮米尺度差值实现皮米器件的思想，周常河发明了皮米光梳技术(参见在先技术4，皮米光梳、皮米光梳的制造装置和制造方法，发明专利申请号：201910368137.9)，也就是利用两个光栅皮米尺度的差值，使每个光栅周期内的开口都以皮米或纳米尺度增加或减少，这为皮米尺度的计量提供了坚实的前期研究基础。
在先技术4发明的皮米光梳，确实提供了光栅开口的皮米尺度调制，但不能直接用于皮米显微测量。原因如下：我们无法保证做出连续皮米尺度变化的物体，因为目前没有皮米尺度调制的光刻胶以及相应的显影与定影技术，因此，直接采用皮米光梳(在先技术4)，很难实现皮米显微测量功能。
为实现皮米尺度的显微功能，周常河发明了皮米显微镜(参见在先技术5，皮米显微镜，发明专利申请号：201911127409.9)，也就是利用皮米结构光场实现皮米显微测量，其中皮米结构光场调制包括采用波长编码、时域编码、或者结构光，实现了皮米尺度的显微测量。
皮米测量技术(在先技术1-3)，皮米光梳(在先技术4)，皮米显微镜(在先技术5)涉及到了皮米测量、皮米调制、皮米显微成像等方面，这为本发明皮米尺提供了有力的前期技术支撑，但在先技术1-5并没有解决皮米尺这个关键问题，而皮米尺又是皮米测量的基础，因此，有必要发明皮米尺这个皮米尺度的计量器件。
发明内容
本发明的皮米尺是皮米尺度的计量工具，可以有多种表现形式和溯源方法，例如，采用激光干涉仪标定，溯源到激光波长上；它可以通过高密度光栅不同周期的皮米尺度的差值来得到；也可以通过改变皮米光梳光场的多光束之间的夹角而得到皮米结构光场；或者采用不同激光的波长，提供皮米光梳光场皮米尺度的移动；或者采用旋转衍射光学元件、例如达曼光栅的并行激光直写技术，实现激光直写间距的皮米尺度控制。也可以通过反馈控制皮米结构光场与皮米光梳之间或者两个皮米光梳之间的相对移动，提供皮米尺的功能。
本发明的技术解决方案如下
一种皮米尺，是皮米尺度的计量工具，其特点在于包括干涉光场产生机构、精密调节平台和在干涉光场的透射方向或反射方向的探测器，该探测器用于记录测量 精密调节平台运动时干涉光场的干涉信号，实现皮米计量。
所述的干涉光场的产生机构包括左光束与右光束的干涉合束器件，所述的左光束与右光束的干涉合束器件是棱镜对，或是与干涉场相等密度的光栅，目的是将左光束和右光束合并，生成干涉信号；所述的精密调节平台连续调节这两束光之间的夹角，得到不同皮米尺度差值的结构光场，所述的探测器记录该不同皮米尺度差值的干涉场周期信号，实现皮米计量。
所述的干涉光场的产生机构由一束左光束与两束右光束干涉形成皮米光梳光场，通过所述的精密调节平台分别精密调节所述的一束左光束与两束右光束的夹角，其调节量从纳弧度到微弧度，实现皮米光梳光场皮米尺度的精确调节，所述的探测器记录该皮米光梳光场精确干涉场信号，实现皮米计量。
所述的干涉光场的产生机构是皮米光梳光场的一束左光束与另一侧双光束，通过调整所述的一束左光束与另一侧双光束的波长，实现皮米光梳光场的皮米尺度的移动，所述的探测器记录该皮米光梳光场精确的干涉场信号，实现皮米计量。
所述的干涉光场的产生机构采用衍射光学元件产生多个焦点，包括达曼光栅的并行激光直写装置，所述的精密调节平台为电子控制的精密转台，通过所述的电子控制的精密转台轻微旋转所述的衍射光学元件，旋转角度控制在毫弧度量级，所述的衍射光学元件的多个焦点会相应转动一个角度，通过精确的转角，实现激光直写光场间距的皮米尺度调节，所述的探测器记录该激光直写光场间距精确干涉场信号，实现皮米计量。
