WO2020237736A1

WO2020237736A1 - Method for manufacturing nanostructure

Info

Publication number: WO2020237736A1
Application number: PCT/CN2019/091114
Authority: WO
Inventors: 张伟华; 鲁振达; 满再琴; 边捷; 邢星
Original assignee: 南京大学
Priority date: 2019-05-31
Filing date: 2019-06-13
Publication date: 2020-12-03
Also published as: CN110182757A

Abstract

The present application relates to the field of nanotechnology, and in particular to a method for manufacturing a nanostructure. The method comprises: according to a pre-set first pattern template, writing charges on a substrate having low surface energy, so that the substrate is chemically modified in a region where the charges are written, so as to form a first nanopattern; and introducing first nanoparticles in a region where the first nanopattern is located, so as to form a first nanostructure. The substrate itself has low surface energy, and by writing charges, the first nanopattern enables the surface of the substrate to be chemically modified. Therefore, the first nanopattern having high surface energy can be formed on the substrate. Therefore, the first nanoparticles can be precisely adsorbed in the region, where the first nanopattern is located, under the action of high surface energy, while the region, other than the first nanopattern, on the substrate has low surface energy and thus cannot adsorb the first nanoparticles, and the problem of non-specific adsorption in the prior is prevented from occurring, thereby allowing the formed first nanostructure to be cleaner.

Description

一种纳米结构的制造方法Method for manufacturing nano structure

本申请要求在2019年05月31日提交中国专利局、申请号为201910474169.3、发明名称为“一种纳米结构的制造方法”的中国专利申请的优先权，其全部内容通过引用结合在本申请中。This application claims the priority of a Chinese patent application filed with the Chinese Patent Office, the application number is 201910474169.3, and the invention title is "a method for manufacturing nanostructures" on May 31, 2019. The entire content of the patent application is incorporated into this application by reference. .

技术领域Technical field

本申请涉及纳米技术领域，特别涉及一种纳米结构的制造方法。This application relates to the field of nanotechnology, in particular to a manufacturing method of nanostructures.

背景技术Background technique

随着科学技术的不断发展，电子科学、光子科学、光电科学、生物科学等领域都对纳米结构的加工技术提出了更高的要求，需要提供一种更加可靠、更加快速、更低成本的纳米加工技术。With the continuous development of science and technology, electronic science, photonic science, optoelectronic science, biological science and other fields have put forward higher requirements on the processing technology of nanostructures. It is necessary to provide a more reliable, faster and lower cost nanostructure. Processing Technology.

现有技术中，通常采用表面化学改性的方法制造纳米结构。具体来说，首先可以采用微纳加工技术制备表面化学性质不同的纳米图案，然后通过化学反应或化学吸附的手段引入纳米颗粒，从而形成纳米结构。然而，由于化学反应或化学吸附不可控性较高，因此，上述方法存在严重的非特异性吸附问题，容易导致形成的纳米结构不干净。In the prior art, surface chemical modification methods are usually used to manufacture nanostructures. Specifically, micro-nano processing technology can be used to prepare nano patterns with different surface chemical properties, and then nanoparticles can be introduced through chemical reaction or chemical adsorption to form nanostructures. However, due to the high uncontrollability of chemical reactions or chemical adsorption, the above methods have serious non-specific adsorption problems, which easily lead to unclean nanostructures formed.

基于此，目前亟需一种纳米结构的制造方法，用于解决现有技术中纳米加工技术存在非特异性吸附的问题。Based on this, there is an urgent need for a nanostructure manufacturing method to solve the problem of non-specific adsorption in the existing nanofabrication technology.

发明内容Summary of the invention

本申请提供一种纳米结构的制造方法，可用于解决现有技术中纳米加工技术存在非特异性吸附的技术问题。The present application provides a method for manufacturing a nano structure, which can be used to solve the technical problem of non-specific adsorption in the nano processing technology in the prior art.

第一方面，本申请实施例提供一种纳米结构的制造方法，所述方法包括：In the first aspect, an embodiment of the present application provides a method for manufacturing a nanostructure, the method including:

提供第一图案模板，所述第一图案模板包括具有低表面能的衬底和待形成的纳米图案；Providing a first pattern template, the first pattern template comprising a substrate with a low surface energy and a nano pattern to be formed;

根据所述待形成的纳米图案，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案；According to the nanopattern to be formed, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form a first nanometer with high surface energy. pattern;

在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构。The first nano particles are introduced into the region where the first nano pattern with high surface energy is located to form the first nano structure.

可选地，在所述形成第一纳米结构之后，所述方法还包括：Optionally, after the forming of the first nanostructure, the method further includes:

采用定位***确定所述第一纳米结构的空间位置；Using a positioning system to determine the spatial position of the first nanostructure;

根据所述第一纳米结构之间的空间位置，调整二次形成的纳米图案的位置信息；所述位置信息包括位置坐标、图案方向和图案尺寸中的至少一项；Adjusting the position information of the second-formed nano pattern according to the spatial position between the first nanostructures; the position information includes at least one of position coordinates, pattern direction, and pattern size;

根据调整后的二次形成的纳米图案的位置信息，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第二纳米图案；According to the adjusted position information of the secondly formed nanopatterns, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where charges are written to form a high surface The second nano pattern of energy;

在所述具有高表面能的第二纳米图案所在的区域引入第二纳米颗粒，形成第二纳米结构；Introducing second nanoparticles into the region where the second nanopattern with high surface energy is located to form a second nanostructure;

组装所述第一纳米结构和所述第二纳米结构，得到复合纳米结构。The first nanostructure and the second nanostructure are assembled to obtain a composite nanostructure.

可选地，所述第一纳米颗粒为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中的任意一项；Optionally, the first nanoparticle is any one of atoms, molecules, ions, clusters, semiconductor quantum dots, metal nanoparticles, insulator nanoparticles, and superparamagnetic nanoparticles;

所述第二纳米颗粒为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中除所述第一纳米颗粒以外的任意一项。The second nanoparticle is any one of atoms, molecules, ions, clusters, semiconductor quantum dots, metal nanoparticles, insulator nanoparticles, and superparamagnetic nanoparticles except for the first nanoparticles.

可选地，在所述形成第一纳米图案之前，还包括：Optionally, before the forming the first nano pattern, the method further includes:

在导电衬底上涂覆一层具有低表面能的驻极体薄层，组成所述具有低表面能的衬底。A thin electret layer with low surface energy is coated on the conductive substrate to form the substrate with low surface energy.

可选地，所述具有低表面能的衬底为含氟的化合物制成的具有低表面能的衬底、含氟的聚合物制成的具有低表面能的衬底、含氯的化合物制成的具有低表面能的衬底、含氯的聚合物制成的具有低表面能的衬底中的任意一项。Optionally, the substrate with low surface energy is a substrate with low surface energy made of a fluorine-containing compound, a substrate with low surface energy made of a fluorine-containing polymer, and a substrate made of a chlorine-containing compound. Any one of a substrate with a low surface energy, a substrate with a low surface energy made of a chlorine-containing polymer.

可选地，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案，包括：Optionally, writing charges on the substrate with low surface energy so that the substrate is chemically modified in the area where the charges are written to form a first nanopattern with high surface energy, including:

根据所述待形成的纳米图案，采用导电的纳米探针在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nanopattern to be formed, a conductive nanoprobe is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.

根据所述待形成的纳米图案，采用导电的纳米***在与所述具有低表面能的衬底接触的区域写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano-pattern to be formed, a conductive nano-stamp is used to write charge in the area contacting the substrate with low surface energy, so that the substrate is chemically modified in the area where the charge is written, forming The first nano pattern with high surface energy.

根据所述待形成的纳米图案，采用施加电子束的方式在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano pattern to be formed, an electron beam is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.

根据所述待形成的纳米图案，采用施加离子束的方式在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nanopattern to be formed, an ion beam is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.

可选地，在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构，包括：Optionally, introducing first nanoparticles into the area where the first nanopattern with high surface energy is located to form the first nanostructure includes:

将由所述第一纳米颗粒组成的溶液滴在所述具有高表面能的第一纳米图案所在的区域，同时按照预设的旋转速度以所述衬底的中心轴线为旋转轴转动所述衬底，形成所述第一纳米结构；所述衬底的中心轴线为垂直于所述衬底所在的平面且穿过所述衬底的中心点的轴线。Drop the solution composed of the first nano-particles on the area where the first nano-pattern with high surface energy is located, and at the same time rotate the substrate with the central axis of the substrate as the rotation axis at a preset rotation speed , Forming the first nanostructure; the central axis of the substrate is an axis perpendicular to the plane where the substrate is located and passing through the central point of the substrate.

