WO2021056729A1 - Array substrate, display panel, and manufacturing method for array substrate - Google Patents

Array substrate, display panel, and manufacturing method for array substrate Download PDF

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Publication number
WO2021056729A1
WO2021056729A1 PCT/CN2019/117490 CN2019117490W WO2021056729A1 WO 2021056729 A1 WO2021056729 A1 WO 2021056729A1 CN 2019117490 W CN2019117490 W CN 2019117490W WO 2021056729 A1 WO2021056729 A1 WO 2021056729A1
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Prior art keywords
layer
screen
array substrate
under
camera area
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PCT/CN2019/117490
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French (fr)
Chinese (zh)
Inventor
梅新东
王超
刘广辉
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武汉华星光电技术有限公司
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Publication of WO2021056729A1 publication Critical patent/WO2021056729A1/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/13306—Circuit arrangements or driving methods for the control of single liquid crystal cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1259—Multistep manufacturing methods

Definitions

  • the present invention relates to the technical field of display panel processing, in particular to a manufacturing method of an array substrate, a display panel and an array substrate.
  • Under-screen camera technology means that full-screen display can be achieved without destroying the integrity of the screen.
  • the screen display is divided into two parts: the regular display area and the camera area under the screen.
  • the camera area under the screen is used for screen display, realizing a full screen display.
  • the camera function is realized when the camera is turned on.
  • the camera area under the screen is different from the conventional display area.
  • the type of liquid crystal used is a scattering type liquid crystal, which can perform transparent display. Under normal circumstances, light passing through the liquid crystal layer will be scattered by the liquid crystal layer, and the light passing through the display becomes less, which makes the display appear in a scattered fog state. Haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials.
  • the larger the optical path the more obvious the effect of light scattering by the liquid crystal, and the better the haze effect.
  • the conversion of the scattered fog state and the transmitted transparent state can be realized.
  • the greater the contrast between the transparent state and the fog state the better the display effect.
  • the thickness of the liquid crystal layer in the camera area under the screen of the existing display panel is about three micrometers, and its haze is poor, which affects its contrast and the display effect of the picture is also poor.
  • the purpose of the present invention is to provide an array substrate, a display panel and a manufacturing method of the array substrate, which solves the technical problem of low haze in the camera area under the screen, thereby improving the contrast of the camera area under the screen and enhancing The picture display effect of the camera area under the screen.
  • the present invention provides an array substrate with a display area and an under-screen camera area.
  • the array substrate includes a substrate, a driving circuit layer, a flat layer, a common electrode layer, an insulating layer, and pixels that are sequentially stacked from bottom to top. Electrode layer.
  • the driving circuit layer is provided on the substrate; the flat layer is provided on the driving circuit layer; the flat layer is provided with a groove in the camera area under the screen; the common electrode The layer is arranged on the flat layer; the insulating layer is arranged on the common electrode layer; the pixel electrode layer is arranged on the insulating layer.
  • the distribution range of the groove is the same as the distribution range of the camera area under the screen.
  • the depth of the groove is equal to the thickness of the flat layer.
  • the depth of the groove is 1um-2um.
  • the present invention also provides a manufacturing method of the array substrate, including the following steps:
  • a pixel electrode layer is formed on the insulating layer.
  • the step of making the groove is to form the groove by etching on the flat layer located in the under-screen camera area; the distribution range of the groove and the distribution of the under-screen camera area The scope is the same.
  • the depth of the groove is equal to the thickness of the flat layer; the depth of the groove is 1um-2um.
  • the present invention further provides a display panel including the above-mentioned array substrate.
  • the display panel further includes a liquid crystal layer and a color filter substrate, the liquid crystal layer is provided on the array substrate; the thickness of the liquid crystal layer located in the camera area under the screen is 4um-5um;
  • the film substrate is arranged on the liquid crystal layer and opposite to the array substrate.
  • the distance between the pixel electrode layer and the color filter substrate is 4um-5um.
  • the beneficial effect of the present invention is to provide an array substrate, a display panel, and a manufacturing method of the array substrate.
  • the liquid crystal layer of the display panel in the camera area under the screen corresponds to The position thickness of the groove is increased, so that the thickness of the liquid crystal layer is increased from about three micrometers to about five micrometers, which increases the optical path of light passing through the liquid crystal layer, thereby improving the scattering effect of light, thereby increasing
  • the haze of the liquid crystal layer is increased, the technical problem of low haze of the camera area under the screen is solved, the contrast of the camera area under the screen is improved, and the picture display effect of the camera area under the screen is enhanced.
  • FIG. 1 is a schematic diagram of a planar structure of a display panel in an embodiment of the present invention
  • FIG. 2 is a cross-sectional view of the display panel at A-A in FIG. 1;
  • FIG. 3 is a schematic diagram of the structure of an array substrate in an embodiment of the present invention.
  • FIG. 4 is a flowchart of a manufacturing method of an array substrate in an embodiment of the present invention.
  • the terms “installed”, “connected”, “connected”, “fixed” and other terms should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. , Or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication of two components or the interaction relationship between two components.
  • installed can be a fixed connection or a detachable connection. , Or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication of two components or the interaction relationship between two components.
  • a display panel 100 is provided, which is provided with a display area 11 and an under-screen camera area 12.
  • the display area 11 is a normal display area 111
  • the under-screen camera area 12 is a transparent display area
  • a camera hole 121 is opened in the middle of the under-screen camera area 12.
  • FIG. 2 is a cross-sectional view of the display panel 100 at A-A in FIG. 1.
