WO2020143217A1 - 掩膜单元及具有该掩膜单元的掩膜板组件 - Google Patents

掩膜单元及具有该掩膜单元的掩膜板组件 Download PDF

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Publication number
WO2020143217A1
WO2020143217A1 PCT/CN2019/098462 CN2019098462W WO2020143217A1 WO 2020143217 A1 WO2020143217 A1 WO 2020143217A1 CN 2019098462 W CN2019098462 W CN 2019098462W WO 2020143217 A1 WO2020143217 A1 WO 2020143217A1
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WIPO (PCT)
Prior art keywords
openings
opening
area
coating area
mask unit
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PCT/CN2019/098462
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English (en)
French (fr)
Inventor
王志祥
沈阳
王国兵
康梦华
叶訢
Original Assignee
昆山工研院新型平板显示技术中心有限公司
昆山国显光电有限公司
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Publication of WO2020143217A1 publication Critical patent/WO2020143217A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Definitions

  • the present application relates to the field of organic light-emitting display manufacturing, and in particular to a mask unit for manufacturing pixels of an organic light-emitting display and a mask plate assembly having the mask unit.
  • the traditional liquid crystal display requires a backlight to work, so it has a heavy weight and a large thickness.
  • the organic light-emitting display that is, organic light-emitting diodes (Organic Light-Emitting Diodes, OLED for short) is a self-luminous device.
  • OLED display organic Light-Emitting Diodes
  • OLED display does not require a backlight, so it has the advantages of light weight, thin thickness, low power consumption, wide viewing angle, and fast screen response.
  • organic light-emitting display technology is the technology that can best meet the functional requirements of people for future displays. In recent years, there have been more and more researches on organic light-emitting display technology in the industry.
  • the mask assembly (may also be called a mask assembly) is immediately under the substrate, and the mask unit (which may also be called a mask unit) constituting the mask assembly is preliminarily
  • a coating area is designed, and an evaporation opening consistent with the pixel pattern to be evaporated is formed in the coating area, and an organic material is deposited at a specific position of the substrate through the evaporation opening to form a desired pixel pattern on the substrate.
  • the mask unit is made of metal sheet, but since the thickness of the metal sheet is usually in the order of micrometers, the boundary between the coating area of the evaporation opening and the non-open area around it is prone to breakage, resulting in the scrap of the mask plate .
  • the stress environment of each area of the coating area on the mask unit is different, under the effect of tension, the deformation in different positions in the coating area is different, which leads to poor uniformity of the evaporation openings in the coating area.
  • This application aims to solve at least one of the technical problems existing in the prior art.
  • this application provides a mask unit.
  • the specific design method is as follows.
  • a masking unit for vapor deposition of organic light-emitting display pixels includes a coating area, the coating area has a plurality of vapor deposition openings for vapor forming the pixels, and the mask unit further includes a first auxiliary Area, the first auxiliary area has at least one first side portion adjacent to at least one side of the coating area, each of the first side portions includes at least one row of first openings, each of the first The opening extends from the inner side of the first side portion closer to the coating area toward the outer side of the first side portion away from the coating area, and the width dimension of the first opening is in its extending direction Up gradually decreases.
  • the first opening has a triangular shape or a curved extending shape.
  • the first opening is an isosceles triangle, and an end of the first opening away from the corresponding coating area forms an apex angle of the isosceles triangle.
  • the extended length dimension of the first opening is 2-3 times the center distance between two adjacent evaporation openings in the extending direction of the first opening.
  • the first side portion further has at least one row of second openings, the second openings are located between the outermost evaporation openings of the coating area and the first openings, the The second opening and the corresponding evaporation opening in the coating area together form a matrix array.
  • the second opening is arranged to surround the corresponding coating area.
  • the first side portions are provided in pairs and adjacent to the opposite two sides of the corresponding coating area.
  • the first opening is arranged to surround the corresponding coating area.
  • the first auxiliary area has four first side portions adjacent to the four sides of the coating area, and every two adjacent first side portions meet A junction is formed at the position, and a plurality of third openings are distributed in the junction. In the direction away from the coating area, the total opening area of the third opening in the unit area of each junction is gradually Decrease the trend.
  • the size of the opening of the third opening decreases along a direction away from the coating area.
  • the size of the plurality of third openings is the same; along the direction away from the coating area, the number of the third openings in the unit area of the intersection becomes smaller.
  • the mask unit is elongated and further has a second auxiliary region, the second auxiliary region has a pair of distributed in the coating region in the width direction of the mask unit
  • the length direction of each second side portion is consistent with the length direction of the mask unit and there are a plurality of fourth openings distributed inside; In the distribution direction of the middle of the two side portions toward both ends in the longitudinal direction, the total opening area of the fourth opening in a unit area tends to increase.
  • the openings of the plurality of fourth openings have the same size, and in the distribution direction from the middle of the second side portion toward both ends in the longitudinal direction, every two adjacent The center distance between the fourth openings gradually decreases.
  • the plurality of fourth openings are distributed at equal intervals, and in the distribution direction from the middle of the second side portion toward both ends in the longitudinal direction, the plurality of fourth openings The opening size gradually increases.
  • the mask unit is elongated, and a pair of the first side portions are distributed on opposite sides of the coating area in the width direction of the mask unit, and from In the distribution direction of the middle of each first side portion toward the two ends in the longitudinal direction, the spacing between each two adjacent first openings gradually decreases.
  • another pair of the first side portions are distributed on opposite sides of the coating area in the length direction of the mask unit, and the An opening is distributed at even intervals.