第二方面，本申请还提供了一种纳米结构的制造装置，所述装置包括模板提供单元、电荷注入单元和纳米颗粒引入单元；In the second aspect, the present application also provides a nanostructure manufacturing device, the device including a template providing unit, a charge injection unit, and a nanoparticle introduction unit;

所述模板提供单元，用于提供第一图案模板，所述第一图案模板包括具有低表面能的衬底和待形成的纳米图案；The template providing unit is configured to provide a first pattern template, the first pattern template including a substrate with low surface energy and a nano pattern to be formed;

所述电荷注入单元，用于根据所述待形成的纳米图案，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案；The charge injection unit is used to write charge on the substrate with low surface energy according to the nano pattern to be formed, so that the substrate is chemically modified in the area where the charge is written to form The first nano pattern with high surface energy;

所述纳米颗粒引入单元，用于在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构。The nanoparticle introduction unit is used to introduce first nanoparticles into the region where the first nanopattern with high surface energy is located to form a first nanostructure.

可选地，所述装置还包括定位单元和组装单元；Optionally, the device further includes a positioning unit and an assembly unit;

所述定位单元，用于采用定位***确定所述第一纳米结构的空间位置；以及，根据所述第一纳米结构之间的空间位置，调整二次形成的纳米图案的位置信息；所述位置信息包括位置坐标、图案方向和图案尺寸中的至少一项；The positioning unit is configured to use a positioning system to determine the spatial position of the first nanostructure; and, according to the spatial position between the first nanostructures, adjust the position information of the nanopattern formed twice; the position The information includes at least one of position coordinates, pattern direction and pattern size;

所述电荷注入单元，还用于根据调整后的二次形成的纳米图案的位置信息，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第二纳米图案；The charge injection unit is also used to write charge on the substrate with low surface energy according to the adjusted position information of the secondly formed nano pattern, so that the substrate is in the area where the charge is written Produce chemical modification to form a second nano pattern with high surface energy;

所述纳米颗粒引入单元，用于在所述具有高表面能的第二纳米图案所在的区域引入第二纳米颗粒，形成第二纳米结构；The nanoparticle introduction unit is used to introduce second nanoparticles into the region where the second nanopattern with high surface energy is located to form a second nanostructure;

所述组装单元，用于组装所述第一纳米结构和所述第二纳米结构，得到复合纳米结构。The assembly unit is used to assemble the first nanostructure and the second nanostructure to obtain a composite nanostructure.

可选地，所述模板提供单元具体用于：Optionally, the template providing unit is specifically configured to:

可选地，所述电荷注入单元具体用于：Optionally, the charge injection unit is specifically configured to:

可选地，所述纳米颗粒引入单元具体用于：Optionally, the nanoparticle introduction unit is specifically used for:

第三方面，本申请还提供了一种纳米结构的制造设备，包括存储器、一个或多个处理器以及一个或多个程序，其中，所述一个或多个程序在由所述一个或多个处理器执行时执行下述操作：In the third aspect, the present application also provides a nanostructure manufacturing equipment, including a memory, one or more processors, and one or more programs, wherein the one or more programs are executed by the one or more The processor performs the following operations when executing:

根据所述待形成的纳米图案，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案；According to the nano pattern to be formed, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the first nano pattern with high surface energy. pattern;

第四方面，本申请还提供了一种计算机可读存储介质，所述计算机可读存储介质上存储有计算机可执行指令，所述计算机可执行指令响应于执行使得纳米结构的制造设备执行操作，所述操作包括：In a fourth aspect, the present application also provides a computer-readable storage medium having computer-executable instructions stored thereon, and the computer-executable instructions cause the nanostructure manufacturing equipment to perform operations in response to execution, The operations include:

第五方面，本申请还提供了一种计算机程序产品。当其在纳米结构的制造设备上运行时，使得纳米结构的制造设备执行操作，所述操作包括：In the fifth aspect, this application also provides a computer program product. When it runs on the nanostructure manufacturing equipment, it causes the nanostructure manufacturing equipment to perform operations, and the operations include:

提供第一图案模板，所述第一图案模板包括具有低表面能的衬底和待形成的纳米图案；Providing a first pattern template, the first pattern template including a substrate with a low surface energy and a nano pattern to be formed;

本申请实施例中，由于衬底本身是具有低表面能的，而第一纳米图案是采用写入电荷的方式，使得衬底表面的化学键断裂，产生化学改性，从而能够在衬底上形成具有高表面能的第一纳米图案。因此，在引入第一纳米颗粒时，第一纳米颗粒在高表面能的作用下，可以精确吸附在第一纳米图案所在的区域，而衬底上除第一纳米图案以外的区域的表面能较低，不会吸附第一纳米颗粒，能够提高纳米结构的精度，也不会产生现有技术中的非特异性吸附的问题，与现有的纳米结构的制造方法相比，采用本申请实施例提供的方法制成的纳米结构更加干净。In the embodiment of the present application, since the substrate itself has low surface energy, and the first nanopattern adopts the method of writing charges, the chemical bonds on the surface of the substrate are broken, resulting in chemical modification, and thus can be formed on the substrate. The first nano pattern with high surface energy. Therefore, when the first nanoparticle is introduced, the first nanoparticle can be accurately adsorbed on the area where the first nanopattern is located under the action of high surface energy, and the surface energy of the area on the substrate except the first nanopattern is relatively high. It is low, does not adsorb the first nanoparticles, can improve the precision of the nanostructure, and does not cause the problem of non-specific adsorption in the prior art. Compared with the existing manufacturing method of the nanostructure, the embodiments of the present application are used. The nanostructure made by the method is cleaner.

附图说明Description of the drawings

为了更清楚地说明本发明实施例的技术方案，下面将对实施例中所需要使用的附图作简单地介绍，显而易见地，对于本领域普通技术人员而言，在不付出创造性劳动性的前提下，还可以根据这些附图获得其他的附图。In order to explain the technical solutions of the embodiments of the present invention more clearly, the following will briefly introduce the accompanying drawings needed in the embodiments. Obviously, for those of ordinary skill in the art, the premise of not paying creative labor Next, you can also obtain other drawings based on these drawings.

图1为本申请实施例提供的一种纳米结构的制造方法所对应的流程示意图；FIG. 1 is a schematic diagram of a process corresponding to a method for manufacturing a nanostructure according to an embodiment of the application;

图2为本申请实施例提供的一种具有低表面能的衬底的结构示意图；2 is a schematic structural diagram of a substrate with low surface energy provided by an embodiment of the application;

图3a为本申请实施例提供的一种形成纳米图案的示意图之一；FIG. 3a is one of the schematic diagrams of forming a nano pattern according to an embodiment of the application;

图3b为本申请实施例提供的一种形成纳米图案的示意图之一；FIG. 3b is one of the schematic diagrams of forming a nano pattern according to an embodiment of the application;

图3c为本申请实施例提供的一种形成纳米图案的示意图之一；FIG. 3c is one of the schematic diagrams of forming a nano pattern according to an embodiment of the application;

图4a为本申请实施例提供的采用旋涂法引入纳米颗粒的示意图；Fig. 4a is a schematic diagram of introducing nanoparticles by spin coating provided in an embodiment of the application;

图4b为本申请实施例提供的采用涂覆法引入纳米颗粒的示意图；Fig. 4b is a schematic diagram of introducing nanoparticles by a coating method provided by an embodiment of the application;

图4c为本申请实施例提供的采用提拉法引入纳米颗粒的示意图；Fig. 4c is a schematic diagram of introducing nanoparticles by a pulling method provided in an embodiment of the application;

图4d为本申请实施例提供的采用气相喷涂法引入纳米颗粒的示意图；FIG. 4d is a schematic diagram of introducing nanoparticles by a vapor spraying method according to an embodiment of the application;

图5为本申请实施例中纳米颗粒组装的示意图；Figure 5 is a schematic diagram of nanoparticle assembly in an embodiment of the application;

图6为本申请实施例提供的一种复合纳米结构的制造方法所对应的流程示意图；6 is a schematic diagram of a process corresponding to a method for manufacturing a composite nanostructure according to an embodiment of the application;

图7为本申请还提供了一种纳米结构的制造装置的结构示意图；FIG. 7 is a schematic structural diagram of a nanostructure manufacturing device provided in this application;

图8为本申请还提供了一种纳米结构的制造设备的结构示意图；FIG. 8 is a schematic structural diagram of a nanostructure manufacturing equipment provided in this application;

图9为本申请实施例提供的用于制造纳米结构的计算机程序的结构示意图。FIG. 9 is a schematic structural diagram of a computer program for manufacturing nanostructures provided by an embodiment of the application.