  • the display panel 100 includes an array substrate 10, a liquid crystal layer 20 and a color filter substrate 30.
  • the liquid crystal layer 20 is disposed on the array substrate 10; the thickness of the liquid crystal layer 20 located in the under-screen camera area 12 is 4um-5um, preferably 5um; the color film substrate 30 is disposed on the liquid crystal
  • the layer 20 is disposed opposite to the array substrate 10.
  • the liquid crystal layer 20 located in the display area 11 uses conventional liquid crystals; the liquid crystal layer 20 located in the under-screen camera area 12 uses scattering type liquid crystals. When light passes through the liquid crystal layer 20, the liquid crystal layer 20 is scattered, and the transmitted light becomes less, so that the camera area 12 under the screen is in a scattered fog state.
  • the thickness of the liquid crystal layer 20 located in the display area 11 is about three microns. If the structure of the array substrate 10 of the under-screen camera area 12 is not changed, the thickness of the under-screen camera area 12 is also about three microns. , It is difficult to increase its haze. Haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials.
  • a groove 31 is provided to increase the optical path to increase the degree of scattering and thereby increase the haze effect. Therefore, the contrast of the under-screen camera area 12 is improved, and the picture display effect of the under-screen camera area 12 is enhanced.
  • the display panel 100 further includes a camera sensor 40, and the camera sensor 40 is arranged corresponding to the under-screen camera area 12.
  • the under-screen camera area 12 is used for image display to realize a full-screen display; when the camera sensor 40 is turned on, the under-screen camera area 12 is in a transparent display mode to realize the camera function.
  • the display panel 100 of the present invention can be applied to various occasions and can be combined with various devices and structures.
  • the display panel 100 can be a mobile terminal, such as a mobile phone, a smart wearable, or a fixed terminal (PC), or a Other devices that display functions, such as tablets, televisions, display windows, etc. It should be understood that, in order to realize functions, the display panel 100 of the present invention has other devices, structures, etc. that are not shown in this specification.
  • the array substrate 10 includes a substrate 1, a driving circuit layer 2, a flat layer 3, a common electrode layer 4, an insulating layer 5, and a pixel electrode layer 6 stacked in sequence from bottom to top.
  • the driving circuit layer 2 is provided on the substrate 1;
  • the flat layer 3 is provided on the driving circuit layer 2;
  • the flat layer 3 is provided with a recess in the camera area 12 under the screen.
  • the common electrode layer 4 is provided on the flat layer 3;
  • the insulating layer 5 is provided on the common electrode layer 4;
  • the pixel electrode layer 6 is provided on the insulating layer 5.
  • the groove 31 is made on the flat layer 3 in the under-screen camera area 12, so that the thickness of the liquid crystal layer in the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased from about three microns.
  • the optical path of light passing through the liquid crystal layer is increased, thereby improving the light scattering effect; haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials.
  • the greater the optical path The more obvious the effect of light scattering by the liquid crystal, the better the haze effect; this embodiment increases the optical path of the light passing through the liquid crystal layer, thereby increasing the haze of the liquid crystal layer, and solves the haze of the camera area 12 under the screen.
  • Lower technical problems thereby improving the contrast of the camera area 12 under the screen, and enhancing the picture display effect of the camera area 12 under the screen.
  • the distribution range of the groove 31 is the same as the distribution range of the under-screen camera area 12. That is, the groove 31 removes the entire flat layer 3 in the under-screen camera area 12, which is a groove relative to the entire array substrate 10, so that the arrangement can maximize the under-screen camera area.
  • the thickness of 12 is reduced relative to the thickness of the display area 11, so that the thickness of the liquid crystal layer of the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased.
  • the depth of the groove 31 is equal to the thickness of the flat layer 3. In this way, the entire flat layer 3 can be removed from the flat layer 3 in the under-screen camera area 12.
  • the depth of the groove 31 is 1um-2um.
  • the thickness of the flat layer 3 is 1 um-2 um, and the depth of the groove 31 can be such that the entire flat layer 3 is removed from the under-screen camera area 12.
  • the thickness of the flat layer 3 is greater than 3um, the depth of the groove 31 is such that the groove 31 will not penetrate the flat layer 3, so that the structural strength will be relatively high, and the structural stability will be better. Deformed.
  • the distance between the pixel electrode layer 6 and the color filter substrate 30 is 4um-5um.
  • the thickness of the liquid crystal layer 20 of the under-screen camera area 12 at the position corresponding to the groove 31 is increased, so that the thickness of the liquid crystal layer 20 is changed from the original
  • the increase of about three microns to about five microns increases the optical path of light passing through the liquid crystal layer 20, thereby improving the light scattering effect, thereby increasing the haze of the liquid crystal layer 20, and improving the under-screen camera Contrast of zone 12.
  • the present invention also provides a manufacturing method of the array substrate 10, which includes the following steps:
  • a substrate 1 is provided, and the substrate 1 is provided with a display area 11 and an under-screen camera area 12;
  • the step of making the groove 31 is to form the groove 31 by etching on the flat layer 3 located in the under-screen camera area 12;
  • the distribution range of the camera area 12 under the screen is the same. That is, the groove 31 removes the entire flat layer 3 in the under-screen camera area 12, which is a groove relative to the entire array substrate 10, so that the arrangement can maximize the under-screen camera area.
  • the thickness of 12 is reduced relative to the thickness of the display area 11, so that the thickness of the liquid crystal layer of the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased.