  • the present application also provides a mask plate assembly, which includes a mask outer frame, and the mask plate assembly further includes at least one mask unit as described above, which is tensioned on the mask outer frame.
  • the beneficial effect of the present application is that the coating area of the mask plate unit involved in this application is connected to its surrounding area through the first auxiliary area, and based on the gradual shape of the first opening in the first auxiliary area, the coating of the mask unit can be effectively reduced
  • the probability of breakage at the boundary between the zone and its surrounding area improves the life of the mask assembly; in addition, the first auxiliary zone can play a role in stress relief, which can effectively reduce the evaporation opening in the coating zone during the tensioning of the mask unit
  • the amount of positional deviation increases the overall accuracy of the vapor deposition opening, which is conducive to improving the pixel quality of the vapor deposition.
  • FIG. 1 is a schematic structural diagram of a mask unit
  • Figure 2 shows the first enlarged schematic view of part a in Figure 1;
  • FIG. 3 is a second enlarged schematic view of part a in FIG. 1;
  • FIG. 4 is a third enlarged schematic diagram of part a in FIG. 1;
  • FIG. 5 is a fourth enlarged schematic diagram of part a in FIG. 1;
  • FIG. 6 is a schematic diagram of another structure of the mask unit
  • FIG. 7 is a first enlarged schematic diagram of part b in FIG. 6;
  • FIG. 8 is a second enlarged schematic view of part b in FIG. 6;
  • FIG. 9 is a schematic diagram of a third structure of the mask unit.
  • FIG. 10 is an enlarged schematic view of part c in FIG. 9.
  • the mask unit involved in the present application is used for the vapor deposition of the pixels of the organic light emitting display, and the present application will be described in detail below with reference to the specific embodiments shown in the drawings.
  • the mask unit 100 in this embodiment includes a plurality of coating regions 11 and a non-coating region (not labeled in the figure) surrounding the coating region 11, each coating region 11 has a plurality of evaporation openings 110,
  • the vapor deposition opening 110 is used for vapor deposition of pixels.
  • the arrangement of the plurality of evaporation openings 110 is the same as the arrangement of pixels on the organic light-emitting display, which is usually arranged in an array. It should be noted that the boundary between each coating area 11 and the non-coating area is a virtual boundary.
  • the virtual boundary is, for example, a closed shape surrounded by a line tangent to the vapor deposition opening 110 of the outermost circle of the coating area 11.
  • the evaporation openings 110 of the coating area 11 are arranged in the form of a matrix, and the coating area 11 can be regarded as a rectangular area, which has four sides, and each side is associated with a corresponding row of evaporation openings Tangent.
  • the non-coating area around each coating area 11 is divided into at least one auxiliary area, and an opening of a suitable configuration is provided in the auxiliary area, so that the auxiliary area functions to buffer the connection between the coating area and the non-coating area In this way, the probability of breakage at the boundary between the coating area of the mask unit and its surrounding area can be effectively reduced.
  • the auxiliary region can also play a role in stress relief, which helps to improve the accuracy of the vaporization opening, and is conducive to improving the quality of the vapor-formed pixel.
  • the non-coating area of the mask unit 100 includes a first auxiliary area 12 having four first side portions 12a adjacent to the four sides of the coating area 11, Each first side portion 12a is provided with a first opening 120.
  • FIG. 2 shows a partial area of two first side portions 12a adjacent to two sides of the vapor deposition zone.
  • the first auxiliary area 12 may include one, two, or three first side portions adjacent to one side, two sides, or three sides of the coating area 11.
  • the first side portions 12 a are provided in pairs and adjacent to the opposite sides of the coating area 11, which is beneficial to improve the position accuracy of the evaporation opening 110 in the coating area 11.
  • each first side portion in this embodiment includes a row of first openings 120 spaced a certain distance from the adjacent side, and each first opening 120 is defined by the first side portion 12a.
  • the inner side extends to the outer side, wherein the width dimension of each first opening 120 gradually decreases in its extending direction.
  • the inside of the first side portion refers to the side of the first side portion 12a close to the coating area 11
  • the outside of the first side portion refers to the side of the first side portion 12a The other side away from the coating area 11.
  • the width direction of each first opening 120 refers to a direction perpendicular to the extending direction of the first opening.
  • the mask unit 100 is usually made of a metal sheet, and the metal sheet usually has a thickness in the order of micrometers.
  • the coating area 11 of the mask unit 100 is connected to its surrounding area through the first side portion 12a of the first auxiliary area 12, and the first opening 120 of the first side portion 12a is designed to have a gradual shape. It can buffer the connection between the coating area 11 and the surrounding non-coating area, which can effectively reduce the breakage probability at the boundary between the coating area 11 of the mask unit 100 and the surrounding non-coating area.
  • the first auxiliary region 12 can play a role of stress relief, so that the positional deviation of the evaporation opening 110 in the coating region 11 can be effectively reduced during the tensioning process of the mask unit 100, thereby improving the overall evaporation opening 110 Accuracy is conducive to the quality of the finally formed pixels.
  • the first opening 120 in this embodiment is triangular.
  • the first opening 120 is an isosceles triangle, wherein the end of the first opening 120 away from the corresponding coating region 11 constitutes the apex angle of the isosceles triangle.
  • the extension length of the first opening 120 ranges from 2 to the center distance between two adjacent evaporation openings 110 in the extending direction of the first opening 120 -3 times. At this time, the combined effect of the first auxiliary area 12 on the anti-breakage effect and the stress relief effect is the best.