具体实施方式Detailed ways

为使本申请的目的、技术方案和优点更加清楚，下面将结合附图对本申请实施方式作进一步地详细描述。In order to make the purpose, technical solutions, and advantages of the present application clearer, the following further describes the embodiments of the present application in detail with reference to the accompanying drawings.

图1示例性示出了本申请实施例提供的一种纳米结构的制造方法所对应的流程示意图。如图1所示，具体包括如下步骤：FIG. 1 exemplarily shows a schematic flow chart corresponding to a method for manufacturing a nanostructure provided by an embodiment of the present application. As shown in Figure 1, it specifically includes the following steps:

步骤101，提供第一图案模板。Step 101: Provide a first pattern template.

步骤102，根据待形成的纳米图案，在具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案。Step 102, according to the nano pattern to be formed, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form a first nano pattern with high surface energy .

步骤103，在具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构。Step 103: Introduce the first nano-particles into the area where the first nano-pattern with high surface energy is located to form the first nano-structure.

本申请实施例中，由于衬底本身是具有低表面能的，而第一纳米图案是采用写入电荷的方式使得衬底表面的化学键断裂，产生化学改性，从而能够在衬底上形成具有高表面能的第一纳米图案。因此，在引入第一纳米颗粒时，第一纳米颗粒在高表面能的作用下，可以精确吸附在第一纳米图案所在的区域，而衬底上除第一纳米图案以外的区域的表面能较低，不会吸附第一纳米颗粒，能够提高纳米结构的精度，也不会产生现有技术中的非特异性吸附的问题，与现有的纳米结构的制造方法相比，采用本申请实施例提供的方法制成的纳米结构更加干净。In the embodiments of the present application, since the substrate itself has low surface energy, the first nanopattern adopts the method of writing charges to break the chemical bonds on the surface of the substrate, resulting in chemical modification, so that it can be formed on the substrate. The first nano pattern with high surface energy. Therefore, when the first nanoparticle is introduced, the first nanoparticle can be accurately adsorbed on the area where the first nanopattern is located under the action of high surface energy, and the surface energy of the area on the substrate except the first nanopattern is relatively high. It is low, does not adsorb the first nanoparticles, can improve the precision of the nanostructure, and does not cause the problem of non-specific adsorption in the prior art. Compared with the existing manufacturing method of the nanostructure, the embodiments of the present application are used. The nanostructure made by the method is cleaner.

在执行步骤101之后，可以先制备具有低表面能的衬底。具体来说，可以在导电衬底上涂覆一层具有低表面能的驻极体薄层，从而组成具有低表面能的衬底。After performing step 101, a substrate with low surface energy may be prepared first. Specifically, a thin layer of electret with low surface energy can be coated on the conductive substrate to form a substrate with low surface energy.

其中，驻极体可以指的是一种电介质材料，它具备几乎永久的电荷或极化的保存能力，可以在其内部和外部产生电场。比如，铁电材料，聚合物材料等都是驻极体。Among them, electret can refer to a kind of dielectric material, it has almost permanent electric charge or polarization preservation ability, can produce electric field inside and outside. For example, ferroelectric materials, polymer materials, etc. are all electrets.

进一步地，采用上述方法制成的衬底的结构如图2所示，为本申请实施例提供的一种具有低表面能的衬底的结构示意图。其中，在导电衬底的表面涂覆有一层驻极体薄层。Further, the structure of the substrate manufactured by the above method is shown in FIG. 2, which is a schematic structural diagram of a substrate with low surface energy provided by an embodiment of the application. Wherein, a thin layer of electret is coated on the surface of the conductive substrate.

更进一步地，驻极体薄层可以为多种类型的驻极体材料，从而可以制备多种类型的具有低表面能的衬底。例如，驻极体薄层可以为含氟的驻极体化合物；或者，也可以为含氟的驻极体聚合物；或者，也可以为含氯的驻极体化合物；或者，还可以含氯的驻极体聚合物。Furthermore, the electret thin layer can be multiple types of electret materials, so that multiple types of substrates with low surface energy can be prepared. For example, the electret thin layer may be a fluorine-containing electret compound; or, it may be a fluorine-containing electret polymer; or, it may also be a chlorine-containing electret compound; or, it may also contain chlorine. Of electret polymers.

步骤101中，第一图案模板可以包括具有低表面能的衬底和待形成的纳米图案。In step 101, the first pattern template may include a substrate with low surface energy and a nano pattern to be formed.

其中，表面能可以是指恒温、恒压、恒组成的情况下，可逆地增加物系表面积须对物质所做的非体积功；换言之，表面能可以是表面粒子相对于内部粒子所多出的能量。Among them, the surface energy can refer to the non-volume work that must be done to the substance to reversibly increase the surface area of the material system under the condition of constant temperature, constant pressure, and constant composition; in other words, the surface energy can be the excess of surface particles relative to internal particles energy.

步骤102中，在衬底上写入电荷，从而形成第一纳米图案的方法有多种。一个示例中，如图3a所示，为本申请实施例提供的一种形成纳米图案的示意图之一。具体来说，可以根据待形成的纳米图案，采用导电的纳米探针在具有低表面能的衬底上写入电荷，从而形成具有高表面能的第一纳米图案。In step 102, there are many methods for writing charges on the substrate to form the first nanopattern. In an example, as shown in FIG. 3a, it is one of the schematic diagrams of forming a nano pattern according to an embodiment of this application. Specifically, according to the nano pattern to be formed, a conductive nano probe may be used to write charges on the substrate with low surface energy, thereby forming the first nano pattern with high surface energy.

其中，导电的纳米探针可以是导电原子力显微镜探针。Among them, the conductive nanoprobe may be a conductive atomic force microscope probe.

又一个示例中，如图3b所示，为本申请实施例提供的一种形成纳米图案的示意图之二。具体来说，可以根据待形成的纳米图案，采用导电的纳米***对与具有低表面能的衬底接触的区域施加电压，以写入电荷，从而形成具有高表面能的第一纳米图案。In another example, as shown in FIG. 3b, it is the second schematic diagram of forming a nano pattern according to an embodiment of the present application. Specifically, according to the nano pattern to be formed, a conductive nano stamp may be used to apply a voltage to the area contacting the substrate with low surface energy to write charges, thereby forming the first nano pattern with high surface energy.

其中，导电的纳米***可以为刻有预设的第一图案模板的金属或半导体模板，或者可以为刻有预设的第一图案模板且表面镀有导电金属层的氧化物模板，或者可以为刻有预设的第一图案模板且表面镀有导电金属层的聚合物模板，具体不做限定。Wherein, the conductive nano-seal may be a metal or semiconductor template engraved with a preset first pattern template, or may be an oxide template engraved with a preset first pattern template and coated with a conductive metal layer on the surface, or may be The polymer template engraved with the preset first pattern template and coated with a conductive metal layer is not specifically limited.

又一个示例中，如图3c示，为本申请实施例提供的一种形成纳米图案的示意图之三。具体来说，可以根据待形成的纳米图案，在具有低表面能的衬底上施加电子束或离子束，以写入电荷，从而形成具有高表面能的第一纳米图案。In another example, as shown in FIG. 3c, it is the third schematic diagram of forming a nano pattern according to an embodiment of the present application. Specifically, according to the nano pattern to be formed, an electron beam or an ion beam may be applied to a substrate with a low surface energy to write charges, thereby forming a first nano pattern with a high surface energy.

在其它可能的示例中，也可以采用其它方法在衬底上写入电荷，具体不做限定。In other possible examples, other methods may also be used to write charges on the substrate, which are not specifically limited.