  • the depth of the groove 31 is equal to the thickness of the flat layer 3; the depth of the groove 31 is 1um-2um.
  • the thickness of the flat layer 3 is 1 um-2 um, and the depth of the groove 31 can be such that the entire flat layer 3 is removed from the under-screen camera area 12.
  • the thickness of the flat layer 3 is greater than 3um, the depth of the groove 31 is such that the groove 31 will not penetrate the flat layer 3, so that the structural strength will be relatively high, and the structural stability will be better. Deformed.
  • the beneficial effect of the present invention is to provide a manufacturing method of the array substrate 10, the display panel 100, and the array substrate 10, by forming the groove 31 on the flat layer 3 located in the camera area 12 under the screen, so that the display panel 100 is under the screen.
  • the thickness of the liquid crystal layer 20 of the camera area 12 increases at the position corresponding to the groove 31, so that the thickness of the liquid crystal layer 20 increases from about three microns to about five microns, which increases the amount of light passing through the liquid crystal layer 20. Therefore, the light scattering effect is improved, the haze of the liquid crystal layer 20 is increased, the technical problem of low haze of the camera area 12 under the screen is solved, and the contrast of the camera area 12 under the screen is improved.
  • the picture display effect of the camera area 12 under the screen is enhanced.

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Abstract

The present invention provides an array substrate, a display panel, and a manufacturing method for the array substrate. The array substrate is provided with a display area and an under-screen camera area and comprises a substrate, a driving circuit layer, a planarization layer, a common electrode layer, an insulating layer, and a pixel electrode layer which are sequentially stacked from bottom to top. The planarization layer is provided with a groove in the under-screen camera area. The display panel comprises the array substrate.

Description

阵列基板、显示面板及阵列基板的制作方法Array substrate, display panel and manufacturing method of array substrate 技术领域Technical field
本发明涉及显示面板加工技术领域，尤其涉及一种阵列基板、显示面板及阵列基板的制作方法。The present invention relates to the technical field of display panel processing, in particular to a manufacturing method of an array substrate, a display panel and an array substrate.
背景技术Background technique
随着显示技术的革新和发展，占屏比这一概念越来越重要，为实现全面屏显示，摄像头在屏幕中占据的空间尤为重要。With the innovation and development of display technology, the concept of screen-to-body ratio becomes more and more important. In order to realize a full-screen display, the space occupied by the camera on the screen is particularly important.
屏下摄像头技术是指在不破坏屏幕完整性的前提下，可以实现全面屏显示。屏幕显示区分为两个部分：常规显示区以及屏下摄像头区。在摄像头关闭时，屏下摄像头区用于画面显示，实现全面屏显示。在摄像头开启时实现摄像功能。屏下摄像头区不同于常规显示区，采用的液晶类型属于散射型液晶，能够进行透明显示。正常情况下，光线通过液晶层会被液晶层散射，透过显示器的光线变少，使显示器呈散射的雾态。雾度是衡量透明或半透明材料透明特性的重要参数，通常情况下，光程越大，光线被液晶散射的效果越明显，雾度效果越好。通过对电压的控制可以实现散射的雾态和透射的透态的转化。屏下摄像头区用于画面显示时，透态与雾态的对比度越大，显示效果越好。通过对屏下摄像头区雾态下光线的透过率的控制来调节雾度，调节对比度，可以实现画面更好的显示效果。Under-screen camera technology means that full-screen display can be achieved without destroying the integrity of the screen. The screen display is divided into two parts: the regular display area and the camera area under the screen. When the camera is closed, the camera area under the screen is used for screen display, realizing a full screen display. The camera function is realized when the camera is turned on. The camera area under the screen is different from the conventional display area. The type of liquid crystal used is a scattering type liquid crystal, which can perform transparent display. Under normal circumstances, light passing through the liquid crystal layer will be scattered by the liquid crystal layer, and the light passing through the display becomes less, which makes the display appear in a scattered fog state. Haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials. Generally, the larger the optical path, the more obvious the effect of light scattering by the liquid crystal, and the better the haze effect. Through the control of the voltage, the conversion of the scattered fog state and the transmitted transparent state can be realized. When the camera area under the screen is used for picture display, the greater the contrast between the transparent state and the fog state, the better the display effect. By controlling the transmittance of the light in the fog state of the camera area under the screen to adjust the haze and adjust the contrast, a better display effect of the picture can be achieved.
但现有显示面板的屏下摄像头区的液晶层厚度为三微米左右，其雾度较差，从而影响其对比度较差，画面的显示效果也较差。However, the thickness of the liquid crystal layer in the camera area under the screen of the existing display panel is about three micrometers, and its haze is poor, which affects its contrast and the display effect of the picture is also poor.
技术问题technical problem
本发明的目的在于，提供一种阵列基板、显示面板及阵列基板的制作方法，解决了屏下摄像头区的雾度较低的技术问题，从而提高了所述屏下摄像头区的对比度，增强了所述屏下摄像头区的画面显示效果。The purpose of the present invention is to provide an array substrate, a display panel and a manufacturing method of the array substrate, which solves the technical problem of low haze in the camera area under the screen, thereby improving the contrast of the camera area under the screen and enhancing The picture display effect of the camera area under the screen.
