WO2021120233A1 - 一种原子力显微镜的探针的刚度实时调节方法 - Google Patents
一种原子力显微镜的探针的刚度实时调节方法 Download PDFInfo
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- WO2021120233A1 WO2021120233A1 PCT/CN2019/127400 CN2019127400W WO2021120233A1 WO 2021120233 A1 WO2021120233 A1 WO 2021120233A1 CN 2019127400 W CN2019127400 W CN 2019127400W WO 2021120233 A1 WO2021120233 A1 WO 2021120233A1
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- probe
- stiffness
- cantilever beam
- atomic force
- force microscope
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- 239000002131 composite material Substances 0.000 claims abstract description 30
- 239000011248 coating agent Substances 0.000 claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 claims description 47
- 239000002184 metal Substances 0.000 claims description 47
- 239000012811 non-conductive material Substances 0.000 claims description 31
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- 229910045601 alloy Inorganic materials 0.000 claims description 22
- 238000010438 heat treatment Methods 0.000 claims description 18
- 238000001816 cooling Methods 0.000 claims description 17
- 239000011347 resin Substances 0.000 claims description 11
- 229920005989 resin Polymers 0.000 claims description 11
- 229910052797 bismuth Inorganic materials 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- 229910052718 tin Inorganic materials 0.000 claims description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- -1 polyethylene Polymers 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 4
- 238000005229 chemical vapour deposition Methods 0.000 claims description 4
- 238000001017 electron-beam sputter deposition Methods 0.000 claims description 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 4
- 238000007737 ion beam deposition Methods 0.000 claims description 4
- 239000004698 Polyethylene Substances 0.000 claims description 3
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- 229920001155 polypropylene Polymers 0.000 claims description 3
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Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/24—AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes
- G01Q60/38—Probes, their manufacture, or their related instrumentation, e.g. holders
Definitions
- the invention relates to the technical field of atomic force microscopes, in particular to a method for real-time adjustment of the stiffness of the probes of the atomic force microscope.
- the atomic force microscope uses a special tiny probe to scan the surface of the sample material in the left and right and front and back directions, and uses the scanner to fine-tune the ability in the vertical direction to keep the force between the probe and the material surface fixed during the scanning process.
- the vertical fine-tuning distance of each point in the scanning process is recorded, and the three-dimensional topography of the material surface can be characterized.
- the atomic force microscope presses the probe tip into and out of the material surface, obtains the force-displacement curve through the sensor, and calculates the curve to obtain the Young's modulus and hardness of the measured material.
- the nanoindentation test can directly act on materials of any size and shape according to the shape and tip size of the nanoindenter. It is a direct test. It is widely used to test the mechanical properties of micro/nano-scale materials.
- Atomic force microscope needs to select a probe with appropriate stiffness according to the working mode. For example: when the atomic force microscope selects the contact mode for imaging, the stiffness of the probe can be selected in the range of 0.1N/m-1N/m. When the AFM is imaging biological materials, the stiffness of the probe can be selected in the range of 0.01N/m-0.5N/m. When the AFM selects the non-contact mode for imaging, the stiffness of the probe can be selected from 50N/m-80N/m. When the AFM selects the force modulation mode for imaging, the stiffness of the probe can be selected from 5N/m-10N/m. When the atomic force microscope performs the nanoindentation test, the stiffness of the atomic force microscope probe is selected according to the mechanical properties of the material being tested.
- the technical problem to be solved by the present invention is to provide a real-time adjustment method for the stiffness of the probe of an atomic force microscope, which can adjust the stiffness of the probe in real time, with a large adjustment range, a wide working range and good stability.
- the present invention provides a real-time adjustment method for the stiffness of an atomic force microscope probe.
- the probe includes a cantilever beam and a needle tip, and includes the following steps:
- the stiffness of the cantilever beam-coating composite is changed by changing the temperature of the stiffness adjustment layer.
- the stiffness adjustment layer is a metal layer, and the melting point of the metal layer is lower than the melting point of the cantilever beam.