需要说明的是，无论是上述哪种示例给出的写入电荷的方法，所形成的第一纳米图案可以直接由开尔文探针技术(Kalvin Probe Force Microscope，KPFM)测量。在写入电荷的过程中，电子或离子会导致衬底出现表面改性的现象，以衬底表面装饰有含氟(或含氯)化合物为例，电子或离子会导致含氟(或含氯)化合物的改性，从而能够提高所形成的第一纳米图案所在的区域的表面能，进而可以使得该第一纳米图案所在的区域易于吸附第一纳米颗粒。进而，由于高表面能对应高摩擦力(即切向力)，第一纳米图案可直接由原子力显微镜的切向力模式进行表征。It should be noted that, regardless of the method of writing charge given in the above example, the first nanopattern formed can be directly measured by the Kelvin Probe Force Microscope (KPFM). In the process of writing charges, electrons or ions will cause surface modification of the substrate. Taking the surface of the substrate decorated with fluorine (or chlorine) compounds as an example, electrons or ions will cause fluorine (or chlorine) ) The modification of the compound can increase the surface energy of the area where the first nanopattern is formed, thereby making it easy for the area where the first nanopattern is to adsorb the first nanoparticles. Furthermore, since high surface energy corresponds to high friction (ie, tangential force), the first nanopattern can be directly characterized by the tangential force mode of the atomic force microscope.

相比于传统的纳米图案的制备方法，本申请实施例中可以直接写入电荷制备纳米图案，无需引入新的材料(比如现有的基于表面化学改性的方法制备的纳米图案，需要引入化学材料)，本申请的制备方法更加简便快捷。Compared with the traditional method for preparing nano-patterns, in the examples of this application, charges can be directly written to prepare nano-patterns, without introducing new materials (such as the existing nano-patterns prepared based on surface chemical modification methods, which require the introduction of chemical Material), the preparation method of this application is simpler and faster.

步骤103中，第一纳米颗粒可以采用多种方法引入到具有高表面能的第一纳米图案所在的区域，例如，可以采用旋涂法引入纳米颗粒，或者也可以采用涂覆法引入纳米颗粒，或者也可以采用提拉法引入纳米颗粒，或者还可以采用气相喷涂发引入纳米颗粒，具体不做限定。In step 103, the first nano-particles can be introduced into the area where the first nano-pattern with high surface energy is located by various methods. For example, the spin-coating method can be used to introduce the nano-particles, or the coating method can also be used to introduce the nano-particles. Alternatively, the pulling method may be used to introduce the nanoparticles, or the vapor spraying method may also be used to introduce the nanoparticles, which is not specifically limited.

以旋涂法为例，如图4a所示，为本申请实施例提供的采用旋涂法引入纳米颗粒的示意图。具体来说，可以将由第一纳米颗粒组成的溶液滴在具有高表面能的第一纳米图案所在的区域，同时按照预设的旋转速度以衬底的中心轴线(图4a中示出的L轴)为旋转轴转动衬底，从而形成第一纳米结构。其中，衬底的中心轴线为垂直于衬底所在的平面且穿过衬底的中心点(图4a中示出的O点)的轴线。Taking the spin coating method as an example, as shown in FIG. 4a, a schematic diagram of introducing nanoparticles by the spin coating method provided in this embodiment of the application. Specifically, the solution composed of the first nano-particles can be dropped on the area where the first nano-pattern with high surface energy is located, and at the same time at a preset rotation speed at the center axis of the substrate (the L axis shown in Figure 4a) ) Is the rotation axis to rotate the substrate to form the first nanostructure. The central axis of the substrate is an axis perpendicular to the plane where the substrate is located and passing through the central point of the substrate (point O shown in FIG. 4a).

进一步地，预设的旋转速度可以设置在1000转/分钟至10000转/每分钟的范围内，本领域技术人员可以根据实际需要来确定旋转速度的取值，具体不做限定。Further, the preset rotation speed may be set in the range of 1000 revolutions/minute to 10000 revolutions/minute, and those skilled in the art can determine the value of the rotation speed according to actual needs, which is not specifically limited.

以涂覆法为例，如图4b所示，为本申请实施例提供的采用涂覆法引入纳米颗粒的示意图。具体来说，可以使用刷子将由第一纳米颗粒组成的溶液刷在具有高表面能的第一纳米图案所在的区域，从而形成第一纳米结构。Taking the coating method as an example, as shown in FIG. 4b, a schematic diagram of introducing nanoparticles by the coating method provided in this embodiment of the application. Specifically, a brush may be used to brush the solution composed of the first nanoparticles on the area where the first nanopattern with high surface energy is located, thereby forming the first nanostructure.

以提拉法为例，如图4c所示，为本申请实施例提供的采用提拉法引入纳米颗粒的示意图。具体来说，可以将衬底浸入由第一纳米颗粒组成的溶液中，如此，第一纳米颗粒被吸附到具有高表面能的第一纳米图案所在的区域，从而形成第一纳米结构。Taking the pulling method as an example, as shown in FIG. 4c, a schematic diagram of introducing nanoparticles by the pulling method provided in this embodiment of the application. Specifically, the substrate may be immersed in a solution composed of first nanoparticles, so that the first nanoparticles are adsorbed to the region where the first nanopatterns with high surface energy are located, thereby forming the first nanostructure.

以气相喷涂法为例，如图4d所示，为本申请实施例提供的采用气相喷涂法引入纳米颗粒的示意图。具体来说，喷枪中存放有由第一纳米颗粒组成的气体，然后使用喷枪向具有高表面能的第一纳米图案所在的区域喷射该气体，从而形成第一纳米结构。Taking the vapor spraying method as an example, as shown in FIG. 4d, a schematic diagram of introducing nanoparticles by the vapor spraying method provided in this embodiment of the application. Specifically, a gas composed of first nanoparticles is stored in the spray gun, and then the spray gun is used to spray the gas to the region where the first nano pattern with high surface energy is located, thereby forming the first nanostructure.

需要说明的是，由于本申请实施例提供的纳米结构的制造方法不存在非特异性吸附的问题，因此，上述四种纳米颗粒的引入方法均可实现纳米颗粒在大面积纳米图案上均匀且快速的引入。本领域技术人员可以根据实际情况选择合适的纳米颗粒的引入方法，具体不做限定。It should be noted that, because the manufacturing method of nanostructures provided in the embodiments of the present application does not have the problem of non-specific adsorption, the above four methods of introducing nanoparticles can all achieve uniform and rapid nanoparticle patterning on a large area. Introduce. Those skilled in the art can choose a suitable method for introducing nanoparticles according to actual conditions, and the specific method is not limited.

进一步地，第一纳米颗粒被引入后，将自行在第一纳米图案所在区域进行组装，从而形成第一纳米结构。如图5所示，为本申请实施例中纳米颗粒组装的示意图。具体组装过程涉及到两个过程，过程一是第一纳米颗粒被静电诱导在第一纳米图案附近，并实现快速富集；过程二是富集在一起的纳米颗粒由于衬底在第一纳米图案所在的区域和除第一纳米图案以外的其它区域之间表面能存在差异，第一纳米颗粒将选择性的吸附于高表面能区域，即吸附于第一纳米图案所在的区域。Further, after the first nano-particles are introduced, they will assemble themselves in the area where the first nano-pattern is located, thereby forming the first nano-structure. As shown in FIG. 5, it is a schematic diagram of nanoparticle assembly in an embodiment of this application. The specific assembly process involves two processes. The first process is that the first nano-particles are electrostatically induced near the first nano-pattern to achieve rapid enrichment; the second is that the enriched nanoparticles are in the first nano-pattern due to the substrate. There is a difference in surface energy between the area where it is located and the area other than the first nanopattern. The first nanoparticle will selectively adsorb to the high surface energy area, that is, the area where the first nanopattern is located.

在具体的表面吸附过程中，第一纳米颗粒将选择性的吸附于高表面能区域是由于衬底的表面能的调制，由于第一纳米图案所在的区域被改性，有着更高的表面能，相对衬底上除第一纳米图案以外的区域(即未被改性的区域)，第一纳米颗粒将有选择的吸附在被改性区域。In the specific surface adsorption process, the first nanoparticle will selectively adsorb to the high surface energy area due to the modulation of the surface energy of the substrate. Because the area where the first nano pattern is located is modified, it has a higher surface energy , The first nano-particles will be selectively adsorbed on the modified area on the area on the substrate other than the first nano-pattern (that is, the unmodified area).