技术解决方案Technical solutions
为了解决上述问题，本发明提供一种阵列基板，设有显示区和屏下摄像头区，阵列基板包括从下至上依次层叠设置的基板、驱动电路层、平坦层、公共电极层、绝缘层和像素电极层。具体地讲，所述驱动电路层设于所述基板上；所述平坦层设于所述驱动电路层上；所述平坦层在位于所述屏下摄像头区设有凹槽；所述公共电极层设于所述平坦层上；所述绝缘层设于所述公共电极层上；所述像素电极层设于所述绝缘层上。In order to solve the above-mentioned problems, the present invention provides an array substrate with a display area and an under-screen camera area. The array substrate includes a substrate, a driving circuit layer, a flat layer, a common electrode layer, an insulating layer, and pixels that are sequentially stacked from bottom to top. Electrode layer. Specifically, the driving circuit layer is provided on the substrate; the flat layer is provided on the driving circuit layer; the flat layer is provided with a groove in the camera area under the screen; the common electrode The layer is arranged on the flat layer; the insulating layer is arranged on the common electrode layer; the pixel electrode layer is arranged on the insulating layer.
进一步地，所述凹槽的分布范围与所述屏下摄像头区的分布范围相同。Further, the distribution range of the groove is the same as the distribution range of the camera area under the screen.
进一步地，所述凹槽的深度等于所述平坦层的厚度。Further, the depth of the groove is equal to the thickness of the flat layer.
进一步地，所述凹槽的深度为1um-2um。Further, the depth of the groove is 1um-2um.
本发明还提供一种阵列基板的制作方法，包括以下步骤：The present invention also provides a manufacturing method of the array substrate, including the following steps:
提供一基板，所述基板设有显示区和屏下摄像头区；Providing a substrate with a display area and an under-screen camera area;
在所述基板上制作驱动电路层；Fabricating a driving circuit layer on the substrate;
在所述驱动电路层上制作平坦层，并在位于所述屏下摄像头区的所述平坦层上制作凹槽；Fabricating a flat layer on the driving circuit layer, and fabricating a groove on the flat layer located in the camera area under the screen;
在所述平坦层上制作公共电极层；Fabricating a common electrode layer on the flat layer;
在所述公共电极层上制作绝缘层；以及Fabricating an insulating layer on the common electrode layer; and
在所述绝缘层上制作像素电极层。A pixel electrode layer is formed on the insulating layer.
进一步地，所述制作凹槽的步骤为在位于所述屏下摄像头区的所述平坦层上通过蚀刻方式形成所述凹槽；所述凹槽的分布范围与所述屏下摄像头区的分布范围相同。Further, the step of making the groove is to form the groove by etching on the flat layer located in the under-screen camera area; the distribution range of the groove and the distribution of the under-screen camera area The scope is the same.
进一步地，所述凹槽的深度等于所述平坦层的厚度；所述凹槽的深度为1um-2um。Further, the depth of the groove is equal to the thickness of the flat layer; the depth of the groove is 1um-2um.
本发明再提供一种显示面板，包括上述阵列基板。The present invention further provides a display panel including the above-mentioned array substrate.
进一步地，所述显示面板还包括液晶层和彩膜基板，所述液晶层设于所述阵列基板上；位于所述屏下摄像头区的所述液晶层的厚度为4um-5um；所述彩膜基板设于所述液晶层上且与所述阵列基板相对设置。Further, the display panel further includes a liquid crystal layer and a color filter substrate, the liquid crystal layer is provided on the array substrate; the thickness of the liquid crystal layer located in the camera area under the screen is 4um-5um; The film substrate is arranged on the liquid crystal layer and opposite to the array substrate.
进一步地，在所述屏下摄像头区内，所述像素电极层与所述彩膜基板的距离为4um-5um。Further, in the under-screen camera area, the distance between the pixel electrode layer and the color filter substrate is 4um-5um.
有益效果Beneficial effect
本发明的有益效果在于，提供一种阵列基板、显示面板及阵列基板的制作方法，通过在位于屏下摄像头区的平坦层上制作凹槽，使得显示面板在屏下摄像头区的液晶层在对应所述凹槽的位置厚度增大，从而液晶层的厚度由原来的三微米左右增加到五微米左右，增大了光线经过所述液晶层的光程，继而提高了光线的散射效果，进而增大了液晶层的雾度，解决了屏下摄像头区的雾度较低的技术问题，且提高了所述屏下摄像头区的对比度，增强了所述屏下摄像头区的画面显示效果。The beneficial effect of the present invention is to provide an array substrate, a display panel, and a manufacturing method of the array substrate. By making grooves on the flat layer located in the camera area under the screen, the liquid crystal layer of the display panel in the camera area under the screen corresponds to The position thickness of the groove is increased, so that the thickness of the liquid crystal layer is increased from about three micrometers to about five micrometers, which increases the optical path of light passing through the liquid crystal layer, thereby improving the scattering effect of light, thereby increasing The haze of the liquid crystal layer is increased, the technical problem of low haze of the camera area under the screen is solved, the contrast of the camera area under the screen is improved, and the picture display effect of the camera area under the screen is enhanced.
附图说明Description of the drawings
图1为本发明的实施例中一种显示面板的平面结构示意图；FIG. 1 is a schematic diagram of a planar structure of a display panel in an embodiment of the present invention;
图2为图1在A-A处的所述显示面板的截面图；2 is a cross-sectional view of the display panel at A-A in FIG. 1;
图3为本发明的实施例中一种阵列基板的结构示意图；3 is a schematic diagram of the structure of an array substrate in an embodiment of the present invention;
图4为本发明的实施例中一种阵列基板的制作方法的流程图。FIG. 4 is a flowchart of a manufacturing method of an array substrate in an embodiment of the present invention.