所述的干涉光场的产生机构是皮米结构光场照射到皮米光梳上，所述的精密调节平台通过改变皮米结构光场入射光的位相延迟量、波长、光束间的夹角等，反馈控制皮米结构光场与皮米光梳之间的相对距离，所述的探测器记录该皮米结构光场与皮米光梳之间的相对距离的干涉场信号，实现皮米计量。
所述的干涉光场的产生机构利用皮米光梳光场做出两个皮米光梳，通过所述的精密调节平台改变两个皮米光梳之间的距离，得到周期性的不同宽度和强度的皮米光场，再通过所述的周期性的不同宽度和强度的皮米光场反馈控制的相对距离，所述的探测器记录该两个皮米光梳之间精确的干涉场信号，实现皮米计量。
所述的探测器为激光干涉仪。
本发明的皮米尺有两种溯源途径：一种是溯源到激光波长上，也就是将激光波长的一个纳米细分1000份，作为皮米计量的基准；第二种是基于物理定律的溯源，例如，采用达曼光栅激光直写光栅时，当达曼光栅旋转时，假设旋转的角度控制在微弧度时，就可以控制激光直写光栅的周期增量或减量在皮米量级。
本发明的技术效果如下：
本发明提供了皮米尺度的计量基础。通过皮米尺提供的计量基准，可以确定皮米尺度下物体的移动与定位，用于观察皮米光场作用时，皮米尺度下光与物质相互作用的过程，使得我们有一个皮米尺度参考基准，观察皮米尺度下的光学世界，发现新的光学现象、原理，并开发其广泛应用。
基于本发明的皮米尺，还有利于开发皮米光刻、皮米测量、皮米尺度线性或非线性光学技术，有利于开辟皮米飞秒光学、皮米阿秒光学等新兴学科研究方向，广泛地应用于半导体光刻、皮米物理、光与物质在皮米尺度相互作用等多个领域。
附图说明
图1是本发明皮米尺实施例1的示意图；
图2是本发明皮米尺实施例1测量与定标示意图；其中(a)是双光束11,12干涉形成全息光栅的示意图；(b)棱镜法将双光束11，12合束的示意图；(c)是光栅法将双光束11，12合束的示意图。(d)采用激光干涉仪测量全息光栅周期的示意图；
图3是本发明皮米尺实施例2的示意图,其中，(a)是所述的精密调节平台之一，反射镜31a与反射镜32a有一个移动量ΔX 1，(b)是所述的精密调节平台之二，产生有一定夹角的双光束的模块。(c)是皮米光梳光场由光束31c，32c，33c干涉形成；
图4是本发明皮米尺实施例3示意图；
图5是本发明皮米尺实施例4示意图；
图6是本发明皮米尺实施例5示意图，其中(a)反射镜31a与反射镜32a有一个移动量ΔX 1，(b)有一定夹角的双光束；
图7是本发明皮米尺的实施例6示意图
图8是本发明皮米尺的实施例7示意图，其中(a)用激光光束74，75，76，产生皮米光梳光场，用于制造皮米光梳88,89，(b)皮米光梳88和皮米光梳89互补重合，(c)皮米光梳88和皮米光梳89相互移动X＝d。
具体实施方式
下面结合附图和实施例对本发明作进一步说明，但不应以此限制本发明的保护范围。
先请参阅图1，图1是本发明皮米尺实施例1的示意图。由图可见，本发明皮 米尺包括干涉光场产生机构、精密调节平台和在干涉光场的透射方向或反射方向的探测器，所述的干涉光场产生机构由全息光束11，12，13形成干涉场15，16，17组成，这个干涉场由激光干涉仪18测量，形成不同长度的皮米尺19。双光束全息的左光束11与右光束12之间有一个夹角，这个夹角决定了全息条纹周期d的大小。右光束12经过所述的精密调节平台转动一个角度θ N后到达全息光束13的位置，干涉场的周期d因此也改变了Δd N，这个改变量Δd N通过激光干涉仪18精确测出，具体测量过程可以参见在先技术3。由于全息干涉场可以精确测量到皮米量级，因此，转动不同的角度θ N就可以得到不同的全息光栅周期值(d+Δd 1),(d+Δd N)等，以此实现皮米尺的基准。