并且，上述过程属于物理吸附，与现有的表面化学改性的方法相比，本申请实施例提供的方法不依赖于特定的化学官能团间的非特异性性吸附，因此，该过程对纳米颗粒的表面也没有要求。这一点上与其它依赖于表面改性的方法有着本质不同。同时，由于未改性区域表面能低，不会吸附纳米颗粒，因此，本申请实施例提供的方法可以解决现有技术中的纳米结构存在非特异性吸附的问题。Moreover, the above process belongs to physical adsorption. Compared with the existing surface chemical modification method, the method provided in the examples of this application does not rely on the non-specific adsorption between specific chemical functional groups. Therefore, the process has a negative effect on nanoparticles. There is no requirement on the surface. This is fundamentally different from other methods that rely on surface modification. At the same time, since the surface energy of the unmodified area is low and the nanoparticles will not be adsorbed, the method provided in the embodiments of the present application can solve the problem of non-specific adsorption of nanostructures in the prior art.

在具体的静电诱导使得纳米颗粒富集过程中，如果衬底本身携带电荷，则纳米颗粒主要受到两种静电作用力，一种作用力是衬底所携带的电荷与纳米颗粒所携带的电荷之间的库伦力，另一种作用力是纳米颗粒在非均匀电场中受到的梯度力。如果衬底本身不携带电荷，则纳米颗粒主要受到梯度力的作用。In the specific electrostatic induction process of enriching nanoparticles, if the substrate itself carries charges, the nanoparticles are mainly subjected to two electrostatic forces. One force is the difference between the charge carried by the substrate and the charge carried by the nanoparticles. The other kind of force is the gradient force that nanoparticles receive in a non-uniform electric field. If the substrate itself does not carry charges, the nanoparticles are mainly subjected to gradient forces.

进一步地，在梯度力的作用下，第一纳米颗粒被推向第一纳米图案所在的区域，这一过程与纳米颗粒本身是否携带电荷无关。如此，采用本申请实施例提供的纳米结构的制造方法，无需考虑纳米颗粒的材料，适用范围较广。Further, under the action of the gradient force, the first nanoparticle is pushed to the area where the first nanopattern is located, and this process has nothing to do with whether the nanoparticle itself carries electric charge. In this way, the nanostructure manufacturing method provided in the embodiments of the present application does not need to consider the material of the nanoparticle, and the application range is wide.

需要说明的是，对于携带电荷的纳米颗粒，由于同种纳米颗粒(即纳米颗粒同携带正电荷，或同携带负电荷)相互排斥，故纳米颗粒可组装成单分散颗粒构成的纳米结构；对于不携带电荷的纳米颗粒，由于各纳米颗粒之间不存在静电排斥作用，故纳米颗粒可组装成密排的纳米结构，这就可以实现制造需要连续结构的应用(比如电极，波导等)。It should be noted that, for nanoparticles carrying charges, because nanoparticles of the same kind (that is, nanoparticles with the same positive charge or with the same negative charge) repel each other, the nanoparticles can be assembled into nanostructures composed of monodisperse particles; For the nanoparticles that do not carry electric charge, because there is no electrostatic repulsion between the nanoparticles, the nanoparticles can be assembled into close-packed nanostructures, which can realize the manufacture of applications that require continuous structures (such as electrodes, waveguides, etc.).

在执行步骤103之后，本申请实施例还提供一种复合纳米结构的制造方法，如图6所示，为本申请实施例提供的一种复合纳米结构的制造方法所对应的流程示意图，具体包括如下步骤：After step 103 is performed, an embodiment of the present application further provides a method for manufacturing a composite nanostructure. As shown in FIG. 6, a schematic flow diagram corresponding to the method for manufacturing a composite nanostructure provided by this embodiment of the present application specifically includes The following steps:

步骤601，采用定位***确定所述第一纳米结构的空间位置。Step 601: Use a positioning system to determine the spatial position of the first nanostructure.

其中，显微镜探针可以是导电的原子力显微镜探针。Among them, the microscope probe may be a conductive atomic force microscope probe.

步骤602，根据第一纳米结构之间的空间位置，调整二次形成的纳米图案的位置信息。Step 602: Adjust the position information of the secondly formed nano pattern according to the spatial position between the first nano structures.

其中，二次形成的纳米图案的位置信息可以包括二次形成的纳米图案的位置坐标、二次形成的纳米图案的图案方向和二次形成的纳米图案的图案尺寸中的至少一项。Wherein, the position information of the secondly formed nano pattern may include at least one of the position coordinates of the secondly formed nano pattern, the pattern direction of the secondly formed nano pattern, and the pattern size of the secondly formed nano pattern.

采用上述第一纳米结构之间的空间位置来调整第二图案模板，可以保证第二纳米结构与第一纳米结构之间的精确对准。Using the above-mentioned spatial position between the first nanostructures to adjust the second pattern template can ensure accurate alignment between the second nanostructures and the first nanostructures.

步骤603，根据调整后的二次形成的纳米图案的位置信息，在具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第二纳米图案。Step 603, according to the adjusted position information of the secondly formed nano pattern, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form a high The second nanopattern of surface energy.

步骤604，在具有高表面能的第二纳米图案所在的区域引入第二纳米颗粒，以使所述衬底在写入电荷的区域产生化学改性，形成第二纳米结构。Step 604: Introduce second nanoparticles into the area where the second nanopattern with high surface energy is located, so that the substrate is chemically modified in the area where charges are written to form a second nanostructure.

其中，第二纳米结构的制造方法与上文所描述的第一纳米结构的制造方法类似，此处不再详细描述。The method for manufacturing the second nanostructure is similar to the method for manufacturing the first nanostructure described above, and will not be described in detail here.

步骤605，组装第一纳米结构和所述第二纳米结构，得到复合纳米结构。Step 605: Assemble the first nanostructure and the second nanostructure to obtain a composite nanostructure.

本申请实施例提供的复合纳米结构的制造方法，相比于现有技术中的纳米结构由于存在非特异性吸附的问题，在组装成复合纳米结构的过程中，非特异性吸附造成的缺陷将被累计放大，因此，现有的复合纳米结构精度较低。而本申请实施例中，第一纳米结构在形成的过程中无非特异性吸附的问题，具有极高的特异性，适合多次组装纳米结构，从而形成复合纳米结构。进一步地，本申请实施例中，纳米图案的制备仅依靠电荷制备，无需对衬底形貌进行改变，也无需引入新的化学材料作为模板，从而适合多次组装纳米结构。Compared with the nanostructures in the prior art, the method for manufacturing the composite nanostructures provided by the embodiments of the present application has the problem of non-specific adsorption. In the process of assembling the composite nanostructures, the defects caused by non-specific adsorption will be accumulated Amplification, therefore, the existing composite nanostructures have lower precision. In the embodiment of the present application, the first nanostructure has no problem of non-specific adsorption during the formation process, has extremely high specificity, and is suitable for assembling the nanostructure multiple times to form a composite nanostructure. Further, in the embodiments of the present application, the preparation of the nano-patterns only relies on electric charge preparation, without changing the morphology of the substrate, and without introducing new chemical materials as templates, which is suitable for assembling nano-structures multiple times.

需要说明的是，图6示出的复合纳米结构的制造方法仅为一种示例，在其它可能的示例中，步骤601中也可以通过预先设计的标记物来来实现，具体可以使用光学显微镜(或电子显微镜、或扫描探针显微镜)精确确定标记的位置，并利用其对第二纳米图案的尺寸进行对准。It should be noted that the manufacturing method of the composite nanostructure shown in FIG. 6 is only an example. In other possible examples, step 601 can also be implemented by pre-designed markers, specifically, an optical microscope ( Or electron microscope, or scanning probe microscope) accurately determine the position of the mark, and use it to align the size of the second nano pattern.