- the metal layer is an alloy composed of one or more of indium, bismuth, tin, and gold.
- the stiffness adjustment layer is prepared by a coating method, an electron beam sputtering method, a chemical vapor deposition method or a focused ion beam deposition method.
- the “change the stiffness of the cantilever beam-coating composite piece by changing the temperature of the stiffness adjustment layer” specifically includes the following steps:
- the molten metal is cooled, and the molten metal is solidified and formed on the surface of the cantilever beam.
- the vibration frequency of the probe is 5khz-20khz, and the vibration amplitude of the probe is 3-5 ⁇ m
- the cooling rate of the "cooling molten metal" is less than 10°C/s.
- the vibration of the probe is driven by a piezoelectric ceramic driver.
- the "change the stiffness of the cantilever beam-coating composite piece by changing the temperature of the stiffness adjustment layer” includes the following steps:
- the morphology of the crystal grains after the solidification of the molten metal is changed, and the cantilever beam-coating composite parts with different stiffness are obtained.
- the "cooling rate of the probe" is 0.1-10°C/s.
- the invention discloses a real-time adjustment method for the stiffness of an atomic force microscope probe.
- the probe includes a cantilever beam and a needle tip, and includes the following steps:
- the probe is pulled out of the non-conductive material. At this time, the surface of the probe is coated with the non-conductive material, and the heating of the probe is stopped, and the non-conductive material is solidified and formed on the probe.
- the melting point of the non-conductive material is lower than 100°C.
- the surface of the probe is coated with the non-conductive material, stop heating the probe, and the non-conductive material is solidified on the probe to form” further includes: scraping Except for the non-conductive material of the needle tip.
- the non-conductive material is resin material, polyethylene, polypropylene or rubber.
- the present invention forms a cantilever beam-coating composite piece by coating a stiffness adjustment layer on the cantilever beam, and then changes the stiffness of the cantilever beam-coating composite piece by changing the temperature of the stiffness adjustment layer, which can adjust the probe in real time Rigidity, no need to replace the probe frequently, reduce probe loss, large adjustment range, wide working range and good stability.
- Figure 1 is a schematic diagram of the structure of the probe
- Figure 2 is a schematic flow chart of the first embodiment
- Fig. 3 is a schematic flow chart of the third embodiment.
- the present invention discloses a real-time adjustment method for the stiffness of the probe of an atomic force microscope, which includes the following steps:
- a rigidity adjustment layer is coated on the cantilever beam to form a cantilever beam-coating composite.
- the stiffness adjustment layer is a metal layer, and the melting point of the metal layer is lower than the melting point of the cantilever beam.
- the metal layer is an alloy composed of one or more of indium, bismuth, tin, and gold.
- the stiffness adjustment layer is prepared by a coating method, an electron beam sputtering method, a chemical vapor deposition method, or a focused ion beam deposition method.
- Cooling the molten metal the molten metal solidifies and forms on the surface of the cantilever beam, "cooling the molten metal", and the cooling rate is less than 10°C/s.
- the probe can be a piezoresistive self-induction atomic force microscope probe produced by Japan HITACHI company.
- the working principle of the probe is to sense the tiny deformation of the cantilever beam through the change of the resistance value of the piezoresistive sensor on the surface of the cantilever beam; moreover, when a voltage is applied to the probe, the cantilever beam can be heated up. Due to the actual micro-machining error, The stiffness of the AFM probe is 40 ⁇ 5N/m.
- Au-Sn alloy powder is placed on the surface of the probe cantilever beam.
- Au-Sn alloy powder is a mixture of Au-Sn solder and alcohol, the ratio is 1:5.
- the target voltage is applied to the AFM probe to 5-10V. After heating for 1 minute, the temperature of the cantilever beam of the probe stabilizes at 280°C, reaching the melting point of Au-Sn alloy powder, which is much lower than the melting point of silicon cantilever material of 1410°C.