图中部件标识如下：The components in the figure are identified as follows:
1、基板，2、驱动电路层，3、平坦层，4、公共电极层，1. Substrate, 2. Drive circuit layer, 3. Flat layer, 4. Common electrode layer,
5、绝缘层，6、像素电极层，10、阵列基板，11、显示区，5. Insulating layer, 6. Pixel electrode layer, 10. Array substrate, 11. Display area,
12、屏下摄像头区，20、液晶层，30、彩膜基板，31、凹槽，12. Camera area under the screen, 20, liquid crystal layer, 30, color film substrate, 31, groove,
40、摄像头传感器，100、显示面板。40. Camera sensor, 100. Display panel.
本发明的实施方式Embodiments of the present invention
以下各实施例的说明是参考附加的图示，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如[上]、[下]、[前]、[后]、[左]、[右]、[内]、[外]、[侧面]等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。在图中，结构相似的单元是用以相同标号表示。The description of the following embodiments refers to the attached drawings to illustrate specific embodiments in which the present invention can be implemented. The directional terms mentioned in the present invention, such as [Up], [Down], [Front], [Back], [Left], [Right], [Inner], [Outer], [Side], etc., are for reference only The direction of the additional schema. Therefore, the directional terms used are used to describe and understand the present invention, rather than to limit the present invention. In the figure, units with similar structures are indicated by the same reference numerals.
在附图中，为了清楚，层和区域的厚度被夸大。例如，为了便于描述，附图中的元件的厚度和尺寸被任意地示出，因此，所描述的技术范围不由附图限定。In the drawings, the thickness of layers and regions are exaggerated for clarity. For example, for ease of description, the thickness and size of the elements in the drawings are arbitrarily shown, and therefore, the described technical scope is not limited by the drawings.
在本发明中，除非另有明确的规定和限定，术语“安装”、“相连”、“连接”、“固定”等术语应做广义理解，例如，可以是固定连接，也可以是可拆卸连接，或成一体；可以是机械连接，也可以是电连接；可以是直接相连，也可以通过中间媒介间接相连，可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言，可以根据具体情况理解上述术语在本发明中的具体含义。In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and other terms should be understood in a broad sense, for example, it can be a fixed connection or a detachable connection. , Or integrated; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, and it can be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above-mentioned terms in the present invention can be understood according to specific situations.
请参阅图1所示，本发明的第一实施例中提供一种显示面板100，设有显示区11和屏下摄像头区12。所述显示区11为常规显示区111，所述屏下摄像头区12为透明显示区，在所述屏下摄像头区12中间开设摄像头孔121。Please refer to FIG. 1, in the first embodiment of the present invention, a display panel 100 is provided, which is provided with a display area 11 and an under-screen camera area 12. The display area 11 is a normal display area 111, the under-screen camera area 12 is a transparent display area, and a camera hole 121 is opened in the middle of the under-screen camera area 12.
请参阅图2所示，为图1在A-A处的所述显示面板100的截面图，所述显示面板100包括阵列基板10、液晶层20和彩膜基板30。所述液晶层20设于所述阵列基板10上；位于所述屏下摄像头区12的所述液晶层20的厚度为4um-5um，优选为5um；所述彩膜基板30设于所述液晶层20上且与所述阵列基板10相对设置。Please refer to FIG. 2, which is a cross-sectional view of the display panel 100 at A-A in FIG. 1. The display panel 100 includes an array substrate 10, a liquid crystal layer 20 and a color filter substrate 30. The liquid crystal layer 20 is disposed on the array substrate 10; the thickness of the liquid crystal layer 20 located in the under-screen camera area 12 is 4um-5um, preferably 5um; the color film substrate 30 is disposed on the liquid crystal The layer 20 is disposed opposite to the array substrate 10.
位于所述显示区11的所述液晶层20使用常规液晶；位于所述屏下摄像头区12的所述液晶层20使用散射型液晶，在光线通过所述液晶层20时会被所述液晶层20散射，透过的光线变少，使所述屏下摄像头区12呈散射的雾态。位于所述显示区11的所述液晶层20的厚度为三微米左右，若不改变所述屏下摄像头区12的阵列基板10结构，则所述屏下摄像头区12的厚度也为三微米左右，很难提高其雾度。雾度是衡量透明或半透明材料透明特性的重要参数，通常情况下，光程越大，光线被液晶散射的效果越明显，雾度效果越好。为增大位于所述屏下摄像头区12的所述液晶层20在散射态时的雾度效果，本实施例通过设置凹槽31来增大光程以增加散射程度进而增大雾度效果，从而提高了所述屏下摄像头区12的对比度，增强了所述屏下摄像头区12的画面显示效果。The liquid crystal layer 20 located in the display area 11 uses conventional liquid crystals; the liquid crystal layer 20 located in the under-screen camera area 12 uses scattering type liquid crystals. When light passes through the liquid crystal layer 20, the liquid crystal layer 20 is scattered, and the transmitted light becomes less, so that the camera area 12 under the screen is in a scattered fog state. The thickness of the liquid crystal layer 20 located in the display area 11 is about three microns. If the structure of the array substrate 10 of the under-screen camera area 12 is not changed, the thickness of the under-screen camera area 12 is also about three microns. , It is difficult to increase its haze. Haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials. Generally, the larger the optical path, the more obvious the effect of light scattering by the liquid crystal, and the better the haze effect. In order to increase the haze effect of the liquid crystal layer 20 in the under-screen camera area 12 in the scattering state, in this embodiment, a groove 31 is provided to increase the optical path to increase the degree of scattering and thereby increase the haze effect. Therefore, the contrast of the under-screen camera area 12 is improved, and the picture display effect of the under-screen camera area 12 is enhanced.