本申请实施例中，第一纳米颗粒可以为多种类型的材料制成的纳米颗粒，比如，可以为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中的任意一项，具体不做限定。In the embodiments of the present application, the first nanoparticle may be a nanoparticle made of various types of materials, for example, it may be an atom, a molecule, an ion, a cluster, a semiconductor quantum dot, a metal nanoparticle, an insulator nanoparticle, or a supersonic nanoparticle. Any one of the magnetic nanoparticles is not specifically limited.

第二纳米颗粒的材料可以与第一纳米颗粒相同，也可以不同。考虑到复合纳米结构中通常存在材料不同的纳米结构，基于此，第二纳米颗粒可以为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中除所述第一纳米颗粒以外的任意一项，具体不做限定。The material of the second nanoparticle can be the same as or different from the first nanoparticle. Considering that there are usually nanostructures with different materials in composite nanostructures, based on this, the second nanoparticle can be atoms, molecules, ions, clusters, semiconductor quantum dots, metal nanoparticles, insulator nanoparticles, and superparamagnetic nanoparticles. Any item other than the first nanoparticle is not specifically limited.

进一步地，纳米颗粒的材料可以是液相的，从而可以在液-固界面形成纳米结构，如图4a、图4b和图4c示出的示意图中，液态的纳米颗粒在固态的衬底上形成纳米结构；或者，纳米颗粒也可以是气相的，从而在气-固界面形成纳米结构，如图4d示出的示意图中，液态的纳米颗粒在固态的衬底上形成纳米结构。Further, the material of the nanoparticle can be liquid, so that nanostructures can be formed at the liquid-solid interface. In the schematic diagrams shown in Figure 4a, Figure 4b and Figure 4c, the liquid nanoparticle is formed on a solid substrate. Nanostructures; or, the nanoparticles can also be in the gas phase, thereby forming nanostructures at the gas-solid interface. In the schematic diagram shown in FIG. 4d, liquid nanoparticles form nanostructures on a solid substrate.

更进一步地，采用本申请提供的方法制造的纳米结构，该纳米结构的尺寸由纳米颗粒的尺寸和纳米图案的尺寸决定的，而纳米颗粒的尺寸和纳米图案的尺寸均可达到10纳米以下，甚至到1纳米尺度，因此本申请中的制造方法可以高速度、高精度、低成本地实现更高精度的纳米结构的制造。Furthermore, the nanostructure manufactured by the method provided in this application, the size of the nanostructure is determined by the size of the nanoparticle and the size of the nanopattern, and the size of the nanoparticle and the size of the nanopattern can reach 10 nanometers or less, Even to the scale of 1 nanometer, the manufacturing method in this application can realize the manufacturing of higher-precision nanostructures at high speed, high precision, and low cost.

本申请实施例中，所形成的纳米结构的尺寸可通过调节制造过程中的参数(该参考可以包括纳米图案的尺寸、写入电荷所需的电压、纳米颗粒组成的溶液的浓度以及引入纳米颗粒的方式和参数)来调节。举个例子，本申请实施例中，可以固定纳米图案的尺寸、纳米颗粒组成的溶液的浓度以及引入纳米颗粒的方式和参数，但改变写入电荷所需的电压，可以实现对纳米结构的尺寸的精确调节。In the embodiments of the present application, the size of the formed nanostructure can be adjusted by adjusting the parameters in the manufacturing process (the reference may include the size of the nanopattern, the voltage required for writing charges, the concentration of the solution composed of nanoparticles, and the introduction of nanoparticles. Method and parameters) to adjust. For example, in the embodiment of the present application, the size of the nano pattern, the concentration of the solution composed of the nanoparticles, and the method and parameters of introducing the nanoparticles can be fixed, but the voltage required to write the charge can be changed to achieve the size of the nano structure. The precise adjustment.

本申请实施例中，所形成的纳米结构可通过转移技术转移到其它衬底上，其中，其它衬底可以是硬基底，或者也可以是柔性基底，或者还可以是已预先制备有纳米结构的衬底，具体不做限定。以荧光材料所形成的纳米结构为例，可以通过直接接触的方式将该纳米解耦股转移到其它衬底上，最终实现纳米显示的功能。In the embodiments of this application, the formed nanostructures can be transferred to other substrates by transfer technology, where the other substrates can be hard substrates, or flexible substrates, or they can be prepared with nanostructures in advance. The substrate is not specifically limited. Taking the nano structure formed by the fluorescent material as an example, the nano decoupling strands can be transferred to other substrates by direct contact, and finally realize the function of nano display.

本申请实施例中，所形成的纳米结构可以通过后处理的办法实现不同器件的功能。以金属材料的纳米颗粒所形成的纳米结构为例，该纳米结构可以通过直接加热(或液相生长)的方法使得金属纳米颗粒之间产生融合，从而形成导电的纳米电极。In the embodiments of the present application, the formed nanostructures can realize the functions of different devices through post-processing. Taking a nanostructure formed by nanoparticles of a metal material as an example, the nanostructure can be directly heated (or liquid phase growth) to cause fusion between metal nanoparticles to form a conductive nanoelectrode.

图7示例性示出了本申请还提供了一种纳米结构的制造装置的结构示意图，如图7所示，所述装置包括模板提供单元701、电荷注入单元702、纳米颗粒引入单元703、定位单元704和组装单元705；其中，FIG. 7 exemplarily shows that the present application also provides a structural schematic diagram of a nanostructure manufacturing device. As shown in FIG. 7, the device includes a template providing unit 701, a charge injection unit 702, a nanoparticle introduction unit 703, and a positioning Unit 704 and assembly unit 705; among them,

所述模板提供单元701，用于提供第一图案模板，所述第一图案模板包括具有低表面能的衬底和待形成的纳米图案；The template providing unit 701 is configured to provide a first pattern template, the first pattern template including a substrate with low surface energy and a nano pattern to be formed;

所述电荷注入单元702，用于根据所述待形成的纳米图案，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案；The charge injection unit 702 is used to write charges on the substrate with low surface energy according to the nano pattern to be formed, so that the substrate is chemically modified in the area where the charges are written, Forming a first nano pattern with high surface energy;

所述纳米颗粒引入单元703，用于在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构。The nanoparticle introduction unit 703 is used to introduce first nanoparticles into the region where the first nanopattern with high surface energy is located to form a first nanostructure.

可选地，所述定位单元704，用于用定位***确定所述第一纳米结构的空间位置；以及，根据所述第一纳米结构之间的空间位置，调整二次形成的纳米图案的位置信息；所述位置信息包括位置坐标、图案方向和图案尺寸中的至少一项；Optionally, the positioning unit 704 is configured to use a positioning system to determine the spatial position of the first nanostructure; and, according to the spatial position between the first nanostructures, adjust the position of the secondly formed nanopattern Information; the location information includes at least one of location coordinates, pattern direction, and pattern size;

所述电荷注入单元702，还用于根据调整后的二次形成的纳米图案的位置信息，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第二纳米图案；The charge injection unit 702 is also used to write charge on the substrate with low surface energy according to the adjusted position information of the secondly formed nanopattern, so that the substrate can be The area is chemically modified to form a second nano pattern with high surface energy;

所述纳米颗粒引入单元703，用于在所述具有高表面能的第二纳米图案所在的区域引入第二纳米颗粒，形成第二纳米结构；The nanoparticle introduction unit 703 is used to introduce second nanoparticles into the region where the second nanopattern with high surface energy is located to form a second nanostructure;

所述组装单元705，用于组装所述第一纳米结构和所述第二纳米结构，得到复合纳米结构。The assembly unit 705 is used to assemble the first nanostructure and the second nanostructure to obtain a composite nanostructure.

可选地，所述模板提供单元701具体用于：Optionally, the template providing unit 701 is specifically configured to:

可选地，所述电荷注入单元702具体用于：Optionally, the charge injection unit 702 is specifically configured to:

根据所述待形成的纳米图案，采用施加离子束的方式在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano pattern to be formed, an ion beam is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.