- the Au-Sn alloy powder on the surface of the AFM probe is completely melted and is in a molten state. Drive the AFM probe in the Z direction with a vibration frequency of 10KHz and a vibration amplitude of 3 ⁇ m.
- the molten Au-Sn alloy material spreads evenly on the surface of the probe cantilever beam. Within 10 minutes, the voltage was slowly reduced from 5-10V to 0V, and the molten Au-Sn alloy solidified into a solid state of 140 with a forming thickness of 15nm. Through software testing and software calculations, the overall stiffness of the AFM probe with the thickness of the cantilever increased by 15nm increased to 102.98N/m.
- the probe in this embodiment is suitable for all AFM probes based on piezoresistive self-induction and self-heating.
- the present invention can influence the forming thickness of Au-Sn alloy material by changing the vibration frequency and the vibration amplitude, and adjust the overall stiffness of the atomic force microscope probe. See Table 1 and Table 2 for details.
- the alloy powder in this embodiment is not limited to the gold-based alloy brazing filler metal.
- the Bi-based alloy and the In-based alloy solder have a lower melting point, which can expand the application of the present invention.
- the melting point of 51% In/32.5% Bi/16.5% Sn is 60°C; the melting point of 57% Bi/26% In/17% Sn is 79°C.
- the invention discloses a real-time adjustment method for the stiffness of the probe of an atomic force microscope, which comprises the following steps:
- a rigidity adjustment layer is coated on the cantilever beam to form a cantilever beam-coating composite.
- the stiffness adjustment layer is a metal layer, and the melting point of the metal layer is lower than the melting point of the cantilever beam.
- the metal layer is an alloy composed of one or more of indium, bismuth, tin, and gold.
- the stiffness adjustment layer is prepared by a coating method, an electron beam sputtering method, a chemical vapor deposition method, or a focused ion beam deposition method.
- the probe can be a piezoresistive self-induction atomic force microscope probe produced by Japan HITACHI company.
- the working principle of the probe is to sense the tiny deformation of the cantilever beam through the change of the resistance value of the piezoresistive sensor on the surface of the cantilever beam; moreover, when a voltage is applied to the probe, the cantilever beam can be heated up. Due to the actual micro-machining error, The stiffness of the AFM probe is 40 ⁇ 5N/m.
- the principle of this embodiment is to place a layer of material on the surface of the cantilever beam of the atomic force microscope probe, and heat the probe to melt the surface material of the cantilever beam.
- the probe used is a piezoresistive self-induction atomic force microscope probe produced by Japan's HITACHI company.
- the working principle is to sense the tiny deformation of the cantilever beam through the change of the resistance value of the piezoresistive sensor on the surface of the cantilever beam.
- the cantilever beam can be heated up. Due to the actual micro-machining error, the stiffness of the AFM probe is 40 ⁇ 5N/m.
- the Au-Sn alloy powder is placed on the surface 220 of the cantilever beam.
- the Au-Sn alloy powder 210 is a mixture of Au-Sn solder and alcohol, and the ratio is 1:5.
- the target voltage is applied to the probe to 5-10V, and after heating for 1 minute, the temperature of the cantilever beam of the probe 2 stabilizes at 280°C, reaching the melting point of Au-Sn alloy powder 210, which is much lower than the melting point of the cantilever silicon material of 1410°C.
- the Au-Sn alloy powder on the surface of the atomic force microscope probe is completely melted and is in a molten state 230.
- the voltage is slowly reduced from 5-10V to 0V, and the molten Au-Sn alloy 230 solidifies into a solid state.
- the average grain size of the solidified Au-Sn alloy metal is 80nm.
- the invention can change the metal crystal grain size of Au-Sn alloy material by controlling the cooling rate of the atomic force microscope probe, affect the mechanical properties of the Au-Sn alloy material, and adjust the overall stiffness of the probe. See Table 3 for details.
- the alloy powder in this embodiment is not limited to the gold-based alloy brazing filler metal.