  • first openings 120 in each first side portion 12a are evenly distributed, and the center distance between each two adjacent first openings 120 is the same as that of two adjacent evaporation openings in the same direction
  • the center spacing of 110 is the same.
  • the total length of a row of first openings 120 is the same as the total length of an adjacent row of vapor deposition openings 110.
  • the first opening 120 is disposed to surround the corresponding coating area 11.
  • this embodiment differs from the first embodiment in that the first side portion of this embodiment further has at least one row of second openings 130.
  • the second openings 130 are located on the outermost side of the coating area 11. Between the plated opening 110 and the first opening 120 described above. All the evaporation openings 110 and the second openings 130 together form a matrix array.
  • the second opening 130 and the vapor deposition opening 110 have the same opening shape and size.
  • the center spacing between two adjacent second openings 130 is equal to the center spacing between two adjacent first vapor deposition openings 110.
  • the center distance between the outermost evaporation opening 110 and the adjacent second opening 130, two adjacent second openings 130 (assuming that each first side portion is provided In the case where there are at least two rows of second openings 130, the center spacing between two adjacent vapor deposition openings 110 has the same set value. In this way, after the mask unit 100 is tensioned, the vapor deposition opening 110 of the coating area 11 has more excellent position accuracy than the first embodiment.
  • the first side portion has a row of second openings 130 disposed adjacent to the outermost evaporation openings 110 of the coating area 11.
  • each first side portion may also have two or more rows of second openings 130.
  • the first opening 120 in this embodiment is substantially the same as the first opening 120 in the first embodiment described above. It should be noted that, in this embodiment, the second opening 130 and the vapor deposition opening 110 together form a rectangular array. At this time, in each first side portion, the total length of a row of first openings 120 may be The total length of the second openings 130 in a row is the same. In addition, in this embodiment, the second opening 130 is disposed to surround the corresponding coating area 11.
  • the first auxiliary region 12 has four first side portions disposed adjacent to the four sides of the coating region 11.
  • each two A junction 15 is formed at the junction of two adjacent first side portions, and a plurality of third openings 150 are distributed in the junction 15. Wherein, in the direction away from the coating area 11, the total opening area of the third opening 150 per unit area in each intersection 15 gradually decreases.
  • the distance value between every two adjacent third openings 150 is the same, and in the longitudinal direction (corresponding to the mask unit 100 And the width direction of the coating region 11) the pitch value of every two adjacent third openings 150 is also the same.
  • the opening size of the third opening 150 in the intersection 15 may gradually decrease in a direction away from the coating region 11 in the lateral direction and a direction away from the coating region 11 in the longitudinal direction.
  • the gradually decreasing rule is, for example: The longitudinal dimensions of the multiple third openings 150 in the same horizontal row are equal, and the lateral dimension gradually decreases in the direction away from the coating area; the lateral dimensions of the multiple third openings 150 in the same vertical row are equal, and the longitudinal dimension is away from the coating film The area gradually shrinks in the direction.
  • the change rule of the opening size of the third opening 150 in the junction 15 is not limited to the above rule. In this way, during the tensioning process of the vapor deposition unit 100, the junction 15 can gradually release the stress that the corner position of the coating zone 11 bears, which can further optimize the position accuracy of the vapor deposition opening 110 in the coating zone 11.
  • the intersection 15 can also achieve the purpose of “in the direction away from the coating area 11, the total opening area of the third opening 150 per unit area in each intersection 15 decreases gradually”.
  • the opening sizes of the third openings 150 in the intersection 15 may all be the same, but the arrangement of the third openings 150 becomes increasingly sparse in the direction away from the coating area 11 (not shown in the figure).
  • this embodiment differs from the first embodiment described above in that the first opening 120 in this embodiment has a curved extension shape.
  • the first opening 120 is S-shaped.
  • the first opening 120 may also have a C-shaped or other curved extension shape, and specifically, no further expansion is performed here.
  • this embodiment differs from the above-mentioned embodiment one in that the non-coating area of the mask unit 100 in this embodiment further includes a second auxiliary area 14.
  • the mask unit 100 is elongated, and the second auxiliary region 14 has a pair of second side portions 14a distributed on opposite sides of the coating region 11, as shown in FIG.
  • a pair of second side portions 14 a of the two auxiliary regions 14 are distributed on opposite sides of the coating region 11 in the width direction of the mask unit 100.
  • a pair of first side portions are provided in addition to the two sides of the width direction of the coating region 11 (the same as the width direction of the mask unit 100).
  • the side portion 12a is adjacent, that is, the first side portion 12a is located between the coating region 11 and the second side portion 14a.
  • each second side portion 14a is consistent with the length direction of the mask unit 100, and a number of circular fourth openings 140 are distributed inside. Referring to the direction indicated by the arrow in FIG. 7, the total opening area of the fourth opening 140 per unit area gradually increases in the distribution direction from the middle of the second side portion 14 a toward both ends in the longitudinal direction.
  • the middle area of the mask unit 100 in the width direction within the span of each coating area 11 in the length direction The amount of shrinkage is greater than the amount of shrinkage in the width direction of both end regions.
  • the uncoated region of the mask unit 100 exerts a drag on the middle region of the coated region 11 within the span of the length direction of each coated region 11 The force is greater than the pulling force applied to the two ends of the coating area 11, so that the width shrinkage of each coating area 11 of the mask unit 100 can be more balanced, so that the evaporation opening 110 in each coating area 11 has better Of uniformity.