可选地，所述纳米颗粒引入单元703具体用于：Optionally, the nanoparticle introduction unit 703 is specifically configured to:

采用本申请实施例的纳米结构的制造装置，由于衬底本身是具有低表面能的，而第一纳米图案是采用写入电荷的方式使得衬底表面的化学键断裂，产生化学改性，从而能够在衬底上形成具有高表面能的第一纳米图案。因此，在引入第一纳米颗粒时，第一纳米颗粒在高表面能的作用下，可以精确吸附在第一纳米图案所在的区域，而衬底上除第一纳米图案以外的区域的表面能较低，不会吸附第一纳米颗粒，能够提高纳米结构的精度，也不会产生现有技术中的非特异性吸附的问题，与现有的纳米结构的制造方法相比，采用本申请实施例提供的方法制成的纳米结构更加干净。With the nanostructure manufacturing device of the embodiment of the present application, since the substrate itself has low surface energy, and the first nanopattern uses the method of writing charges to break the chemical bonds on the surface of the substrate and produce chemical modification. A first nano pattern with high surface energy is formed on the substrate. Therefore, when the first nanoparticle is introduced, the first nanoparticle can be accurately adsorbed on the area where the first nanopattern is located under the action of high surface energy, and the surface energy of the area on the substrate except the first nanopattern is relatively high. It is low, does not adsorb the first nanoparticles, can improve the precision of the nanostructure, and does not cause the problem of non-specific adsorption in the prior art. Compared with the existing manufacturing method of the nanostructure, the embodiments of the present application are used. The nanostructure made by the method is cleaner.

图8示例性示出了本申请还提供了一种纳米结构的制造设备的结构示意图，如图8所示，本申请实施例的纳米结构的制造设备包括：存储器801、一个或多个处理器802以及一个或多个程序803。FIG. 8 exemplarily shows that the present application also provides a schematic structural diagram of a nanostructure manufacturing equipment. As shown in FIG. 8, the nanostructure manufacturing equipment of an embodiment of the present application includes: a memory 801, one or more processors 802 and one or more programs 803.

其中，所述一个或多个程序803在由一个或多个处理器802执行时执行上述实施例中的任意一种方法。Wherein, the one or more programs 803 execute any one of the methods in the foregoing embodiments when being executed by one or more processors 802.

采用本申请实施例的纳米结构的制造设备，由于衬底本身是具有低表面能的，而第一纳米图案是采用写入电荷的方式使得衬底表面的化学键断裂，产生化学改性，从而能够在衬底上形成具有高表面能的第一纳米图案。因此，在引入第一纳米颗粒时，第一纳米颗粒在高表面能的作用下，可以精确吸附在第一纳米图案所在的区域，而衬底上除第一纳米图案以外的区域的表面能较低，不会吸附第一纳米颗粒，能够提高纳米结构的精度，也不会产生现有技术中的非特异性吸附的问题，与现有的纳米结构的制造方法相比，采用本申请实施例提供的方法制成的纳米结构更加干净。Using the nanostructure manufacturing equipment of the embodiments of the present application, since the substrate itself has low surface energy, and the first nanopattern uses the method of writing charges to break the chemical bonds on the surface of the substrate, resulting in chemical modification. A first nano pattern with high surface energy is formed on the substrate. Therefore, when the first nanoparticle is introduced, the first nanoparticle can be accurately adsorbed on the area where the first nanopattern is located under the action of high surface energy, and the surface energy of the area on the substrate except the first nanopattern is relatively high. It is low, does not adsorb the first nanoparticles, can improve the precision of the nanostructure, and does not cause the problem of non-specific adsorption in the prior art. Compared with the existing manufacturing method of the nanostructure, the embodiments of the present application are used. The nanostructure made by the method is cleaner.

图9为本申请实施例提供的用于制造纳米结构的计算机程序的结构示意图。如图9所示，本申请实施例的用于制造纳米结构的计算机程序产品901，可以包括信号承载介质902。信号承载介质902可以包括一个或更多个指令903，该指令903在由例如处理器执行时，处理器可以提供以上针对图1描述的功能。例如，指令903可以包括：用于提供第一图案模板的一个或多个指令；用于形成具有高表面能的第一纳米图案的一个或多个指令；以及用于形成第一纳米结构的一个或多个指令。因此，例如，参照图1，纳米结构的制造装置可以响应于指令93来进行图1中所示的步骤中的一个或更多个。FIG. 9 is a schematic structural diagram of a computer program for manufacturing nanostructures provided by an embodiment of the application. As shown in FIG. 9, the computer program product 901 for manufacturing nanostructures in this embodiment of the present application may include a signal bearing medium 902. The signal-bearing medium 902 may include one or more instructions 903. When the instructions 903 are executed by, for example, a processor, the processor may provide the functions described above with respect to FIG. 1. For example, the instruction 903 may include: one or more instructions for providing a first pattern template; one or more instructions for forming a first nanopattern with high surface energy; and one or more instructions for forming a first nanostructure Or multiple instructions. Therefore, for example, referring to FIG. 1, the nanostructure manufacturing apparatus may perform one or more of the steps shown in FIG. 1 in response to the instruction 93.

在一些实现中，信号承载介质902可以包括计算机可读介质904，诸如但不限于硬盘驱动器、压缩盘(CD)、数字通用盘(DVD)、数字带、存储器等。在一些实现中，信号承载介质902可以包括可记录介质905，诸如但不限于存储器、读/写(R/W)CD、R/W DVD等。在一些实现中，信号承载介质902可以包括通信介质906，诸如但不限于数字和/或模拟通信介质(例如，光纤线缆、波导、有线通信链路、无线通信链路等)。因此，例如，计算机程序产品901可以通过RF信号承载介质902传送给纳米结构的制造装置的一个或多个模块，其中，信号承载介质902由无线通信介质(例如，符合IEEE 802.11标准的无线通信介质)传送。In some implementations, the signal-bearing medium 902 may include a computer-readable medium 904, such as, but not limited to, a hard drive, compact disc (CD), digital versatile disc (DVD), digital tape, memory, and the like. In some implementations, the signal bearing medium 902 may include a recordable medium 905, such as but not limited to memory, read/write (R/W) CD, R/W DVD, and the like. In some implementations, the signal-bearing medium 902 can include a communication medium 906, such as, but not limited to, digital and/or analog communication media (eg, fiber optic cables, waveguides, wired communication links, wireless communication links, etc.). Therefore, for example, the computer program product 901 can be transmitted to one or more modules of the nanostructure manufacturing device through the RF signal-bearing medium 902, where the signal-bearing medium 902 is composed of a wireless communication medium (for example, a wireless communication medium compliant with the IEEE 802.11 standard). ) Transmission.

本申请实施例的计算机程序产品，由于衬底本身是具有低表面能的，而第一纳米图案是采用写入电荷的方式使得衬底表面的化学键断裂，产生化学改性，从而能够在衬底上形成具有高表面能的第一纳米图案。因此，在引入第一纳米颗粒时，第一纳米颗粒在高表面能的作用下，可以精确吸附在第一纳米图案所在的区域，而衬底上除第一纳米图案以外的区域的表面能较低，不会吸附第一纳米颗粒，能够提高纳米结构的精度，也不会产生现有技术中的非特异性吸附的问题，与现有的纳米结构的制造方法相比，采用本申请实施例提供的方法制成的纳米结构更加干净。The computer program product of the embodiment of the present application, because the substrate itself has a low surface energy, and the first nanopattern uses the method of writing charges to break the chemical bonds on the substrate surface and produce chemical modification, so that the substrate can be A first nano pattern with high surface energy is formed thereon. Therefore, when the first nanoparticle is introduced, the first nanoparticle can be accurately adsorbed on the area where the first nanopattern is located under the action of high surface energy, and the surface energy of the area on the substrate except the first nanopattern is relatively high. It is low, does not adsorb the first nanoparticles, can improve the precision of the nanostructure, and does not cause the problem of non-specific adsorption in the prior art. Compared with the existing manufacturing method of the nanostructure, the embodiments of the present application are used. The nanostructure made by the method is cleaner.

通过以上的实施方式的描述，本领域的技术人员可以清楚地了解到各实施方式可借助软件加必需的通用硬件平台的方式来实现，当然也可以通过硬件。基于这样的理解，上述技术方案本质上或者说对现有技术做出贡献的部分可以以软件产品的形式体现出来，该计算机软件产品可以存储在计算机可读存储介质中，如ROM/RAM、磁碟、光盘等，包括若干指令用以使得一台计算机设备(可以是个人计算机，服务器，或者网络设备等)执行各个实施例或者实施例的某些部分所述的方法。Through the description of the above implementation manners, those skilled in the art can clearly understand that each implementation manner can be implemented by software plus a necessary general hardware platform, and of course, it can also be implemented by hardware. Based on this understanding, the above technical solutions can be embodied in the form of software products, which can be stored in computer-readable storage media, such as ROM/RAM, magnetic A disc, an optical disc, etc., include a number of instructions to make a computer device (which may be a personal computer, a server, or a network device, etc.) execute the methods described in each embodiment or some parts of the embodiment.