例如，t 1时刻左光束11与右光束12形成的干涉场周期为(d+Δd 1)；t N时刻左光束11与右光束13形成的干涉场周期为(d+Δd N)。由于角度θ N可以取任意值，因此，Δd 1，Δd 2，···Δd N就可以得到任意皮米精度的值。对于周期d＝833nm的干涉场，两个光栅之间的差值可以为Δd 1＝10pm,Δd 2＝20pm,···，Δd N＝1000pm；将所有这些皮米精度的变化量组合在一起，就可以得到如图1所示的皮米尺19，以此作为皮米尺度计量的基础。
图2(a)是双光束11,12干涉形成全息光栅的示意图，其光栅周期为d，激光波长可以选为λ＝405nm，双光束之间的夹角可以选择使得d＝833nm。如图2(a)所示，其光栅周期为
d＝λ/(sinθ 1+sinθ 2)    (1)
图2(b)是双光束11,12的干涉合束器件，其中23为棱镜对，其中间细实线为合束面，双光束11,12经过中间合束面，形成11′，12′的合束光，在探测器25上形成两者之间的干涉信号。
图2(c)是采用了光栅24的合束器件，其中光栅24的周期与双光束11,12形成的干涉周期完全一致，均为d,在光栅24的-1衍射级次上，形成合束信号11′，12′，探测器25上记录两者之间的干涉信号。
图2(d)是皮米尺20的一种定标方式。21、22、…、2N是皮米尺20的每个周期内的分布，所有21、22、…、2N之间的周期完全一致，皮米尺20的移动量X 2可以由皮米测量装置28测量得到。干涉场周期皮米测量装置28可以包括扫描参考光栅，移动台，激光干涉仪等组成，工作原理参见图2(b),图2(c)。由于皮米尺20的移动量X 2的测量精度可以在纳米或亚纳米量级，假设测量皮米尺的周期个数为N＝1000，则每个周期的测量精度可以达到皮米或亚皮米量级，因此，本发明皮米 尺的测量精度是可以保证在皮米精度量级的。
实施例2
图3是本发明皮米尺实施例2的示意图
图3(a)是所述的精密调节平台之一，反射镜31a与反射镜32a有一个移动量ΔX 1，采用激光干涉仪18具有纳米分辨率，如果反射镜31a移动ΔX 1＝10nm，两个反射镜31a，32a之间的距离X 1＝3mm,则反射光偏转的角度分辨率为Δθ 3＝ΔX 1/X 1＝3.3nrad,达到了纳弧度量级，满足了本发明图1,图3(c),图4,图5对光束偏振角度精度的要求。
图3(b)是所述的精密调节平台之二，产生有一定夹角的双光束的模块。采用反射镜31b,半透半反镜32b,结合图3(a)的部分，就可以构成Δθ模块，其目的就是产生有精确夹角的双光束32c,33c。
图3(c)是本发明皮米尺实施例2的示意图。皮米光梳光场由光束31c，32c，33c干涉形成，干涉场的一部分为34c，35c，36c，它们之间的周期为d+Δd,其中35c的宽度为ΔX 3，其左侧34c的宽度为ΔX 3-Δd,右侧36c的宽度为ΔX 3+Δd，由于Δd可以通过光束32c，33c之间的夹角Δθ 3设定，使Δd可以从10pm-1000pm连续选择，或者更大到纳米量级。
图3(c)的具体实施例可以为，皮米光梳的周期d＝833nm,Δd＝100pm，35c的宽度ΔX 3＝300nm；36c的宽度为ΔX 3+Δd＝300nm+100pm＝300.100nm；34c的宽度为ΔX 3-Δd＝300nm-100pm＝299.900nm。因此，34c，35c，36c之间固定的皮米尺度的差值可以作为皮米尺实施例的一种情况。
实施例3