  • the opening sizes of all the fourth openings 140 are uniform and are in the distribution direction from the middle of the second side portion toward both ends in the longitudinal direction (refer to the direction indicated by the arrow ), the center distance between each two adjacent fourth openings 140 gradually decreases. As shown in the figure, the interval L1 between the two adjacent fourth openings 140 near the end is smaller than the interval L2 between the two adjacent fourth openings 140 near the middle.
  • the shape of the fourth opening 140 may be a semicircle, a rectangle, a triangle, or other shapes.
  • the difference between this embodiment and the above-mentioned embodiment 5 is that in this embodiment, “in the distribution direction from the middle of the second side portion toward both ends in the longitudinal direction, the unit area The total opening area of the upper fourth opening 140 is gradually increasing.
  • all the fourth openings 140 are distributed at equal intervals in the distribution direction from the middle of the second side portion toward the two ends in the longitudinal direction (refer to the figure 8), the opening size of the fourth opening 140 gradually increases. In this way, the technical effect of improving the uniformity of the evaporation opening 110 in each coating area 11 described in Embodiment 5 can also be achieved.
  • the mask unit 100 in this embodiment is elongated.
  • the difference from the first embodiment is that the mask unit 100 in this embodiment has a pair of The first side portions distributed on the opposite sides of the coating area 11 in the width direction (only the first side portions on the side of the coating area 11 are shown in FIG. 10), and facing from the middle of each first side portion In the distribution direction of both ends in the length direction (refer to the direction indicated by the arrow in FIG. 10 ), the distance between each two adjacent first openings 120 gradually decreases. As shown in the figure, the distance D1 between two adjacent first openings 120 near the end is smaller than the distance D2 between two adjacent first openings 120 near the middle.
  • the second auxiliary region 14 in the fifth and sixth embodiments need not be provided in this embodiment, and the technology for improving the uniformity of the evaporation opening 110 in the coating region 11 described in the fifth and sixth embodiments can also be achieved effect.
  • the mask unit 100 further includes another pair of first side portions distributed on opposite sides of the coating region 11 in the length direction of the mask unit 100, and the other pair of first sides The pitches of the first openings in the sides are evenly distributed.