请参阅图2所示，本实施例中，所述显示面板100还包括摄像头传感器40，所述摄像头传感器40与所述屏下摄像头区12对应设置。在摄像头传感器40关闭时，所述屏下摄像头区12用于画面显示，实现全面屏显示；在摄像头传感器40开启时，所述屏下摄像头区12为透明显示方式，实现摄像功能。As shown in FIG. 2, in this embodiment, the display panel 100 further includes a camera sensor 40, and the camera sensor 40 is arranged corresponding to the under-screen camera area 12. When the camera sensor 40 is turned off, the under-screen camera area 12 is used for image display to realize a full-screen display; when the camera sensor 40 is turned on, the under-screen camera area 12 is in a transparent display mode to realize the camera function.
本发明的显示面板100可适用于各种场合，可与各种器件、结构相结合，显示面板100既可以是移动终端，如手机、智能穿戴，或者固定终端（PC），也可为带有显示功能的其他设备，例如平板电脑、电视机、显示橱窗等。应该理解，为了实现功能，本发明的显示面板100带有在本说明书中未示出的其他器件、结构等。The display panel 100 of the present invention can be applied to various occasions and can be combined with various devices and structures. The display panel 100 can be a mobile terminal, such as a mobile phone, a smart wearable, or a fixed terminal (PC), or a Other devices that display functions, such as tablets, televisions, display windows, etc. It should be understood that, in order to realize functions, the display panel 100 of the present invention has other devices, structures, etc. that are not shown in this specification.
请参阅图3所示，所述阵列基板10包括从下至上依次层叠设置的基板1、驱动电路层2、平坦层3、公共电极层4、绝缘层5和像素电极层6。具体地讲，所述驱动电路层2设于所述基板1上；所述平坦层3设于所述驱动电路层2上；所述平坦层3在位于所述屏下摄像头区12设有凹槽31；所述公共电极层4设于所述平坦层3上；所述绝缘层5设于所述公共电极层4上；所述像素电极层6设于所述绝缘层5上。As shown in FIG. 3, the array substrate 10 includes a substrate 1, a driving circuit layer 2, a flat layer 3, a common electrode layer 4, an insulating layer 5, and a pixel electrode layer 6 stacked in sequence from bottom to top. Specifically, the driving circuit layer 2 is provided on the substrate 1; the flat layer 3 is provided on the driving circuit layer 2; the flat layer 3 is provided with a recess in the camera area 12 under the screen. Groove 31; the common electrode layer 4 is provided on the flat layer 3; the insulating layer 5 is provided on the common electrode layer 4; the pixel electrode layer 6 is provided on the insulating layer 5.
本实施例通过在位于屏下摄像头区12的平坦层3上制作所述凹槽31，使得所述阵列基板10形成的显示面板在屏下摄像头区12的液晶层厚度由原来的三微米左右增加到五微米左右，增大了光线经过所述液晶层的光程，从而提高了光线的散射效果；雾度是衡量透明或半透明材料透明特性的重要参数，通常情况下，光程越大，光线被液晶散射的效果越明显，雾度效果越好；本实施例增大了光线经过所述液晶层的光程进而增大了液晶层的雾度，解决了屏下摄像头区12的雾度较低的技术问题，从而提高了所述屏下摄像头区12的对比度，增强了所述屏下摄像头区12的画面显示效果。In this embodiment, the groove 31 is made on the flat layer 3 in the under-screen camera area 12, so that the thickness of the liquid crystal layer in the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased from about three microns. To about five microns, the optical path of light passing through the liquid crystal layer is increased, thereby improving the light scattering effect; haze is an important parameter to measure the transparency characteristics of transparent or semi-transparent materials. Generally, the greater the optical path, The more obvious the effect of light scattering by the liquid crystal, the better the haze effect; this embodiment increases the optical path of the light passing through the liquid crystal layer, thereby increasing the haze of the liquid crystal layer, and solves the haze of the camera area 12 under the screen. Lower technical problems, thereby improving the contrast of the camera area 12 under the screen, and enhancing the picture display effect of the camera area 12 under the screen.
本实施例中，所述凹槽31的分布范围与所述屏下摄像头区12的分布范围相同。即所述凹槽31就是在所述屏下摄像头区12去掉整个所述平坦层3，相对于整个所述阵列基板10来说是一个槽，这样设置能够最大限度的将所述屏下摄像头区12的厚度相对于所述显示区11的厚度减小，从而使得所述阵列基板10形成的显示面板在屏下摄像头区12的液晶层厚度增大。In this embodiment, the distribution range of the groove 31 is the same as the distribution range of the under-screen camera area 12. That is, the groove 31 removes the entire flat layer 3 in the under-screen camera area 12, which is a groove relative to the entire array substrate 10, so that the arrangement can maximize the under-screen camera area. The thickness of 12 is reduced relative to the thickness of the display area 11, so that the thickness of the liquid crystal layer of the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased.
本实施例中，所述凹槽31的深度等于所述平坦层3的厚度。这样能够将所述平坦层3在所述屏下摄像头区12去掉整个所述平坦层3。In this embodiment, the depth of the groove 31 is equal to the thickness of the flat layer 3. In this way, the entire flat layer 3 can be removed from the flat layer 3 in the under-screen camera area 12.