- the Bi-based alloy and the In-based alloy solder have a lower melting point, which can expand the application of the present invention.
- the melting point of 51% In/32.5% Bi/16.5% Sn is 60°C; the melting point of 57% Bi/26% In/17% Sn is 79°C.
- the PID method can be used to adjust and control the cooling rate.
- the present invention discloses a real-time adjustment method for the stiffness of the probe of an atomic force microscope, which includes the following steps:
- the non-conductive material is resin material, polyethylene, polypropylene or rubber.
- the probe used in this embodiment is a piezoresistive self-induction atomic force microscope probe produced by Japan's HITACHI company.
- the working principle is to sense the tiny deformation of the cantilever beam through the change of the resistance value of the piezoresistive sensor on the surface of the cantilever beam. Moreover, by applying a voltage to the probe, the cantilever beam can be heated up. Due to the actual micro-machining error, the stiffness of the AFM probe is 40 ⁇ 5N/m.
- the specific implementation steps of this embodiment are as follows: apply the target voltage to the probe of the atomic force microscope to 1-5V, and after heating for 1 minute, the temperature reaches 80°C. Drive the AFM probe close to the resin material until it is "immersed” in the resin material. After being “immersed” in the resin material for 1 minute, drive the AFM probe again to move the AFM probe away from the resin material. At this time, the surface of the cantilever beam of the atomic force microscope probe is covered with a layer of resin material. After software testing and software calculation, the overall stiffness of the atomic force microscope probe has increased to 67.87N/m.
- the speed at which the probe of the atomic force microscope approaches the resin material is controlled below 20 nm/s to prevent the probe from being damaged.
- the overall stiffness of the atomic force microscope probe can be adjusted by controlling the heating temperature and the "immersion" time. Refer to Table 4 and Table 5 for details.
Abstract
Description
振动频率(kHz) | 5 | 10 | 15 | 20 |
悬臂梁-涂层复合件刚度(N/m) | 143.56 | 102.98 | 95.67 | 79.82 |
振动幅度(μm) | 3 | 3.5 | 4 | 5 |
悬臂梁-涂层复合件刚度(N/m) | 102.98 | 87.68 | 68.75 | 60.38 |
冷却速度(℃/s) | 0.1 | 1 | 10 |
悬臂梁-涂层复合件的刚度(N/m) | 100.98 | 87.53 | 75.63 |
“包裹”时间(min) | 0.1 | 1 | 5 |
悬臂梁-涂层复合件的刚度(N/m) | 55.65 | 67.87 | 80.65 |
加热温度(℃) | 30 | 80 | 120 |
悬臂梁-涂层复合件的刚度(N/m) | 89.65 | 67.87 | 38.24 |
Claims (14)
- 一种原子力显微镜的探针的刚度实时调节方法,所述探针包括悬臂梁和针尖,其特征在于,包括以下步骤:在所述悬臂梁上涂有刚度调节层,形成悬臂梁-涂层复合件;通过改变所述刚度调节层的温度以改变悬臂梁-涂层复合件的刚度。
- 如权利要求1所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述刚度调节层为金属层,所述金属层的熔点低于所述悬臂梁的熔点。