图4是本发明皮米尺实施例3。光束41是干涉光场的左光束，光束42，43为干涉光场的两束右光束，左光束41与两束右光束42，43的干涉形成了皮米结构光场46，47。当两束右光束42，43在所述的精密调节平台的调节下旋转一个角度Δθ 4到43，44的位置，则其皮米结构光场47就移动到48的位置。由于采用图3(a)或图3(b)的结构，旋转角度Δθ 4可以根据需要控制在纳弧度到微弧度量级，因此，皮米结构光场47到48的移动就可以控制在皮米量级,这也是皮米尺一种实施例。
实施例4
图5是皮米尺的实施例4。不同波长的右光束51，52，和左光束53，54，形成干涉场55，56，57，其中光束51，53为相同波长λ 1的光束，52，54为相同波长λ 2的光束。由图2(a)和公式(1),我们知道，干涉结构55，56，57之间的间距X 5正比 于所用激光的波长λ，如58所示，因此，当51，53所用的波长λ 1变为52，54的波长λ 2时，其干涉结构56会移动到57。控制波长的选择，可以实现X 5的值在皮米量级，例如，X 5＝100pm。
实施例5
图6是皮米尺的实施例5。如图6(a)所示，61为所用的入射激光光束，62为衍射光学元件，例如，达曼光栅等。63为入射激光61通过衍射光学元件62后的衍射分布，64为聚焦透镜，其将衍射光学元件62，例如，达曼光栅产生的多光束聚焦在焦面上形成多个焦点，66，67，68等。当衍射光学元件62在所述的精密调节平台的调节下旋转一个角度θ 6时，其产生的多焦点在透镜64的焦面上也会旋转一个角度θ 6，焦点68会旋转到69的位置。如图6(b)，假设平台的运动方向为67b，68b，69b所示，则旋转前的焦点间距d就会缩短一个距离Δd。采用精密电子转台，这个转角可以精确控制到微弧度量级，因此，Δd就可以精确控制在皮米量级，例如，d＝833nm,Δd＝100pm。因此，这是皮米尺第五个实施例。
实施例6
图7是本发明皮米尺的实施例6。71为照明光，72为聚焦透镜，73为经过聚焦透镜72后的聚焦光，74为产生皮米光梳光场的左光束，75、76为右光束，74、75、76的共同作用产生了皮米光梳光场78，其中77为皮米光梳光场上一个周期内的光场分布。79为皮米光梳，其上有Δd、2Δd、3Δd等皮米调制结构，例如，80是其中一个皮米结构，皮米光梳光场上皮米光场结构77和皮米光梳上皮米结构80之间的相对距离为ΔX 8，皮米光梳的移动可以表示为X 8。81为聚焦光73通过皮米光场结构77、皮米光梳结构80后共同作用后的光束，82为会聚透镜，83为会聚透镜82的收聚光束，84为会聚透镜82对应的成像点，84上有光强探测器85，这个探测器上的强度由位相
Figure PCTCN2020120368-appb-000001
延迟模块(虚线方框所示)、激光波长λ、产生皮米光梳光场左右光束之间的夹角θ 3，以及两束右光束之间的夹角Δθ 3等所决定。其中激光波长可以由Laserλ模块选择，用于提供给位相
Figure PCTCN2020120368-appb-000002
延迟模块(虚线方框所示)和Δθmodule模块的入射光。通过控制这些变量，可以实现皮米尺的功能，例如，ΔX 8＝100pm。
实施例7