本实施例中，所述凹槽31的深度为1um-2um。通常所述平坦层3的厚度为1um-2um，所述凹槽31的深度尺寸可以使得在所述屏下摄像头区12去掉整个所述平坦层3。当然若所述平坦层3的厚度大于3um，所述凹槽31的深度尺寸使得所述凹槽31不会贯穿所述平坦层3，这样结构强度会相对较高，结构稳定性更好，不易变形。In this embodiment, the depth of the groove 31 is 1um-2um. Generally, the thickness of the flat layer 3 is 1 um-2 um, and the depth of the groove 31 can be such that the entire flat layer 3 is removed from the under-screen camera area 12. Of course, if the thickness of the flat layer 3 is greater than 3um, the depth of the groove 31 is such that the groove 31 will not penetrate the flat layer 3, so that the structural strength will be relatively high, and the structural stability will be better. Deformed.
可以理解的是，在所述显示面板100中的所述屏下摄像头区12内，所述像素电极层6与所述彩膜基板30的距离为4um-5um。从而通过在位于屏下摄像头区12的平坦层3上制作凹槽31，使得屏下摄像头区12的液晶层20在对应所述凹槽31的位置厚度增大，从而液晶层20的厚度由原来的三微米左右增加到五微米左右，增大了光线经过所述液晶层20的光程，继而提高了光线的散射效果，进而增大了液晶层20的雾度，提高了所述屏下摄像头区12的对比度。It can be understood that, in the under-screen camera area 12 of the display panel 100, the distance between the pixel electrode layer 6 and the color filter substrate 30 is 4um-5um. Thus, by forming the groove 31 on the flat layer 3 of the under-screen camera area 12, the thickness of the liquid crystal layer 20 of the under-screen camera area 12 at the position corresponding to the groove 31 is increased, so that the thickness of the liquid crystal layer 20 is changed from the original The increase of about three microns to about five microns increases the optical path of light passing through the liquid crystal layer 20, thereby improving the light scattering effect, thereby increasing the haze of the liquid crystal layer 20, and improving the under-screen camera Contrast of zone 12.
请参阅图4所示，本发明还提供一种阵列基板10的制作方法，包括以下步骤：Referring to FIG. 4, the present invention also provides a manufacturing method of the array substrate 10, which includes the following steps:
S1、提供一基板1，所述基板1设有显示区11和屏下摄像头区12；S1. A substrate 1 is provided, and the substrate 1 is provided with a display area 11 and an under-screen camera area 12;
S2、在所述基板1上制作驱动电路层2；S2, fabricating a driving circuit layer 2 on the substrate 1;
S3、在所述驱动电路层2上制作平坦层3，并在位于所述屏下摄像头区12的所述平坦层3上制作凹槽31；S3, forming a flat layer 3 on the driving circuit layer 2, and forming a groove 31 on the flat layer 3 located in the under-screen camera area 12;
S4、在所述平坦层3上制作公共电极层4；S4, forming a common electrode layer 4 on the flat layer 3;
S5、在所述公共电极层4上制作绝缘层5；以及S5, forming an insulating layer 5 on the common electrode layer 4; and
S6、在所述绝缘层5上制作像素电极层6。S6, forming a pixel electrode layer 6 on the insulating layer 5.
本实施例中，所述制作凹槽31的步骤为在位于所述屏下摄像头区12的所述平坦层3上通过蚀刻方式形成所述凹槽31；所述凹槽31的分布范围与所述屏下摄像头区12的分布范围相同。即所述凹槽31就是在所述屏下摄像头区12去掉整个所述平坦层3，相对于整个所述阵列基板10来说是一个槽，这样设置能够最大限度的将所述屏下摄像头区12的厚度相对于所述显示区11的厚度减小，从而使得所述阵列基板10形成的显示面板在屏下摄像头区12的液晶层厚度增大。In this embodiment, the step of making the groove 31 is to form the groove 31 by etching on the flat layer 3 located in the under-screen camera area 12; The distribution range of the camera area 12 under the screen is the same. That is, the groove 31 removes the entire flat layer 3 in the under-screen camera area 12, which is a groove relative to the entire array substrate 10, so that the arrangement can maximize the under-screen camera area. The thickness of 12 is reduced relative to the thickness of the display area 11, so that the thickness of the liquid crystal layer of the under-screen camera area 12 of the display panel formed by the array substrate 10 is increased.
本实施例中，所述凹槽31的深度等于所述平坦层3的厚度；所述凹槽31的深度为1um-2um。通常所述平坦层3的厚度为1um-2um，所述凹槽31的深度尺寸可以使得在所述屏下摄像头区12去掉整个所述平坦层3。当然若所述平坦层3的厚度大于3um，所述凹槽31的深度尺寸使得所述凹槽31不会贯穿所述平坦层3，这样结构强度会相对较高，结构稳定性更好，不易变形。In this embodiment, the depth of the groove 31 is equal to the thickness of the flat layer 3; the depth of the groove 31 is 1um-2um. Generally, the thickness of the flat layer 3 is 1 um-2 um, and the depth of the groove 31 can be such that the entire flat layer 3 is removed from the under-screen camera area 12. Of course, if the thickness of the flat layer 3 is greater than 3um, the depth of the groove 31 is such that the groove 31 will not penetrate the flat layer 3, so that the structural strength will be relatively high, and the structural stability will be better. Deformed.