- 如权利要求2所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述金属层为铟、铋、锡、金中的一种或多种组成的合金。
- 如权利要求2所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述刚度调节层通过涂覆法、电子束溅射法、化学气相沉积法或聚焦离子束沉积法制备。
- 如权利要求2所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“通过改变所述刚度调节层的温度以改变悬臂梁-涂层复合件的刚度”,具体包括以下步骤:加热探针,所述悬臂梁上金属层熔化,得到熔融状态下的金属液;振动探针以使得金属液均匀铺设在悬臂梁外壁上;冷却金属液,所述金属液在悬臂梁表面凝固成型。
- 如权利要求5所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“振动探针以使得金属液均匀铺设在悬臂梁外壁上”中,所述探针的振动频率为5khz-20khz,所述探针的振动幅度为3-5μm。
- 如权利要求5所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“冷却金属液”,冷却速度小于10℃/s。
- 如权利要求5所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“振动探针以使得金属液均匀铺设在悬臂梁外壁上”,探针的振动采用压电陶瓷驱动器驱动。
- 如权利要求2所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“通过改变所述刚度调节层的温度以改变悬臂梁-涂层复合件的刚度”,包括以下步骤:加热探针,所述悬臂梁上金属层熔化,得到熔融状态下的金属液;通过控制探针的冷却速度来改变金属液凝固成型后的晶粒形貌,获取不同刚度的悬臂梁-涂层复合件。
- 如权利要求9所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述“探针的冷却速度”为0.1-10℃/s。
- 一种原子力显微镜的探针的刚度实时调节方法,所述探针包括悬臂梁和针尖,其特征在于,包括以下步骤:加热探针,使得探针的温度大于非导电材料的熔点;将加热后的探针浸没在非导电材料中并停留;将探针从非导电材料中拔出,此时探针表面涂覆有非导电材料,停止加热探针,非导电材料在探针上凝固成型。
- 如权利要求11所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述非导电材料的熔点低于100℃。
- 如权利要求11所述的原子力显微镜的探针的刚度实时调节方法,其特 征在于,所述“将探针从非导电材料中拔出,此时探针表面涂覆有非导电材料,停止加热探针,非导电材料在探针上凝固成型”之后还包括:刮除针尖的非导电材料。
- 如权利要求11所述的原子力显微镜的探针的刚度实时调节方法,其特征在于,所述非导电材料为树脂材料、聚乙烯、聚丙烯或者橡胶。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2643316Y (zh) * | 2003-09-27 | 2004-09-22 | 均豪精密工业股份有限公司 | 具有高强度探针的纳米机械性质测量装置 |
WO2007095360A2 (en) * | 2006-02-14 | 2007-08-23 | The Regents Of The University Of California | Coupled mass-spring systems and imaging methods for scanning probe microscopy |
CN101876667A (zh) * | 2010-06-30 | 2010-11-03 | 北京大学 | 基于碳纳米管和平面波导结构的原子力显微镜探针 |
CN107328956A (zh) * | 2017-06-05 | 2017-11-07 | 南京航空航天大学 | 一种包裹二维材料的原子力显微镜探针制备方法 |
CN109239405A (zh) * | 2018-07-24 | 2019-01-18 | 西安交通大学 | 一种原子力显微镜探针的制备方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3290378B2 (ja) * | 1996-06-13 | 2002-06-10 | インターナショナル・ビジネス・マシーンズ・コーポレーション | Afm/stm形状測定のためのマイクロメカニカル・センサ |
US20030143327A1 (en) * | 2001-12-05 | 2003-07-31 | Rudiger Schlaf | Method for producing a carbon nanotube |
US6612161B1 (en) * | 2002-07-23 | 2003-09-02 | Fidelica Microsystems, Inc. | Atomic force microscopy measurements of contact resistance and current-dependent stiction |
GB0316577D0 (en) * | 2003-07-15 | 2003-08-20 | Univ Bristol | Atomic force microscope |
WO2007037994A2 (en) * | 2005-09-26 | 2007-04-05 | General Nanotechnology Llc | Manufacturing of micro-objects such as miniature diamond tool tips |
US20100196661A1 (en) * | 2009-01-30 | 2010-08-05 | Duerig Urs T | Method for patterning nano-scale patterns of molecules on a surface of a material |