本领域技术人员在考虑说明书及实践这里公开的发明后，将容易想到本公开的其它实施方案。本申请旨在涵盖本公开的任何变型、用途或者适应性变化，这些变型、用途或者适应性变化遵循本公开的一般性原理并包括本公开未公开的本技术领域中的公知常识或惯用技术手段。说明书和实施例仅被视为示例性的，本公开的真正范围和精神由下面的权利要求指出。Those skilled in the art will easily think of other embodiments of the present disclosure after considering the specification and practicing the invention disclosed herein. This application is intended to cover any variations, uses, or adaptive changes of the present disclosure, which follow the general principles of the present disclosure and include common knowledge or conventional technical means in the technical field not disclosed in the present disclosure . The description and the embodiments are to be regarded as exemplary only, and the true scope and spirit of the present disclosure are pointed out by the following claims.

应当理解的是，本公开并不局限于上面已经描述并在附图中示出的精确结构，并且可以在不脱离其范围进行各种修改和改变。本公开的范围仅由所附的权利要求来限制。It should be understood that the present disclosure is not limited to the precise structure that has been described above and shown in the drawings, and various modifications and changes can be made without departing from its scope. The scope of the present disclosure is only limited by the appended claims.

Claims

一种纳米结构的制造方法，其特征在于，所述方法包括：A method for manufacturing nanostructures, characterized in that the method includes:

提供第一图案模板，所述第一图案模板包括具有低表面能的衬底和待形成的纳米图案；Providing a first pattern template, the first pattern template comprising a substrate with a low surface energy and a nano pattern to be formed;

根据所述待形成的纳米图案，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案；According to the nanopattern to be formed, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form a first nanometer with high surface energy. pattern;

在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构。The first nano particles are introduced into the region where the first nano pattern with high surface energy is located to form the first nano structure.
根据权利要求1所述的方法，其特征在于，在所述形成第一纳米结构之后，所述方法还包括：The method of claim 1, wherein after said forming the first nanostructure, the method further comprises:

采用定位***确定所述第一纳米结构的空间位置；Using a positioning system to determine the spatial position of the first nanostructure;

根据所述第一纳米结构之间的空间位置，调整二次形成的纳米图案的位置信息；所述位置信息包括位置坐标、图案方向和图案尺寸中的至少一项；Adjusting the position information of the second-formed nano pattern according to the spatial position between the first nanostructures; the position information includes at least one of position coordinates, pattern direction, and pattern size;

根据调整后的二次形成的纳米图案的位置信息，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第二纳米图案；According to the adjusted position information of the secondly formed nanopatterns, write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where charges are written to form a high surface The second nano pattern of energy;

在所述具有高表面能的第二纳米图案所在的区域引入第二纳米颗粒，以使所述衬底在写入电荷的区域产生化学改性，形成第二纳米结构；Introducing second nanoparticles into the area where the second nanopattern with high surface energy is located, so that the substrate is chemically modified in the area where charges are written to form a second nanostructure;

组装所述第一纳米结构和所述第二纳米结构，得到复合纳米结构。The first nanostructure and the second nanostructure are assembled to obtain a composite nanostructure.
根据权利要求2所述的方法，其特征在于，所述第一纳米颗粒为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中的任意一项；The method according to claim 2, wherein the first nanoparticle is any one of atoms, molecules, ions, clusters, semiconductor quantum dots, metal nanoparticles, insulator nanoparticles, and superparamagnetic nanoparticles. item;

所述第二纳米颗粒为原子、分子、离子、团簇、半导体量子点、金属纳米颗粒、绝缘体纳米颗粒、超顺磁纳米颗粒中除所述第一纳米颗粒以外的任意一项。The second nanoparticle is any one of atoms, molecules, ions, clusters, semiconductor quantum dots, metal nanoparticles, insulator nanoparticles, and superparamagnetic nanoparticles except for the first nanoparticles.
根据权利要求1所述的方法，其特征在于，在所述形成第一纳米图案之前，还包括：The method according to claim 1, wherein before said forming the first nano pattern, further comprising:

在导电衬底上涂覆一层具有低表面能的驻极体薄层，组成所述具有低表面能的衬底。A thin electret layer with low surface energy is coated on the conductive substrate to form the substrate with low surface energy.
根据权利要求1所述的方法，其特征在于，所述具有低表面能的衬底为含氟的化合物制成的具有低表面能的衬底、含氟的聚合物制成的具有低表面能的衬底、含氯的化合物制成的具有低表面能的衬底、含氯的聚合物制成的具有低表面能的衬底中的任意一项。The method according to claim 1, wherein the substrate with low surface energy is a substrate with low surface energy made of a fluorine-containing compound, or a substrate made of a fluorine-containing polymer with low surface energy. Any one of the substrate, a substrate made of a chlorine-containing compound with a low surface energy, or a substrate made of a chlorine-containing polymer with a low surface energy.
根据权利要求1至5中任一项所述的方法，其特征在于，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案写入电荷，包括：The method according to any one of claims 1 to 5, wherein the charge is written on the substrate with low surface energy so that the substrate is chemically modified in the area where the charge is written , To form a first nano-pattern with high surface energy to write charges, including:

根据所述待形成的纳米图案，采用导电的纳米探针在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nanopattern to be formed, a conductive nanoprobe is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.
根据权利要求1至5中任一项所述的方法，其特征在于，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案，包括：The method according to any one of claims 1 to 5, wherein the charge is written on the substrate with low surface energy so that the substrate is chemically modified in the area where the charge is written To form the first nano pattern with high surface energy, including:

根据所述待形成的纳米图案，采用导电的纳米***在与所述具有低表面能的衬底接触的区域写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano-pattern to be formed, a conductive nano-stamp is used to write charge in the area contacting the substrate with low surface energy, so that the substrate is chemically modified in the area where the charge is written, forming The first nano pattern with high surface energy.
根据权利要求1至5中任一项所述的方法，其特征在于，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案，包括：The method according to any one of claims 1 to 5, wherein the charge is written on the substrate with low surface energy so that the substrate is chemically modified in the area where the charge is written , Forming the first nano pattern with high surface energy, including:

根据所述待形成的纳米图案，采用施加电子束的方式在与所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano pattern to be formed, an electron beam is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.
根据权利要求1至5中任一项所述的方法，其特征在于，在所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成具有高表面能的第一纳米图案，包括：The method according to any one of claims 1 to 5, wherein the charge is written on the substrate with low surface energy so that the substrate is chemically modified in the area where the charge is written , Forming the first nano pattern with high surface energy, including:

根据所述待形成的纳米图案，采用施加离子束的方式在与所述具有低表面能的衬底上写入电荷，以使所述衬底在写入电荷的区域产生化学改性，形成所述具有高表面能的第一纳米图案。According to the nano pattern to be formed, an ion beam is used to write charges on the substrate with low surface energy, so that the substrate is chemically modified in the area where the charges are written to form the The first nano pattern with high surface energy.
根据权利要求1至5中任一项所述的方法，其特征在于，在所述具有高表面能的第一纳米图案所在的区域引入第一纳米颗粒，形成第一纳米结构，包括：The method according to any one of claims 1 to 5, characterized in that the introduction of first nanoparticles into the region where the first nanopattern with high surface energy is located to form the first nanostructure comprises:

将由所述第一纳米颗粒组成的溶液滴在所述具有高表面能的第一纳米图案所在的区域，同时按照预设的旋转速度以所述衬底的中心轴线为旋转轴转动所述衬底，形成所述第一纳米结构；所述衬底的中心轴线为垂直于所述衬底所在的平面且穿过所述衬底的中心点的轴线。Drop the solution composed of the first nano-particles on the area where the first nano-pattern with high surface energy is located, and at the same time rotate the substrate with the central axis of the substrate as the rotation axis at a preset rotation speed , Forming the first nanostructure; the central axis of the substrate is an axis perpendicular to the plane where the substrate is located and passing through the central point of the substrate.