图8是本发明皮米尺的实施例7的工作原理。图8(a)说明用激光光束74，75，76，产生皮米光梳光场，用于制造皮米光梳88,89。图8(b)说明皮米光梳88和89完全互补重合时，在入射光场86的照射下，通过这两者88，89的光场在X＝0时，其光强为零，I 87＝0；图8(c)给出了皮米光梳88和皮米光梳89相互移动X＝d时，由 于皮米光梳相邻结构相差一个Δd,所以此时会出现每个周期内出现一个宽度Δd光场的情况，如90，91，92所示，通过探测皮米光场90，91，92，就可以反馈锁定88与89之间的距离，过程如下：93为来自皮米结构光场90的光线，经过聚焦透镜94收聚，形成会聚光线95，照射到探测器96上，经过反馈装置97，控制皮米光梳88，89之间的移动X，实现皮米尺的功能。在88与89之间距离为X＝N·Δd时，就会出现每个周期内有宽度为N·Δd皮米光场的情况，由于光强I 87的变化和88，89之间的距离相关，并且这个光强值是在暗场情况下取得的，在探测器足够灵敏的情况下，就可以得到皮米尺度的分辨率，例如，Δd＝100pm.
本发明至少公布了七种皮米尺的实施例。这七种皮米尺可以看作为两种溯源方式。图1，2是将皮米尺的基准溯源到激光干涉仪18的激光波长，也就是将所用激光干涉仪的一个纳米细分一千倍，就是一个皮米。更高细分的倍数要考虑激光干涉仪波长的稳定性。如果所用激光干涉仪的波长经过定标后，是准确并稳定的，这里的皮米细分精度就是有保障的。图3(c)皮米尺的基准溯源也是基于所用激光干涉仪的波长，因此，其皮米结构的差值Δd也是有保证的。
图4是基于产生皮米光梳光场的两束光的夹角旋转而得到，因此，采用图3(a),(b)的结构，旋转角度可以锁定在纳弧度量级，则皮米结构光场的移动量ΔX 4也是可以控制的，也就是说，是可以定标的。这个定标可以通过理论计算来实现，也可以通过实验比对来实现。定标后，可以作为皮米尺实际使用。
图5的皮米尺也可以通过定标而使用。因为激光波长λ与所产生的皮米结构的距离X 5成正比，所以这个定标既可以通过理论计算来定标，也可以通过实验测试来定标。定标后，也可以作为皮米尺来使用。
图6的皮米尺的变化量Δd完全由旋转角度θ 6来确定，精密电子转台提供了微弧度量级的转角精度，或采用图3(a)(b)结构，可以通过定标θ 6可以确定Δd的范围。经过定标，也可以作为皮米尺来使用。
图7是本发明皮米尺的实施例6，其中的关键是皮米光梳光场78与皮米光梳79之间相互距离ΔX 8的测量技术。图7所示的皮米光梳结构是其中最简单的结构，如在先技术4所示，皮米光梳具有非常丰富的皮米光场结构，而且由于目前并没有商品化皮米分辨的光刻胶、显影液等，这些因素综合起来，图7所示的皮米尺测量***极具挑战性，但其实现皮米尺的功能又是最有实用意义的。图8说明利用皮米光梳光场做出皮米光梳88，89，利用88和89之间的相互移动，就可以产生周期性皮米光场90，91，92等，探测这些光强的位置，反馈控制皮米光梳88，89之间的 距离X，就可以实现皮米尺的功能。
有必要指出，这些皮米尺前期技术基础在在先技术1-5涉及过，但在先技术1-5并没有涉及皮米尺的核心体系，包括皮米尺的基准、溯源、定标及应用等。例如，在先技术1-3讨论的是干涉场皮米测量技术，并不是一个单独的器件，不是皮米尺；在先技术4是皮米光梳器件，并不是皮米尺；在先技术5讨论的皮米显微镜，研究的是皮米结构光场的产生与成像，不是皮米尺的计量体系和技术。本发明在在先技术1-5的皮米测量技术的基础上，首次引入皮米尺的概念，明确定义了皮米尺及其应用方式，指出了六种实施例，这是在先技术1-5没有的创新内容。根据本发明的原理，还可以构造出更多的皮米尺的实施例，这里并没有全部列举，不应该以此限制本发明的范围。