本发明的有益效果在于，提供一种阵列基板10、显示面板100及阵列基板10的制作方法，通过在位于屏下摄像头区12的平坦层3上制作凹槽31，使得显示面板100在屏下摄像头区12的液晶层20在对应所述凹槽31的位置厚度增大，从而液晶层20的厚度由原来的三微米左右增加到五微米左右，增大了光线经过所述液晶层20的光程，继而提高了光线的散射效果，进而增大了液晶层20的雾度，解决了屏下摄像头区12的雾度较低的技术问题，且提高了所述屏下摄像头区12的对比度，增强了所述屏下摄像头区12的画面显示效果。The beneficial effect of the present invention is to provide a manufacturing method of the array substrate 10, the display panel 100, and the array substrate 10, by forming the groove 31 on the flat layer 3 located in the camera area 12 under the screen, so that the display panel 100 is under the screen. The thickness of the liquid crystal layer 20 of the camera area 12 increases at the position corresponding to the groove 31, so that the thickness of the liquid crystal layer 20 increases from about three microns to about five microns, which increases the amount of light passing through the liquid crystal layer 20. Therefore, the light scattering effect is improved, the haze of the liquid crystal layer 20 is increased, the technical problem of low haze of the camera area 12 under the screen is solved, and the contrast of the camera area 12 under the screen is improved. The picture display effect of the camera area 12 under the screen is enhanced.
以上所述仅是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也应视为本发明的保护范围。The above are only the preferred embodiments of the present invention. It should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present invention, several improvements and modifications can be made, and these improvements and modifications should also be considered This is the protection scope of the present invention.

Claims (10)

  1. 一种阵列基板，设有显示区和屏下摄像头区，其包括：An array substrate is provided with a display area and an under-screen camera area, which includes:
    基板；Substrate
    驱动电路层，设于所述基板上；The driving circuit layer is arranged on the substrate;
    平坦层，设于所述驱动电路层上；所述平坦层在位于所述屏下摄像头区设有凹槽；A flat layer is provided on the driving circuit layer; the flat layer is provided with a groove in the camera area under the screen;
    公共电极层，设于所述平坦层上；The common electrode layer is arranged on the flat layer;
    绝缘层，设于所述公共电极层上；以及An insulating layer is provided on the common electrode layer; and
    像素电极层，设于所述绝缘层上。The pixel electrode layer is arranged on the insulating layer.
  2. 根据权利要求1所述的阵列基板，其中，所述凹槽的分布范围与所述屏下摄像头区的分布范围相同。The array substrate according to claim 1, wherein the distribution range of the grooves is the same as the distribution range of the camera area under the screen.
  3. 根据权利要求1所述的阵列基板，其中，所述凹槽的深度等于所述平坦层的厚度。The array substrate according to claim 1, wherein the depth of the groove is equal to the thickness of the flat layer.
  4. 根据权利要求1所述的阵列基板，其中，所述凹槽的深度为1um-2um。The array substrate according to claim 1, wherein the depth of the groove is 1um-2um.
  5. 一种阵列基板的制作方法，其包括步骤：A manufacturing method of an array substrate includes the steps:
    提供一基板，所述基板设有显示区和屏下摄像头区；Providing a substrate with a display area and an under-screen camera area;
    在所述基板上制作驱动电路层；Fabricating a driving circuit layer on the substrate;
    在所述驱动电路层上制作平坦层，并在位于所述屏下摄像头区的所述平坦层上制作凹槽；Fabricating a flat layer on the driving circuit layer, and fabricating a groove on the flat layer located in the camera area under the screen;
    在所述平坦层上制作公共电极层；Fabricating a common electrode layer on the flat layer;
    在所述公共电极层上制作绝缘层；以及Fabricating an insulating layer on the common electrode layer; and
    在所述绝缘层上制作像素电极层。A pixel electrode layer is formed on the insulating layer.
  6. 根据权利要求5所述的阵列基板的制作方法，其中，所述制作凹槽的步骤为在位于所述屏下摄像头区的所述平坦层上通过蚀刻方式形成所述凹槽；所述凹槽的分布范围与所述屏下摄像头区的分布范围相同。5. The manufacturing method of the array substrate according to claim 5, wherein the step of making the groove is to form the groove by etching on the flat layer located in the under-screen camera area; the groove The distribution range of is the same as the distribution range of the camera area under the screen.
  7. 根据权利要求5所述的阵列基板的制作方法，其中，所述凹槽的深度等于所述平坦层的厚度；所述凹槽的深度为1um-2um。The manufacturing method of the array substrate according to claim 5, wherein the depth of the groove is equal to the thickness of the flat layer; and the depth of the groove is 1um-2um.
  8. 一种显示面板，其包括如权利要求1所述的阵列基板。A display panel comprising the array substrate according to claim 1.
  9. 根据权利要求8所述的显示面板，其中，还包括：The display panel according to claim 8, further comprising:
    液晶层，设于所述阵列基板上；位于所述屏下摄像头区的所述液晶层的厚度为4um-5um；以及The liquid crystal layer is arranged on the array substrate; the thickness of the liquid crystal layer in the camera area under the screen is 4um-5um; and
    彩膜基板，设于所述液晶层上且与所述阵列基板相对设置。The color filter substrate is arranged on the liquid crystal layer and opposite to the array substrate.
  10. 根据权利要求8所述的显示面板，其中，The display panel according to claim 8, wherein:
    在所述屏下摄像头区内，所述像素电极层与所述彩膜基板的距离为4um-5um。In the under-screen camera area, the distance between the pixel electrode layer and the color filter substrate is 4um-5um.
PCT/CN2019/117490 2019-09-25 2019-11-12 Array substrate, display panel, and manufacturing method for array substrate WO2021056729A1 (en)

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