  • the mask plate assembly includes a mask frame (not shown in the figure).
  • the mask plate assembly in this embodiment further includes at least one The mask unit 100 as described in Embodiment 1 to Embodiment 7 on the mask outer frame.
  • the mask assembly involved in the present application When the mask assembly involved in the present application is applied to the evaporation molding of pixels of an organic light emitting display, the accuracy of the evaporation position of the pixels can be improved, and the quality of the finished organic light emitting display can be improved.

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Abstract

一种掩膜单元（100）及具有该掩膜单元的掩膜板组件，其中所涉及的掩膜单元（100）用于有机发光显示器像素的蒸镀成型，所述掩膜单元（100）包括镀膜区（11），所述镀膜区具有多个供蒸镀成型所述像素的蒸镀开口（110），所述掩膜单元还包括第一辅助区（12），所述第一辅助区（12）具有邻接所述镀膜区（11）的至少一个侧边的至少一个第一侧边部（12a），每一所述第一侧边部（12a）包括至少一排第一开口（120），各所述第一开口（120）在从该第一侧边部（12a）的内侧向其外侧的方向上延伸，且所述第一开口（120）的宽度尺寸在其延伸方向上逐渐减小。该掩膜单元（100）中的镀膜区（11）通过第一辅助区（12）与其周边区域连接，基于第一辅助区（12）中第一开口（120）的渐变形态，可以有效降低掩膜单元（100）镀膜区（11）与其周边区域交界位置处的折伤概率。

Description

掩膜单元及具有该掩膜单元的掩膜板组件 技术领域
本申请涉及有机发光显示器制作领域，尤其涉及一种用于有机发光显示器的像素制作的掩膜单元及具有该掩膜单元的掩膜板组件。
背景技术
传统的液晶显示器(LCD)因需要背光源才能工作，所以质量重、厚度大。而有机发光显示器，即有机电致发光二极管(Organic Light-Emitting Diodes，简称OLED)是自发光器件。相较于液晶显示器，因有机发光显示器(简称OLED显示器)不需要背光源，所以具有质量轻、厚度薄、功耗低、视角宽、屏幕响应快等优点。基于此，有机发光显示技术是最能符合人们对未来显示器的功能要求的技术，近年来业界对有机发光显示器技术的研究也越来越多。
目前，在有机发光显示器的制作过程中，实现像素制作的较成熟的技术是真空蒸镀技术。通常，有机材料通过蒸镀沉积在位于蒸发源上方的基板的特定位置处，从而实现特定形态像素的成型。具体而言，在像素制作过程中，掩膜板组件(也可以称为掩模板组件)紧贴在基板下方，而构成掩膜板组件的掩膜单元(也可以称为掩模单元)上预先设计有镀膜区，镀膜区内形成有与待蒸镀的像素图案一致的蒸镀开口，有机材料通过该蒸镀开口沉积于基板的特定位置处，以在基板上形成所需的像素图案。
然而存在以下问题：
首先，掩膜单元采用金属片材制成，但由于金属片材的厚度通常为微米级别，蒸镀开口的镀膜区与其周边非开口区域的交界位置处容易出现折伤，从而导致掩膜板报废。其次，在掩膜板的制作过程中，通常需要对构成掩膜板的掩膜单元进行张紧，而掩膜单元被张紧后，镀膜区靠近交界位置附近的蒸镀开口容易出现较大的位置偏移，从而影响最终蒸镀成型的像素质量。再者，由于掩膜单元上镀膜区各个区域受力环境不同，在张紧力的作用下，镀膜区内不同位置的形变量不同，如此导致镀膜区上蒸镀开口的均匀性较差。
发明内容
本申请旨在至少解决现有技术存在的技术问题之一，为实现上述发明目的，本申请提供了一种掩膜单元，其具体设计方式如下。
一种用于有机发光显示器像素的蒸镀成型的掩膜单元，包括镀膜区，所述镀膜区具有多个供蒸镀成型所述像素的蒸镀开口，所述掩膜单元还包括第一辅助区，所述第一辅助区具有邻接所述镀膜区的至少一个侧边的至少一个第一侧边部，每一所述第一侧边部包括至少一排第一开口，各所述第一开口在从该第一侧边部的靠近所述镀膜区的内侧向该第一侧边部的远离所述镀膜区的外侧的方向上延伸，且所述第一开口的宽度尺寸在其延伸方向上逐渐减小。
在其中一个实施例中，所述第一开口呈三角形或弯曲延伸形状。
在其中一个实施例中，所述第一开口为等腰三角形，所述第一开口的远离对应的镀膜区的一端构成等腰三角形的顶角。
在其中一个实施例中，所述第一开口的延伸长度尺寸范围为在所述第一开口延伸方向上的两个相邻的所述蒸镀开口的中心间距的2-3倍。
在其中一个实施例中，所述第一侧边部还具有至少一排第二开口，所述第二开口位于所述镀膜区的最外侧蒸镀开口和所述第一开口之间，所述第二开口与对应的镀膜区内的蒸镀开口共同构成矩阵阵列。
在其中一个实施例中，所述第二开口设置成环绕对应的所述镀膜区。
在其中一个实施例中，所述第一侧边部成对地设置并邻接于对应的所述镀膜区的相对两个侧边。
在其中一个实施例中，所述第一开口设置成环绕对应的所述镀膜区。
在其中一个实施例中，所述第一辅助区具有邻接所述镀膜区的四个侧边的四个所述第一侧边部，每两个相邻的所述第一侧边部的交接位置处形成有交汇部，所述交汇部内分布有多个第三开口，在远离所述镀膜区的方向上，每一所述交汇部内的单位面积内所述第三开口的总开口面积呈逐渐减小趋势。