JP2011008070A (ja) * | 2009-06-26 | 2011-01-13 | Ricoh Co Ltd | マイクロミラー装置 |
JP5519572B2 (ja) * | 2011-05-09 | 2014-06-11 | 株式会社日立ハイテクノロジーズ | 磁気力顕微鏡用カンチレバー |
CN102738380B (zh) * | 2012-06-05 | 2015-04-15 | 东南大学 | 微纳热电偶探针的制备装置 |
EP2835654A1 (en) * | 2013-08-09 | 2015-02-11 | Université de Genève | Insulator coated conductive probe and method of production thereof |
CN110082014B (zh) * | 2013-12-07 | 2021-08-03 | 布鲁克公司 | 具有与样品交互的探针的原子力显微镜 |
CN104698224A (zh) * | 2013-12-09 | 2015-06-10 | 孙宝恒 | 高灵敏微悬臂梁探针 |
CN104360107B (zh) * | 2014-11-12 | 2016-11-30 | 苏州大学 | 一种石墨烯包覆原子力显微镜探针及其制备方法、用途 |
CN104764905B (zh) * | 2015-03-24 | 2018-04-20 | 清华大学深圳研究生院 | 一种原子力显微镜扫描热探针及其制备方法 |
KR101742211B1 (ko) * | 2015-11-23 | 2017-05-31 | 주식회사 포스코 | 마이크로 rna의 초민감성 정량 분석 방법 및 장치 |
US20170184631A1 (en) * | 2015-12-14 | 2017-06-29 | Applied Nanostructures, Inc. | Probe device for scanning probe microscopes and method of manufacture thereof |
CN105712281B (zh) * | 2016-02-18 | 2017-08-04 | 国家纳米科学中心 | 一种锥形纳米碳材料功能化针尖及其制备方法 |
EP3480583B1 (en) * | 2016-06-30 | 2024-04-24 | Kyoto University | Probe manufacturing method |
WO2018039246A1 (en) * | 2016-08-22 | 2018-03-01 | Bruker Nano, Inc. | Infrared characterization of a sample using peak force tapping |
WO2018089022A1 (en) * | 2016-11-11 | 2018-05-17 | Aaron Lewis | Enhancing optical signals with probe tips optimized for chemical potential and optical characteristics |
CN106501551B (zh) * | 2016-12-29 | 2019-08-06 | 山东大学 | 一种基于光纤的原子力显微镜探头及原子力显微镜*** |
CN107561315B (zh) * | 2017-09-14 | 2019-08-30 | 浙江大学 | 一种金属中微观氢分布及氢偏聚激活能的测试装置及方法 |
CN108051614B (zh) * | 2017-12-05 | 2020-03-24 | 湘潭大学 | 一种基于扫描电镜原位力学测试***的光/力/电耦合测试装置及其测试方法 |
CN110051343B (zh) * | 2019-04-08 | 2020-05-22 | 北京大学 | 一种以不锈钢为基材的多功能三维生物微探针及其制备方法 |
CN112394199A (zh) * | 2019-08-16 | 2021-02-23 | 长鑫存储技术有限公司 | 原子力显微镜及其测量方法 |
CN112964910A (zh) * | 2020-09-16 | 2021-06-15 | 中国科学院沈阳自动化研究所 | 原子力显微镜一体化双探针快速原位切换测量方法与装置 |
-
2019
- 2019-12-20 CN CN201911329307.5A patent/CN110954714B/zh active Active
- 2019-12-23 WO PCT/CN2019/127400 patent/WO2021120233A1/zh active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2643316Y (zh) * | 2003-09-27 | 2004-09-22 | 均豪精密工业股份有限公司 | 具有高强度探针的纳米机械性质测量装置 |
WO2007095360A2 (en) * | 2006-02-14 | 2007-08-23 | The Regents Of The University Of California | Coupled mass-spring systems and imaging methods for scanning probe microscopy |
CN101876667A (zh) * | 2010-06-30 | 2010-11-03 | 北京大学 | 基于碳纳米管和平面波导结构的原子力显微镜探针 |
CN107328956A (zh) * | 2017-06-05 | 2017-11-07 | 南京航空航天大学 | 一种包裹二维材料的原子力显微镜探针制备方法 |
CN109239405A (zh) * | 2018-07-24 | 2019-01-18 | 西安交通大学 | 一种原子力显微镜探针的制备方法 |
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