实验表明，本发明皮米尺提供了可靠、高信噪比的皮米尺度信号和丰富的皮米结构光场。通过这些皮米尺的结构光场，以此可以开发出多种皮米结构光场下光与物质相互作用的测量装置，用于观察多种皮米结构光场作用下，光与物质相互作用的过程，使得我们可以从皮米计量的角度，发现皮米世界新的光学原理、现象及规律，并开发出可靠的皮米测量工具和***。
本发明皮米尺有助于发展皮米成像、皮米光刻、皮米尺度光学技术，开辟皮米飞秒光学、皮米阿秒光学等新兴学科研究方向，应用于半导体光刻、皮米物理、光与物质在皮米尺度相互作用等多个领域。

Claims (8)

  1. 一种皮米尺，是皮米尺度的计量工具，其特征在于包括干涉光场产生机构、精密调节平台和在干涉光场的透射方向或反射方向的探测器，该探测器用于记录测量精密调节平台运动时干涉光场的干涉信号，实现皮米计量。
  2. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构包括左光束与右光束的干涉合束器件，所述的左光束与右光束的干涉合束器件是棱镜对，或是与干涉场相等密度的光栅，目的是将左光束和右光束合并，生成干涉信号；所述的精密调节平台连续调节这两束光之间的夹角，得到不同皮米尺度差值的结构光场，所述的探测器记录该不同皮米尺度差值的干涉场周期信号，实现皮米计量。
  3. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构由一束左光束与两束右光束干涉形成皮米光梳光场，通过所述的精密调节平台分别精密调节所述的一束左光束与两束右光束的夹角，其调节量从纳弧度到微弧度，实现皮米光梳光场皮米尺度的精确调节，所述的探测器记录该皮米光梳光场精确干涉场信号，实现皮米计量。
  4. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构是皮米光梳光场的一束左光束与另一侧双光束，通过调整所述的一束左光束与另一侧双光束的波长，实现皮米光梳光场的皮米尺度的移动，所述的探测器记录该皮米光梳光场精确的干涉场信号，实现皮米计量。
  5. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构采用衍射光学元件产生多个焦点，包括达曼光栅的并行激光直写装置，所述的精密调节平台为电子控制的精密转台，通过所述的电子控制的精密转台轻微旋转所述的衍射光学元件，旋转角度控制在毫弧度量级，所述的衍射光学元件的多个焦点会相应转动一个角度，通过精确的转角，实现激光直写光场间距的皮米尺度调节，所述的探测器记录该激光直写光场间距精确干涉场信号，实现皮米计量。
  6. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构是皮米结构光场照射到皮米光梳上，所述的精密调节平台通过改变皮米结构光场入射光的位相延迟量、波长、光束间的夹角等，反馈控制皮米结构光场与皮米光梳之间的相对距离，所述的探测器记录该皮米结构光场与皮米光梳之间的相对距离的干涉场信号，实现皮米计量。
  7. 根据权利要求1所述的皮米尺，其特征在于所述的干涉光场的产生机构利用皮米光梳光场做出两个皮米光梳，通过所述的精密调节平台改变两个皮米光梳之间的距离，得到周期性的不同宽度和强度的皮米光场，再通过所述的周期性的不同宽 度和强度的皮米光场反馈控制的相对距离，所述的探测器记录该两个皮米光梳之间精确的干涉场信号，实现皮米计量。
  8. 根据权利要求1至7任一项所述的皮米尺，其特征在于所述的探测器为激光干涉仪。
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