在其中一个实施例中，沿着远离所述镀膜区的方向，所述第三开口的开口尺寸按照一定的规律减小。
在其中一个实施例中，所述多个第三开口的尺寸相同；沿着远离所述镀膜区的方向，所述第三开口在所述交汇部单位面积内的数量变少。
在其中一个实施例中，所述掩膜单元呈长条状且还具有第二辅助区，所述第二辅助区具有一对在所述掩膜单元的宽度方向上分布于所述镀膜区的相对两侧边之外的第二侧边部，每一所述第二侧边部的长度方向与所述掩膜单元的长度方向一致且内部分布有多个第四开口；在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，单位面积内所述第四开口的总开口面积呈增大趋势。
在其中一个实施例中，所述多个第四开口的开口尺寸相同，且在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，每两个相邻的所述第四开口之间的中心间距逐渐减小。
在其中一个实施例中，所述多个第四开口等间距地分布，且在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，所述多个第四开口的开口尺寸逐渐增大。
在其中一个实施例中，所述掩膜单元呈长条状，一对所述第一侧边部在所述掩膜单元的宽度方向上分布于所述镀膜区的相对两侧，且在从每一所述第一侧边部的中间朝向其长度方向的两端的分布方向上，每两个相邻的所述第一开口之间的间距逐渐减小。
在其中一个实施例中，另一对所述第一侧边部在所述掩膜单元的长度方向上分布于所述镀膜区的相对两侧，且该另一对第一侧边部内的第一开口以均匀间距分布。
本申请还提供了一种掩膜板组件，包括掩膜外框，所述掩膜板组件还至少包括一个张紧设置于所述掩膜外框上的如上所述的掩膜单元。
本申请的有益效果是：本申请中所涉及掩膜板单元的镀膜区通过第一辅助区与其周边区域连接，基于第一辅助区中第一开口的渐变形态，可以有效降低掩膜单元的镀膜区与其周边区域交界位置处的折伤概率，提高掩膜组件的寿命；此外，第一辅助区可以起到应力释放作用，如此在掩膜单元张紧过程中能够有效减少镀膜区内蒸镀开口的位置偏移量，从而提高蒸镀开口的整体精度，利于提高蒸镀成型的像素质量。
附图说明
图1所示为掩膜单元的一种结构示意图；
图2所示为图1中a部分的第一种放大示意图；
图3所示为图1中a部分的第二种放大示意图；
图4所示为图1中a部分的第三种放大示意图；
图5所示为图1中a部分的第四种放大示意图；
图6所示为掩膜单元的另一种结构示意图；
图7所示为图6中b部分的第一种放大示意图；
图8所示为图6中b部分的第二种放大示意图；
图9所示为掩膜单元的第三种结构示意图；
图10所示为图9中c部分的放大示意图。
具体实施方式
本申请中所涉及的掩膜单元用于有机发光显示器像素的蒸镀成型，以下将结合附图所示的各具体实施例对本申请进行详细描述。
实施例一
参考图1，其展示了本申请掩膜单元100的一种实施方式。结合图2所示，本实施例中的掩膜单元100包括多个镀膜区11和包围镀膜区11的非镀膜区(图中未标号)，每个镀膜区11具有多个蒸镀开口110，蒸镀开口110用于像素的蒸镀成型。在具体实施方式中，多个蒸镀开口110的排布方式与有机发光显示器上像素的排布方式一致，其通常呈阵列形态排布。需要说明的是，各个镀膜区11和非镀膜区的界线是虚拟界线，该虚拟界线例如是由与镀膜区11的最外圈的蒸镀开口110相切的线条所围成的封闭形状。本实施例中，镀膜区11的蒸镀开口110以矩阵的形式排列，镀膜区11可以被认为是矩形区域，该矩形区域具有四个侧边，每个侧边与对应的一排蒸镀开口相切。
本申请中将每个镀膜区11周围的非镀膜区划分出至少一个辅助区，并在辅助区设置合适构型的开口，使辅助区起到缓冲镀膜区与非镀膜区之间的连接的作用，这样，可以有效降低掩膜单元的镀膜区与其周边区域交界位置处的折伤概率。另外，辅助区还可以起到应力释放的作用，有助于提高蒸镀开口的精度，利于提高蒸镀成型的像素质量。
在本实施例中，具体地，掩膜单元100的非镀膜区包括第一辅助区12，第一辅助区12具有与镀膜区11的四个侧边邻接的四个第一侧边部12a，每个第一侧边部12a均设置有第一开口120。图2中示出了与蒸镀区两个侧边相邻的两个第一侧边部12a的局部区域。在其他实施例中，第一辅助区12可以包括与镀膜区11的一个侧边、两个侧边或三个侧边邻接的一个、两个或三个第一侧边部。在一些实施例中，第一侧边部12a成对地设置并邻接于镀膜区11的相对两侧边，这样有利于提高镀膜区11内蒸镀开口110的位置精度。
进一步参考图2，本实施例中的每一第一侧边部均包括与相邻的侧边间隔一定距离的一排第一开口120，各第一开口120由该第一侧边部12a的内侧向外侧延伸，其中，各第一开口120的宽度尺寸在其延伸方向上逐渐减小。在本申请中，可以容易地理解，第一侧边部内侧指的是第一侧边部12a的靠近镀膜区11的一侧，第一侧边部外侧指的是第一侧边部12a的远离镀膜区11的另一侧。可以理解，各第一开口120的宽度方向指的是垂直于第一开口延伸方向的方向。
在具体实施过程中，掩膜单元100通常采用金属片材制成，金属片材通常具有微米级别的厚度。本实施例中，掩膜单元100的镀膜区11通过第一辅助区12的第一侧边部12a与其 周边区域连接，且将第一侧边部12a的第一开口120设计成渐变形态，这样，可以缓冲镀膜区11与周边非镀膜区的连接，能够有效降低掩膜单元100的镀膜区11与其周边的非镀膜区交界位置处的折伤概率。此外，第一辅助区12可以起到应力释放作用，如此在掩膜单元100的张紧过程中能够有效减少镀膜区11内蒸镀开口110的位置偏移量，从而提高蒸镀开口110的整体精度，利于最终蒸镀成型的像素的质量。
本实施例中的第一开口120呈三角形。作为示例，第一开口120为等腰三角形，其中，第一开口120的远离对应的镀膜区11的一端构成等腰三角形的顶角。
作为本实施例的一种具体实施结构，参考图2所示，第一开口120的延伸长度尺寸范围为在该第一开口120延伸方向上两个相邻的蒸镀开口110的中心间距的2-3倍。此时，第一辅助区12所起到的防折伤作用及应力释放作用的综合效果最好。
此外，在本实施例中，每一第一侧边部12a内的第一开口120均匀分布，每两个相邻的第一开口120的中心间距与同方向上的两个相邻的蒸镀开口110的中心间距相同。
本实施例中，在每一第一侧边部12a内，一排第一开口120的总长度与相邻的一排蒸镀开口110的总长度一致。另外，在本实施例中，第一开口120设置成环绕对应的镀膜区11。
实施例二
参见图3并结合参考图1，本实施例与实施例一不同点在于，本实施例中第一侧边部还具有至少一排第二开口130，第二开口130位于镀膜区11最外侧蒸镀开口110和上述的第一开口120之间。全部蒸镀开口110与第二开口130共同构成矩阵阵列。
具体而言，第二开口130与蒸镀开口110具有相同的开口形状和尺寸。在与对应的侧边平行的方向上，两个相邻的第二开口130的中心间距等于两个相邻的第一蒸镀开口110的中心间距。在与对应的侧边垂直的方向上，最外侧蒸镀开口110与相邻的第二开口130之间的中心间距、两个相邻的第二开口130(假设每一第一侧边部设置有至少两排第二开口130的情况下)之间的中心间距以及两个相邻的蒸镀开口110之间的中心间距均具有相同的设定值。如此，镀膜区11的蒸镀开口110在掩膜单元100张紧后相对实施例一具有更为优异的位置精度。
具体于图3所示的实施结构中，第一侧边部具有一排紧邻镀膜区11最外侧蒸镀开口110设置的第二开口130。在其他实施例中，每一第一侧边部也可以具有两排甚至更多排第二开口130。
本实施例中的第一开口120与上述第一实施例中的第一开口120大体相同。需要说明的是，因本实施例中第二开口130和蒸镀开口110一起构成矩形阵列，此时，在每一第一侧边 部内，一排第一开口120的总长度可以与相邻的一排第二开口130的总长度一致。另外，在本实施例中，第二开口130设置成环绕对应的镀膜区11。
实施例三
参见图4并结合参考图1，本实施例中第一辅助区12具有邻接镀膜区11四侧设置的四个第一侧边部，本实施例与上述实施例二的不同点在于，每两个相邻的第一侧边部的交接位置处形成有交汇部15，交汇部15内分布有若干第三开口150。其中，在远离镀膜区11的方向上，每一交汇部15内单位面积内第三开口150的总开口面积呈逐渐减小趋势。
具体于图4所示的实施结构中，横向上(对应掩膜单元100及镀膜区11的长度方向)每两个相邻的第三开口150的间距值相同，纵向上(对应掩膜单元100及镀膜区11的宽度方向)每两个相邻的第三开口150的间距值也相同。在横向远离镀膜区11的方向上以及纵向远离镀膜区11的方向上，交汇部15内的第三开口150的开口尺寸可以按照一定的规律逐渐减小，该逐渐减小的规律例如是：在同一横排的多个第三开口150的纵向尺寸相等，而横向尺寸在远离镀膜区的方向上逐渐缩小；在同一纵排的多个第三开口150的横向尺寸相等，而纵向尺寸在远离镀膜区的方向上逐渐缩小。当然，交汇部15内的第三开口150的开口尺寸的变化规律并不仅限制于上述规律。如此，在蒸镀单元100的张紧过程中，交汇部15可以对镀膜区11边角位置所承受的应力进行渐变式释放，能够进一步优化镀膜区11内蒸镀开口110的位置精度。
本实施例中交汇部15也可以通过其它实施结构实现“在远离镀膜区11的方向上，每一交汇部15内单位面积内第三开口150的总开口面积呈逐渐减小趋势”的目的。例如，交汇部15内的第三开口150的开口尺寸可以全部一致，但在远离镀膜区11的方向上，第三开口150的排布越来越稀疏(图中未示出)。
实施例四
参见图5并结合参考图1，本实施例与上述实施例一的不同点在于，本实施例中的第一开口120呈弯曲延伸形状。具体参见图5，第一开口120呈S型。在其他实施例中，第一开口120也可以呈C型等其它弯曲延伸形状，具体在此不做进一步展开。
实施例五
如图6和图7所示，本实施例与上述实施例一的不同点在于，本实施例中的掩膜单元100的非镀膜区还包括第二辅助区14。在一些实施例中，掩膜单元100呈长条状，第二辅助区14具有一对分布于镀膜区11的相对两侧边外的第二侧边部14a，参考图6所示，构成第二辅助区14的一对第二侧边部14a在掩膜单元100的宽度方向上分布于镀膜区11的相对两 侧。本实施例中，镀膜区11的宽度方向(与掩膜单元100的宽度方向一致)的两侧边之外还设置有一对第一侧边部，此时，第二侧边部14a与第一侧边部12a邻接，即第一侧边部12a位于镀膜区11与第二侧边部14a之间。
本实施例中的每一第二侧边部14a的长度方向与掩膜单元100的长度方向一致且内部分布有若干圆形的第四开口140。参考图7中箭头所示方向，在从第二侧边部14a的中间朝向其长度方向的两端的分布方向上，单位面积内第四开口140的总开口面积呈逐渐增大趋势。
通常，在掩膜单元100的长度方向上对掩膜单元100的两端施加张紧力后，在每一镀膜区11长度方向的跨度范围内，掩膜单元100的中间区域在宽度方向上的收缩量大于其两端区域在宽度方向上的收缩量。然而，基于本实施例中第二辅助区14内第四开口140的设计，在每一镀膜区11长度方向的跨度范围内，掩膜单元100的非镀膜区对镀膜区11中间区域施加的牵扯力大于对镀膜区11两端区域施加的牵扯力，如此可以使掩膜单元100的每一镀膜区11的宽度收缩量较为均衡，从而使得每一镀膜区11内的蒸镀开口110具有较优的均匀性。
如图7中所示，在本实施例中，全部第四开口140的开口尺寸均匀一致，且在从第二侧边部的中间朝向其长度方向的两端的分布方向上(参考箭头所示方向)，每两个相邻的第四开口140之间的中心间距逐渐减小。如图中所示，靠近端部的两个相邻的第四开口140之间的间距L1小于靠近中间的两个相邻的第四开口140之间的间距L2。
此外，在一些实施例中，第四开口140的形状可以为半圆形、矩形、三角形或其它形状。
实施例六
参见图8并结合参考图6，本实施例与上述实施例五的不同点在于，本实施例中实现“在从第二侧边部的中间朝向其长度方向的两端的分布方向上，单位面积上第四开口140的总开口面积呈逐渐增大趋势”的方式为：全部第四开口140等间距分布，在从第二侧边部的中间朝向其长度方向的两端的分布方向上(参考图8中箭头所示方向)，第四开口140的开口尺寸逐渐增大。如此也可以实现实施例五中所述的提高每一镀膜区11内的蒸镀开口110均匀性的技术效果。
实施例七
如图9和图10所示，本实施例中的掩膜单元100呈长条状，与实施例一的不同点在于，本实施例中的掩膜单元100具有一对在掩膜单元100的宽度方向上分布于镀膜区11的相对两侧的第一侧边部(图10中仅展示镀膜区11一侧的第一侧边部)，且在从每一第一侧边部 的中间朝向其长度方向的两端的分布方向上(参考图10中箭头所示方向)，每两个相邻的第一开口120之间的间距逐渐减小。如图中所示，靠近端部的两个相邻的第一开口120之间的间距D1小于靠近中间的两个相邻的第一开口120之间的间距D2。
如此，本实施例中无需设置实施例五、实施例六中的第二辅助区14，也可以实现实施例五、实施例六中所述的提高镀膜区11内蒸镀开口110均匀性的技术效果。
另外，在其他实施例中，掩膜单元100还包括在掩膜单元100的长度方向上分布于镀膜区11的相对两侧的另一对第一侧边部，且该另一对第一侧边部内的第一开口间距均匀地分布。
实施例八
本实施例提供了一种掩膜板组件，具体地，该掩膜板组件包括掩膜外框(图中未示出)，本实施例中的掩膜板组件还包括至少一个张紧设置于掩膜外框上的如实施例一至实施例七中所描述的掩膜单元100。
本申请中所涉及的掩膜组件在应用于有机发光显示器像素的蒸镀成型时，可以提高像素的蒸镀位置精度，提高有机发光显示器成品的质量。
应当理解，虽然本说明书按照实施方式加以描述，但并非每个实施方式仅包含一个独立的技术方案，说明书的这种叙述方式仅仅是为清楚起见，本领域技术人员应当将说明书作为一个整体，各实施方式中的技术方案也可以经适当组合，形成本领域技术人员可以理解的其他实施方式。
上文所列出的一系列的详细说明仅仅是针对本申请的可行性实施方式的具体说明，它们并非用以限制本申请的保护范围，凡未脱离本申请技艺精神所作的等效实施方式或变更均应包含在本申请的保护范围之内。

Claims (17)

  1. 一种用于有机发光显示器像素的蒸镀成型的掩膜单元，包括镀膜区，所述镀膜区具有多个供蒸镀成型所述像素的蒸镀开口，其中，所述掩膜单元还包括第一辅助区，所述第一辅助区具有邻接所述镀膜区的至少一个侧边的至少一个第一侧边部，每一所述第一侧边部包括至少一排第一开口，各所述第一开口在从该第一侧边部的靠近所述镀膜区的内侧向该第一侧边部的远离所述镀膜区的外侧的方向上延伸，且所述第一开口的宽度尺寸在其延伸方向上逐渐减小。
  2. 根据权利要求1所述的掩膜单元，其中，所述第一开口呈三角形或弯曲延伸形状。
  3. 根据权利要求2所述的掩膜单元，其中，所述第一开口为等腰三角形，所述第一开口的远离对应的镀膜区的一端构成等腰三角形的顶角。
  4. 根据权利要求2所述的掩膜单元，其中，所述第一开口的延伸长度尺寸范围为在所述第一开口延伸方向上的两个相邻的所述蒸镀开口的中心间距的2-3倍。
  5. 根据权利要求1所述的掩膜单元，其中，所述第一侧边部还具有至少一排第二开口，所述第二开口位于所述镀膜区的最外侧蒸镀开口和所述第一开口之间，所述第二开口与对应的镀膜区内的蒸镀开口共同构成矩阵阵列。
  6. 根据权利要求5所述的掩膜单元，其中，所述第二开口设置成环绕对应的所述镀膜区。
  7. 根据权利要求1所述的掩膜单元，其中，所述第一侧边部成对地设置并邻接于对应的所述镀膜区的相对两个侧边。
  8. 根据权利要求1所述的掩膜单元，其中，所述第一开口设置成环绕对应的所述镀膜区。
  9. 根据权利要求1所述的掩膜单元，其中，所述第一辅助区具有邻接所述镀膜区的四个侧边的四个所述第一侧边部，每两个相邻的所述第一侧边部的交接位置处形成有交汇部，所述交汇部内分布有多个第三开口，在远离所述镀膜区的方向上，每一所述交汇部内的单位面积内所述第三开口的总开口面积呈逐渐减小趋势。
  10. 根据权利要求9所述的掩膜单元，其中，沿着远离所述镀膜区的方向，所述第三开口的开口尺寸按照一定的规律减小。
  11. 根据权利要求9所述的掩膜单元，其中，所述多个第三开口的尺寸相同；沿着远离所述镀膜区的方向，所述第三开口在所述交汇部单位面积内的数量变少。
  12. 根据权利要求1-11中任意一项所述的掩膜单元，其中，所述掩膜单元呈长条状且还 具有第二辅助区，所述第二辅助区具有一对在所述掩膜单元的宽度方向上分布于所述镀膜区的相对两侧边之外的第二侧边部，每一所述第二侧边部的长度方向与所述掩膜单元的长度方向一致且内部分布有多个第四开口；在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，单位面积内所述第四开口的总开口面积呈增大趋势。
  13. 根据权利要求12所述的掩膜单元，其中，所述多个第四开口的开口尺寸相同，且在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，每两个相邻的所述第四开口之间的中心间距逐渐减小。
  14. 根据权利要求12所述的掩膜单元，其中，所述多个第四开口等间距地分布，且在从所述第二侧边部的中间朝向其长度方向的两端的分布方向上，所述多个第四开口的开口尺寸逐渐增大。
  15. 根据权利要求1-5中任意一项所述的掩膜单元，其中，所述掩膜单元呈长条状，一对所述第一侧边部在所述掩膜单元的宽度方向上分布于所述镀膜区的相对两侧，且在从每一所述第一侧边部的中间朝向其长度方向的两端的分布方向上，每两个相邻的所述第一开口之间的间距逐渐减小。
  16. 根据权利要求15所述的掩膜单元，其中，另一对所述第一侧边部在所述掩膜单元的长度方向上分布于所述镀膜区的相对两侧，且该另一对第一侧边部内的第一开口以均匀间距分布。
  17. 一种掩膜板组件，包括掩膜外框，其中，所述掩膜板组件还至少包括一个张紧设置于所述掩膜外框上的如权利要求1-16中任意一项所述的掩膜单元。
PCT/CN2019/098462 2019-01-09 2019-07-30 掩膜单元及具有该掩膜单元的掩膜板组件 WO2020143217A1 (zh)

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